WO2016123932A1 - 彩膜基板及显示装置 - Google Patents

彩膜基板及显示装置 Download PDF

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Publication number
WO2016123932A1
WO2016123932A1 PCT/CN2015/085283 CN2015085283W WO2016123932A1 WO 2016123932 A1 WO2016123932 A1 WO 2016123932A1 CN 2015085283 W CN2015085283 W CN 2015085283W WO 2016123932 A1 WO2016123932 A1 WO 2016123932A1
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WO
WIPO (PCT)
Prior art keywords
color filter
layer
touch electrode
black matrix
touch
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PCT/CN2015/085283
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English (en)
French (fr)
Inventor
曲连杰
杨莉
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/022,507 priority Critical patent/US10503290B2/en
Publication of WO2016123932A1 publication Critical patent/WO2016123932A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of display, and in particular, to a color film substrate and a display device.
  • the touch screen can be divided into: an external touch screen, a cover surface touch screen, and an in-cell touch screen according to the composition structure.
  • the in-cell touch panel embeds the touch electrode of the touch screen in the interior of the liquid crystal display, which can reduce the overall thickness of the module, and can greatly reduce the manufacturing cost of the touch screen, and is favored by various panel manufacturers.
  • a structure of a conventional in-cell touch panel is as shown in FIG. 1.
  • the driving electrode 500' is disposed on one side of the array substrate 200' (TFT substrate), and the sensing electrode 400' is disposed on the color filter substrate 100.
  • On the '(CF) side in addition, in order to prevent interference of an external signal, a side of the color filter substrate 100' away from the liquid crystal layer 300' is further provided with a high resistance film layer 600'.
  • the touch electric field between the driving electrode 500' and the sensing electrode 400' passes through the liquid crystal layer 300', and the deflection of the liquid crystal molecules in the liquid crystal layer is controlled by the display electric field between the pixel electrode and the common electrode. , thereby causing the interaction between the touch electric field and the display electric field.
  • the technical solution of the present invention provides a color film substrate including a substrate substrate, and a black matrix layer and a color filter layer disposed on the substrate, wherein the substrate is further A first touch electrode and a second touch electrode for forming a touch electric field are disposed.
  • the first touch electrode is a part of any one of the black matrix layer and the color filter layer, and the first touch electrode is insulated from other parts of the any structure. .
  • the first touch electrode is a part of a black matrix layer
  • the color filter layer includes a first color filter layer that is electrically conductive in the first color sub-pixel region
  • the second touch electrode is a portion of the first color filter layer
  • the second touch electrode is insulated from other portions of the first color filter layer, in the second touch electrode, the first Color filter layers are also formed at positions corresponding to the black matrix in the black matrix layer to connect the first color sub-pixel regions.
  • the black matrix layer and the color filter layer are formed on the same side of the base substrate, and the color filter layer further includes a second color filter layer that is insulated and located in the second color sub-pixel region.
  • the second color filter layer is further formed on the black matrix in the black matrix layer and located between the black matrix layer and the first color filter layer as the first touch An insulating layer between the electrode and the second touch electrode.
  • the black matrix layer and the color filter layer are respectively formed on opposite sides of the base substrate.
  • the material of the black matrix layer is a ferrous metal or a black resin doped with a conductive material
  • the material of the first color filter layer is a colored resin doped with a conductive material
  • the black resin and the conductive material doped in the color resin include at least one of the following: silver nanowires, carbon nanotubes, and indium tin oxide.
  • the method further includes a protective layer formed on the color filter layer and electrically conductive, the first touch electrode being a part of the protective layer, and the first touch electrode and the protective layer Other parts are insulated.
  • the black matrix layer, the color filter layer, and the protective layer are sequentially disposed on the color filter substrate, and the second touch electrode is a part of the black matrix layer, and the The two touch electrodes are insulated from the other portions of the black matrix layer, and the color filter layer is further formed between the first touch electrode and the second touch electrode as an insulating layer.
  • the present invention also provides a display device comprising any of the above color film substrates.
  • the color film substrate provided by the present invention is formed on the color film substrate by the first touch electrode and the second touch electrode, so that the touch electric field generated by the first touch electrode and the second touch electrode is away from the liquid crystal layer. Thereby reducing the interaction between the touch electric field and the display electric field.
