WO2017000331A1 - 互电容触控显示面板及其制作方法 - Google Patents

互电容触控显示面板及其制作方法 Download PDF

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Publication number
WO2017000331A1
WO2017000331A1 PCT/CN2015/084867 CN2015084867W WO2017000331A1 WO 2017000331 A1 WO2017000331 A1 WO 2017000331A1 CN 2015084867 W CN2015084867 W CN 2015084867W WO 2017000331 A1 WO2017000331 A1 WO 2017000331A1
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Prior art keywords
substrate
touch
liquid crystal
display panel
crystal layer
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PCT/CN2015/084867
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English (en)
French (fr)
Inventor
徐向阳
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深圳市华星光电技术有限公司
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Priority to US14/778,609 priority Critical patent/US20170220159A1/en
Publication of WO2017000331A1 publication Critical patent/WO2017000331A1/zh

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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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    • G06F2203/04104—Multi-touch detection in digitiser, i.e. details about the simultaneous detection of a plurality of touching locations, e.g. multiple fingers or pen and finger

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a mutual capacitance touch display panel and a manufacturing method thereof.
  • touch display panels have been widely accepted and used by people, such as smart phones, tablets, etc., using touch display panels.
  • the touch display panel integrates the touch panel and the liquid crystal display panel by using the embedded touch technology, and the touch panel function is embedded in the liquid crystal display panel, so that the liquid crystal display panel has the functions of displaying and sensing the touch input at the same time.
  • the liquid crystal display panel usually comprises a color filter substrate (CF), a thin film transistor array substrate (Thin Film Transistor Array Substrate, TFT Array Substrate), and a liquid crystal layer (Liquid Crystal Layer) disposed between the two substrates.
  • the working principle is that the rotation of the liquid crystal molecules of the liquid crystal layer is controlled by applying a driving voltage on the two glass substrates, and the light of the backlight module is refracted to generate a picture.
  • liquid crystal display panels on the mainstream market can be classified into the following types: Vertical Alignment (VA) type, Twisted Nematic (TN) or Super Twisted (Super Twisted). Nematic, STN) type, In-Plane Switching (IPS) type, and Fringe Field Switching (FFS) type.
  • VA Vertical Alignment
  • TN Twisted Nematic
  • IPS In-Plane Switching
  • FFS Fringe Field Switching
  • Touch display panels can be divided into resistive, capacitive, optical, and acoustic waves according to different sensing technologies.
  • the mainstream touch technology is capacitive, and the capacitive type is divided into self-capacitance and mutual capacitance.
  • the capacitive touch display panels on the market are mainly mutual capacitance type, and the mutual capacitance has the advantage that multi-touch can be realized.
  • the touch display panel can be divided according to the structure: the touch circuit is covered on the liquid crystal cell (On Cell), the touch circuit is embedded in the liquid crystal cell (In Cell), and the external type.
  • the In cell type has the advantages of low cost, ultra-thin, and narrow bezel, and is mainly used in high-end touch products.
  • the sensitivity is poor.
  • the most widely used touch display panel on the market is still plug-in type, and the external type has the advantages of high sensitivity and fast response speed, but the disadvantage is high cost and limited product thinning.
  • On Cell integrates the advantages of external and In cell type, which can improve sensitivity and reduce panel thickness, but it can only be used in the process of making On Cell touch display panel. After the crystal forming box is plated on the surface of the panel, the transparent electrode indium tin oxide (ITO) for making the touch circuit is used, and the annealing temperature of the ITO is limited, so that the resistance is hard to be lowered, and the touch sensitivity is limited.
  • ITO indium tin oxide
  • An object of the present invention is to provide a mutual capacitance touch display panel, wherein the touch sensing electrode has low resistance and high touch sensitivity.
  • the object of the present invention is to provide a method for manufacturing a mutual capacitance touch display panel, which can reduce the resistance of the touch sensing electrode and increase the touch of the touch display panel without increasing the process technology and affecting the panel aperture ratio. Control sensitivity.
  • the present invention provides a mutual-capacitive touch display panel, comprising: a TFT array substrate, a CF substrate disposed opposite to the TFT array substrate, and a liquid crystal interposed between the TFT array substrate and the CF substrate. a plurality of mutually adjacent touch-emitting emitter electrodes disposed on a side of the CF substrate away from the liquid crystal layer, and a plurality of mutually disposed parallel electrodes disposed on a side of the CF substrate adjacent to the liquid crystal layer and spatially perpendicular to the touch emission a transparent touch sensing electrode of the electrode;
  • the touch sensing electrode is subjected to a high temperature annealing process.
