WO2016029548A1 - 触摸屏、其制作方法及触摸显示装置 - Google Patents

触摸屏、其制作方法及触摸显示装置 Download PDF

Info

Publication number
WO2016029548A1
WO2016029548A1 PCT/CN2014/090514 CN2014090514W WO2016029548A1 WO 2016029548 A1 WO2016029548 A1 WO 2016029548A1 CN 2014090514 W CN2014090514 W CN 2014090514W WO 2016029548 A1 WO2016029548 A1 WO 2016029548A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
touch
graphene
touch screen
substrate
Prior art date
Application number
PCT/CN2014/090514
Other languages
English (en)
French (fr)
Inventor
曾亭
胡明
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Publication of WO2016029548A1 publication Critical patent/WO2016029548A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Definitions

  • At least one embodiment of the present invention is directed to a touch screen, a method of fabricating the same, and a touch display device.
  • the Touch Screen Panel has gradually spread throughout people's lives.
  • the touch screen can be divided into: resistive, capacitive, infrared, surface acoustic wave, electromagnetic, vibration wave induction and frustrated total internal reflection optical induction.
  • Capacitive touch screen is favored by the industry as its new favorite with its unique touch principle and high sensitivity, long life and high light transmittance.
  • Embodiments of the present invention provide a touch screen, a manufacturing method thereof, and a touch display device, which are used to avoid the problems that the bridge layer is visible, the metal climbing, the touch screen transmittance is low, and the antistatic performance is poor.
  • a touch screen provided by at least one embodiment of the present invention includes a substrate and a touch structure located on a touch area of the touch screen.
  • the touch structure includes a touch sensing electrode and a touch driving electrode disposed in the same layer, intersecting and insulated from each other, and bridging the bridge layer of the adjacent touch driving electrode or the adjacent touch sensing electrode And an insulating layer between the touch sensing electrode disposed in the same layer and the touch driving electrode and the bridging layer; the material of the bridging layer is graphene.
  • At least one embodiment of the present invention also provides a method of fabricating a touch screen, the method comprising: forming a graphene layer on a substrate, forming a pattern of the bridge layer by a patterning process; forming a pattern of the insulating layer on the substrate; Forming a pattern of the touch sensing electrodes and the touch driving electrodes that are interdigitated and insulated from each other on the substrate, and the bridge layer bridges the adjacent touch driving electrodes or the adjacent touch sensing electrodes .
  • At least one embodiment of the present invention further provides a touch display device including the above touch screen provided by the embodiment of the present invention.
  • 1a is a top plan view of an OGS touch structure
  • Figure 1b is a schematic cross-sectional view taken along line A-A of Figure 1a;
  • FIGS. 2a and 2b are respectively schematic structural diagrams of a touch screen according to an embodiment of the present invention.
  • FIG. 3 is a schematic flowchart of a method for manufacturing a touch screen according to an embodiment of the present invention
  • 4a to 4f are respectively schematic structural views of the method for fabricating the touch screen shown in FIG. 2a after performing various steps;
  • FIG. 5a is a schematic diagram showing exposure processing of a positive photoresist layer on a graphene layer according to an embodiment of the present invention
  • FIG. 5b is a schematic diagram showing exposure processing of a negative photoresist layer on a graphene layer according to an embodiment of the present invention
  • 5c is a schematic structural view of a photoresist layer on a graphene layer after exposure and development processing according to an embodiment of the present invention
  • FIG. 5 is a schematic structural diagram of etching a photoresist layer on a graphene layer according to an embodiment of the present invention.
  • the OGS (One Glass Solution) touch module is widely used to form a single layer of touch conductive film and sensor directly on the substrate, as shown in FIG. 1a and FIG. 1b, OGS.
  • the structure of the touch module includes, for example, a bridge layer 02, an overcoat (OC) 03, and a touch electrode layer 04 which are sequentially stacked on the base substrate 01.
  • the touch electrode layer 04 includes a touch sensing electrode 041 and a touch driving electrode 042 that are interdigitated and insulated from each other.
  • the touch sensing electrode 041 and the touch driving electrode 042 have a diamond pattern, adjacent and mutually disconnected touches.
  • the driving electrode 042 is bridged through the bridge layer 02, and the touch sensing electrode 041 and the touch driving electrode 042 are connected to the corresponding peripheral traces (not shown in FIG. 1a and FIG. 1b) in the non-touch area of the touch module.
  • the trace transmits the signal on the touch electrode layer to the corresponding IC chip for analysis.
  • the material selection of the bridge layer is very important.
  • the material of the bridge layer is generally a metal material or an Indium Tin Oxide (ITO) material.
  • ITO Indium Tin Oxide
  • the bridging layer of metal material has the disadvantages of metal climbing, bridge point visibility and low transmittance of touch screen, while the bridge layer of ITO material has poor Electro-Static Discharge (ESD) performance. Accordingly, those skilled in the art desire to provide a new bridging layer.
