WO2016169159A1 - 彩膜基板及其制作方法、显示装置 - Google Patents
彩膜基板及其制作方法、显示装置 Download PDFInfo
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- WO2016169159A1 WO2016169159A1 PCT/CN2015/086762 CN2015086762W WO2016169159A1 WO 2016169159 A1 WO2016169159 A1 WO 2016169159A1 CN 2015086762 W CN2015086762 W CN 2015086762W WO 2016169159 A1 WO2016169159 A1 WO 2016169159A1
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- WIPO (PCT)
- Prior art keywords
- insulating layer
- transparent insulating
- light
- layer
- color film
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/047—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/206—Filters comprising particles embedded in a solid matrix
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Definitions
- the present invention relates to the field of display technologies, and in particular, to a color film substrate, a manufacturing method thereof, and a display device.
- the existing display device with touch function can be generally divided into an on-cell touch panel and an in-cell touch panel.
- FIG. 1 it is a schematic diagram of a color filter substrate in a common on cell touch panel in the prior art.
- the color filter substrate includes a substrate 1 and a color film layer 2 formed on a lower surface of the substrate 1 .
- the touch electrode line pattern 3 on the upper surface of the substrate 1.
- the touch electrode line pattern 3 described above is generally made of an ITO material, and the refractive index of the ITO material is 2.
- the light passing through the ITO material is shifted to the left, and the light that is not passed through the ITO material is directly refracted without shifting to the left.
- the light that should be emitted through the area is shifted to the left, and the light in the area on the right side of the area does not shift to the left because it does not pass through the touch electrode line pattern.
- This causes light loss in the corresponding area, forming a dark area as shown in the figure.
- the light in the area on the left side of the touch electrode line pattern 3 is not shifted to the left, and is superimposed with the light that is shifted to the area by the touch electrode line pattern to form a bright area as shown in the figure. This will cause the brightness difference line to appear in the display.
- the present invention provides a color filter substrate comprising: a substrate, a color film layer formed on the substrate; and a transparent insulating layer formed on the light emitting surface of the color film layer and formed on the transparent insulating layer
- the touch electrode line pattern on the light-emitting surface, the refractive index of the transparent insulating layer is consistent with the refractive index of the touch electrode line pattern.
- the color film layer is formed on the first surface of the substrate, and the transparent insulating layer is formed on the second surface of the substrate facing away from the color film layer.
- the transparent insulating layer has a thickness of N ⁇ /4n, wherein N is an odd number, ⁇ is a center wavelength of the outgoing light, and n is a refractive index of the transparent insulating layer.
- the thickness of the transparent insulating layer corresponding to the color film layers of different colors is N ⁇ /4n, where N is an odd number, and ⁇ is the center wavelength of each light passing through the color film layers of different colors, n is The refractive index of the transparent insulating layer.
- the transparent insulating layer is made of a material mixed with a Nb 2 O 5 material and a SiO 2 material.
- the Nb 2 O 5 material is particles having a diameter of 6 nm
- the SiO 2 material is particles having a diameter of 40 nm.
- the color filter substrate further includes a flat layer; the flat layer covers a light emitting surface of the touch electrode line pattern and a light emitting surface of the transparent insulating layer.
- the present invention provides a method of fabricating a color filter substrate, including:
- forming the transparent insulating layer on the light emitting surface of the color film layer comprises:
- the transparent insulating layer is formed on a surface of the substrate facing away from the color film layer.
- the transparent insulating layer has a thickness of N* ⁇ /4n, wherein N is an odd number, ⁇ is a center wavelength of the outgoing light, and n is a refractive index of the transparent insulating layer.
- the thickness of the transparent insulating layer corresponding to the color film layers of different colors is N ⁇ /4n, where N is an odd number, and ⁇ is the center wavelength of each light passing through the color film layers of different colors, n is The refractive index of the transparent insulating layer.
- the transparent insulating layer is made of a material mixed with a Nb 2 O 5 material and a SiO 2 material.
- the Nb 2 O 5 material is particles having a diameter of 6 nm
- the SiO 2 material is particles having a diameter of 40 nm.
- the method further includes forming a flat layer on the light-emitting surface of the touch electrode line pattern and the light-emitting surface of the transparent insulating layer.
- the present invention provides a display device comprising the color filter substrate of any of the above embodiments.
- the color film substrate provided by the invention can effectively weaken the brightness difference line generated by the touch electrode line pattern.
- FIG. 1 is a schematic structural view of a color filter substrate in the prior art
- FIG. 2 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention.
