WO2016019660A1 - 具有触摸功能的显示器件及其制作方法、显示装置 - Google Patents

具有触摸功能的显示器件及其制作方法、显示装置 Download PDF

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Publication number
WO2016019660A1
WO2016019660A1 PCT/CN2014/092696 CN2014092696W WO2016019660A1 WO 2016019660 A1 WO2016019660 A1 WO 2016019660A1 CN 2014092696 W CN2014092696 W CN 2014092696W WO 2016019660 A1 WO2016019660 A1 WO 2016019660A1
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Prior art keywords
electrode
substrate
array substrate
display device
layer
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PCT/CN2014/092696
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English (en)
French (fr)
Inventor
卢永春
乔勇
程鸿飞
先建波
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京东方科技集团股份有限公司
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Priority to US14/774,902 priority Critical patent/US20160202563A1/en
Publication of WO2016019660A1 publication Critical patent/WO2016019660A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • Embodiments of the present invention relate to a display device having a touch function, a method of fabricating the same, and a display device.
  • Touch screen also known as "touch screen” is the most simple, convenient and natural way of human-computer interaction.
  • LCD touch screen displays included a touch panel and a display panel, and the touch panel and the display panel were separate.
  • the usual liquid crystal touch display screen generally integrates the touch panel and the liquid crystal display panel, which includes an "In-cell” liquid crystal touch display screen and an "On-cell” liquid crystal touch display screen.
  • the liquid crystal touch display screen includes a plurality of first electrodes 11 arranged along the first direction 101 and a plurality of second electrodes 21 arranged along the second direction 102.
  • an insulating layer 12 is provided between the first electrode 11 and the second electrode 21 for insulating the first electrode 11 and the second electrode 21.
  • FIG. 3 taking the capacitive touch panel as an example, when the finger 30 touches the screen, the capacitances of the first electrode 11 and the second electrode 21 at the touch position may change, so that the touch position can be detected and the touch is realized.
  • the first electrode and the second electrode of the liquid crystal touch display panel are generally formed using a transparent conductive oxide (TOC), for example, ITO (indium tin oxide) is used to form the first electrode and the second electrode.
  • TOC transparent conductive oxide
  • ITO indium tin oxide
  • the resistance value of the ITO film is too large, so the touch response rate is slow and easy to generate heat, and the power consumption is large.
  • Embodiments of the present invention provide a display device having a touch function, a method of fabricating the same, and a display device.
  • At least one embodiment of the present invention provides a display device having a touch function including an array substrate and a counter substrate of a pair of cassettes, and a display function layer between the array substrate and the opposite substrate.
  • the material of the first electrode and/or the second electrode comprises a topological insulator, the first electrode and/or the second electrode have a two-dimensional nanostructure, and the two-dimensional nanostructure formed by the topological insulator
  • An electrode and/or a second electrode are adhered to the array substrate and/or the opposite substrate by an adhesive layer.
  • An embodiment of the present invention further provides a method for fabricating a display device having a touch function, comprising: forming a first electrode pattern and/or a second electrode pattern of a two-dimensional nanostructure by using a topological insulator; forming an array substrate and a counter substrate Included, the first electrode pattern and/or the second electrode pattern are adhered to the first substrate of the array substrate and/or the second substrate of the opposite substrate through an adhesive layer to be in the array A first electrode and a second electrode that are not in contact with each other are formed on the substrate and/or the opposite substrate.
  • the first electrode and the second electrode are respectively a driving electrode and a sensing electrode; a display function layer is filled between the array substrate and the opposite substrate; and the array substrate and the opposite substrate are paired .
  • the embodiment of the invention further provides a display device, which comprises the display device with touch function according to any one of the embodiments of the invention.
  • 1 is a schematic view of a first electrode and a second electrode of a touch panel
  • FIG. 2 is a schematic cross-sectional view of the touch panel of FIG. 1;
  • FIG. 3 is a schematic diagram of a touch principle of the capacitive touch panel of FIG. 1;
  • FIG. 4 is a schematic diagram of a display device with a touch function according to an embodiment of the present invention.
  • FIG. 5 is a schematic diagram of another display device with a touch function according to an embodiment of the present invention.
  • FIG. 6 is a schematic diagram of another display device with a touch function according to an embodiment of the present invention.
  • FIG. 7 is a schematic diagram of another display device with a touch function according to an embodiment of the present invention.
  • FIG. 8 is a schematic diagram of another display device with a touch function according to an embodiment of the present invention.
  • FIG. 9 is a schematic diagram of another display device with a touch function according to an embodiment of the present invention.
  • FIG. 10 is a schematic diagram of a two-dimensional diamond structure according to an embodiment of the present invention.
  • the inventors have noticed in the research that solving the problem that the resistance values of the first electrode and the second electrode on the touch display device are large, the touch response rate is slow and easy to generate heat, and the power consumption is large has become one of the research directions in the field.
  • the first electrode 11 is used as the driving electrode, and the second electrode 21 is taken as the sensing electrode.
  • the first electrode 11 can also function as a sensing electrode, and the corresponding second electrode 21 serves as a sensing electrode. Drive the electrode. That is, the first electrode and the second electrode can be interchanged as needed.
  • the embodiment of the present invention provides a display device with a touch function, as shown in FIG. 4 to FIG. 9 , which includes an array substrate 100 and a color filter substrate 200 , and the array substrate 100 and the color filter substrate 200 .
  • the display between the functional layers.
  • the liquid crystal layer 300 is shown as a functional layer, and the first electrode 11 and the second electrode 21 which are not in contact with each other are formed on the array substrate 100 and/or the color filter substrate 200.
  • the first electrode 11 and/or the second electrode 21 include a two-dimensional nanostructure topological insulator, and the two-dimensional nanostructure topological insulator is adhered to the array substrate 11 and/or the color filter substrate 21 through the adhesive layer 40;
  • the electrode 11 and the second electrode 21 are a drive electrode and an induction electrode, respectively.
  • the color filter substrate 200 is an example of a counter substrate.
  • the opposite substrate may no longer be a color film substrate.
  • the material forming the first electrode and/or the second electrode includes a topological insulator, that is, the material forming the first electrode and/or the second electrode may include only the topological insulator, and may also be a mixed material formed of a topological insulator and a polymer or the like.
  • embodiments of the present invention both form a first electrode and/or a second
  • the material of the pole is a detailed description of the topological insulator, but is not limited thereto.
  • the display functional layer is a liquid crystal layer as an example.
  • Forming a first electrode and a second electrode on the array substrate and/or the color filter substrate that is, the first electrode and the second electrode may be formed on the array substrate, and the first electrode and the second electrode are adhered through the adhesive layer On the array substrate.
  • the first electrode and the second electrode are formed on the color filter substrate, and the first electrode and the second electrode are adhered to the color filter substrate through the adhesive layer.
  • a first electrode and a second electrode are formed on the array substrate and the color filter substrate, respectively.
  • a first electrode may be formed on the array substrate, and a second electrode is formed on the color filter substrate.
  • the first electrode is adhered to the array substrate through the adhesive layer, and the second electrode is adhered through the adhesive layer.
  • a second electrode is formed on the array substrate, and a first electrode is formed on the color filter substrate.
  • the second electrode is adhered to the array substrate through the adhesive layer, and the first electrode is adhered to the color through the adhesive layer.
  • the first electrode and the second electrode may be formed by adhering a substance having adhesive properties such as glue to adhere to the array substrate and/or the color filter substrate.
  • the first electrode and/or the second electrode are topological insulators of two-dimensional nanostructures.
  • it may be a topological insulator in which only the first electrode is a two-dimensional nanostructure, and the second electrode may be a common conductive material, for example, may be formed of ITO; or, only the second electrode is a two-dimensional nanostructure topological insulator,
  • the first electrode may be formed of a common conductive material; or the first electrode and the second electrode may each be a two-dimensional nanostructured topological insulator.
  • Topological insulators are a new form of matter that has recently been recognized.
  • the physical energy band structure of the topological insulator has a finite size energy gap at the Fermi level, but at its boundary or surface, it is energy-free, Dirac type, spin non-degenerate.
  • the conductive edge state which is the most unique property that distinguishes it from ordinary insulators. Such conductive edge states are stable, and the transmission of information can be through the spin of electrons, rather than passing charges like conventional materials. Therefore, the topological insulator has better electrical conductivity and does not involve dissipation or heat generation.
  • the topological insulator of the two-dimensional nanostructure is a nanometer-sized film formed by a topological insulator, and may be a two-dimensional nano film formed by a topological insulator, a two-dimensional nanosheet, a two-dimensional nanobelt, or the like.
  • the topological insulator of two-dimensional nanostructure has the ultra-high specific surface area and the controllability of the energy band structure, which can significantly reduce the proportion of bulk carriers and highlight the topological surface state, and thus the conductivity is better.
  • topological insulator of the two-dimensional nanostructure is similar to the graphene structure.
  • the high flexibility and high transmission that is invisible to the naked eye make it more suitable for display devices.
  • the first electrode and the second electrode may be a Touch Driving electrode and a Touch Sensing electrode, respectively. Then, when a driving signal (Tx) is added to the first electrode, the second electrode receives the sensing signal (Rx).
