WO2015117468A1 - 触摸屏及其制作方法、触摸显示装置 - Google Patents

触摸屏及其制作方法、触摸显示装置 Download PDF

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Publication number
WO2015117468A1
WO2015117468A1 PCT/CN2014/092038 CN2014092038W WO2015117468A1 WO 2015117468 A1 WO2015117468 A1 WO 2015117468A1 CN 2014092038 W CN2014092038 W CN 2014092038W WO 2015117468 A1 WO2015117468 A1 WO 2015117468A1
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Prior art keywords
transparent conductive
conductive layer
layer
patterned transparent
patterned
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PCT/CN2014/092038
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English (en)
French (fr)
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刘国冬
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京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Priority to US14/769,217 priority Critical patent/US9886148B2/en
Publication of WO2015117468A1 publication Critical patent/WO2015117468A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04104—Multi-touch detection in digitiser, i.e. details about the simultaneous detection of a plurality of touching locations, e.g. multiple fingers or pen and finger
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0108—Transparent
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/032—Materials
    • H05K2201/0326—Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10128—Display
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4647—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer around previously made via studs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/467—Adding a circuit layer by thin film methods

Definitions

  • the present invention relates to the field of display, and in particular, to a touch screen, a method of manufacturing the same, and a touch display device.
  • Touch displays have grown rapidly and have evolved into mainstream flat panel displays. At present, touch displays are mostly made by a touch screen with touch function on the display panel, and the touch screen mostly uses capacitive sensing. When a finger (or other object) approaches or touches, it affects the intersection near the touch point. The capacitance between the drive line and the sense line identifies the position of the touch point by detecting a change in capacitance between the drive line and the sense line.
  • OGS glass solution
  • OGS is a technology that directly forms a protective film and a sensing layer on the protective glass of the display panel.
  • One piece of glass can simultaneously serve the dual functions of protection and touch sensors.
  • OGS technology has the following advantages: simple structure, light, thin, good light transmission, and saves production cost and improves product yield by eliminating a transparent substrate and bonding process.
  • the mainstream OGS touch screen structure is basically formed by the same layer of the driving line and the sensing line, one of which is a continuous structure, and the other is a structure in which metal bridges (or ITO bridges) are connected to each other.
  • the coating process in the preparation of metal bridges is one of the factors leading to complicated processes and difficult product quality control, and this bridge structure is prone to breakdown due to electrostatic discharge (ESD), which affects touch function.
  • ESD electrostatic discharge
  • the metal bridge structure is easier to see the whitening of the metal connecting line under illumination, which affects the transmittance and display quality.
  • Embodiments of the present invention provide a touch screen, a manufacturing method thereof, and a touch display device, which do not require a bridge, have high transmittance, and have a simple process, which not only reduces production cost, but also has high mass production yield.
  • a touch screen may include: a transparent substrate, a first patterned transparent conductive layer, a patterned insulating layer and a second patterned transparent conductive layer, a first patterned transparent conductive layer, a patterned insulating layer, and a first a second patterned transparent conductive layer may be sequentially formed on the transparent Above the substrate, wherein
  • One of the first patterned transparent conductive layer and the second patterned transparent conductive layer is formed with a plurality of driving lines, and the other is formed with a plurality of sensing lines; the pattern of the patterned insulating layer and the first patterned The pattern of the transparent conductive layer is uniform or coincides with the pattern of the second patterned transparent conductive layer.
  • the touch screen may further include: a protective layer formed on the second patterned transparent conductive layer.
  • the touch screen may further include: a shadowing layer formed under the first patterned transparent conductive layer.
  • the touch screen may further include: a black matrix located at an edge of the touch screen to avoid edge leakage.
  • the black matrix may be formed on a transparent substrate and under the shadow mask.
  • the black matrix may be formed after the second transparent conductive layer and formed before the protective layer.
  • the transparent substrate may be a protective substrate of the display panel.
  • the patterned insulating layer may be formed of any one or more of the following materials: SiO 2 , SiNx, organic transparent insulating material.
  • the anti-shadow layer may include a Nb 2 O 5 film layer and a SiO 2 film layer, or the anti-shadow layer may include a Nb 2 O 5 film layer and a SiN x film layer.
  • the protective layer may be formed of any one or more of the following materials: OC, SiO 2 , SiNx.
  • An embodiment of the present invention further provides a touch display device, which may include any one of the aforementioned touch screens.
  • an embodiment of the present invention further provides a method for manufacturing a touch screen, including:
  • one step may form a plurality of driving lines, and the other step may form a plurality of sensing lines
  • the pattern of the patterned insulating layer formed is identical to the pattern of the first patterned transparent conductive layer or to the pattern of the second patterned transparent conductive layer.
  • the manufacturing method may further include: forming a second patterned transparent in the forming A step of forming a protective layer after the step of conducting the conductive layer.
  • the manufacturing method may further include a step of forming a shadowing layer before the step of forming the first patterned transparent conductive layer.
  • the manufacturing method may further include a process of forming a black matrix before the step of forming a protective layer.
  • forming the first by using a yellow light process or a laser etching process a patterned transparent conductive layer or the second patterned transparent conductive layer.
