WO2015143862A1 - 触摸屏、其制作方法及显示装置 - Google Patents

触摸屏、其制作方法及显示装置 Download PDF

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Publication number
WO2015143862A1
WO2015143862A1 PCT/CN2014/088229 CN2014088229W WO2015143862A1 WO 2015143862 A1 WO2015143862 A1 WO 2015143862A1 CN 2014088229 W CN2014088229 W CN 2014088229W WO 2015143862 A1 WO2015143862 A1 WO 2015143862A1
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Prior art keywords
touch
layer
touch screen
base substrate
forming
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PCT/CN2014/088229
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English (en)
French (fr)
Inventor
齐永莲
徐传祥
舒适
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京东方科技集团股份有限公司
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Publication of WO2015143862A1 publication Critical patent/WO2015143862A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • At least one embodiment of the present invention is directed to a touch screen, a method of fabricating the same, and a display device.
  • the Touch Screen Panel has gradually spread throughout people's lives.
  • the touch screen can be divided into: resistive, capacitive, infrared, surface acoustic wave, electromagnetic, vibration wave induction and frustrated total internal reflection optical induction.
  • Capacitive touch screen is favored by the industry as its new favorite with its unique touch principle and high sensitivity, long life and high light transmittance.
  • At least one embodiment of the present invention provides a touch screen, a method of fabricating the same, and a display device for avoiding bombardment of a shield layer by a plasma in a sputtering chamber, thereby preventing the shield layer from contaminating the chamber and preventing plasma from being shielded.
  • the surface of the shield caused by surface bombardment is not flat.
  • a touch screen provided by at least one embodiment of the present invention includes a base substrate, a touch structure located in a touch area of the touch screen, and a non-touch area of the touch screen and electrically connected to the touch structure A peripheral connection of the sexual connection and a shielding layer for shielding the peripheral trace.
  • the touch structure and the peripheral trace are located on one side of the base substrate, and the shield layer is located on the other side of the base substrate.
  • a method for fabricating a touch screen includes: forming a pattern including an electrically connected peripheral trace and a touch structure on one side of a base substrate, and forming on the other side of the base substrate Includes graphics for the shield.
  • the shielding layer is used to block the peripheral routing.
  • the shielding layer and the peripheral routing are located in the non-touch area of the touch screen, and the touch structure is located in the touch area of the touch screen.
  • At least one embodiment of the present invention provides a display device including the above touch screen.
  • 1a is a top plan view of an OGS touch module
  • Figure 1b is a schematic cross-sectional view of Figure 1a along the A-A direction;
  • FIG. 2 is a schematic structural diagram of a touch screen according to an embodiment of the present invention.
  • FIG. 3 is a second schematic structural diagram of a touch screen according to an embodiment of the present disclosure.
  • FIG. 4 is a flowchart of a method for fabricating a touch screen according to an example 1 of the present invention
  • FIG. 5 is a flowchart of a method for fabricating a touch screen provided by example 2 of the present invention.
  • the widely used OGS (One Glass Solution) touch module is a single layer of touch conductive film and sensor directly formed on the substrate.
  • the structure of the OGS touch module may include a shield layer (Blackmatrix, BM for short) 02, a bridge layer 03, and an insulating layer (overcoat) which are sequentially stacked on the base substrate 01. , referred to as OC) 04, touch electrode layer 05, peripheral trace 06, and passivation layer 07.
  • the touch electrode layer 05 may include touch sensing electrodes 051 and touch driving electrodes 052 that are interdigitated and insulated from each other.
  • the touch sensing electrodes 051 and the touch driving electrodes 052 are in a diamond pattern, and the adjacent and disconnected touch driving electrodes 052 are bridged by the bridge layer 03.
  • the touch sensing electrode 051 and the touch driving electrode 052 are connected to the corresponding peripheral trace 06 in the non-touch area of the touch module, and the peripheral trace 06 can transmit the signal on the touch electrode layer 05 to the corresponding IC chip. Perform analytical processing.
