WO2014047959A1 - 彩色滤光基板以及其相关制作方法 - Google Patents

彩色滤光基板以及其相关制作方法 Download PDF

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WO2014047959A1
WO2014047959A1 PCT/CN2012/082574 CN2012082574W WO2014047959A1 WO 2014047959 A1 WO2014047959 A1 WO 2014047959A1 CN 2012082574 W CN2012082574 W CN 2012082574W WO 2014047959 A1 WO2014047959 A1 WO 2014047959A1
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Prior art keywords
layer
black matrix
color
film layer
region
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PCT/CN2012/082574
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English (en)
French (fr)
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袁继旺
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深圳市华星光电技术有限公司
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Priority to US13/696,031 priority Critical patent/US20140092496A1/en
Publication of WO2014047959A1 publication Critical patent/WO2014047959A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters

Definitions

  • the invention relates to a display technology, in particular to a color filter substrate and a related manufacturing method thereof.
  • Liquid crystal display (Liquid Crystal Display, LCD) is widely used in modern information equipment such as computers, mobile phones and personal digital assistants due to its advantages of lightness, thinness and low power consumption.
  • a liquid crystal display includes a liquid crystal display panel and a backlight module (backlight) Module), since the liquid crystal display panel itself does not emit light, the liquid crystal display must rely on the light source in the backlight module to emit light.
  • the light emitted by the light source in the backlight module passes through the liquid crystal of the liquid crystal display panel, and the light intensity transmitted to the user is adjusted by the steering of the liquid crystal to output an image.
  • the color filter substrate is an indispensable component in the liquid crystal display.
  • the color filter substrate is placed in front of the light source, and the light of the light source is separated into three primary colors of red, green and blue by filtering the color filter substrate.
  • the LCD monitor can display color images.
  • FIG. 1 illustrates the structure of a conventional color filter substrate 100 .
  • the color filter substrate 100 includes a glass substrate 110, a black matrix layer 120, a red film layer 131, a green film layer 132, and a blue film layer 133.
  • the red film layer 131, the green film layer 132, and the blue film layer 133 are collectively referred to as a color film layer, and the liquid crystal display separates the light of the three primary colors of red, green, and blue by the color film layer to display a color image.
  • a region in which the red film layer 131, the green film layer 132, and the blue film layer 133 overlap the black matrix layer 120 can be seen in FIG.
  • the color film layer and the black matrix layer 120 have a certain overlapping region.
  • the manner in which the color film layer partially overlaps the black matrix layer 120 is such that the overlapping regions of the color mode layer and the black matrix layer 120 are higher than that of the black matrix layer 120 because the overlapping regions are not completely removed by etching. Unoverlapping areas. That is to say, the overlapping area of the color mode layer and the black matrix layer 120 forms a protrusion, thereby causing the angular difference d of these color film layers. This angular difference d may affect the alignment of the liquid crystal at the sub-pixel edge.
  • the invention provides a color filter substrate and a related manufacturing method thereof, which are made of a mask having different transmittances to form a black matrix layer. Therefore, the black matrix layer undergoes different degrees of exposure and development during the manufacturing process. In this way, in the subsequent etching process, different regions of the black matrix layer are etched differently, so that the height of the overlapping region of the color mode layer and the black matrix layer is substantially equal to the non-overlapping region. In this way, the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.
  • the present invention provides a method for fabricating a color filter substrate for fabricating a color filter substrate, the method comprising: providing a glass substrate; forming on the glass substrate a color resist layer; using a mask having a plurality of light transmittances to perform different degrees of exposure and development on the color resist layer; etching the color resist layer to produce a black matrix layer according to the result of exposure development
  • the black matrix layer has a first region and a second region, the first region having a lower height than the second region; and a color film is formed on the glass substrate and the black matrix layer a layer; wherein an overlap of the color film layer and the black matrix layer is located in a first region of the black matrix layer.
  • the mask is a halftone mask.
  • the color film layer comprises a red mold layer, a blue film layer and a green film layer.
  • the step of generating the color film layer includes: generating the red mold layer on the glass substrate and the black matrix layer; generating the green film layer on the glass substrate and the black matrix layer; And generating the blue film layer on the glass substrate and the black matrix layer.
  • the present invention also provides a color filter substrate comprising a glass substrate; a black matrix layer on the glass substrate, the black matrix layer having a first region and a second region, wherein the a first region having a height lower than the second region; and a color film layer on the glass substrate and the black matrix layer; wherein an overlap of the color film layer and the black matrix layer is located Within the first region of the black matrix layer.
