WO2016143629A1 - 球状酸化亜鉛粒子、その製造方法及びそれを用いたプラズモンセンサーチップ - Google Patents
球状酸化亜鉛粒子、その製造方法及びそれを用いたプラズモンセンサーチップ Download PDFInfo
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- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
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Definitions
- the present invention relates to spherical zinc oxide particles, a production method thereof, and a plasmon sensor chip using the same.
- Optical measurement technology that uses evanescent light that totally reflects light on a metal thin film and oozes onto the reflective surface has been widely studied and applied.
- a sensor using an optical system that uses a thin film of gold, silver, or the like on the reflecting surface and causes surface plasmon resonance (abbreviated as SPR) by light is called an SPR sensor.
- the SPR sensor Since the nature of the object to be measured can be known from the wavelength at which this SPR phenomenon occurs, the SPR sensor is applied to immunosensors using the antigen-antibody reaction, detection of DNA, and detection of interactions between receptors and proteins. It's getting on.
- the metal thin film used for the sensor chip of the SPR sensor is generally a gold or silver thin film. In this case, light in the ultraviolet to visible light range is used for SPR.
- oxide semiconductors instead of metals. Since the oxide semiconductor has a wide band gap and the number of carriers can be arbitrarily controlled by the introduced dopant concentration, it can be used from the visible to the near infrared region, and can be used as an SPR sensor using infrared rays, which has been difficult in the past. In particular, it is expected to be applied to the bio field, such as a non-invasive blood sugar level sensor.
- zinc oxide (ZnO) doped with a small amount of metal is attracting attention from the viewpoint of practical use because it has high carrier mobility and carrier density, can easily control the measurement wavelength region, and can be expected to be highly sensitive. ing.
- a plasmon sensor using plasmon resonance on the particle surface by using particles having a small particle diameter instead of an SPR sensor using a metal thin film as a sensor chip is conceivable.
- the incident angle dependency is small, and stable measurement can be expected.
- Patent Document 1 discloses spherical zinc oxide particles having a high sphericity. However, since the particle size is large and the monodispersity is low, it is not suitable for use in a plasmon sensor.
- Patent Document 2 discloses spherical zinc oxide particles having a small particle size and high sphericity. However, the degree of monodispersity is low and it is not suitable for use in plasmon sensors. Therefore, spherical zinc oxide particles having a small particle size and excellent monodispersion that can efficiently perform plasmon resonance have been desired.
- the present invention has been made in view of the above-mentioned problems and situations, and its solution is to provide spherical zinc oxide particles having a particle diameter within a specific range and excellent in monodispersity and having high plasmon resonance intensity. It is. Another object of the present invention is to provide a manufacturing method and a plasmon sensor chip having high sensitivity and low angle dependency during measurement using the manufacturing method.
- the present inventors have doped a specific metal element and have a particle diameter in a specific range.
- the inventors have found that spherical zinc oxide particles having excellent monodispersity and high sphericity exhibit high plasmon resonance, and have reached the present invention.
- a metal element selected from the group consisting of gallium, europium, cerium, praseodymium, samarium, gadolinium, terbium, niobium and ytterbium is doped, the average particle size is in the range of 50 to 5000 nm, and the variation coefficient of the particle size distribution is 1 Spherical zinc oxide particles characterized by being in the range of 0.0 to 10%.
- a zinc-based compound precursor particle is formed by mixing an aqueous solution of a metal element selected from the group consisting of gallium, europium, cerium, praseodymium, samarium, gadolinium, terbium, niobium, and ytterbium, an aqueous zinc solution, and an aqueous urea solution. And a step of firing the zinc-based compound precursor particles to obtain spherical zinc oxide particles doped with the metal element.
- a metal element selected from the group consisting of gallium, europium, cerium, praseodymium, samarium, gadolinium, terbium, niobium, and ytterbium
- step of forming the zinc-based compound precursor particles adding at least one of the zinc aqueous solution, the metal element aqueous solution, and the urea aqueous solution to a reaction solution in the process of forming the zinc-based compound precursor particles.
- step of forming the zinc-based compound precursor particles adding at least one of the zinc aqueous solution, the metal element aqueous solution, and the urea aqueous solution to a reaction solution in the process of forming the zinc-based compound precursor particles.
- a plasmon sensor chip comprising the spherical zinc oxide particles according to any one of items 1 to 6 and a base material. 10. The plasmon sensor chip according to item 9, wherein the substrate has translucency and a refractive index thereof is in a range of 1.30 to 4.00.
- ⁇ is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
- the spherical zinc oxide particles of this embodiment are gallium (Ga), europium (Eu), cerium (Ce), praseodymium (Pr), samarium (Sm), gadolinium (Gd), terbium (Tb), niobium (Nd) and Spherical zinc oxide particles doped with a metal element selected from the group consisting of ytterbium (Yb), having an average particle size in the range of 50 to 5000 nm, and a coefficient of variation in particle size distribution in the range of 1 to 10% It is.
- the spherical zinc oxide particles have a relatively small average particle diameter and are excellent in monodispersibility. It is useful for realizing a plasmon sensor chip having high plasmon resonance intensity and small angle dependency.
- Spherical zinc oxide particles include gallium (Ga), europium (Eu), cerium (Ce), praseodymium (Pr), samarium (Sm), gadolinium (Gd), terbium (Tb), niobium (Nd) and ytterbium (Yb).
- the metal element to be doped is preferably Ga or Eu, and more preferably Ga. Moreover, you may include several types of said metal elements suitably from the objective. In addition, other metal atoms may be included as long as the expression of plasmon resonance is not impaired. Furthermore, other metal atoms may be contained within a range not impairing the expression of plasmon resonance.
