WO2015085679A1 - 承载基板和柔性显示器件制作方法 - Google Patents

承载基板和柔性显示器件制作方法 Download PDF

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Publication number
WO2015085679A1
WO2015085679A1 PCT/CN2014/074037 CN2014074037W WO2015085679A1 WO 2015085679 A1 WO2015085679 A1 WO 2015085679A1 CN 2014074037 W CN2014074037 W CN 2014074037W WO 2015085679 A1 WO2015085679 A1 WO 2015085679A1
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Prior art keywords
gas
substrate
generation layer
generating layer
gas generating
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English (en)
French (fr)
Inventor
王辉锋
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to US14/420,748 priority Critical patent/US20160039182A1/en
Publication of WO2015085679A1 publication Critical patent/WO2015085679A1/zh
Anticipated expiration legal-status Critical
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/10—Removing layers, or parts of layers, mechanically or chemically
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
    • B32B43/006—Delaminating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/06—Interconnection of layers permitting easy separation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2315/00—Other materials containing non-metallic inorganic compounds not provided for in groups B32B2311/00 - B32B2313/04
    • B32B2315/08—Glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a carrier substrate and a method of fabricating a flexible display device. Background technique
  • a display element is fabricated on a flexible film to obtain a flexible display device.
  • the high temperature applied in the process of fabricating a display element on a flexible film may cause deformation of the flexible film, resulting in processing failure. Therefore, in the prior art, a flexible film is usually formed on a rigid glass substrate, and then a display element is formed on the flexible film, and the flexible film is separated from the glass substrate after the display element is completed.
  • a conventional method for separating a flexible film from a glass substrate is to form a metal layer, an oxide layer, and a semiconductor containing hydrogen on the glass substrate, and release hydrogen in the semiconductor by heat treatment to cause a redox reaction of the oxide layer. Thereby, the adhesion between the oxide layer and the metal layer is lowered to peel the flexible film from the glass substrate.
  • Another existing method is to process a layer of hot-melt type resin between the flexible film and the glass substrate. When peeling off, the hot-melt type resin is melted by heating to separate the flexible film from the peeling substrate.
  • an object of the present invention is to provide a carrier substrate and a method of fabricating a flexible display device, which are capable of separating a flexible film from a substrate after the display element on the flexible film is fabricated.
  • the present invention provides a carrier substrate for carrying a flexible film of the flexible display device in the process of manufacturing a flexible display device, the carrier substrate comprising: a substrate; and gas generation on the substrate a layer, the flexible film is placed on the gas generating layer during the manufacturing of the flexible display device, and a material of the gas generating layer is capable of decomposing and generating a gas.
  • the gas generating layer is decomposed and generates a gas after absorbing laser energy by irradiating the gas generating layer with a laser.
  • the material of the gas generating layer has a band gap energy of 2 eV to 7 eV.
  • the material of the gas generating layer comprises GaN or AlN, or the material of the gas generating layer comprises a mixture of GaN and A1N.
  • the gas generating layer further comprises a photothermal conversion material.
  • the material of the substrate has a band gap energy greater than 7 eV.
  • the material of the substrate is glass or transparent ceramic.
  • the gas generating layer has a thickness of 10 nm to 100 m.
  • the gas generating layer has a thickness of from 200 nm to 500 nm.
  • the present invention further provides a method of fabricating a flexible display device, the method of fabricating the flexible display device comprising the steps of:
  • the material of the gas generating layer is decomposed and a gas is generated to separate the flexible film from the substrate.
  • the step of decomposing the material of the gas generating layer and generating a gas comprises: irradiating the gas generating layer with a laser such that the gas generating layer decomposes and generates a gas after absorbing laser energy.
  • the laser light is irradiated along a predetermined trajectory to illuminate the gas generating layer through the substrate.
  • the laser is scanned and irradiated in a direction from one side of the gas generating layer to the other side opposite to the one side to irradiate the gas to the gas through the substrate.
  • Floor is scanned and irradiated in a direction from one side of the gas generating layer to the other side opposite to the one side to irradiate the gas to the gas through the substrate.
  • the laser light is scanned in a direction from an edge of the gas generating layer to a center of the gas generating layer to illuminate the gas generating layer through the substrate.
  • the present invention can disintegrate the gas generating layer and generate a gas when the flexible film needs to be peeled off by providing a gas generating layer between the substrate and the flexible film, thereby forcing the flexible film to be separated from the substrate by the expansion of the gas.
