WO2017041430A1 - 一种彩膜基板、显示装置及彩膜基板的制备方法 - Google Patents

一种彩膜基板、显示装置及彩膜基板的制备方法 Download PDF

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Publication number
WO2017041430A1
WO2017041430A1 PCT/CN2016/073626 CN2016073626W WO2017041430A1 WO 2017041430 A1 WO2017041430 A1 WO 2017041430A1 CN 2016073626 W CN2016073626 W CN 2016073626W WO 2017041430 A1 WO2017041430 A1 WO 2017041430A1
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WIPO (PCT)
Prior art keywords
black matrix
hole
groove
color filter
resin material
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PCT/CN2016/073626
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English (en)
French (fr)
Inventor
董安鑫
文钟源
李宾
陆相晚
袁慧芳
朱涛
唐文浩
尹海斌
陈建
方群
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Priority to US15/518,873 priority Critical patent/US10274776B2/en
Publication of WO2017041430A1 publication Critical patent/WO2017041430A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/22—Antistatic materials or arrangements

Definitions

  • Embodiments of the present invention relate to a color film substrate, a display device, and a method of fabricating a color filter substrate.
  • the edge-cutting technology is used in the panel design, and the edge of the liquid crystal display panel is minimized by the edge-cutting technology.
  • the color film substrate and the TFT array substrate will have positive and negative charges, respectively, to maintain charge balance.
  • the BM resin used for the black matrix (BM) of the display panel generally has an impedance of 10 6 to 10 8 ohms. If a high-impedance (impedance of 10 13 to 10 15 ohms) is used to fabricate the display panel, the cost of the display panel will increase by a factor of three, and the product yield will be greatly reduced. At the same time, the high-impedance BM resin has its own characteristics, and the application surface is small and cannot be applied. Pixels Per Inch (PPI) products.
  • PPI Pixels Per Inch
  • Embodiments of the present invention provide a color film substrate, a display device, and a method for preparing a color filter substrate, which are used to solve the problem that the charge release in the edge-cut product leads to greening of the picture quality of the display panel.
  • an embodiment of the present invention provides a color filter substrate, including:
  • a substrate a black matrix above the substrate, wherein a region of the black matrix where the sealant is to be coated is provided with a through hole or a groove;
  • the via or recess is filled with a high impedance material having a higher impedance than the black matrix.
  • the high-resistance material is composed of one or more of a blue pixel resin material, a red pixel resin material, and a green pixel resin material.
  • the color filter substrate further includes: a color filter disposed above the substrate;
  • the pixel resin material filled in the through hole or the groove is the same as the pixel resin material of the color filter.
  • the width of the through hole or the groove is greater than or equal to 10 micrometers, which is smaller than the width of the sealant, and the thickness (ie, depth) of the through hole is consistent with the thickness of the black matrix.
  • the term "the thickness of the through hole coincides with the thickness of the black matrix” herein means that the thickness of the through hole is within ⁇ 10% of the thickness of the black matrix.
  • the present invention provides a method for preparing a color filter substrate, comprising:
  • a high-impedance material is filled in the via or trench, the impedance of the high-impedance material being higher than the impedance of the black matrix.
  • the method further includes:
  • a flat layer is formed over the black matrix.
  • the high-resistance material is composed of one or more of a blue pixel resin material, a red pixel resin material, and a green pixel resin material.
  • the filling the high-impedance material in the through hole or groove comprises:
  • a pixel resin material for preparing the color filter is filled in the through hole or the groove.
  • the through hole or the groove is filled with a blue pixel resin by one patterning process
  • the through hole or groove is filled with a green pixel resin by one patterning process
  • the via holes or grooves are filled with a red pixel resin by one patterning process.
  • the width of the through hole or the groove is greater than or equal to 10 micrometers, which is smaller than the width of the sealant, and the thickness of the through hole is consistent with the thickness of the black matrix.
  • an embodiment of the present invention provides a display device, including the color film substrate of any of the above.