- the total doping amount of the metal elements in the spherical zinc oxide particles is preferably in the range of 0.01 to 10.00 mol%. More preferably, it is in the range of 0.01 to 7.00 mol%.
- the content of the metal element contained in the spherical zinc oxide particles can be determined by elemental analysis.
- 1 g is dissolved in a mixed solution of 10 mL of nitric acid aqueous solution and 1.0 mL of hydrogen peroxide solution, and elemental analysis is performed using an ICP emission spectral plasma apparatus (ICP-AES) manufactured by SII Nano Technology.
- ICP-AES ICP emission spectral plasma apparatus manufactured by SII Nano Technology.
- the composition ratio (mol%) can be determined from the content of each metal element in the spherical zinc oxide particles.
- the composition distribution of the spherical zinc oxide particles may be obtained by performing an elemental analysis of the cross section of the spherical zinc oxide particles.
- a spherical zinc oxide particle is subjected to cross-section processing with a focused ion beam (FB-2000A) manufactured by Hitachi High-Technologies, and a surface passing through the vicinity of the particle center is cut out. From the cut surface, elemental analysis can be performed using STEM-EDX (HD-2000) manufactured by Hitachi High-Technologies to determine the composition distribution of each metal element in the spherical zinc oxide particles.
- FB-2000A focused ion beam
- HD-2000 manufactured by Hitachi High-Technologies
- the spherical zinc oxide particles of the present embodiment have an average particle size in the range of 50 to 5000 nm and a variation coefficient of particle size distribution in the range of 1.0 to 10%. By setting it as such a range, the absorption intensity in a plasmon resonance frequency can be raised.
- Sphere is defined based on a scanning micrograph (SEM image) of spherical zinc oxide particles. Specifically, a scanning micrograph is taken for the spherical zinc oxide particles, and 100 spherical zinc oxide particles are randomly selected. When the major axis of each selected particle is a and the minor axis is b, an average value of a / b values is obtained as an aspect ratio. In addition, when drawing a circumscribing rectangle for each particle (referred to as “the circumscribing rectangle”), the shortest short side of the circumscribed rectangle is the shortest length, and the longest long side is the length. Is the major axis.
- SEM image scanning micrograph
- the aspect ratio is in the range of 1.00 to 1.15, more preferably in the range of 1.00 to 1.05, it is classified as spherical. If it is outside the range of 1.00 to 1.15, it is classified as an indeterminate form. The closer the aspect ratio is to 1, the higher the sphericity.
- the average particle diameter of the spherical zinc oxide particles is in the range of 50 to 5000 nm. If it is less than 50 nm, aggregation or the like occurs during particle synthesis, which is not preferable. On the other hand, if it exceeds 5000 nm, the efficiency of plasmon resonance is deteriorated.
- the thickness is preferably in the range of 50 to 3000 nm, more preferably in the range of 80 to 2500 nm.
- the average particle diameter can be determined as an area circle equivalent particle diameter based on the area of a photographic image of 100 randomly selected spherical zinc oxide particles, which can be used as the average particle diameter.
- the variation coefficient of the particle size distribution of the spherical zinc oxide particles is in the range of 1.0 to 10%. If the variation coefficient of the particle size distribution exceeds 10%, it is not preferable because plasmon resonance cannot be performed efficiently. It is preferably 1.0 to 8.0%, more preferably 1.0 to 7.0%.
- the variation coefficient of the particle size distribution can be defined by the variation coefficient of the particle size distribution that can be obtained from a scanning micrograph (SEM image) of a predetermined number of spherical zinc oxide particles.
- the coefficient of variation (also referred to as “monodispersity”) of the particle size distribution can be obtained from an SEM image of 100 spherical zinc oxide particles, and the monodispersity can be evaluated.
- the variation coefficient of the particle size distribution is obtained by the following formula.
- Coefficient of variation (%) (standard deviation of particle size distribution / average particle size) ⁇ 100
- the measurement of the said particle diameter, distribution, etc. can be performed using an image processing measuring device (for example, Luzex AP; Nireco Corporation make).
- the method for producing spherical zinc oxide particles of the present embodiment includes gallium (Ga), europium (Eu), cerium (Ce), praseodymium (Pr), samarium (Sm), gadolinium (Gd), terbium (Tb), niobium (A step of mixing an aqueous solution of a metal element selected from the group consisting of Nd) and ytterbium (Yb), an aqueous zinc solution, and an aqueous urea solution to form zinc-based compound precursor particles, and the zinc-based compound precursor particles And a step of firing.
- Ga gallium
- Eu europium
- Ce cerium
- Pr praseodymium
- Sm samarium
- Gd gadolinium
- Tb terbium
- niobium A step of mixing an aqueous solution of a metal element selected from the group consisting of Nd) and ytterbium (Yb), an aqueous zinc
- the spherical zinc oxide particles are obtained by firing zinc compound precursor particles produced by mixing and heating a zinc aqueous solution, a metal element aqueous solution, and a urea aqueous solution.
- the method for producing spherical zinc oxide particles of the present embodiment includes a step of mixing a zinc aqueous solution, the metal element aqueous solution and a urea aqueous solution to form zinc-based compound precursor particles, and firing the zinc-based compound precursor particles.
- a step also referred to as a firing step
- raw material liquid preparation step desirably, as described below, “raw material liquid preparation step”, “step of forming zinc-based compound precursor particles”, “solid-liquid separation” It consists of four steps, “step” and “step of firing the zinc-based compound precursor particles”.
- the raw material solution preparation step is a step of preparing the raw material zinc aqueous solution, metal element aqueous solution, and urea aqueous solution.
- the urea aqueous solution preparation step is a step of preparing a urea aqueous solution having a predetermined concentration.