  • the black matrix layer is formed by using a mask having a plurality of light transmittances to expose and develop a color resist layer to different degrees and etching the color resist layer.
  • the mask is a halftone mask.
  • the color film layer comprises a red mold layer, a blue film layer, and a green film layer.
  • the present invention provides a color filter substrate and related fabrication method for fabricating a black matrix layer by masks having different light transmittances. Therefore, the black matrix layer undergoes different degrees of exposure and development during the fabrication process. In this way, in the subsequent etching process, different regions of the black matrix layer are etched differently, so that the height of the overlapping region of the color mode layer and the black matrix layer is substantially equal to the non-overlapping region. In this way, the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.
  • FIG. 1 illustrates the structure of a conventional color filter substrate.
  • FIG. 2 is a schematic view showing an embodiment of a color filter substrate of the present invention.
  • 3 to 5 are schematic views showing the process of the color filter substrate of FIG. 2.
  • FIG. 2 is a schematic diagram of an embodiment of a color filter substrate 200 of the present invention.
  • the color filter substrate 200 includes a glass substrate 210, a black matrix layer 220, a red film layer 231, a green film layer 232, and a blue film layer 233.
  • the red film layer 231, the green film layer 232, and the blue film layer 233 are collectively referred to as a color film layer.
  • the liquid crystal display separates the light of the three primary colors of red, green and blue by the color film layer to display a color image.
  • the height of the black matrix layer 220 can be seen differently in FIG. In the first region D1 in which the black matrix layer 220 overlaps the color mode layer, its height is lower than that of the second region D2 which is not overlapped. In this way, by appropriately designing the height difference between the first region D1 and the second region D2, the angular difference of the prior art color mold layer can be eliminated.
  • the red mold layer 231 as an example, the surface of the red mold layer 231 is flat and has no angular difference. This is because the height of the black matrix layer 220 in the first region D1 is low, and the original red mold layer 231 is compensated for in the first region.
  • FIG. 3 to FIG. 5 are schematic diagrams showing the process of the color filter substrate 200 of FIG. 2 .
  • a color resist layer 320 (the subsequent black matrix layer) is first formed on the glass substrate 210, and a photoresist 330 is applied on the color resist layer 320.
  • halftone Mask 310 exposes and develops the color resist layer 320.
  • the halftone mask 310 has different light transmittances in different regions.
  • the halftone mask 310 has three regions A1, A2, and A3, the region A1 indicates a region through which part of the light is permeable, and the region A2 indicates that the light cannot be transmitted.
  • the area A3 indicates an area through which all light can pass. Therefore, the present invention can suitably utilize a halftone mask to perform different exposure development on various regions of the color resist layer 320.
  • the area A1 of the halftone mask 310 is aligned with the area to be partially removed by the color resist layer 320 (ie, the first area D1 of FIG.
  • the area A2 of the halftone mask 310 is aligned with the color resist layer.
  • the area to be completely removed i.e., the second area D2 of Fig. 2 is such that the area A3 of the halftone mask 310 is aligned with the area where the color resist layer 320 is completely unnecessary (i.e., the third area D3 of Fig. 2). Since the light transmittances of the 310 regions A1-A3 of the halftone mask are different, the photoresist 330 forms photoresists of different intensities depending on the light transmittance after the exposure.
  • the partial color resist layer 320 of the first region D1 and the entire color resist layer 320 of the second region D2 are removed by a chemical solvent.
  • the color resist layer 320 of the third region D3 it is completely retained due to the protection of the photoresist.
  • the photoresist is removed with another chemical solvent.
  • the color resist layer 320 forms the black matrix layer 220 shown in FIG. Since different degrees of exposure and development are performed, the first region D1 of the color resist layer 320 is partially etched during etching, the color resist layer 320 is completely retained in the second region D2, and the color resist of the third region D3 is formed. Layer 320 is completely etched away.
  • a color film layer is formed on the glass substrate 210 and the black matrix layer 220. Note that in order to simplify the drawing, only the red film layer 231 is shown in FIG. As is clear from FIG. 5, when the red film layer 231 is formed, since the black matrix layer 220 already has a preferable height difference, the surface of the red film layer 231 does not have a height difference (corner difference).