  • the display device, and the method for preparing the color film substrate provided by the embodiment of the present invention, by providing a through hole or a groove on the black matrix above the substrate,
  • the through hole or the groove corresponds to the area of the black matrix coated with the sealant, and the high-impedance material is filled in the through hole or the groove, so that the impedance of the filled high-resistance material is higher than the impedance of the black matrix, and thus the edge can be After the cutting, the electric charge on the black matrix is ensured to be not released, the charge balance of the display device is ensured, the picture quality of the display device is ensured, and the problem that the picture quality of the display device in the edge-cut product is green is solved.
  • Figure 1 is a schematic view of a bezel structure of a trimmed product.
  • FIG. 2 is a schematic structural view of a display panel corresponding to the frame of FIG. 1.
  • FIG. 3A is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention.
  • FIG. 3B is a schematic structural diagram of a color filter substrate according to another embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of a frame of a trimming product according to an embodiment of the present invention.
  • FIG. 5 is a schematic flow chart of a method for preparing a color filter substrate according to an embodiment of the present invention.
  • the base substrate 31 the black matrix 32, the sealant 33, the through holes 34, the high-resistance material 35, the flat layer 36, and the array substrate 37.
  • FIG. 1 shows a bezel design of a black matrix (BM), and FIG. 2 shows a panel structure for completing the entire liquid crystal panel process.
  • the BM frame in the edge-cut product shown in Fig. 1 and Fig. 2 is an integrated design. Since the impedance of the BM resin is low, the impedance of the BM resin is generally 10 6 to 10 8 ohms, and the BM in the color film after the edge cutting is The external conduction causes the charge in the color film to be released; the charge balance of the display panel is broken, and the Vcom voltage changes, causing the display to be green, affecting the picture quality and reducing the product quality.
  • FIG. 3A and FIG. 3B are schematic diagrams showing the structure of a color filter substrate according to an embodiment of the present invention.
  • the color filter substrate of the embodiment includes: a substrate substrate 31 located in the lining. a black matrix 32 above the base substrate 31, a region of the black matrix 32 on which the sealant 33 is applied is provided with a through hole 34; or, a region of the black matrix 32 on which the sealant 33 is coated is provided with a groove ( Not shown in the figure);
  • the through hole 34 or the groove is filled with a high-resistance material 35 having an impedance higher than that of the black matrix 32.
  • the groove can be understood as a blind hole, and the area in contact with the sealant 33 is an open area of the blind hole.
  • the thickness (ie, the depth) of the groove is slightly smaller than the thickness of the black matrix 32. Actually need to be set.
  • the width of the through hole 34 or the groove is greater than or equal to 10 micrometers, which is smaller than the width of the sealant, and the thickness of the through hole 34 substantially coincides with the thickness of the black matrix.
  • the via or groove width is approximately 15 microns to 23 microns, such as 20 microns.
  • the difference in resistivity between the high-impedance material and the black matrix in the via hole or the groove is utilized, and the problem that the charge balance is broken due to the low resistivity of the black matrix is solved, that is, the picture quality of the display device in the prior art is solved.
  • the problem of greening is utilized, and the problem that the charge balance is broken due to the low resistivity of the black matrix is solved, that is, the picture quality of the display device in the prior art is solved.
  • the impedance of the resin material can be higher than the impedance of the black matrix.
  • the high-impedance material in the through holes or grooves described above uses a resin material.
  • the aforementioned high-resistance material is composed of one or more of a blue pixel resin material, a red pixel resin material, and a green pixel resin material.
  • the color is only an example, and may be selected according to actual needs in practical applications.
  • the color filter substrate further includes a color filter (not shown) located above the substrate.
  • the resin material filled in the through hole or the groove in this embodiment is the same as the resin material of the color filter.
  • the high-impedance material filling the via or the groove shown in FIG. 3B The blue pixel resin material, the green pixel resin material, and the red pixel resin material may be sequentially stacked.
  • the color filter is also composed of a blue pixel resin material, a green pixel resin material, and a red pixel resin material which are sequentially stacked.
  • the color filter further comprises a transparent pixel resin material, and at this time, the high-resistance material filling the via or the groove includes a transparent pixel resin material.
