WO2016161858A1 - 触摸基板及其制作方法、触摸显示面板 - Google Patents

触摸基板及其制作方法、触摸显示面板 Download PDF

Info

Publication number
WO2016161858A1
WO2016161858A1 PCT/CN2016/075175 CN2016075175W WO2016161858A1 WO 2016161858 A1 WO2016161858 A1 WO 2016161858A1 CN 2016075175 W CN2016075175 W CN 2016075175W WO 2016161858 A1 WO2016161858 A1 WO 2016161858A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
touch
layer
photoresist layer
electrode layer
Prior art date
Application number
PCT/CN2016/075175
Other languages
English (en)
French (fr)
Inventor
王文龙
罗鸿强
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/326,404 priority Critical patent/US20170205911A1/en
Publication of WO2016161858A1 publication Critical patent/WO2016161858A1/zh

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of display, and in particular, to a touch substrate, a method for fabricating the same, and a touch display panel.
  • the existing touch substrates are classified according to their working principles: capacitive, resistive, infrared, pressure sensing, etc. Among them, capacitive touch substrates are widely used, and are widely used in mobile phones, flat panels and the like.
  • the traditional capacitive touch panel is formed by bonding a layer of cover glass and a layer of touch glass through an optical adhesive (OCA) to form a touch panel, that is, a GG (Glass-Glass) structure, but with the development of touch technology.
  • OCA optical adhesive
  • the structure can no longer meet the requirements of light, thin, low-cost touch substrates, and is gradually replaced by touch structures such as GF (Glass-Film), GFF (Glass-Film-Film), and OGS (On Glass Solution).
  • the conventional touch structure such as GG, GF, GFF or the like is a frame shading material using black ink or white ink as a cover, and can produce a black border touch screen and a white border touch screen.
  • the ink has poor high temperature resistance, and in the high-temperature process for producing OGS, the ink is easily affected by high temperature and turns yellow, which affects the appearance.
  • OGS uses white photoresist as the frame shading material, but the white photoresist on the market is still not mature and the shading effect is poor. Therefore, the production of the glass cover with white photoresist should be the same as that of the white ink production cover.
  • the optical effect requires a white photoresist having a thickness of at least 15 um and above.
  • a white photoresist layer 2 and a touch electrode layer 3 are disposed on the same surface of the substrate 1 because of the white photoresist.
  • the layer 2 needs a certain thickness, which causes the position where the touch electrode layer 3 and the white photoresist layer 2 are superposed (ie, the climbing position) to be prone to disconnection, thereby affecting product performance.
  • the technical problem to be solved by the embodiments of the present invention is how to reduce or avoid the problem that the touch electrodes are disconnected when climbing the edge region.
  • the technical solution of the embodiments of the present invention provides a touch substrate, including a substrate, a photoresist layer, and a touch electrode layer, wherein the photoresist layer is located around a first surface of the substrate, and the touch The control electrode layer is located on the second surface of the substrate.
  • the photoresist layer may include a white photoresist layer.
  • the photoresist layer may further include a black photoresist layer under the white photoresist layer.
  • a first protective layer covering the entire first surface of the substrate may be disposed above the photoresist layer.
  • the touch electrode layer may be made of a transparent conductive material.
  • the second surface of the substrate may further be provided with a second protective layer covering the touch electrode layer.
  • the touch display panel may include a display panel and the touch substrate disposed on a light exiting side of the display panel.
  • a further embodiment of the present invention further provides a method of manufacturing a touch substrate, the method comprising: providing a substrate; forming a photoresist layer around the first surface of the substrate; and forming a touch on the second surface of the substrate Electrode layer.
  • the step of forming the photoresist layer may include: forming a black photoresist layer around the first surface of the substrate; and forming a white photoresist layer above the black photoresist layer.