  • the capacitive touch screen determines whether there is a finger touch by calculating the amount of change in the capacitance of the second electrode and the first electrode before and after the finger touch to realize the touch function.
  • the first electrode and/or the second electrode is a two-dimensional nanostructure topological insulator, and has a greatly reduced electrode with respect to an electrode formed of ITO or metal.
  • the resistance in turn, can increase the touch response rate.
  • the electrode formed by the topological insulator of the two-dimensional nanostructure does not generate heat for a long time, which not only reduces the power consumption, but also avoids the problem that the high temperature affects the performance of other devices.
  • a thin film transistor, a pixel electrode, or the like is generally formed on the array substrate, and the color filter substrate is generally formed with a color film layer, a black matrix, or the like.
  • the present disclosure will be described by way of example only with respect to the film or layer structure associated with the inventive aspects of the present invention.
  • the conductive film may be a two-dimensional strip-shaped nanostructure or a two-dimensional diamond-shaped nanostructure, and the two-dimensional diamond-shaped nanostructure may be a structure as shown in FIG.
  • the conductive film may also be a two-dimensional network nanostructure, and the two-dimensional network nanostructure has a plurality of meshes arranged in an array.
  • the mesh may be a diamond, a regular quadrangle or a regular hexagon.
  • the topological insulator may include HgTe, Bi x Sb 1-x , Sb 2 Te 3 , Bi 2 Te 3 , Bi 2 Se 3 , T l BiTe 2 , T l BiSe 2 , Ge 1 Bi 4 Te 7 , Ge 2 Bi At least one of 2 Te 5 , Ge 1 Bi 2 Te 4 , AmN, PuTe, a single layer of tin, and a single layer of tin variant material.
  • Ge 1 Bi 4 Te 7 , Ge 2 Bi 2 Te 5 and Ge 1 Bi 2 Te 4 are chalcogenides.
  • AmN and PuTe belong to topological insulators with strong interactions.
  • the topological insulator can also be other materials such as a ternary Hessler compound.
  • the topological insulator may include HgTe, Bi x Sb 1-x , Sb 2 Te 3 , Bi 2 Te 3 , Bi 2 Se 3 , T l BiTe 2 , T l BiSe 2 , Ge 1 Bi 4 Te 7 , Ge 2 Bi At least one of 2 Te 5 , Ge 1 Bi 2 Te 4 , AmN, PuTe, single-layer tin, and a single-layer tin variant material, that is, the topological insulator may be HgTe or Bi x Sb 1-x or Sb 2 Te 3 or Bi 2 Te 3 or Bi 2 Se 3 or T l BiTe 2 or T l BiSe 2 or Ge 1 Bi 4 Te 7 or Ge 2 Bi 2 Te 5 or Ge 1 Bi 2 Te 4 or AmN or PuTe or a single layer of tin or single
  • the layer tin variant material may also be a mixed material formed of a plurality of the above materials, and may be, for example, a mixed material formed of two of the above materials. Of
  • the topological insulator is a single layer of tin or a single layer of tin of a variant material.
  • a single layer of tin is a two-dimensional material with only one tin atom thickness, and the level of the atomic layer thickness makes it have a good light transmittance.
  • Single-layer tin is similar to graphene, has good toughness, and has high light transmittance.
  • a single layer of tin atoms can reach 100% at room temperature and may become a superconductor material.
  • a single layer of tin variant material is formed by surface modification or magnetic doping of a single layer of tin.
  • Surface modification of a single layer of tin may be accomplished by adding functional groups such as -F, -Cl, -Br, -I and -OH to a single layer of tin.
  • a single-layer tin variant material is a tin-fluoride compound formed by surface modification of a single layer of tin with a fluorine atom.
  • F atoms are added to a single-layer tin atom structure, the conductivity of a single layer of tin can reach 100% at temperatures up to 100 ° C, and the properties are still stable.
  • the first electrode is located on the array substrate
  • the second electrode is located on the color filter substrate
  • the first electrode and the second electrode are both located on the array substrate; or the first electrode and the second electrode are both located in the color film substrate.
  • the first electrode and the second electrode are topological insulators of two-dimensional nanostructures.
  • the first electrode 11 and the second electrode 21 are topological insulators of two-dimensional nanostructures, the first electrode 11 is located on the array substrate 100 , and the second electrode 21 is located on the color filter substrate 200 .
  • the array substrate 100 includes a first substrate 10, and a first electrode 11 is formed on a side of the first substrate 10 near the color filter substrate 200; the first electrode 11 is a two-dimensional nanostructure top insulator, and the first electrode 11 Adhered to the first substrate 10 by the adhesive layer 40; and as shown in FIGS. 4 and 5, the array substrate 100 is further formed with a passivation layer 13 on the first electrode 11, and a passivation layer 13 for making the liquid crystal layer 300 is not in contact with the first electrode 11.
  • the array substrate 100 may further include other films or layer structures, and the first electrode 11 and the liquid crystal layer 300 may not be in contact with each other through other films or layers.
  • the embodiment of the present invention is only shown in FIG. 4 and FIG. example.
  • the color filter substrate 200 includes a second substrate 20, and a second electrode 21 is formed on a side of the second substrate 20 adjacent to the array substrate 100; the second electrode 21 is a two-dimensional nanostructure topological insulator.
  • the structure shown in FIG. 4 and FIG. 5 is exemplified by the color film substrate 200 further including the color film layer 22.
  • the second electrode 21 is formed on the color filter substrate 200, it may be as shown in FIG.
  • the electrode 21 is located between the second substrate 20 and the color film layer 22, and the second electrode 21 is adhered to the second substrate 20 by the adhesive layer 40.
  • the color film layer 22 is located between the second substrate 20 and the second electrode 21, and the second electrode 21 is adhered to the color film layer 22 by the adhesive layer 40.
  • a passivation layer 13 is formed on the second electrode 21.
  • the color film substrate 200 may further include other films or layer structures, and the second electrode 21 and the liquid crystal layer 300 may not be in contact with each other through other films or layer structures.
  • the embodiment of the present invention is only exemplified by FIG.
  • the color film layer generally comprises three different color layers of red, green and blue, and a black matrix is further formed on the color film substrate, and the black matrix divides the film layers of different colors of the color film layer into a plurality of pixels of different colors, Achieve color display.
  • the embodiment of the present invention and the accompanying drawings are described in detail by taking a color film substrate as a color film layer as an example.
  • the array substrate and the color filter substrate may further include other film or layer structures, and the specific positions of the first electrode and the second electrode on the array substrate and the color film substrate may be further adjusted.
  • the embodiments of the present invention are only exemplified above, and other films or layer structures and the like are not specifically limited.
  • a display device with a touch function is provided in the embodiment of the present invention.
  • the first electrode 11 and the second electrode 21 are topological insulators of two-dimensional nanostructures, and the first electrode 11 and the second electrode 21 are located.
  • the array substrate 100, the first electrode 11 and the second electrode 21 are not contacted by the insulating layer 12, the first electrode 11 is adhered to the first substrate 10 by the adhesive layer 40, and the second electrode 21 is adhered by the adhesive layer 40.
  • a passivation layer 13 is further formed on the array substrate 100 to prevent the second electrode 21 and the liquid crystal layer 300 from coming into contact.
  • the color filter substrate 200 is further formed with a color film layer 22 on the second substrate 20.
  • first electrode and the second electrode are both located on the array substrate, and the first electrode and the second electrode are not in contact with each other, and the first electrode and the second electrode may be disposed in the same layer, for example, the first electrode corresponds to the second The position of the electrode is broken to not contact the second electrode.
  • the first electrode and the second electrode are located in different layers, and an insulating layer is formed between the first electrode and the second electrode such that the first electrode and the second electrode are not in contact.
  • the insulating layer 12 is further included between the first electrode 11 and the second electrode 21, and the insulating layer 12 makes the first electrode 11 and the second electrode 21 not contact as an example. Description.
  • the first electrode 11 and the second electrode 21 are topological insulators of two-dimensional nanostructures, wherein the first electrode 11 and the second electrode 21 Both are located on the color film substrate 200.
  • the first electrode 11 and the second electrode 21 are located between the second substrate 20 and the color film layer 22 , and the first electrode 11 and the second electrode 21 are not contacted by the insulating layer 12 as an example.
  • the first electrode 11 is adhered to the second substrate 20 by the adhesive layer 40
  • the second electrode 21 is adhered to the insulating layer 12 by the adhesive layer 40.
  • the specific positions of the first electrode 11 and the second electrode 21 on the color filter substrate 200 can be changed and adjusted accordingly.
  • the embodiment of the present invention is only described in detail by taking the example shown in FIG. 7 as an example.
  • first electrode and the second electrode are both located on the color filter substrate, and the first electrode and the second electrode are not in contact with each other, and the first electrode and the second electrode may be disposed in the same layer, for example, the first electrode is corresponding to the first electrode. The position of the two electrodes is broken to be out of contact with the second electrode.
  • the first electrode and the second electrode are located in different layers, and an insulating layer is formed between the first electrode and the second electrode such that the first electrode and the second electrode are not in contact.