  • the preparation process of the color filter substrate may not be increased. That is to say, the process of filling the resin material in the through hole or the groove is substantially the same as the process of manufacturing the color filter in the color film substrate, ensuring that the preparation process is not increased, and the cost is not increased.
  • the portion of the array substrate 37 is also shown in FIG. 3B.
  • the frame structure shown in FIG. 4 can be used, and the annular/square groove on the frame is the above-mentioned FIG. 3A and FIG. 3B.
  • the ring/square groove cuts the black matrix frame and is filled with the BGR pixel resin material which is sequentially stacked.
  • the impedance of the BGR pixel resin material is about 10 13 -10 15 ohms, which is higher than the impedance of the black matrix.
  • the guaranteed black matrix frame does not leak light, and the charge balance of the display panel is not broken, and the picture quality of the display panel is ensured.
  • the screen display effect of the frame shown in FIG. 4 described above is substantially the same as the screen display effect of the frame prepared by using the high-cost black matrix with high cost.
  • the problem that the display screen is green on the edge-cut product can be effectively solved, and the high-impedance black matrix is not needed to prepare the frame, thereby reducing the cost of the edge-cut product.
  • the color filter substrate shown in FIG. 3B further includes a flat layer for protecting the black matrix, and the flat layer may be a protective film OC, which is located above the black matrix and is located in the frame. Below the glue 33.
  • a through hole or a groove is formed on the black matrix above the base substrate, and the through hole or the groove corresponds to a region on the black matrix coated with the sealant, and further in the through hole or the groove Filling the aforementioned high-resistance material such as a resin material, so that the impedance of the filled resin material is higher than the impedance of the black matrix, and then the charge on the black matrix can be blocked from being released after the edge trimming, thereby ensuring the display device
  • the charge balance ensures the picture quality of the display device, and solves the problem that the picture quality of the display device in the prior art is green.
  • an embodiment of the present invention further provides a display device, which may include the color filter substrate described in any of the above embodiments.
  • a frame of the display device is not limited to the narrow frame product, and the display frame is applicable to any display device. Display device and liquid crystal display device of various sizes.
  • the display device of this embodiment has better display quality.
  • the display device can be any product or component having a display function such as a display panel, an electronic paper, a television, a display, a digital photo frame, a mobile phone, a tablet computer, and the like.
  • the present invention further provides a method for preparing a color filter substrate.
  • the method for preparing a color filter substrate in the embodiment includes the following steps:
  • a black matrix material layer on the base substrate, forming a black matrix by exposing and developing the black matrix material layer, and forming a through hole or a groove, and the through hole or the groove is located on the black matrix to be coated with the sealant Area.
  • the base substrate formed with the black matrix material layer can be exposed by using a black matrix mask, and then the developing operation is performed, so that the black matrix and the via holes or the grooves of the color filter substrate remain on the substrate. That is, a black matrix and the via holes or grooves are formed on the base substrate.
  • the black matrix mask includes a plurality of preset patterns, wherein the preset pattern includes a fully transparent region and an opaque region.
  • the high-resistance material includes a resin material or a resin material.
  • the high-resistance material includes one or more of a blue pixel resin material, a red pixel resin material, a green pixel resin material, or one of a blue pixel resin material, a red pixel resin material, and a green pixel resin material. Or a variety of components.
  • step 502 may be specifically: when forming a color filter on the base substrate, filling the through hole or the groove with a color filter for preparing a color filter. Pixel resin material.
  • the high-impedance material shown in the foregoing FIGS. 3A and 3B is a blue pixel resin material, a green pixel resin material, and a red pixel resin material which are sequentially superposed.
  • the blue filter layer can be formed using the halftone mask. Filling the through holes or grooves with blue pixel resin by one patterning process;
  • the through hole or groove is filled with a green pixel resin by one patterning process
  • the via holes or grooves are filled with a red pixel resin by one patterning process.
  • the through hole or the groove area corresponds to the semi-transmissive area of the halftone mask pattern, so that the film thickness of the resin layer filled in the through hole or the groove is thinner than the resin layer of the filter layer, and the pass is ensured.
