WO2015093543A1 - 熱硬化性樹脂組成物、これを用いた光半導体装置用反射部材の製造方法、および、光半導体装置 - Google Patents
熱硬化性樹脂組成物、これを用いた光半導体装置用反射部材の製造方法、および、光半導体装置 Download PDFInfo
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- WO2015093543A1 WO2015093543A1 PCT/JP2014/083458 JP2014083458W WO2015093543A1 WO 2015093543 A1 WO2015093543 A1 WO 2015093543A1 JP 2014083458 W JP2014083458 W JP 2014083458W WO 2015093543 A1 WO2015093543 A1 WO 2015093543A1
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- Prior art keywords
- resin composition
- thermosetting resin
- optical semiconductor
- semiconductor device
- anhydride
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 66
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 56
- 230000003287 optical effect Effects 0.000 title claims abstract description 34
- 239000004065 semiconductor Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title abstract description 12
- 229920002601 oligoester Polymers 0.000 claims abstract description 56
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims abstract description 54
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 32
- 239000003822 epoxy resin Substances 0.000 claims abstract description 27
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 27
- 239000012463 white pigment Substances 0.000 claims abstract description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 29
- -1 saturated aliphatic cyclic acid anhydride Chemical class 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 18
- 150000005846 sugar alcohols Polymers 0.000 claims description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 14
- 150000008065 acid anhydrides Chemical class 0.000 claims description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 10
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 claims description 8
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 6
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 claims description 5
- 238000001721 transfer moulding Methods 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 abstract description 9
- 238000002845 discoloration Methods 0.000 abstract description 8
- 238000002310 reflectometry Methods 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 41
- 125000000217 alkyl group Chemical group 0.000 description 14
- 238000004132 cross linking Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- 238000001579 optical reflectometry Methods 0.000 description 10
- 238000000465 moulding Methods 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 150000001924 cycloalkanes Chemical group 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 238000004898 kneading Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- 239000004954 Polyphthalamide Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000004018 acid anhydride group Chemical group 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 3
- 229920006375 polyphtalamide Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- OJRJDENLRJHEJO-UHFFFAOYSA-N 2,4-diethylpentane-1,5-diol Chemical compound CCC(CO)CC(CC)CO OJRJDENLRJHEJO-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 0 C*1CC(*)C2=C3C(C4C*(*)C*(*)C5C4)C5[C@@](C)(*)C3C2CC1 Chemical compound C*1CC(*)C2=C3C(C4C*(*)C*(*)C5C4)C5[C@@](C)(*)C3C2CC1 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- QYFACSDTKGXDDM-UHFFFAOYSA-N OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 Chemical compound OC.OC.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1 QYFACSDTKGXDDM-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 2
- 239000003094 microcapsule Substances 0.000 description 2
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 150000004714 phosphonium salts Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- DPDQQGBQYIBXDX-UHFFFAOYSA-N 2,4,6-tris(aminomethyl)phenol Chemical class NCC1=CC(CN)=C(O)C(CN)=C1 DPDQQGBQYIBXDX-UHFFFAOYSA-N 0.000 description 1
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DSKYSDCYIODJPC-UHFFFAOYSA-N 2-butyl-2-ethylpropane-1,3-diol Chemical compound CCCCC(CC)(CO)CO DSKYSDCYIODJPC-UHFFFAOYSA-N 0.000 description 1
- HANAPQDZIWXGMR-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;4-(oxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound CCC(CO)(CO)CO.C1OC1C1CC2OC2CC1 HANAPQDZIWXGMR-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QXSNXUCNBZLVFM-UHFFFAOYSA-N 2-methyl-1h-imidazole;1,3,5-triazinane-2,4,6-trione Chemical compound CC1=NC=CN1.O=C1NC(=O)NC(=O)N1 QXSNXUCNBZLVFM-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- RJIQELZAIWFNTQ-UHFFFAOYSA-N 2-phenyl-1h-imidazole;1,3,5-triazinane-2,4,6-trione Chemical compound O=C1NC(=O)NC(=O)N1.C1=CNC(C=2C=CC=CC=2)=N1 RJIQELZAIWFNTQ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- PAVNZLVXYJDFNR-UHFFFAOYSA-N 3,3-dimethyloxane-2,6-dione Chemical compound CC1(C)CCC(=O)OC1=O PAVNZLVXYJDFNR-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- UVYLEXYRTBDZNM-UHFFFAOYSA-N 4,4-diethyloxane-2,6-dione Chemical compound CCC1(CC)CC(=O)OC(=O)C1 UVYLEXYRTBDZNM-UHFFFAOYSA-N 0.000 description 1
- YGYPMFPGZQPETF-UHFFFAOYSA-N 4-(4-hydroxy-3,5-dimethylphenyl)-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C=2C=C(C)C(O)=C(C)C=2)=C1 YGYPMFPGZQPETF-UHFFFAOYSA-N 0.000 description 1
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- UTPHVTOEOCZQJU-UHFFFAOYSA-N 4-methylbicyclo[2.2.1]heptane Chemical group C1CC2CCC1(C)C2 UTPHVTOEOCZQJU-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 description 1
- IXCOKTMGCRJMDR-UHFFFAOYSA-N 9h-fluorene;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1.C1=CC=C2CC3=CC=CC=C3C2=C1 IXCOKTMGCRJMDR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- QDZXJOMXPRWGFG-UHFFFAOYSA-N CCC1=NC=NC=N1.O=C1NC(=O)NC(=O)N1 Chemical compound CCC1=NC=NC=N1.O=C1NC(=O)NC(=O)N1 QDZXJOMXPRWGFG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- BKJLNJYDEMKREK-UHFFFAOYSA-N FNB(F)F Chemical class FNB(F)F BKJLNJYDEMKREK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- ZFDXZGUFUMAREO-UHFFFAOYSA-N [1-(hydroxymethyl)-2-phenylimidazol-4-yl]methanol Chemical compound OCC1=CN(CO)C(C=2C=CC=CC=2)=N1 ZFDXZGUFUMAREO-UHFFFAOYSA-N 0.000 description 1
- NIYNIOYNNFXGFN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol;7-oxabicyclo[4.1.0]heptane-4-carboxylic acid Chemical compound OCC1CCC(CO)CC1.C1C(C(=O)O)CCC2OC21.C1C(C(=O)O)CCC2OC21 NIYNIOYNNFXGFN-UHFFFAOYSA-N 0.000 description 1
- RMSYBFIFHHWKCN-UHFFFAOYSA-M [OH-].C(CCCCCCCCCCCCCCC)[N+](C)(C)C.[NH4+].[OH-] Chemical class [OH-].C(CCCCCCCCCCCCCCC)[N+](C)(C)C.[NH4+].[OH-] RMSYBFIFHHWKCN-UHFFFAOYSA-M 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- CEGOLXSVJUTHNZ-UHFFFAOYSA-K aluminium tristearate Chemical compound [Al+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CEGOLXSVJUTHNZ-UHFFFAOYSA-K 0.000 description 1
- 229940063655 aluminum stearate Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- IJRVQAXSAHHCNH-UHFFFAOYSA-M butyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCC[N+](C)(C)C IJRVQAXSAHHCNH-UHFFFAOYSA-M 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- MMIVZWZHLDUCKH-UHFFFAOYSA-N chloromethane;chloromethylbenzene Chemical compound ClC.ClCC1=CC=CC=C1 MMIVZWZHLDUCKH-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- OZEHOHQZIRILDX-UHFFFAOYSA-N ctk1b7797 Chemical compound O=C1OC(=O)C2C1C1(C)CC2CC1 OZEHOHQZIRILDX-UHFFFAOYSA-N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 150000001934 cyclohexanes Chemical group 0.000 description 1
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 1
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 1
- PYRZPBDTPRQYKG-UHFFFAOYSA-N cyclopentene-1-carboxylic acid Chemical compound OC(=O)C1=CCCC1 PYRZPBDTPRQYKG-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- WJLUBOLDZCQZEV-UHFFFAOYSA-M hexadecyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[N+](C)(C)C WJLUBOLDZCQZEV-UHFFFAOYSA-M 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- GQKZBCPTCWJTAS-UHFFFAOYSA-N methoxymethylbenzene Chemical compound COCC1=CC=CC=C1 GQKZBCPTCWJTAS-UHFFFAOYSA-N 0.000 description 1
- QLPMKRZYJPNIRP-UHFFFAOYSA-M methyl(trioctyl)azanium;bromide Chemical compound [Br-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC QLPMKRZYJPNIRP-UHFFFAOYSA-M 0.000 description 1
