WO2015152191A1 - 半導体装置用ボンディングワイヤ及びその製造方法 - Google Patents
半導体装置用ボンディングワイヤ及びその製造方法 Download PDFInfo
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Definitions
- Ag is an element having an electrical conductivity equal to or higher than that of Au and having a lower hardness than Cu, and further having oxidation resistance.
- the gist of the present invention is as follows.
- a bonding wire for a semiconductor device having an Ag content of 90% by mass or more In a cross section including the wire center and parallel to the longitudinal direction of the wire (hereinafter referred to as “wire center cross section”), a crystal grain having a ratio a / b of major axis a to minor axis b of 10 or more and an area of 15 ⁇ m 2 or more ( Hereinafter referred to as “fibrous structure”),
- the existence ratio of the crystal orientation ⁇ 100> having an angle difference of 15 ° or less with respect to the wire longitudinal direction is 50% or more and 90% or less in area ratio.
- [Leaning] 100 leads were bonded to the evaluation lead frame with a loop length of 5 mm and a loop height of 0.5 mm.
- the wire upright portion was observed from the chip horizontal direction, and the evaluation was performed by the interval (leaning interval) when the interval between the perpendicular passing through the center of the ball joint portion and the wire upright portion was the maximum.
- the leaning interval was smaller than the wire diameter, the leaning was good, and when the leaning interval was large, the upright part was inclined, so that the leaning was judged to be bad.
- 100 bonded wires were observed with an optical microscope and the number of leaning defects was counted. Zero defects were marked with ⁇ , 1-5 with ⁇ , and 6 or more with x.
- [Crimped ball shape] The ball shape of the 1st joint was evaluated. 100 wires were bonded to a Si chip for evaluation using a wire bonder. As an evaluation method, 100 pressure-bonded ball portions were observed with an optical microscope, the one close to a perfect circle was OK, the one having a petal shape was NG, and the number was counted. NG is 0, NG is 1-5, ⁇ is 6-10, ⁇ is 11 and more is X.
Abstract
Description
(1)Ag含有量が90質量%以上である半導体装置用ボンディングワイヤであって、
ワイヤ中心を含みワイヤ長手方向に平行な断面(以下「ワイヤ中心断面」という。)において、長径aと短径bの比a/bが10以上であって面積が15μm2以上である結晶粒(以下「繊維状組織」という。)が存在せず、
前記ワイヤ中心断面におけるワイヤ長手方向の結晶方位を測定した結果、前記ワイヤ長手方向に対して角度差が15°以下である結晶方位<100>の存在比率が面積率で50%以上90%以下であり、
ワイヤ表面におけるワイヤ長手方向の結晶方位を測定した結果、前記ワイヤ長手方向に対して角度差が15°以下である結晶方位<100>の存在比率が面積率で50%以上90%以下であることを特徴とする半導体装置用ボンディングワイヤ。
(2)前記半導体装置用ボンディングワイヤは、Pd、Cu、Au、Zn、Pt、Ge、Sn、Ti、Niの1種以上を含み、Pd、Cu、Au、Znを含む場合はそれらの合計が0.01~8質量%であり、Pt、Ge、Sn、Ti、Niを含む場合はそれらの合計が0.001~1質量%であり、残部Ag及び不純物であることを特徴とする上記(1)に記載の半導体装置用ボンディングワイヤ。