  • FIG. 1 is a schematic view of an in-cell touch panel in the prior art
  • FIG. 2 is a schematic view of a color filter substrate provided by an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of a multiplexed black matrix layer as a touch electrode according to an embodiment of the present invention
  • FIG. 4 is a schematic diagram of a multiplexed color filter layer as a touch electrode according to an embodiment of the present invention
  • FIG. 5 is a schematic view of another color film substrate provided by an embodiment of the present invention.
  • FIG. 6 is a schematic view of still another color film substrate provided by an embodiment of the present invention.
  • FIG. 7 is a schematic diagram of a multiplexing protection layer provided as a touch electrode according to an embodiment of the present invention.
  • FIG. 8 is a schematic diagram of a display device according to an embodiment of the present invention.
  • FIG. 2 is a schematic view of a color filter substrate including a base substrate 101, and a black matrix layer 102 and a color filter layer 103 disposed on the base substrate, wherein the color film substrate is provided by the embodiment of the present invention.
  • the first touch electrode 400 and the second touch electrode 500 for forming a touch electric field are further disposed on the base substrate 101.
  • first touch electrode 400 and the second touch electrode 500 may be stacked on the color filter layer 103, and an insulation is formed between the first touch electrode 400 and the second touch electrode 500.
  • the shape of the first touch electrode and the second touch electrode may be set according to specific conditions, which is not specifically limited in the present invention.
  • the color film substrate provided by the embodiment of the present invention is formed on the color film substrate by the first touch electrode 400 and the second touch electrode 500, so that the first touch electrode 400 and the second touch electrode 500 are touched.
  • the control electric field is away from the liquid crystal layer, thereby reducing the interaction between the touch electric field and the display electric field.
  • any one of the first touch electrode 400 and the second touch electrode may be a touch sensing electrode (Rx) or a touch driving electrode (Tx).
  • the first touch electrode When the touch sensing electrode is the touch sensing electrode, the second touch electrode 500 is a touch driving electrode.
  • the first touch electrode 400 is a touch driving electrode, the second touch electrode 500 is a touch sensing electrode.
  • the touch electrodes may be separately formed by an additional process.
  • the color film may be reused.
  • the existing structure in the substrate serves as a touch electrode.
  • any one of the first touch electrode 400 and the second touch electrode 500 may be composed of the black matrix layer 102 or a part of the color filter layer 103, and the black matrix layer 102 or The other portions of the color filter layer 103 are insulated.
  • a method of multiplexing a black matrix layer as a touch electrode can be employed.
  • the black matrix layer on the color filter substrate may be partitioned, as shown in FIG. 3, the black matrix layer 102 may be divided into a first region 1021, a second region 1022, and a third region 1023, for example,
  • the second region 1022 of the black matrix layer 102 is used as the first touch electrode 400, and the second region 1022 of the black matrix layer 102 and the first region 1021 of the black matrix layer 102 and the third region 1023 of the black matrix layer 102 are formed. Insulation setting.
  • the black matrix layer 102 may be made of a black metal (such as iron, chromium, etc.) or a black resin doped with a conductive material, which may be silver nanowires, carbon nanotubes, indium tin oxide (ITO). And the like, for example, ITO chips can be incorporated into a black resin as a material for forming the black matrix layer.
  • a black metal such as iron, chromium, etc.
  • a black resin doped with a conductive material which may be silver nanowires, carbon nanotubes, indium tin oxide (ITO).
  • ITO indium tin oxide
  • a method of multiplexing a color filter layer as a touch electrode may also be employed.
  • the color filter layer 103 on the color filter substrate can also be partitioned, for example, for the existing RGB mode color filter substrate, wherein the color filter layer 103 includes red disposed in the red sub-pixel region. a filter layer, a green filter layer disposed in the green sub-pixel region, and a blue filter layer disposed in the blue sub-pixel region, wherein a filter layer of one of the colors can be multiplexed as a touch electrode, for example, if By using the red filter layer as the first touch electrode, the red filter layer can be formed by adding a conductive material to the red resin.
  • the red filter layer is electrically conductive, and then The red filter layer is partitioned and the partition as a touch electrode is insulated from other partitions.
  • the touch electrode as shown in FIG. 4, the red filter layer is not only disposed on the red sub-pixel region, but also can be covered.
  • the red sub-pixel regions are connected to form a single body on the black matrix of the black matrix layer.
  • the first touch electrode 400 and the second touch electrode 500 can be obtained by multiplexing the existing structure in the color filter substrate.
  • FIG. 5 is provided by the embodiment of the present invention.