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical group CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- XIVNZHXRIPJOIZ-UHFFFAOYSA-N octadecanoic acid;zinc Chemical compound [Zn].CCCCCCCCCCCCCCCCCC(O)=O XIVNZHXRIPJOIZ-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- UOURRHZRLGCVDA-UHFFFAOYSA-D pentazinc;dicarbonate;hexahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Zn+2].[Zn+2].[Zn+2].[Zn+2].[Zn+2].[O-]C([O-])=O.[O-]C([O-])=O UOURRHZRLGCVDA-UHFFFAOYSA-D 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 125000005496 phosphonium group Chemical group 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 150000003527 tetrahydropyrans Chemical class 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- MRYQZMHVZZSQRT-UHFFFAOYSA-M tetramethylazanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)C MRYQZMHVZZSQRT-UHFFFAOYSA-M 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- OLNCQUXQEJCISO-UHFFFAOYSA-M trimethyl(propyl)azanium;hydroxide Chemical compound [OH-].CCC[N+](C)(C)C OLNCQUXQEJCISO-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- JRHDFVNUWLMGBU-UHFFFAOYSA-L zinc octyl phosphate Chemical compound C(CCCCCCC)OP(=O)([O-])[O-].[Zn+2] JRHDFVNUWLMGBU-UHFFFAOYSA-L 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical class [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- IJQXGKBNDNQWAT-UHFFFAOYSA-L zinc;docosanoate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCCCCCC([O-])=O IJQXGKBNDNQWAT-UHFFFAOYSA-L 0.000 description 1
- PORPEXMDRRVVNF-UHFFFAOYSA-L zinc;octadecyl phosphate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCOP([O-])([O-])=O PORPEXMDRRVVNF-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4246—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof polymers with carboxylic terminal groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
- C08K2003/2241—Titanium dioxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- the present invention suppresses volatilization of the curing agent during production and processing, suppresses discoloration due to heat, and provides a cured product excellent in light reflectivity and reliability in a high temperature environment
- the present invention relates to a manufacturing method of a reflecting member for an optical semiconductor device using the same, and an optical semiconductor device having the reflecting member.
- Optical semiconductor elements such as LEDs (Light Emitting Diodes, light-emitting diodes) have features such as low power consumption, long life, and small size, and thus are used in many electronic devices. Conventionally, it has been used for low-brightness electronic devices, but in recent years, it has come to be used in fields that require high brightness, such as automotive headlamps and lighting applications, due to technological improvements. Also, the UV-resistant and heat-resistant properties have been demanded for the reflecting members constituting the optical semiconductor.
- polyphthalamide (PPA) resin is widely used as a material for reflecting members constituting optical semiconductors.
- thermosetting light reflecting resin composition having excellent light resistance and heat resistance is desired.
- Patent Document 1 discloses a thermosetting light-reflective resin composition in the form of a B-stage comprising an epoxy resin, a curing agent and a curing accelerator as constituents as a thermosetting light-reflective resin composition having good light resistance and heat resistance. Things are disclosed.
- As a molding method of this thermosetting light reflecting resin composition after sufficiently kneading with a mixer, it is melt-kneaded under a predetermined condition with a mixing roll, an extruder, a kneader, a roll, an extruder, etc., and cooled and pulverized.
- thermosetting light reflecting resin composition was prepared, and this composition was molded by transfer molding under the conditions of a mold temperature of 170 to 190 ° C., a molding pressure of 2 to 8 MPa, and a molding time of 60 to 120 seconds. It is described that the mold is removed and after-curing is performed at 120 to 180 ° C. for 1 to 3 hours.
- hexahydrophthalic anhydride is used as the curing agent.
- phthalic anhydride maleic anhydride, trimellitic anhydride, pyromellitic anhydride, tetrahydrophthalic anhydride, methyl nadic anhydride, nadic anhydride
- acid anhydrides such as acid, glutaric anhydride, dimethyl glutaric anhydride, diethyl glutaric anhydride, succinic anhydride, methyl hexahydrophthalic anhydride, and methyltetrahydrophthalic anhydride
- this epoxy resin composition for B-stage semiconductor encapsulation has a problem that the acid anhydride curing agent volatilizes due to the temperature applied during manufacture by melt-kneading or during processing by transfer molding. .
- An object of the present invention is to provide a photosensitive resin composition, a method for producing a reflecting member for an optical semiconductor device using the same, and an optical semiconductor device having the reflecting member.
- thermosetting resin composition comprising an epoxy resin (A), a curing agent (B), and a white pigment (C), wherein the curing agent is a terminal carboxylic acid having a softening point of 50 ° C. or higher.
- thermosetting resin composition that is an oligoester; (2) The thermosetting resin composition in which the oligoester of the terminal carboxylic acid has at least two or more carboxyl groups and has an aliphatic hydrocarbon group as a main skeleton, (3) The thermosetting resin composition according to (1) or (2), wherein the white pigment (C) is titanium dioxide powder, (4) The thermosetting resin composition according to any one of (1) to (3), wherein in the thermosetting resin composition, the light reflectance at a wavelength of 460 to 800 nm after thermosetting is 80% or more. object, (5) The thermosetting resin composition according to any one of (1) to (4), wherein the content of the white pigment is 5 to 95% by weight based on the entire thermosetting resin composition.
- Oligoester of terminal carboxylic acid according to (1) Compound obtained by reacting a terminal carboxylic acid oligoester with a bifunctional or polyfunctional alcohol having 6 or more carbon atoms and a saturated aliphatic cyclic acid anhydride
- the saturated aliphatic cyclic acid anhydride is at least selected from the group consisting of hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride.
- thermosetting resin composition of the present invention containing an epoxy resin (A), a specific curing agent (B), and a white pigment (C) suppresses volatilization of the curing agent during production and processing, and is based on heat. It is extremely useful as a thermosetting resin composition that suppresses discoloration and is excellent in light reflectivity and reliability in a high temperature environment.
- the present invention is characterized by containing an epoxy resin (A), a curing agent (B), and a white pigment (C).
- the epoxy resin (A) in the present invention can be used without particular limitation as long as it is usually blended as a conventional thermosetting light reflecting resin composition or epoxy resin molding material.
- phenol novolac type epoxy resins orthocresol novolac type epoxy resins and other phenols and aldehydes novolak resins epoxidized, bisphenol A, bisphenol F, bisphenol S, diglycidyl ethers such as alkyl-substituted bisphenol
- Examples include glycidylamine-type epoxy resins obtained by reaction of polyamines such as diaminodiphenylmethane and isocyanuric acid with epichlorohydrin, alicyclic epoxy resins obtained by oxidizing olefinic bonds with peracids such as peracetic acid, silsesquioxane compounds, etc.
- epoxy resins those that are less colored are preferred.
- bisphenol A type epoxy resin bisphenol F type epoxy resin, bisphenol S type epoxy resin, diglycidyl isocyanurate, triglycidyl isocyanurate, silsesquioxide. Oxane compounds can be mentioned.
- the epoxy resin in the present invention it is preferable to use an alicyclic epoxy resin or an epoxy resin having a triglycidyl isocyanurate skeleton alone or in combination from the viewpoint of excellent transparency and discoloration resistance.
- an epoxy resin having a triglycidyl isocyanurate skeleton for example, the following formula (A)
- R 4 are each independently a direct bond, an oxygen atom or an alkyl group having 1 to 6 carbon atoms which may have an ester bond, the following formula (B)
- R 5 represents a direct bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms which may have an ester bond).