  • An embodiment of the present invention provides a touch screen, a method of manufacturing the same, and a touch display device.
  • the touch screen may include a first patterned transparent conductive layer, a patterned insulating layer, and a second patterned transparent conductive layer.
  • One of the first patterned transparent conductive layer and the second patterned transparent conductive layer is formed with a plurality of driving lines, the other is formed with a plurality of sensing lines, the first patterned transparent conductive layer and the second patterned
  • the transparent conductive layer may be separated by a patterned insulating layer, so that no bridge is required, and the transmittance is high; the pattern of the patterned insulating layer may be combined with the first patterned transparent conductive layer or the second patterned transparent conductive
  • the pattern of the layers is uniform, and the preparation can be formed by one patterning process, and the process is simple, which not only reduces the production cost, but also has high yield of mass production.
  • FIG. 1 is a cross-sectional view of a touch screen according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of a touch screen according to another embodiment of the present invention.
  • FIG. 3 is a flowchart of a method for manufacturing a touch screen according to an embodiment of the present invention
  • FIG. 4 is a flowchart of a method for manufacturing a touch screen according to another embodiment of the present invention.
  • the embodiment of the present invention provides a touch screen.
  • the cross-sectional view is as shown in FIG. 1.
  • the touch screen may include: a transparent substrate 100, a first patterned transparent conductive layer 400, a patterned insulating layer 500, and a second patterned transparent layer.
  • the conductive layer 600; the first patterned transparent conductive layer 400, the patterned insulating layer 500, and the second patterned transparent conductive layer 600 may be sequentially formed on the transparent substrate 100, and the first patterned transparent conductive layer 400 And a second patterned transparent conductive layer 600, one of which may be formed with a plurality of driving lines, and the other may be formed with a plurality of sensing lines; the pattern of the patterned insulating layer 500 may be combined with the second patterned transparent conductive layer The pattern of 600 is consistent.
  • the first patterned transparent conductive layer 400 and the second patterned transparent conductive layer 600 in this embodiment are respectively disposed via the patterned insulating layer 500, and one of the two layers (400 and 600) is formed if
  • the drive line is formed with a sensing line, and the specific pattern and design requirements may be any one known to those skilled in the art, except that the driving line and the sensing line are respectively formed in the respective film layers.
  • the drive line and the sense line may cross each other across the insulating layer. Therefore, there is no need to bridge and will not be described here.
  • the insulating layer 500 between the two layers (400 and 600) may also be patterned, and its pattern may be consistent with the pattern of the second patterned transparent conductive layer 600, that is, the insulating layer 500 may have a second patterning
  • the transparent conductive layer 600 has a uniform pattern.
  • the pattern of the insulating layer 500 may also coincide with the pattern of the first patterned transparent conductive layer 400.
  • the material of the insulating layer 500 may be SiO 2 , SiNx, or other organic or inorganic materials having insulating properties. Compared with the existing touch screen structure with a bridge structure, the touch screen of the embodiment has the following advantages:
  • the touch screen of the embodiment does not need to be provided with a bridge structure, so the transparent conductive layer (ITO) for forming the driving line and the sensing line does not need to climb, and the formed driving line and the sensing line have no bridging point (the contact point between the bridge and the ITO) ), can greatly improve the anti-static breakdown ability of the product;
  • ITO transparent conductive layer
  • the touch screen of the embodiment of the invention can effectively reduce or avoid the problem that the metal bridge structure can easily see the white connection of the metal connection line under illumination, and improve the display effect of the product;
  • the production process is simple, and there is no need to set up a metal bridge, so the metal film deposition process of metal bridge can be omitted, and the industry's usual ITO climbing problem will not occur.
  • the quality is easy to control, not only can reduce the production cost, but also improve the yield of mass production, stable product quality and improved production efficiency.
  • the touch screen of the embodiment may further include: a protective layer 700 formed on the second patterned transparent conductive layer 600.
  • the protective layer 700 can provide protection for the touch structure, and can be OC, SiO 2 , SiNx or other transparent inorganic or organic materials having insulating properties.
  • the full name of the above OC is Over Coat, which is a transparent insulating photoresist that protects the black matrix (BM), the metal layer, and the like and reduces the difference in height between the layers.
  • the touch screen may further include: a black matrix 200 located at an edge of the touch screen to avoid light leakage at the edge, which may be formed on the transparent substrate 100 and located under the first patterned transparent conductive layer 400.
  • the touch screen may further include: a shadowing layer 300 formed on the black matrix 200 and located under the first patterned transparent conductive layer 400.
  • the material of the anechoic layer 300 may be a Nb 2 O 5 and SiO 2 composite material or a Nb 2 O 5 and SiNx composite material.
  • the opaque layer 300 may include a Nb 2 O 5 film layer and a SiO 2 film layer, or The opaque layer 300 may include a Nb 2 O 5 film layer and a SiNx film layer, and the opaque layer 300 may also be another film layer having a shadow absorbing effect. Setting the erasing layer 300 can effectively improve the shading phenomenon of the touch screen under illumination and improve the display effect.
  • the above-mentioned color erasing layer 300 can be used as a shadow removing function under the first patterned transparent conductive layer 400.