  • Another schematic diagram of a color filter substrate comprising a base substrate 101, and a black matrix layer 102 and a color filter layer 103 disposed on the base substrate 101, the black matrix layer 102 and the color filter layer 103 are formed.
  • the first touch electrode for forming a touch electric field is composed of a portion of the black matrix layer 102, and the first touch electrode is insulated from other portions of the black matrix layer 102.
  • the specific setting method can be as shown in Figure 3.
  • the color filter layer 103 includes a first color filter layer 1031 that is electrically conductive in the first color sub-pixel region, and a second color filter layer 1032 that is in the second color sub-pixel region and is insulated for forming a touch electric field.
  • the second touch electrode 500 is formed by a portion of the first color filter layer 1031, and the second touch electrode 500 is insulated from the other portions of the first color filter layer 1031.
  • the first color filter layer is further formed at a position corresponding to the black matrix in the black matrix layer to connect the first color sub-pixel regions, and the specific arrangement manner is as shown in FIG. Show.
  • the second color filter layer 1032 is further formed on the black matrix in the black matrix layer 102 and located in the black matrix layer 102 and the The first color filter layer 1031 is used as an insulating layer between the first touch electrode 400 and the second touch electrode 500.
  • the second color filter layer is not only disposed in the second color.
  • the sub-pixel area is further disposed at a portion where the first touch electrode 400 and the second touch electrode 500 overlap, so as to maintain insulation between the first touch electrode 400 and the second touch electrode 500 to form a touch electric field. .
  • the material of the black matrix layer 102 may be a ferrous metal or a black resin doped with a conductive material
  • the material of the first color filter layer may be a color resin doped with a conductive material
  • the conductive material may be Silver nanowires, carbon nanotubes, indium tin oxide, etc., for example, ITO chips or conductive particles formed of carbon nanotubes can be incorporated into a resin of a corresponding color as a material for forming the first color filter layer.
  • a black matrix layer can be first formed by using a conductive material, and the black matrix layer is multiplexed as a touch sensing electrode, and then a mask of the red sub-pixel (MASK) is changed and deposited.
  • a layer of non-conductive red resin to form a red filter layer the red filter layer is multiplexed as an insulating layer between the touch sensing electrode and the touch driving electrode, and then a green filter layer and a blue filter layer are formed. And multiplex one of them as a touch drive electrode.
  • the black matrix layer 102 and the color filter layer 103 are formed on the same side of the base substrate 101, and the color filter layer is used as the insulation between the first touch electrode 400 and the second touch electrode 500.
  • the black matrix layer 102 and the color filter layer 103 may be respectively formed on opposite sides of the base substrate 101.
  • the black matrix layer 102 may be formed on the side of the base substrate 101 away from the liquid crystal layer.
  • the color filter layer 103 is formed on the side of the base substrate 101 close to the liquid crystal layer, so that the base substrate 101 is used as an insulating layer between the first touch electrode 400 and the second touch electrode 500.
  • FIG. 6 is a schematic diagram of still another color film substrate according to an embodiment of the present invention.
  • the color film substrate includes a base substrate 101, and a black matrix layer 102 and a color filter layer 103 are sequentially disposed on the base substrate. And a protective layer (OC layer) 104 formed on the color filter layer 103 and electrically conductive, wherein the first touch electrode 400 is formed by a portion of the protective layer 104, and the first touch electrode 400 and the The other portions of the protective layer 104 are insulated.
  • OC layer protective layer
  • the second touch electrode 500 may be formed by a portion of the black matrix layer 102, and the second touch electrode 500 is insulated from other portions of the black matrix layer 102, and the color filter layer 103 is further
  • the first touch electrode 400 and the second touch electrode 500 are formed as an insulating layer.
  • the material thereof can be obtained by adding a conductive material (such as silver nanowire or ITO, etc.) to a material (such as a resin material) of the existing protective layer, and the electrical resistance thereof can be changed by changing the conductive material. The amount of addition is adjusted.
  • a conductive material such as ITO
  • the protective layer can also be partitioned, for example.
  • the protective layer may be in the shape of a slit and arranged alternately, one part is energized, the other part is not energized, and the energized part is used as the first touch electrode. For example, as shown in FIG.
  • the protective layer 104 is divided into the first area 1041.
  • the second region 1042 and the third region 1043 may have the second region 1042 of the protective layer 104 as the first touch electrode, and the second region 1042 of the protective layer 104 and the first region 1041 and the protective layer 104 of the protective layer 104.