  • an insulating layer 12 is further included between the first electrode 11 and the second electrode 21 , and the insulating layer 12 makes the first electrode 11 and the second electrode 21 not contact as an example. Description.
  • the display device with a touch function further includes a package substrate 400.
  • the color filter substrate 200 is located between the package substrate 400 and the array substrate 100, and the first electrode 11 and the second electrode 21 are two-dimensional nanometers.
  • a topological insulator of the structure, the first electrode 11 is located on the array substrate 100, and the second electrode 21 is located on the color filter substrate 200.
  • the array substrate 100 includes a first substrate 10, and a first electrode 11 is formed on a side of the first substrate 10 adjacent to the color filter substrate 200; the first electrode 11 is a two-dimensional nanostructure topological insulator, and the first The electrode 11 is adhered to the first substrate 10 through the adhesive layer 40.
  • the color filter substrate 200 includes a second substrate 20, and a second electrode 21 is formed on a side of the second substrate 20 close to the package substrate 400; the second electrode 21 is a two-dimensional nanostructure topological insulator, and the second electrode 21 passes The adhesive layer 40 is adhered to the side of the second substrate 20 close to the package substrate 400.
  • the second electrode 21 is located between the color filter substrate 200 and the package substrate 400.
  • the second electrode 21 can also be formed on the package substrate 400.
  • the embodiment of the present invention is described in detail by taking the example of forming the first electrode and the second electrode on the array substrate and the color filter substrate.
  • the display device with a touch function further includes a package substrate 400 , and the color filter substrate 200 is located between the package substrate 200 and the array substrate 100 , and the first electrode 11 and the second electrode
  • the pole 21 is a topological insulator of a two-dimensional nanostructure, and the first electrode 11 and the second electrode 21 are both located on the color filter substrate 200.
  • the color filter substrate 200 includes a second substrate 20, and a first electrode 11 is formed on a side of the second substrate 20 close to the array substrate 100, and a second substrate 20 is formed on a side close to the package substrate 400.
  • the second electrode 21, the first electrode 11 and the second electrode 21 are topological insulators of a two-dimensional nanostructure, the first electrode 11 is adhered to the side of the second substrate adjacent to the array substrate 100 through the adhesive layer 40, and the second electrode 21 passes The adhesive layer 40 is adhered to the side of the second substrate 20 close to the package substrate 400.
  • the first electrode 11 and the second electrode 21 are respectively located on opposite sides of the second substrate 20.
  • the display device with touch function is as shown in FIG. 4 to FIG. 9 , which includes the array substrate 100 , the color filter substrate 200 , and the liquid crystal layer 300 (ie, the display function layer), and the array substrate 100 and the color filter substrate 200 are both
  • the first electrode 11 and the second electrode 21 may have corresponding transformations at the positions of the array substrate 100 and the color filter substrate 200, and the embodiment of the present invention only uses FIG. 4-9.
  • the example shown is described as an example.
  • the first electrode and/or the second electrode may also function as a common electrode.
  • the second electrode on the color filter substrate can also be used as a common electrode.
  • the display time of the liquid crystal display is divided into a touch time period and a display time period. For example, the display time of one frame is divided into a corresponding touch time period and a display time period. Adding a touch sensing signal to the second electrode during the touch time period, that is, the second electrode receives the sensing signal.
  • the first electrode receives the driving signal, and may also add a driving signal to the second electrode.
  • the electrode receives the sensing signal; the common electrode signal is added to the second electrode during the display period, and the second electrode functions as a common electrode to form a vertical electric field with the pixel electrode on the array substrate.
  • the embodiment of the invention provides a display device, which comprises the display device with touch function according to any one of the embodiments of the present invention.
  • the display device may be a display device such as a liquid crystal display, and any display product or component such as a television, a digital camera, a mobile phone, a watch, a tablet, a navigator, or the like including the display device.
  • the embodiment of the present invention provides a method for fabricating a display device with a touch function provided by an embodiment of the present invention, and the method includes the following steps 101-104.
  • Step 101 Form a first electrode pattern and/or a second electrode pattern of the two-dimensional nanostructure by using a topological insulator.
  • the display device When the display device only has the first electrode as a two-dimensional nanostructure topological insulator, it is only necessary to form a first electrode pattern of the two-dimensional nanostructure by using the topological insulator; when the display device only has the second electrode as a two-dimensional nanostructure topological insulator The second electrode pattern of the two-dimensional nanostructure is only required to be formed by using the topological insulator; when the first electrode and the second electrode of the display device are two-dimensional nanostructure topological insulators, the topological insulator is used to form the two-dimensional nanostructure a first electrode pattern and a second electrode pattern.
  • a first electrode pattern in which a two-dimensional nanostructure is formed by using a topological insulator is taken as an example to describe a method for fabricating the above step 101, for example, including 1011 to 1013:
  • Step 1011 Perform pattern etching on the substrate to form a pattern corresponding to the first electrode.
  • the substrate can be mica, SrTiO 3 (111), and other substrates that can grow a topological insulator film on their surface by molecular beam epitaxy.
  • the base is mica as an example for detailed description.
  • the substrate is patterned and etched to form a pattern corresponding to the first electrode, and the same mask pattern as the first electrode pattern may be used, and the mica substrate is plasma etched under the mask of the mask to obtain the first The patterned mica substrate of the same electrode pattern.
  • Step 1012 forming a thin film of a two-dimensional nanostructured topological insulator on the surface of the patterned substrate.
  • a Bi 2 Se 3 film is grown by molecular beam epitaxy on the surface of the patterned mica substrate.
  • other topological insulator films can also be grown.
  • the top insulator is Bi 2 Se 3 as an example for detailed description.
  • Step 1013 removing the substrate to obtain a first electrode pattern.
  • the mica substrate is dissolved to obtain a first electrode pattern of a two-dimensional nanostructured topological insulator.
  • the pattern of the first electrode forming the topological insulator of the two-dimensional nanostructure is taken as an example, and the pattern of the second electrode forming the topological insulator of the two-dimensional nano structure may be referred to the specific description of the pattern forming the first electrode. Do not repeat them.
  • Step 102 forming an array substrate and a color filter substrate.
  • the first electrode pattern and/or the second electrode pattern are adhered to the first substrate of the array substrate and/or the second substrate of the color filter substrate through the adhesive layer to be on the array substrate and/or the color filter substrate.
  • first electrode and a second electrode on the array substrate and/or the color filter substrate that is, the first electrode and the second electrode may be formed on the array substrate; or, the first electrode and the color filter substrate are formed on the color filter substrate; a second electrode; or a first electrode and a second electrode are respectively formed on the array substrate and the color filter substrate. That is, the second electrode may be formed on the color filter substrate when the first electrode is formed on the array substrate, or the first electrode may be formed on the color filter substrate when the second electrode is formed on the array substrate. Specific embodiments of the present invention will be described to illustrate the above various different situations.
  • adhering the first electrode pattern and/or the second electrode pattern to the first substrate of the array substrate and/or the second substrate of the color filter substrate through the adhesive layer may include: in the first electrode pattern and/or Forming an adhesive layer on the surface of the second electrode pattern, and attaching the first electrode pattern and/or the second electrode pattern to the first electrode region of the first substrate of the array substrate and/or the second substrate of the color filter substrate and/or Or the second electrode zone.
  • the first electrode is formed on the array substrate.
  • an adhesive layer may be formed on the surface of the first electrode pattern, and the side of the first electrode pattern on which the adhesive layer is formed may be attached to the first substrate of the array substrate.
  • the first electrode region forms a first electrode.
  • the first substrate may be a glass substrate or other thin film or layer structure formed on the glass substrate.
  • Step 103 Fill a display function layer between the array substrate and the color filter substrate.
  • the display function layer is filled between the array substrate and the color filter substrate, and the sealant may be formed on the array substrate or the color filter substrate, and then the liquid crystal is dripped in the region formed by the sealant to form a liquid crystal display functional layer. .
  • Step 104 Align the array substrate and the color filter substrate with the box.
  • the array substrate and the color filter substrate pair cassette may be according to the film layer structure on the array substrate and the color filter substrate, which differ in the manner of the cartridge, which will be described below in the specific embodiment.
  • a method for manufacturing a display device with a touch function according to an embodiment of the present invention includes steps 201-205.
  • Step 201 Form a first electrode pattern and a second electrode pattern of the two-dimensional nano structure by using a topological insulator. For example, reference may be made to step 101 above.
  • Step 202 forming an adhesive layer on the surface of the first electrode pattern, and attaching the first electrode pattern to the first electrode region on the first substrate.
  • a passivation layer or the like may be formed on the first substrate, and the formed substrate may be as shown in FIG. Or the array substrate 100 shown in FIG. 5, that is, the first electrode 11 is formed on the array substrate 100, and the first electrode 11 is adhered to the first substrate 10 through the adhesive layer 40.
  • Step 203 forming an adhesive layer on the surface of the second electrode pattern, and attaching the second electrode pattern to the second electrode region on the second substrate.
  • a color film layer, a black matrix, or the like may be formed on the second substrate, and the formed substrate may be the color film substrate 200 as shown in FIG. 4 and FIG. 5, that is, the second electrode is formed on the color filter substrate 200. twenty one.