  • the CF substrate includes a substrate, and the plurality of touch emitter electrodes are disposed on a surface of the substrate away from the liquid crystal layer, and the plurality of touch sensing electrodes are disposed on a surface of the substrate adjacent to the liquid crystal layer;
  • the CF substrate further includes a color color resistance disposed on the substrate and the plurality of touch sensing electrodes, a black matrix separating the color color resistors, a photoresist spacer disposed on the black matrix, and a cover The color resist, the black matrix, and the alignment film of the photoresist spacer.
  • the material of the touch sensing electrode is ITO.
  • the thickness of the touch sensing electrode is the thickness of the touch sensing electrode.
  • the material of the touch emitting electrode is ITO or metal.
  • the present invention also provides a mutual-capacitive touch display panel, comprising: a TFT array substrate, a CF substrate disposed opposite to the TFT array substrate, and a liquid crystal layer interposed between the TFT array substrate and the CF substrate; a plurality of mutually adjacent touch-emitting emitter electrodes on a side of the CF substrate away from the liquid crystal layer, and a plurality of transparent electrodes disposed on the side of the CF substrate adjacent to the liquid crystal layer and parallel to each other and spatially perpendicular to the touch emitter electrode Touch sensing electrode;
  • the touch sensing electrode is subjected to high temperature annealing treatment
  • the CF substrate includes a substrate, and the plurality of touch emitter electrodes are disposed on a surface of the substrate away from the liquid crystal layer, and the plurality of touch sensing electrodes are disposed on a surface of the substrate adjacent to the liquid crystal layer.
  • the CF substrate further includes a color color resistance disposed on the substrate and the plurality of touch sensing electrodes, a black matrix separating the color color resistors, and a photoresist spacer disposed on the black matrix. And an alignment film covering the color resist, the black matrix, and the photoresist spacer;
  • the material of the touch sensing electrode is ITO
  • the material of the touch emitting electrode is ITO or metal.
  • the invention also provides a method for manufacturing a mutual capacitance touch display panel, comprising the following steps:
  • Step 1 Providing a substrate, plating a transparent conductive film on one surface of the substrate, and then patterning the transparent conductive film by a mask etching process to form a plurality of transparent touches that are parallel to each other. Controlled sensing electrode;
  • Step 2 performing high temperature annealing on the plurality of transparent touch sensing electrodes that are parallel to each other to reduce the resistance of the touch sensing electrode;
  • Step 3 sequentially forming a black matrix, a color color resist, and a photoresist spacer on the substrate and the touch sensing electrode by a mask etching process;
  • the black matrix is spaced apart by a color color resistor, and the photoresist spacer is disposed on the black matrix;
  • Step 4 applying an alignment liquid on the color resist, the black matrix, and the photoresist spacer to form an alignment film, thereby completing the fabrication of the CF substrate;
  • Step 5 providing a TFT array substrate, the TFT array substrate and the CF substrate are grouped, the touch sensing electrode is directed toward the TFT array substrate, and liquid crystal is poured between the TFT array substrate and the CF substrate to form a liquid crystal layer;
  • Step 6 plating a conductive film on the surface of the substrate of the CF substrate away from the liquid crystal layer, and then patterning the conductive film by a mask etching process to form a plurality of parallel and spatially perpendicular to each other.
  • the touch transmitting electrode of the touch sensing electrode is
  • the material of the transparent conductive film in the step 1 is ITO.
  • the thickness of the transparent conductive film is
  • the material of the conductive film in the step 6 is ITO or metal.
  • the substrate is a glass substrate.
  • the present invention provides a mutual-capacitive touch display panel, which integrates the touch-emitting electrode on the side of the CF substrate away from the liquid crystal layer, and integrates the transparent touch-sensing electrode on the CF substrate near the liquid crystal layer.
  • the touch sensing electrodes are subjected to high temperature annealing, so that the resistance of the touch sensing electrodes is low, and the touch sensitivity of the touch display panel is high.
  • the invention provides a method for manufacturing a mutual-capacitive touch display panel, wherein a transparent touch sensing electrode is formed on a surface of the CF substrate adjacent to the liquid crystal layer before the liquid crystal layer is formed, and high-temperature annealing is used to reduce the touch sensing.