  • the invention can make the flexible film and the substrate have better separation effect, and at the same time, the gas generating layer in the invention can have better heat resistance and can overcome the prior art in the processing display.
  • the hydrogen is diffused in advance in the high temperature environment of the device, or the hot melt resin is melted in advance.
  • the present invention can flexibly adjust the peeling manner of the flexible film by controlling the scanning mode of the laser, and can also adjust the separation strength between the flexible film and the substrate by controlling the thickness of the gas generating layer.
  • FIG. 1 is a view showing an example of a structure of a carrier substrate provided by the present invention and a flexible display device carried on the carrier substrate;
  • FIG. 2 is a flow chart showing a method of fabricating a flexible display device according to the present invention
  • FIG. 3 is a side view showing an example of a laser irradiation direction provided by the present invention
  • FIG. 4 is a view showing a laser scanning mode provided by the present invention.
  • the carrier substrate on which the flexible display device is fabricated may include the substrate 101 and the gas generating layer 102, and the flexible display device carried on the carrier substrate may include the flexible film 103 and the display device layer 104.
  • the gas generating layer 102 is located on the substrate 101
  • the flexible film 103 is located on the gas generating layer 102
  • the material of the gas generating layer 102 is capable of decomposing and generating gas.
  • the substrate 101 is The gas generating layer 102 is formed such that the gas generating layer 102 is located between the substrate 101 and the flexible film 103. Since the material of the gas generating layer 102 can be decomposed under certain conditions and gas is generated, the gas can be expanded by gas.
  • the flexible film 103 is separated from the substrate 101. Specifically, the excitation conditions for exciting the gas generating layer 102 to decompose and generate a gas may be determined according to actual needs.
  • the present invention separates the flexible film 103 from the substrate 101 by the expansion of the gas, applies a separation principle different from the prior art, and can obtain a better separation effect by the expansion of the gas.
  • the gas generating layer 102 in the present invention can have better heat resistance, and the gas generating layer 102 is not decomposed in advance in a high-temperature process environment for manufacturing a display device, and can overcome the prior art in processing a display device. In the high temperature environment, hydrogen is diffused in advance, or the hot melt resin is melted in advance.
  • the gas generating layer 102 may be irradiated with a laser so that the gas generating layer 102 decomposes and generates a gas after absorbing laser energy.
  • the band gap energy of the material of the gas generating layer 102 may be between 2 eV and 7 eV.
  • the band gap energy of the material for fabricating the gas generating layer 102 is small, the energy of the laser light can be easily absorbed to decompose and generate a gas, and therefore, preferably, the band gap energy of the material of the gas generating layer 102 can be 2 eV ⁇ Between 7 eV, and the laser used may be a laser in the ultraviolet band, and the laser energy in the ultraviolet band is high enough to decompose the gas generating layer 102 and generate gas.
  • the material for forming the gas generating layer 102 may use a material capable of generating and releasing a gas under laser irradiation, and preferably, a material for fabricating the gas generating layer 102 may be used.
  • GaN or AlN is included, or a mixture of GaN and A1N may be included.
  • the band gap energy of GaN is 3. 3 eV
  • the band gap energy of A1N is 6. 3 eV, both of which can be decomposed by absorbing laser energy after being irradiated by laser light to generate gas N2 and corresponding metal, thereby being able to pass through
  • the expansion of the gas N2 causes the flexible film 103 to be separated from the substrate 101.
  • both GaN and A1N have good heat resistance.
  • the interfacial decomposition temperature of GaN is 900 ° C
  • the high temperature environment for forming the display device layer 104 is usually between 300 ° C and 400 ° C.
  • the gas generating layer 102 made of GaN or AlN can be stabilized in a high temperature environment in which the display device layer 104 is formed.
  • the gas generating layer 102 is formed by using GaN or AlN or a mixture of the two, so that the adhesion between the substance (Ga or A1) decomposed by the gas generating layer 102 and the substrate 101 is stronger than that between the flexible film 103 and the flexible film 103. Adhesion, thereby preventing the decomposed material from remaining on the flexible film 103.
  • an auxiliary material may be added to the gas generating layer 102 to promote the energy of the gas generating layer 102 to absorb the laser light.
  • the photothermal conversion material may be added to the gas generating layer 102.