  • the thickness of the blue pixel resin, the green pixel resin, and the red pixel resin sequentially filled in the holes or grooves coincides with the thickness of the black matrix.
  • the thickness of the black matrix is approximately 1.0 microns or more.
  • a pixel resin material layer of a plurality of colors is formed stepwise on a base substrate, and after forming a pixel resin material layer of one color, exposure and development are performed by a halftone mask patterned with a pattern to form the species.
  • the pixel resin of the color forms a corresponding pixel resin in the through holes or grooves of the bezel area.
  • the above method may not increase the manufacturing process of the color filter substrate, that is, the process of filling the resin material in the through hole or the groove is basically the same as the process of manufacturing the color filter in the color film substrate, and only the halftone mask is changed.
  • the pattern can be.
  • a frame groove having a width of about 20 ⁇ m is formed (as shown in FIG. 4 ), and a halftone mask (Half Tone Mask) can be used for the B/G/R in the position corresponding to the BM frame groove.
  • a halftone mask Half Tone Mask
  • the thickness of the B/G/R resin filled in the groove position can be effectively reduced during the production process, and the process defects caused by the excessive thickness of the superposed portion are not caused after the B/G/R is superposed.
  • step 503 not shown in the following figure may be further included:
  • the flat layer in this embodiment may be a protective film (OC).
  • a spacer PS spacer
  • PS spacer may also be formed over the flat layer, and the spacer may be integrally formed or separately formed from the protective film. That is, the color filter substrate of the present embodiment can be realized on a predetermined product process, and the process flow can be BM-B-G-R-OC (transparent spacer).