  • At least one embodiment of the present invention includes a substrate 10 and a touch structure located on a touch area of the touch screen; the touch structure includes the same layer, intersects, and mutually
  • the insulating touch sensing electrode 11 and the touch driving electrode 12 bridge the adjacent touch driving electrode 12 or the bridge layer 13 of the adjacent touch sensing electrode 11 and the touch sensing electrode 11 and the touch layer disposed in the same layer.
  • the insulating layer 14 between the driving electrode 12 and the bridging layer 13 is controlled; the material of the bridging layer 13 is graphene.
  • 2a and 2b illustrate the example in which the bridge layer 13 is located between the touch electrode and the substrate 10. However, the bridge layer 13 may also be disposed on a side of the touch electrode away from the substrate 10.
  • the embodiments of the present invention are not limited.
  • the material of the bridge layer in the touch structure is graphene. Since the graphene has a high charge mobility, and the resistance value is independent of the wavelength of the light in the visible light band, it can be touched. Adjacent touch driving electrodes or adjacent touch sensing electrodes in the control structure play a good bridging role.
  • the bridging layer made of graphene has strong antistatic property compared with the bridging layer of ITO material, and can avoid the disadvantages and improvement of metal climbing and bridge point visibility compared with the bridging layer of metallic material. The transmittance of the touch screen.
  • the bridge layer comprises a single layer of graphene or a double layer of graphene. This is because the transmittance of single or double layer graphene can reach above 95%.
  • the touch sensing The material of the electrode and the touch driving electrode is a transparent conductive material.
  • the transparent conductive material is indium tin oxide or indium zinc oxide, which is not limited herein.
  • the thickness of the touch sensing electrode and the touch driving electrode is in the range of 20 nm to 80 nm, which is not limited.
  • the thickness of the touch sensing electrode and the touch driving electrode is controlled to be about 50 nm.
  • the material of the substrate may be selected from glass or polyethylene terephthalate (PET), which is not limited herein.
  • the effect is better when the thickness of the substrate ranges from 0.3 mm to 1.0 mm.
  • the touch screen provided by the embodiment of the present invention may further include a passivation layer covering the touch driving electrode and the touch sensing electrode, in order to protect the touch sensing electrode and the touch driving electrode.
  • the touch screen provided by the embodiment of the present invention is different from the touch screen of the bridge layer of the metal material or the bridge layer of the ITO material.
  • the material of the bridge layer is graphene. Therefore, the above structure is applicable.
  • touch screens including OGS touch modules.
  • other components in the common touch screen may also be included, and details are not described herein.
  • At least one embodiment of the present invention further provides a method for fabricating any of the above touch screens, which may include: forming a graphene layer on a substrate, forming a pattern of the bridge layer by a patterning process; forming on the substrate a pattern of the insulating layer; and a pattern of the touch sensing electrodes and the touch driving electrodes that are interdigitated and insulated from each other on the substrate, and the bridge layer bridges the adjacent touch driving electrodes or the adjacent touch sensing electrodes.
  • the embodiment of the present invention does not limit the sequence of the foregoing steps, and the method provided by the embodiment of the present invention is that the bridge layer is located between the touch electrode and the substrate and the bridge layer is located on the side of the touch electrode away from the substrate. Be applicable.
  • the method may include the following steps:
  • the method may include: forming a pattern of the touch sensing electrodes and the touch driving electrodes that are intersecting and insulated from each other on the substrate; Forming an insulating layer on the substrate of the touch sensing electrode and the touch driving electrode; forming a graphene layer on the insulating layer, and forming a pattern of the bridge layer by a patterning process, so that the bridge layer bridges the adjacent touch driving electrodes or Adjacent touch sensing electrodes.
  • forming the graphene layer on the substrate may include transferring the pre-formed single-layer graphene or double-layer graphene onto the substrate by a transfer method.
  • the pre-formed single-layer or double-layer graphene can be obtained by various methods, and the main methods at present are: mechanical separation method, redox method and chemical vapor deposition method.
  • the CVD method is widely used because it can prepare a large area of graphene as compared with mechanical separation and redox methods.
  • the CVD method mainly utilizes a hydrocarbon gas such as methane or ethylene to adsorb on the surface of a catalyst metal substrate at a high temperature, and decomposes and recombines to form graphene under metal catalysis.
  • the general CVD method is carried out in a high temperature furnace, and after the growth is completed, the grown graphene is completely attached to the catalyst metal. Therefore, an additional transfer step is required to form the graphene prepared by this method on the substrate.