  • the material of the substrate 101 has a band gap energy greater than 7 eV.
  • the band gap energy of the material of the substrate 101 can be made large so that it does not easily absorb the energy of the laser photons.
  • the photon energy of the laser in the ultraviolet band is between 3 eV and 7 eV. Therefore, preferably, the band gap energy of the material of the substrate 101 can be greater than 7 eV, so that the energy of the laser light in the ultraviolet band can be transmitted to the gas through the substrate 101.
  • Layer 102 is created.
  • the material of the substrate 101 may be glass or transparent ceramic.
  • the glass or the transparent ceramic has a large band gap energy, is not easy to absorb the energy of the laser photon, and at the same time, as a transparent material, the laser can pass through the substrate. 101 is irradiated to the gas generating layer 102.
  • the gas generating layer has a thickness of 10 nm to 100 m.
  • the thickness of the gas generating layer 102 may be determined according to the required force for separating the flexible film 103 from the substrate 101.
  • a thick gas generating layer may be provided.
  • the gas generating layer 102 is decomposed to generate more gas to provide a larger separation force; accordingly, when the separation force required to separate the flexible film 103 from the substrate 101 is small, a thinner gas can be provided.
  • Producing layer 102 thereby making gas The resulting layer 102 is decomposed to produce less gas to provide less separation force.
  • the thickness of the gas generating layer 102 is not excessively thick, and the thickness of the gas generating layer 102 may be set to be between 10 nm and 100 m. Preferably, The thickness of the gas generating layer 102 is set to be between 200 nm and 500 nm.
  • a method for fabricating a flexible display device capable of fabricating a flexible display device using the carrier substrate provided by the present invention is provided. Specifically, as shown in FIG. 2, the flexible display device is fabricated. Methods can include:
  • Step S1 forming a gas generating layer on the substrate, the material of the gas generating layer being capable of decomposing and generating a gas;
  • Step S2 forming a flexible film on the gas generating layer
  • Step S3 forming a display device layer on the flexible film
  • Step S4 decomposing the material of the gas generating layer and generating a gas to separate the flexible film from the substrate.
  • the gas generating layer 102 may be irradiated with a laser such that the gas generating layer 102 decomposes and generates a gas after absorbing laser energy.
  • the photon energy of the laser is high enough to cause the gas generating layer 102 to absorb energy and decompose to generate a gas.
  • the laser is highly directional, which facilitates controlling the positioning of the gas generating layer 102. Specifically, a laser in the ultraviolet band can be used.
  • the laser light can pass through a predetermined trajectory (i.e., the arrow in Fig. 3 shows the laser irradiation direction and the irradiation position from the bottom to the top).
  • the substrate 101 is then irradiated to the gas generating layer 102.
  • a gas generating layer 102 (not shown) is disposed in a direction in which the vertical direction of the substrate 101 faces inward as described above, and a laser is used along the gas generating layer 102 from the gas generating layer 102.
  • One side (for example, the left side in FIG. 4) is scanned in the direction opposite to the other side (for example, the right side in FIG. 4) (ie, the arrow in FIG. 4 shows the scanning direction when the laser 201 is irradiated).
  • the gas generating layer 102 is irradiated through the substrate 101.
  • the manner of separating the flexible film 103 from the substrate 101 can be flexibly controlled according to actual needs, and the flexible film 103 can be separated from the substrate 101 from side to side by controlling the laser scanning irradiation, or from the edge of the flexible film 103.
  • the center is separated from the substrate 101 to achieve separation of the flexible substrate from the carrier substrate in various ways.
  • the present invention can provide peeling flexibility by providing a gas generating layer between the substrate and the flexible film.
  • the gas generating layer is decomposed and gas is generated, thereby forcing the flexible film to separate from the substrate by the expansion of the gas.
  • the gas generating layer in the present invention can have better heat resistance, and can overcome the prior art, in which the hydrogen is diffused in advance in the high temperature environment of the processing display device, or the hot melt resin is melted in advance. The problem.
  • the present invention can flexibly adjust the peeling manner of the flexible film by controlling the scanning mode of the laser, and can also adjust the separation strength between the flexible film and the substrate by controlling the thickness of the gas generating layer.

