WO2017008316A1 - 一种阵列基板及液晶显示面板 - Google Patents

一种阵列基板及液晶显示面板 Download PDF

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Publication number
WO2017008316A1
WO2017008316A1 PCT/CN2015/084364 CN2015084364W WO2017008316A1 WO 2017008316 A1 WO2017008316 A1 WO 2017008316A1 CN 2015084364 W CN2015084364 W CN 2015084364W WO 2017008316 A1 WO2017008316 A1 WO 2017008316A1
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Prior art keywords
substrate
layer
color
projection
metal layer
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Ceased
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PCT/CN2015/084364
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English (en)
French (fr)
Inventor
叶成亮
付如海
邱杰
张君恺
林永伦
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/777,977 priority Critical patent/US20170017112A1/en
Publication of WO2017008316A1 publication Critical patent/WO2017008316A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to an array substrate and a liquid crystal display panel.
  • the existing liquid crystal display panel includes: a first substrate and a second substrate 19, and the first substrate is, for example, BOA (BM on Array), the BOA substrate is a color filter film and a black matrix formed on the array substrate; the substrate includes a substrate substrate 11, a shield metal line 12, an insulating layer 13 between the shield metal line 12 and the data line, and a data line 14
  • the color resist layer 15, the black matrix layer 16, the transparent conductive layer 17, and the liquid crystal layer 18; the color resist layer 15 includes a red color film 101, a green color film 102, and a blue color film 103.
  • the liquid crystal display increases the shielding metal line 12 on both sides of the data line 14 to shield, and the separation distance between the shielding metal line 12 and the data line 14 is about 3-4 microns. .
  • the BOA technique occludes the gap between the data line 14 and the shield metal line 12 through the black matrix.
  • the overlap between the adjacent two color film color resists above the data line 14 is too high, resulting in the pixel edge liquid crystal reversing direction, so that the liquid crystal molecules are not aligned backward.
  • the liquid crystal at the edge of the pixel generates dark lines due to the difference in thickness, and reduces the contrast of the panel.
  • the data line 14 and the scan line 20 define a plurality of pixels 104, 105; Dark lines appear on the edges of pixels 104 and 105.
  • an array substrate which includes:
  • the shielding metal layer comprising a plurality of shielding metal lines
  • a first metal layer on the shielding metal layer including a plurality of the data lines
  • the color resist layer on the first insulating layer, the color resist layer comprising a plurality of color film color resists; wherein two adjacent color film resists are spaced apart from each other;
  • the black matrix layer comprising a plurality of black matrices
  • the spacing between adjacent two color film color resists is set according to a first spacing, the first spacing is a spacing between the first projection and the second projection, and the first projection is the data line Projection on the base substrate; the second projection is a projection of the shield metal line on the base substrate corresponding to the data line.
  • the spacing between adjacent two color film color resists is 2-4 microns.
  • the thickness of the black matrix and the thickness of the color film of the color film are equal.
  • the black matrix is used to shield a gap between the data line and a corresponding one of the shield metal lines.
  • a second insulating layer is further disposed between the shield metal layer and the first metal layer.
  • an array substrate which includes:
  • a first metal layer on the substrate substrate including a plurality of the data lines
  • the color resist layer comprises a plurality of color film color resists; wherein two adjacent color film resists are spaced apart from each other;
  • the black matrix layer comprising a plurality of black matrices
  • the transparent conductive layer is located on the black matrix layer.
  • the array substrate further includes a shielding metal layer between the substrate substrate and the first metal layer, the shielding metal layer including a plurality of shielding metal lines ;
  • the spacing between two adjacent color film color resists is set according to a first pitch, wherein the first pitch is a spacing between the first projection and the second projection, and the first projection is that the data line is in the a projection on the substrate; the second projection is a projection of the shield metal line on the substrate corresponding to the data line.
  • the spacing between adjacent two color film color resists is 2-4 microns.
  • the thickness of the black matrix and the thickness of the color film of the color film are equal.
  • the array substrate further includes a shielding metal layer between the substrate substrate and the first metal layer, the shielding metal layer including a plurality of shielding metal lines ;
  • the black matrix is used to shield a gap between the data line and a corresponding one of the shield metal lines.