  • the OGS touch module shown in FIG. 1a and FIG. 1b needs to form a shielding layer 02 on the substrate 01 first, and then the substrate substrate on which the shielding layer 02 is formed. 01 needs to enter the sputtering chamber multiple times to form subsequent layers, such as the bridge layer 03, the touch electrode layer 05, and the peripheral traces 06. Since the material of the shielding layer 02 includes a resin material, when the substrate substrate 01 on which the shielding layer 02 is formed is bombarded by plasma in the sputtering chamber, the shielding layer 02 can release other substances, thereby contaminating the cavity. room. In addition, when the plasma bombards the surface of the shielding layer 02, the surface of the shielding layer 02 may have uneven defects such as protrusions and depressions, thereby affecting the flatness of the subsequent film layer, causing problems such as process defects.
  • a touch screen as shown in FIG. 2 and FIG. 3, includes a base substrate 100, a touch structure 200 located in a touch area of the touch screen, and a non-touch area of the touch screen.
  • a peripheral trace 300 electrically connected to the touch structure 200 and a shield layer 400 for shielding the peripheral trace 300.
  • the touch structure 200 and the peripheral traces 300 are located on one side of the base substrate 100, and the shield layer 400 is located on the other side of the base substrate 100.
  • the touch structure and the peripheral trace are located on one side of the base substrate, and the shield layer is located on the other side of the base substrate, that is, the shield layer and the touch structure are respectively located on the base substrate.
  • the shield layer is located on the other side of the base substrate, that is, the shield layer and the touch structure are respectively located on the base substrate.
  • the material of the shielding layer 400 may be a black photosensitive resin material, so that the black photosensitive resin can be used as a photoresist in the mask process at the same time, eliminating the need for separately coating the light.
  • the process of engraving reduces the amount of photoresist used and saves production costs.
  • the peripheral traces may be metal traces, because the metal has a relatively small resistance and a better conductive effect, which is beneficial to improving the touch sensitivity of the touch screen.
  • the perimeter traces can be molybdenum (Mo) or aluminum (Al).
  • the touch structure 200 can include touch sensing electrodes 210 and touch driving electrodes 220 that are interdigitated and insulated from each other.
  • the touch sensing electrodes 210 and the touch driving electrodes 220 are electrically connected to the corresponding peripheral wires 300, respectively.
  • the touch sensing The electrode 210 and the touch driving electrode 220 may be disposed in the same layer.
  • the touch structure 200 may further include: a bridging layer 230 bridging the adjacent touch sensing electrodes 210 or adjacent touch driving electrodes 220; and located at the bridging layer 230 The insulating layer 240 between the touch sensing electrode 210 and the touch driving electrode 220 disposed in the same layer.
  • the bridging layer 230 is used to bridge the adjacent touch sensing electrodes 210 as an example for description.
  • the materials of the touch sensing electrode 210 and the touch driving electrode 220 may be transparent conductive materials, for example, indium tin oxide (ITO), indium zinc oxide (IZO), Transparent conductive materials such as carbon nanotubes and graphene.
  • transparent conductive materials for example, indium tin oxide (ITO), indium zinc oxide (IZO), Transparent conductive materials such as carbon nanotubes and graphene.
  • the material of the bridging layer 230 may be a transparent conductive material, for example, indium tin oxide (ITO), indium zinc oxide (IZO) material, carbon nanotube or graphene.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • the advantage of using ITO as the bridging layer 230 is to increase the transmittance of the touch screen, and ITO has a smaller reflectance to light than metal, reducing the visual impact of reflected light on a person.
  • the material of the bridging layer 230 can also be made of metal. The resistance of the metal is smaller than that of ITO, which is beneficial to reducing the resistance of the touch electrode layer and improving the touch sensitivity, but the metal is generally opaque and affects the transmittance of the touch screen.
  • the embodiments of the present invention are not limited.
  • the touch screen provided by the embodiment of the present invention may further include: the base substrate 100 and the touch structure 200, as shown in FIG. 3, in order to prevent the external light from being irradiated to the touch screen from being reflected.
  • the anti-reflection layer 600 is between. This is because when the light of the external environment passes through the touch screen, some metal film layers (such as bridge layers, etc.) pass through, so that the emission occurs, so that the human eye can see the pattern on the touch screen and reduce the visual effect. Moreover, since the light rays passing through different positions of the touch screen pass through different layers, the spectrum of the reflected light is different, which causes a large difference in reflected light and also reduces the visual effect. Therefore, providing the anti-reflection layer 600 can reduce the reflectance and reduce the reflected light as much as possible, thereby improving the visual effect.