  • the above method can ensure that the material utilization rate is substantially unchanged when preparing the color film substrate, thereby ensuring no increase in cost, and does not increase the process for preparing the color film substrate, thereby being better popularized and used.
  • Any of the display panel/display device and the liquid crystal display device can adopt the above-described method of preparing the color filter substrate.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
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Abstract

一种彩膜基板、显示装置及彩膜基板的制备方法。所述彩膜基板包括衬底基板(31)，位于所述衬底基板（31）上方的黑矩阵(32)，所述黑矩阵(32)上涂覆封框胶(33)的区域设置有通孔(34)或凹槽；所述通孔(34)或凹槽中填充有高阻抗材料(35)，所述高阻抗材料(35)的阻抗高于所述黑矩阵(32)的阻抗。包括上述彩膜基板的显示装置能够解决齐边切产品中的电荷释放，导致显示装置的画面品质发绿的问题。

Description

一种彩膜基板、显示装置及彩膜基板的制备方法 技术领域
本发明的实施例涉及一种彩膜基板、显示装置及彩膜基板的制备方法。
背景技术
随着窄边框、高占屏比的液晶面板产品的市场需要增加，在面板设计中使用齐边切技术，通过此齐边切技术实现液晶显示面板边框最小化。
在齐边切产品设计时，显示面板的Vcom公共电压不为零时，彩膜基板和TFT阵列基板会分别带有正电荷和负电荷，以保持电荷平衡。
用于制作显示面板的黑矩阵(Black Matrix，简称BM)的BM树脂的阻抗一般为106～108欧姆。如果使用高阻抗的(阻抗1013～1015欧姆)进行制作显示面板，显示面板的成本会上升3倍，产品收益大幅下降，同时高阻抗BM树脂自身特性问题，适用面较小，无法应用高像素(Pixels Per Inch，简称PPI)产品。
发明内容
本发明的实施例提供一种彩膜基板、显示装置及彩膜基板的制备方法，用于解决齐边切产品中的电荷释放，导致显示面板的画面品质发绿的问题。
第一方面，本发明的实施例提供一种彩膜基板，包括：
衬底基板，位于所述衬底基板上方的黑矩阵，所述黑矩阵上将要涂覆封框胶的区域设置有通孔或凹槽；
所述通孔或凹槽中填充有高阻抗材料，所述高阻抗材料的阻抗高于所述黑矩阵的阻抗。
在一些实施方式中，所述高阻抗材料由蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种组成。
在一些实施方式中，所述彩膜基板还包括：位于所述衬底基板上方的彩色滤光片；
所述通孔或凹槽中填充的像素树脂材料与所述彩色滤光片的像素树脂材料相同。
在一些实施方式中，所述通孔或凹槽的宽度大于等于10微米，小于封框胶的宽度，所述通孔的厚度(即深度)与所述黑矩阵的厚度一致。此处的术语“所述通孔的厚度与所述黑矩阵的厚度一致”是指所述通孔的厚度为所述黑矩阵的厚度的±10％以内。
第二方面，本发明提供一种彩膜基板的制备方法，包括：
在衬底基板上形成黑矩阵材料层，在黑矩阵材料层上刻蚀形成黑矩阵，同时形成通孔或凹槽，所述通孔或凹槽位于黑矩阵上涂覆封框胶的区域；
在所述通孔或凹槽中填充高阻抗材料，所述高阻抗材料的阻抗高于所述黑矩阵的阻抗。
在一些实施方式中，所述方法还包括：
在所述黑矩阵上方形成平坦层。
在一些实施方式中，所述高阻抗材料由蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种组成。
在一些实施方式中，所述在所述通孔或凹槽中填充高阻抗材料，包括：
在所述衬底基板上形成彩色滤光片时，在所述通孔或凹槽中填充制备所述彩色滤光片的像素树脂材料。
在一些实施方式中，使用半色调掩模板制作蓝色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充蓝色像素树脂；
使用半色调掩膜板制作绿色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充绿色像素树脂；以及