- ureas in addition to urea, salts of urea (eg, nitrates, hydrochlorides, etc.), N, N′-dimethylacetylurea, N, N′-dibenzoylurea, benzenesulfonylurea, p-toluenesulfonylurea, Examples thereof include trimethylurea, tetraethylurea, tetramethylurea, triphenylurea, tetraphenylurea, N-benzoylurea, methylisourea, ethylisourea, ammonium carbonate, and ammonium bicarbonate.
- ureas act as a precipitating agent, and when zinc oxide aqueous solution and metal element aqueous solution are mixed with water and heated, zinc-based compound precursor particles are formed as basic carbonates.
- urea is preferable in that it gradually hydrolyzes to form a precipitate slowly and a uniform precipitate is obtained.
- the urea aqueous solution is an aqueous solution containing urea. What is necessary is just to mix and prepare the said ureas and water. If necessary, an additive such as a pH adjusting agent may be added.
- the concentration of the aqueous urea solution is not particularly limited, but is preferably in the range of 0.01 to 10.00 mol / L. Preferably, it is in the range of 0.10 to 5.00 mol / L.
- the metal element aqueous solution preparation process includes gallium (Ga), europium (Eu), cerium (Ce), praseodymium (Pr), samarium (Sm), gadolinium (Gd), terbium (Tb), niobium (Nd), and ytterbium (Yb).
- Ga gallium
- Eu europium
- Ce cerium
- Pr praseodymium
- Sm samarium
- Gd gadolinium
- Tb terbium
- Nd niobium
- Yb ytterbium
- salts of these elements that can be used for preparing an aqueous solution of these metals, nitrates, hydrochlorides, sulfates, and the like can be used, but it is preferable to use nitrates. Thereby, spherical zinc oxide particles with few impurities can be manufactured.
- the ion concentration of the aqueous metal element solution in the aqueous solution is not particularly limited, but is preferably in the range of 0.00001 to 5.00 mol / L. More preferably, it is in the range of 0.0001 to 3.00 mol / L.
- the metal element aqueous solution may contain one or more of the above metals.
- the zinc aqueous solution preparation step is a step of preparing an aqueous solution containing zinc element.
- a zinc salt that can be used to prepare an aqueous solution containing elemental zinc nitrates, hydrochlorides, sulfates, and the like can be used, but it is preferable to use nitrates. Thereby, spherical zinc oxide particles with few impurities can be manufactured.
- the ion concentration of the aqueous zinc solution is not particularly limited, but is preferably in the range of 0.0001 to 10.00 mol / L. More preferably, it is in the range of 0.001 to 5.00 mol / L.
- Step of forming zinc-based compound precursor particles The step of forming zinc-based compound precursor particles (hereinafter also referred to as precursor particle forming step) is performed by mixing a zinc aqueous solution, a metal element aqueous solution, and a urea aqueous solution to form a zinc-based compound. This is a step of forming compound precursor particles.
- the zinc-based compound precursor particles may be formed by first mixing a zinc aqueous solution, a metal element aqueous solution, and a urea aqueous solution. You may add at least any one of zinc aqueous solution, the said metal element aqueous solution, and the said urea aqueous solution in the reaction liquid in the middle of formation of zinc type compound precursor particle
- spherical zinc oxide particles having a particle diameter within a specific range and excellent in monodispersity and high plasmon resonance intensity are obtained by the method for producing spherical zinc oxide particles of the present embodiment.
- the presence of ureas may cause the ureas to decompose gradually and uniformly to produce zinc basic carbonate uniformly. Therefore, it is considered that spherical zinc oxide particles having a uniform particle size distribution are generated.
- spherical zinc oxide particles are produced through basic carbonates, the basic carbonates may remain in the particles.
- the first reaction solution is preferably a mixture of a zinc aqueous solution and a urea aqueous solution.
- the reaction liquid refers to a liquid in which a urea aqueous solution and at least one of a zinc aqueous solution and a metal element aqueous solution are mixed.
- the temperature of the reaction solution is preferably a temperature at which ureas can be hydrolyzed.
- the temperature of the reaction solution is in the range of 75 to 100 ° C., preferably 80 to 100 ° C., more preferably 90 to 100 ° C.
- the aqueous solution to be added may be any of an aqueous zinc solution, an aqueous metal element solution, and an aqueous urea solution.
- a plurality of aqueous solutions may be added.
- the position of the metal element in the zinc compound precursor particles can be controlled by adding the metal element aqueous solution to the reaction solution in the middle of the formation of the zinc compound precursor particles in which the zinc aqueous solution and the urea aqueous solution are mixed. .
- a zinc aqueous solution, a metal element aqueous solution, and a urea aqueous solution may be mixed and the aqueous urea solution added to the reaction solution in the process of forming the zinc-based compound precursor particles.
- a urea aqueous solution as a raw material, spherical zinc-based compound precursor particles excellent in monodispersion while maintaining the particle size distribution can be obtained.
- the rate of addition is preferably in the range of 0.00001 to 1.00 mol / min with respect to 1 L of the reaction solution. More preferably, it is in the range of 0.0001 to 0.50 mol.
- the addition time is preferably 30 to 240 minutes. More preferably, it is within the range of 60 to 180 minutes.
- the total doping amount of the metal element in the spherical zinc oxide particles may be considered as the ratio of zinc to metal element in the zinc compound precursor particles, it can be easily changed by changing the ratio of the zinc aqueous solution to be added and the metal element aqueous solution. Can be adjusted to.
- stirring time is preferably within a range of 30 minutes to 10 hours, and particularly preferably within a range of 1 to 3 hours.
- heating temperature and stirring time can be suitably adjusted according to the target particle diameter.