  • the third region 1043 is provided with an insulating layer, wherein the method for fabricating the protective layer may be, for example, wet etching and dry etching, depending on materials, and since the protective layer has relatively high light transmittance,
  • the area is covered on the color film substrate, so as to play a role like a high-resistance film, which can prevent external signal interference and realize the built-in of the high-resistance film layer, thereby achieving the multiplexed protective layer as the first touch electrode and the high-resistance film layer. Dual purpose.
  • the material may be ferrous metal or black resin doped with a conductive material, and multiplexing it as the second touch electrode is the same as that shown in FIG. 3, for example, the black matrix layer may be horizontal or vertical.
  • the partition is selected, and then the partition is selected to be connected to the board, and is energized during the touch phase, as the second touch electrode, and is not energized during the non-touch phase.
  • the material may still be a conventional color resin material. Due to the insulation property of the resin material, a color filter layer may be formed on the first touch electrode and the second touch electrode. Thus as an insulating layer.
  • the color film substrate provided by the embodiment of the present invention is formed on the color film substrate by the first touch electrode and the second touch electrode, so that the touch electric field generated by the first touch electrode and the second touch electrode is no longer Through the liquid crystal layer, the interaction between the touch electric field and the display electric field is reduced, and further, by manufacturing the touch electrode by multiplexing the structure in the color film, the manufacturing process and cost of the built-in touch screen can be reduced, and, due to the above protective layer
  • the black matrix layer is charged, so it can also prevent external interference, improve the signal-to-noise ratio, and eliminate the need to separately create a high-resistance film layer to prevent external signal interference, greatly reducing the process complexity of the built-in touch screen. .