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  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
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Abstract

一种承载基板，用于在制造柔性显示器件的过程中承载所述柔性显示器件的柔性膜（103），承载基板包括：基板（101）；位于基板（101）上的气体产生层（102），在制造柔性显示器件的过程中使柔性膜（103）位于气体产生层（102）上，并且气体产生层（102）的材料能够分解并产生气体。还提供了一种柔性显示器件的制作方法，步骤包括：在基板（101）上形成气体产生层（102）；气体产生层（102）上形成柔性膜（103）；在柔性膜（103）上形成显示器件层（104）；使气体产生层（102）的材料分解并产生气体，以将柔性膜（103）与基板（101）分离。通过设置气体产生层（102）能够灵活调整柔性膜的剥离方式，以及调节柔性膜与基板的分离力度。

Description

承载基板和柔性显示器件制作方法 技术领域
本发明涉及显示技术领域， 尤其涉及一种承载基板和一种柔性 显示器件制作方法。 背景技术
如今， 柔性材料已经被逐步应用在显示技术领域中， 由于柔性 显示屏与传统平板显示屏相比， 能够弯曲或者折叠， 因此， 柔性显示 屏具有广阔的应用前景。
通常， 是在柔性膜上制作显示元件以得到柔性显示器件， 然而， 在柔性膜上制作显示元件的工艺过程中所应用的高温可能会造成柔 性膜变形， 从而导致加工失败。 因此， 现有的方法通常是在刚性的玻 璃基板上制作柔性膜，之后在柔性膜上制作显示元件，在显示元件制 作完毕后将柔性膜与玻璃基板分离。
现有的一种将柔性膜与玻璃基板分离的方法是在玻璃基板上制 作金属层、氧化物层和含有氢的半导体，通过热处理将半导体中的氢 释放，使得氧化物层发生氧化还原反应，从而降低氧化物层和金属层 之间的粘合力， 以将柔性膜与玻璃基板剥离。现有的另一种方法是在 柔性膜和玻璃基板之间加工一层热熔型树脂，剥离时，通过加热使得 热熔型树脂熔化， 以将柔性膜与剥离基板分离。
然而， 由于在柔性膜上制作显示元件的过程中， 经常会使用高 温工艺， 可能造成现有的利用含氢半导体的方法中的氢被提前扩散， 导致后续的剥离不够充分，或者，可能造成现有的利用热熔型树脂的 方法中的热熔型树脂提前熔化， 导致整个柔性显示器件加工失败。 发明内容
有鉴于此， 本发明的目的在于提供一种承载基板和一种柔性显 示器件制作方法， 以能够在柔性膜上的显示元件制作完毕后，将柔性 膜与基板分离。 为实现上述目的， 本发明提供一种承载基板， 用于在制造柔性 显示器件的过程中承载所述柔性显示器件的柔性膜，所述承载基板包 括： 基板； 和位于所述基板上的气体产生层， 在所述制造柔性显示器 件的过程中使所述柔性膜位于所述气体产生层上，并且所述气体产生 层的材料能够分解并产生气体。
优选地， 通过用激光照射所述气体产生层来使所述气体产生层 在吸收激光能量后分解并产生气体。
优选地， 所述气体产生层的材料的带隙能量为 2eV~7eV。
优选地，所述气体产生层的材料包括 GaN或 A1N,或者所述气体 产生层的材料包括 GaN与 A1N的混合物。
优选地， 所述气体产生层还包括光热转换材料。
优选地， 所述基板的材料的带隙能量大于 7eV。
优选地， 所述基板的材料为玻璃或者透明的陶瓷。
优选地， 所述气体产生层的厚度为 10nm~100 m。
优选地， 所述气体产生层的厚度为 200nm~500nm。
相应地， 本发明还提供一种柔性显示器件的制作方法， 所述柔 性显示器件的制作方法包括步骤：
在基板上形成气体产生层， 所述气体产生层的材料能够分解并 产生气体；
在所述气体产生层上形成柔性膜；
在所述柔性膜上形成显示器件层；
使所述气体产生层的材料分解并产生气体， 以将所述柔性膜与 所述基板分离。
优选地， 所述使所述气体产生层的材料分解并产生气体的步骤 包括：用激光照射所述气体产生层，使所述气体产生层在吸收激光能 量后分解并产生气体。