  • Step 204 Fill a display function layer on the second substrate.
  • the sealant may be formed on the second substrate on which the color film layer and the second electrode are formed, and the liquid crystal may be dripped in the sealant region to form a liquid crystal display functional layer.
  • Step 205 The side on which the first substrate is formed with the first electrode and the side on which the second substrate is formed with the second electrode are opposed to the pair of boxes.
  • the display device shown in FIGS. 4 and 5 may be formed after the case.
  • Forming the first electrode pattern and/or the second electrode pattern of the two-dimensional nanostructure by using the topological insulator that is, the material forming the first electrode pattern and/or the second electrode pattern of the two-dimensional nano structure may include only the topological insulator, or may be The mixed material formed by the topological insulator and the polymer is described in detail in the embodiment of the present invention by taking the material forming the first electrode pattern and/or the second electrode pattern as a topological insulator.
  • first electrode pattern corresponds to the first electrode before being attached to the substrate
  • second electrode pattern corresponds to the second electrode before being attached to the substrate
  • first electrode region corresponds to the sticker of the first electrode Attached to the location.
  • the second electrode region corresponds to the attachment position of the second electrode.
  • a method for fabricating a display device with a touch function according to an embodiment of the present invention includes steps 301-305.
  • Step 301 Form a first electrode pattern and a second electrode pattern of the two-dimensional nanostructure by using a topological insulator. For example, reference may be made to step 101 above.
  • Step 302 forming an adhesive layer on the surface of the first electrode pattern and the second electrode pattern, and attaching the first electrode pattern and the second electrode pattern to the first electrode region and the second electrode region of the first substrate, respectively.
  • a passivation layer or the like may be formed on the first substrate, and the formed substrate may be the array substrate 100 as shown in FIG. 6, that is, the array substrate 100 is formed with the first electrode 11 and the second electrode 21, And the first electrode 11 is adhered to the first substrate 10 through the adhesive layer 40, and the second electrode 21 is adhered to the insulating layer 12 by the adhesive layer 40.
  • Step 303 forming a color filter substrate.
  • a color film layer or the like may be formed on the second substrate.
  • Step 304 filling a display function layer on the color filter substrate.
  • the sealant may be formed on the second substrate on which the color film layer is formed, and the liquid crystal may be dripped in the sealant region to form a liquid crystal display functional layer.
  • Step 305 forming a first substrate with a side of the first electrode and the second electrode and a color filter substrate pair.
  • the display device shown in Fig. 6 may be formed after the pair of boxes.
  • a method for manufacturing a display device with a touch function according to an embodiment of the present invention includes steps 401 to 405.
  • Step 401 Form a first electrode pattern and a second electrode pattern of the two-dimensional nanostructure by using a topological insulator. For example, reference may be made to step 101 above.
  • Step 402 forming an adhesive layer on the surface of the first electrode pattern and the second electrode pattern, and attaching the first electrode pattern and the second electrode pattern to the first electrode region and the second electrode region of the second substrate, respectively.
  • a color film layer or the like may be formed on the second substrate.
  • the formed substrate may be the color film substrate 200 as shown in FIG. 7, that is, the first electrode 11 and the second electrode 21 are formed on the color filter substrate 200.
  • the first electrode 11 is adhered to the second substrate 20 through the adhesive layer 40, and the second electrode 21 is adhered to the insulating layer 12 by the adhesive layer 40.
  • Step 403 forming an array substrate.
  • a thin film transistor, a pixel electrode, or the like may be formed on the first substrate.
  • Step 404 filling a display function layer on the second substrate.
  • the sealant may be formed on the second substrate on which the first electrode, the second electrode, and the color film layer are formed, and the liquid crystal may be dripped in the sealant region to form a liquid crystal display functional layer.
  • Step 405 the side of the second substrate on which the first electrode and the second electrode are formed and the array substrate pair.
  • the display device shown in Fig. 7 may be formed after the cartridge.
  • a method for manufacturing a display device with a touch function according to an embodiment of the present invention includes steps 501 to 505.
  • Step 501 Form a first electrode pattern and a second electrode pattern of the two-dimensional nanostructure by using a topological insulator. For example, reference may be made to step 101 above.
  • Step 502 forming an adhesive layer on the surface of the first electrode pattern, and attaching the first electrode pattern to the first electrode region of the first substrate.
  • a passivation layer or the like may be formed on the first substrate, and the formed substrate may be the array substrate 100 as shown in FIG. 8, that is, the first electrode 11 is formed on the array substrate 100, and the first electrode 11 passes.
  • the adhesive layer 40 is adhered to the first substrate 10.
  • Step 503 forming an adhesive layer on the surface of the second electrode pattern, and attaching the second electrode pattern to the second electrode region of the second substrate.
  • a color film layer or the like may be formed on a side where the second electrode is not formed on the second substrate, and the formed substrate may be the color film substrate 200 as shown in FIG. 8, that is, the color film substrate 200 is formed with a second surface.
  • the electrode 21 and the color film layer 22, and the second electrode 21 and the color film layer 22 are located on opposite sides of the second substrate 20.
  • Step 504 filling a display function layer on the second substrate.
  • the sealant may be formed on the second substrate on which the color film layer is formed, and the liquid crystal may be dripped in the sealant region to form a liquid crystal display functional layer.
  • Step 505 the side on which the first substrate is formed with the first electrode and the side on which the second substrate is not formed with the second electrode are opposite to the pair of boxes, and the side of the color filter substrate on which the second electrode is formed is performed by using the package substrate.
  • Package
  • the display device shown in Fig. 8 may be formed after the cartridge.
  • a method for manufacturing a display device with a touch function according to an embodiment of the present invention includes steps 601-605.
  • Step 601 Form a first electrode pattern and a second electrode pattern of the two-dimensional nanostructure by using a topological insulator. For example, reference may be made to step 101 above.
  • Step 602 forming an adhesive layer on the surface of the first electrode pattern and the second electrode pattern, and attaching the first electrode pattern and the second electrode pattern to the first electrode region and the second electrode region on opposite sides of the second substrate, respectively.
  • a color film layer or the like may be formed on the second substrate, and the formed substrate may be the color film substrate 200 as shown in FIG. 9, that is, the side of the second substrate 20 of the color filter substrate 200 is formed with a first surface.
  • An electrode 11 and a color film layer 22, and the other side of the second substrate 20 is formed with a second electrode 21, and the first electrode 11 and the second electrode 21 are adhered to the second substrate 20 through the adhesive layer 40, respectively.
  • Step 603 forming an array substrate.
  • a thin film transistor, a pixel electrode, or the like can be formed on the first substrate.
  • Step 604 filling a display function layer on the second substrate.
  • a sealant may be formed on the second substrate on which the color film layer is formed, and liquid crystal may be dripped in the sealant region to form a liquid crystal display functional layer.
  • Step 605 the side of the second substrate on which the first electrode is formed and the array substrate pair, and the side of the color film substrate on which the second electrode is formed is packaged by the package substrate.
  • the display device as shown in FIG. 9 may be formed after the cartridge.
  • An embodiment of the present invention further provides a display device with a touch function, a display device thereof, and a display device having a touch function, including a first electrode and a second electrode that are not in contact with each other, the first electrode and
  • the second electrode comprises a two-dimensional nanostructured topological insulator, which greatly reduces the resistance of the electrode relative to the electrode formed of ITO or metal, thereby improving the touch response rate and the two-dimensional nanostructure topological insulator
  • the formed electrode can be used for a long time without heating, which not only reduces power consumption, but also avoids the problem that high temperature affects the performance of other devices.