  • the resistance of the electrode is further formed on the surface of the CF substrate away from the liquid crystal layer after the formation of the CF substrate and the TFT substrate pair and the liquid crystal layer, thereby achieving the process of not increasing the process and not affecting the panel aperture ratio. In this case, the resistance of the touch sensing electrode is reduced, and the touch sensitivity of the touch display panel is improved.
  • FIG. 1 is a cross-sectional structural view of a mutual capacitance touch display panel of the present invention
  • FIG. 2 is a top plan view of a touch sensing electrode and a touch emitting electrode of a mutual capacitance touch display panel according to the present invention
  • FIG. 3 is a flow chart of a method for fabricating a mutual capacitance touch display panel according to the present invention.
  • the present invention firstly provides a mutual-capacitive touch display panel, comprising: a TFT array substrate 1, a CF substrate 2 disposed opposite to the TFT array substrate 1, and a TFT array interposed therebetween. a liquid crystal layer 3 between the substrate 1 and the CF substrate 2, a plurality of mutually adjacent touch emitter electrodes 4 disposed on a side of the CF substrate 2 remote from the liquid crystal layer 3, and a CF substrate 2 disposed adjacent to the liquid crystal layer 3
  • the plurality of strips on one side are parallel to each other and spatially perpendicular to the transparent touch sensing electrodes 5 of the touch emitter electrode 4.
  • the TFT array substrate 1 includes a base substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source/drain, a pixel electrode, a protective layer, a comb-shaped common electrode, an alignment film, and the like, and the prior art IPS type and
  • the TFT array substrate of the FFS type liquid crystal display panel is the same, and will not be described in detail herein.
  • the CF substrate 2 includes a substrate 21, and the plurality of touch emitter electrodes 4 are disposed on a surface of the substrate 1 away from the liquid crystal layer 3, and the plurality of touch sensing electrodes 5 are disposed on the substrate 1 near the liquid crystal layer.
  • the CF substrate 2 further includes a color color resistor 22 disposed on the substrate 21 and the plurality of touch sensing electrodes 5, and a black matrix 23 that spaces the color color resistors 22.
  • the touch sensing electrode 5 is subjected to a high temperature annealing process.
  • the substrate 21 is a glass substrate.
  • the material of the touch sensing electrode 5 is indium tin oxide (ITO), and the thickness is
  • the material of the touch emitting electrode 4 may be ITO or metal.
  • the mutual-capacitive touch display panel of the present invention integrates the touch-emitting electrode 4 on the side of the CF substrate 2 away from the liquid crystal layer 3, and integrates the transparent touch-sensing electrode 5 on the side of the CF substrate 2 near the liquid crystal layer 3, and
  • the touch sensing electrode 5 is subjected to a high temperature annealing process, so that the resistance of the touch sensing electrode 5 is low, and the touch sensitivity of the touch display panel is high.
  • the present invention further provides a method for manufacturing a mutual capacitance touch display panel, comprising the following steps:
  • Step 1 providing a substrate 21, plating a transparent conductive film on one surface of the substrate 21, and then patterning the transparent conductive film by a mask etching process to form a plurality of parallel transparent Touch sensing electrode 5.
  • the substrate 21 is preferably a glass substrate; the transparent conductive film is made of ITO and has a thickness of
  • Step 2 Perform high temperature annealing on the plurality of transparent touch sensing electrodes 5 that are parallel to each other to reduce the resistance of the touch sensing electrode 5.
  • Step 3 A black matrix 23, a color color resistor 22, and a photoresist spacer 24 are sequentially formed on the substrate 21 and the touch sensing electrode 5 by a mask etching process.
  • the black matrix 23 is spaced apart from the color resists 22, and the photoresist spacers 24 are disposed on the black matrix 23.
  • Step 4 Applying an alignment liquid to the color resist 22, the black matrix 23, and the photoresist spacer 24 to form an alignment film 25, thereby completing the fabrication of the CF substrate 2.
  • Step 5 A TFT array substrate 1 is provided, and the TFT array substrate 1 and the CF substrate 2 are paired, and the touch sensing electrodes 5 are directed toward the TFT array substrate 1, and liquid crystal is poured between the TFT array substrate 1 and the CF substrate 2.
  • the liquid crystal layer 3 is formed.