  • the manufacturing method of the touch substrate may include forming a first protective layer on the first surface of the substrate; and forming a second protective layer on the second surface of the substrate.
  • the manufacturing method of the touch substrate may further include the steps of: forming a conductive film layer on the second surface of the substrate at a temperature not lower than 300 ° C; and patterning the conductive film layer to form the touch including the touch The pattern of the electrode layer.
  • the conductive film layer may be formed by a sputtering or plating process.
  • the touch substrate provided by the embodiment of the present invention, by using the photoresist layer and the touch electrode layer on different surfaces of the substrate, the problem of disconnection of the touch electrode layer when climbing the edge region of the substrate can be avoided, thereby improving the white OGS touch. Substrate yield and product performance.
  • FIG. 1 is a top plan view of a touch substrate in the prior art
  • FIG. 2 is a cross-sectional view of a touch substrate in the prior art
  • FIG. 3 is a cross-sectional view of a touch substrate according to an embodiment of the present invention.
  • FIG. 4 is a cross-sectional view of another touch substrate according to an embodiment of the present invention.
  • the embodiment of the invention provides a touch substrate, a manufacturing method thereof, and a touch display panel.
  • the problem that the touch electrode is broken at the climbing position is avoided by making the photoresist layer and the touch electrode layer on different surfaces of the substrate.
  • FIG. 3 is a cross-sectional view of a touch substrate including a substrate 1, a photoresist layer 6 and a touch electrode layer 3, the photoresist layer 6 being located on a first surface of the substrate 1 according to an embodiment of the invention.
  • the touch electrode layer 3 is located on the second surface of the substrate 1 .
  • the substrate 1 may be a substrate of different materials.
  • the substrate 1 may be tempered glass, and the touch electrode layer may be ITO (Indium Tin Oxide) or other metal materials.
  • the touch substrate provided by the embodiment of the present invention, by forming the photoresist layer 6 and the touch electrode layer 3 on different surfaces of the substrate 1, the problem of disconnection of the touch electrode layer when climbing the edge region of the substrate can be avoided, thereby improving Touch substrate yield and product performance.
  • the photoresist layer 6 may be a white photoresist layer, and the touch substrate frame material made of white photoresist is more beautiful than the black photoresist.
  • the optical density value (OD value) of the white photoresist is low, and the light blocking property is poor. Therefore, when the white photoresist is used as the frame material of the touch substrate, in order to achieve a better light-shielding effect, the white photoresist needs to be made. Thick, generally 15um and above, but this is not conducive to the thinning of the touch substrate.
  • the touch substrate includes a substrate 1 and a touch electrode layer 3.
  • the photoresist layer may include a white photoresist layer 21 and a black photoresist layer 7, the white photoresist layer 21 and the black photoresist layer. 7 is located at a periphery of the first surface of the substrate 1 , and the touch electrode layer 3 is located at a second surface of the substrate 1 .
  • the black photoresist layer 7 may be located between the substrate 1 and the white photoresist layer 21, and the black photoresist layer and the white photoresist layer may be used because of the high optical density value and good light-shielding property of the black photoresist. Both of them are made thin, which can effectively achieve the effect of shading, and can make the touch substrate light and thin.
  • the white photoresist layer 21 can be made on the black photoresist layer 7 to achieve the purpose of aesthetics.
  • a first protective layer 5 covering the entire first surface of the substrate 1 may be disposed above the photoresist layer, and the second surface of the substrate 1 may be disposed to cover the touch
  • the second protective layer 4 of the electrode layer 3 can be used to protect the photoresist layer and the touch electrode layer from being scratched, respectively.