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Abstract

一种具有触摸功能的显示器件及其制作方法、显示装置。该显示器件包括对盒的阵列基板（100）和对置基板，以及位于阵列基板（100）和对置基板之间的显示功能层（300）。在阵列基板（100）和/或对置基板上形成有互不接触的第一电极（11）和第二电极（21），分别为驱动电极和感应电极；第一电极（11）和/或第二电极（21）的形成材料包括拓扑绝缘体，第一电极（11）和/或第二电极（21）具有二维纳米结构，且通过黏着层（40）粘附在阵列基板（100）和/或对置基板上。该显示器件避免了通常的显示器件上第一电极和第二电极的电阻值偏大，触控响应速率慢且容易发热，功耗较大的问题。

Description

具有触摸功能的显示器件及其制作方法、显示装置 技术领域
本发明的实施例涉及一种具有触摸功能的显示器件及其制作方法、显示装置。
背景技术
触摸屏(touch screen)又称为“触控屏”，是目前最简单、方便、自然的一种人机交互方式。早期的液晶触摸显示屏包括触摸面板和显示面板，且触摸面板和显示面板是分开的。现在通常的液晶触摸显示屏一般是将触摸面板和液晶显示面板一体化，这包括“In-cell”液晶触摸显示屏和“On-cell”液晶触摸显示屏。
但无论是哪一种液晶触摸显示屏，其触控的原理是相同的。如图1所示，液晶触摸显示屏包括多条沿第一方向101排布的第一电极11以及多条沿第二方向102排布的第二电极21。如图2所示，第一电极11和第二电极21之间设置有绝缘层12，用于使得第一电极11和第二电极21绝缘。如图3所示，以电容式触摸面板为例，当手指30触摸屏幕时，触摸位置处的第一电极11和第二电极21的电容会发生变化，从而可以检出触控位置，实现触摸功能。
通常液晶触摸显示屏的第一电极和第二电极一般是采用透明导电氧化物(TOC)形成，例如用ITO(氧化铟锡)形成第一电极和第二电极。但ITO薄膜的电阻值偏大，因此触控响应速率慢且容易发热，功耗较大。
发明内容
本发明的实施例提供一种具有触摸功能的显示器件及其制作方法、显示装置。
本发明至少一个实施例提供一种具有触摸功能的显示器件，其包括对盒的阵列基板和对置基板，以及位于所述阵列基板和所述对置基板之间的显示功能层。在所述阵列基板和/或所述对置基板上形成有互不接触的第一电极和第二电极，所述第一电极和所述第二电极分别为驱动电极和感应电极；形成 所述第一电极和/或所述第二电极的材料包括拓扑绝缘体，所述第一电极和/或所述第二电极具有二维纳米结构，且由拓扑绝缘体形成的二维纳米结构的第一电极和/或第二电极通过黏着层粘附在所述阵列基板和/或所述对置基板上。
本发明的实施例还提供一种具有触摸功能的显示器件的制作方法，其包括：利用拓扑绝缘体形成二维纳米结构的第一电极图案和/或第二电极图案；形成阵列基板和对置基板，包括：将所述第一电极图案和/或所述第二电极图案通过黏着层粘附在阵列基板的第一衬底和/或对置基板的第二衬底上，以在所述阵列基板和/或所述对置基板上形成互不接触的第一电极和第二电极。所述第一电极和所述第二电极分别为驱动电极和感应电极；在所述阵列基板和所述对置基板之间填充显示功能层；将所述阵列基板和所述对置基板对盒。
本发明实施例还提供一种显示装置，其包括本发明实施例提供的任一所述的具有触摸功能的显示器件。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例。
图1为一种触摸面板第一电极和第二电极示意图；
图2为图1的触摸面板截面示意图；
图3为图1的电容式触摸面板的触摸原理示意图；
图4为本发明实施例提供的一种具有触摸功能的显示器件示意图；
图5为本发明实施例提供的另一种具有触摸功能的显示器件示意图；
图6为本发明实施例提供的另一种具有触摸功能的显示器件示意图；
图7为本发明实施例提供的另一种具有触摸功能的显示器件示意图；
图8为本发明实施例提供的另一种具有触摸功能的显示器件示意图；
图9为本发明实施例提供的另一种具有触摸功能的显示器件示意图；
图10为本发明实施例提供的一种二维菱形结构示意图。
附图标记：
10-第一衬底；11-第一电极；12-绝缘层；13-钝化层；20-第二衬底；21- 第二电极；22-彩色膜层；30-手指；40-黏着层；100-阵列基板；200-彩膜基板；300-液晶层；400-封装基板。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
除非另作定义，本公开所使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。
发明人在研究中注意到，解决触摸显示器件上第一电极和第二电极的电阻值偏大，触控响应速率慢且容易发热，功耗较大的问题成为领域内的研究方向之一。
在本公开下面的描述之中，以第一电极11作为驱动电极，第二电极21作为感应电极为例，但是在实际情况中第一电极11也可以作为感应电极，相应的第二电极21作为驱动电极。即第一电极和第二电极可以根据需要互换。
本发明实施例提供了一种具有触摸功能的显示器件，如图4-图9所示，其包括对盒的阵列基板100和彩膜基板200，以及位于所述阵列基板100和彩膜基板200之间的显示功能层。图4-图9中以显示功能层为液晶层300为例，在阵列基板100和/或彩膜基板200上形成有互不接触的第一电极11和第二电极21。第一电极11和/或第二电极21包括二维纳米结构的拓扑绝缘体，且该二维纳米结构的拓扑绝缘体通过黏着层40粘附在阵列基板11和/或彩膜基板21上；第一电极11和第二电极21分别为驱动电极和感应电极。
本公开之中，彩膜基板200是对置基板的一个示例。当阵列基板上形成有彩膜层时，即该阵列基板为COA基板时，对置基板可不再是彩膜基板。
形成第一电极和/或第二电极的材料包括拓扑绝缘体，即形成第一电极和/或第二电极的材料可以仅包括拓扑绝缘体，还可以是拓扑绝缘体和聚合物等形成的混合材料。本公开之中，本发明实施例均以形成第一电极和/或第二电 极的材料为拓扑绝缘体为例进行详细说明，但是不限于此。
需要说明的是，本发明实施例均以显示功能层为液晶层为例。在阵列基板和/或彩膜基板上形成有第一电极和第二电极，即可以是在阵列基板上形成有第一电极和第二电极，则第一电极和第二电极通过黏着层粘附在阵列基板上。或者，在彩膜基板上形成有第一电极和第二电极，则第一电极和第二电极通过黏着层粘附在彩膜基板上。或者，在阵列基板和彩膜基板上分别形成有第一电极和第二电极。例如，可以是在阵列基板上形成有第一电极，则在彩膜基板上形成有第二电极，此时第一电极通过黏着层粘附在阵列基板上，第二电极通过黏着层粘附在彩膜基板上。或者，在阵列基板上形成有第二电极，则在彩膜基板上形成有第一电极，此时，第二电极通过黏着层粘附在阵列基板上，第一电极通过黏着层粘附在彩膜基板上。例如，第一电极和第二电极可以是通过胶水等具有黏着特性的物质形成黏着层以粘附在阵列基板和/或彩膜基板上。
第一电极和/或第二电极为二维纳米结构的拓扑绝缘体。例如，可以是仅第一电极为二维纳米结构的拓扑绝缘体，则第二电极可以为通常的导电材料，例如可以是由ITO形成；或者，仅第二电极为二维纳米结构的拓扑绝缘体，则第一电极可以为通常的导电材料形成；或者第一电极和第二电极均为二维纳米结构的拓扑绝缘体。且本发明实施例及附图以第一电极和第二电极均为二维纳米结构的拓扑绝缘体为例进行详细说明。
拓扑绝缘体(topological insulator)是近年来新认识到的一种物质形态。拓扑绝缘体的体能带结构和普通绝缘体一样，都在费米能级处有一有限大小的能隙，但是在它的边界或表面却是无能隙的、狄拉克(Dirac)型、自旋非简并的导电的边缘态，这是它有别于普通绝缘体的最独特的性质。这样的导电边缘态是稳定存在的，信息的传递可以通过电子的自旋，而不像传统材料通过电荷。因此，拓扑绝缘体的导电性能更好且不涉及耗散即不发热。
二维纳米结构的拓扑绝缘体即由拓扑绝缘体形成的纳米尺寸厚度的膜，可以是由拓扑绝缘体形成的二维纳米薄膜、二维纳米薄片、二维纳米带等。二维纳米结构的拓扑绝缘体具有超高比表面积和能带结构的可调控性，能显著降低体态载流子的比例和凸显拓扑表面态，进而导电性能更好。
需要说明的是，二维纳米结构的拓扑绝缘体因其与石墨烯结构类似，具 有较高的柔韧性以及基本肉眼不可见的高透过率，使其更适用于显示器件。
需要说明的是，第一电极和第二电极可以分别为驱动(Touch Driving)电极和感应(Touch Sensing)电极。则当对第一电极添加驱动信号(Tx)，第二电极接收到感应信号(Rx)。电容式触摸屏通过计算手指触摸前后第二电极与第一电极构成电容的变化量来判断是否有手指触摸，以实现触摸功能。
本发明实施例提供的一种具有触摸功能的显示器件，第一电极和/或第二电极为二维纳米结构的拓扑绝缘体，相对于由ITO或金属形成的电极，具有大大减小了的电极电阻，进而可以提高触控响应速率。且二维纳米结构的拓扑绝缘体形成的电极长时间使用也不会发热，不仅可以减小功耗，还可以避免温度高影响其他器件的性能的问题。