  • the structure and process of the TFT array substrate 1 are the same as those of the TFT array substrate of the IPS type and the FFS type liquid crystal display panel in the prior art, and are not described in detail herein.
  • Step 6 plating a conductive film on the surface of the substrate 21 of the CF substrate 2 away from the liquid crystal layer 3, and then patterning the conductive film by a mask etching process to form a plurality of parallel and spatially
  • the touch emitter electrode 4 is perpendicular to the touch sensing electrode 5.
  • the material of the conductive film is ITO or metal.
  • a transparent touch sensing electrode 5 is formed on the surface of the CF substrate 2 near the liquid crystal layer 3, and high-temperature annealing is used to reduce the touch.
  • the touch emitter electrode 4 is formed on the surface of the CF substrate 2 away from the liquid crystal layer 3, thereby realizing that the process is not increased. Reduce the touch when the process does not affect the panel aperture ratio
  • the resistance of the sensing electrode 5 improves the touch sensitivity of the touch display panel.
  • the mutual-capacitive touch display panel of the present invention integrates the touch-emitting electrode on the side of the CF substrate away from the liquid crystal layer, and integrates the transparent touch-sensing electrode on the side of the CF substrate close to the liquid crystal layer, and The touch sensing electrode is subjected to high temperature annealing, so that the resistance of the touch sensing electrode is low, and the touch sensitivity of the touch display panel is high.
  • a transparent touch sensing electrode is formed on a surface of the CF substrate close to the liquid crystal layer before the liquid crystal layer is formed, and high-temperature annealing is used to reduce the resistance of the touch sensing electrode.
  • the touch emitter electrode is formed on the surface of the CF substrate away from the liquid crystal layer, so that the process is not increased, and the panel aperture ratio is not affected.
  • the resistance of the touch sensing electrode is reduced, and the touch sensitivity of the touch display panel is improved.