使用半色调掩膜板制作红色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充红色像素树脂。
在一些实施方式中，所述通孔或凹槽的宽度大于等于10微米，小于封框胶的宽度，所述通孔的厚度与所述黑矩阵的厚度一致。
第三方面，本发明的实施例还提供一种显示装置，包括上述任一所述的彩膜基板。
由上述技术方案可知，在本发明实施例提供的彩膜基板、显示装置及彩膜基板的制备方法中，通过在衬底基板上方的黑矩阵上设置通孔或凹槽，该 通孔或凹槽对应黑矩阵上涂覆封框胶的区域，进而在通孔或凹槽中填充高阻抗材料，使得填充的高阻抗材料的阻抗高于黑矩阵的阻抗，进而可在齐边切之后，保证黑矩阵上的电荷使其不被释放，保证显示装置的电荷平衡，保证了显示装置的画面品质，解决了齐边切产品中显示装置的画面品质发绿的问题。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为一种齐边切产品的边框结构的示意图。
图2为对应图1边框的显示面板的结构示意图。
图3A为本发明一实施例提供的彩膜基板的结构示意图。
图3B为本发明另一实施例提供的彩膜基板的结构示意图。
图4为本发明一实施例提供的齐边切产品的边框结构示意图。
图5为本发明一实施例提供的彩膜基板的制备方法的流程示意图。
附图标记说明
衬底基板31、黑矩阵32、封框胶33、通孔34、高阻抗材料35、平坦层36、阵列基板37。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
图1示出了一种齐边切产品的黑矩阵(Black Matrix，简称BM)的边框设计，图2示出了完成整个液晶面板制程的面板结构。图1和图2所示的齐边切产品中BM边框为一体设计，由于BM树脂的阻抗较低，BM树脂的阻抗一般为106～108欧姆，齐边切后彩膜中的BM与外界导通，导致彩膜中的 电荷释放；显示面板的电荷平衡被打破，Vcom电压变化，使显示画面发绿，影响画面品质，降低产品品质。
下面结合附图和实施例，对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明，但不用来限制本发明的范围。
图3A和图3B分别示出了本发明一实施例提供的彩膜基板的结构示意图，如图3A和图3B所示，本实施例的彩膜基板包括：衬底基板31，位于所述衬底基板31上方的黑矩阵32，所述黑矩阵32上涂覆封框胶33的区域设置有通孔34；或者，所述黑矩阵32上涂覆封框胶33的区域设置有凹槽(图中未示出)；
所述通孔34或凹槽中填充有高阻抗材料35，所述高阻抗材料35的阻抗高于所述黑矩阵32的阻抗。
本实施例中凹槽可理解为盲孔，与封框胶33接触的区域为盲孔的开口区域，此时凹槽的厚度(即深度)略小于黑矩阵32的厚度，本实施例可根据实际需要设置。
需要说明的是，本实施例中通孔34或凹槽的宽度大于等于10微米，小于封框胶的宽度，所述通孔34的厚度与所述黑矩阵的厚度基本一致。在实际应用中，通孔或凹槽宽度大约为15微米～23微米，例如20微米。所述通孔或凹槽把将要涂覆封框胶的区域的黑矩阵切断，从而使得在通孔或者凹槽两侧的黑矩阵之间不直接接触。
本实施例利用通孔或凹槽中高阻抗材料与黑矩阵的电阻率差异，解决了由于黑矩阵电阻率较低而引起电荷平衡被打破的问题，即解决了现有技术中显示装置的画面品质发绿的问题。
目前，树脂材料的阻抗可高于黑矩阵的阻抗。在一些实施方式中，上述通孔或凹槽中的高阻抗材料使用树脂材料。举例来说，前述的高阻抗材料由蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种组成。在一些实施方式中，所述彩色，。本实施例仅为举例，在实际应用中可根据实际需要选择。
另外，彩膜基板还包括位于衬底基板上方的彩色滤光片(图中未示出)。本实施例中通孔或凹槽中填充的树脂材料与所述彩色滤光片的树脂材料相同。举例来说，如图3B所示，图3B中所示的填充通孔或凹槽的高阻抗材料 可为依次叠加的蓝色像素树脂材料、绿色像素树脂材料和红色像素树脂材料，此时，彩色滤光片也是由依次叠加的蓝色像素树脂材料、绿色像素树脂材料和红色像素树脂材料组成。在一些实施方式中，所述彩色滤光片还包含透明像素树脂材料，此时，填充通孔或凹槽的高阻抗材料包括透明像素树脂材料。
如果通孔或凹槽中填充的树脂材料与彩色滤光片的树脂材料相同，则可不增加彩膜基板的制备工艺。也就是说，在通孔或凹槽中填充树脂材料的工艺与该彩膜基板中制作彩色滤光片的工艺基本相同，保证制备工艺不增加，进而成本不增加。