  • the first protective layer 5 covers the entire first surface of the substrate 1 over the photoresist layer, and can also flatten the height difference between the photoresist layer and the substrate, and can achieve the purpose of image elimination.
  • the first protective layer 5 and the second protective layer 4 may be made of an organic insulating material or an inorganic insulating material.
  • the touch display layer can be made of a transparent conductive material.
  • the embodiment of the invention further provides a touch panel, which comprises the touch substrate described in any of the above embodiments.
  • the touch panel may include a display panel and a touch substrate disposed on a light exiting side of the display panel.
  • the touch electrode layer 3 can be reduced or avoided when climbing the edge region of the substrate 1 compared with the prior art. A disconnection problem occurs, thereby improving the yield of the touch substrate and product performance.
  • the frame material adopts a combination of the white photoresist layer 21 and the black photoresist layer 7 to realize a light and thin white OGS product while ensuring a good shading effect.
  • a further embodiment of the present invention further provides a method for manufacturing a touch substrate, including:
  • Step S1 providing a substrate
  • Step S2 forming a photoresist layer around the first surface of the substrate
  • Step S3 forming a touch electrode layer on the second surface of the substrate.
  • a photoresist layer may be formed on the periphery of the first surface of the substrate through processes such as coating, exposure, and development, and the production process is easier to implement than printing by ink, etc. It is more suitable for the big generation line (more than 6 generations).
  • a black photoresist layer may be formed on the periphery of the first surface of the substrate, and then a white photoresist layer is formed over the black photoresist layer.
  • the black photoresist layer has a high optical density value and a good light-shielding property, so that both the black photoresist layer and the white photoresist layer can be made thin, and the effect of shading can be effectively achieved, and the touch substrate can be made thinner and lighter.
  • the white photoresist layer is formed on the black photoresist layer to achieve the purpose of aesthetics.
  • a conductive film layer may be formed on the second surface of the substrate at a temperature not lower than 300 ° C; and the patterning process is performed on the conductive film layer to form the touch electrode layer.
  • Graphics Since the white photoresist is an organic material, in the prior art, the touch electrode layer must be formed at a low temperature (below 300 ° C), and the low-temperature fabrication of the touch electrode layer easily makes the touch electrode layer adhere and resist.
  • the uniformity is reduced, and the technical solution provided in this embodiment can make the fabrication of the touch electrode layer no longer subject to the white photoresist material, and the touch electrode layer can be fabricated under high temperature (not lower than 300 ° C), effectively improving The adhesion of the touch electrode layer and the uniformity of the resistance.
  • the conductive film layer may be formed by a sputtering or plating process.
  • a first protective layer may be formed on the first surface of the substrate, the first protective layer covering the entire first surface of the substrate over the photoresist layer, the first The protective layer can not only protect the photoresist layer from being scratched, but also flatten the height difference between the photoresist layer and the substrate, and at the same time, the first protective layer can also have the effect of eliminating the shadow.
  • a second protective layer covering the touch electrode layer may be formed on the second surface of the substrate.
  • the order of making the photoresist layer, the touch electrode layer, the first protective layer and the second protective layer may be selected according to different processes, and only the first protective layer is formed after the photoresist layer is completed.
  • the second protective layer is formed after the touch electrode layer is completed.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种触摸基板及其制作方法、触摸显示面板,该触摸基板包括基板(1)、光阻层(6)和触控电极层(3),所述光阻层(6)位于所述基板(1)的第一表面周边,所述触控电极层(3)位于所述基板(1)的第二表面。该触摸基板通过将光阻层(6)和触控电极层(3)做在基板(1)的不同表面,从而避免触控电极在基板边缘区域爬坡时出现断线,以此来提高触摸基板的良率和产品的性能。