  • the transfer usually needs to be immersed in the FeCl 3 solution for more than ten hours to etch away the catalyst metal substrate, and then the target substrate, that is, the substrate in the embodiment of the present invention, is taken up, and then dried to form graphene on the substrate.
  • the method for preparing the single-layer or multi-layer graphene and the method for transferring the graphene can all adopt methods generally used by those skilled in the art, and will not be described herein.
  • the pattern of forming the bridge layer by the patterning process may include: spin-coating a photoresist layer covering the graphene layer on the graphene layer; and spin-coating the photoresist
  • the substrate of the layer is subjected to exposure, development, etching, and lift-off processing to form a pattern of the bridge layer.
  • the photoresist layer may be a positive photoresist or a negative photoresist, which is not limited herein.
  • forming the pattern of the insulating layer on the substrate may include: forming a layer of the insulating material on the substrate by a sputtering method, and then The insulating material layer is patterned to form a pattern of the insulating layer.
  • the following describes the method for manufacturing the touch panel provided by the embodiment of the present invention by taking the structure of the touch screen shown in FIG. 2a as an example.
  • the method may include the following steps (1) to (7), and the steps are respectively introduced one by one.
  • a graphene layer 15 is formed on the substrate 10 by a transfer method as shown in Fig. 4a.
  • a photoresist layer 16 is spin-coated on the graphene layer 15, as shown in Fig. 4b.
  • the photoresist may be a positive photoresist or a negative photoresist, which is not limited herein.
  • the photoresist layer 16 when the photoresist layer is a positive photoresist: the photoresist layer 16 is exposed and developed by using the positive mask 20, as shown in FIG. 5a; The exposed region b removes the exposed region a in the photoresist layer 16, thereby defining a pattern of the bridge layer in the photoresist layer 16, as shown in Fig. 5c.
  • the photoresist layer is a negative photoresist: the photoresist layer 16 is exposed and developed using a negative mask 21 as shown in FIG. 5b; the exposed regions of the photoresist layer 16 are left.
  • the unexposed region b of the photoresist layer 16 is removed, thereby defining a pattern of the bridge layer in the photoresist layer 16, as shown in Figure 5c.
  • the graphene layer 15 is etched along the defined pattern of the bridge layer to expose the substrate 10, as shown in FIG. 5d;
  • the photoresist layer 16 on 15 is peeled off to form a pattern of the bridge layer 13, as shown in Fig. 4c.
  • a layer 17 of insulating material is deposited on the bridge layer 13 by sputtering, as shown in Fig. 4d.
  • a patterning process is performed on the insulating material layer 17 to form a pattern of the insulating layer 14, as shown in Fig. 4e.
  • a photoresist layer may be deposited on the insulating material layer 17 by spin coating, and then formed into a pattern of the insulating layer 14 by exposure, development, etching, and lift-off processing.
  • An ITO film 18 is formed on the insulating layer 14 as shown in Fig. 4f.
  • an ITO film is generally deposited on the insulating layer by sputtering.
  • a patterning process is performed on the ITO film 18 to form a pattern of the touch sensing electrode 11 and the touch driving electrode 12, as shown in FIG. 2a.
  • the photoresist is generally coated on the ITO film, and the photoresist is exposed and exposed. After the shadowing and etching processes, the photoresist is stripped to form a pattern of the touch sensing electrodes 11 and the touch driving electrodes 12.
  • the manufacturing method of the touch screen of the structure shown in FIG. 2b is similar to the manufacturing method of the touch screen of the structure shown in FIG. 2a, and details are not described herein again.
  • At least one embodiment of the present invention further provides a touch display device, which includes any of the above-mentioned touch screens provided by the embodiments of the present invention, and the touch display device may be: a mobile phone, a tablet computer, a television set, Any product or component that has a display function, such as a monitor, a notebook computer, a digital photo frame, and a navigator.
  • the touch display device reference may be made to the embodiment of the touch screen described above, and the repeated description is omitted.
  • the embodiment of the invention provides a touch screen, a manufacturing method thereof and a touch display device.
  • the material of the bridge layer of the touch structure in the touch screen is graphene, and the graphene has a high charge mobility and the resistance value is in the visible light band.
  • the wavelength of the light is independent, so that the adjacent touch driving electrodes or the adjacent touch sensing electrodes in the touch structure can be well bridged.
  • the bridging layer made of graphene has a strong antistatic property compared with the bridging layer of ITO material, and can avoid the disadvantages of metal climbing and bridge point visibility compared with the bridging layer of metal material. And improve the transmittance of the touch screen.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种触摸屏、其制作方法及触摸显示装置，触摸屏包括基板(10)和位于触摸屏的触控区域的触控结构；触控结构包括同层设置、交叉而置且相互绝缘的触控感应电极(11)和触控驱动电极(12)，桥接相邻的触控驱动电极(12)或相邻的触控感应电极(11)的桥接层(13)，以及位于同层设置的触控感应电极(11)和触控驱动电极(12)与桥接层(13)之间的绝缘层(14)；桥接层(13)的材料为石墨烯。触摸屏具有很强的抗静电性能力，可以避免金属爬坡、桥点可见性的缺点和提高触摸屏的透过率。