图3B中还示出了阵列基板37部分，即在彩膜基板和阵列基板成盒后，可采用图4所示的边框结构，该边框上的环形/方形沟壑即为上述图3A和图3B所示彩膜基板的黑矩阵中对应的通孔区域。该环形/方形沟壑将黑矩阵边框截断，利用依次叠加的B-G-R像素树脂材料进行填充，该B-G-R像素树脂材料的阻抗约为1013-1015欧姆，高于黑矩阵的阻抗，由此可较好的保证黑矩阵边框不漏光，且使得显示面板的电荷平衡不被打破，保证显示面板的画面品质。
具体而言，上述采用图4所示的边框的画面显示效果与采用成本较高的高阻抗黑矩阵制备的边框的画面显示效果基本相同。
本实施例中可有效解决齐边切产品上显示画面发绿的问题，无需使用高阻抗黑矩阵制备边框，进而可降低齐边切产品的成本。
另外，如图3B所示，图3B中所示的彩膜基板还包括用于保护黑矩阵的平坦层，该平坦层可为保护膜OC，该平坦层36位于黑矩阵上方，且位于封框胶33下方。
本实施例的彩膜基板，通过在衬底基板上方的黑矩阵上设置通孔或凹槽，该通孔或凹槽对应黑矩阵上涂覆封框胶的区域，进而在通孔或凹槽中填充前述的高阻抗材料如树脂材料，使得填充的树脂材料的阻抗高于黑矩阵的阻抗，进而可在齐边切之后，可阻断黑矩阵上的电荷使其不被释放，保证显示装置的电荷平衡，保证了显示装置的画面品质，解决了现有技术中显示装置的画面品质发绿的问题。
另一方面，本发明的实施例还提供一种显示装置，该显示装置可包括上述任意实施例所述的彩膜基板。
此外，如图4所示，本实施例中采用上述彩膜基板制备显示装置之后，显示装置的边框的示意图，本实施例的边框不限于窄边框产品，可应用任一显示装置中，适用各种尺寸的显示装置和液晶显示设备。
本实施例的显示装置具有较好的显示质量。显示装置可以为：显示面板、电子纸、电视、显示器、数码相框、手机、平板电脑等任何具有显示功能的产品或部件。
第三方面，本发明还提供一种彩膜基板的制备方法，如图5所示，本实施例中的彩膜基板的制备方法包括如下步骤：
501、在衬底基板上形成黑矩阵材料层，通过对黑矩阵材料层曝光显影刻蚀形成黑矩阵，同时形成通孔或凹槽，通孔或凹槽位于黑矩阵上将要涂覆封框胶的区域。
可理解的是，可采用黑矩阵掩模板对形成有黑矩阵材料层的衬底基板进行曝光，接着进行显影操作，使得彩膜基板的黑矩阵和通孔或凹槽保留在衬底基板上，也即，在衬底基板上形成黑矩阵和所述通孔或凹槽。
在本实施例中，黑矩阵掩模板中包括有多个预设图案，其中预设图案包括全透光区域和不透光区域。
502、在所述通孔或凹槽中填充高阻抗材料，所述高阻抗材料的阻抗高于所述黑矩阵的阻抗。
由于树脂材料的阻抗高于黑矩阵的阻抗，因此，在一些实施方式中，所述高阻抗材料包括树脂材料，或者采用树脂材料。例如，高阻抗材料包括蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种，或者由蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种组成。
另外，需要说明的是，本实施例中，步骤502可具体为，在所述衬底基板上形成彩色滤光片时，在所述通孔或凹槽中填充用于制备彩色滤光片的像素树脂材料。
前述图3A和图3B中示出的高阻抗材料为依次叠加的蓝色像素树脂材料、绿色像素树脂材料和红色像素树脂材料。
在本实施例中，由于半色调掩模板的图案中半透明区域形成的色阻膜厚较全透明区域形成的色阻膜厚较薄，故可使用半色调掩模板制作蓝色滤光层 时，通过一次构图工艺在所述通孔或凹槽中填充蓝色像素树脂；
使用半色调掩膜板制作绿色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充绿色像素树脂；以及
使用半色调掩膜板制作红色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充红色像素树脂。
具体而言，通孔或凹槽区域对应半色调掩模板图案的半透光区域，进而使得通孔或凹槽中填充的树脂层的膜厚相对于滤光层的树脂层薄一些，保证在通孔或凹槽中依次填充的蓝色像素树脂、绿色像素树脂、红色像素树脂的厚度与黑矩阵的厚度一致。通常，黑矩阵的厚度大约在1.0微米以上。
应说明的是，在衬底基板上分步形成多种颜色的像素树脂材料层，在形成一种颜色的像素树脂材料层后通过刻画有图案的半色调掩模板进行曝光并显影而形成该种颜色的像素树脂，同时在边框区域的通孔或凹槽中形成相应的像素树脂。
上述方法可不增加彩膜基板的制作工艺，即在通孔或凹槽中填充树脂材料的工艺与所述彩膜基板中制作彩色滤光片的工艺基本相同，仅改变的是半色调掩膜板的图案即可。
需要说明的是，在BM制作时制成宽度为20微米左右的边框沟壑(如图4所示)，在对应BM边框沟壑位置，B/G/R可使用半色调掩膜板(Half Tone Mask)进行制作，制作过程中能够有效降低沟壑位置填充的B/G/R树脂的厚度，在B/G/R叠加后不会引起由于叠加部位厚度过高引起的工艺性不良。