- the shape of the stirrer is not particularly limited, but in order to obtain higher stirring efficiency. It is preferable to use a rotor-stator type stirrer.
- Solid-liquid separation step After heating and stirring, solid-liquid separation is performed to separate the produced precipitate (precursor of spherical zinc oxide particle fine particles) from the solution.
- the solid-liquid separation method may be a general method.
- a precursor of spherical zinc oxide particles can be obtained by filtration using a filter or the like.
- the step of firing involves firing the precursor of spherical zinc oxide particles obtained by the solid-liquid separation step at 200 ° C. or higher in air or in an oxidizing atmosphere.
- the precursor of the fired spherical zinc oxide particles becomes an oxide, and becomes spherical zinc oxide particles containing a metal element.
- the firing temperature is in the range of 300-600 ° C.
- the spherical zinc oxide particles After cooling through the firing step, the spherical zinc oxide particles can be recovered and then recovered.
- spherical zinc oxide particles having a high degree of sphericity that hardly contain anisotropically grown spherical zinc oxide particles can be obtained.
- the plasmon sensor chip of the present embodiment has the spherical zinc oxide particles and the base material described above. Spherical zinc oxide particles are used as a chip that generates plasmon resonance in a plasmon sensor.
- FIG. 1 is an example of a plasmon sensor using a plasmon sensor chip.
- the plasmon sensor 1 includes a plasmon sensor chip 4 including a base 2 and a layer 3 containing spherical zinc oxide particles thereon, and a surface of the base 2 opposite to the layer 3 containing spherical zinc oxide particles.
- the optical prism 5 is closely attached.
- a test object 9 is fixed by a mounting portion 8.
- Near-infrared light irradiated from the light source 6 is polarized through the polarizing plate 7 and irradiated to the transparent substrate 2 through the optical prism 5.
- Incident light is incident at an incident angle ⁇ 1 under the condition of total reflection.
- Localized plasmon resonance appears at a certain wavelength by the evanescent wave that oozes out to the surface side of the spherical zinc oxide particles of the incident light. This is performed with infrared light having different wavelengths.
- the evanescent wave is absorbed by the surface plasmon, so that the reflection intensity is significantly reduced.
- the functional group in the molecule of the test object can be quantified from this resonance frequency.
- the amount of reflected light reflected at the reflection angle ⁇ 2 is measured by the light receiving unit 10.
- the plasmon sensor of the present embodiment by using spherical zinc oxide particles having excellent monodispersity and high sphericity, the difference in surface state between the respective particles is reduced, so that the angle dependency is suppressed and easy. It is considered that surface plasmon resonance can be caused accurately.
- the base material used for the plasmon sensor chip has translucency, and in particular, it is preferably transparent from the visible light to the infrared region and has a high refractive index.
- the refractive index of the substrate is preferably in the range of 1.30 to 4.00. More preferably, it is 1.40 to 3.00.
- glass and resin are preferably used.
- resin films can be used as the resin base material.
- resin films cellulose ester film, polyester film, polycarbonate film, polyarylate film, polysulfone (including polyethersulfone) film, polyethylene terephthalate, polyethylene naphthalate polyester film, polyethylene film, polypropylene film, cellophane, Cellulose diacetate film, cellulose triacetate film, cellulose acetate propionate film, cellulose acetate butyrate film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene vinyl alcohol film, syndiotactic polystyrene film, polycarbonate film, norbornene resin film , Polymethylpentenef Can Lum, polyether ketone film, polyether ketone imide film, a polyamide film, a fluororesin film, a nylon film, polymethyl methacrylate film, and acrylic films.
- polyester films such as polyethylene terephthalate, norbornene resin films, cellulose ester films, and acrylic films are preferable. It is particularly preferable to use a polyester film such as polyethylene terephthalate or an acrylic film.
- the resin film may be a film manufactured by melt casting film formation or a film manufactured by solution casting film formation.
- the thickness of the base material is preferably in the range of 0.001 to 10 mm, for example.
- a dispersion medium such as water or an aqueous solvent such as alcohol in which spherical zinc oxide particles are dispersed
- the thickness of the layer containing spherical zinc oxide particles is preferably in the range of 50 nm to 50 ⁇ m for the reason of high efficiency of plasmon resonance. More preferably, it is in the range of 50 nm to 10 ⁇ m.
- Preparation of zinc oxide particles 5-12 In the production of the zinc oxide particles 1, the gallium nitrate aqueous solution is changed to the same concentration europium nitrate aqueous solution, cerium nitrate aqueous solution, praseodymium nitrate aqueous solution, samarium nitrate aqueous solution, gadolinium nitrate aqueous solution, terbium nitrate aqueous solution, neodymium nitrate aqueous solution or ytterbium nitrate aqueous solution. Otherwise, zinc oxide particles 5 to 12 were prepared in the same manner as the preparation of zinc oxide particles 1.
- the ZnO target was irradiated with ArF excimer laser light (5 Hz pulse laser, energy density of about 1 J / cm 2 ), and the film formation rate was 4 nm / min. Filmed.
- Preparation of zinc oxide particles 18 Repulp 600g of fine zinc oxide and 138g of gallium oxide into water, mix 3.50% by mass of dispersant (poise 532A manufactured by Kao Corporation) with respect to the mass of fine zinc oxide, and mix 0.61% by mass of acetic acid. A slurry is prepared so that becomes 600 g / L. Next, the slurry is spray-dried to obtain granulated particles. This was placed in a mortar made of mullite, mullite, cordierite or the like and baked at 1150 ° C. for 3 hours.