  • an embodiment of the present invention further provides a display device including the above color film substrate.
  • the display device provided by the embodiment of the present invention may be any product or component having a display function such as a notebook computer display screen, a liquid crystal display, a liquid crystal television, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • FIG. 8 is a schematic diagram of a display device according to an embodiment of the present invention.
  • the display device includes a color filter substrate 100 , an array substrate 200 , and a liquid crystal layer 300 between the two substrates.
  • the color filter substrate 100 includes a lining. a bottom substrate 101, a black matrix layer 102 and a color filter layer 103 sequentially disposed on the base substrate 101, and a protective layer (OC layer) 104 formed on the color filter layer 103 and electrically conductive, wherein
  • the touch electrode is formed by a portion of the protective layer 104, and the first touch electrode is insulated from the other portions of the protective layer 104.
  • the second touch electrode is formed by a portion of the black matrix layer 102, and the second touch electrode and the black matrix The other portion of the layer 102 is insulated.
  • the color filter layer 103 is also formed between the first touch electrode and the second touch electrode as an insulating layer.
  • the touch electric field generated by the first touch electrode and the second touch electrode is away from the liquid crystal layer 300 , thereby reducing the interaction between the touch electric field and the display electric field.

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Abstract

一种彩膜基板及显示装置，包括衬底基板(101)，以及设置在衬底基板(101)上的黑矩阵层(102)和彩色滤光层(103)，衬底基板(101)上还设置有用于形成触控电场的第一触控电极(400)和第二触控电极(500)。该彩膜基板，通过将触控电极均形成在彩膜基板上，使得触控电极产生的触控电场远离液晶层，从而降低触控电场与显示电场之间的相互影响。

Description

彩膜基板及显示装置
本申请要求于2015年2月6日递交中国专利局的、申请号为201510065367.6的中国专利申请的权益，该申请的全部公开内容以引用方式并入本文。
技术领域
本发明涉及显示领域，尤其涉及一种彩膜基板及显示装置。
背景技术
随着显示技术的飞速发展，触摸屏已经逐渐遍及人们的生活中。目前，触摸屏按照组成结构可以分为：外挂式触摸屏、覆盖表面式触摸屏、以及内嵌式触摸屏。其中，内嵌式触摸屏将触摸屏的触控电极内嵌在液晶显示屏内部，可以减薄模组整体的厚度，又可以大大降低触摸屏的制作成本，受到各大面板厂家青睐。