Description

触摸屏、其制作方法及触摸显示装置 技术领域
本发明的至少一个实施例涉及一种触摸屏、其制作方法及触摸显示装置。
背景技术
随着显示技术的飞速发展，触摸屏(Touch Screen Panel)已经逐渐遍及人们的生活中。目前，触摸屏按照工作原理可以分为：电阻式、电容式、红外线式、表面声波式、电磁式、振波感应式以及受抑全内反射光学感应式等。电容式触摸屏以其独特的触控原理，凭借高灵敏度、长寿命、高透光率等优点，被业内追捧为新宠。
发明内容
本发明实施例提供了一种触摸屏、其制作方法及触摸显示装置，用以避免桥接层桥点可见、金属爬坡、触摸屏透过率较低和抗静电性能差的问题。
本发明的至少一个实施例提供的一种触摸屏，包括基板和位于所述触摸屏的触控区域的触控结构。所述触控结构包括同层设置、交叉而置且相互绝缘的触控感应电极和触控驱动电极，桥接相邻的所述触控驱动电极或相邻的所述触控感应电极的桥接层，以及位于同层设置的所述触控感应电极和所述触控驱动电极与所述桥接层之间的绝缘层；所述桥接层的材料为石墨烯。
本发明的至少一个实施例还提供了一种触摸屏的制作方法，该方法包括：在基板上形成石墨烯层，通过构图工艺形成桥接层的图形；在所述基板上形成绝缘层的图形；以及在所述基板上形成交叉而置且相互绝缘的触控感应电极和触控驱动电极的图形，且所述桥接层桥接相邻的所述触控驱动电极或相邻的所述触控感应电极。
本发明的至少一个实施例还提供了一种触摸显示装置，其包括本发明实施例提供的上述触摸屏。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1a为一种OGS触控结构的俯视示意图；
图1b为图1a中A-A向的截面示意图；
图2a和图2b分别为本发明实施例提供的触摸屏的结构示意图；
图3为本发明实施例提供的触摸屏的制作方法的流程示意图；
图4a至图4f分别为本发明图2a所示的触摸屏的制作方法执行各步骤后的结构示意图；
图5a为本发明实施例提供的对石墨烯层上的正性光刻胶层进行处曝光处理的示意图；
图5b为本发明实施例提供的对石墨烯层上的负性光刻胶层进行处曝光处理的示意图；
图5c为本发明实施例提供的对石墨烯层上的光刻胶层进行曝光和显影处理后的结构示意图；
图5d为本发明实施例提供的对石墨烯层上的光刻胶层进行刻蚀处理后的结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
下面对本发明实施例提供的触摸屏、其制作方法及触摸显示装置的具体实施方式进行详细地说明。
附图中各层薄膜厚度和区域大小形状不反映真实比例，目的只是示意说明本发明内容。
目前应用比较广泛的单片式(OGS，One Glass Solution)触控模组，是在基板上直接形成单层的触控导电膜及传感器，如图1a和图1b所示，OGS 触控模组的结构例如包括在衬底基板01上依次层叠设置的桥接层(Bridge)02、绝缘层(Overcoat，简称OC)03以及触控电极层04。触控电极层04包括交叉而置且相互绝缘的触控感应电极041和触控驱动电极042，触控感应电极041和触控驱动电极042为菱形图案，相邻的且相互断开的触控驱动电极042通过桥接层02桥接，触控感应电极041和触控驱动电极042在触控模组的非触控区域与对应的周边走线(图1a和图1b中未示出)相连，周边走线会将触控电极层上的信号传输到对应的IC芯片进行分析处理。
在OGS触控模组中，桥接层的材料选择很重要，目前，桥接层的材料一般为金属材料或氧化铟锡(Indium Tin Oxide，ITO)材料。但是金属材料的桥接层具有金属爬坡、桥点可见和触摸屏透过率较低的缺点，而ITO材料的桥接层的抗静电(Electro-Static Discharge，ESD)性能较差。因此，本领域技术人员希望提供一种新的桥接层。
本发明的至少一个实施例提供的一种触摸屏，如图2a和图2b所示，包括基板10和位于触摸屏的触控区域的触控结构；触控结构包括同层设置、交叉而置且相互绝缘的触控感应电极11和触控驱动电极12，桥接相邻的触控驱动电极12或相邻的触控感应电极11的桥接层13，以及位于同层设置的触控感应电极11和触控驱动电极12与桥接层13之间的绝缘层14；桥接层13的材料为石墨烯。图2a和图2b以桥接层13位于触控电极和基板10之间为例进行说明，但桥接层13还可以设置于触控电极的远离基板10的一侧。本发明实施例不做限定。