Description

触摸基板及其制作方法、触摸显示面板 技术领域
本发明涉及显示领域,尤其涉及一种触摸基板及其制作方法、触摸显示面板。
背景技术
现有的触摸基板根据其工作原理分为:电容式、电阻式、红外、压力传感等几种,其中电容式触摸基板应用较为广泛,其广泛应用于手机、平板等领域。
传统的电容式触摸面板,是将一层盖板玻璃与一层触控玻璃通过光学胶(OCA)贴合形成触控面板,即GG(Glass-Glass)结构,但随着触控技术的发展,该结构已不能满足触摸基板轻、薄、低成本等要求,其逐渐被GF(Glass-Film)、GFF(Glass-Film-Film)、OGS(On Glass Solution)等触控结构所取代。
目前市场上OGS相较于GG、GF、GFF等触控结构在外观方面遇到了难题。常规的GG、GF、GFF等触控结构是使用黑色油墨或白色油墨作为盖板的边框遮光材料,可以生产出黑色边框的触摸屏及白色边框的触摸屏。
然而,油墨耐高温性差,在制作OGS的高温工艺过程中,油墨容易受到高温影响而变黄,影响美观。为了美观,OGS使用白色光阻作为边框遮光材料,但是目前市场上的白色光阻还不太成熟且遮光效果差,因此,用白色光阻生产玻璃盖板要达到与白色油墨生产的盖板相同的光学效果,需要白色光阻的厚度至少要达到15um及以上,如图1及图2所示,在基板1的同一表面设置有白色光阻层2和触控电极层3,因为白色光阻层2需要一定的厚度,这样就会导致触控电极层3与白色光阻层2叠加的位置(即,爬坡位置)容易出现断线的可能,从而影响产品性能。
发明内容
本发明的实施例要解决的技术问题是如何减轻或避免触控电极在边缘区域爬坡时出现断线的问题。
为解决上述技术问题,本发明实施例的技术方案提供了一种触摸基板,包括基板、光阻层和触控电极层,所述光阻层位于所述基板的第一表面周边,所述触控电极层位于所述基板的第二表面。
进一步地,所述光阻层可包括白色光阻层。
进一步地,所述光阻层还可包括位于所述白色光阻层下方的黑色光阻层。
进一步地,所述光阻层上方还可设置有覆盖所述基板整个第一表面的第一保护层。
进一步地,所述触控电极层可以为透明导电材料制作而成。
进一步地,所述基板第二表面还可设置有覆盖所述触控电极层的第二保护层。
本发明的另外的实施例还提供了一种触摸显示面板,包括上述实施例中的任一实施例所描述的触摸基板。
进一步地,所述触摸显示面板可包括显示面板和设于所述显示面板出光侧的所述触摸基板。
本发明的又一实施例还提供了一种触摸基板的制造方法,该方法可包括:提供一基板;在所述基板第一表面周边形成光阻层;在所述基板第二表面形成触控电极层。
进一步地,形成光阻层的步骤可包括:在所述基板第一表面周边形成黑色光阻层;在所述黑色光阻层上方形成白色光阻层。
进一步地,触摸基板的制造方法可包括在所述基板第一表面形成第一保护层;在所述基板第二表面形成第二保护层。
进一步地,触摸基板的制造方法还可包括以下步骤:在不低于300℃温度下在所述基板第二表面形成导电膜层;对所述导电膜层进行构图工艺以形成包括所述触控电极层的图形。
进一步地,可以采用溅射或者镀膜工艺形成所述导电膜层。
本发明实施例提供的触摸基板,通过将光阻层与触控电极层做在基板的不同表面,可以规避触控电极层在基板边缘区域爬坡时出现的断线问题,从而提高白色OGS触摸基板的良率和产品性能。
附图说明
图1是现有技术中的触摸基板的俯视图;
图2是现有技术中的触摸基板的剖面图;
图3是本发明实施例提供的一种触摸基板的剖面图;
图4是本发明实施例提供的另一种触摸基板的剖面图。
附图标记
1-基板        2,21-白色光阻层    3-触控电极层
4-第二保护层  5-第一保护层        6-光阻层
7-黑色光阻层
具体实施方式
为了减轻或避免触控电极在边缘区域爬坡时出现断线的问题,从而提高触摸基板的良率和产品性能,本发明实施例提供了触摸基板及其制作方法、触摸显示面板。在本发明的实施例的技术方案中,通过将光阻层与触控电极层做在基板的不同表面来避免触控电极在爬坡位置出现断线的问题。下面结合附图和实施例,对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明,但不用来限制本发明的范围。
图3是本发明实施例提供的一种触摸基板的剖面图,该触摸基板包括基板1、光阻层6和触控电极层3,所述光阻层6位于所述基板1的第一表面周边,所述触控电极层3位于所述基板1的第二表面。
在实施例中,基板1可以为不同材料的基板,例如,该基板1可以为强化玻璃,所述触控电极层可以是ITO(氧化铟锡)或其他金属材料。