  • the green film layer 232 is sequentially generated on the glass substrate 210 and the black matrix layer 220. Blue film layer 233. To this end, those skilled in the art should understand the manner in which the green film layer 232 and the blue film layer 233 are produced, and therefore will not be described again.
  • the present invention does not limit the manner in which the color mold layer is produced, and it is within the scope of the present invention, whether by means of printing, deposition or other means of production.
  • the present invention provides a color filter substrate and a related manufacturing method for fabricating a black matrix layer by using masks having different light transmittances. Therefore, the black matrix layer undergoes different degrees of exposure and development during the fabrication process, so that in the subsequent etching process, different etching levels are applied to different regions of the black matrix layer, thereby making the color mode layer and black
  • the height of the overlapping area of the matrix layer is approximately equal to the area that is not overlapped. In this way, the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

提供了一种彩色滤光基板（200）以及其相关制作方法。彩色滤光基板（200）的制作方法包含：提供一玻璃基板（210）；于玻璃基板（210）上，形成一色阻层（320）；利用具有多种透光率的一掩膜（310），以对色阻层（320）进行不同程度的曝光显影；根据曝光显影的结果，来蚀刻色阻层（320），以产生一黑色矩阵层（220），黑色矩阵层（220）具有一第一区域（D1）以及一第二区域（D3），第一区域（D1）的高度低于第二区域（D3）；以及于玻璃基板（210）以及黑色矩阵层（220）上，产生一彩色膜层（231，232，233）；其中彩色膜层（231，232，233）与黑色矩阵层（220）的重叠处位于黑色矩阵层（220）的第一区域（D1）内。

Description

彩色滤光基板以及其相关制作方法 技术领域
本发明涉及一种显示器技术，尤其涉及一种彩色滤光基板以及其相关制作方法。
 背景技术
液晶显示器(Liquid Crystal Display，LCD)轻、薄、低耗电等优点，被广泛应用于计算机、移动电话及个人数字助理等现代化信息设备。一般来说，液晶显示器包含液晶显示面板及背光模块(backlight module)，由于液晶显示面板自身不会发光，因此液晶显示器必须仰赖背光模块内的光源来发出光线。由背光模块内的光源所发出的光线，经过液晶显示面板的液晶，藉由液晶的转向，来调整传递至使用者的光线强度，进而输出影像。
彩色滤光基板是液晶显示器中不可或缺的零件，一般彩色滤光基板会放置在光源之前，藉由彩色滤光基板的滤光，可使光源的光线分离成为红绿蓝三原色，藉此，液晶显示器方能显示彩色影像。
请参阅图1，图1绘示了现有彩色滤光基板100的结构。彩色滤光基板100包含了玻璃基板110、黑色矩阵层120、红色膜层131、绿色膜层132、以及蓝色膜层133。红色膜层131、绿色膜层132以及蓝色膜层133合称为彩色膜层，液晶显示器便是藉由这彩色膜层，来分离出红绿蓝三原色的光，以显示彩色影像。