在一些实施方式中，在实际制备彩膜基板时，在前述步骤502之后，还可包括下述的图中未示出的步骤503：
503、在所述黑矩阵上方形成平坦层(如图3B所示)。
本实施例中的平坦层可为保护膜(OC)。在其他实施例中，还可以在平坦层上方形成隔垫物(photo spacer简称PS)，该隔垫物可与保护膜一体成型或分开成型。即，本实施例的彩膜基板可在既定的产品工艺上实现，工艺流程可为BM-B-G-R-OC(透明隔垫物)。
上述方法在制备彩膜基板时可保证物料使用率基本不变，进而保证不增加成本，且不增加制备彩膜基板的工艺，由此，可较好的推广使用。任一显示面板/显示装置及液晶显示器设备均可采用上述彩膜基板的制备方法。
本领域普通技术人员可以理解：以上各实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述各实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本发明权利要求所限定的范围。
本申请要求于2015年9月7日递交的中国专利申请第201510564858.5号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (15)

  1. 一种彩膜基板，包括：
    衬底基板，位于所述衬底基板上方的黑矩阵，所述黑矩阵上将要涂覆封框胶的区域设置有通孔或凹槽；
    所述通孔或凹槽中填充有高阻抗材料，所述高阻抗材料的阻抗高于所述黑矩阵的阻抗。
  2. 根据权利要求1所述的彩膜基板，其中所述高阻抗材料包括蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种。
  3. 根据权利要求2所述的彩膜基板，其中所述彩膜基板还包括：位于所述衬底基板上方的彩色滤光片；
    所述通孔或凹槽中填充的像素树脂材料与所述彩色滤光片的像素树脂材料相同。
  4. 根据权利要求1至3任一项所述的彩膜基板，其中所述通孔或凹槽的宽度大于等于10微米，小于封框胶的宽度，所述通孔的厚度与所述黑矩阵的厚度一致。
  5. 根据权利要求4所述的彩膜基板，其中所述通孔或凹槽的宽度为15微米至23微米。
  6. 根据权利要求1至5中任一项所述的彩膜基板，其中所述通孔或凹槽把将要涂覆封框胶的区域的黑矩阵切断。
  7. 一种彩膜基板的制备方法，包括：
    在衬底基板上形成黑矩阵材料层，在黑矩阵材料层上刻蚀形成黑矩阵，同时形成通孔或凹槽，通孔或凹槽位于黑矩阵上将要涂覆封框胶的区域；
    在所述通孔或凹槽中填充高阻抗材料，所述高阻抗材料的阻抗高于所述黑矩阵的阻抗。
  8. 根据权利要求7所述的方法，其中所述方法还包括：
    在所述黑矩阵上方形成平坦层。
  9. 根据权利要求7所述的方法，其中所述高阻抗材料包括蓝色像素树脂材料、红色像素树脂材料、绿色像素树脂材料中的一种或多种。
  10. 根据权利要求9所述的方法，其中所述在所述通孔或凹槽中填充高 阻抗材料，包括：
    在所述衬底基板上形成彩色滤光片时，在所述通孔或凹槽中填充制备所述彩色滤光片的像素树脂材料。
  11. 根据权利要求10所述的方法，其中
    使用半色调掩模板制作蓝色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充蓝色像素树脂；
    使用半色调掩膜板制作绿色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充绿色像素树脂；以及
    使用半色调掩膜板制作红色滤光层时，通过一次构图工艺在所述通孔或凹槽中填充红色像素树脂。
  12. 根据权利要求7至11中任一项所述的方法，其中所述通孔或凹槽的宽度大于等于10微米，小于封框胶的宽度，所述通孔的厚度与所述黑矩阵的厚度一致。
  13. 根据权利要求12所述的方法，其中所述通孔或凹槽的宽度为15微米至23微米。
  14. 根据权利要求7至13中任一项所述的方法，其中所述通孔或凹槽把将要涂覆封框胶的区域的黑矩阵切断。
  15. 一种显示装置，包括权利要求1至6中任一项所述的彩膜基板。
PCT/CN2016/073626 2015-09-07 2016-02-05 一种彩膜基板、显示装置及彩膜基板的制备方法 WO2017041430A1 (zh)

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