- ⁇ Average particle size, particle size variation coefficient (CV value)> The average particle size and the coefficient of variation of the particle size distribution were determined from a scanning micrograph (SEM image) of 100 particles. For 100 particles, the diameter of a circle having the same area as the photographed particle image was measured, and the average particle diameter of the particles was determined.
- the particle size distribution variation coefficient was determined by the following formula.
- Coefficient of variation (%) (standard deviation of particle size distribution / average particle size) ⁇ 100 ⁇ Plasmon strength evaluation>
- plasmon intensity evaluation an infrared sensor was prepared, and the incident light angle dependency of the plasmon intensity and the plasmon intensity was evaluated.
- ⁇ Dependence on incident light angle> Using an ellipsometer, infrared light was incident on the sample water, and the reflected light intensity was measured. In the arrangement shown in FIG. 1, irradiation was performed at an incident light wavelength of 1500 nm using an ellipsometer (VASE manufactured by JA Woollam Japan). Two incident polarized lights were irradiated at an incident angle ⁇ 1 of 43 ° and 46 °, and the following evaluation criteria were used. The reflection angle ⁇ 2 was fixed at 43 °. ⁇ : The spectrum could be measured at two incident angles. X: The spectrum could be measured only at one incident angle.
- the spectrum could be measured when the peak with a reflectance of 5% or more was recognized.
- ⁇ Evaluation of plasmon resonance intensity> The plasmon resonance spectrum of water was measured using an FT-IR apparatus (FTIR-6000 manufactured by JASCO Corporation), and the absorption value at a wavelength of 1500 nm, which is the absorption of OH groups of water molecules, was determined. As for the numerical value of the table, 1.00 is the maximum, and a large value indicates that the plasmon resonance intensity is high.
- Table 1 the particle diameter variation coefficient is abbreviated as variation coefficient.
- the column of additional addition indicates whether or not the zinc aqueous solution, the metal element aqueous solution, and the urea aqueous solution are added to the reaction solution in the step of forming the zinc-based compound precursor particles.
- Table 1 shows that the zinc oxide particles 1 to 13 have a higher sphericity, a smaller average particle diameter, and a smaller variation coefficient than the zinc oxide particles 14 to 18. It can also be seen that the plasmon sensor chip has high plasmon resonance intensity and little angle dependency of the incident angle.
- the SEM image of the obtained zinc oxide particle number 3 is shown in FIG. It can be seen that the spherical zinc oxide particles have a high sphericity, a small average particle size and a small coefficient of variation.
Abstract
Description
7.ガリウム、ユーロピウム、セリウム、プラセオジム、サマリウム、ガドリニウム、テルビウム、ニオブ及びイッテルビウムからなる群より選ばれる金属元素の水溶液と、亜鉛水溶液と、尿素類水溶液とを混合して亜鉛系化合物前駆体粒子を形成する工程と、前記亜鉛系化合物前駆体粒子を焼成する工程とを有し、前記金属元素がドープされた球状酸化亜鉛粒子を得ることを特徴とする球状酸化亜鉛粒子の製造方法。
10.前記基材が、透光性を有しており、その屈折率が1.30~4.00の範囲内であることを特徴とする第9項に記載のプラズモンセンサーチップ。
本実施形態の球状酸化亜鉛粒子は、ガリウム(Ga)、ユーロピウム(Eu)、セリウム(Ce)、プラセオジム(Pr)、サマリウム(Sm)、ガドリニウム(Gd)、テルビウム(Tb)、ニオブ(Nd)及びイッテルビウム(Yb)からなる群より選ばれる金属元素がドープされ、その平均粒子径が50~5000nmの範囲内であり、粒子径分布の変動係数が1~10%の範囲内である球状酸化亜鉛粒子である。この球状酸化亜鉛粒子は、比較的小さな平均粒子径を有しており、かつ、単分散性に優れている。そして、プラズモン共鳴強度が高く、角度依存性の小さいプラズモンセンサーチップの実現に有用である。