本发明实施例提供的触摸基板,通过将光阻层6与触控电极层3做在基板1的不同表面,可以规避触控电极层在基板边缘区域爬坡时出现的断线问题,从而提高触摸基板的良率和产品性能。
在一个实施例中,所述光阻层6可以为白色光阻层,相较于黑色光阻,用白色光阻做成的触摸基板边框材料更加美观。
但白色光阻的光学密度值(OD值)较低,遮光性较差,所以,用白色光阻做触摸基板的边框材料时,为了达到较好的遮光效果,需要将白色光阻做得较厚,一般都在15um及以上,但这样不利于触摸基板的轻薄化。
因此,为了能够提高光阻的光学密度值,实现较好的遮光效果,同时能够将触摸基板做的更加轻薄,本发明的另外的实施例提供了另一种触摸基板。如图4所示,该触摸基板包括基板1,触控电极层3,光阻层可包括白色光阻层21和黑色光阻层7,所述白色光阻层21和所述黑色光阻层7位于所述基板1的第一表面周边,所述触控电极层3位于所述基板1的第二表面。所述黑色光阻层7可位于所述基板1与所述白色光阻层21之间,利用黑色光阻光学密度值高、遮光性好的性质,可以将黑色光阻层和白色光阻层均做得很薄,既能够实效遮光好的效果,又能够使触摸基板轻薄化,同时,将所述白色光阻层21做在所述黑色光阻层7上面还能达到美观的目的。
此外,如图3和图4所示,光阻层上方可设置有覆盖所述基板1整个第一表面的第一保护层5,所述基板1的第二表面可设置有覆盖所述触控电极层3的第二保护层4,可分别用来保护光阻层和触控电极层不被刮伤。
特别地,所述第一保护层5在光阻层上方覆盖所述基板1整个第一表面,还可以平坦化光阻层与基板之间的高度差,并且能够达到消影的目的。
在实施例中,第一保护层5和第二保护层4可以用有机绝缘材料或无机绝缘材料制作。
为了不影响显示区域的光线出射,有益于实现触控显示,所述触控电极层可以为透明导电材料制作而成。
本发明实施例还提供了一种触控面板,该触控面板包括上述实施例中的任一实施例所描述的触摸基板。
在一个实施例中,该触控面板可包括显示面板和设置于所述显示面板出光侧的触摸基板。
在上述实施例中,通过将光阻层6与触控电极层3做在基板1的不同表面,与现有技术相比,可以减轻或避免触控电极层3在基板1边缘区域爬坡时出现的断线问题,从而提高触摸基板的良率和产品性能。进一步地,边框材料采用白色光阻层21和黑色光阻层7组合的方式,在保证好的遮光效果的同时,可以实现轻薄的白色OGS产品。
此外,本发明的另外的实施例还提供了一种触摸基板的制造方法,包括:
步骤S1:提供一基板;
步骤S2:在所述基板第一表面周边形成光阻层;
步骤S3:在所述基板第二表面形成触控电极层。
具体地,在步骤S2中,可经过涂覆、曝光和显影等工序,在所述基板第一表面周边形成光阻层,与利用油墨印刷等方式相比,这种生产工艺更加容易实现,特别是对于大世代线(6代以上)来说,更加适用。
在一个实施例中,在步骤S2中,可以在所述基板第一表面周边先形成黑色光阻层,然后在所述黑色光阻层上方形成白色光阻层。这样,利用黑色光阻光学密度值高、遮光性好的性质,可以将黑色光阻层和白色光阻层均做得很薄,既能够实效遮光好的效果,又能够使触摸基板轻薄化,同时,将所述白色光阻层做在所述黑色光阻层上面还能达到美观的目的。
在一个实施例中,在步骤S3中,可以在不低于300℃温度下在所述基板第二表面形成导电膜层;对所述导电膜层进行构图工艺形成包括所述触控电极层的图形。因为白色光阻属于有机材料,所以,现有技术中,制作触控电极层必须在低温(300℃以下)下进行,而低温制作触控电极层容易使触控电极层的附着性和电阻的均匀性降低,而本实施例提供的技术方案可以使触控电极层的制作不再受制于白色光阻材料,触控电极层可以在高温(不低于300℃)条件下制作,有效的提高了触控电极层的附着性和电阻的均匀性。
具体地,可以采用溅射或者镀膜工艺形成所述导电膜层。
在其它的实施例中,在步骤S3之后,可以在所述基板第一表面形成第一保护层,所述第一保护层位于光阻层上方覆盖所述基板整个第一表面,所述第一保护层不仅能够保护光阻层不被刮伤,还能够平坦化光阻层与所述基板之间的高度差,同时,该第一保护层还能够起到消影的效果。同样的,为了保护触控电极层不被刮伤,在形成第一保护层后,可以在所述基板第二表面形成覆盖所述触控电极层的第二保护层。
需要说明的是,光阻层,触控电极层,第一保护层及第二保护层的制作顺序可以根据工艺的不同进行选择,只需使得第一保护层在光阻层制作完成之后制作,第二保护层在触控电极层制作完成之后制作。
以上实施方式仅用于说明本发明,而并非对本发明的限制,有关技术领域的普通技术人员,在不脱离本发明的精神和范围的情况下,还可以做出各种变化和变型,因此所有等同的技术方案也属于本发明的范畴,本发明的专利保护范围应由权利要求限定。