  • the touch screen provided by the embodiment of the present invention may further include: a passivation layer 500 covering the touch structure 200 and the peripheral traces 300.
  • At least one embodiment of the present invention further provides a method for fabricating any of the above touch screens.
  • the method may include the following steps: forming a peripheral trace and a touch including an electrical connection on one side of the base substrate.
  • a pattern of the control structure is formed on the other side of the base substrate to form a pattern including a shield layer.
  • the shielding layer is used to block the peripheral traces.
  • the shielding layer and the peripheral traces are located in the non-touch area of the touch screen, and the touch structure is located in the touch area of the touch screen.
  • a pattern including a shielding layer may be formed on one side of the substrate substrate, and then the substrate is flipped, and the other side of the substrate substrate is formed to include an electrical connection.
  • a pattern of the peripheral traces and the touch structure; or, a pattern of the peripheral traces and the touch structure including the electrical connection may be formed on one side of the base substrate, and then the substrate is flipped, and the substrate is further A pattern including a shield layer is formed on one side.
  • forming a pattern including the electrically connected peripheral traces and the touch structure may include: forming a pattern including the bridge layer; forming a pattern including the insulating layer on the bridge layer; forming the same on the insulating layer a pattern of touch sensing electrodes and touch driving electrodes disposed in layers and intersecting; and forming a pattern including peripheral traces on the base substrate.
  • the fabricating method may further include: forming a pattern including an anti-reflection layer on the substrate substrate before forming the pattern including the peripheral traces and the touch electrodes electrically connected, and the anti-reflection layer is located Between the substrate and the touch structure.
  • the manufacturing method may further include: forming a passivation layer covering the touch structure and the peripheral trace on the base substrate after forming the pattern including the peripheral traces and the touch electrodes electrically connected .
  • the method for preparing the touch panel provided by the embodiment of the present invention is described below by taking the structure shown in FIG. 3 as an example.
  • the touch structure 200 includes a touch sensing electrode 210 and a touch driving electrode 220 disposed in the same layer, intersecting and insulated from each other, bridging the bridging layer 230 of the adjacent touch sensing electrodes 210, and the bridging layer 230 and the same layer.
  • An insulating layer 240 is disposed between the touch sensing electrode 210 and the touch driving electrode 220.
  • a black photosensitive resin resist may be coated on the base substrate 100 by spin coating, and then subjected to exposure, development, and post-baking treatment to form a pattern of the shield layer 400.
  • an ITO material may be deposited on the anti-reflective layer 600 by sputtering, and then a photoresist is coated on the ITO. After exposing, developing, and etching the photoresist, the photoresist is stripped to form a bridge layer. 230 graphics.
  • an insulating material and a photoresist may be coated on the bridging layer and then formed into a pattern of the insulating layer 240 by exposure and development processing.
  • an ITO material may be deposited on the insulating layer 240 by sputtering, and then a photoresist is coated on the ITO. After the photoresist is exposed, developed, and etched, the photoresist is stripped to form a touch sensing. A pattern of the electrode 210 and the touch drive electrode 220.
  • a pattern including the peripheral traces 300 is formed on the base substrate 100.
  • a film layer of a metal material may be deposited on the base substrate 100 by sputtering, and then a photoresist is coated on the film layer of the metal material, and the photoresist is exposed, developed, and etched, and then stripped.
  • the photoresist forms a pattern of peripheral traces 300.
  • the metal material may be Mo or Al.
  • the touch structure 200 includes a touch sensing electrode 210 and a touch driving electrode 220 disposed in the same layer, intersecting and insulated from each other, bridging the bridging layer 230 of the adjacent touch sensing electrodes 210, and the bridging layer 230 and the same layer.
  • An insulating layer 240 is disposed between the touch sensing electrode 210 and the touch driving electrode 220.
  • an ITO material may be deposited on the anti-reflective layer 600 by sputtering, and then a photoresist is coated on the ITO. After exposing, developing, and etching the photoresist, the photoresist is stripped to form a bridge layer. 230 graphics.