球状酸化亜鉛粒子は、ガリウム(Ga)、ユーロピウム(Eu)、セリウム(Ce)、プラセオジム(Pr)、サマリウム(Sm)、ガドリニウム(Gd)、テルビウム(Tb)、ニオブ(Nd)及びイッテルビウム(Yb)からなる群より選ばれる金属元素をドープした球状酸化亜鉛粒子である。金属を用いたSPRセンサーとは異なり、バンドギャップが大きい半導体である酸化亜鉛にこのような金属元素をドープすることにより、キャリア数を制御することができ、可視から赤外領域にわたるプラズモン共鳴波長の制御を可能とすることができる。このような制御は、ドープする金属元素の種類及びその含有量などで行うことができる。
本実施形態の球状酸化亜鉛粒子は、平均粒子径が、50~5000nmの範囲内であり、粒子径分布の変動係数が1.0~10%の範囲内である。このような範囲とすることで、プラズモン共鳴周波数における吸収強度を高めることができる。
なお、上記粒子径、分布等の測定は、画像処理測定装置(例えば、ルーゼックス AP;株式会社ニレコ製)を用いて行うことができる。
本実施形態の球状酸化亜鉛粒子の製造方法は、ガリウム(Ga)、ユーロピウム(Eu)、セリウム(Ce)、プラセオジム(Pr)、サマリウム(Sm)、ガドリニウム(Gd)、テルビウム(Tb)、ニオブ(Nd)及びイッテルビウム(Yb)からなる群より選ばれる金属元素の水溶液と、亜鉛水溶液と、尿素類水溶液とを混合して亜鉛系化合物前駆体粒子を形成する工程と、前記亜鉛系化合物前駆体粒子を焼成する工程とを有することを特徴とする。
原料液調製工程は、原料である亜鉛水溶液と金属元素水溶液と尿素類水溶液とを調製する工程である。
尿素類水溶液調製工程は、所定の濃度の尿素類水溶液を調製する工程である。
金属元素水溶液調製工程は、ガリウム(Ga)、ユーロピウム(Eu)、セリウム(Ce)、プラセオジム(Pr)、サマリウム(Sm)、ガドリニウム(Gd)、テルビウム(Tb)、ニオブ(Nd)及びイッテルビウム(Yb)からなる群より選ばれる金属元素を含有する水溶液である、金属元素水溶液を調製する工程である。
亜鉛水溶液調製工程は、亜鉛元素を含有する水溶液を調製する工程である。亜鉛元素を含有する水溶液を調製するために用いることができる亜鉛の塩として、硝酸塩、塩酸塩、硫酸塩等を用いることができるが、硝酸塩を使用することが好ましい。これにより、不純物の少ない球状酸化亜鉛粒子を製造することができる。
亜鉛系化合物前駆体粒子を形成する工程(以下前駆体粒子形成工程ともいう。)は、亜鉛水溶液と金属元素水溶液と尿素類水溶液とを混合して亜鉛系化合物前駆体粒子を形成する工程である。
加熱・撹拌した後、生成した沈殿(球状酸化亜鉛粒子微粒子の前駆体)を溶液と分離する固液分離を行う。固液分離の方法は、一般的な方法でよく、例えば、フィルター等を使用して濾過により球状酸化亜鉛粒子の前駆体を得ることができる。
焼成する工程(焼成工程ともいう。)は、固液分離工程により得られた球状酸化亜鉛粒子の前駆体を空気中又は酸化性雰囲気中で、200℃以上で焼成する。焼成された球状酸化亜鉛粒子の前駆体は、酸化物となり、金属元素を含有する球状酸化亜鉛粒子となる。好ましくは、焼成温度は300~600℃の範囲内である。
本実施形態のプラズモンセンサーチップは、上述した球状酸化亜鉛粒子及び基材を有する。球状酸化亜鉛粒子は、プラズモンセンサーにおいて、プラズモン共鳴を生じるチップとして用いられる。
プラズモンセンサーチップに用いられる基材は透光性を有しており、特に、可視光から赤外領域に透明で高屈折率であることが好ましい。基材の屈折率は、1.30~4.00の範囲内であることが好ましい。より好ましくは1.40~3.00である。例えば、ガラス、樹脂が好ましく用いられる。
球状酸化亜鉛粒子を含有した層を基材上に形成する形成方法は種々な方法をとりうる。例えば、スプレーコーティング、インクジェットコーティング、ディスペンサーコーティング、スリットコーティング、ロールコーティング、スピンコーティング、ディップコーティングなどを用いることができる。また、球状酸化亜鉛粒子を含有する層を形成するに当たっては、水、アルコール等の水系溶媒などの分散媒に球状酸化亜鉛粒子を分散させたものを用いてコーティングを行い、塗布後に乾燥を行って分散媒を除去することが好ましい。
(1) 2.10mol/Lの尿素水溶液を1.00L用意した。
(2) 0.10mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.90mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を90℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、1時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子1を得た。
(1) 2.10mol/Lの尿素水溶液を1.0L用意した。
(2) 0.0001mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 1.00mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を90℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、1時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子2を得た。
(1) 2.10mol/Lの尿素水溶液を1.0L用意した。
(2) 0.07mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.93mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を90℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、1時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子3を得た。
(1) 2.10mol/Lの尿素水溶液を1.0L用意した。
(2) 0.05mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.95mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を90℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、1時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子4を得た。
酸化亜鉛粒子1の作製において、硝酸ガリウム水溶液を、それぞれ同濃度の硝酸ユーロピウム水溶液、硝酸セリウム水溶液、硝酸プラセオジム水溶液、硝酸サマリウム水溶液、硝酸ガドリニウム水溶液、硝酸テルビウム水溶液、硝酸ネオジム水溶液又は硝酸イッテルビウム水溶液に変えて、その他は酸化亜鉛粒子1の作製と同様にして酸化亜鉛粒子5~12を作製した。
(1) 2.10mol/Lの尿素水溶液を1.0L用意した。
(2) 0.073mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.97mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液に、(1)で調製した尿素と(2)で調製した硝酸ガリウム水溶液を添加し、90℃まで加熱した。