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Abstract

本发明提供一种互电容触控显示面板及其制作方法。该互电容触控显示面板将触控发射电极(4)集成在CF基板(2)远离液晶层(3)的一侧，将透明的触控感应电极(5)集成在CF基板(2)靠近液晶层(3)的一侧，且触控感应电极(5)经过高温退火处理。该互电容触控显示面板的制作方法，于液晶层(3)形成以前在CF基板(2)靠近液晶层(3)一侧的表面上制作出透明的触控感应电极(5)，并采用高温退火来降低触控感应电极(5)的电阻，再在CF基板(2)与TFT基板(1)对组、液晶层(3)形成以后在CF基板(2)远离液晶层(3)一侧的表面上制作出触控发射电极(4)。本发明能够降低触控感应电极的电阻，提升触控显示面板的触控灵敏度。

Description

互电容触控显示面板及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种互电容触控显示面板及其制作方法。
背景技术
随着显示技术的飞速发展，触控显示面板已经广泛地被人们所接受及使用，如智能手机、平板电脑等均使用了触控显示面板。触控显示面板采用嵌入式触控技术将触控面板和液晶显示面板结合为一体，并将触控面板功能嵌入到液晶显示面板内，使得液晶显示面板同时具备显示和感知触控输入的功能。
液晶显示面板的通常是由一彩色滤光片基板(Color Filter，CF)、一薄膜晶体管阵列基板(Thin Film Transistor Array Substrate，TFT Array Substrate)以及一配置于两基板间的液晶层(Liquid Crystal Layer)所构成，其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转，将背光模组的光线折射出来产生画面。按照液晶的取向方式不同，目前主流市场上的液晶显示面板可以分为以下几种类型：垂直配向(Vertical Alignment，VA)型、扭曲向列(Twisted Nematic，TN)或超扭曲向列(Super Twisted Nematic，STN)型、平面转换(In-Plane Switching，IPS)型、及边缘场开关(Fringe Field Switching，FFS)型。
触控显示面板依感应技术不同可分为电阻式、电容式、光学式、音波式四种，目前主流的触控技术为电容式，其中电容式又分为自电容式和互电容式，目前市场上的电容式触控显示面板为主要为互电容式，互电容的优点在于可实现多点触控。触控显示面板根据结构不同可划分为：触控电路覆盖于液晶盒上式(On Cell)，触控电路内嵌在液晶盒内式(In Cell)、以及外挂式。其中，In cell式具有成本低、超薄、和窄边框的优点，主要应用在高端触控产品中，但由于In cell式触控技术工艺难度较大，信号干扰等因素，其灵敏度较差。目前市场上应用最多的触控显示面板仍为外挂式，外挂式的优点在于灵敏度高，响应速度快，但缺点是成本高，产品超薄化受限制。On Cell式集成了外挂式和In cell式的优点，既能提高灵敏度又能降低面板厚度，但由于在On Cell式触控显示面板的制作过程中，只能在液 晶成盒之后在面板表面镀用于制作触控电路的透明电极氧化铟锡(ITO)，ITO退火温度受限制，因此电阻很难降低，导致触控灵敏度提高受限。
发明内容
本发明的目的在于提供一种互电容触控显示面板，其触控感应电极的电阻较低，触控灵敏度较高。
本发明的目的还在于提供一种互电容触控显示面板的制作方法，能够在不增加制程工艺、不影响面板开口率的情况下，降低触控感应电极的电阻，提升触控显示面板的触控灵敏度。
为实现上述目的，本发明提供一种互电容触控显示面板，包括：TFT阵列基板、与所述TFT阵列基板相对设置的CF基板、夹设于所述TFT阵列基板与CF基板之间的液晶层、设于所述CF基板远离液晶层一侧的数条相互平行的触控发射电极、及设于所述CF基板靠近液晶层一侧的数条相互平行且在空间上垂直于触控发射电极的透明的触控感应电极；
所述触控感应电极经过高温退火处理。
所述CF基板包括基板，所述数条触控发射电极设于该基板远离液晶层一侧的表面上，所述数条触控感应电极设于该基板靠近液晶层一侧的表面上；所述CF基板还包括设于所述基板与数条触控感应电极上的彩色色阻、将所述彩色色阻间隔开的黑色矩阵、设于所述黑色矩阵上的光阻间隔物、及覆盖所述彩色色阻、黑色矩阵、与光阻间隔物的配向膜。
所述触控感应电极的材料为ITO。
所述触控感应电极的厚度为
Figure PCTCN2015084867-appb-000001
所述触控发射电极的材料为ITO或金属。
本发明还提供一种互电容触控显示面板，包括：TFT阵列基板、与所述TFT阵列基板相对设置的CF基板、夹设于所述TFT阵列基板与CF基板之间的液晶层、设于所述CF基板远离液晶层一侧的数条相互平行的触控发射电极、及设于所述CF基板靠近液晶层一侧的数条相互平行且在空间上垂直于触控发射电极的透明的触控感应电极；