需要说明的是，阵列基板和彩膜基板上均还形成有其他的薄膜或层结构等。例如阵列基板上一般还形成有薄膜晶体管、像素电极等，彩膜基板一般还形成有彩色膜层、黑矩阵等。为了简洁器件，本公开仅以与本发明的发明点相关的薄膜或层结构为例进行说明。
例如，导电薄膜可为二维条带状纳米结构或为二维菱形纳米结构，二维菱形纳米结构可以是如图10所示的结构。当然，导电薄膜也可以是二维网状纳米结构，二维网状纳米结构具有多个阵列排布的网孔。例如，网孔可为菱形、正四边形或正六边形等。
例如，拓扑绝缘体可包括HgTe、BixSb1-x、Sb2Te3、Bi2Te3、Bi2Se3、TlBiTe2、TlBiSe2、Ge1Bi4Te7、Ge2Bi2Te5、Ge1Bi2Te4、AmN、PuTe、单层锡以及单层锡变体材料中的至少一种。
Ge1Bi4Te7、Ge2Bi2Te5以及Ge1Bi2Te4属于硫属化物。AmN以及PuTe属于具有强相互作用的拓扑绝缘体。当然，拓扑绝缘体还可以是三元赫斯勒化合物等其他材料。
例如，拓扑绝缘体可包括HgTe、BixSb1-x、Sb2Te3、Bi2Te3、Bi2Se3、TlBiTe2、TlBiSe2、Ge1Bi4Te7、Ge2Bi2Te5、Ge1Bi2Te4、AmN、PuTe、单层锡以及单层锡变体材料中的至少一种，即拓扑绝缘体可以为HgTe或BixSb1-x或Sb2Te3或Bi2Te3或Bi2Se3或TlBiTe2或TlBiSe2或Ge1Bi4Te7或Ge2Bi2Te5或Ge1Bi2Te4或AmN或PuTe或单层锡或单层锡变体材料，还可以是上述材料中的多种形成的混合材料，例如可以是上述材料中的两种形成的混合材料。当然，也可以 是上述材料中的三种形成的混合材料等。且当拓扑绝缘体为至少两种材料形成的混合材料时，还可以通过选择具有互补特性的材料混合，以提高混合后材料的特性。
例如，拓扑绝缘体为单层锡或单层锡的变体材料。单层锡为只有一个锡原子厚度的二维材料，原子层厚度的级别使其具有较好的光透过率。单层锡与石墨烯类似，具有较好的韧性，且光透过率高。
单层锡原子在常温下导电率可以达到100％，可能成为一种超级导体材料。例如，单层锡的变体材料是通过对单层锡进行表面修饰或磁性掺杂形成。对单层锡进行表面修饰可以是对单层锡添加-F,-Cl,-Br,-I和-OH等功能基实现其改性。
再如，单层锡的变体材料为对单层锡进行氟原子的表面修饰，形成的锡氟化合物。当添加F原子到单层锡原子结构中时，单层锡在温度高达100℃时导电率也能达到100％，且性质依然稳定。
下面将具体说明第一电极位于阵列基板，第二电极位于彩膜基板；或第一电极和第二电极均位于阵列基板；或第一电极和第二电极均位于彩膜基板的各种情况。第一电极和第二电极为二维纳米结构的拓扑绝缘体。
例如，如图4、图5所示，第一电极11和第二电极21为二维纳米结构的拓扑绝缘体，第一电极11位于阵列基板100，第二电极21位于彩膜基板200。
阵列基板100包括第一衬底10，且在第一衬底10靠近彩膜基板200的一侧形成有第一电极11；第一电极11为二维纳米结构的拓扑绝缘体，且第一电极11通过黏着层40粘附在第一衬底10上；且如图4、图5所示，阵列基板100在第一电极11上还形成有钝化层13，钝化层13用于使得液晶层300与第一电极11不接触。当然，阵列基板100还可包括其他薄膜或层结构等，第一电极11和液晶层300还可以是通过其他薄膜或层结构不接触，本发明实施例仅以图4、图5所示的为例。
彩膜基板200包括第二衬底20，且在第二衬底20靠近阵列基板100的一侧形成有第二电极21；第二电极21为二维纳米结构的拓扑绝缘体。
需要说明的是，图4、图5所示的结构以彩膜基板200还包括彩色膜层22为例。当第二电极21形成在彩膜基板200上，可以是如图4所示，第二 电极21位于第二衬底20和彩色膜层22之间，第二电极21通过黏着层40粘附在第二衬底20上。或如图5所示，彩色膜层22位于第二衬底20和第二电极21之间，第二电极21通过黏着层40粘附在彩色膜层22上。当第二电极21位于彩色膜层22的上面，如图5所示，为了防止第二电极21和液晶层300接触，在第二电极21的上面形成钝化层13。当然，彩膜基板200还可包括其他薄膜或层结构等，第二电极21和液晶层300还可以是通过其他薄膜或层结构不接触，本发明实施例仅以图5所示的为例。
需要说明的是，本发明实施例中的“上”、“下”以制造膜层时的先后顺序为准。例如，在上的薄膜或图案是指相对在后形成的薄膜或图案，在下的薄膜或图案是指相对在先形成的薄膜或图案。彩色膜层一般包括红、绿、蓝三种不同颜色的膜层，且彩膜基板上还形成有黑矩阵，黑矩阵将彩色膜层不同颜色的膜层分割形成多个不同颜色的像素，以实现彩色显示。本发明实施例及附图以彩膜基板还形成有彩色膜层为例进行详细说明。当然，阵列基板和彩膜基板还可以包括其他薄膜或层结构，阵列基板和彩膜基板上的第一电极和第二电极的具体位置还可以进一步进行调整。本发明实施例仅以上述为例，对其他薄膜或层结构等不作具体限定。
本发明实施例提供的一种具有触摸功能的显示器件，如图6所示，第一电极11和第二电极21为二维纳米结构的拓扑绝缘体，第一电极11和第二电极21均位于阵列基板100，第一电极11和第二电极21之间通过绝缘层12不接触，第一电极11通过黏着层40粘附在第一衬底10上，第二电极21通过黏着层40粘附在绝缘层12上。如图6所示，阵列基板100上还形成有钝化层13，以防止第二电极21和液晶层300接触。图6中彩膜基板200在第二衬底20上还形成有彩色膜层22。
需要说明的是，第一电极和第二电极均位于阵列基板，第一电极和第二电极互不接触，可以是第一电极和第二电极同层设置，例如，第一电极在对应第二电极的位置处断开，以与第二电极不接触。或者，第一电极和第二电极位于不同层，在第一电极和第二电极之间形成绝缘层以使得第一电极和第二电极不接触。如图6所示，本发明实施例中以所述第一电极11和第二电极21之间还包括绝缘层12，绝缘层12使得第一电极11和第二电极21不接触为例进行详细说明。
本发明实施例提供的一种具有触摸功能的显示器件，如图7所示，第一电极11和第二电极21为二维纳米结构的拓扑绝缘体，其中，第一电极11和第二电极21均位于彩膜基板200。如图7所示，以第一电极11和第二电极21位于第二衬底20和彩色膜层22之间，第一电极11和第二电极21之间通过绝缘层12不接触为例，第一电极11通过黏着层40粘附在第二衬底20上，第二电极21通过黏着层40粘附在绝缘层12上。当然，第一电极11和第二电极21在彩膜基板200上的具体位置还可以进行相应的变化和调整，本发明实施例仅以图7所示的为例进行详细说明。
需要说明的是，第一电极和第二电极均位于彩膜基板，第一电极和第二电极互不接触，可以是第一电极和第二电极同层设置，例如，第一电极在对应第二电极的位置处断开，以与第二电极不接触。或者，第一电极和第二电极位于不同层，在第一电极和第二电极之间形成绝缘层以使得第一电极和第二电极不接触。如图7所示，本发明实施例中以第一电极11和第二电极21之间还包括绝缘层12，所述绝缘层12使得第一电极11和第二电极21不接触为例进行详细说明。
可选的，如图8所示，具有触摸功能的显示器件还包括封装基板400，彩膜基板200位于封装基板400和阵列基板100之间，第一电极11和第二电极21为二维纳米结构的拓扑绝缘体，第一电极11位于阵列基板100，第二电极21位于彩膜基板200。
这里，阵列基板100包括第一衬底10，且在第一衬底10靠近彩膜基板200的一侧形成有第一电极11；第一电极11为二维纳米结构的拓扑绝缘体，且第一电极11通过黏着层40粘附在第一衬底10上。
彩膜基板200包括第二衬底20，且在第二衬底20靠近封装基板400的一侧形成有第二电极21；第二电极21为二维纳米结构的拓扑绝缘体，第二电极21通过黏着层40粘附在第二衬底20靠近封装基板400的一侧。例如，第二电极21位于彩膜基板200和封装基板400之间。当然，还可以在封装基板400上形成第二电极21。本发明实施例仅以在阵列基板和彩膜基板上形成第一电极和第二电极为例进行详细说明。
可选的，如图9所示，具有触摸功能的显示器件还包括封装基板400，彩膜基板200位于封装基板200和阵列基板100之间，第一电极11和第二电 极21为二维纳米结构的拓扑绝缘体，第一电极11和第二电极21均位于所述彩膜基板200。
这里，彩膜基板200包括第二衬底20，且在第二衬底20靠近阵列基板100的一侧形成有第一电极11，在第二衬底20靠近封装基板400的一侧形成有第二电极21，第一电极11和第二电极21为二维纳米结构的拓扑绝缘体，第一电极11通过黏着层40粘附在第二衬底靠近阵列基板100的一侧，第二电极21通过黏着层40粘附在第二衬底20靠近封装基板400的一侧。
如图9所示，第一电极11和第二电极21分别位于第二衬底20的相对的两侧。