本发明实施例提供的上述触摸屏中，触控结构中的桥接层的材料为石墨烯，由于石墨烯具有较高的电荷迁移率，且电阻值在可见光波段与光的波长无关，因此可以对触控结构中相邻的触控驱动电极或相邻的触控感应电极起到很好的桥接作用。另外，采用石墨烯制作的桥接层与ITO材料的桥接层相比还具有很强的抗静电性能力，与金属材料的桥接层相比还可以避免金属爬坡、桥点可见性的缺点和提高触摸屏的透过率。
例如，为了保证桥接层的透过率，在本发明实施例提供的上述触摸屏中，桥接层包括单层石墨烯或双层石墨烯。这是因为单层或双层石墨烯的透过率可达95％之上。
例如，在具体实施时，在本发明实施例提供的上述触摸屏中，触控感应 电极和触控驱动电极的材料为透明导电材料。
例如，在本发明实施例提供的上述触摸屏中，透明导电材料为氧化铟锡或氧化铟锌，在此不作限定。
例如，在具体实施时，在本发明实施例提供的上述触摸屏中，触控感应电极和触控驱动电极的厚度范围为20nm-80nm时效果较佳，在此不作限定。
例如，在本发明实施例提供的上述触摸屏中，触控感应电极和触控驱动电极的厚度控制在50nm左右效果最佳。
在具体实施时，在本发明实施例提供的上述触摸屏中，基板的材料可以选取玻璃或者聚对苯二甲酸乙二酯(Polythylene terephthalate，PET)，在此不作限定。
例如，在本发明实施例提供的上述触摸屏中，基板的厚度范围为0.3mm-1.0mm时效果较佳。
为了保护触控感应电极和触控驱动电极，本发明实施例提供的上述触摸屏还可以包括覆盖触控驱动电极和触控感应电极的钝化层。
需要说明的是，本发明实施例提供的上述触控屏，与采用金属材料的桥接层或ITO材料的桥接层的触摸屏相比，主要区别在于桥接层的材料为石墨烯，因此，上述结构适用于包括OGS触控模组在内的所有触摸屏。进而，在发明实施例提供的上述触摸屏中，还可以包括常见的触摸屏中的其它部件，在此不作赘述。
基于同一发明构思，本发明的至少一个实施例还提供了上述任一种触摸屏的制作方法，该方法可以包括：在基板上形成石墨烯层，通过构图工艺形成桥接层的图形；在基板上形成绝缘层的图形；以及在基板上形成交叉而置且相互绝缘的触控感应电极和触控驱动电极的图形，且桥接层桥接相邻的触控驱动电极或相邻的触控感应电极。需要注意的是，本发明实施例不限定上述步骤的顺序，并且本发明实施例提供的方法对于桥接层位于触控电极与基板之间和桥接层位于触控电极的远离基板一侧的情形均适用。
例如，当桥接层位于触控电极与基板之间时，如图3所示，所述方法可以包括以下步骤：
S101、在基板上形成石墨烯层，通过构图工艺形成桥接层的图形；
S102、在形成有桥接层的基板上形成绝缘层的图形；
S103、在绝缘层上形成交叉而置且相互绝缘的触控感应电极和触控驱动电极的图形；且桥接层桥接相邻的触控驱动电极或相邻的触控感应电极。
例如，当桥接层位于触控电极的远离基板的一侧时，所述方法可以包括：在基板上形成交叉而置且相互绝缘的触控感应电极和触控驱动电极的图形；然后在形成有触控感应电极和触控驱动电极的基板上形成绝缘层的图形；之后在绝缘层上形成石墨烯层，并通过构图工艺形成桥接层的图形，使桥接层桥接相邻的触控驱动电极或相邻的触控感应电极。
例如，在本发明实施例提供的上述触摸屏的制作方法中，在基板上形成石墨烯层可以包括：采用转移法将预先形成的单层石墨烯或双层石墨烯转移到基板上。
在具体实施时，在本发明实施例提供的上述方法中，预先形成的单层或双层石墨烯可以通过多种方法获得，目前主要手段有：机械分离法、氧化还原法和化学气相沉积法(Chemical Vapor Deposition，CVD)。CVD法相比于机械分离和氧化还原法能够制备较大面积的石墨烯而被广泛应用。CVD法主要是利用甲烷、乙烯等烃类气体在高温下吸附在催化剂金属衬底表面，并在金属催化作用下分解、重组形成石墨烯的方法。一般CVD法是在高温炉中进行的，生长结束后，生长的石墨烯完全贴附在催化剂金属上。因此要将这种方法制备的石墨烯形成于基板上还需要一个额外的转移步骤。转移通常需要在FeCl3溶液中浸泡十多个小时以刻蚀掉催化剂金属衬底，然后再用目标衬底即本发明实施例中的基板捞取，然后烘干即可在基板上形成石墨烯。制备单层或多层石墨烯的方法和转移石墨烯的方法均可以采用本领域技术人员常用的方法，在此不作赘述。