(3)前記不純物に含まれるSが1質量ppm以下、Clが0.5質量ppm以下であることを特徴とする上記(1)又は(2)に記載の半導体装置用ボンディングワイヤ。
(4)1回以上伸線加工を行う伸線工程を有し、伸線工程中に減面率が15.5~30.5%である伸線加工を少なくとも1回有し、
伸線工程の途中に1回以上の熱処理と伸線工程終了後に最終熱処理を行い、最終熱処理の直前の熱処理の温度が600℃以上800℃以下であり、最終熱処理の温度が300℃以上600℃未満であることを特徴とする上記(1)~(3)のいずれか1つに記載の半導体装置用ボンディングワイヤの製造方法。
ボンディングワイヤ中の含有成分(不純物以外)の濃度は、ICP分析、ICP質量分析等により測定した。ボンディングワイヤ中の不純物濃度は、GDMS(Glow Discharge Mass Spectrometry)分析により測定した。GDMS分析とは、Ar雰囲気下で試料を陰極としてグロー放電を発生させ、プラズマ内で試料表面をスパッタし、イオン化された構成元素を質量分析計で測定する手法である。
ワイヤ中心を含みワイヤ長手方向に平行な断面(ワイヤ中心断面)及びワイヤ表面を観察面として、結晶組織の評価を行った。評価手法として、後方散乱電子線回折法(EBSD、Electron Backscattered Diffraction)を用いた。EBSD法は観察面の結晶方位を観察し、隣り合う測定点間での結晶方位の角度差を図示出来るという特徴を有し、ボンディングワイヤのような細線であっても、比較的簡便ながら精度よく結晶方位を観察できる。
評価用のリードフレームに、ループ長5mm、ループ高さ0.5mmで100本ボンディングした。評価方法として、チップ水平方向からワイヤ直立部を観察し、ボール接合部の中心を通る垂線とワイヤ直立部との間隔が最大であるときの間隔(リーニング間隔)で評価した。リーニング間隔がワイヤ径よりも小さい場合にはリーニングは良好、大きい場合には直立部が傾斜しているためリーニングは不良であると判断した。100本のボンディングしたワイヤを光学顕微鏡で観察し、リーニング不良の本数を数えた。不良が0本を◎、1~5本を○、6本以上を×とした。
評価用のSiチップに、ループ長2.5mm、ループ高さ0.15mmで100本ボンディングした。スプリング特性の評価のために、電極上に形成されたスタッドパンプの上にボンディングワイヤのウェッジ接合を行う接続方法である逆ボンディングを行い、ボンディングワイヤが屈曲するスプリング不良を観察した。評価方法として、100本のボンディングしたワイヤを光学顕微鏡で観察し、スプリング不良の本数を数えた。不良が0本を◎、1~3本を○、4~5本を△、6本以上を×とした。
高湿加熱評価としてHAST試験を行った。ワイヤボンダーでボンディングを行った半導体装置について、温度130℃、湿度85%RH、5Vという環境下に放置し、48時間おきに取り出して評価した。評価方法として、電気抵抗を測定し、抵抗が上昇したものをNGとした。NGになるまでの時間が480時間以上を◎、384時間以上480時間未満のものを○、288時刊以上384時間未満のものを△、288時間未満のものを×とした。
1st接合のFAB形状を評価した。評価用のリードフレームに、ワイヤボンダーでFABを100個作製した。評価方法として、FABをSEM(電子顕微鏡)で100個観察し、真球状のものをOK、偏芯、引け巣をNGとし、その数をカウントした。NGが0個を◎、NGが1~5個を○、6~10個を△、11個以上を×とした。
1st接合のボール形状を評価した。評価用のSiチップに、ワイヤボンダーで100本ボンディングした。評価方法として、圧着ボール部を光学顕微鏡で100個観察し、真円に近いものをOK、花びら状になっているものをNGとし、その数をカウントした。NGが0個を◎、NGが1~5個を○、6~10個を△、11個以上を×とした。
Claims (4)
- Ag含有量が90質量%以上である半導体装置用ボンディングワイヤであって、ワイヤ中心を含みワイヤ長手方向に平行な断面であるワイヤ中心断面において、長径aと短径bの比a/bが10以上であって面積が15μm2以上である結晶粒が存在せず、前記ワイヤ中心断面におけるワイヤ長手方向の結晶方位を測定した結果、前記ワイヤ長手方向に対して角度差が15°以下である結晶方位<100>の存在比率が面積率で50%以上90%以下であり、ワイヤ表面におけるワイヤ長手方向の結晶方位を測定した結果、前記ワイヤ長手方向に対して角度差が15°以下である結晶方位<100>の存在比率が面積率で50%以上90%以下であることを特徴とする半導体装置用ボンディングワイヤ。
- 前記半導体装置用ボンディングワイヤは、Pd、Cu、Au、Zn、Pt、Ge、Sn、Ti、Niの1種以上を含み、Pd、Cu、Au、Znを含む場合はそれらの合計が0.01~8質量%であり、Pt、Ge、Sn、Ti、Niを含む場合はそれらの合計が0.001~1質量%であり、残部がAg及び不純物であることを特徴とする請求項1に記載の半導体装置用ボンディングワイヤ。
- 前記不純物に含まれるSが1質量ppm以下、Clが0.5質量ppm以下であることを特徴とする請求項1または2に記載の半導体装置用ボンディングワイヤ。
- 1回以上の伸線加工を行う伸線工程を有し、前記伸線工程中に減面率が15.5~30.5%である伸線加工を少なくとも1回有し、前記伸線工程の途中に1回以上の熱処理と伸線工程終了後に最終熱処理を行い、前記最終熱処理の直前の熱処理の温度が600℃以上800℃以下であり、前記最終熱処理の温度が300℃以上600℃未満であることを特徴とする請求項1~3のいずれか1項に記載の半導体装置用ボンディングワイヤの製造方法。
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