  • a photoresist of an insulating material may be coated on the bridging layer and then formed into a pattern of the insulating layer 240 by exposure and development processing.
  • an ITO material may be deposited on the insulating layer 240 by sputtering, and then a photoresist is coated on the ITO. After the photoresist is exposed, developed, and etched, the photoresist is stripped to form a touch sensing. A pattern of the electrode 210 and the touch drive electrode 220.
  • a pattern including the peripheral traces 300 is formed on the base substrate 100.
  • a film layer of a metal material may be deposited on the base substrate 100 by sputtering, and then a photoresist is coated on the film layer of the metal material, and the photoresist is exposed, developed, and etched, and then stripped.
  • the photoresist forms a pattern of peripheral traces 300.
  • the metal material may be Mo or Al.
  • the substrate substrate 100 is turned over.
  • a black photosensitive resin resist may be coated on a base substrate by spin coating, and then subjected to exposure, development, and post-baking treatment to form a pattern of the shield layer 400.
  • At least one embodiment of the present invention further provides a display device including the above touch screen provided by the embodiment of the present invention.
  • the display device can be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • At least one embodiment of the present invention provides a touch screen, a manufacturing method thereof, and a display device, wherein the touch structure and the peripheral trace are located on one side of the base substrate, and the shield layer is located on the base substrate.
  • One side, that is, the shielding layer and the touch structure are respectively located on both sides of the substrate, so when the touch screen is formed by sputtering on the side of the substrate, the touch structure and the peripheral traces are formed in the sputtering chamber.