例如，在本发明实施例提供的上述触摸屏的制作方法中，通过构图工艺形成桥接层的图形可以包括：在石墨烯层上旋涂覆盖石墨烯层的光刻胶层；以及对旋涂有光刻胶层的基板进行曝光、显影、刻蚀和剥离处理，形成桥接层的图形。
在具体实施时，光刻胶层可以采用正性光刻胶，也可以采用负性光刻胶，在此不作限定。
在具体实施时，在本发明实施例提供的上述制作方法中，在基板上形成绝缘层的图形可以包括：可以通过溅射方法在基板上形成绝缘材料层，然后 对该绝缘材料层进行构图处理，形成绝缘层的图形。
下面以图2a所示的触摸屏的结构为例来说明本发明实施例提供的上述触摸屏的制作方法，该方法可以包括以下步骤(1)至步骤(7)，下面逐一介绍这些步骤。
(1)利用转移法在基板10上形成石墨烯层15，如图4a所示。
(2)在石墨烯层15上旋涂光刻胶层16，如图4b所示。
在具体实施时，光刻胶可以是正性光刻胶，也可以是负性光刻胶，在此不作限定。
(3)先对光刻胶层16进行曝光、显影处理，再对石墨烯层15进行刻蚀和剥离处理，形成桥接层13的图形，如图4c所示。
在具体实施时，当光刻胶层采用正性光刻胶时：采用正掩膜板20对光刻胶层16进行曝光和显影处理，如图5a所示；保留光刻胶层16中未被曝光的区域b，去除光刻胶层16中被曝光的区域a，从而在光刻胶层16中定义出桥接层的图形，如图5c所示。或者，当光刻胶层是负性光刻胶时：采用负掩膜板21对光刻胶层16进行曝光和显影处理，如图5b所示；保留光刻胶层16中被曝光的区域a，去除光刻胶层16中未被曝光的区域b，从而在光刻胶层16中定义出桥接层的图形，如图5c所示。然后，以该具有桥接层的图形的光刻胶层16为掩膜，沿定义出的桥接层的图形刻蚀石墨烯层15至露出基板10，如图5d所示；将保留在石墨烯层15上的光刻胶层16剥离，从而形成桥接层13的图形，如图4c所示。
(4)通过溅射的方式在桥接层13上沉积绝缘材料层17，如图4d所示。
(5)对绝缘材料层17进行构图工艺形成绝缘层14的图形，如图4e所示。
例如，在具体实施时，可以通过旋涂的方式在绝缘材料层17上沉积光刻胶层，然后通过曝光、显影、刻蚀和剥离处理后，形成绝缘层14的图形。
(6)在绝缘层14上形成ITO薄膜18；如图4f所示。
在具体实施时，一般通过溅射的方式在绝缘层上沉积ITO薄膜。
(7)对ITO薄膜18进行构图工艺形成触控感应电极11和触控驱动电极12的图形，如图2a所示。
在具体实施时，一般在ITO薄膜上涂覆光刻胶，对光刻胶进行曝光、显 影和刻蚀处理之后，剥离光刻胶，形成触控感应电极11和触控驱动电极12的图形。
经过上述步骤(1)至(7)之后，得到本发明实施例所提供的如图2a所示的触摸屏。
对于图2b所示结构的触摸屏的制作方法与图2a所示结构的触摸屏的制作方法相似，在此不再赘述。
基于同一发明构思，本发明的至少一个实施例还提供了一种触摸显示装置，其包括本发明实施例提供的上述任一种触摸屏，该触摸显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。该触摸显示装置的实施可以参见上述触摸屏的实施例，重复之处不再赘述。
本发明实施例提供了一种触摸屏、其制作方法及触摸显示装置，触摸屏中触控结构的桥接层的材料为石墨烯，由于石墨烯具有较高的电荷迁移率，且电阻值在可见光波段与光的波长无关，因此可以对触控结构中相邻的触控驱动电极或相邻的触控感应电极起到很好的桥接作用。另外，采用石墨烯制作的桥接层与ITO材料的桥接层相比还具有很强的抗静电性能力，与金属材料的桥接层相比可以，还可以避免金属爬坡、桥点可见性的缺点和提高触摸屏的透过率。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2014年8月29日递交的中国专利申请第201410437054.4号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (10)