  • the black matrix 200 can be formed on the transparent substrate 100 or formed on the first substrate. Any one of the patterned transparent conductive layer 400, the insulating layer 500, the second patterned transparent conductive layer 600, and the erasing layer 300 may be manufactured to meet the process requirements.
  • the black matrix 200 may be formed on the transparent substrate 100 and located below the erasing layer 300.
  • the erasing layer 300 may be a black matrix 200.
  • the process of forming the black matrix 200 is placed at the rear end, that is, the black matrix 200 is formed after the second transparent conductive layer 600 and before the protective layer 700.
  • the touch screen provided by the embodiment has the advantages of simple structure, no need for bypassing, strong antistatic breakdown capability, high transmittance, light weight and good display effect; and the production process is simple, and the ITO climbing problem in the industry does not occur.
  • the quality is easy to control, not only can reduce production costs, improve production efficiency, but also stable product quality and high yield of mass production.
  • FIG. 2 is a cross-sectional view of another touch screen according to another embodiment of the present invention, It differs from the touch screen structure shown in FIG. 1 in that a black matrix 200 located at the edge of the touch screen to avoid edge leakage is formed after the first patterned transparent conductive layer 400 and is formed before the patterned insulating layer 500.
  • the black matrix 200 is formed on the first patterned transparent conductive layer 400, and then the patterned insulating layer 500 is formed.
  • the image forming layer 300 is formed on the transparent substrate 100 and below the first patterned transparent conductive layer 400.
  • the black matrix 200 may be formed on the second patterned transparent conductive layer 600 and under the protective layer 700, that is, after the second patterned transparent conductive layer 600, the black matrix 200 is formed, and then formed.
  • Protective layer 700 may be formed on the second patterned transparent conductive layer 600 and under the protective layer 700, that is, after the second patterned transparent conductive layer 600, the black matrix 200 is formed, and then formed.
  • the touch screen provided by this embodiment of the present invention is substantially similar to the touch screen provided by the previous embodiment, and will not be described in detail.
  • the insulating layer 500 may be formed of any one or more of the following materials: SiO 2 , SiNx, organic transparent material.
  • the opaque layer 300 may be a composite film layer Nb 2 O 5 /SiO 2 or may be a composite film layer Nb 2 O 5 /SiNx.
  • the protective layer 700 may be formed of any one or more of the following materials: OC, SiO 2 , SiNx.
  • the touch screen structure provided in this embodiment may separately form a product having a touch function, such as a touch screen, or may be formed on the protection substrate of the display panel by using the OGS technology.
  • the transparent substrate described in this embodiment is the protective substrate of the display panel.
  • the touch screen provided by the embodiment has the advantages of simple structure, no need for bypassing, strong antistatic breakdown capability, high transmittance, light weight and good display effect; and the production process is simple, and the ITO climbing problem in the industry does not occur.
  • the quality is easy to control, not only can reduce production costs, improve production efficiency, but also stable product quality and high yield of mass production.
  • the embodiment of the invention further provides a touch display device, comprising: any one of the above touch screens.
  • the touch display device adopts the above-mentioned touch screen structure, and thus has the advantages of strong antistatic breakdown capability, high transmittance, light weight, and good display effect; and the production process is simple, and the ITO crawl of the industry is not present.
  • the slope problem, product quality is easy to control, not only can reduce production costs, improve production efficiency, and product quality is stable, high yield and high yield.
  • the display device may be any product or component having a touch function, such as a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a touch function such as a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • an embodiment of the present invention further provides a method for manufacturing a touch screen. As shown in FIG. 3, the method may include:
  • a plurality of driving lines may be formed in one step.
  • Another process may form a plurality of sensing lines; the pattern of the patterned insulating layer 500 formed by the process 102 may be consistent with the pattern of the first patterned transparent conductive layer 400, or may be combined with the second patterned transparent conductive layer 600. The pattern is consistent.
  • the touch screen manufacturing method provided by the embodiment has a simple production process, does not have the usual ITO climbing problem in the industry, and the product quality is easy to control, which not only reduces the production cost, improves the production efficiency, but also has stable product quality and high mass production yield. .
  • the touch screen manufacturing method may further include: 106, a step of forming a protective layer after the step 103 of forming the second patterned transparent conductive layer; 105, before the step 101 of forming the first patterned transparent conductive layer a step of forming a shadow layer; and may further include: 104, a step of forming a black matrix before or after any of the steps 101 to 103 and 105.
  • the step 104 can be performed before or after any of the steps 101 to 103 and the step 105, that is, the step 104 can be performed before the step 106 of forming the protective layer.
  • the step 105 needs to be performed before the step 101.
  • the step 106 needs to be performed after the formation of the second patterned transparent conductive layer, which is generally the last step.
  • the touch screen manufacturing method may further include: 104, a process of forming a black matrix, and, 105, forming a
  • the touch panel manufacturing method may further include: 106, a step of forming a protective layer.
  • a yellow patterned process or a laser etching process may be used to form the first patterned transparent conductive Layer 400 or a second patterned transparent conductive layer 600 is formed.
  • the method for manufacturing a high transmittance touch screen without a bridge is provided by the embodiment of the present invention.