所述触控感应电极经过高温退火处理；
其中，所述CF基板包括基板，所述数条触控发射电极设于该基板远离液晶层一侧的表面上，所述数条触控感应电极设于该基板靠近液晶层一侧的表面上；所述CF基板还包括设于所述基板与数条触控感应电极上的彩色色阻、将所述彩色色阻间隔开的黑色矩阵、设于所述黑色矩阵上的光阻间隔物、及覆盖所述彩色色阻、黑色矩阵、与光阻间隔物的配向膜；
其中，所述触控感应电极的材料为ITO；
其中，所述触控发射电极的材料为ITO或金属。
本发明还提供一种互电容触控显示面板的制作方法，包括如下步骤：
步骤1、提供一基板，在所述基板的一侧表面上镀一层透明导电膜，然后通过掩膜刻蚀工艺对所述透明导电膜进行图案化处理，形成数条相互平行的透明的触控感应电极；
步骤2、对所述数条相互平行的透明的触控感应电极进行高温退火，以降低触控感应电极的电阻；
步骤3、通过掩膜刻蚀工艺依次在所述基板与触控感应电极上制作出黑色矩阵、彩色色阻、及光阻间隔物；
其中，所述黑色矩阵将彩色色阻间隔开，所述光阻间隔物设于所述黑色矩阵上；
步骤4、在所述彩色色阻、黑色矩阵、与光阻间隔物上涂布配向液，形成配向膜，完成CF基板的制作；
步骤5、提供一TFT阵列基板，将TFT阵列基板与CF基板对组，使所述触控感应电极朝向TFT阵列基板，向TFT阵列基板与CF基板之间灌入液晶，形成液晶层；
步骤6、在CF基板的基板远离液晶层一侧的表面上镀一层导电膜，然后通过掩膜刻蚀工艺对所述导电膜进行图案化处理，形成数条相互平行且在空间上垂直于触控感应电极的触控发射电极。
所述步骤1中的透明导电膜的材料为ITO。
所述透明导电膜的厚度为
Figure PCTCN2015084867-appb-000002
所述步骤6中导电膜的材料为ITO或金属。
所述基板为玻璃基板。
本发明的有益效果：本发明提供的一种互电容触控显示面板，将触控发射电极集成在CF基板远离液晶层的一侧，将透明的触控感应电极集成在CF基板靠近液晶层的一侧，且触控感应电极经过高温退火处理，从而触控感应电极的电阻较低，触控显示面板的触控灵敏度较高。本发明提供的一种互电容触控显示面板的制作方法，于液晶层形成以前在CF基板靠近液晶层一侧的表面上制作出透明的触控感应电极，并采用高温退火来降低触控感应电极的电阻，再在CF基板与TFT基板对组、液晶层形成以后在CF基板远离液晶层一侧的表面上制作出触控发射电极，实现了在不增加制程工艺、不影响面板开口率的情况下，降低触控感应电极的电阻，提升触控显示面板的触控灵敏度。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明的互电容触控显示面板的剖面结构示意图；
图2为本发明的互电容触控显示面板的触控感应电极和触控发射电极的俯视示意图；
图3为本发明的互电容触控显示面板的制作方法的流程图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请同时参阅图1与图2，本发明首先提供一种互电容触控显示面板，包括：TFT阵列基板1、与所述TFT阵列基板1相对设置的CF基板2、夹设于所述TFT阵列基板1与CF基板2之间的液晶层3、设于所述CF基板2远离液晶层3一侧的数条相互平行的触控发射电极4、及设于所述CF基板2靠近液晶层3一侧的数条相互平行且在空间上垂直于触控发射电极4的透明的触控感应电极5。
所述TFT阵列基板1包括衬底基板、栅极、栅极绝缘层、半导体层、源\漏极、像素电极、保护层、梳形公共电极、配向膜等，与现有技术中IPS型和FFS型液晶显示面板的TFT阵列基板无异，此处不展开详述。
所述CF基板2包括基板21，所述数条触控发射电极4设于该基板1远离液晶层3一侧的表面上，所述数条触控感应电极5设于该基板1靠近液晶层3一侧的表面上；所述CF基板2还包括设于所述基板21与数条触控感应电极5上的彩色色阻22、将所述彩色色阻22间隔开的黑色矩阵23、设于所述黑色矩阵23上的光阻间隔物24、及覆盖所述彩色色阻22、黑色矩阵23、与光阻间隔物24的配向膜25。
所述触控感应电极5经过高温退火处理。
具体地，所述基板21为玻璃基板。
所述触控感应电极5的材料为氧化铟锡(ITO)，厚度为
Figure PCTCN2015084867-appb-000003
所述触控发射电极4的材料可为ITO，也可为金属。
本发明的互电容触控显示面板将触控发射电极4集成在CF基板2远离液晶层3的一侧，将透明的触控感应电极5集成在CF基板2靠近液晶层3的一侧，且触控感应电极5经过高温退火处理，从而触控感应电极5的电阻较低，触控显示面板的触控灵敏度较高。
请参阅图3，结合图1与图2，本发明还提供一种互电容触控显示面板的制作方法，包括如下步骤：
步骤1、提供一基板21，在所述基板21的一侧表面上镀一层透明导电膜，然后通过掩膜刻蚀工艺对所述透明导电膜进行图案化处理，形成数条相互平行的透明的触控感应电极5。
具体地，所述基板21优选为玻璃基板；所述透明导电膜的材料为ITO，厚度为
Figure PCTCN2015084867-appb-000004
步骤2、对所述数条相互平行的透明的触控感应电极5进行高温退火，以降低触控感应电极5的电阻。