Claims (13)

  1. 一种触摸基板,包括基板、光阻层和触控电极层,其中所述光阻层位于所述基板的第一表面周边,所述触控电极层位于所述基板的第二表面。
  2. 根据权利要求1所述的触摸基板,其中所述光阻层包括白色光阻层。
  3. 根据权利要求2所述的触摸基板,其中所述光阻层还包括位于所述白色光阻层下方的黑色光阻层。
  4. 根据权利要求1~3任一项所述的触摸基板,其中所述光阻层上方还设置有覆盖所述基板整个第一表面的第一保护层。
  5. 根据权利要求1所述的触摸基板,其中所述触控电极层为透明导电材料制作而成。
  6. 根据权利要求5所述的触摸基板,其中所述基板第二表面还设置有覆盖所述触控电极层的第二保护层。
  7. 一种触摸显示面板,所述触摸显示面板包括权利要求1-6中任意一项所述的触摸基板。
  8. 根据权利要求7所述的触摸显示面板,其中该触摸显示面板包括显示面板和设置于所述显示面板出光侧的所述触摸基板。
  9. 一种触摸基板的制造方法,该方法包括:
    提供一基板;
    在所述基板第一表面周边形成光阻层;
    在所述基板第二表面形成触控电极层。
  10. 根据权利要求9所述的触摸基板的制造方法,其中所述形成光阻层的步骤包括:
    在所述基板第一表面周边形成黑色光阻层;
    在所述黑色光阻层上方形成白色光阻层。
  11. 根据权利要求9所述的触摸基板的制造方法,其中所述方法还包括以下步骤:
    在所述基板第一表面形成第一保护层;
    在所述基板第二表面形成第二保护层。
  12. 根据权利要求9所述的触摸基板的制造方法,其中所述方法包 括以下步骤:
    在不低于300℃温度下在所述基板第二表面形成导电膜层;
    对所述导电膜层进行构图工艺以形成包括所述触控电极层的图形。
  13. 根据权利要求12所述的触摸屏的制造方法,其中采用溅射或者镀膜工艺形成所述导电膜层。
PCT/CN2016/075175 2015-04-09 2016-03-01 触摸基板及其制作方法、触摸显示面板 WO2016161858A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/326,404 US20170205911A1 (en) 2015-04-09 2016-03-01 Touch substrate, manufacturing method thereof and touch display panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510166660.1A CN104714698A (zh) 2015-04-09 2015-04-09 触摸基板及其制作方法、触摸显示面板
CN201510166660.1 2015-04-09

Publications (1)

Publication Number Publication Date
WO2016161858A1 true WO2016161858A1 (zh) 2016-10-13

Family

ID=53414095

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2016/075175 WO2016161858A1 (zh) 2015-04-09 2016-03-01 触摸基板及其制作方法、触摸显示面板

Country Status (3)