(5) 上記(4)の分散溶液に、あらかじめ混合しておいた0.035mol/Lの硝酸ガリウム水溶液600mLと0.50mol/Lの硝酸亜鉛水溶液600mLの混合液を10mL/minの添加速度で、90℃で加熱撹拌しながら添加した。
(6) 添加終了後、上記(5)で加熱撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子13を得た。
(1) ターゲットとして、Gaを10mol%含んだZnO粉末を約200kg/cm2でプレス成形した後、1000℃の温度で24時間焼成した焼成ZnOを用意した。
(2) ガラス基材を中性洗剤、純水、アセトンの順で超音波洗浄した。
(3) ZnOターゲットを成膜室内に配置し、ガラス基材をZnOターゲットに平行に向かい合せて配置した。ZnOターゲットと基材の距離は30mmとした。
(4) 成膜室内を1×10-6Torrまで真空排気した後、酸素ガスを5×10-4Torrになるまで成膜室内に供給した。
(5) ガラス基材をヒータにて500℃まで加熱した後、ArFエキシマレーザ光(5Hzパルスレーザ、エネルギー密度が約1J/cm2)をZnOターゲットに照射し、成膜速度4nm/分で成膜した。
(1) 1.40mol/Lの尿素水溶液を1.0L用意した。
(2) 0.10mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.90mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を90℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、3時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子15を得た。
(1) 1.40mol/Lの尿素水溶液を1.0L用意した。
(2) 0.10mol/Lの硝酸ガリウム水溶液を500mL用意した。
(3) 0.90mol/Lの硝酸亜鉛水溶液500mLに純水を加えて8.5Lとした。
(4) 上記(3)で調製した硝酸亜鉛水溶液を78℃まで加熱した。
(5) 上記(4)で加熱した硝酸亜鉛水溶液に、(1)で用意した尿素水溶液と(2)で用意した硝酸ガリウム水溶液を添加し、3時間加熱・撹拌した。
(6) 上記(5)で加熱・撹拌した混合液中に析出した粒子の前駆体をメンブランフィルターで分離した。
(7) 上記(6)で分離した粒子の前駆体を400℃で焼成して酸化亜鉛粒子16を得た。
硝酸亜鉛6水和物14.87gに水を加え、全量が500mLになるように溶解した。その溶液に、硝酸ガリウム水和物1.28gを加え溶解した。さらにエチレングリコール250gを添加した後、トリエタノールアミン62.5gを加え撹拌した。その後、2℃/分の昇温速度にて90℃にまで加温し、90℃に到達してから1時間90℃を保持した。その後、水洗、ろ過、乾燥を行い、一次粒子径が10nmで、球状に集積した状態で、300nmの球状粉体を得た。その後、400℃にて2時間焼成を行い、球状粉体の酸化亜鉛粒子17を得た。
微細酸化亜鉛600gと酸化ガリウム138gを水にリパルプし、微細酸化亜鉛の質量に対し分散剤(花王社製 ポイズ532A)3.50質量%を混合し、酢酸0.61質量%を混合して濃度が600g/Lとなるスラリーを調製する。次に、このスラリーを噴霧乾燥することにより造粒粒子を得る。これをムライト製、ムライト・コージライト製等の匣鉢に入れ1150℃で3時間静置焼成した。これを冷却後、1.0リットルの水に分散後、200メッシュ(目開き75μm)の篩を通過させ、通過したスラリーをろ過、乾燥することにより、球状かつ平均粒子径が33.1μmの酸化亜鉛粒子18を得た。
球状酸化亜鉛粒子の評価として、平均粒子径、粒子径変動係数(CV値)及びプラズモン強度評価を行った。
粒子100個の走査型顕微鏡写真(SEM像)から平均粒子径及び粒子径分布の変動係数を求めた。100個の粒子について、撮影した粒子画像と等しい面積を有する円の直径を測長し、粒子の平均粒子径を求めた。
〈プラズモン強度評価〉
プラズモン強度評価は、赤外線センサーを作製し、プラズモン強度とプラズモン強度の入射光角度依存性を評価した。
エリプソメーターを用い、サンプルの水に赤外光を入射し、その反射光強度を測定した。図1の配置にて、エリプソメーター(ジェー・エー・ウーラム・ジャパン社製 VASE)を使用して、入射光波長1500nmにて照射した。入射角θ1として43°と46°で二つの偏光を照射して以下の評価基準で評価した。反射角θ2は43°に固定した。○:二つの入射角でスペクトルを測定できた。
×:一つの入射角でしかスペクトルを測定できなかった。
FT-IR装置(日本分光社製 FTIR-6000)を用いて水のプラズモン共鳴スペクトルを測定し、水分子のOH基の吸収である波長1500nmの吸収値を求めた。表の数値は1.00が最大で、大きい値であることがプラズモン共鳴強度が高いことを示している。
2 基材
3 球状酸化亜鉛粒子を含有した層
4 プラズモンセンサーチップ
5 光学プリズム
6 光源
7 偏光板
8 取付け部
9 被検物
10 受光部
θ1 入射角
θ2 反射角
Claims (10)
- ガリウム、ユーロピウム、セリウム、プラセオジム、サマリウム、ガドリニウム、テルビウム、ニオブ及びイッテルビウムからなる群より選ばれる金属元素がドープされ、平均粒子径が50~5000nmの範囲内であり、粒子径分布の変動係数が1.0~10%の範囲内であることを特徴とする球状酸化亜鉛粒子。
- 前記球状酸化亜鉛粒子中の前記金属元素の総ドープ量が、0.01~10.00モル%の範囲内であることを特徴とする請求項1に記載の球状酸化亜鉛粒子。
- 前記球状酸化亜鉛粒子中の前記金属元素の総ドープ量が、0.01~7.00モル%の範囲内であることを特徴とする請求項1に記載の球状酸化亜鉛粒子。
- 前記球状酸化亜鉛粒子の平均アスペクト比が、1.00~1.15の範囲内であることを特徴とする請求項1から請求項3までのいずれか一項に記載の球状酸化亜鉛粒子。
- 前記金属元素が、ガリウムであることを特徴とする請求項1から請求項4までのいずれか一項に記載の球状酸化亜鉛粒子。
- 前記粒子径分布の変動係数が1.0~8.0%の範囲内であることを特徴とする請求項1から請求項5までのいずれか一項に記載の球状酸化亜鉛粒子。
- ガリウム、ユーロピウム、セリウム、プラセオジム、サマリウム、ガドリニウム、テルビウム、ニオブ及びイッテルビウムからなる群より選ばれる金属元素の水溶液と、亜鉛水溶液と、尿素類水溶液とを混合して亜鉛系化合物前駆体粒子を形成する工程と、前記亜鉛系化合物前駆体粒子を焼成する工程とを有し、前記金属元素がドープされた球状酸化亜鉛粒子を得ることを特徴とする球状酸化亜鉛粒子の製造方法。
- 前記亜鉛系化合物前駆体粒子を形成する工程において、前記亜鉛水溶液と前記金属元素水溶液と前記尿素類水溶液の少なくともいずれかを前記亜鉛系化合物前駆体粒子の形成途中の反応液中に添加することを特徴とする請求項7に記載の球状酸化亜鉛粒子の製造方法。
- 請求項1から請求項6までのいずれか一項に記載の球状酸化亜鉛粒子及び基材を有することを特徴とするプラズモンセンサーチップ。
- 前記基材が、透光性を有しており、その屈折率が1.30~4.00の範囲内であることを特徴とする請求項9に記載のプラズモンセンサーチップ。