  1. 一种触摸屏，包括基板和位于所述触摸屏的触控区域的触控结构；其中，
    所述触控结构包括同层设置、交叉而置且相互绝缘的触控感应电极和触控驱动电极，桥接相邻的所述触控驱动电极或相邻的所述触控感应电极的桥接层，以及位于同层设置的所述触控感应电极和所述触控驱动电极与所述桥接层之间的绝缘层；
    所述桥接层的材料为石墨烯。
  2. 如权利要求1所述的触摸屏，其中，所述桥接层包括单层石墨烯或双层石墨烯。
  3. 如权利要求1或2所述的触摸屏，其中，所述触控感应电极和所述触控驱动电极的材料为透明导电材料。
  4. 如权利要求3所述的触摸屏，其中，所述透明导电材料为氧化铟锡或氧化铟锌。
  5. 如权利要求1-4任一项所述的触摸屏，其中，所述触控感应电极和触控驱动电极的厚度为20nm-80nm。
  6. 如权利要求1-5任一项所述的触摸屏，其中，所述基板的厚度为0.3mm-1.0mm。
  7. 一种如权利要求1-6任一项所述的触摸屏的制作方法，包括：
    在基板上形成石墨烯层，通过构图工艺形成桥接层的图形；
    在所述基板上形成绝缘层的图形；
    在所述基板上形成交叉而置且相互绝缘的触控感应电极和触控驱动电极的图形，其中，所述桥接层桥接相邻的所述触控驱动电极或相邻的所述触控感应电极。
  8. 如权利要求7所述的制作方法，其中，所述在基板上形成石墨烯层，包括：
    采用转移法将预先形成的单层石墨烯或双层石墨烯转移到基板上。
  9. 如权利要求7或8所述的制作方法，其中，所述通过构图工艺形成桥接层的图形，包括：
    在所述石墨烯层上旋涂覆盖所述石墨烯层的光刻胶层；
    对旋涂有所述光刻胶层的基板进行曝光、显影、刻蚀和剥离处理，形成桥接层的图形。
  10. 一种触摸显示装置，包括如权利要求1-6任一项所述的触摸屏。
PCT/CN2014/090514 2014-08-29 2014-11-06 触摸屏、其制作方法及触摸显示装置 WO2016029548A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410437054.4 2014-08-29
CN201410437054.4A CN104199580A (zh) 2014-08-29 2014-08-29 一种触摸屏、其制作方法及触摸显示装置