- FIG. 3 is a schematic structural diagram of a color filter substrate according to another embodiment of the present invention.
- the first embodiment of the present invention provides a color filter substrate.
- the color filter substrate includes: a substrate 1 and a color film layer 2 formed on a lower surface of the substrate 1; and further includes: forming an upper surface of the substrate 1
- the transparent insulating layer 4 having the same refractive index as that of the touch electrode line pattern 3 is formed on the substrate 1, the region passing through the right side of the touch electrode line pattern 3 is formed. Part of the light that is emitted will also be shifted to the left, and the light compensation will be performed to the corresponding area to a certain extent, which increases the light transmitted through the dark area, thereby enhancing the brightness of the dark area. Correspondingly, part of the light that is emitted through the area on the left side of the touch electrode line pattern 3 is also shifted to the left, reducing the light superimposed on the bright area and reducing the brightness of the bright area. This effectively weakens the luminance difference line generated by the touch electrode line pattern.
- the transparent insulating layer has a thickness of N ⁇ /4n, where N is an odd number, ⁇ is a center wavelength of the outgoing light, and n is a refractive index of the transparent insulating layer.
- the touch electrode line pattern 3 is generally made of a transparent material such as ITO, light loss of a portion of the light passing through the touch electrode line pattern 3 is inevitably caused by reflection or the like. This is also one of the reasons for the difference in luminance.
- the thickness of the transparent insulating layer of the region corresponding to the color film layer having the wavelength of ⁇ of the emitted light is set to an odd multiple of ⁇ /4, so that the light reflected by the two surfaces of the transparent insulating layer can be generated. Eliminate interference. This can increase the brightness of the outgoing light, compensate for the opposite Light loss caused by shooting and other reasons. Further, the luminance difference line generated by the touch electrode line pattern is further weakened.
- the thickness of the transparent insulating layer corresponding to the color film layers of different colors is N ⁇ /4n, where N is an odd number, and ⁇ is the center wavelength of each light passing through the color film layers of different colors, n is The refractive index of the transparent insulating layer.
- the touch electrode line pattern herein can be made of ITO material
- the transparent insulating layer here can be made of a material mixed with Nb 2 O 5 material and SiO 2 material.
- the Nb 2 O 5 material herein may be particles having a diameter of 6 nm
- the SiO 2 material may be particles having a diameter of 40 nm.
- the touch electrode line pattern 4 herein may be a Tx electrode line pattern and/or an Rx electrode line pattern.
- FIG. 3 is a schematic structural diagram of a color filter substrate according to Embodiment 2 of the present invention.
- a flat layer 5 is further formed on the touch electrode line pattern 3 and the transparent insulating layer 4, and is specifically implemented. This is advantageous for attaching other optical films such as polarizers.
- the flat layer herein can be made of a glue that is viscous, which facilitates adhesion of the optical film.
- the color film layer 2 and the transparent insulating layer 4 are arranged on the two surfaces of the substrate 1, but in practical applications, the above color film layer 2 and the transparent insulating layer 4 may also be located on the same side surface of the substrate as long as the transparent insulating layer 4 is located on the light-emitting surface of the color film layer 2 and the touch electrode line pattern 3 is located on the light-emitting surface of the transparent insulating layer 4.
- the problems raised by the present invention can be solved by the above, and the corresponding technical solutions can also fall within the scope of protection of the present invention.
- the present invention also provides a method for fabricating a color filter substrate, which can be used to fabricate the color filter substrate described above, the method comprising:
- the color film substrate produced by the color film substrate method provided by the present invention can effectively weaken the luminance difference line generated by the touch electrode line pattern.
- the transparent insulating layer is formed on a surface of the substrate that faces away from the color film layer.
- the transparent insulating layer has a thickness of N ⁇ /4n, where N is an odd number, ⁇ is a center wavelength of the outgoing light, and n is a refractive index of the transparent insulating layer.
- the thickness of the transparent insulating layer corresponding to the color film layers of different colors is N ⁇ /4n, where N is an odd number, and ⁇ is the center wavelength of each light passing through the color film layers of different colors, n It is the refractive index of the transparent insulating layer.
- the transparent insulating layer is made of a material mixed with a Nb 2 O 5 material and a SiO 2 material.
- the Nb 2 O 5 material is particles having a diameter of 6 nm
- the SiO 2 material is particles having a diameter of 40 nm.
- the method further includes forming a flat layer on the light-emitting surface of the touch electrode line pattern and the light-emitting surface of the transparent insulating layer.
- an embodiment of the present invention further provides a display device including the color film substrate described in the above embodiments.