- R 4 at least one represents the formula (B).
- An epoxy resin having the following structure can be preferably used. Specific examples include TEPIC-S (manufactured by Nissan Chemical Industries). Examples of suitable alicyclic epoxy resins include SEJ-01R (manufactured by Nippon Kayaku Co., Ltd.), Celoxide 2021 (manufactured by Daicel Corporation), EHPE3150 (manufactured by Daicel Corporation), and the like.
- the compound name is not particularly limited as long as it has an epoxycyclohexyl skeleton, but as a bifunctional example, an alkylene group having 1 to 10 carbon atoms in which two epoxycyclohexyl skeletons may have an oxygen atom or an ester bond may be used.
- alkylene group having 1 to 10 carbon atoms in which two epoxycyclohexyl skeletons may have an oxygen atom or an ester bond may be used.
- monofunctional examples include epoxy resins having an alkyl group having 1 to 10 carbon atoms and a hydroxyl group which may have an oxygen atom as a substituent on the epoxycyclohexyl skeleton. .
- Specific preferred examples include 3 ′, 4′-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate, 2,2-bis (hydroxymethyl) -1-butanol 1,2-epoxy-4- ( 2-oxiranyl) cyclohexane adduct and the like.
- the curing agent in the present invention is an oligoester of a terminal carboxylic acid having a softening point of 50 ° C. or higher.
- a specific structural formula the following formula (1)
- a plurality of P are residues of a polyhydric alcohol having 2 to 20 carbon atoms which may contain a hetero atom of 0 to 6 oxygen atoms, nitrogen atoms and phosphorus atoms, and R is a carbon number
- a plurality of n and k are independently present, and on average represent 1 to 6. The total of n is 2 or more and less than 12.
- a compound having an ester structure (preferably two ester structures) in the molecule. Moreover, it is a compound which has a some carboxyl group at the terminal.
- the oligoester of the terminal carboxylic acid of the formula (1) is a compound obtained by an esterification reaction of a bi- to hexafunctional polyhydric alcohol having 6 or more carbon atoms and a saturated aliphatic cyclic acid anhydride. preferable.
- the linking group R is preferably a cycloalkane skeleton having 4 to 10 carbon atoms or a norbornane skeleton, and the cycloalkane skeleton is substituted, or An unsubstituted cyclohexane structure, particularly a methylcyclohexane structure having a methyl group is preferred from the optical properties of the cured product.
- the norbornane skeleton is preferably a norbornane or methylnorbornane structure.
- the linking group P is a residue of a polyhydric alcohol having 2 to 10 carbon atoms (residue obtained by removing a hydroxyl group from the polyhydric alcohol used in the reaction), and is preferably a branched cross-linking group or a cycloalkyl group.
- P is preferably a divalent crosslinking group defined by the following (a) or (b).
- the linking group R is a cycloalkane skeleton or a norbornane skeleton having 4 to 10 carbon atoms
- the substituent R 3 in the formula (2) described later is a group other than a hydrogen atom.
- the softening point of the said oligoester is 50 degreeC or more normally, 60 degreeC or more is preferable and 80 degreeC or more is more preferable.
- it is 500 degrees C or less, It is preferable that it is 300 degrees C or less, and it is more preferable that it is 200 degrees C or less.
- the above particularly preferred terminal carboxylic acid oligoesters in the present invention can be obtained by addition reaction of a bi- to hexafunctional polyhydric alcohol having 6 or more carbon atoms and a saturated aliphatic cyclic acid anhydride.
- the terminal carboxylic acid oligoester in the present invention may be a composition containing two kinds of polyvalent carboxylic acids.
- an oligoester composition of a terminal carboxylic acid containing at least two oligoesters of a terminal carboxylic acid a method of mixing at least two kinds of oligoesters of a single terminal carboxylic acid obtained by the above method, or
- a method of synthesizing the oligoester of the terminal carboxylic acid there is a method in which at least two kinds of mixtures are used as the hexahydrophthalic anhydride, or an addition reaction is performed using two kinds of the polyhydric alcohols. .
- the saturated aliphatic cyclic acid anhydride used for the synthesis of the oligoester of a terminal carboxylic acid has a cyclohexane structure, has a methyl group substitution or a carboxyl group substitution on the cyclohexane ring, or is unsubstituted, and the cyclohexane ring And a compound having one or more (preferably one) acid anhydride groups bonded to.
- Specific examples include at least one acid anhydride selected from the group consisting of hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride. .
- the crosslinkable group represented by P is preferably a divalent crosslinkable group defined by the above (a) or (b), which will be specifically described below.
- the divalent crosslinking group defined in (a) is a divalent chain alkyl chain obtained by removing a hydroxyl group from a divalent alcohol (diol) having a branched structure having 6 to 20 carbon atoms.
- the side chain may be branched from any carbon atom constituting the main chain, and includes, for example, a case where the side chain is branched from a carbon atom to which an alcoholic hydroxyl group is bonded (terminal carbon atom of the main chain).
- Any crosslinking group having such a structure may be used, and a specific example of such a crosslinking group is shown in the following formula (a1).
- the alkylene bridging group defined in (a) is not particularly limited as long as it has a structure having an alkyl branched chain (side chain) with respect to the main chain alkylene group, but the main chain has 3 or more main chain carbon atoms.
- those having at least one alkyl side chain are preferred, and those having two or more alkyl side chains are particularly preferred.
- More preferable examples include a bridging group having a linear main chain having 3 to 12 carbon atoms and 2 to 4 side chains, and at least one of the side chains having 2 to 10 carbon atoms. Can do.
- a crosslinking group in which at least two of the side chains have 2 to 10 carbon atoms is more preferable.
- the 2 to 4 side chains are preferably branched from carbon atoms having different main chains. More specific examples of the compound include a compound in which a hydroxyl group is bonded to the position of * in the crosslinking group described in the formula (a1).
- polyhydric alcohols used as the raw material polyhydric alcohols having at least two side chains and at least two of which are side chains having 2 to 4 carbon atoms are preferred.
- particularly preferred polyhydric alcohols are 2,4-diethyl-1,5-pentanediol, 2-ethyl-2-butyl-1,3-propanediol, 2-ethyl-1,3- Examples include hexanediol, and 2,4-diethyl-1,5-pentanediol is particularly preferable.
- Examples of the crosslinking group defined in (b) include a divalent group represented by the following formula (b1).
- the crosslinked polycyclic diol residue is a diol residue having a tricyclodecane structure or a pentacyclopentadecane structure as the main skeleton, and is represented by the following formula (b2). Is done.
- a plurality of R 2 each independently represents a hydrogen atom or a methyl group. Of these, a bridging group in which all R 2 are hydrogen atoms is preferred. Specific examples include tricyclodecane dimethanol, methyl tricyclodecane dimethanol, and pentacyclopentadecane dimethanol.
- the reaction between the acid anhydride and the polyhydric alcohol is generally an addition reaction using an acid or a base as a catalyst, but in the present invention, a reaction without a catalyst is particularly preferable.
- a catalyst examples of the catalyst that can be used include hydrochloric acid, sulfuric acid, methanesulfonic acid, trifluoromethanesulfonic acid, paratoluenesulfonic acid, nitric acid, trifluoroacetic acid, trichloroacetic acid and other acidic compounds, sodium hydroxide, hydroxide Metal hydroxides such as potassium, calcium hydroxide and magnesium hydroxide, amine compounds such as triethylamine, tripropylamine and tributylamine, pyridine, dimethylaminopyridine, 1,8-diazabicyclo [5.4.0] undec-7 -Heterocyclic compounds such as ene, imidazole, triazole, tetrazole, tetramethylammonium hydrox
- the amount of the catalyst used is not particularly limited, but it is usually preferable to use 0.001 to 5 parts by weight, if necessary, with respect to 100 parts by weight of the total weight of the raw materials.