  • the plasma does not bombard the shield on the other side of the substrate, thereby preventing the shield from contaminating the chamber.
  • the shielding layer is located on the other side of the substrate, the touch structure does not occur due to the unevenness of the shielding layer compared with the structure in which the touch structure and the peripheral trace are formed on the film layer of the shielding layer. This is an uneven phenomenon, which guarantees the quality of the touch screen.

Abstract

一种触摸屏、其制作方法及显示装置，该触摸屏包括衬底基板（100），位于所述触摸屏的触控区域的触控结构（200），以及位于所述触摸屏的非触控区域的且与所述触控结构（200）电性连接的周边走线（300）和用于遮挡所述周边走线（300）的屏蔽层（400）。所述触控结构（200）和所述周边走线（300）位于所述衬底基板（100）的一侧，所述屏蔽层（400）位于所述衬底基板（100）的另一侧。该触摸屏可以避免屏蔽层（400）污染腔室，并且避免由于屏蔽层（400）的不平坦而造成的触控结构（200）不平坦，从而保证触摸屏的质量。

Description

触摸屏、其制作方法及显示装置 技术领域
本发明至少一个实施例涉及一种触摸屏、其制作方法及显示装置。
背景技术
随着显示技术的飞速发展，触摸屏(Touch Screen Panel)已经逐渐遍及人们的生活中。目前，触摸屏按照工作原理可以分为：电阻式、电容式、红外线式、表面声波式、电磁式、振波感应式以及受抑全内反射光学感应式等。电容式触摸屏以其独特的触控原理，凭借高灵敏度、长寿命、高透光率等优点，被业内追捧为新宠。
发明内容
本发明的至少一个实施例提供的一种触摸屏、其制作方法及显示装置，用以避免在溅镀腔中等离子体对屏蔽层的轰击，从而避免屏蔽层污染腔室，以及避免等离子体对屏蔽层表面轰击造成的屏蔽层表面不平坦。
本发明的至少一个实施例提供的一种触摸屏，包括衬底基板，位于所述触摸屏的触控区域的触控结构，以及位于所述触摸屏的非触控区域的且与所述触控结构电性连接的周边走线和用于遮挡所述周边走线的屏蔽层。所述触控结构和所述周边走线位于所述衬底基板的一侧，所述屏蔽层位于所述衬底基板的另一侧。
本发明的至少一个实施例提供的一种触摸屏的制作方法，包括：在衬底基板的一侧形成包括电性连接的周边走线与触控结构的图形，在衬底基板的另一侧形成包括屏蔽层的图形。所述屏蔽层用于遮挡所述周边走线，所述屏蔽层和所述周边走线位于所述触摸屏的非触控区域，所述触控结构位于所述触摸屏的触控区域。
本发明的至少一个实施例提供的一种显示装置，包括上述触摸屏。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1a为一种OGS触控模组的俯视示意图；
图1b为图1a沿A-A向的截面示意图；
图2为本发明实施例提供的触摸屏的结构示意图之一；
图3为本发明实施例提供的触摸屏的结构示意图之二；
图4为本发明实例一提供的触摸屏的制作方法的流程图；
图5为本发明实例二提供的触摸屏的制作方法的流程图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
附图中各层薄膜厚度和区域大小形状不反映触摸屏的真实比例，目的只是示意说明本发明内容。
目前应用比较广泛的单片式(OGS，One Glass Solution)触控模组，是在基板上直接形成单层的触控导电膜及传感器。如图1a和图1b所示，OGS触控模组的结构可以包括：在衬底基板01上依次层叠设置的屏蔽层(Blackmatrix，简称BM)02、桥接层(Bridge)03、绝缘层(Overcoat，简称OC)04、触控电极层05、周边走线06以及钝化层07。触控电极层05可以包括交叉而置且相互绝缘的触控感应电极051和触控驱动电极052。触控感应电极051和触控驱动电极052为菱形图案，相邻的且相互断开的触控驱动电极052通过桥接层03桥接。触控感应电极051和触控驱动电极052在触控模组的非触控区域与对应的周边走线06相连，周边走线06可将触控电极层05上的信号传输到对应的IC芯片进行分析处理。