  • the specific implementation steps may be as follows:
  • Step 1 printing on the sensing surface side of the transparent substrate 100, or first forming a film and then using a yellow light process or a laser etching process to form the patterned black matrix 200;
  • Step two then using a coating process to deposit the shadow layer 300;
  • Step 3 depositing a transparent conductive layer (first transparent conductive layer) on the shadow removing layer 300 by using a coating process, and performing a yellow light process or a laser etching process on the transparent conductive layer to form a first patterned transparent layer.
  • Step 4 depositing an insulating layer on the first patterned transparent conductive layer 400 by using a coating process; performing a yellow light process or a laser etching process on the insulating layer to form a cross between the first patterned transparent conductive layer 400 and the first patterned transparent conductive layer 400. pattern;
  • the first patterned transparent conductive layer 400 and the second patterned transparent conductive layer 600 may be respectively formed with driving lines and sensing lines, and the driving lines and the sensing lines may cross each other with an insulating layer, and the patterned insulating layer
  • the pattern of 500 may coincide with the pattern of the second patterned transparent conductive layer 600. Therefore, it is also considered that the pattern formed on the insulating layer 500 and the pattern of the first patterned transparent conductive layer 400 cross each other.
  • Step 5 forming a second patterned transparent conductive layer 600 by forming a film on the insulating layer 500 and then forming a second patterned transparent conductive layer 600 by using a yellow light process or a laser etching process.
  • the pattern may be the same as the pattern of the insulating layer 500;
  • Step 6 Finally, a protective layer 700 (for example, OC) is deposited on the sensing surface of the transparent substrate 100 (above the second patterned transparent conductive layer 600 formed in step 5).
  • a protective layer 700 for example, OC
  • the above touch screen manufacturing method can eliminate the need for bridging, can save the metal film deposition and the one-time patterning process, the production process is simple, and the ITO climbing problem which is usually in the industry does not occur, and the product quality is easy to control.
  • the touch screen manufacturing method of the embodiment can realize the touch structure under the condition of only the laser etching process, and does not require an expensive yellow light process technology and equipment, can greatly reduce the production cost, improve the production efficiency, and the product quality is stable. The yield of mass production is high.
  • Another embodiment of the present invention provides a high transmittance OGS touch screen that does not need to be bridged.
  • the process steps of the process can be as follows:
  • Step 1 forming a patterned black matrix 200 by printing on the sensing surface side of the transparent substrate 100;
  • Step two then using a coating process to deposit the shadow layer 300;
  • Step 3 forming a first patterned transparent conductive layer 400 on the image forming layer 300 by using a film forming method and then using a laser etching process;
  • Step 4 directly forming a pattern intersecting the first patterned transparent conductive layer 400 on the first patterned transparent conductive layer 400 by using a printing process, that is, the patterned insulating layer 500;
  • Step 5 forming a second patterned transparent conductive layer 600 by first forming a film on the patterned insulating layer 500 and using a laser etching process, and the pattern may be the same as the pattern of the insulating layer 500;
  • Step 6 Finally, a protective layer 700 (for example, OC) is deposited on the sensing surface of the transparent substrate 100 (above the second patterned transparent conductive layer 600 formed in step 5).
  • a protective layer 700 for example, OC
  • the touch screen manufacturing method is simpler, and the laser etching process only needs to be used in the process of forming the first and second transparent conductive layers, which can further reduce the production cost without affecting the product quality.
  • the touch screen manufacturing method provided by the embodiment has a simple production process, does not have the usual ITO climbing problem in the industry, and the product quality is easy to control, which not only reduces the production cost, improves the production efficiency, but also has stable product quality and high mass production yield.
  • the formed touch screen has a simple structure, does not need to be bridged, has strong antistatic breakdown ability, high transmittance, light and thin product, and good display effect.