- a reaction without a solvent is preferable, but an organic solvent may be used.
- the amount of the organic solvent used is 0.005 to 1 part by weight, preferably 0.005 to 0.7 part, based on 1 part of the total amount of the acid anhydride and the polyhydric alcohol as reaction substrates. More preferably, it is 0.005 to 0.5 part (that is, 50% by weight or less).
- the amount of the organic solvent used exceeds 1 part by weight with respect to 1 part by weight of the reaction substrate, it is not preferable because the progress of the reaction becomes extremely slow.
- organic solvents that can be used include alkanes such as hexane, cyclohexane and heptane, aromatic hydrocarbon compounds such as toluene and xylene, ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone and anone, diethyl ether , Ethers such as tetrahydrofuran and dioxane, and ester compounds such as ethyl acetate, butyl acetate and methyl formate can be used.
- alkanes such as hexane, cyclohexane and heptane
- aromatic hydrocarbon compounds such as toluene and xylene
- ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone and anone
- diethyl ether Ethers such as tetrahydrofuran and dioxane
- the reaction temperature is preferably 30 to 200 ° C, more preferably 40 to 200 ° C, and particularly preferably 40 to 150 ° C.
- the reaction at 100 ° C. or lower is preferred, and the reaction at 30 to 100 ° C. or 40 to 100 ° C. is particularly preferred because of the volatilization of the acid anhydride.
- the reaction ratio between the acid anhydride and the polyhydric alcohol is theoretically preferably equimolar, but can be changed as necessary.
- the specific charging ratio of the two at the time of reaction is such that the polyhydric alcohol is equivalent to 0.001 to 2 equivalents in terms of the hydroxyl group equivalent to 1 equivalent of the acid anhydride group in terms of the functional group equivalent. It is preferable to charge at a ratio of preferably 0.01 to 1.5 equivalents, more preferably 0.1 to 1.2 equivalents.
- the obtained terminal carboxylic acid oligoester is solid, and in order to obtain a solid resinous terminal carboxylic acid oligoester, ideally an equimolar equivalent or more of polyhydric alcohol is used.
- the equivalent ratio of the alcoholic hydroxyl group to the acid anhydride equivalent is preferably 0.85 to 1.20 molar equivalent, particularly preferably 0.90 to 1.1.0 molar equivalent.
- reaction time depends on the reaction temperature, the amount of catalyst, etc., from the viewpoint of industrial production, a long reaction time is not preferable because it consumes a great deal of energy.
- An excessively short reaction time means that the reaction is abrupt and is not preferable from the viewpoint of safety.
- a preferred range is 1 to 48 hours, preferably 1 to 36 hours, more preferably 1 to 24 hours, and still more preferably about 2 to 10 hours.
- the catalyst After completion of the reaction, when a catalyst is used, the catalyst is removed by neutralization, washing with water, adsorption, etc., and the solvent is distilled off to obtain the desired terminal carboxylic acid oligoester.
- the desired oligoester of the terminal carboxylic acid can be obtained by distilling off the solvent as necessary.
- the oligoester of the terminal carboxylic acid made into the objective is obtained by removing a solvent. Further, in the case of no solvent and no catalyst, the product can be obtained by taking it out as it is.
- the most preferable production method is a method in which the acid anhydride and the polyhydric alcohol are reacted at 40 to 150 ° C. under non-catalytic conditions to remove the solvent and then taken out.
- the thus obtained terminal carboxylic acid oligoester or a composition containing the terminal carboxylic acid oligoester usually shows a colorless to pale yellow solid resinous form (which may crystallize in some cases).
- the softening point of the terminal carboxylic acid oligoester is preferably 50 to 190 ° C, more preferably 55 to 150 ° C, and particularly preferably 60 to 120 ° C.
- the crosslinking group is an alkylene group having a side chain defined by (a)
- it shows a colorless to pale yellow solid resinous form.
- the optimal method using the thermosetting resin composition containing the oligoester of terminal carboxylic acid is a shaping
- the oligoester of terminal carboxylic acid is a solid resin form.
- the bridging group is a bridging group defined by (b)
- the aliphatic hydrocarbon group is a cycloalkane skeleton or a norbornane skeleton having 4 to 10 carbon atoms, all of the alicyclic substituents are at the end of the hydrogen atom.
- Carboxylic acid oligoesters show coloration upon curing and are not suitable for particularly demanding optical applications.
- the aliphatic hydrocarbon group is a cycloalkane skeleton or a norbornane skeleton having 4 to 10 carbon atoms
- the compound having a methyl group or a carboxyl group as the substituent is less colored and the optical properties are improved.
- the substituent is a methyl group or a carboxyl group. This is preferable because optical characteristics are improved.
- the terminal carboxylic acid oligoester composition of the present invention is a cycloalkane skeleton or norbornane skeleton having 4 to 10 carbon atoms
- the substituent is preferably a methyl group or a carboxyl group, or a group having the formula (1)
- a composition comprising an oligoester of a terminal carboxylic acid is preferred.
- an oligoester composition of a terminal carboxylic acid containing two or more kinds of oligoesters of the terminal carboxylic acid at least the terminal carboxylic acid oligoester of the formula (1) in which the substituent is not a hydrogen atom (the substituent is the alkyl group) .
- an oligoester of a terminal carboxylic acid having a methyl group or a carboxyl group is preferably 50 mol% or more based on the total amount of oligoesters of the terminal carboxylic acid.
- a terminal carboxylic acid oligoester composition containing 70 mol% or more, most preferably 90 mol% or more of a terminal carboxylic acid oligoester of the formula (1) in which the substituent is not a hydrogen atom is preferred.
- the balance is the oligoester of the terminal carboxylic acid of formula (1) where R is a hydrogen atom.
- R is a hydrogen atom.
- an oligoester of a terminal carboxylic acid represented by the following formula (2) is used as a suitable oligoester of a terminal carboxylic acid represented by the following formula (2) is used.
- R 3 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a carboxyl group.
- R 3 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a carboxyl group.
- the oligoester of the terminal carboxylic acid may be used in combination with another curing agent.
- the proportion of the terminal carboxylic acid oligoester in the total curing agent is preferably 20% by weight or more, particularly preferably 30% by weight or more.
- Curing agents that can be used in combination with terminal carboxylic acid oligoesters include, for example, amine compounds, acid anhydride compounds having an unsaturated ring structure, acid anhydrides having an organosiloxane skeleton, amide compounds, phenol compounds, carboxylic compounds, and the like. Examples include acid compounds.
- the curing agent that can be used include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, polyamide resin synthesized from linolenic acid and ethylenediamine, phthalic anhydride, trimellitic anhydride Acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butanetetracarboxylic anhydride, Bicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, methylbicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, cyclo
- curing agent (B) is the hardening
- the active group (acid anhydride group or hydroxyl group) in the entire curing agent containing (B) is preferably 0.5 to 1.5 equivalents (considering that the carboxylic acid is monofunctional and the acid anhydride is monofunctional), particularly preferably Is 0.5 to 1.2 equivalents. When less than 0.5 equivalent or more than 1.5 equivalent with respect to 1 equivalent of epoxy group, curing may be incomplete and good cured properties may not be obtained.
- the white pigment in the present invention is not particularly limited, and for example, alumina, magnesium oxide, antimony oxide, titanium oxide, zirconium oxide, zinc oxide, basic zinc carbonate, kaolin, calcium carbonate and the like can be used.
- the white pigment may be a hollow particle.
- the average particle size of the white pigment is preferably in the range of 0.01 to 50 ⁇ m. If it is less than 0.01 ⁇ m, the particles tend to aggregate and the dispersibility tends to deteriorate, and if it exceeds 50 ⁇ m, the reflective properties of the cured product tend not to be sufficiently obtained.
- the average particle diameter can be measured using, for example, a laser diffraction / scattering particle size distribution meter.
- a powder of titanium oxide particularly titanium dioxide. This is because whiteness, light reflectivity, and hiding power are high, dispersibility stability is excellent, and availability is easy.