在图1中可以见到红色膜层131、绿色膜层132以及蓝色膜层133与黑色矩阵层120具有重叠的区域。在制作彩色滤光基板100时，为了避免彩色膜层边缘漏光，因此会使彩色膜层与黑色矩阵层120有一定的重叠区域。然而，让彩色膜层与黑色矩阵层120部分重叠的制作方式，由于没有完全将这些重叠区域藉由蚀刻的方式去除之，因此会导致彩色模层与黑色矩阵层120的重叠区域的高度高于未重叠的区域。也就是说，彩色模层与黑色矩阵层120的重叠区域会形成一个突起，进而造成这些彩色膜层的角段差d。此角段差d可能会影响子像素(sub-pixel)边缘处液晶的排列效果。
因此，业界必须提出其他的方式，来解决这样的问题。
 技术问题
本发明提供一种彩色滤光基板以及其相关制作方式，其藉由具有不同透光率的掩膜，来制作黑色矩阵层，因此，黑色矩阵层在制作过程中会经过不同程度的曝光显影，如此一来，在其后的蚀刻过程中，就会对黑色矩阵层不同区域有不同的蚀刻程度，进而使彩色模层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
 技术解决方案
为了解决现有技术的问题，本发明提供了一种彩色滤光基板的制作方法，用来制作一彩色滤光基板，所述制作方法包含：提供一玻璃基板；于所述玻璃基板上，形成一色阻层；利用具有多种透光率的一掩膜，以对所述色阻层进行不同程度的曝光显影；根据曝光显影的结果，来蚀刻所述色阻层，以产生一黑色矩阵层，所述黑色矩阵层具有一第一区域以及一第二区域，所述第一区域的高度低于所述第二区域；以及于所述玻璃基板以及所述黑色矩阵层上，产生一彩色膜层；其中，所述彩色膜层与所述黑色矩阵层的重叠处位于所述黑色矩阵层的第一区域内。
其中，所述掩膜为一半色调掩膜。
其中，彩色膜层包含一红色模层、一蓝色膜层以及一绿色膜层。
此外，产生所述彩色膜层的步骤包含：于所述玻璃基板与所述黑色矩阵层上产生所述红色模层；于所述玻璃基板与所述黑色矩阵层上产生所述绿色膜层；以及于所述玻璃基板与所述黑色矩阵层上产生所述蓝色膜层。
本发明还提供了一种彩色滤光基板，包含一玻璃基板；一黑色矩阵层，位于所述玻璃基板上，所述黑色矩阵层的具有一第一区域以及一第二区域，其中，所述第一区域的高度低于所述第二区域；以及一彩色膜层，位于所述玻璃基板以及所述黑色矩阵层上；其中，所述彩色膜层与所述黑色矩阵层的重叠处位于所述黑色矩阵层的第一区域内。
其中，所述黑色矩阵层是藉由利用具有多种透光率的一掩膜，以对一色阻层进行不同程度的曝光显影，并蚀刻所述色阻层制作而成。
此外，所述掩膜为一半色调掩膜。
其中，所述彩色膜层包含一红色模层、一蓝色膜层、以及一绿色膜层。
 有益效果
本发明提供一种彩色滤光基板与相关制作方式，其藉由具有不同透光率的掩膜，来制作黑色矩阵层。因此，黑色矩阵层在制作过程中会经过不同程度的曝光显影。如此一来，在其后的蚀刻过程中，就会对黑色矩阵层不同区域有不同的蚀刻程度，进而使彩色模层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。
图1绘示现有彩色滤光基板的结构。
图2绘示本发明彩色滤光基板的实施例的示意图。
图3-图5为图2彩色滤光基板的制程示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施之特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「顶」、「底」、「水平」、「垂直」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参阅图2，图2为本发明彩色滤光基板200的实施例的示意图。彩色滤光基板200包含有玻璃基板210、黑色矩阵层220、红色膜层231、绿色膜层232以及蓝色膜层233。红色膜层231、绿色膜层232以及蓝色膜层233合称为彩色膜层。液晶显示器便是藉由这彩色膜层，来分离出红绿蓝三原色的光，以显示彩色影像。
在图2中可以见到黑色矩阵层220的高度有所不同。在黑色矩阵层220与彩色模层重叠的第一区域D1中，其高度比未重叠的第二区域D2来的低。如此一来，藉由适当地设计第一区域D1与第二区域D2的高度差，便可以消除现有技术彩色模层的角段差。以红色模层231为例，红色模层231的表面平整，不具有角段差，这便是由于黑色矩阵层220于第一区域D1的高度较低，补偿了原本红色模层231于第一区域D1与第二区域D2的高度差。
请参阅图3-图5，图3-图5为图2彩色滤光基板200的制程示意图。首先，会先在玻璃基板210上产生一色阻层320(之后的黑色矩阵层)，并在色阻层320上涂上光致抗蚀剂(photoresist)330。