步骤3、通过掩膜刻蚀工艺依次在所述基板21与触控感应电极5上制作出黑色矩阵23、彩色色阻22、及光阻间隔物24。
其中，所述黑色矩阵23将彩色色阻22间隔开，所述光阻间隔物24设于所述黑色矩阵23上。
步骤4、在所述彩色色阻22、黑色矩阵23、与光阻间隔物24上涂布配向液，形成配向膜25，完成CF基板2的制作。
步骤5、提供一TFT阵列基板1，将TFT阵列基板1与CF基板2对组，使所述触控感应电极5朝向TFT阵列基板1，向TFT阵列基板1与CF基板2之间灌入液晶，形成液晶层3。
其中，所述TFT阵列基板1的结构及制程过程与现有技术中IPS型和FFS型液晶显示面板的TFT阵列基板无异，此处不展开详述。
步骤6、在CF基板2的基板21远离液晶层3一侧的表面上镀一层导电膜，然后通过掩膜刻蚀工艺对所述导电膜进行图案化处理，形成数条相互平行且在空间上垂直于触控感应电极5的触控发射电极4。
具体地，所述导电膜的材料为ITO或金属。
本发明的互电容触控显示面板的制作方法，于液晶层3形成以前在CF基板2靠近液晶层3一侧的表面上制作出透明的触控感应电极5，并采用高温退火来降低触控感应电极5的电阻，再在CF基板2与TFT基板1对组、液晶层3形成以后在CF基板2远离液晶层3一侧的表面上制作出触控发射电极4，实现了在不增加制程工艺、不影响面板开口率的情况下，降低触控 感应电极5的电阻，提升触控显示面板的触控灵敏度。
综上所述，本发明的互电容触控显示面板，将触控发射电极集成在CF基板远离液晶层的一侧，将透明的触控感应电极集成在CF基板靠近液晶层的一侧，且触控感应电极经过高温退火处理，从而触控感应电极的电阻较低，触控显示面板的触控灵敏度较高。本发明的互电容触控显示面板的制作方法，于液晶层形成以前在CF基板靠近液晶层一侧的表面上制作出透明的触控感应电极，并采用高温退火来降低触控感应电极的电阻，再在CF基板与TFT基板对组、液晶层形成以后在CF基板远离液晶层一侧的表面上制作出触控发射电极，实现了在不增加制程工艺、不影响面板开口率的情况下，降低触控感应电极的电阻，提升触控显示面板的触控灵敏度。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (12)

  1. 一种互电容触控显示面板，包括：TFT阵列基板、与所述TFT阵列基板相对设置的CF基板、夹设于所述TFT阵列基板与CF基板之间的液晶层、设于所述CF基板远离液晶层一侧的数条相互平行的触控发射电极、及设于所述CF基板靠近液晶层一侧的数条相互平行且在空间上垂直于触控发射电极的透明的触控感应电极；
    所述触控感应电极经过高温退火处理。
  2. 如权利要求1所述的互电容触控显示面板，其中，所述CF基板包括基板，所述数条触控发射电极设于该基板远离液晶层一侧的表面上，所述数条触控感应电极设于该基板靠近液晶层一侧的表面上；所述CF基板还包括设于所述基板与数条触控感应电极上的彩色色阻、将所述彩色色阻间隔开的黑色矩阵、设于所述黑色矩阵上的光阻间隔物、及覆盖所述彩色色阻、黑色矩阵、与光阻间隔物的配向膜。
  3. 如权利要求1所述的互电容触控显示面板，其中，所述触控感应电极的材料为ITO。
  4. 如权利要求3所述的互电容触控显示面板，其中，所述触控感应电极的厚度为
    Figure PCTCN2015084867-appb-100001
  5. 如权利要求1所述的互电容触控显示面板，其中，所述触控发射电极的材料为ITO或金属。
  6. 一种互电容触控显示面板，包括：TFT阵列基板、与所述TFT阵列基板相对设置的CF基板、夹设于所述TFT阵列基板与CF基板之间的液晶层、设于所述CF基板远离液晶层一侧的数条相互平行的触控发射电极、及设于所述CF基板靠近液晶层一侧的数条相互平行且在空间上垂直于触控发射电极的透明的触控感应电极；
    所述触控感应电极经过高温退火处理；
    其中，所述CF基板包括基板，所述数条触控发射电极设于该基板远离液晶层一侧的表面上，所述数条触控感应电极设于该基板靠近液晶层一侧的表面上；所述CF基板还包括设于所述基板与数条触控感应电极上的彩色色阻、将所述彩色色阻间隔开的黑色矩阵、设于所述黑色矩阵上的光阻间隔物、及覆盖所述彩色色阻、黑色矩阵、与光阻间隔物的配向膜；
    其中，所述触控感应电极的材料为ITO；
    其中，所述触控发射电极的材料为ITO或金属。
  7. 如权利要求6所述的互电容触控显示面板，其中，所述触控感应电极的厚度为
    Figure PCTCN2015084867-appb-100002
  8. 一种互电容触控显示面板的制作方法，包括如下步骤：
    步骤1、提供一基板，在所述基板的一侧表面上镀一层透明导电膜，然后通过掩膜刻蚀工艺对所述透明导电膜进行图案化处理，形成数条相互平行的透明的触控感应电极；
    步骤2、对所述数条相互平行的透明的触控感应电极进行高温退火，以降低触控感应电极的电阻；
    步骤3、通过掩膜刻蚀工艺依次在所述基板与触控感应电极上制作出黑色矩阵、彩色色阻、及光阻间隔物；
    其中，所述黑色矩阵将彩色色阻间隔开，所述光阻间隔物设于所述黑色矩阵上；