- the display device can be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
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- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Optics & Photonics (AREA)
- Position Input By Displaying (AREA)
- Electroluminescent Light Sources (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (15)
- 一种彩膜基板,包括:基底、形成在基底上的彩膜层;其特征在于,还包括:形成在彩膜层出光表面上的透明绝缘层和形成在所述透明绝缘层出光表面上的触控电极线图形,所述透明绝缘层的折射率与所述触控电极线图形的折射率一致。
- 如权利要求1所述的彩膜基板,其特征在于,所述彩膜层形成在所述基底的第一表面上,所述透明绝缘层形成在所述基底的背离所述彩膜层的第二表面上。
- 如权利要求1所述的彩膜基板,其特征在于,所述透明绝缘层的厚度为Nλ/4n,其中N为奇数,λ为出射光的中心波长,n为所述透明绝缘层的折射率。
- 如权利要求1所述的彩膜基板,其特征在于,所述透明绝缘层对应于不同颜色的彩膜层的区域的厚度分别是Nλ/4n,其中N为奇数,λ为各个通过不同颜色的彩膜层的光线的中心波长,n为所述透明绝缘层的折射率。
- 如权利要求1所述的彩膜基板,其特征在于,所述透明绝缘层利用混合有Nb2O5材料和SiO2材料的材料制作。
- 如权利要求5所述的彩膜基板,其特征在于,所述Nb2O5材料为直径为6nm的颗粒,所述SiO2材料为直径为40nm的颗粒。
- 如权利要求1所述的彩膜基板,其特征在于,还包括平坦层;所述平坦层覆盖所述触控电极线图形的出光表面和所述透明绝缘层的出光表面。
- 一种彩膜基板的制作方法,其特征在于,包括:在基底上形成彩膜层;在彩膜层出光表面上形成透明绝缘层;在所述透明绝缘层出光表面上形成触控电极线图形;其中,所述透明绝缘层的折射率与所述触控电极线图形的折射率一致。
- 如权利要求8所述的方法,其特征在于,所述在彩膜层出光表面上形成透明绝缘层包括:在所述基底的背离所述彩膜层的表面上形成所述透明绝缘层。
- 如权利要求8所述的方法,其特征在于,所述透明绝缘层的厚 度为Nλ/4n,其中N为奇数,λ为出射光的中心波长,n为所述透明绝缘层的折射率。
- 如权利要求8所述的方法,其特征在于,所述透明绝缘层对应于不同颜色的彩膜层的区域的厚度分别是Nλ/4n,其中N为奇数,λ为各个通过不同颜色的彩膜层的光线的中心波长,n为所述透明绝缘层的折射率。
- 如权利要求8所述的方法,其特征在于,所述透明绝缘层利用混合有Nb2O5材料和SiO2材料的材料制作。
- 如权利要求12所述的方法,其特征在于,所述Nb2O5材料为直径为6nm的颗粒,所述SiO2材料为直径为40nm的颗粒。
- 如权利要求8所述的方法,其特征在于,还包括:在所述触控电极线图形的出光表面和所述透明绝缘层的出光表面上形成平坦层。
- 一种显示装置,其特征在于,包括如权利要求1-7任一项所述的彩膜基板。
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US15/122,572 US10203832B2 (en) | 2015-04-20 | 2015-08-12 | Color film substrate, manufacturing method thereof and display device |
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CN201510188956.3A CN104765500B (zh) | 2015-04-20 | 2015-04-20 | 彩膜基板及其制作方法、显示装置 |
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CN104765500B (zh) * | 2015-04-20 | 2018-07-17 | 合肥京东方光电科技有限公司 | 彩膜基板及其制作方法、显示装置 |
CN109189272B (zh) * | 2018-09-28 | 2021-01-15 | 惠州市华星光电技术有限公司 | 触控显示装置及其制造方法 |
CN109739378B (zh) * | 2018-12-18 | 2020-07-28 | 维沃移动通信有限公司 | 一种压力检测装置、屏幕组件及移动终端 |
CN112202437A (zh) * | 2020-09-14 | 2021-01-08 | 青岛日高光电科技有限公司 | 一种触摸式复合镍标面板 |
CN113176680B (zh) * | 2021-04-30 | 2023-04-25 | 长沙惠科光电有限公司 | 彩膜基板及显示面板 |
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US10203832B2 (en) | 2019-02-12 |
US20180164927A1 (en) | 2018-06-14 |
CN104765500B (zh) | 2018-07-17 |
CN104765500A (zh) | 2015-07-08 |
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