传统的内嵌式触摸屏所采用的一种方案的结构如图1所示，将驱动电极500’设置在阵列基板200’(TFT基板)一侧，而将感应电极400’设置在彩膜基板100’(CF)一侧，此外，为防止外部信号的干扰，彩膜基板100’远离液晶层300’的一侧还设置有高阻膜层600’。然而，在上述结构中，驱动电极500’与感应电极400’间的触控电场都要经过液晶层300’，而液晶层中液晶分子的偏转则由像素电极与公共电极之间的显示电场控制，从而造成了触控电场与显示电场之间的相互影响。
发明内容
为解决上述技术问题，本发明的技术方案提供了一种彩膜基板，包括衬底基板，以及设置在衬底基板上的黑矩阵层和彩色滤光层，其中，所述衬底基板上还设置有用于形成触控电场的第一触控电极和第二触控电极。
进一步地，所述第一触控电极为所述黑矩阵层与所述彩色滤光层中任一结构的一部分，且所述第一触控电极与所述任一结构中的其他部分绝缘设置。
进一步地，所述第一触控电极为黑矩阵层中的一部分，所述彩色滤光层包括位于第一颜色子像素区域且导电的第一颜色滤光层，所述第二触控电极为所述第一颜色滤光层中的一部分，且所述第二触控电极与所述第一颜色滤光层中的其他部分绝缘设置，在所述第二触控电极中，所述第一颜色滤光层还形成在所述黑矩阵层中的黑矩阵对应的位置上以使各第一颜色子像素区域相连接。
进一步地，所述黑矩阵层与所述彩色滤光层形成在所述衬底基板的同一侧，所述彩色滤光层还包括位于第二颜色子像素区域且绝缘的第二颜色滤光层，在所述第二触 控电极中，所述第二颜色滤光层还形成在所述黑矩阵层中的黑矩阵上且位于所述黑矩阵层与所述第一颜色滤光层之间作为所述第一触控电极与第二触控电极之间的绝缘层。
进一步地，所述黑矩阵层与所述彩色滤光层分别形成在所述衬底基板相对的两侧。
进一步地，所述黑矩阵层的材料为黑色金属或者掺杂有导电材料的黑色树脂，所述第一颜色滤光层的材料为掺杂有导电材料的彩色树脂。
进一步地，所述黑色树脂和所述彩色树脂中掺杂的导电材料至少包括以下的一种：银纳米线、碳纳米管、氧化铟锡。
进一步地，还包括形成在所述彩色滤光层上且导电的保护层，所述第一触控电极为所述保护层的一部分，且所述第一触控电极与所述保护层中的其他部分绝缘设置。
进一步地，所述黑矩阵层、所述彩色滤光层、所述保护层依次设置在所述彩膜基板上，所述第二触控电极为所述黑矩阵层的一部分，且所述第二触控电极与所述黑矩阵层中的其他部分绝缘设置，所述彩色滤光层还形成在所述第一触控电极与所述第二触控电极之间作为绝缘层。
为解决上述技术问题，本发明还提供了一种显示装置，包括上述任一的彩膜基板。
本发明提供的彩膜基板，通过将第一触控电极和第二触控电极均形成在彩膜基板上，使得第一触控电极和第二触控电极产生的触控电场远离液晶层，从而降低触控电场与显示电场之间的相互影响。
附图说明
图1是现有技术中的内嵌式触摸屏的示意图；
图2是本发明实施方式提供的一种彩膜基板的示意图；
图3是本发明实施方式提供的复用黑矩阵层作为触控电极的示意图；
图4是本发明实施方式提供的复用彩色滤光层作为触控电极的示意图；
图5是本发明实施方式提供的另一种彩膜基板的示意图；
图6是本发明实施方式提供的又一种彩膜基板的示意图；
图7是本发明实施方式提供的复用保护层作为触控电极的示意图；
图8是本发明实施方式提供的一种显示装置的示意图。
具体实施方式
下面结合附图和实施例，对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明，但不用来限制本发明的范围。
另外，在下面的详细描述中，为便于解释，阐述了许多具体的细节以提供对本披露实施例的全面理解。然而明显地，一个或多个实施例在没有这些具体细节的情况下也可以被实施。在其他情况下，公知的结构和装置以图示的方式体现以简化附图。
图2是本发明实施方式提供的一种彩膜基板的示意图，该彩膜基板包括衬底基板101，以及设置在衬底基板上的黑矩阵层102和彩色滤光层103，其中，所述衬底基板101上还设置有用于形成触控电场的第一触控电极400和第二触控电极500。
在一示例中，第一触控电极400和第二触控电极500可以层叠地设置在彩色滤光层103上，在第一触控电极400与第二触控电极500之间还形成有绝缘层600。其中，第一触控电极和第二触控电极的形状可以根据具体情况而设置，本发明对此不作具体限定。
本发明实施方式提供的彩膜基板，通过将第一触控电极400和第二触控电极500均形成在彩膜基板上，使得第一触控电极400和第二触控电极500产生的触控电场远离液晶层，从而降低触控电场与显示电场之间的相互影响。
在实施例中，第一触控电极400和第二触控电极中的任一个可以为触控感应电极(Rx)，也可以为触控驱动电极(Tx)，然而，当第一触控电极400为触控感应电极时，第二触控电极500为触控驱动电极，当第一触控电极400为触控驱动电极时，第二触控电极500为触控感应电极。
在本发明的实施方式提供的彩膜基板中，触控电极(包括第一触控电极400和第二触控电极500)可以通过另外增设的工艺单独形成，作为示例，也可以复用彩膜基板中现有的结构作为触控电极。
例如，所述第一触控电极400和第二触控电极500中的任一个可以由所述黑矩阵层102或所述彩色滤光层103的一部分构成，且与所述黑矩阵层102或所述彩色滤光层103中的其他部分绝缘设置。