    步骤4、在所述彩色色阻、黑色矩阵、与光阻间隔物上涂布配向液，形成配向膜，完成CF基板的制作；
    步骤5、提供一TFT阵列基板，将TFT阵列基板与CF基板对组，使所述触控感应电极朝向TFT阵列基板，向TFT阵列基板与CF基板之间灌入液晶，形成液晶层；
    步骤6、在CF基板的基板远离液晶层一侧的表面上镀一层导电膜，然后通过掩膜刻蚀工艺对所述导电膜进行图案化处理，形成数条相互平行且在空间上垂直于触控感应电极的触控发射电极。
  9. 如权利要求8所述的互电容触控显示面板的制作方法，其中，所述步骤1中的透明导电膜的材料为ITO。
  10. 如权利要求9所述的互电容触控显示面板的制作方法，其中，所述透明导电膜的厚度为
    Figure PCTCN2015084867-appb-100003
  11. 如权利要求8所述的互电容触控显示面板的制作方法，其中，所述步骤6中导电膜的材料为ITO或金属。
  12. 如权利要求8所述的互电容触控显示面板的制作方法，其中，所述基板为玻璃基板。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110441968A (zh) * 2019-08-14 2019-11-12 京东方科技集团股份有限公司 一种液晶显示面板和显示装置

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105159516B (zh) * 2015-09-18 2018-01-12 深圳市华星光电技术有限公司 触控显示面板及触控显示装置
CN105302363A (zh) * 2015-09-18 2016-02-03 京东方科技集团股份有限公司 一种触摸屏的制备方法、触摸屏及显示装置
WO2020129323A1 (ja) * 2018-12-21 2020-06-25 株式会社ジャパンディスプレイ 表示装置
KR20200131691A (ko) * 2019-05-14 2020-11-24 엘지디스플레이 주식회사 터치 센서를 가지는 표시 장치
CN111129082A (zh) * 2019-12-04 2020-05-08 武汉华星光电半导体显示技术有限公司 显示面板及制作方法
CN112885873A (zh) * 2021-01-14 2021-06-01 京东方科技集团股份有限公司 显示面板及其制备方法、显示装置
CN113325625B (zh) * 2021-06-24 2022-07-29 业成科技（成都）有限公司 显示面板的制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103699262A (zh) * 2013-12-20 2014-04-02 合肥京东方光电科技有限公司 一种触摸屏及其制作方法、显示装置
CN104375707A (zh) * 2014-11-21 2015-02-25 重庆京东方光电科技有限公司 触摸显示面板及触摸显示装置
CN104731423A (zh) * 2013-12-20 2015-06-24 胜华科技股份有限公司 元件基板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI292068B (en) * 2004-04-30 2008-01-01 Innolux Display Corp Liquid crystal display device
CN104965621B (zh) * 2006-06-09 2018-06-12 苹果公司 触摸屏液晶显示器及其操作方法
CN102693030A (zh) * 2011-03-21 2012-09-26 奇美电子股份有限公司 触控式显示面板的制作方法
CN103294253A (zh) * 2012-12-26 2013-09-11 厦门天马微电子有限公司 触控显示面板

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103699262A (zh) * 2013-12-20 2014-04-02 合肥京东方光电科技有限公司 一种触摸屏及其制作方法、显示装置
CN104731423A (zh) * 2013-12-20 2015-06-24 胜华科技股份有限公司 元件基板
CN104375707A (zh) * 2014-11-21 2015-02-25 重庆京东方光电科技有限公司 触摸显示面板及触摸显示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110441968A (zh) * 2019-08-14 2019-11-12 京东方科技集团股份有限公司 一种液晶显示面板和显示装置
CN110441968B (zh) * 2019-08-14 2022-07-12 京东方科技集团股份有限公司 一种液晶显示面板和显示装置

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