Country Link
US (1) US20170205911A1 (zh)
CN (1) CN104714698A (zh)
WO (1) WO2016161858A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104714698A (zh) * 2015-04-09 2015-06-17 合肥鑫晟光电科技有限公司 触摸基板及其制作方法、触摸显示面板
CN105138200B (zh) * 2015-09-01 2018-11-09 京东方科技集团股份有限公司 触摸屏基板及其制备方法、触控面板和显示装置
CN108196432B (zh) * 2018-01-05 2021-10-22 深圳市骏达光电股份有限公司 Bpo光阻喷墨工艺
CN108321088B (zh) * 2018-02-05 2020-06-16 京东方科技集团股份有限公司 触控基板的制造方法、触控基板及显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101464761A (zh) * 2009-01-05 2009-06-24 中国南玻集团股份有限公司 电容式触控屏
CN201440257U (zh) * 2009-05-13 2010-04-21 中国南玻集团股份有限公司 电容式触控屏
CN203376704U (zh) * 2013-06-21 2014-01-01 江西沃格光电科技有限公司 触控面板及其遮蔽层
CN203520372U (zh) * 2013-10-25 2014-04-02 贵州省湄潭县乾开高科技有限公司 一种一体化式电容式触摸屏
US20140204286A1 (en) * 2013-01-24 2014-07-24 Jung-Mok Park Touch screen panel
CN104714698A (zh) * 2015-04-09 2015-06-17 合肥鑫晟光电科技有限公司 触摸基板及其制作方法、触摸显示面板
CN105138200A (zh) * 2015-09-01 2015-12-09 京东方科技集团股份有限公司 触摸屏基板及其制备方法、触控面板和显示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140132861A1 (en) * 2010-05-31 2014-05-15 Wintek Corporation Touch panel and touch-sensitive display device
KR101699530B1 (ko) * 2010-07-27 2017-01-25 삼성디스플레이 주식회사 터치스크린패널 및 이를 구비한 영상표시장치
KR20120065687A (ko) * 2010-12-13 2012-06-21 삼성모바일디스플레이주식회사 터치 스크린 패널
WO2014098131A1 (ja) * 2012-12-19 2014-06-26 株式会社カネカ 透明電極付き基板およびその製造方法
CN104267848B (zh) * 2014-09-26 2017-10-31 蓝思科技(长沙)有限公司 一种触控面板及其制备方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101464761A (zh) * 2009-01-05 2009-06-24 中国南玻集团股份有限公司 电容式触控屏
CN201440257U (zh) * 2009-05-13 2010-04-21 中国南玻集团股份有限公司 电容式触控屏
US20140204286A1 (en) * 2013-01-24 2014-07-24 Jung-Mok Park Touch screen panel
CN203376704U (zh) * 2013-06-21 2014-01-01 江西沃格光电科技有限公司 触控面板及其遮蔽层
CN203520372U (zh) * 2013-10-25 2014-04-02 贵州省湄潭县乾开高科技有限公司 一种一体化式电容式触摸屏
CN104714698A (zh) * 2015-04-09 2015-06-17 合肥鑫晟光电科技有限公司 触摸基板及其制作方法、触摸显示面板
CN105138200A (zh) * 2015-09-01 2015-12-09 京东方科技集团股份有限公司 触摸屏基板及其制备方法、触控面板和显示装置

Also Published As

Publication number Publication date
CN104714698A (zh) 2015-06-17
US20170205911A1 (en) 2017-07-20

Similar Documents

Publication Publication Date Title
WO2018099174A1 (zh) 触摸屏及其制作方法、触控显示装置
TWI522864B (zh) 觸控面板及其製造方法
CN103353815B (zh) 电容屏ogs消影结构及其制造工艺
WO2016161858A1 (zh) 触摸基板及其制作方法、触摸显示面板
WO2015117468A1 (zh) 触摸屏及其制作方法、触摸显示装置
CN104281303B (zh) 一种显示装置、触摸屏及其制造方法
US10168846B2 (en) Touch display panel, manufacturing method, display device and touch substrate
TW201441887A (zh) 觸控面板及其製造方法
US10509516B2 (en) Touch panel manufacturing method, touch panel, touch screen and display device
US20150346880A1 (en) Touch-sensitive device and manufacturing method thereof
WO2018126710A1 (zh) 触摸面板、触摸显示装置及触摸面板的制备方法
WO2016169159A1 (zh) 彩膜基板及其制作方法、显示装置
WO2019052216A1 (zh) 一种减少侧光反射的电容触摸屏
CN203825592U (zh) 一种ogs触摸屏
TWM528471U (zh) 觸控面板
TWI481913B (zh) 彩色濾光基板的製作方法
TW201633081A (zh) 低色差觸控基板
TWI515617B (zh) 觸控面板結構及其製作方法
CN207281420U (zh) 一种具有触控功能的彩膜基板
WO2018176786A1 (zh) 显示面板保护玻璃及其制备方法、显示面板和显示装置
TWI596529B (zh) 透明電容式觸控面板及其電極結構
CN220357576U (zh) 一种ogs触摸屏结构
WO2017143681A1 (zh) 触控屏
WO2016037430A1 (zh) Ogs触摸屏基板架桥结构及其制造方法、ogs触摸屏及其制造方法及显示装置
TW201504878A (zh) 觸控面板結構、觸控面板結構之製作方法及其觸控裝置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16776033

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 15326404

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 16776033

Country of ref document: EP

Kind code of ref document: A1

122 Ep: pct application non-entry in european phase

Ref document number: 16776033

Country of ref document: EP

Kind code of ref document: A1

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 200418)

122 Ep: pct application non-entry in european phase

Ref document number: 16776033

Country of ref document: EP

Kind code of ref document: A1