  • a first insulating layer is provided between the first metal layer and the color resist layer.
  • the invention also provides a liquid crystal display panel comprising:
  • the array substrate includes:
  • a first metal layer on the substrate substrate including a plurality of the data lines
  • the color resist layer comprises a plurality of color film color resists; wherein two adjacent color film resists are spaced apart from each other;
  • the black matrix layer comprising a plurality of black matrices
  • the transparent conductive layer is located on the black matrix layer.
  • the array substrate further includes a shielding metal layer between the substrate substrate and the first metal layer, the shielding metal layer including a plurality of shielding metals line;
  • the spacing between two adjacent color film color resists is set according to a first pitch, wherein the first pitch is a spacing between the first projection and the second projection, and the first projection is that the data line is in the a projection on the substrate; the second projection is a projection of the shield metal line on the substrate corresponding to the data line.
  • the spacing between adjacent two color film color resists is 2-4 micrometers.
  • the thickness of the black matrix and the thickness of the color film of the color film are equal.
  • the black matrix is used to shield a gap between the data line and a corresponding one of the shield metal lines.
  • a first insulating layer is provided between the first metal layer and the color resist layer.
  • a second insulating layer is further provided between the shield metal layer and the first metal layer.
  • the color film color resistance is prevented from overlapping, thereby making the surface of the array substrate smoother and reducing dark lines.
  • FIG. 1 is a schematic structural view of a prior art array substrate
  • FIG. 2 is a schematic structural view of a pixel of the prior art
  • FIG. 3 is a schematic structural view of a first liquid crystal display panel of the present invention.
  • FIG. 4 is a schematic structural view of a second liquid crystal display panel of the present invention.
  • FIG. 3 is a schematic structural diagram of a first liquid crystal display panel of the present invention.
  • the array substrate of the present invention comprises: a first substrate, and the first substrate is, for example, BOA (BM on The Array substrate includes a base substrate 21, a first metal layer 24, a color resist layer 25, a black matrix layer, a transparent conductive layer 27, and a liquid crystal layer 28; and further includes a shield metal layer 22, a second insulating layer 23,
  • the shielding metal layer 22 is located on the substrate substrate 21 and includes a plurality of shielding metal lines 31.
  • the first metal layer 24 is located on the shielding metal layer 22, and includes a plurality of data lines 32.
  • the shielding metal lines 31 are provided.
  • the color resist layer 25 is located on the first metal layer 24, and the color resist layer 25 includes a plurality of color film color resists; for example, red color The film 201, the green color film 202, and the blue color film 203. Wherein two adjacent color film resists are arranged at intervals; that is, the adjacent two color films do not overlap.
  • the black matrix layer is located between two color film color resists, and the black matrix layer includes a plurality of black matrices 26.
  • the transparent conductive layer 27 may include a pixel electrode.
  • the color film color resistances do not overlap, when a black matrix is formed, a part of the black matrix material is caused to flow into the gap between the color film color resistances, thereby reducing the height of the black matrix overlapping the color film color resistance.
  • the surface of the array substrate is made flatter, which can reduce dark lines and improve the contrast of the panel.
  • a spacing between two adjacent color film color resists is set according to a first pitch, the first pitch being a spacing m between the first projection and the second projection, the first projection being the Projection of the data line 32 on the base substrate 21; the second projection is a projection of the shield metal line 31 corresponding to the data line 32 on the base substrate.
  • the shield metal wires are generally disposed on both sides of the data line.
  • the spacing between the color film color resists is preferably greater than the first pitch, and if the distance is too small, the aperture ratio of the panel may be affected. Therefore, the spacing between the color resists of the color film is set according to the first pitch, and the aperture ratio of the display panel can be prevented from being affected.
  • the black matrix is used to block a gap between the data line and a corresponding one of the shielding metal lines.
  • the black matrix 26 blocks the gap between the data line 32 and the shield metal line 31 on the left side thereof, and the gap between the data line 32 and the shield metal line on the right side thereof.
  • the spacing between adjacent two color film color resists is 2-4 microns.