- the crystal form of titanium oxide is not particularly limited, and may be a rutile type, anatase type, or a mixture of both, but the anatase type has a photocatalytic function and deteriorates the resin. In the present invention, the rutile type is preferable. Further, the content of the white pigment is preferably in the range of 10% by weight to 85% by weight with respect to the entire resin composition.
- the total content is less than 10% by weight, the light reflection characteristics of the cured product tend not to be obtained sufficiently, and if it exceeds 85% by weight, the moldability of the resin composition tends to be poor, and it becomes difficult to produce a substrate. It is in.
- Curing accelerators include 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-phenylimidazole, 1-benzyl- 2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole, 2,4-diamino-6 (2′-methylimidazole (1 ′)) ) Ethyl-s-triazine, 2,4-diamino-6 (2′-undecylimidazole (1 ′)) ethyl-s-triazine, 2,4-diamino-6 (2′-ethyl, 4-methylimidazole (
- curing accelerators which of these curing accelerators is used is appropriately selected depending on characteristics required for the obtained transparent resin composition, such as transparency, curing speed, and working conditions.
- the curing accelerator is usually used in an amount of 0.001 to 15 parts by weight, preferably 0.01 to 5 parts by weight, based on 100 parts by weight of the epoxy resin.
- an inorganic filler can be added to the curable resin composition of the present invention as necessary.
- the inorganic filler may be the same as the white pigment.
- examples of the inorganic filler include, but are not limited to, crystalline silica, fused silica, antimony oxide, titanium oxide, magnesium oxide, zirconium oxide, aluminum hydroxide, magnesium hydroxide, and alumina. These may be used alone or in combination of two or more.
- the blending amount of the inorganic filler is preferably 1 to 1000 parts by weight with respect to 100 parts by weight of the total amount of the component (A) and the component (B) as the total amount with the white pigment. It is more preferable that
- the curable resin composition of the present invention includes an internal mold release agent such as a silane coupling agent, stearic acid, palmitic acid, zinc stearate, aluminum stearate, calcium stearate, zinc carboxylate (zinc 2-ethylhexanoate).
- Zinc compounds metal soaps
- zinc phosphate esters such as zinc octyl phosphate and zinc stearyl phosphate
- light stabilizers such as surfactants and hindered amines
- Various compounding agents such as an antioxidant and a coupling agent, and various thermosetting resins can be added.
- additives such as a known ion supplement may be added to the curable resin composition of the present invention as necessary.
- the light reflectance at a wavelength of 460 to 800 nm after heat curing is 80% or more, more preferably 85% or more. If the light reflectance is less than 80%, there is a tendency that the light semiconductor device cannot sufficiently contribute to the improvement of the luminance of the optical semiconductor device.
- thermosetting resin composition of the present invention can be obtained by uniformly dispersing and mixing the various components described above.
- the method is not particularly limited, a method in which various components are sufficiently uniformly stirred and mixed by a mixer or the like and then kneaded or melt-kneaded by a mixing roll, an extruder, a kneader, a roll, an extruder, or the like, cooled, and pulverized.
- the conditions for kneading or melt-kneading may be determined depending on the types and amounts of the components, and are not particularly limited. However, kneading at 20 to 100 ° C. for 5 to 40 minutes is more preferable.
- the kneading temperature is less than 20 ° C., the dispersibility of each component is lowered and it is difficult to sufficiently knead.
- the kneading temperature is higher than 100 ° C., the crosslinking reaction of the resin composition proceeds and the resin composition There is a risk that things will harden.
- thermosetting resin composition of the present invention is preferably capable of being pressed (tablet) at room temperature of 0 to 30 ° C. before heat molding.
- the pressure molding may be performed under conditions of 0.01 to 10 MPa and 1 to 5 seconds.
- the mold used at the time of pressing (tablet) molding is not particularly limited, and for example, it is composed of a vertical mold (upper mold) and a mortar mold (lower mold) made of a ceramic material, a fluorine resin material, or the like. It is preferable to use what is used.
- thermosetting resin composition of the present invention is useful in applications such as optical semiconductor sealing materials and optical semiconductor reflectors that require high glass transition temperatures and high transmittance.
- the production method is not particularly limited.
- the thermosetting resin composition of the present invention is poured into a mold, for example, cured for 60 to 800 seconds under conditions of a mold temperature of 150 to 190 ° C. and a molding pressure of 2 to 20 MPa. Heat curing is performed at a curing temperature of 150 ° C. to 180 ° C. for 1 to 3 hours.
- a light reflection preventing member having a cylindrical hollow portion is disposed on a substrate to form a cylindrical shape.
- An optical semiconductor element is disposed on the substrate in the internal space of the hollow portion. And the one end part and board
- the gel permeation chromatography (hereinafter referred to as “GPC”) measurement is as follows.
- the column is a Shodex SYSTEM-21 column (KF-803L, KF-802.5 ( ⁇ 2), KF-802), the coupled eluent is tetrahydrofuran, and the flow rate is 1 ml / min.
- the column temperature was 40 ° C.
- the detection was performed by RI (Reflective index), and the standard curve made by Shodex was used for the calibration curve.
- the functional group equivalent was calculated from the ratio calculated from GPC, and the value was determined with 1 equivalent each of carboxylic acid and acid anhydride.
- the softening point was measured using a softening point measuring apparatus METTLER FP90 (manufactured by METTLER TOLEDO Co., Ltd.) at a heating rate of 2 ° C./min.
- the oligoester (B-1) of the terminal carboxylic acid obtained in Synthesis Example 1 and hexahydrophthalic anhydride (manufactured by Shin Nippon Rika Co., Ltd., Jamaicacid HH) the oligoester of the terminal carboxylic acid was 200 ° C. or less. It can be seen that there is almost no volatilization amount, and it is clearly less volatile than Licacid HH. From this result, it is considered that the problem that the curing agent volatilizes during production and processing can be solved by using the oligoester of the terminal carboxylic acid of the present invention as the curing agent.
- Example 1 ⁇ Preparation of Thermosetting Light Reflecting Resin Composition (Example 1, Comparative Example 1)> Each component was blended according to the blending table shown in Table 2, sufficiently kneaded with a mixer, then melt-kneaded under a predetermined condition with a mixing roll, cooled and ground, and the thermosetting light reflection of Example 1 and Comparative Example 1 A resin composition was prepared.
- surface is a weight part, and the blank represents that the said component is not used.
- ⁇ Light reflectivity test> The resin composition of each example and each comparative example was transfer-molded under conditions of a mold temperature of 150 ° C., a molding pressure of 10.4 MPa, and a curing time of 300 seconds, and then post-cured at 150 ° C. for 3 hours to obtain a thickness of 1 A test piece of 0.0 mm was produced. Next, the light reflectance at a wavelength of 460 nm was measured with an integrating sphere spectrophotometer UV-3600 type (manufactured by Shimadzu Corporation), and the light reflectivity of each test piece was evaluated according to the following evaluation criteria.
- thermosetting resin composition of the present invention suppresses volatilization of the curing agent component during production and processing, suppresses discoloration due to heat, and improves light reflectivity and reliability in a high temperature environment. It turns out that the outstanding hardened
- thermosetting resin composition of the present invention suppresses volatilization of the curing agent component during production and processing, suppresses discoloration due to heat, and gives a cured product having excellent light reflectivity and reliability in a high temperature environment. Therefore, it is useful as a thermosetting resin composition for light reflection. Suppressing the volatilization of the curing agent component during processing is important for improving the working environment and expressing stable performance of the cured product. Moreover, it is useful as a reflecting member for optical semiconductors and the like that can increase the output by suppressing discoloration due to heat and obtaining a cured product having excellent light reflectivity and reliability under a high temperature environment.