优选地， 使所述激光沿预定轨迹照射， 以穿过所述基板照射到 所述气体产生层。
优选地， 使所述激光沿着从所述气体产生层的一边至与该一边 相对的另一边的方向扫描照射，以穿过所述基板照射到所述气体产生 层。
优选地， 使所述激光沿着从所述气体产生层的边缘至所述气体 产生层的中心的方向扫描照射，以穿过所述基板照射到所述气体产生 层。
可以看出， 本发明通过在基板与柔性膜之间设置气体产生层， 能够在需要剥离柔性膜时，使气体产生层分解并产生气体，从而通过 气体的膨胀作用迫使柔性膜与基板分离。与现有技术相比，本发明可 以使柔性膜与基板有较好的分离效果， 同时，本发明中的气体产生层 可以具有较好的耐热性，能够克服现有技术中，在加工显示器件的高 温环境下氢被提前扩散， 或者热熔型树脂提前熔化的问题。此外， 本 发明能够通过控制激光的扫描方式，灵活调整柔性膜的剥离方式，还 可以通过控制气体产生层的厚度， 调节柔性膜与基板的分离力度。 附图说明
附图是用来提供对本发明的进一步理解， 并且构成说明书的一 部分，与下面的具体实施方式一起用于解释本发明，但并不构成对本 发明的限制。 在附图中：
图 1 为本发明所提供的承载基板以及在所述承载基板上所承载 的柔性显示器件的结构示例图；
图 2为本发明所提供的柔性显示器件制作方法的流程图； 图 3为示出了本发明所提供的激光照射方向的示例侧视图； 图 4为示出了本发明所提供的激光扫描方式的示例仰视图。 附图标记说明
101-基板； 102-气体产生层； 103-柔性膜； 104-显示器件层； 201-激光。 具体实施方式
以下结合附图对本发明的具体实施方式进行详细说明。 应当理 解的是，此处所描述的具体实施方式仅用于说明和解释本发明，并不 用于限制本发明。 作为本发明的一个方面， 提供一种承载基板， 在制造柔性显示 器件的过程中，该承载基板能够用于在其上承载柔性显示器件。具体 地，可以如图 1所示，该制造柔性显示器件的承载基板可以包括基板 101和气体产生层 102， 并且承载在该承载基板上的柔性显示器件可 以包括柔性膜 103和显示器件层 104。其中， 气体产生层 102位于基 板 101上， 柔性膜 103位于气体产生层 102上， 且气体产生层 102 的材料能够分解并产生气体。
具体地， 如图 1所示， 为了在柔性膜 103上将显示器件层 104 加工完毕后能够将柔性膜 103与基板 101剥离，本发明所提供的制造 柔性显示器件的承载基板中， 在基板 101上制作了气体产生层 102， 以使该气体产生层 102位于基板 101与柔性膜 103之间，由于该气体 产生层 102的材料在一定条件下能够分解并且产生气体，从而能够通 过气体的膨胀作用使得柔性膜 103与基板 101分离。具体地，激发气 体产生层 102 使其分解并产生气体的激发条件可以根据实际需求而 定。
本发明通过气体的膨胀作用使得柔性膜 103与基板 101分离， 应用了与现有技术不同的分离原理，并且，通过气体的膨胀作用能够 得到更好的分离效果。同时，本发明中的气体产生层 102可以具有较 好的耐热性，在制造显示器件的高温工艺环境下气体产生层 102也不 会被提前分解，能够克服现有技术中，在加工显示器件的高温环境下 氢被提前扩散， 或者热熔型树脂提前熔化的问题。
更进一步地，可以使用激光照射气体产生层 102， 以使气体产生 层 102在吸收激光能量后分解并产生气体。在这种情况下，气体产生 层 102的材料的带隙能量可以在 2eV~7eV之间。这是因为当用于制作 气体产生层 102的材料的带隙能量较小时，能够便于吸收激光的能量 以分解并产生气体， 因此优选地，气体产生层 102的材料的带隙能量 可以在 2eV~7eV之间，且所使用的激光可以为紫外波段的激光，紫外 波段的激光能量较高， 足以使气体产生层 102分解并产生气体。