Publications (1)

Publication Number Publication Date
WO2016029548A1 true WO2016029548A1 (zh) 2016-03-03

Family

ID=52084880

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/090514 WO2016029548A1 (zh) 2014-08-29 2014-11-06 触摸屏、其制作方法及触摸显示装置

Country Status (2)

Country Link
CN (1) CN104199580A (zh)
WO (1) WO2016029548A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113220158A (zh) * 2021-04-30 2021-08-06 上海天马微电子有限公司 触控面板制备方法、触控面板及显示装置
CN114201074A (zh) * 2021-12-13 2022-03-18 深圳市华星光电半导体显示技术有限公司 触控显示面板及触控显示装置

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104503647B (zh) 2014-12-31 2017-12-08 京东方科技集团股份有限公司 一种触摸显示屏的基板及其制造方法、触摸屏及显示装置
CN105159489B (zh) * 2015-08-20 2018-01-30 京东方科技集团股份有限公司 一种显示装置、触控面板及其制作方法
CN106611934A (zh) * 2015-10-21 2017-05-03 中国科学院苏州纳米技术与纳米仿生研究所 采用石墨烯进行电极搭桥的面发射激光器及其制备方法
CN106293216A (zh) * 2016-08-02 2017-01-04 京东方科技集团股份有限公司 一种触控基板及其制备方法、显示装置
CN106681579A (zh) * 2017-01-10 2017-05-17 昆山国显光电有限公司 触控面板及其制备方法
CN106886338B (zh) * 2017-02-08 2023-03-10 江西卓讯微电子有限公司 触摸屏及电子装置
CN107046051A (zh) * 2017-04-19 2017-08-15 上海天马有机发光显示技术有限公司 一种显示面板、显示装置和显示面板的制造方法
CN107092395A (zh) * 2017-04-26 2017-08-25 昆山国显光电有限公司 触摸屏导电搭桥的制作方法
CN108304092B (zh) * 2018-01-30 2020-08-21 云谷（固安）科技有限公司 一种触控基板的制备方法、触控基板及显示装置
CN108598290B (zh) * 2018-04-04 2020-05-05 武汉华星光电半导体显示技术有限公司 柔性显示器及其制作方法
CN110777355B (zh) * 2019-11-27 2022-04-12 中国航空制造技术研究院 原位复合的金属网格石墨烯复合功能薄膜及其制备方法
CN111290661B (zh) * 2020-01-22 2021-04-02 武汉华星光电半导体显示技术有限公司 柔性触控显示装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203535617U (zh) * 2013-10-25 2014-04-09 重庆绿色智能技术研究院 一种石墨烯导电薄膜
US20140147675A1 (en) * 2012-11-27 2014-05-29 Hcgt Ltd. Structure and method for a graphene-based apparatus
CN203759671U (zh) * 2014-03-26 2014-08-06 京东方科技集团股份有限公司 一种触摸屏及显示装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103927034A (zh) * 2013-01-18 2014-07-16 上海天马微电子有限公司 一种金属电极、触控电极层、彩膜基板和显示面板
CN203786713U (zh) * 2014-02-19 2014-08-20 宸鸿科技(厦门)有限公司 触控电极结构

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140147675A1 (en) * 2012-11-27 2014-05-29 Hcgt Ltd. Structure and method for a graphene-based apparatus
CN203535617U (zh) * 2013-10-25 2014-04-09 重庆绿色智能技术研究院 一种石墨烯导电薄膜
CN203759671U (zh) * 2014-03-26 2014-08-06 京东方科技集团股份有限公司 一种触摸屏及显示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113220158A (zh) * 2021-04-30 2021-08-06 上海天马微电子有限公司 触控面板制备方法、触控面板及显示装置
CN114201074A (zh) * 2021-12-13 2022-03-18 深圳市华星光电半导体显示技术有限公司 触控显示面板及触控显示装置

Also Published As

Publication number Publication date
CN104199580A (zh) 2014-12-10

Similar Documents

Publication Publication Date Title
WO2016029548A1 (zh) 触摸屏、其制作方法及触摸显示装置
US9433102B2 (en) Touch screen panel and method for manufacturing the same, and display device
US10261635B2 (en) Touch substrate, method for manufacturing the same, touch screen, and display device
US9417745B2 (en) Touch screen, the manufacturing method of the touch screen and display device
US9690434B2 (en) Touch module, manufacturing method thereof and display device
WO2018099174A1 (zh) 触摸屏及其制作方法、触控显示装置
WO2015027633A1 (zh) 触摸屏、其制作方法及显示装置
US20150060125A1 (en) Touch panel
WO2018028161A1 (zh) 触控基板及其制作方法、显示面板和显示装置
US20160062518A1 (en) Touch substrate and fabricating method thereof, and touch display apparatus
CN108228014B (zh) 触控模组及其制备方法、触控屏
EP2818993A1 (en) Novel ito crossover integrated capacitive touch screen and manufacturing method thereof
WO2015143862A1 (zh) 触摸屏、其制作方法及显示装置
US9430109B2 (en) Touch screen panel and method for manufacturing the same, and display device
JP5827972B2 (ja) タッチセンサ一体型表示装置
WO2015117468A1 (zh) 触摸屏及其制作方法、触摸显示装置
TWI401498B (zh) 觸控平面顯示面板及其製造方法
CN107229360A (zh) 触控面板、其制造方法及触控显示装置
WO2015027637A1 (zh) 触摸屏、其制作方法及显示装置
US10768764B2 (en) Touch structure and manufacturing method thereof, and touch device
CN203480463U (zh) 触摸屏及显示装置
WO2016192469A1 (zh) 触控面板的制备方法、触控面板和显示装置
CN203759671U (zh) 一种触摸屏及显示装置
TWI444874B (zh) 觸控面板與其製法
TWI437318B (zh) 觸控式顯示面板

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14900780

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 23.06.2017)

122 Ep: pct application non-entry in european phase

Ref document number: 14900780

Country of ref document: EP

Kind code of ref document: A1