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Abstract
Description
この場合、硬化剤としては、ヘキサヒドロ無水フタル酸が使用されており、そのほか、無水フタル酸、無水マレイン酸、無水トリメリット酸、無水ピロメリット酸、テトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、無水グルタル酸、無水ジメチルグルタル酸、無水ジエチルグルタル酸、無水コハク酸、メチルヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸などの酸無水物を使用できると記載されているが、本発明者らの検討によれば、このBステージ状半導体封止用エポキシ樹脂組成物は、溶融混練による製造時あるいはトランスファー成型による加工時に、温度がかかることで酸無水物系硬化剤が揮発する問題がある。
(1)エポキシ樹脂(A)、硬化剤(B)、および白色顔料(C)からなる熱硬化性樹脂組成物であって、前記硬化剤が、軟化点が50℃以上である末端カルボン酸のオリゴエステルである熱硬化性樹脂組成物、
(2)前記末端カルボン酸のオリゴエステルが、少なくとも2つ以上のカルボキシル基を有し、脂肪族炭化水素基を主骨格とする熱硬化性樹脂組成物、
(3)前記白色顔料(C)が、二酸化チタン粉末である(1)または(2)に記載の熱硬化性樹脂組成物、
(4)前記熱硬化性樹脂組成物において、熱硬化後の波長460~800nmにおける光反射率が80%以上である(1)~(3)のいずれか一項に記載の熱硬化性樹脂組成物、
(5)前記白色顔料の含有量が、熱硬化性樹脂組成物全体に対して5~95重量%である、(1)~(4)のいずれか一項に記載の熱硬化性樹脂組成物、
(6)(1)記載の末端カルボン酸のオリゴエステル末端カルボン酸のオリゴエステルが炭素数6以上の2~6官能の多価アルコールと飽和脂肪族環状酸無水物との反応により得られた化合物である前項(1)~(5)のいずれか一項に記載の熱硬化性樹脂組成物、
(7)前記飽和脂肪族環状酸無水物が、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、およびシクロヘキサン-1,2,4-トリカルボン酸-1,2-無水物からなる群から選ばれる少なくとも1種の酸無水物との反応により得られた化合物である前項(1)~(6)のいずれか一項に記載の熱硬化性樹脂組成物、
(8)光半導体装置を構成する光反射部材形成用である(1)~(7)のいずれか一項に記載の熱硬化性樹脂組成物、
(9)(1)~(8)のいずれか一項に記載の熱硬化性樹脂組成物を硬化させてなる光半導体装置用反射部材であり、光半導体装置用反射部材の少なくとも一部を、(1)~(8)のいずれか一項に記載の光反射用熱硬化性樹脂組成物をトランスファー成形により形成する光半導体装置用反射部材の製造方法。
(10)(1)~(8)のいずれか一項に記載の熱硬化性樹脂組成物を硬化させてなる光反射部材と、光半導体素子とを有する光半導体装置、
に関する。
ここで、本発明におけるエポキシ樹脂としては透明性、耐変色性に優れるという点から、脂環式エポキシ樹脂、トリグリシジルイソシアヌレート骨格を有するエポキシ樹脂を単独もしくは併せて用いることが好ましい。
尚、トリグリシジルイソシアヌレート骨格を有するエポキシ樹脂としては、例えば下記式(A)
の構造を有するエポキシ樹脂を好適に使用することができる。具体的にはTEPIC-S(日産化学工業社製)等が挙げられる。
また、好適な脂環式エポキシ樹脂としては、例えばSEJ-01R(日本化薬社製)、セロキサイド2021(株式会社ダイセル社製)、EHPE3150(株式会社ダイセル社製)等が挙げられる。化合物名としては、エポキシシクロヘキシル骨格を有するものであれば特に限定されないが、2官能の例としては2つのエポキシシクロヘキシル骨格が酸素原子又はエステル結合を有してもよい炭素数1~10のアルキレン基で結合しているエポキシ樹脂が挙げられ、単官能の例としては、エポキシシクロヘキシル骨格に置換基として酸素原子を有してもよい炭素数1~10のアルキル基又は水酸基を有するエポキシ樹脂が挙げられる。具体的な好ましいものの例としては、3’,4’-エポキシシクロヘキシルメチル 3,4-エポキシシクロヘキサンカルボキシレート、2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物等が挙げられる。
具体的な構造式としては、下記式(1)
の構造を有し、分子内にエステル構造(好ましくは2つのエステル構造)を有する化合物である。また末端に複数のカルボキシル基を有する化合物である。
中でも、前記式(1)の末端カルボン酸のオリゴエステルが炭素数6以上の2~6官能の多価アルコールと飽和脂肪族環状酸無水物とのエステル化反応により得られた化合物であることが好ましい。
より具体的には、前記式(1)に記載の末端カルボン酸のオリゴエステルにおいて、連結基Rは炭素数4~10のシクロアルカン骨格、もしくはノルボルナン骨格が好ましく、シクロアルカン骨格においては置換、もしくは無置換のシクロヘキサン構造、特にメチル基を具備するメチルシクロヘキサン構造がその硬化物における光学特性から好ましい。またノルボルナン骨格としてはノルボルナン、メチルノルボルナン構造が好ましい。
連結基Pは炭素数2~10の多価アルコールの残基(反応に用いた多価アルコールから水酸基を除いた残基)であるが、分岐鎖状の架橋基、もしくはシクロアルキル基が好ましく、特にPは下記(a)又は(b)で定義される2価の架橋基であることが好ましい。
(a)炭素数6~20の分岐構造を有する鎖状アルキル鎖であり、該鎖状アルキル鎖が炭素数3~12の直鎖の主鎖と、2~4個の側鎖を有し、かつその側鎖の少なくとも1つが炭素数2~10である架橋基、
又は、
(b)シクロ環上にメチル基を有してもよい、トリシクロデカンジメタノール又はペンタシクロペンタデカンジメタノール、から選ばれる少なくとも1種の架橋多環ジオールから、2つの水酸基を取り除いた2価の架橋基、
但し、Pが(b)の場合、好ましいものは連結基Rが炭素数4~10のシクロアルカン骨格又はノルボルナン骨格のときは、後述する式(2)において置換基R3が水素原子以外の基を表す。
尚、上記オリゴエステルの軟化点は通常50℃以上であるが、60℃以上が好ましく、80℃以上がより好ましい。上限値に特に制限はないが通常500℃以下であり、300℃以下であることが好ましく、200℃以下であることがより好ましい。
本発明における末端カルボン酸のオリゴエステルは、2種の多価カルボン酸を含む組成物であってもよい。末端カルボン酸のオリゴエステルを少なくとも2種含む末端カルボン酸のオリゴエステル組成物を得る方法としては、上記方法で得られた単一の末端カルボン酸のオリゴエステルを少なくとも2種を混合する方法、または、上記の末端カルボン酸のオリゴエステルを合成する際に、上記ヘキサヒドロ無水フタル酸として、少なくとも2種の混合物を使用するか、前記多価アルコールを2種使用して、付加反応を行う方法がある。
具体的にはヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、およびシクロヘキサン-1,2,4-トリカルボン酸-1,2-無水物からなる群から選ばれる少なくとも1種の酸無水物が挙げられる。
前記式(1)において、Pで表される架橋基は、好ましくは前記(a)または(b)で定義される2価の架橋基であり、それらについて以下に具体的に説明する。
前記(a)で定義される2価の架橋基は、炭素数6~20の分岐構造を有する2価のアルコール(ジオール)から、水酸基を除いた2価の鎖状アルキル鎖であり、ジオールの2個のアルコール性水酸基に挟まれたアルキル鎖を主鎖とし、該アルキル鎖から分岐したアルキル鎖(側鎖という)を有する構造である。該側鎖は、主鎖を構成するいずれの炭素原子から分岐していてもよく、例えばアルコール性水酸基が結合していた炭素原子(主鎖の末端炭素原子)から分岐している場合も含む。該構造を有する架橋基であれば何れでもよく、このような架橋基の具体例を下記式(a1)に示す。
より具体的な化合物としては前記式(a1)に記載した架橋基において、*印の位置にヒドロキシル基が結合した化合物を挙げることができる。
原料として使用する多価アルコールの中では、少なくとも2個の側鎖を有し、該側鎖の中で少なくとも2個が炭素数2~4の側鎖である多価アルコールが好ましい。
このような骨格の中で特に好ましい多価アルコールとしては2,4-ジエチル-1,5-ペンタンジオール、2-エチル-2-ブチル-1,3-プロパンジオール、2-エチル-1,3-ヘキサンジオールなどが挙げられ、特に2,4-ジエチル-1,5-ペンタンジオールが好ましい。