Abstract

本发明实施例公开了一种触摸屏及其制造方法、触摸显示装置，涉及显示领域，无需搭桥，透过率高，工艺制程简单，不仅可降低生产成本，而且量产化良率高。本发明实施例提供的触摸屏，包括：透明基板；第一图案化透明导电层、图案化的绝缘层以及第二图案化的透明导电层，它们依次形成于所述透明基板之上，其中，所述第一图案化的透明导电层和所述第二图案化的透明导电层中，其一形成有多个驱动线，另一形成有多个感应线；所述绝缘层的图案与所述第一图案化的透明导电层的图案一致，或者与所述第二图案化的透明导电层的图案一致。

Description

触摸屏及其制作方法、触摸显示装置 技术领域
本发明涉及显示领域，尤其涉及一种触摸屏及其制造方法、触摸显示装置。
背景技术
触摸显示器发展迅速，已经逐渐发展成为主流平板显示器。目前，触摸显示器多由具有触控功能的触摸屏贴合在显示面板上制成，而触摸屏多采用电容式传感，当手指(或其它物体)靠近或触摸时，会影响在触摸点附近相交叉的驱动线和感应线间的电容，通过检测驱动线和感应线间的电容变化就可以识别触摸点的位置。
随着消费者对触摸显示器的薄化需求，技术人员开发出多种技术以制造更薄、显示品质更佳的产品。其中，单玻璃全贴合技术(one glass solution，OGS)是薄型化中的一个重要发展的方向。OGS是在显示面板的保护玻璃上直接形成保护膜及感应层的技术，一片玻璃可同时起到保护及触控传感器的双重作用。OGS技术具有以下优势：结构简单、轻、薄、透光性好，而且由于省掉一块透明基板以及贴合工序，可节省生产成本，提高产品良率。
目前主流的OGS触摸屏结构基本上是驱动线和感应线同层形成，其中之一是连续的结构，而另一则是采用金属搭桥(或ITO搭桥)相互连接的结构。其中，制备金属搭桥时的镀膜工序是导致工序复杂、产品品质较难控制的因素之一，而且这种搭桥结构极易出现因静电放电(ESD)导致搭桥处击穿的现象，影响触控功能；另一方面，金属搭桥结构在光照下较易看到金属连接线发白现象，影响透过率及显示品质。
发明内容
本发明的实施例提供一种触摸屏及其制造方法、触摸显示装置，无需搭桥，透过率高，工艺制程简单，不仅可降低生产成本，而且量产化良率高。
为了减轻或者避免上述问题，本发明的实施例采用如下技术方案：
一种触摸屏，可包括：透明基板，第一图案化的透明导电层，图案化的绝缘层以及第二图案化的透明导电层，第一图案化的透明导电层、图案化的绝缘层以及第二图案化的透明导电层可依次形成于所述透明 基板之上，其中，
第一图案化的透明导电层和第二图案化的透明导电层中，其一形成有多个驱动线，另一形成有多个感应线；图案化的绝缘层的图案与第一图案化的透明导电层的图案一致，或者与第二图案化的透明导电层的图案一致。
进一步地，所述的触摸屏还可包括：保护层，形成于第二图案化的透明导电层上。
进一步地，所述的触摸屏还可包括：消影层，形成于第一图案化的透明导电层的下方。
进一步地，所述的触摸屏还可包括：位于触摸屏的边缘用以避免边缘漏光的黑矩阵。
可选地，所述黑矩阵可形成于透明基板上，且位于消影层的下方。
可选地，所述黑矩阵可在第二透明导电层之后形成，且在保护层之前形成。
可选地，所述透明基板可以为显示面板的保护基板。
可选地，所述图案化的绝缘层可采用下述任意一种或多种材料形成：SiO2，SiNx，有机透明绝缘材料。
可选地，消影层可包括Nb2O5膜层和SiO2膜层，或者，所述消影层可包括Nb2O5膜层和SiNx膜层。
可选地，所述保护层可采用下述任意一种或多种材料形成：OC，SiO2，SiNx。
本发明的实施例还提供一种触摸显示装置，可包括：前述的触摸屏中的任一触摸屏。
另一方面，本发明实施例还提供一种触摸屏的制造方法，包括：
形成第一图案化的透明导电层的工序；
形成图案化的绝缘层的工序；
形成第二图案化的透明导电层的工序；
其中，所述形成第一图案化的透明导电层的工序和所述形成第二图案化的透明导电层的工序中，其一工序可形成多个驱动线，另一工序可形成多个感应线；形成的图案化的绝缘层的图案与第一图案化的透明导电层的图案一致，或者与第二图案化的透明导电层的图案一致。
进一步地，所述制造方法还可包括：在所述形成第二图案化的透明 导电层的工序之后形成保护层的工序。
进一步地，所述制造方法还可包括：在所述形成第一图案化的透明导电层的工序之前形成消影层的工序。
进一步地，所述制造方法还可包括在所述的形成保护层的工序之前形成黑矩阵的工序。
可选地，所述形成第一图案化的透明导电层的工序和/或所述形成第二图案化的透明导电层的工序中，采用黄光制程或激光刻蚀工艺，形成所述第一图案化的透明导电层或所述第二图案化的透明导电层。
本发明的实施例提供一种触摸屏及其制造方法、触摸显示装置，所述触摸屏可依次包括第一图案化的透明导电层，图案化的绝缘层以及第二图案化的透明导电层；其中，第一图案化的透明导电层和第二图案化的透明导电层中，其一形成有多个驱动线，另一形成有多个感应线，第一图案化的透明导电层和第二图案化的透明导电层可采用图案化的绝缘层隔开，因而，无需搭桥，透过率高；图案化的绝缘层的图案可以与第一图案化的透明导电层或者与第二图案化的透明导电层的图案一致，制备可以采用一次构图工艺形成，工艺制程简单，不仅可降低生产成本，而且量产化良率高。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其它的附图。