  • the array substrate is further provided with a plurality of thin film transistors, and each of the color film color resists corresponds to a thin film transistor.
  • a first insulating layer is disposed between the first metal layer and the color resist layer.
  • the first insulating layer is used to isolate the shielding metal layer and the color resist layer for preventing the shielding metal layer from being oxidized.
  • FIG. 4 is a schematic structural diagram of a second liquid crystal display panel of the present invention.
  • the difference between the present embodiment and the previous embodiment is that the spacing between the red color film 301, the green color film 302, and the blue color film 303 in the color resist layer 30 of the present embodiment is larger than that in FIG. 3, so that the black The thickness of the black matrix 33 in the matrix layer is equal to the thickness of the color film color resists 301-303; that is, the surface of the black matrix is flush with the surface of the color film color resist, thereby making the surface of the transparent conductive layer 34 more flat.
  • the surface of the array substrate is made flatter, and the dark lines can be further reduced.
  • the present invention also provides a liquid crystal display panel comprising: as shown in FIGS. 3 and 4, an opposite substrate 29 disposed opposite to the array substrate; and a liquid crystal layer 28 between the opposite substrate 29 and the array substrate
  • the array substrate includes: a substrate substrate 21, and a shielding metal layer 22 on the substrate substrate 21, including a plurality of shielding metal lines 31 for reducing the data lines 32 and the transparent conductive layer A coupling capacitance between 27 or 34; the opposite substrate 29 may be provided with a common electrode.
  • the first metal layer 24 is located on the shielding metal layer 22, including a plurality of the data lines 32;
  • a color resist layer 25 or 30 is disposed on the first metal layer 24, the color resist layer includes a plurality of color film color resists 201-203 or 301-303; wherein the color spacing between adjacent two color film layers is Setting
  • the black matrix layer comprising a plurality of black matrices 26 or 33;
  • a transparent conductive layer 27 or 34 is located on the black matrix layer.
  • a spacing between adjacent two color film color resists is set according to a first spacing, the first spacing is a spacing between the first projection and the second projection, and the first projection is the data a projection of the line on the base substrate; the second projection being a projection of the shielded metal line on the substrate substrate corresponding to the data line.
  • the spacing between the color film color resists is preferably greater than the first pitch, and if the distance is too small, the aperture ratio of the panel may be affected. Therefore, the spacing between the color resists of the color film is set according to the first pitch, and the aperture ratio of the display panel can be prevented from being affected.
  • the black matrix is used to block a gap between the data line and a corresponding one of the shielding metal lines.
  • the black matrix 26 blocks the gap between the data line 32 and the shield metal line 31 on the left side thereof, and the gap between the data line 32 and the shield metal line on the right side thereof.
  • the spacing between adjacent two color film color resists is 2-4 microns.
  • the array substrate is further provided with a plurality of thin film transistors, and each of the color film color resists corresponds to a thin film transistor.
  • a first insulating layer is disposed between the first metal layer and the color resist layer.
  • the first insulating layer is used to isolate the shielding metal layer and the color resist layer for preventing the shielding metal layer from being oxidized.