具体的にはトリシクロデカンジメタノール、メチルトリシクロデカンジメタノール、ペンタシクロペンタデカンジメタノールなどが挙げられる。
触媒を用いる場合、使用しうる触媒としては、例えば塩酸、硫酸、メタンスルホン酸、トリフルオロメタンスルホン酸、パラトルエンスルホン酸、硝酸、トリフルオロ酢酸、トリクロロ酢酸等の酸性化合物、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム、水酸化マグネシウム等の金属水酸化物、トリエチルアミン、トリプロピルアミン、トリブチルアミン等のアミン化合物、ピリジン、ジメチルアミノピリジン、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン、イミダゾール、トリアゾール、テトラゾール等の複素環式化合物、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、テトラプロピルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、トリメチルエチルアンモニウムヒドロキシド、トリメチルプロピルアンモニウムヒドロキシド、トリメチルブチルアンモニウムヒドロキシド、トリメチルセチルアンモニウムヒドロキシド、トリオクチルメチルアンモニウムヒドロキシド、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムブロミド、テトラメチルアンモニウムヨージド、テトラメチルアンモニウムアセテート、トリオクチルメチルアンモニウムアセテート等の4級アンモニウム塩等が挙げられる。これらの触媒は1種又は2種以上を混合して用いても良い。これらの中で、トリエチルアミン、ピリジン、ジメチルアミノピリジンが好ましい。
本反応においては無溶剤での反応が好ましいが、有機溶剤を使用しても構わない。有機溶剤の使用量としては、反応基質である前記酸無水物と前記多価アルコールの総量1部に対し、重量比で0.005~1部であり、好ましくは0.005~0.7部、より好ましくは0.005~0.5部(すなわち50重量%以下)である。有機溶剤の使用量が上記反応基質1重量部に対して、重量比で1部を超える場合、反応の進行が極度に遅くなることから好ましくない。使用できる有機溶剤の具体的な例としてはヘキサン、シクロヘキサン、ヘプタン等のアルカン類、トルエン、キシレン等の芳香族炭化水素化合物、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、アノン等のケトン類、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル、蟻酸メチルなどのエステル化合物などが使用できる。
反応させる際の具体的な両者の仕込み比率としては、その官能基当量で、該酸無水物基1当量に対して、該多価アルコールを、その水酸基当量で、0.001~2当量、より好ましくは0.01~1.5当量、さらに好ましくは0.1~1.2当量となる割合で仕込むのが好ましい。
本発明においては得られる末端カルボン酸のオリゴエステルが固形であることが好ましく、固形の樹脂状末端カルボン酸のオリゴエステルを得るためには、理想的には等モル当量以上の多価アルコールを使用することが好ましいが、フィラーを添加するため流動性が重要となり、この流動性を確保する為に、その粘度バランスから、固形を保つ範囲(軟化点50℃以上)で多少のバランスを崩しても構わない。
具体的には、酸無水物当量に対し、アルコール性水酸基の当量比において0.85~1.20モル当量が好ましく、特に0.90~1.1.0モル当量が好ましい。
通常、架橋基が、(a)で定義される側鎖を有するアルキレン基である場合、無色~淡黄色の固形の樹脂状を示す。
本発明においては、末端カルボン酸のオリゴエステルを含む熱硬化性樹脂組成物を使用する最適な方法が、トランスファーで成形であることから、末端カルボン酸のオリゴエステルは固形の樹脂状である。
架橋基が(b)で定義される架橋基の場合、脂肪族炭化水素基が炭素数4~10のシクロアルカン骨格又はノルボルナン骨格であるとき、脂環式の置換基の全てが水素原子の末端カルボン酸のオリゴエステルは、硬化時の着色が見られ、特に厳しい光学用途には好適ではない。脂肪族炭化水素基が炭素数4~10のシクロアルカン骨格又はノルボルナン骨格であるとき、置換基がメチル基またはカルボキシル基の化合物ではそのような着色は少なく、その光学特性が向上する。
前記(a)で定義される架橋基の化合物においても、脂肪族炭化水素基が炭素数4~10のシクロアルカン骨格又はノルボルナン骨格であるとき、置換基がメチル基またはカルボキシル基の化合物の場合の方が、光学特性が向上し、好ましい。
すなわち、本発明の末端カルボン酸のオリゴエステル組成物として、炭素数4~10のシクロアルカン骨格又はノルボルナン骨格であるとき、置換基は好ましくはメチル基もしくはカルボキシル基、又は両者を有する式(1)の末端カルボン酸のオリゴエステルを含む組成物が好ましい。該末端カルボン酸のオリゴエステルを2種以上含む末端カルボン酸のオリゴエステル組成物の場合、少なくとも当該置換基が水素原子でない式(1)の末端カルボン酸のオリゴエステル(当該置換基が前記アルキル基、好ましくはメチル基、又はカルボキシル基の末端カルボン酸のオリゴエステル)、を、末端カルボン酸のオリゴエステルの総量に対して、50モル%以上含む組成物が好ましい。より好ましくは、当該置換基が水素原子でない式(1)の末端カルボン酸のオリゴエステルを70モル%以上、最も好ましくは90モル%以上含む末端カルボン酸のオリゴエステル組成物が好ましい。残部が、Rが水素原子である式(1)の末端カルボン酸のオリゴエステルである。
本発明において好適な末端カルボン酸のオリゴエステルとしては、下記式(2)で表される末端カルボン酸のオリゴエステルが用いられる。
ここで、上記式(2)においては、上記に記載の通りの理由により、R3が炭素数1~3のアルキル基またはカルボキシル基を好適に使用できる。
末端カルボン酸のオリゴエステルに併用しうる硬化剤としては、例えばアミン系化合物、不飽和環構造を有する酸無水物系化合物、オルガノシロキサン骨格を有する酸無水物、アミド系化合物、フェノール系化合物、カルボン酸系化合物などが挙げられる。用いうる硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ブタンテトラカルボン酸無水物、ビシクロ[2,2,1]ヘプタン-2,3-ジカルボン酸無水物、メチルビシクロ[2,2,1]ヘプタン-2,3-ジカルボン酸無水物、シクロヘキサン-1,3,4-トリカルボン酸-3,4-無水物、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、テルペンジフェノール、4,4’-ビフェノール、2,2’-ビフェノール、3,3’,5,5’-テトラメチル-[1,1’-ビフェニル]-4,4’-ジオール、ハイドロキノン、レゾルシン、ナフタレンジオール、トリス-(4-ヒドロキシフェニル)メタン、1,1,2,2-テトラキス(4-ヒドロキシフェニル)エタン、フェノール類(フェノール、アルキル置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、ジヒドロキシナフタレン等)とホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p-ヒドロキシベンズアルデヒド、o-ヒドロキシベンズアルデヒド、p-ヒドロキシアセトフェノン、o-ヒドロキシアセトフェノン、ジシクロペンタジエン、フルフラール、4,4’-ビス(クロロメチル)-1,1’-ビフェニル、4,4’-ビス(メトキシメチル)-1,1’-ビフェニル、1,4’-ビス(クロロメチル)ベンゼン、1,4’-ビス(メトキシメチル)ベンゼン等との重縮合物及びこれらの変性物、テトラブロモビスフェノールA等のハロゲン化ビスフェノール類、イミダゾール、トリフルオロボラン-アミン錯体、グアニジン誘導体、テルペンとフェノール類の縮合物などが挙げられるが、これらに限定されるものではない。これらは単独で用いてもよく、2種以上を用いてもよい。
また、白色顔料の含有量は、樹脂組成物全体に対して、10重量%~85重量%の範囲であることが好ましい。合計含有量が10重量%未満であると硬化物の光反射特性が十分得られない傾向にあり、85重量%を超えると樹脂組成物の成型性が悪くなり、基板の作製が困難となる傾向にある。
硬化促進剤は、エポキシ樹脂100重量部に対し通常0.001~15重量部、好ましくは0.01~5重量部の範囲で使用される。
無機充填剤の配合量は、白色顔料との合計量が(A)成分および(B)成分の合計量100重量部に対して、1~1000重量部であることが好ましく、1~800重量部であることがより好ましい。