图1为本发明的一个实施例提供的触摸屏的截面图；
图2为本发明的另一实施例提供的触摸屏的截面图；
图3为本发明的一个实施例提供的触摸屏制造方法流程图；
图4为本发明的另一实施例提供的触摸屏制造方法流程图。
附图标记
100-透明基板，200-黑矩阵，300-消影层，
400-第一图案化的透明导电层，500-图案化的绝缘层，
600-第二图案化的透明导电层，700-保护层。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案 进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。
本发明实施例提供一种触摸屏，其截面图如图1所示，该触摸屏可包括：透明基板100，第一图案化的透明导电层400，图案化的绝缘层500以及第二图案化的透明导电层600；其中，第一图案化的透明导电层400，图案化的绝缘层500以及第二图案化的透明导电层600可依次形成于透明基板100上，第一图案化的透明导电层400和第二图案化的透明导电层600中，其一可形成有多个驱动线，另一可形成有多个感应线；图案化的绝缘层500的图案可以与第二图案化的透明导电层600的图案一致。
本实施例中的第一图案化的透明导电层400和第二图案化的透明导电层600隔着图案化的绝缘层500分别设置，这两层(400和600)中，其一如果形成有驱动线，另一则形成有感应线，其具体图案及设计要求可以是本领域技术人员所熟知的任意一种，只是驱动线和感应线在各自的膜层中分别形成。而且，驱动线和感应线可以是隔着绝缘层相互交叉的。因此，无需搭桥，在此不再赘述。这两层(400和600)之间的绝缘层500也可以是图案化的，并且其图案可以与第二图案化的透明导电层600的图案一致，即绝缘层500可以具有与第二图案化的透明导电层600相一致的图案。当然，绝缘层500的图案也可以与第一图案化的透明导电层400的图案一致。其中，绝缘层500材料可以为SiO2、SiNx、或者其它具有绝缘透明性能的有机或无机材料。与现有设置有搭桥结构的触摸屏结构相比，本实施例的触摸屏具有如下优势：
1、无需搭桥，只用图案化的两层ITO和一层绝缘层就能完成多点触控，产品轻薄；而且由于本实施例中绝缘层500可以是图案化的，与现有的搭桥结构触摸屏相比，可大幅度提高触摸屏的透过率；
2、本实施例的触摸屏无需设置搭桥结构，因此用以形成驱动线和感应线的透明导电层(ITO)无须爬坡，并且形成的驱动线和感应线没有桥接点(搭桥与ITO的接触点)，可大幅度提高产品的抗静电击穿能力；
3、与传统金属搭桥结构触摸屏相比，本发明的实施例的触摸屏可有效减轻或避免金属搭桥结构在光照下较易看到金属连接线发白的问题，提高产品的显示效果；
4、生产工艺简单，并且无需设置金属搭桥，因此可以省去金属搭桥的金属膜沉积工序，并且不会出现业界通常的ITO爬坡问题，产品品 质容易管控，不仅可降低生产成本，且量产化良率提高，产品质量稳定，生产效率提高。
进一步地，本实施例所述的触摸屏还可以包括：保护层700，形成于第二图案化的透明导电层600上。保护层700可为触控结构提供保护，可以为OC、SiO2、SiNx或其他具有绝缘性能的透明的无机或有机材料。其中，上述的OC的全称是Over Coat，其为一种对黑矩阵(BM)、金属层等起保护作用并降低各层间高度差异的一种透明绝缘性光刻胶。
进一步地，所述的触摸屏还可包括：位于触摸屏的边缘用以避免边缘漏光的黑矩阵200，其可以形成于透明基板100上，且位于第一图案化的透明导电层400的下方。
进一步地，所述的触摸屏还可包括：消影层300，形成于黑矩阵200之上，且位于第一图案化的透明导电层400的下方。其中，消影层300材料可以为Nb2O5和SiO2复合材料或者为Nb2O5和SiNx复合材料，例如，消影层300可包括Nb2O5膜层和SiO2膜层，或者，消影层300可包括Nb2O5膜层和SiNx膜层，消影层300还可以为其它具有消影效果的膜层。设置消影层300，可有效改善触摸屏在光照下的消影现象，提高显示效果。
需要说明的是，上述的消影层300只要位于第一图案化的透明导电层400的下方即可起到消影作用；而上述的黑矩阵200可形成于透明基板100上，或者形成于第一图案化的透明导电层400、绝缘层500、第二图案化的透明导电层600和消影层300中的任意膜层上，只要能在制造上满足工艺要求即可。
考虑到黑矩阵200的材料可能不耐高温等恶劣环境，因此，黑矩阵200可以形成于透明基板100上，且位于消影层300的下方，在后续制程中消影层300可以为黑矩阵200提供保护作用。或者，将形成黑矩阵200的工序放在后端，即黑矩阵200于第二透明导电层600之后，且于保护层700之前形成。
本实施例提供的触摸屏，结构简单，无需搭桥，抗静电击穿能力强，透过率高，产品轻薄，显示效果好；并且，生产工艺简单，不会出现业界通常的ITO爬坡问题，产品品质容易管控，不仅可降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高。
如图2所示，为本发明的另一实施例提供的另一触摸屏的截面图， 其与图1所示触摸屏结构的区别在于，位于触摸屏的边缘用以避免边缘漏光的黑矩阵200在第一图案化的透明导电层400之后形成，且在图案化的绝缘层500之前形成。第一图案化的透明导电层400上先形成黑矩阵200，再形成图案化的绝缘层500；消影层300形成于透明基板100上，且位于第一图案化的透明导电层400的下方。