用于制作气体产生层 102 的材料可以使用在激光照射下能够产 生并释放气体的材料，优选地，用于制作气体产生层 102的材料可以 包括 GaN或 A1N， 或者可以包括 GaN与 A1N的混合物。 GaN的带隙能 量为 3. 3eV， A1N的带隙能量为 6. 3eV， 二者都能够在被激光照射后， 吸收激光能量而分解， 以产生气体 N2以及对应的金属， 从而能够通 过所产生的气体 N2的膨胀作用使得柔性膜 103与基板 101分离。 同 时， GaN和 A1N的都具有较好的耐热性， 例如， GaN的界面分解温度 为 900°C， 而制作显示器件层 104时的高温环境通常在 300°C ~400°C 之间， 因此，用 GaN或 A1N制成的气体产生层 102能够在制作显示器 件层 104的高温环境中保持稳定。此外，选用 GaN或者 A1N或者二者 的混合物制作气体产生层 102，可以使得气体产生层 102分解后的物 质 （Ga或 A1 ) 与基板 101之间的粘附力强于与柔性膜 103之间的粘 附力， 从而能够避免分解后的物质残留在柔性膜 103上。
需要说明的是， 在气体产生层 102 中还可以添加辅助材料以促 进气体产生层 102 吸收激光的能量， 例如， 可以在气体产生层 102 中添加光热转换材料。
更进一步地， 基板 101的材料的带隙能量大于 7eV。 具体地， 基 板 101的材料的带隙能量可以较大，以使其不易于吸收激光光子的能 量。通常， 紫外波段的激光的光子能量在 3eV~7eV之间， 因此， 优选 地， 基板 101的材料的带隙能量可以大于 7eV， 从而使得紫外波段的 激光的能量能够透过基板 101而传递至气体产生层 102。
优选地， 基板 101 的材料可以为玻璃或者透明的陶瓷， 玻璃或 者透明的陶瓷具有较大的带隙能量，不易于吸收激光光子的能量， 同 时，作为透明的材料，可以使得激光能够透过基板 101照射到气体产 生层 102。
更进一步地， 本发明所提供的制造柔性显示器件的承载基板中， 气体产生层的厚度为 10nm~100 m。 具体地， 气体产生层 102的厚度 可以根据分离柔性膜 103与基板 101所需要的力度来定，当分离柔性 膜 103与基板 101所需要的力度较大时，可以提供厚度较厚的气体产 生层 102， 从而使得气体产生层 102分解后产生的气体较多， 以提供 较大的分离力度；相应地， 当分离柔性膜 103与基板 101所需要的分 离力度较小时， 可以提供厚度较薄的气体产生层 102， 从而使得气体 产生层 102分解后产生的气体较少， 以提供较小的分离力度。需要说 明的是， 为了避免产生的气体过多而出现爆炸现象， 气体产生层 102 的厚度不宜过厚，可以将气体产生层 102的厚度设定在 10nm~100 m 之间， 优选地， 可以使气体产生层 102 的厚度设定在 200nm~500nm 之间。
作为本发明的一个方面， 提供一种柔性显示器件的制作方法， 该方法能够利用上述本发明所提供的承载基板来制作柔性显示器件， 具体地， 如图 2所示， 该柔性显示器件的制作方法可以包括：
步骤 Sl、 在基板上形成气体产生层， 所述气体产生层的材料能 够分解并产生气体；
步骤 S2、 在所述气体产生层上形成柔性膜；
步骤 S3、 在所述柔性膜上形成显示器件层；
步骤 S4、 使所述气体产生层的材料分解并产生气体， 以将所述 柔性膜与所述基板分离。
优选地， 可以使用激光照射气体产生层 102， 使得气体产生层 102在吸收激光能量后分解并产生气体。激光的光子能量较高， 足以 使得气体产生层 102吸收能量后分解以产生气体， 同时，激光方向性 强， 便于控制对气体产生层 102的照射定位。具体地， 可以使用紫外 波段的激光。
更进一步地，如图 3的侧视图所示，用激光照射气体产生层 102 时，激光可以沿预定轨迹（即图 3中箭头示出了激光从下往上的照射 方向和照射位置） 穿过基板 101， 然后照射到气体产生层 102。
优选地， 可以如图 4的仰视图所示， 如前所述在基板 101垂直 纸面向内的方向布置有气体产生层 102 (图中未示出） ， 用激光沿着 从气体产生层 102的一边（例如， 图 4中的左边）至与该一边相对的 另一边（例如， 图 4中的右边）的方向扫描照射（即图 4中的箭头示 出了激光 201进行照射时的扫描方向），从而穿过基板 101照射到气 体产生层 102。
或者， 也可以使激光沿着从气体产生层 102 的边缘至气体产生 层 102的中心的方向扫描照射，从而穿过基板 101照射到气体产生层 102。