  • the color film color resistance is prevented from overlapping, thereby making the surface of the array substrate smoother, reducing dark lines, and improving the display effect.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Filters (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种阵列基板及液晶显示面板，所述阵列基板包括：衬底基板(21)、第一金属层(24)、色阻层(25)、黑色矩阵层、透明导电层(27)，所述色阻层（25）包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置。所述阵列基板及液晶显示面板，通过将彩膜色阻间隔设置，避免彩膜色阻之间重叠，从而使得阵列基板的表面更平整，减少暗纹。

Description

一种阵列基板及液晶显示面板 技术领域
本发明涉及液晶显示器技术领域，特别是涉及一种阵列基板及液晶显示面板。
 背景技术
现有的液晶显示面板包括：第一基板、第二基板19，第一基板譬如为BOA（BM on Array）基板，BOA基板是在阵列基板上制作彩色滤光膜和黑色矩阵；其包括衬底基板11、屏蔽金属线12、位于屏蔽金属线12和数据线之间的绝缘层13；数据线14、色阻层15、黑色矩阵层16、透明导电层17、液晶层18；色阻层15包括红色彩膜101、绿色彩膜102、蓝色彩膜103。为了降低数据线与透明导电层之间的耦合电容，液晶显示器在数据线14的两边增加屏蔽金属线12起到屏蔽作用，屏蔽金属线12与数据线14之间的间隔距离约3-4微米。BOA技术通过黑色矩阵对数据线14与屏蔽金属线12之间的缝隙进行遮挡。
然而现有的制作方法，使得数据线14上方的相邻两个彩膜色阻之间重叠太高，导致像素边缘液晶倒向方向，使得液晶分子的倒向不一致。特别是在亮态情况下，像素边缘的液晶由于上述厚度差的影响，产生暗纹，降低面板的对比度，如图2所示，数据线14和扫描线20限定多个像素104、105；在像素104和105的边缘出现了暗纹。
因此，有必要提供一种阵列基板及液晶显示面板，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种阵列基板及液晶显示面板，以解决现有技术中的相邻彩膜色阻之间由于重叠，使得阵列基板侧的表面不平整，容易出现暗纹的技术问题。
 技术解决方案
为解决上述技术问题，本发明构造了一种阵列基板，其包括：
衬底基板；
屏蔽金属层，位于所述衬底基板上，所述屏蔽金属层包括多条屏蔽金属线；
第一金属层，位于所述屏蔽金属层上，包括多条所述数据线；
第一绝缘层，位于所述第一金属层上；
色阻层，位于所述第一绝缘层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
透明导电层，位于所述黑色矩阵层上；
其中，相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
在本发明的阵列基板中，相邻两个所述彩膜色阻之间的间距为2-4微米。
在本发明的阵列基板中，所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
在本发明的阵列基板中，所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
在本发明的阵列基板中，在所述屏蔽金属层和所述第一金属层之间还设置有第二绝缘层。
为解决上述技术问题，本发明构造了一种阵列基板，其包括：
衬底基板；
第一金属层，位于所述衬底基板上，包括多条所述数据线；
色阻层，位于所述第一金属层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
所述透明导电层，位于所述黑色矩阵层上。
在本发明的阵列基板中，所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
在本发明的阵列基板中，相邻两个所述彩膜色阻之间的间距为2-4微米。
在本发明的阵列基板中，所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
在本发明的阵列基板中，所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
在本发明的阵列基板中，在所述第一金属层和所述色阻层之间设置有第一绝缘层。
本发明还提供一种液晶显示面板，其包括：
对置基板，与阵列基板相对设置；
液晶层，位于所述对置基板和所述阵列基板之间；以及
所述阵列基板，其包括：
衬底基板；
第一金属层，位于所述衬底基板上，包括多条所述数据线；
色阻层，位于所述第一金属层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
所述透明导电层，位于所述黑色矩阵层上。
在本发明的液晶显示面板中，所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
在本发明的液晶显示面板中，相邻两个所述彩膜色阻之间的间距为2-4微米。