本申请的发明人注意到，图1a和图1b所示的OGS触控模组在制备时，需要先在衬底基板01上形成屏蔽层02，然后该形成有屏蔽层02的衬底基板 01需要多次进入到溅镀腔中以形成后续的其他膜层，例如形成桥接层03、触控电极层05以及周边走线06。由于屏蔽层02的材料中包括树脂材料，因此，当形成有屏蔽层02的衬底基板01在溅镀腔中被等离子体(plasma)轰击时，屏蔽层02可释放出其他物质，从而污染腔室。另外，等离子体对屏蔽层02的表面进行轰击时，也可导致屏蔽层02的表面有凸起和凹陷等不平坦的缺陷，从而影响后续膜层的平坦度，造成工艺不良等问题。
本发明的至少一个实施例提供的一种触摸屏，如图2和图3所示，包括衬底基板100，位于触摸屏的触控区域的触控结构200，以及位于触摸屏的非触控区域的且与触控结构200电性连接的周边走线300和用于遮挡周边走线300的屏蔽层400。触控结构200和周边走线300位于衬底基板100的一侧，屏蔽层400位于衬底基板100的另一侧。
本发明实施例提供的上述触摸屏中，由于触控结构和周边走线位于衬底基板的一侧，而屏蔽层位于衬底基板的另一侧，即屏蔽层和触控结构分别位于衬底基板的两侧，因此当该触摸屏在采用溅射的方式在衬底基板的一侧制作触控结构和周边走线时，溅镀腔中的等离子体不会对位于衬底基板另一侧的屏蔽层产生轰击，从而避免屏蔽层污染腔室。并且，由于屏蔽层位于衬底基板的另一侧，因此与触控结构和周边走线形成在屏蔽层的膜层上的结构相比，不会发生由于屏蔽层的不平坦而造成触控结构不平坦的现象，这保证了触摸屏的质量。
在本发明的一个实施例提供的触摸屏中，屏蔽层400的材料可以为黑色感光性树脂材料，这样黑色感光性树脂同时可以作为掩膜工艺中的光刻胶使用，省去了单独涂覆光刻胶的工艺，减少了对光刻胶的使用量，节约了生产成本。
在本发明的一个实施例提供的触摸屏中，周边走线可以是金属走线，因为金属的电阻比较小，导电效果更好，有利于提高触摸屏的触控灵敏度。例如，周边走线可以为钼(Mo)或铝(Al)。
在本发明的一个实施例提供的触摸屏中，如图2和图3所示，触控结构200可以包括交叉而置且相互绝缘的触控感应电极210和触控驱动电极220。触控感应电极210和触控驱动电极220分别与对应的周边走线300电性连接。
在本发明的一个实施例提供的触摸屏中，如图2和图3所示，触控感应 电极210和触控驱动电极220可以同层设置，触控结构200还可以包括：桥接相邻的触控感应电极210或相邻的触控驱动电极220的桥接层230；以及位于桥接层230与同层设置的触控感应电极210和触控驱动电极220之间的绝缘层240。在图2中以桥接层230桥接相邻的触控感应电极210为例进行说明。
例如，在本发明实施例提供的上述触摸屏中，触控感应电极210和触控驱动电极220的材料可以采用透明导电材料，例如，可以是氧化铟锡(ITO)、氧化铟锌(IZO)、碳纳米管、石墨烯等透明导电材料。
例如，在本发明实施例提供的上述触摸屏中，桥接层230的材料可以采用透明导电材料，例如，可以是氧化铟锡(ITO)、氧化铟锌(IZO)材料、碳纳米管或者石墨烯。采用ITO作为桥接层230的好处在于提高触摸屏的透过率，并且ITO与金属相比对光的反射率较小，降低了反射光对人的视觉影响。当然，桥接层230的材料也可以采用金属制备。金属的电阻比ITO小，有利于减小触控电极层的电阻，提高触控灵敏度，但是金属一般是不透光的，会影响触摸屏的透过率。本发明的实施例不做限定。
在一个实施例中，为了防止照射到触摸屏的外界光发生反射而影响视觉效果，本发明实施例提供的上述触摸屏，如图3所示，还可以包括：位于衬底基板100与触控结构200之间的抗反射层600。这是因为当外界环境的光线穿过触摸屏时，会经过一些金属膜层(例如桥接层等)，从而发生发射，使人眼可以看到触摸屏上的图案，降低视觉效果。并且，由于穿过触摸屏不同位置的光线所经过的膜层是不同的，因此反射出来的光线的光谱也就不同，这造成反射光线差异较大，同样降低视觉效果。因此，设置抗反射层600可以尽可能地降低反射率和减少反射光线，从而提高视觉效果。
在一个实施例中，本发明实施例提供的上述触摸屏，如图2和图3所示，还可以包括：覆盖触控结构200和周边走线300的钝化层500。
基于同一发明构思，本发明的至少一个实施例还提供了上述任一种触摸屏的制作方法，该方法例如可以包括以下步骤：在衬底基板的一侧形成包括电性连接的周边走线与触控结构的图形，在衬底基板的另一侧形成包括屏蔽层的图形。该屏蔽层用于遮挡所述周边走线。屏蔽层和周边走线位于触摸屏的非触控区域，触控结构位于触摸屏的触控区域。
例如，本发明实施例提供的上述制作方法中，可以先在在衬底基板的一侧形成包括屏蔽层的图形，然后翻转衬底基板，在衬底基板的另一侧形成包括电性连接的周边走线与触控结构的图形；或，也可以先在衬底基板的一侧形成包括电性连接的周边走线与触控结构的图形，然后翻转衬底基板，在衬底基板的另一侧形成包括屏蔽层的图形。