需要说明的是，具有触摸功能的显示器件如图4-图9所示，其包括阵列基板100、彩膜基板200以及液晶层300(即显示功能层)，阵列基板100和彩膜基板200均还可包括有其他薄膜或层结构，则第一电极11和第二电极21具体在阵列基板100和彩膜基板200的位置还可以有相应的变换，本发明实施例仅以图4-图9所示的为例进行说明。
另外，第一电极和/或第二电极位于阵列基板或彩膜基板上时，第一电极和/或第二电极还可以用作公共电极。如图4、图5所示的液晶显示屏，位于彩膜基板上的第二电极还可以用作公共电极。液晶显示屏的显示时间分为触控时间段和显示时间段，例如一帧的显示时间分为相应的触控时间段和显示时间段。在触控时间段向所述第二电极添加触摸传感信号，即第二电极接收感应信号，此时，第一电极接收驱动信号，亦可向第二电极添加驱动信号，此时，第一电极接收感应信号；在显示时间段向第二电极添加公共电极信号，则第二电极用作公共电极，以和阵列基板上的像素电极形成垂直电场。
本发明实施例提供了一种显示装置，其包括本发明实施例提供的任一所述的具有触摸功能的显示器件。所述显示装置可以为液晶显示器等显示器件以及包括这些显示器件的电视、数码相机、手机、手表、平板电脑、导航仪等任何具有显示功能的产品或者部件。
本发明实施例提供了一种用于形成本发明实施例提供的具有触摸功能的显示器件的制作方法，所述方法包括如下步骤101～104。
步骤101、利用拓扑绝缘体形成二维纳米结构的第一电极图案和/或第二电极图案。
当显示器件只有第一电极为二维纳米结构的拓扑绝缘体时，则只需要利用拓扑绝缘体形成二维纳米结构的第一电极图案；当显示器件只有第二电极为二维纳米结构的拓扑绝缘体时，则只需要利用拓扑绝缘体形成二维纳米结构的第二电极图案；当显示器件的第一电极和第二电极均为二维纳米结构的拓扑绝缘体时，则利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。
例如，以利用拓扑绝缘体形成二维纳米结构的第一电极图案为例，说明上述步骤101的制作方法，例如其包括1011～1013：
步骤1011、对基底进行图案化刻蚀，形成对应第一电极的图案。
例如，基底可以是云母、SrTiO3(111)，以及通过分子束外延法可在其表面生长拓扑绝缘体薄膜的其他基底。本发明实施例中以基底为云母为例进行详细说明。
对基底进行图案化刻蚀形成对应第一电极的图案，可以是采用与第一电极图案相同的掩膜板，在掩膜板的掩膜下对云母基底进行等离子体刻蚀，得到与第一电极图案相同的图案化的云母基底。
步骤1012、在图案化的基底表面形成二维纳米结构的拓扑绝缘体的薄膜。
例如，在图案化的云母基底表面，通过分子束外延生长Bi2Se3薄膜。当然，还可以生长其他拓扑绝缘体薄膜，本发明实施例以拓扑绝缘体为Bi2Se3为例进行详细说明。
步骤1013、将基底去除，得到第一电极图案。
将云母基底溶解掉，得到二维纳米结构的拓扑绝缘体的第一电极图案。
上述仅以形成二维纳米结构的拓扑绝缘体的第一电极的图案为例，形成二维纳米结构的拓扑绝缘体的第二电极的图案可参考形成第一电极的图案的具体说明，本发明实施例不作赘述。
步骤102、形成阵列基板和彩膜基板。
例如，将第一电极图案和/或第二电极图案通过黏着层粘附在阵列基板的第一衬底和/或彩膜基板的第二衬底上，以在阵列基板和/或彩膜基板上形成互不接触的第一电极和第二电极；所述第一电极和所述第二电极分别为驱动电极和感应电极。
在阵列基板和/或彩膜基板上形成有第一电极和第二电极，即可以是在阵列基板上形成有第一电极和第二电极；或者，在彩膜基板上形成有第一电极和第二电极；或者，在阵列基板和彩膜基板上分别形成有第一电极和第二电极。即可以是在阵列基板上形成有第一电极，则在彩膜基板上形成有第二电极；或者，在阵列基板上形成有第二电极，则在彩膜基板上形成有第一电极。本发明实施例将列举具体的实施例用于说明以上几种不同情况。
例如，将第一电极图案和/或第二电极图案通过黏着层粘附在阵列基板的第一衬底和/或彩膜基板的第二衬底上可包括：在第一电极图案和/或第二电极图案表面形成黏着层，将第一电极图案和/或第二电极图案贴附在阵列基板的第一衬底和/或彩膜基板的第二衬底对应的第一电极区和/或第二电极区。
以在阵列基板上形成有第一电极为例，例如，可以是在第一电极图案表面形成黏着层，将第一电极图案形成有黏着层的一侧贴附在阵列基板的第一衬底的第一电极区以形成第一电极。需要说明的是，第一衬底可以是玻璃基板也可以是形成在玻璃基板上的其他薄膜或层结构。
步骤103、在阵列基板和彩膜基板之间填充显示功能层。
例如，在阵列基板和彩膜基板之间填充显示功能层，可以是在阵列基板或彩膜基板上先形成封框胶，再在封框胶形成的区域滴注液晶，以形成液晶显示功能层。
步骤104、将阵列基板和彩膜基板对盒。
例如，阵列基板和彩膜基板对盒可以是根据阵列基板和彩膜基板上的膜层结构，其对盒方式有所不同，下面将在具体实施例中进行说明。
下面列举几个具体的实施例以说明本发明实施例提供的制作方法。
实施例一
本发明实施例提供的一种具有触摸功能的显示器件的制作方法，其包括步骤201～205。
步骤201、利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。例如，可以参照上述步骤101。
步骤202、在第一电极图案的表面形成黏着层，将第一电极图案贴附在第一衬底上的第一电极区。
当然，还可以在第一衬底上形成钝化层等，形成后的基板可以是如图4 或图5所示的阵列基板100，即阵列基板100上形成有第一电极11，且第一电极11通过黏着层40粘附在第一衬底10上。
步骤203、在第二电极图案的表面形成黏着层，将第二电极图案贴附在第二衬底上的第二电极区。
当然，还可以在第二衬底上形成彩色膜层以及黑矩阵等，则形成的基板可以是如图4、图5所示的彩膜基板200，即彩膜基板200上形成有第二电极21。
步骤204、在第二衬底上填充显示功能层。
例如，可以是在形成有彩色膜层以及第二电极的第二衬底上形成封框胶，再在封框胶区域滴注液晶形成液晶显示功能层。
步骤205、将第一衬底形成有第一电极的一侧和第二衬底形成有第二电极的一侧相对对盒。
对盒后可以是形成如图4、图5所示的显示器件。
利用拓扑绝缘体形成二维纳米结构的第一电极图案和/或第二电极图案，即形成二维纳米结构的第一电极图案和/或第二电极图案的材料可以仅包括拓扑绝缘体，还可以是拓扑绝缘体和聚合物等形成的混合材料，本发明实施例均以形成第一电极图案和/或第二电极图案的材料为拓扑绝缘体为例进行详细说明。
需要说明的是，第一电极图案对应于贴附至衬底前的第一电极，第二电极图案对应于贴附至衬底前的第二电极，第一电极区对应于第一电极的贴附位置。第二电极区对应于第二电极的贴附位置。
实施例二
本发明实施例提供的一种具有触摸功能的显示器件的制作方法，其包括步骤301～305。
步骤301、利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。例如，可以参照上述步骤101。
步骤302、在第一电极图案和第二电极图案的表面形成黏着层，将第一电极图案和第二电极图案分别贴附在第一衬底的第一电极区和第二电极区。
当然，还可以在第一衬底上形成钝化层等，形成后的基板可以是如图6所示的阵列基板100，即阵列基板100上形成有第一电极11和第二电极21， 且第一电极11通过黏着层40粘附在第一衬底10上，第二电极21通过黏着层40粘附在绝缘层12上。
步骤303、形成彩膜基板。
例如，可以是在第二衬底上形成彩色膜层等。
步骤304、在彩膜基板上填充显示功能层。
例如，可以是在形成有彩色膜层的第二衬底上形成封框胶，再在封框胶区域滴注液晶形成液晶显示功能层。
步骤305、将第一衬底形成有第一电极和第二电极的一侧和彩膜基板对盒。
对盒后可以是形成如图6所示的显示器件。
实施例三
本发明实施例提供的一种具有触摸功能的显示器件的制作方法，其包括步骤401～405。
步骤401、利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。例如，可以参照上述步骤101。
步骤402、在第一电极图案和第二电极图案的表面形成黏着层，将第一电极图案和第二电极图案分别贴附在第二衬底的第一电极区和第二电极区。
当然，还可以在第二衬底上形成彩色膜层等，形成后的基板可以是如图7所示的彩膜基板200，即彩膜基板200上形成有第一电极11和第二电极21，且第一电极11通过黏着层40粘附在第二衬底20上，第二电极21通过黏着层40粘附在绝缘层12上。
步骤403、形成阵列基板。
例如，可以是在第一衬底上形成薄膜晶体管以及像素电极等。
步骤404、在第二衬底上填充显示功能层。
例如，可以是在形成有第一电极、第二电极以及彩色膜层的第二衬底上形成封框胶，再在封框胶区域滴注液晶形成液晶显示功能层。
步骤405、将第二衬底形成有第一电极和第二电极的一侧和阵列基板对盒。
对盒后可以是形成如图7所示的显示器件。
实施例四