作为示例，可以采用复用黑矩阵层作为触控电极的方式。在该示例中，可以将彩膜基板上的黑矩阵层分区设置，如图3所示，可将黑矩阵层102分为第一区1021、第二区1022和第三区1023，例如，可以将黑矩阵层102的第二区1022作为上述第一触控电极400，并使黑矩阵层102的第二区1022与黑矩阵层102的第一区1021、黑矩阵层102的第三区1023绝缘设置。作为示例，该黑矩阵层102可以由黑色金属(如铁、铬等)或者掺杂有导电材料的黑色树脂制作而成，该导电材料可以为银纳米线、碳纳米管、氧化铟锡(ITO)等，例如，可将ITO碎片掺入黑色树脂中作为制作该黑矩阵层的材料。
作为示例，也可以采用复用彩色滤光层作为触控电极的方式。在该示例中，同样可以将彩膜基板上的彩色滤光层103分区设置，例如，对于现有的RGB模式的彩膜基板，其中的彩色滤光层103包括设置在红色子像素区域的红色滤光层，设置在绿色子像素区域的绿色滤光层以及设置在蓝色子像素区域的蓝色滤光层，则可以复用其中一种颜色的滤光层作为触控电极，例如，若利用红色滤光层作为第一触控电极，则可以在红色树脂中添加导电材料制作该红色滤光层，例如，可以在红色树脂中添加银纳米线、碳纳米管、氧化铟锡(ITO)等材料，从而使该红色滤光层具备导电性，而后可将 该红色滤光层分区设置，并使作为触控电极的分区与其他分区绝缘设置，在触控电极中，如图4所示，红色滤光层不但设置在红色子像素区域上，还可以覆盖在黑矩阵层的黑矩阵上从而使各红色子像素区域相连接形成一体。
在本发明的一实施例中，第一触控电极400和第二触控电极500均可以通过复用彩膜基板中现有的结构得到，参见图5，图5是本发明实施方式提供的另一种彩膜基板的示意图，该彩膜基板包括衬底基板101，以及设置在衬底基板101上的黑矩阵层102和彩色滤光层103，黑矩阵层102与彩色滤光层103形成在衬底基板101的同一侧，其中，用于形成触控电场的第一触控电极由黑矩阵层102的一部分构成，并且第一触控电极与黑矩阵层102的其他部分绝缘设置，其具体设置方式可如图3所示。
彩色滤光层103包括位于第一颜色子像素区域且导电的第一颜色滤光层1031，以及位于第二颜色子像素区域且绝缘的第二颜色滤光层1032，用于形成触控电场的第二触控电极500由第一颜色滤光层1031的一部分构成，且所述第二触控电极500与所述第一颜色滤光层1031的其他部分绝缘设置，在所述第二触控电极500中，所述第一颜色滤光层还形成在与所述黑矩阵层中的黑矩阵对应的位置上以使各第一颜色子像素区域相连接，其具体设置方式可如图4所示。
在所述第二触控电极500中，如图5所示，所述第二颜色滤光层1032还形成在所述黑矩阵层102中的黑矩阵上且位于所述黑矩阵层102与所述第一颜色滤光层1031之间作为所述第一触控电极400与第二触控电极500之间的绝缘层，在该实施方式中，第二颜色滤光层不仅设置在第二颜色子像素区域上，还设置在第一触控电极400与第二触控电极500交叠的部分，从而使第一触控电极400与第二触控电极500之间保持绝缘以形成触控电场。作为示例，黑矩阵层102的材料可以为黑色金属或者掺杂有导电材料的黑色树脂，第一颜色滤光层的材料可以为掺杂有导电材料的彩色树脂，其中，上述的导电材料可以为银纳米线、碳纳米管、氧化铟锡等，例如，可将ITO碎片或者由碳纳米管形成的导电粒子掺入相应颜色的树脂中作为制作该第一颜色滤光层的材料。
例如，对于现有的RGB模式的彩膜基板，首先可以采用导电材料制作黑矩阵层，并复用该黑矩阵层作为触控感应电极，而后改变红色子像素的掩膜版(MASK)，沉积一层不导电的红色树脂以形成红色滤光层，复用该红色滤光层作为触控感应电极和触控驱动电极之间的绝缘层，再制作绿色滤光层和蓝色滤光层，并复用其中之一作为触控驱动电极。
上述实施方式中，黑矩阵层102与彩色滤光层103形成在衬底基板101的同一侧，其通过利用彩色滤光层作为第一触控电极400与第二触控电极500之间的绝缘层，此外，还可将黑矩阵层102与彩色滤光层103分别形成在衬底基板101相对的两侧，例如可以将黑矩阵层102制作在衬底基板101远离液晶层的一侧，将彩色滤光层103制作在衬底基板101靠近液晶层的一侧，从而利用衬底基板101作为第一触控电极400与第二触控电极500之间的绝缘层。
参见图6，图6是本发明实施方式提供的又一种彩膜基板的示意图，该彩膜基板包括衬底基板101，依次设置在衬底基板上的黑矩阵层102和彩色滤光层103，以及形成在所述彩色滤光层103上且导电的保护层(OC层)104，其中，第一触控电极400由保护层104的一部分构成，且所述第一触控电极400与所述保护层104的其他部分绝缘设置。
所述第二触控电极500可以由所述黑矩阵层102的一部分构成，且所述第二触控电极500与所述黑矩阵层102的其他部分绝缘设置，所述彩色滤光层103还形成在所述第一触控电极400与所述第二触控电极500之间作为绝缘层。
具体地，对于上述的保护层104，其材料可以通过在现有制作保护层的材料(如树脂材料)中添加导电材料(如银纳米线或者ITO等)得到，其电阻可通过改变导电材料的添加量进行调节，此外，还可以直接采用导电材料(如ITO)作为该保护层的制作材料，对于复用该保护层作为第一触控电极的方式，同样可将该保护层分区设置，例如，该保护层可呈狭缝状，并隔行设置，一部分通电，另一部分不通电，通电部分作为第一触控电极，例如，如图7所示，将保护层104分为第一区1041、第二区1042、第三区1043，可将保护层104的第二区1042作为第一触控电极，并使保护层104的第二区1042与保护层104的第一区1041、保护层104的第三区1043绝缘设置，其中，制作该保护层的方法可以采用例如湿法刻蚀和干法刻蚀，具体视材料而定，另外，由于保护层具有比较高的透光率，因此可以大面积覆盖在彩膜基板上，从而起到类似高阻膜的作用能够防止外部信号的干扰，实现高阻膜层的内置，从而达到复用保护层作为第一触控电极、高阻膜层的双重目的。