在至少一个实施例中，形成包括电性连接的周边走线与触控结构的图形可以包括：形成包括桥接层的图形；在桥接层上形成包括绝缘层的图形；在绝缘层上形成包括同层设置且交叉而置的触控感应电极和触控驱动电极的图形；以及在衬底基板上形成包括周边走线的图形。
在一个实施例中，所述制作方法还可以包括：在形成包括电性连接的周边走线与触控电极的图形之前，在衬底基板上形成包括抗反射层的图形，并且抗反射层位于衬底基板与触控结构之间。
在一个实施例中，所述制作方法还可以包括：在形成包括电性连接的周边走线与触控电极的图形之后，在衬底基板上形成覆盖触控结构和周边走线的钝化层。
下面以图3所示的结构为例来说明本发明实施例提供的上述触摸屏的制备方法。
实例一
在制作如图3所示的触摸屏时，先在在衬底基板100的一侧形成包括屏蔽层400的图形，然后翻转衬底基板100，在衬底基板100的另一侧形成包括电性连接的周边走线300与触控结构200的图形。触控结构200包括同层设置、交叉而置且相互绝缘的触控感应电极210和触控驱动电极220，桥接相邻的触控感应电极210的桥接层230，以及位于桥接层230与同层设置的触控感应电极210和触控驱动电极220之间的绝缘层240。触摸屏的制作过程，如图4所示，例如可以包括以下步骤。
S401、在衬底基板100的一侧形成包括屏蔽层400的图形。
例如，可以采用旋涂法在衬底基板100上涂覆黑色感光性树脂光刻胶，然后经过曝光、显影和后烘处理后，形成屏蔽层400的图形。
S402、翻转衬底基板100。
S403、在衬底基板100的另一侧形成包括抗反射层600的图形。
S404、在抗反射层600上形成包括桥接层230的图形。
例如，可以通过溅射的方式在抗反射层600上沉积ITO材料，然后在ITO上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成桥接层230的图形。
S405、在桥接层230上形成包括绝缘层240的图形。
例如，可以在桥接层上涂覆绝缘材料和光刻胶，然后通过曝光和显影处理后，形成绝缘层240的图形。
S406、在绝缘层240上形成包括同层设置且交叉而置的触控感应电极210和触控驱动电极220的图形。
例如，可以通过溅射的方式在绝缘层240上沉积ITO材料，然后在ITO上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成触控感应电极210和触控驱动电极220的图形。
S407、衬底基板100上形成包括周边走线300的图形。
例如，可以通过溅射的方式在衬底基板100上沉积金属材料的膜层，然后在金属材料的膜层上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成周边走线300的图形。例如，金属材料可以为Mo或Al。
S408、形成覆盖触控结构200和周边走线300的钝化层500。
经过上述步骤S401至S408之后，得到本发明实施例所提供的如图3所示的触摸屏。
实例二
在制作如图3所示的触摸屏时，先在衬底基板100的一侧形成包括电性连接的周边走线300与触控结构200的图形，然后翻转衬底基板100，在衬底基板100的另一侧形成包括屏蔽层400的图形。触控结构200包括同层设置、交叉而置且相互绝缘的触控感应电极210和触控驱动电极220，桥接相邻的触控感应电极210的桥接层230，以及位于桥接层230与同层设置的触控感应电极210和触控驱动电极220之间的绝缘层240。触摸屏制作过程，如图5所示，例如可以包括以下步骤。
S501、在衬底基板100的一侧形成包括抗反射层600的图形。
S502、在抗反射层600上形成桥接层230的图形。
例如，可以通过溅射的方式在抗反射层600上沉积ITO材料，然后在ITO上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成桥接层230的图形。
S503、在桥接层230上形成包括绝缘层240的图形。
例如，可以在桥接层上涂覆绝缘材料的光刻胶，然后通过曝光和显影处理后，形成绝缘层240的图形。
S504、在绝缘层240上形成包括同层设置且交叉而置的触控感应电极210和触控驱动电极220的图形。
例如，可以通过溅射的方式在绝缘层240上沉积ITO材料，然后在ITO上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成触控感应电极210和触控驱动电极220的图形。
S505、衬底基板100上形成包括周边走线300的图形。
例如，可以通过溅射的方式在衬底基板100上沉积金属材料的膜层，然后在金属材料的膜层上涂覆光刻胶，对光刻胶进行曝光、显影和刻蚀处理之后，剥离光刻胶，形成周边走线300的图形。例如，金属材料可以为Mo或Al。
S506、形成覆盖触控结构200和周边走线300的钝化层500。
S507、翻转衬底基板100。