在本发明的液晶显示面板中，所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
在本发明的液晶显示面板中，所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
在本发明的液晶显示面板中，在所述第一金属层和所述色阻层之间设置有第一绝缘层。
在本发明的液晶显示面板中，在所述屏蔽金属层和所述第一金属层之间还设置有第二绝缘层。
 有益效果
本发明的阵列基板及液晶显示面板，通过将彩膜色阻间隔设置，避免彩膜色阻之间重叠，从而使得阵列基板的表面更平整，减少暗纹。
 附图说明
图1为现有技术的阵列基板的结构示意图；
图2为现有技术的像素的结构示意图；
图3为本发明的第一种液晶显示面板的结构示意图；
图4为本发明的第二种液晶显示面板的结构示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
请参照图3，图3为本发明的第一种液晶显示面板的结构示意图。
本发明的阵列基板包括：第一基板、第一基板譬如为BOA（BM on Array）基板，其包括衬底基板21、第一金属层24、色阻层25、黑色矩阵层、透明导电层27、液晶层28；此外还可包括屏蔽金属层22、第二绝缘层23、所述屏蔽金属层22位于所述衬底基板21上，包括多条屏蔽金属线31，第一金属层24位于所述屏蔽金属层22上，包括多条数据线32；所述屏蔽金属线31用于降低数据线32与透明导电层27之间的耦合电容；所述色阻层25位于所述第一金属层24上，所述色阻层25包括多个彩膜色阻；譬如红色彩膜201、绿色彩膜202、蓝色彩膜203。其中相邻两个所述彩膜色阻之间间隔设置；即相邻两个彩膜之间不重叠。所述黑色矩阵层位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵26。所述透明导电层27可包括像素电极。
由于彩膜色阻之间不重叠，因此在制作黑色矩阵时，使得一部分黑色矩阵材料流入到彩膜色阻之间的空隙中，从而降低了重叠在彩膜色阻上的黑色矩阵的高度，使得阵列基板的表面更加平整，能够减少暗纹，提高面板的对比度。
优选地，相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距m，所述第一投影为所述数据线32在所述衬底基板21上的投影；所述第二投影为与所述数据线32相应的所述屏蔽金属线31在所述衬底基板上的投影。 一般在所述数据线的两侧设置有所述屏蔽金属线。
彩膜色阻之间的间距优选大于所述第一间距，如果距离太小，会影响面板的开口率。因此彩膜色阻之间的间距根据第一间距设置，可以防止影响显示面板的开口率。
优选地，所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。譬如黑色矩阵26遮挡数据线32与其左侧的所述屏蔽金属线31之间的间隙，以及遮挡数据线32与位于其右侧的屏蔽金属线之间的间隙。
优选地，相邻两个所述彩膜色阻之间的间距为2-4微米。
所述彩膜色阻之间间距越小，其上重叠的黑色矩阵越高，阵列基板表面越不平整，导致暗纹越多，间距太大会降低透光率以及面板的利用率。
优选地，所述阵列基板上还设置有多个薄膜晶体管，每个所述彩膜色阻对应一薄膜晶体管。
优选地，在所述第一金属层和所述色阻层之间设置有第一绝缘层。所述第一绝缘层用于隔离所述屏蔽金属层和所述色阻层，用于防止所述屏蔽金属层被氧化。
请参照图4，图4为本发明的第二种液晶显示面板的结构示意图。
本实施例和上一实施例的区别在于：本实施例的色阻层30中红色彩膜301、绿色彩膜302、蓝色彩膜303之间的间距比图3中的大，使得所述黑色矩阵层中的黑色矩阵33的厚度和所述彩膜色阻301-303的厚度相等；即黑色矩阵的表面与彩膜色阻的表面齐平，进而使得透明导电层34的表面也更加平整。
本实施例由于黑色矩阵并未在彩膜色阻上重叠，因此使得阵列基板的表面更加平整，能够进一步地减小暗纹。
本发明还提供一种液晶显示面板，其包括：如图3和4所示，对置基板29，与阵列基板相对设置；液晶层28，位于所述对置基板29和所述阵列基板之间；以及所述阵列基板包括：衬底基板21、屏蔽金属层22位于所述衬底基板21上，包括多条屏蔽金属线31，所述屏蔽金属线31用于降低数据线32与透明导电层27或34之间的耦合电容；所述对置基板29可设置有公共电极。
第一金属层24位于所述屏蔽金属层22上，包括多条所述数据线32；
色阻层25或者30位于所述第一金属层24上，所述色阻层包括多个彩膜色阻201-203或301-303；其中相邻两个所述彩膜色阻之间间隔设置；
黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵26或者33；以及
透明导电层27或34位于所述黑色矩阵层上。
优选地，相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
彩膜色阻之间的间距优选大于所述第一间距，如果距离太小，会影响面板的开口率。因此彩膜色阻之间的间距根据第一间距设置，可以防止影响显示面板的开口率。
优选地，所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。譬如黑色矩阵26遮挡数据线32与其左侧的所述屏蔽金属线31之间的间隙，以及遮挡数据线32与位于其右侧的屏蔽金属线之间的间隙。
优选地，相邻两个所述彩膜色阻之间的间距为2-4微米。