通过上述方式， 能够根据实际需要灵活地控制柔性膜 103与基 板 101 的分离方式， 通过控制激光扫描照射的方式实现柔性膜 103 从一边到另一边与基板 101分离，或者从柔性膜的 103的边缘至中心 与基板 101分离， 实现柔性基板与承载基板的多种方式的分离。
上述为对本发明所提供的制造柔性显示器件的承载基板以及相 应的柔性显示器件制作方法进行的描述，可以看出，本发明通过在基 板与柔性膜之间设置气体产生层，能够在需要剥离柔性膜时，使气体 产生层分解并产生气体，从而通过气体的膨胀作用迫使柔性膜与基板 分离。与现有技术相比，本发明中的气体产生层可以具有较好的耐热 性，能够克服现有技术中，在加工显示器件的高温环境下氢被提前扩 散， 或者热熔型树脂提前熔化的问题。 同时， 本发明能够通过控制激 光的扫描方式，灵活调整柔性膜的剥离方式，还可以通过控制气体产 生层的厚度， 调节柔性膜与基板的分离力度。
可以理解的是， 以上实施方式仅仅是为了说明本发明的原理而 采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的 普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做 出各种变型和改进， 这些变型和改进也视为本发明的保护范围。

Claims

权利要求
1. 一种承载基板， 用于在制造柔性显示器件的过程中承载所述 柔性显示器件的柔性膜， 所述承载基板的特征在于包括： 基板； 和位 于所述基板上的气体产生层，在所述制造柔性显示器件的过程中使所 述柔性膜位于所述气体产生层上，并且所述气体产生层的材料能够分 解并产生气体。
2. 根据权利要求 1所述的承载基板， 其特征在于， 通过用激光 照射所述气体产生层来使所述气体产生层在吸收激光能量后分解并 产生气体。
3. 根据权利要求 2所述的承载基板， 其特征在于， 所述气体产 生层的材料的带隙能量为 2eV~7eV。
4. 根据权利要求 3所述的承载基板， 其特征在于， 所述气体产 生层的材料包括 GaN或 A1N,或者所述气体产生层的材料包括 GaN与 A1N的混合物。
5. 根据权利要求 4所述的承载基板， 其特征在于， 所述气体产 生层还包括光热转换材料。
6. 根据权利要求 3所述的承载基板， 其特征在于， 所述基板的 材料的带隙能量大于 7eV。
7. 根据权利要求 6所述的承载基板， 其特征在于， 所述基板的 材料为玻璃或者透明的陶瓷。
8. 根据权利要求 1至 7中任意一项所述的承载基板， 其特征在 于， 所述气体产生层的厚度为 10nm~100 m。
9. 根据权利要求 8所述的承载基板， 其特征在于， 所述气体产 生层的厚度为 200nm~500nm。
10. 一种柔性显示器件的制作方法， 其特征在于包括步骤： 在基板上形成气体产生层， 所述气体产生层的材料能够分解并 产生气体；
在所述气体产生层上形成柔性膜；
在所述柔性膜上形成显示器件层；
使所述气体产生层的材料分解并产生气体， 以将所述柔性膜与 所述基板分离。
11 . 根据权利要求 10所述的柔性显示器件的制作方法， 其特征 在于，所述使所述气体产生层的材料分解并产生气体的步骤包括：用 激光照射所述气体产生层，使所述气体产生层在吸收激光能量后分解 并产生气体。
12. 根据权利要求 11所述的柔性显示器件的制作方法， 其特征 在于，使所述激光沿预定轨迹照射， 以穿过所述基板照射到所述气体 产生层。
13. 根据权利要求 12所述的柔性显示器件的制作方法， 其特征 在于，使所述激光沿着从所述气体产生层的一边至与该一边相对的另 一边的方向扫描照射， 以穿过所述基板照射到所述气体产生层。
14. 根据权利要求 12所述的柔性显示器件的制作方法， 其特征 在于，使所述激光沿着从所述气体产生层的边缘至所述气体产生层的 中心的方向扫描照射， 以穿过所述基板照射到所述气体产生层。
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CN102636898A (zh) * 2012-03-14 2012-08-15 京东方科技集团股份有限公司 一种柔性显示装置的制备方法

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