S508、在衬底基板100的另一侧形成包括屏蔽层400的图形。
例如，可以采用旋涂法在衬底基板上涂覆黑色感光性树脂光刻胶，然后经过曝光、显影和后烘处理后，形成屏蔽层400的图形。
经过上述步骤S501至S508之后，得到本发明实施例所提供的如图3所示的触摸屏。
基于同一发明构思，本发明的至少一个实施例还提供了一种显示装置，其包括本发明实施例提供的上述触摸屏。该显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。该显示装置的实施可以参见上述触摸屏的实施例，重复之处不再赘述。
本发明的至少一个实施例提供的一种触摸屏、其制作方法及显示装置，由于触控结构和周边走线位于衬底基板的一侧，而屏蔽层位于衬底基板的另 一侧，即屏蔽层和触控结构分别位于衬底基板的两侧，因此当该触摸屏在采用溅射的方式在衬底基板的一侧制作触控结构和周边走线时，溅镀腔中的等离子体不会对位于衬底基板另一侧的屏蔽层产生轰击，从而避免屏蔽层污染腔室。并且，由于屏蔽层位于衬底基板的另一侧，因此与触控结构和周边走线形成在屏蔽层的膜层上的结构相比，不会发生由于屏蔽层的不平坦而造成触控结构不平坦的现象，这保证了触摸屏的质量。
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。
本申请要求于2014年3月26日递交的中国专利申请第201410116726.1号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (16)

  1. 一种触摸屏，包括衬底基板，位于所述触摸屏的触控区域的触控结构，以及位于所述触摸屏的非触控区域的且与所述触控结构电性连接的周边走线和用于遮挡所述周边走线的屏蔽层，其中，
    所述触控结构和所述周边走线位于所述衬底基板的一侧，所述屏蔽层位于所述衬底基板的另一侧。
  2. 如权利要求1所述的触摸屏，其中，所述触控结构包括：交叉而置且相互绝缘的触控感应电极和触控驱动电极，所述触控感应电极和触控驱动电极分别与对应的周边走线电性连接。
  3. 如权利要求2所述的触摸屏，其中，所述触控感应电极和所述触控驱动电极同层设置。
  4. 如权利要求3所述的触摸屏，其中，所述触控结构还包括：桥接相邻的所述触控驱动电极或相邻的所述触控感应电极的桥接层。
  5. 如权利要求4所述的触摸屏，其中，所述触控结构还包括：位于所述桥接层与所述触控感应电极和所述触控驱动电极之间的绝缘层。
  6. 如权利要求1-5任一所述的触摸屏，还包括：位于所述衬底基板与所述触控结构之间的抗反射层。
  7. 如权利要求1-6任一项所述的触摸屏，还包括：覆盖所述触控结构和所述周边走线的钝化层。
  8. 如权利要求1-7任一项所述的触摸屏，其中，所述屏蔽层的材料为黑色感光性树脂材料。
  9. 如权利要求1-8任一项所述的触摸屏，其中，所述桥接层的材料为透明导电材料。
  10. 一种如权利要求1-9任一项所述的触摸屏的制作方法，包括：
    在衬底基板的一侧形成包括电性连接的周边走线与触控结构的图形；
    在衬底基板的另一侧形成包括屏蔽层的图形；其中，
    所述屏蔽层用于遮挡所述周边走线，所述屏蔽层和所述周边走线位于所述触摸屏的非触控区域，所述触控结构位于所述触摸屏的触控区域。
  11. 如权利要求10所述的制作方法，其中，
    在所述衬底基板的一侧形成包括屏蔽层的图形之后，并且在所述衬底基板的另一侧形成包括电性连接的周边走线与触控结构的图形之前，翻转所述衬底基板。
  12. 如权利要求10所述的制作方法，其中，在所述衬底基板的一侧形成包括电性连接的周边走线与触控结构的图形之后，并且在所述衬底基板的另一侧形成包括屏蔽层的图形之前，翻转所述衬底基板。
  13. 如权利要求10-12任一项所述的制作方法，其中，所述形成包括电性连接的周边走线与触控结构的图形，包括：
    形成包括桥接层的图形；
    在所述桥接层上形成包括绝缘层的图形；
    在所述绝缘层上形成包括同层设置且交叉而置的触控感应电极和触控驱动电极的图形；以及
    在所述衬底基板上形成包括周边走线的图形。
  14. 如权利要求10-13任一项所述的制作方法，还包括：
    在形成包括电性连接的周边走线与触控电极的图形之前，在所述衬底基板上形成包括抗反射层的图形，其中，所述抗反射层位于所述衬底基板与所述触控结构之间。
  15. 如权利要求10-14任一所述的制作方法，还包括：
    在形成包括电性连接的周边走线与触控电极的图形之后，在所述衬底基板上形成覆盖所述触控结构和所述周边走线的钝化层。
  16. 一种显示装置，包括如权利要求1-9任一项所述的触摸屏。
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