所述彩膜色阻之间间距越小，其上重叠的黑色矩阵越高，阵列基板表面越不平整，导致暗纹越多，间距太大会降低透光率以及面板的利用率。
优选地，所述阵列基板上还设置有多个薄膜晶体管，每个所述彩膜色阻对应一薄膜晶体管。
优选地，在所述第一金属层和所述色阻层之间设置有第一绝缘层。所述第一绝缘层用于隔离所述屏蔽金属层和所述色阻层，用于防止所述屏蔽金属层被氧化。
本发明的阵列基板及液晶显示面板，通过将彩膜色阻间隔设置，避免彩膜色阻之间重叠，从而使得阵列基板的表面更平整，减小暗纹，提高显示效果。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (18)

  1. 一种阵列基板，其包括：
    衬底基板；
    屏蔽金属层，位于所述衬底基板上，所述屏蔽金属层包括多条屏蔽金属线；
    第一金属层，位于所述屏蔽金属层上，包括多条所述数据线；
    第一绝缘层，位于所述第一金属层上；
    色阻层，位于所述第一绝缘层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
    黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
    透明导电层，位于所述黑色矩阵层上；
    其中，相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
  2. 根据权利要求1所述的阵列基板，其中
    相邻两个所述彩膜色阻之间的间距为2-4微米。
  3. 根据权利要求1所述的阵列基板，其中
    所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
  4. 根据权利要求1所述的阵列基板，其中
    所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
  5. 根据权利要求1所述的阵列基板，其中
    在所述屏蔽金属层和所述第一金属层之间还设置有第二绝缘层。
  6. 一种阵列基板，其包括：
    衬底基板；
    第一金属层，位于所述衬底基板上，包括多条所述数据线；
    色阻层，位于所述第一金属层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
    黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
    所述透明导电层，位于所述黑色矩阵层上。
  7. 根据权利要求6所述的阵列基板，其中
    所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
    相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
  8. 根据权利要求6所述的阵列基板，其中
    相邻两个所述彩膜色阻之间的间距为2-4微米。
  9. 根据权利要求6所述的阵列基板，其中
    所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
  10. 根据权利要求6所述的阵列基板，其中
    所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
    所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
  11. 根据权利要求6所述的阵列基板，其中
    在所述第一金属层和所述色阻层之间设置有第一绝缘层。
  12. 一种液晶显示面板，其包括：
    对置基板，与阵列基板相对设置；
    液晶层，位于所述对置基板和所述阵列基板之间；以及
    所述阵列基板，其包括：
    衬底基板；
    第一金属层，位于所述衬底基板上，包括多条所述数据线；
    色阻层，位于所述第一金属层上，所述色阻层包括多个彩膜色阻；其中相邻两个所述彩膜色阻之间间隔设置；
    黑色矩阵层，位于两个所述彩膜色阻之间，所述黑色矩阵层包括多个黑色矩阵；以及
    所述透明导电层，位于所述黑色矩阵层上。
  13. 根据权利要求12所述的液晶显示面板，其中
    所述阵列基板还包括屏蔽金属层，所述屏蔽金属层位于所述衬底基板和所述第一金属层之间，所述屏蔽金属层包括多条屏蔽金属线；
    相邻两个所述彩膜色阻之间的间距根据第一间距设置，所述第一间距为第一投影与第二投影之间的间距，所述第一投影为所述数据线在所述衬底基板上的投影；所述第二投影为与所述数据线相应的所述屏蔽金属线在所述衬底基板上的投影。
  14. 根据权利要求12所述的液晶显示面板，其中
    相邻两个所述彩膜色阻之间的间距为2-4微米。
  15. 根据权利要求12所述的液晶显示面板，其中
    所述黑色矩阵的厚度和所述彩膜色阻的厚度相等。
  16. 根据权利要求12所述的液晶显示面板，其中
    所述黑色矩阵用于遮挡所述数据线与相应的所述屏蔽金属线之间的间隙。
  17. 根据权利要求12所述的液晶显示面板，其中
    在所述第一金属层和所述色阻层之间设置有第一绝缘层。
  18. 根据权利要求12所述的液晶显示面板，其中
    在所述屏蔽金属层和所述第一金属层之间还设置有第二绝缘层。
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