接着，利用半色调掩膜(half-tone mask)310对色阻层320进行曝光显影。半色调掩膜310在不同区域具有不同的透光率，举例来说，半色调掩膜310具有三个区域A1、A2和A3，区域A1表示部分光线可以透过的区域，区域A2表示光线无法透过的区域，区域A3表示全部光线可以透过的区域。因此，本发明可适当的利用半色调掩膜，以对色阻层320各个区域进行不同的曝光显影。举例来说，将半色调掩膜310的区域A1对准色阻层320欲部分去除的区域(亦即图2的第一区域D1)，将半色调掩膜310的区域A2对准色阻层320欲全部去除的区域(亦即图2的第二区域D2)，将半色调掩膜310的区域A3对准色阻层320完全无须去除的区域(亦即图2的第三区域D3)。因为半色调掩膜310个区域A1-A3的透光率不同，因此光致抗蚀剂330在曝光之后，会依据透光率的不同形成不同强度的光阻。
请参阅图4。以化学溶剂冲刷以去除第一区域D1的部分色阻层320以及第二区域D2的全部色阻层320。至于第三区域D3的色阻层320因为有光阻的保护而得以全部保留。最后，再以另一化学溶剂将光阻移除。如此一来，在进行蚀刻制程之后，色阻层320就会形成图2所示的黑色矩阵层220。由于进行了不同程度的曝光显影，因此在蚀刻时，色阻层320的第一区域D1便会被部分蚀刻，色阻层320在第二区域D2则完全保留，而第三区域D3的色阻层320便会完全被蚀刻而去除。
请参阅图5。在玻璃基板210与黑色矩阵层220上产生彩色膜层。请注意，为了简化图式，于图2中仅显示出红色膜层231。在图5中可清楚见到，在形成红色膜层231时，由于黑色矩阵层220已经具有较佳的高低差，因此，红色膜层231的表面便不会具有高低差(角段差)。
虽然于图5中仅绘示了红色膜层231的产生，然而，这仅只是简易的说明，在实际应用中，会另外于玻璃基板210与黑色矩阵层220上依序产生绿色膜层232以及蓝色膜层233。揭露至此，此领域具有通常知识者应可理解绿色膜层232以及蓝色膜层233的产生方式，故不另赘述于此。
此外，本发明并未限制彩色模层的产生方式，无论是利用印刷方式，沉积方式或是其他的产生方式，皆属本发明的范畴。
相较于现有技术，本发明提供一种彩色滤光基板与相关制作方式，其藉由具有不同透光率的掩膜，来制作黑色矩阵层。因此，黑色矩阵层在制作过程中会经过不同程度的曝光显影，如此一来，在其后的蚀刻过程中，就会对黑色矩阵层不同区域有不同的蚀刻程度，进而使彩色模层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
综上所述，虽然本发明已以较佳实施例揭露如上，但该较佳实施例并非用以限制本发明，该领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
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Claims (8)

  1. 彩色滤光基板的制作方法，用来制作一彩色滤光基板，所述制作方法包含：
    提供一玻璃基板；于所述玻璃基板上，形成一色阻层；
    利用具有多种透光率的一掩膜，以对所述色阻层进行不同程度的曝光显影；
    根据曝光显影的结果，来蚀刻所述色阻层，以产生一黑色矩阵层，所述黑色矩阵层具有一第一区域以及一第二区域，所述第一区域的高度低于所述第二区域；以及
    于所述玻璃基板以及所述黑色矩阵层上，产生一彩色膜层，其中，所述彩色膜层与所述黑色矩阵层的重叠处位于所述黑色矩阵层的第一区域内。
  2. 如权利要求1所述的制作方法，其中所述掩膜为一半色调掩膜。
  3. 如权利要求1所述的制作方法，其中所述彩色膜层包含一红色模层、一蓝色膜层、以及一绿色膜层。
  4. 如权利要求3所述的制作方法，其中产生所述彩色膜层的步骤包含：于所述玻璃基板与所述黑色矩阵层上产生所述红色模层；于所述玻璃基板与所述黑色矩阵层上产生所述绿色膜层；以及于所述玻璃基板与所述黑色矩阵层上产生所述蓝色膜层。
  5. 一种彩色滤光基板，包含：
    一玻璃基板；
    一黑色矩阵层，位于所述玻璃基板上，所述黑色矩阵层的具有一第一区域以及一第二区域，其中，所述第一区域的高度低于所述第二区域；以及
    一彩色膜层，位于所述玻璃基板以及所述黑色矩阵层上；
    其中，所述彩色膜层与所述黑色矩阵层的重叠处位于所述黑色矩阵层的第一区域内。
  6. 如权利要求5所述的彩色滤光基板，其中所述黑色矩阵层是藉由利用具有多种透光率的一掩膜，以对一色阻层进行不同程度的曝光显影，并蚀刻所述色阻层制作而成。
  7. 如权利要求6所述的彩色滤光基板，其中所述掩膜为一半色调掩膜。
  8. 如权利要求5所述的彩色滤光基板，其中所述彩色膜层包含一红色模层、一蓝色膜层、以及一绿色膜层。
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CN104280805A (zh) * 2014-09-30 2015-01-14 南京中电熊猫液晶材料科技有限公司 用半色调掩膜改善画素端差高度的彩色滤光片制造方法
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