本发明实施例提供的一种具有触摸功能的显示器件的制作方法，其包括步骤501～505。
步骤501、利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。例如，可以参照上述步骤101。
步骤502、在第一电极图案的表面形成黏着层，将第一电极图案贴附在第一衬底的第一电极区。
当然，还可以在第一衬底上形成钝化层等，形成后的基板可以是如图8所示的阵列基板100，即阵列基板100上形成有第一电极11，且第一电极11通过黏着层40粘附在第一衬底10上。
步骤503、在第二电极图案的表面形成黏着层，将第二电极图案贴附在第二衬底的第二电极区。
例如，可以是在第二衬底未形成第二电极的一侧形成彩色膜层等，形成后的基板可以是如图8所示的彩膜基板200，即彩膜基板200上形成有第二电极21和彩色膜层22，且第二电极21和彩色膜层22位于第二衬底20的相对两侧。
步骤504、在第二衬底上填充显示功能层。
例如，可以是在形成有彩色膜层的第二衬底上形成封框胶，再在封框胶区域滴注液晶形成液晶显示功能层。
步骤505、将第一衬底形成有第一电极的一侧和第二衬底未形成有第二电极的一侧相对对盒，利用封装基板对彩膜基板形成有第二电极的一侧进行封装。
对盒后可以是形成如图8所示的显示器件。
实施例五
本发明实施例提供的一种具有触摸功能的显示器件的制作方法，其包括步骤601～605。
步骤601、利用拓扑绝缘体形成二维纳米结构的第一电极图案和第二电极图案。例如，可以参照上述步骤101。
步骤602、在第一电极图案和第二电极图案的表面形成黏着层，将第一电极图案和第二电极图案分别贴附在第二衬底相对两侧的第一电极区和第二电极区。
当然，还可以在第二衬底上形成彩色膜层等，形成后的基板可以是如图9所示的彩膜基板200，即彩膜基板200的第二衬底20的一侧形成有第一电极11和彩色膜层22，且第二衬底20的另一侧形成有第二电极21，且第一电极11和第二电极21分别通过黏着层40粘附在第二衬底20上。
步骤603、形成阵列基板。
例如，可以在第一衬底上形成薄膜晶体管以及像素电极等。
步骤604、在第二衬底上填充显示功能层。
例如，可以在形成有彩色膜层的第二衬底上形成封框胶，再在封框胶区域滴注液晶形成液晶显示功能层。
步骤605、将第二衬底形成有第一电极的一侧和阵列基板对盒，利用封装基板对彩膜基板形成有第二电极的一侧进行封装。
对盒后可以是形成如图9所示的显示器件。
本发明的实施例还提供一种具有触摸功能的显示器件及其制作方法、显示装置，所述具有触摸功能的显示器件包括互不接触的第一电极和第二电极，所述第一电极和/或所述第二电极包括二维纳米结构的拓扑绝缘体，相对于由ITO或金属形成的电极，大大减小了电极的电阻，进而可以提高触控响应速率，且二维纳米结构的拓扑绝缘体形成的电极使用时间再长也不会发热，不仅可以减小功耗，还可以避免温度高影响其他器件的性能的问题。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本专利申请要求于2014年8月5日递交的中国专利申请第201410381530.5号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (15)

  1. 一种具有触摸功能的显示器件，其包括对盒的阵列基板和对置基板，以及位于所述阵列基板和所述对置基板之间的显示功能层，
    其中，在所述阵列基板和/或所述对置基板上形成有互不接触的第一电极和第二电极，所述第一电极和所述第二电极分别为驱动电极和感应电极；
    形成所述第一电极和/或所述第二电极的材料包括拓扑绝缘体，所述第一电极和/或所述第二电极具有二维纳米结构，且第一电极和/或第二电极通过黏着层粘附在所述阵列基板和/或所述对置基板上。
  2. 根据权利要求1所述的具有触摸功能的显示器件，其中，形成所述第一电极和所述第二电极的材料包括拓扑绝缘体，所述第一电极和所述第二电极具有二维纳米结构；
    所述第一电极形成于所述阵列基板，所述第二电极形成于所述对置基板；或，
    所述第一电极和所述第二电极均形成于所述阵列基板；或，
    所述第一电极和所述第二电极均形成于所述对置基板。
  3. 根据权利要求1或2所述的具有触摸功能的显示器件，其中，所述第一电极形成于所述阵列基板，所述第二电极形成于所述对置基板，
    所述阵列基板包括第一衬底，在所述第一衬底靠近对置基板的一侧形成有第一电极；
    所述对置基板包括第二衬底，在所述第二衬底靠近阵列基板的一侧形成有第二电极。
  4. 根据权利要求1至3任一项所述的具有触摸功能的显示器件，还包括封装基板，
    其中，所述对置基板位于所述封装基板和所述阵列基板之间；所述第一电极形成于所述阵列基板，所述第二电极形成于所述对置基板，
    所述阵列基板包括第一衬底，在所述第一衬底靠近对置基板的一侧形成有第一电极；
    所述对置基板包括第二衬底，在所述第二衬底靠近封装基板的一侧形成有第二电极。
  5. 根据权利要求1至3任一项所述的具有触摸功能的显示器件，还包括封装基板，
    其中，所述对置基板位于所述封装基板和所述阵列基板之间；所述第一电极和所述第二电极均形成于所述对置基板，
    所述对置基板包括第二衬底，在所述第二衬底靠近阵列基板的一侧形成有第一电极，在所述第二衬底靠近封装基板的一侧形成有第二电极。
  6. 根据权利要求1至5任一项所述的具有触摸功能的显示器件，其中，所述拓扑绝缘体包括HgTe、BixSb1-x、Sb2Te3、Bi2Te3、Bi2Se3、TlBiTe2、TlBiSe2、Ge1Bi4Te7、Ge2Bi2Te5、Ge1Bi2Te4、AmN、PuTe、单层锡以及单层锡变体材料中的至少一种。
  7. 根据权利要求6所述的具有触摸功能的显示器件，其中，单层锡的变体材料通过对单层锡进行表面修饰或磁性掺杂形成。
  8. 根据权利要求7所述的具有触摸功能的显示器件，其中，单层锡的变体材料为对单层锡进行氟原子的表面修饰，形成的锡氟化合物。
  9. 根据权利要求1至8任一项所述的具有触摸功能的显示器件，其中，所述显示功能层为液晶层。
  10. 一种具有触摸功能的显示器件的制作方法，其包括：
    利用拓扑绝缘体形成二维纳米结构的第一电极图案和/或第二电极图案；
    形成阵列基板和对置基板，包括：将所述第一电极图案和/或所述第二电极图案通过黏着层粘附在阵列基板的第一衬底和/或对置基板的第二衬底上，以在所述阵列基板和/或所述对置基板上形成互不接触的第一电极和第二电极；其中，所述第一电极和所述第二电极分别为驱动电极和感应电极；
    在所述阵列基板和所述对置基板之间填充显示功能层；
    将所述阵列基板和所述对置基板对盒。
  11. 根据权利要求10所述的制作方法，其中，形成所述第一电极和所述第二电极的材料包括拓扑绝缘体，所述第一电极和所述第二电极具有二维纳米结构；所述方法还包括：
    利用封装基板对对置基板进行封装；其中，
    形成阵列基板包括在第一衬底的一侧形成第一电极；
    形成对置基板包括在第二衬底的一侧形成第二电极；
    阵列基板形成有第一电极的一侧与对置基板未形成有第二电极的一侧相对对盒；
    利用封装基板对对置基板形成有第二电极的一侧进行封装。
  12. 根据权利要求10所述的制作方法，其中，形成所述第一电极和所述第二电极的材料包括拓扑绝缘体，所述第一电极和所述第二电极具有二维纳米结构；
    所述方法还包括利用封装基板对对置基板进行封装；
    其中，在第二衬底的一侧形成第一电极，在第二衬底的另一侧形成第二电极；
    将阵列基板与对置基板形成有第一电极的一侧相对对盒；
    利用封装基板对对置基板形成有第二电极的一侧进行封装。
  13. 根据权利要求10至12任一项所述的制作方法，其中，所述利用拓扑绝缘体形成二维纳米结构的第一电极图案和/或第二电极图案包括：
    对基底进行图案化刻蚀，形成对应第一电极的图案和/或第二电极的图案；
    在图案化的基底表面形成具有二维纳米结构的拓扑绝缘体的薄膜；
    将所述基底去除，得到第一电极图案和/或第二电极图案。
  14. 根据权利要求10至12任一项所述的制作方法，其中，将所述第一电极图案和/或第二电极图案通过黏着层粘附在阵列基板的第一衬底和/或对置基板的第二衬底上，包括：
    在所述第一电极图案和/或所述第二电极图案表面形成黏着层，将所述第一电极图案和/或所述第二电极图案贴附在所述阵列基板的第一衬底和/或所述对置基板的第二衬底对应的第一电极区和/或第二电极区。
  15. 一种显示装置，其包括权利要求1至9任一项所述的具有触摸功能的显示器件。
PCT/CN2014/092696 2014-08-05 2014-12-01 具有触摸功能的显示器件及其制作方法、显示装置 WO2016019660A1 (zh)

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