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180044276A (ko) * | 2015-08-28 | 2018-05-02 | 스미토모 오사카 세멘토 가부시키가이샤 | 산화 아연 분체, 분산액, 조성물, 및 화장료 |
JP2018105665A (ja) * | 2016-12-26 | 2018-07-05 | コニカミノルタ株式会社 | 歪センサー及び歪量測定方法 |
CN114956149A (zh) * | 2022-06-23 | 2022-08-30 | 包头稀土研究院 | 氧化镨钕球形颗粒的制备方法 |
Families Citing this family (1)
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---|---|---|---|---|
CN112110475B (zh) * | 2020-09-24 | 2022-06-21 | 安徽省含山县锦华氧化锌厂 | 一种采用膏状前驱体制备氧化锌的生产工艺 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0769631A (ja) * | 1993-06-29 | 1995-03-14 | Sumitomo Chem Co Ltd | 薄片状導電性酸化亜鉛及びその製造方法 |
JP2005263612A (ja) * | 2004-02-18 | 2005-09-29 | Nippon Shokubai Co Ltd | 金属酸化物粒子およびその用途 |
JP2009184885A (ja) * | 2008-02-07 | 2009-08-20 | National Institute Of Advanced Industrial & Technology | コアシェル型酸化亜鉛微粒子又はそれを含有する分散液、それらの製造方法及び用途 |
JP2013234080A (ja) * | 2012-05-07 | 2013-11-21 | Sekisui Chem Co Ltd | 金属酸化物粒子の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4808398A (en) * | 1985-02-14 | 1989-02-28 | The Dow Chemical Company | Narrow size distribution zinc oxide |
DE10235758A1 (de) * | 2002-08-05 | 2004-02-26 | Degussa Ag | Dotiertes Zinkoxidpulver, Verfahren zu seiner Herstellung und Verwendung |
TWI402864B (zh) * | 2008-07-11 | 2013-07-21 | Sfi Electronics Technology Inc | 一種氧化鋅變阻器的製法 |
-
2016
- 2016-03-02 WO PCT/JP2016/056405 patent/WO2016143629A1/ja active Application Filing
- 2016-03-02 US US15/555,837 patent/US20180044198A1/en not_active Abandoned
- 2016-03-02 JP JP2017505005A patent/JPWO2016143629A1/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0769631A (ja) * | 1993-06-29 | 1995-03-14 | Sumitomo Chem Co Ltd | 薄片状導電性酸化亜鉛及びその製造方法 |
JP2005263612A (ja) * | 2004-02-18 | 2005-09-29 | Nippon Shokubai Co Ltd | 金属酸化物粒子およびその用途 |
JP2009184885A (ja) * | 2008-02-07 | 2009-08-20 | National Institute Of Advanced Industrial & Technology | コアシェル型酸化亜鉛微粒子又はそれを含有する分散液、それらの製造方法及び用途 |
JP2013234080A (ja) * | 2012-05-07 | 2013-11-21 | Sekisui Chem Co Ltd | 金属酸化物粒子の製造方法 |
Non-Patent Citations (2)
Title |
---|
LIU, JIA: "Investigation of aluminum-gallium co- doped zinc oxide targets for sputtering thin film and photovoltaic application", JOURNAL OF ALLOYS AND COMPOUNDS, vol. 575, 2013, pages 174 - 182, XP028676925 * |
YANG, JINGHAI ET AL.: "Effects of mineralizing agent on the morphologies and photoluminescence properties of Eu3+-doped ZnO nanomaterials", JOURNAL OF ALLOYS AND COMPOUNDS, vol. 509, no. 41, 2011, pages 10025 - 10031, XP028296134 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180044276A (ko) * | 2015-08-28 | 2018-05-02 | 스미토모 오사카 세멘토 가부시키가이샤 | 산화 아연 분체, 분산액, 조성물, 및 화장료 |
JPWO2017038635A1 (ja) * | 2015-08-28 | 2018-06-14 | 住友大阪セメント株式会社 | 酸化亜鉛粉体、分散液、組成物、及び化粧料 |
EP3342755A4 (en) * | 2015-08-28 | 2019-05-01 | Sumitomo Osaka Cement Co., Ltd. | ZINC OXIDE POWDER, DISPERSION, COMPOSITION, AND COSMETIC PRODUCT |
US11497695B2 (en) | 2015-08-28 | 2022-11-15 | Sumitomo Osaka Cement Co., Ltd. | Zinc oxide powder, dispersion, composition, and cosmetic |
KR102547489B1 (ko) | 2015-08-28 | 2023-06-23 | 스미토모 오사카 세멘토 가부시키가이샤 | 산화 아연 분체, 분산액, 조성물, 및 화장료 |
JP2018105665A (ja) * | 2016-12-26 | 2018-07-05 | コニカミノルタ株式会社 | 歪センサー及び歪量測定方法 |
CN114956149A (zh) * | 2022-06-23 | 2022-08-30 | 包头稀土研究院 | 氧化镨钕球形颗粒的制备方法 |
CN114956149B (zh) * | 2022-06-23 | 2024-01-23 | 包头稀土研究院 | 氧化镨钕球形颗粒的制备方法 |
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