本発明の半導体装置は、代表的な構造について具体例を例示すると、国際公開第2012/124147号に記載の通り、基板上に円筒状の中空部を有する光反射防止部材を配置し、円筒状の中空部の内部空間において基板上に光半導体素子を配置する。そして、光半導体素子の一端部と基板をワイヤーで繋げ、上記中空部に封止樹脂が封入された構成を有している。
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、窒素パージを施しながらトリシクロデカンジメタノール98.1部、メチルヘキサヒドロフタル酸無水物とヘキサヒドロフタル酸無水物の混合物(新日本理化(株)製、リカシッドMHT、比率 7:3)117.6部、シクロヘキサン-1,2,4-トリカルボン酸-1,2-無水物(三菱ガス化学製 H-TMAn)59.4部、MEK275.2部を加え、60℃で1時間反応後80℃で5時間加熱撹拌を行い、硬化剤を得た。得られた硬化剤は下記式で表され、無色、固形であった。また、官能基当量は225.2g/eq.であった。軟化点は105.6℃であった。
各硬化剤について、下記試験方法により硬化物の揮発性を評価した。結果を表1に示す。TG/DTAの測定方法を記載する。
エスアイアイ・ナノテクノロジー株式会社製熱重量分析装置(TG/DTA7200)を用いて、空気中、昇温速度10℃/分で、150℃、180℃、200℃の各温度での減量(%)を測定した。
表2に示した配合表に従って各成分を配合し、ミキサーによって十分混練した後、ミキシングロールにより所定条件で溶融混練し、冷却、粉砕を行い、実施例1および比較例1の熱硬化性光反射用樹脂組成物を調製した。なお、表中の各成分の配合量の単位は重量部であり、空欄は当該成分を使用していないことを表す。
各実施例及び各比較例の樹脂組成物について、下記試験方法により硬化物の光反射性を評価した。結果を表2(72時間後)、表3(144時間後)に示す。
各実施例及び各比較例の樹脂組成物を、成型型温度150℃、成型圧力10.4MPa、キュア時間300秒の条件でトランスファー成型した後、150℃で3時間ポストキュアすることにより、厚み1.0mmのテストピースを作製した。ついで、積分球型分光光度計UV-3600型(株式会社島津製作所製)にて波長460nmにおける光反射率を測定し、下記の評価基準により各テストピースの光反射性を評価した。
なお、本願は、2013年12月18日付で出願された日本国特許出願(2013-260903)に基づいており、その全体が引用により援用される。また、ここに引用されるすべての参照は全体として取り込まれる。
Claims (10)
- エポキシ樹脂、硬化剤、および白色顔料からなる光反射用熱硬化性樹脂組成物であって、前記硬化剤が、軟化点が50℃以上である末端カルボン酸のオリゴエステルである熱硬化性樹脂組成物。
- 前記末端カルボン酸のオリゴエステル末端カルボン酸のオリゴエステルが、少なくとも2つ以上のカルボキシル基を有し、脂肪族炭化水素基を主骨格とする請求項1に記載の熱硬化性樹脂組成物。
- 前記白色顔料が、二酸化チタン粉末である請求項1または請求項2に記載の熱硬化性樹脂組成物。
- 前記熱硬化性樹脂組成物において、熱硬化後の波長460~800nmにおける光反射率が80%以上である請求項1~3のいずれか一項に記載の熱硬化性樹脂組成物。
- 前記白色顔料の含有量が、熱硬化性樹脂組成物全体に対して5~95重量%である、請求項1~4のいずれか一項に記載の熱硬化性樹脂組成物。
- 請求項1記載の末端カルボン酸のオリゴエステル末端カルボン酸のオリゴエステルが炭素数6以上の2~6官能の多価アルコールと飽和脂肪族環状酸無水物との反応により得られた化合物である請求項1~5のいずれか一項に記載の熱硬化性樹脂組成物。
- 前記飽和脂肪族環状酸無水物が、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、およびシクロヘキサン-1,2,4-トリカルボン酸-1,2-無水物からなる群から選ばれる少なくとも1種の酸無水物との反応により得られた化合物である請求項1~6のいずれか一項に記載の熱硬化性樹脂組成物、
- 光半導体装置を構成する光反射部材形成用である請求項1~7のいずれか一項に記載の熱硬化性樹脂組成物。
- 請求項1~8のいずれか一項に記載の熱硬化性樹脂組成物を硬化させてなる光半導体装置用反射部材であり、光半導体装置用反射部材の少なくとも一部を、請求項1~8のいずれか一項に記載の光反射用熱硬化性樹脂組成物をトランスファー成形により形成する光半導体装置用反射部材の製造方法。
- 請求項1~8のいずれか一項に記載の熱硬化性樹脂組成物を硬化させてなる光反射部材と、光半導体素子とを有する光半導体装置。
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JP5179839B2 (ja) * | 2007-11-08 | 2013-04-10 | 株式会社ダイセル | エポキシ樹脂組成物、及びその硬化物 |
JP2010074124A (ja) | 2008-08-18 | 2010-04-02 | Hitachi Chem Co Ltd | 光半導体装置、光半導体素子搭載用パッケージ基板の製造方法及びこのパッケージ基板を用いた光半導体装置の製造方法 |
JP2013168684A (ja) | 2013-06-03 | 2013-08-29 | Hitachi Chemical Co Ltd | 光半導体素子搭載用部材及び光半導体装置 |
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2014
- 2014-12-17 JP JP2015553589A patent/JP6147362B2/ja not_active Expired - Fee Related
- 2014-12-17 CN CN201480070280.1A patent/CN105849149A/zh active Pending
- 2014-12-17 KR KR1020167015189A patent/KR20160100943A/ko not_active Application Discontinuation
- 2014-12-17 WO PCT/JP2014/083458 patent/WO2015093543A1/ja active Application Filing
- 2014-12-18 TW TW103144427A patent/TW201538612A/zh unknown
Patent Citations (2)
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JP2008050573A (ja) * | 2006-07-25 | 2008-03-06 | Hitachi Chem Co Ltd | 熱硬化性光反射用樹脂組成物、これを用いた光半導体素子搭載用基板とその製造方法および光半導体装置 |
WO2010150524A1 (ja) * | 2009-06-22 | 2010-12-29 | 日本化薬株式会社 | 多価カルボン酸、その組成物、硬化性樹脂組成物、硬化物および多価カルボン酸の製造方法 |
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WO2019003822A1 (ja) * | 2017-06-28 | 2019-01-03 | Dic株式会社 | 活性エステル化合物及び硬化性組成物 |
CN116082793A (zh) * | 2022-12-28 | 2023-05-09 | 东莞联茂电子科技有限公司 | 耐黄变白色覆铜板用的环氧树脂组合物、半固化片及基板 |
CN116082793B (zh) * | 2022-12-28 | 2024-06-07 | 东莞联茂电子科技有限公司 | 耐黄变白色覆铜板用的环氧树脂组合物、半固化片及基板 |
Also Published As
Publication number | Publication date |
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KR20160100943A (ko) | 2016-08-24 |
JPWO2015093543A1 (ja) | 2017-03-23 |
TW201538612A (zh) | 2015-10-16 |
JP6147362B2 (ja) | 2017-06-14 |
CN105849149A (zh) | 2016-08-10 |
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