或者，上述黑矩阵200也可以形成于第二图案化的透明导电层600之上，且位于保护层700的下方，即于第二图案化的透明导电层600之后形成黑矩阵200，之后再形成保护层700。
除此之外，本发明的这一实施例提供的触摸屏与之前的实施例提供的触摸屏大致类似，不再详述。可选地，绝缘层500可以采用下述任意一种或多种材料形成：SiO2，SiNx，有机透明材料。可选地，消影层300可以为复合膜层Nb2O5/SiO2，或者可以为复合膜层Nb2O5/SiNx。可选地，保护层700可采用下述的任意一种或多种材料形成：OC，SiO2，SiNx。
需要注意的是，本实施例提供的触摸屏结构可以单独形成具有触控功能的产品，例如触摸屏，也可以采用OGS技术，将本实施例提供的触摸屏结构直接形成在显示面板的保护基板上，此时本实施例中所述的透明基板即为显示面板的保护基板。
本实施例提供的触摸屏，结构简单，无需搭桥，抗静电击穿能力强，透过率高，产品轻薄，显示效果好；并且，生产工艺简单，不会出现业界通常的ITO爬坡问题，产品品质容易管控，不仅可降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高。
本发明实施例还提供一种触摸显示装置，包括：上述的任意一种触摸屏。所述触摸显示装置由于采用了上述的触摸屏结构，因而具有抗静电击穿能力强，透过率高，产品轻薄，显示效果好的优点；并且，生产工艺简单，不会出现业界通常的ITO爬坡问题，产品品质容易管控，不仅可降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高。
所述显示装置可以为：液晶面板、电子纸、OLED面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示触摸功能的产品或部件。
另一方面，本发明实施例还提供一种触摸屏的制造方法，如图3所示，该方法可以包括：
101、形成第一图案化的透明导电层的工序；
102、形成图案化的绝缘层的工序；
103、形成第二图案化的透明导电层的工序；
其中，参照图1和图2所示，形成第一图案化的透明导电层400的工序101和形成第二图案化的透明导电层600的工序103中，其一工序可形成多个驱动线，另一工序可形成多个感应线；工序102形成的图案化的绝缘层500的图案可以与第一图案化的透明导电层400的图案一致，或者可以与第二图案化的透明导电层600的图案一致。
本实施例提供的触摸屏制造方法，生产工艺简单，不会出现业界通常的ITO爬坡问题，产品品质容易管控，不仅可降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高。
进一步地，所述触摸屏制造方法还可以包括：106、在形成第二图案化的透明导电层的工序103之后，形成保护层的工序；105、形成第一图案化的透明导电层的工序101之前形成消影层的工序；并且还可包括：104、在工序101～103和105中的任一工序之前或之后形成黑矩阵的工序。
工序104可以在工序101～103、工序105中的任一工序之前或之后进行，即工序104可以在形成保护层的工序106之前进行。工序105需要在工序101之前进行。工序106需要在形成第二图案化的透明导电层之后进行，一般是为最后的一道工序。
一种具体的实施方式如图4所示，在所述形成第一图案化的透明导电层的工序101之前，触摸屏制造方法还可包括：104、形成黑矩阵的工序，以及，105、形成消影层的工序；在形成第二图案化的透明导电层的工序103之后，触摸屏制造方法还可包括：106、形成保护层的工序。
另外，形成第一图案化的透明导电层的工序101和/或形成第二图案化的透明导电层的工序103中，可采用黄光制程或激光刻蚀工艺，形成第一图案化的透明导电层400或形成第二图案化的透明导电层600。
为了本领域技术人员更好的理解本发明实施例提供的触摸屏制造方法，下面通过具体的实施例对本发明提供的触摸屏制造方法进行详细说明。
本发明实施例提供的一种无需搭桥的高透过率触摸屏制造方法，以OGS触摸屏为例，具体的实施步骤可以如下：
步骤一、在透明基板100感应面侧通过印刷，或者先成膜再采用黄光制程或激光刻蚀工艺来制作图案化的黑矩阵200；
步骤二、接着利用镀膜工艺沉积消影层300；
步骤三、在消影层300上面利用镀膜工艺沉积一层透明导电层(第一层透明导电层)，并对该透明导电层进行黄光制程或激光刻蚀工艺，形成第一图案化的透明导电层400；
步骤四、在第一图案化的透明导电层400上利用镀膜工艺沉积一层绝缘层；对绝缘层进行黄光制程或激光刻蚀工艺，形成与第一图案化的透明导电层400相互交叉的图案；
第一图案化的透明导电层400和第二图案化的透明导电层600可以分别形成有驱动线和感应线，驱动线和感应线可以是隔着绝缘层相互交叉的，而图案化的绝缘层500的图案可以与第二图案化的透明导电层600的图案一致，因此，也可以认为绝缘层500上形成的图案与第一图案化的透明导电层400的图案相互交叉。
步骤五、在绝缘层500上先成膜再采用黄光制程或激光刻蚀工艺的方法形成第二图案化的透明导电层600，图案可以与绝缘层500的图案一样；
步骤六、最后在透明基板100感应面(步骤五形成的第二图案化的透明导电层600之上)沉积一层保护层700(例如OC)。