对于黑矩阵层102，其材料可以为黑色金属或者掺杂有导电材料的黑色树脂，复用其作为第二触控电极与图3所示的方式相同，例如，可将黑矩阵层横向或者竖向分区，而后选择其中的分区与电路板连接，在触摸阶段通电，作为第二触控电极，在非触摸阶段不通电。
对于彩色滤光层103，其材料仍可采用现有的彩色树脂材料，由于树脂材料的绝缘性，可使彩色滤光层形成在所述第一触控电极与所述第二触控电极之间从而作为绝缘层。
本发明实施方式提供的彩膜基板，通过将第一触控电极和第二触控电极均形成在彩膜基板上，使得第一触控电极和第二触控电极产生的触控电场不再经过液晶层，从而降低触控电场与显示电场之间的相互影响，此外，通过复用彩膜中的结构制作触控电极，可以减少内置触摸屏的制作工艺和成本，并且，由于上述的保护层和黑矩阵层带电，因此还可以起到防止外界干扰的目的，提高信噪比，而不必再单独制作一层高阻膜层防止外界信号的干扰，极大的降低了内置触摸屏的工艺复杂度。
此外，本发明实施方式还提供了一种显示装置，包括上述的彩膜基板。本发明实施方式提供的显示装置可以是笔记本电脑显示屏、液晶显示器、液晶电视、数码相框、手机、平板电脑等任何具有显示功能的产品或部件。
参见图8，图8是本发明实施方式提供的一种显示装置的示意图，该显示装置包括彩膜基板100、阵列基板200以及两基板之间的液晶层300，其中，彩膜基板100包括衬底基板101，依次设置在衬底基板101上的黑矩阵层102和彩色滤光层103，以及形成在所述彩色滤光层103上且导电的保护层(OC层)104，其中，第一触控电极由保护层104的一部分构成，且第一触控电极与保护层104的其他部分绝缘设置，第二触控电极由黑矩阵层102的一部分构成，且第二触控电极与黑矩阵层102的其他部分绝缘设置，彩色滤光层103还形成在第一触控电极与第二触控电极之间作为绝缘层。
参见图8，由于第一触控电极与所述第二触控电极产生的触控电场远离液晶层300，从而降低触控电场与显示电场之间的相互影响。
以上实施方式仅用于说明本发明，而并非对本发明的限制，有关技术领域的普通技术人员，在不脱离本发明的精神和范围的情况下，还可以做出各种变化和变型，因此所有等同的技术方案也属于本发明的范畴，本发明的专利保护范围应由权利要求限定。

Claims (10)

  1. 一种彩膜基板，包括：
    衬底基板，以及
    设置在衬底基板上的黑矩阵层和彩色滤光层，
    其中，所述衬底基板上还设置有用于形成触控电场的第一触控电极和第二触控电极。
  2. 根据权利要求1所述的彩膜基板，其中，所述第一触控电极或第二触控电极由所述黑矩阵层或所述彩色滤光层的一部分构成，且所述第一触控电极或第二触控电极与所述黑矩阵层或所述彩色滤光层的其他部分绝缘设置。
  3. 根据权利要求1或2所述的彩膜基板，其中，所述第一触控电极由黑矩阵层的一部分构成，所述彩色滤光层包括位于第一颜色子像素区域且导电的第一颜色滤光层，所述第二触控电极由所述第一颜色滤光层的一部分构成，且所述第二触控电极与所述第一颜色滤光层的其他部分绝缘设置，在所述第二触控电极中，所述第一颜色滤光层还形成在与所述黑矩阵层中的黑矩阵对应的位置上以使各第一颜色子像素区域相连接。
  4. 根据权利要求3所述的彩膜基板，其中，所述黑矩阵层与所述彩色滤光层形成在所述衬底基板的同一侧，所述彩色滤光层还包括位于第二颜色子像素区域且绝缘的第二颜色滤光层，在所述第二触控电极中，所述第二颜色滤光层还形成在所述黑矩阵层中的黑矩阵上且位于所述黑矩阵层与所述第一颜色滤光层之间作为所述第一触控电极与第二触控电极之间的绝缘层。
  5. 根据权利要求1-3中任一项所述的彩膜基板，其中，所述黑矩阵层与所述彩色滤光层分别形成在所述衬底基板相对的两侧。
  6. 根据权利要求3所述的彩膜基板，其中，所述黑矩阵层的材料为黑色金属或者掺杂有导电材料的黑色树脂，所述第一颜色滤光层的材料为掺杂有导电材料的彩色树脂。
  7. 根据权利要求6所述的彩膜基板，其中，所述黑色树脂和所述彩色树脂中掺杂的导电材料至少包括以下的一种：银纳米线、碳纳米管、氧化铟锡。
  8. 根据权利要求1所述的彩膜基板，还包括形成在所述彩色滤光层上且导电的保护层，所述第一触控电极由所述保护层的一部分构成，且所述第一触控电极与所述保护层的其他部分绝缘设置。
  9. 根据权利要求8所述的彩膜基板，其中，所述黑矩阵层、所述彩色滤光层、所述保护层依次设置在所述彩膜基板上，所述第二触控电极由所述黑矩阵层的一部分构成，且所述第二触控电极与所述黑矩阵层的其他部分绝缘设置，所述彩色滤光层形成在所述第一触控电极与所述第二触控电极之间作为绝缘层。
  10. 一种显示装置，包括如权利要求1-9任一项所述的彩膜基板。
PCT/CN2015/085283 2015-02-06 2015-07-28 彩膜基板及显示装置 WO2016123932A1 (zh)

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