上述触摸屏制造方法，无需搭桥，可以省去一次金属薄膜沉积和一次构图工艺，生产工艺简单，并且不会出现业界通常的ITO爬坡问题，产品品质容易管控。另外，本实施例触摸屏制造方法在只有激光刻蚀工艺的条件下也可实现触控结构，无需价格昂贵的黄光制程工艺及设备，可大幅度降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高。
本发明实施例还提供另一种无需搭桥的高透过率OGS触摸屏，其制程工艺步骤可以如下：
步骤一、在透明基板100感应面侧通过印刷来制作图案化的黑矩阵200；
步骤二、接着利用镀膜工艺沉积消影层300；
步骤三、在消影层300上面利用先成膜再采用激光刻蚀工艺的方法形成第一图案化的透明导电层400；
步骤四、在第一图案化的透明导电层400上利用印刷工艺直接形成与第一图案化的透明导电层400相互交叉的图案，即图案化的绝缘层500；
步骤五、在图案化的绝缘层500上先成膜再利用激光刻蚀工艺的方法形成第二图案化的透明导电层600，图案可以与绝缘层500的图案一样；
步骤六、最后在透明基板100感应面(步骤五形成的第二图案化的透明导电层600之上)沉积一层保护层700(例如OC)。
这种触摸屏制造方法更为简单，激光刻蚀工艺只需在形成第一、第二层透明导电层的工序中使用，可使生产成本进一步降低，且不影响产品质量。
本实施例提供的触摸屏制造方法，生产工艺简单，不会出现业界通常的ITO爬坡问题，产品品质容易管控，不仅可降低生产成本，提高生产效率，而且产品质量稳定，量产化良率高，并且形成的触摸屏结构简单，无需搭桥，抗静电击穿能力强，透过率高，产品轻薄，显示效果好。
本说明书中的各个实施例均采用递进的方式描述，各个实施例之间相同相似的部分互相参见即可，每个实施例重点说明的都是与其他实施例的不同之处。尤其，对于方法实施例而言，由于其基本相似于设备实施例，所以描述得比较简单，相关之处参见方法实施例的部分说明即可。以上所述，仅为本发明的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到的变化或替换，都应涵盖在本发明的保护范围之内。因此，本发明的保护范围应该以权利要求的保护范围为准。

Claims (16)

  1. 一种触摸屏，包括：
    透明基板；
    第一图案化的透明导电层；
    图案化的绝缘层；
    以及第二图案化的透明导电层，
    其中，所述第一图案化的透明导电层、所述图案化的绝缘层和所述第二图案化的透明导电层依次形成于所述透明基板之上，
    所述第一图案化的透明导电层和所述第二图案化的透明导电层中，其一形成有多个驱动线，另一形成有多个感应线；所述图案化的绝缘层的图案与所述第一图案化的透明导电层的图案一致，或者与所述第二图案化的透明导电层的图案一致。
  2. 根据权利要求1所述的触摸屏，还包括：
    保护层，形成于所述第二图案化的透明导电层上。
  3. 根据权利要求2所述的触摸屏，还包括：
    消影层，形成于所述第一图案化的透明导电层的下方。
  4. 根据权利要求3所述的触摸屏，还包括：位于所述触摸屏的边缘用以避免边缘漏光的黑矩阵。
  5. 根据权利要求4所述的触摸屏，所述黑矩阵形成于所述透明基板上，且位于所述消影层的下方。
  6. 根据权利要求4所述的触摸屏，所述黑矩阵在所述第二图案化的透明导电层之后形成，且在所述保护层之前形成。
  7. 根据权利要求1-6任一项所述的触摸屏，
    所述透明基板为显示面板的保护基板。
  8. 根据权利要求1-6任一项所述的触摸屏，所述图案化的绝缘层采用下述任意一种或多种材料形成：
    SiO2，SiNx，有机透明绝缘材料。
  9. 根据权利要求3所述的触摸屏，所述消影层包括Nb2O5膜层和SiO2膜层，或者，
    所述消影层包括Nb2O5膜层和SiNx膜层。
  10. 根据权利要求2-6任一项所述的触摸屏，所述保护层采用下述 任意一种或多种材料形成：
    OC，SiO2，SiNx。
  11. 一种触摸显示装置，包括：权利要求1-10任一项所述的触摸屏。
  12. 一种触摸屏的制造方法，包括：
    形成第一图案化的透明导电层的工序；
    形成图案化的绝缘层的工序；
    形成第二图案化的透明导电层的工序；
    其中，所述形成第一图案化的透明导电层的工序和所述形成第二图案化的透明导电层的工序中，其一工序形成多个驱动线，另一工序形成多个感应线；形成的所述图案化的绝缘层的图案与所述第一图案化的透明导电层的图案一致，或者与所述第二图案化的透明导电层的图案一致。
  13. 根据权利要求12所述的制造方法，还包括：在所述形成第二图案化的透明导电层的工序之后形成保护层的工序。
  14. 根据权利要求13所述的制造方法，还包括：在所述形成第一图案化的透明导电层的工序之前形成消影层的工序。
  15. 根据权利要求14所述的制造方法，还包括：在所述的形成保护层的工序之前形成黑矩阵的工序。
  16. 根据权利要求12所述的制造方法，所述形成第一图案化的透明导电层的工序和/或所述形成第二图案化的透明导电层的工序中，
    采用黄光制程或激光刻蚀工艺，形成所述第一图案化的透明导电层或所述第二图案化的透明导电层。
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