WO2015052877A1 - ネイル成形装置およびネイル成形方法 - Google Patents
ネイル成形装置およびネイル成形方法 Download PDFInfo
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- WO2015052877A1 WO2015052877A1 PCT/JP2014/004811 JP2014004811W WO2015052877A1 WO 2015052877 A1 WO2015052877 A1 WO 2015052877A1 JP 2014004811 W JP2014004811 W JP 2014004811W WO 2015052877 A1 WO2015052877 A1 WO 2015052877A1
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- nail
- light source
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D31/00—Artificial nails
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
- A45D2029/005—Printing or stamping devices for applying images or ornaments to nails
Definitions
- the present invention relates to a nail molding apparatus and a nail molding method for drawing a nail or an artificial nail.
- Nail art that draws on the surface of the nail is commonly used by the user to draw a desired design from the practitioner at the nail salon.
- a gel nail using a photocurable resin as a material is widespread. And with the spread of gel nails, consumers of nail art are increasing.
- Patent Documents 1 and 2 disclose a method in which a resin-made finger (nail) is inserted into an opening of a resin-curing lamp and the entire finger inserted into the opening is irradiated with the resin-curing lamp.
- Patent Document 3 discloses a configuration of a pen-type resin curing lamp having a small light irradiation area in consideration of the influence of UV light for resin curing on the human body.
- Patent Document 4 discloses a structure having a two-wavelength light source according to the type of the photocurable resin.
- One embodiment of the present invention is a nail molding device that forms a drawing pattern using a photocurable resin on a surface of a nail or an artificial nail as a nail molding device, using a light source and a light beam emitted from the light source.
- An optical drawing unit that partially cures the photocurable resin, and a control unit that controls the light source and the optical drawing unit.
- one embodiment of the present invention is a nail molding method in which a drawing pattern is formed on a surface of a nail or an artificial nail using a photocurable resin. And a resin application step of applying a photocurable resin to the surface of the nail or artificial nail, a curing step of partially curing the photocurable resin, a removal step of removing an uncured portion of the photocurable resin, Is provided.
- the nail molding apparatus includes a light source, a light drawing unit that partially cures the photocurable resin using light emitted from the light source, and a control unit that controls the light source and the light drawing unit. Is used to partially cure the photocurable resin.
- a drawing pattern can be easily formed on the surface of the nail or the artificial nail.
- FIG. 1 is a schematic diagram showing a nail forming apparatus according to an embodiment of the present invention.
- FIG. 2 is a perspective view of a reflecting mirror constituting the nail forming apparatus according to the embodiment of the present invention.
- FIG. 3 is a diagram showing a drawing pattern.
- FIG. 4 is a schematic view showing a light irradiation state of the nail molding apparatus according to the embodiment of the present invention.
- FIG. 5 is a schematic diagram showing a nail molding method using the nail molding apparatus in the embodiment of the present invention.
- the drawing skill of the user himself has a great influence on the drawing of the nail art by the user himself. Even if the drawing skill is high, it is difficult to make the drawing accuracy the same between the drawing on the nail of the dominant hand and the drawing on the nail of the hand opposite to the dominant hand.
- FIG. 1 is a schematic diagram showing a nail forming apparatus 2 for drawing nail art on a nail 1 (forming a drawing pattern).
- the nail molding apparatus 2 is a nail molding apparatus 2 that forms a drawing pattern using a photocurable resin 3 on the surface of a nail 1 (or an artificial nail), and uses a light source 4 and a light beam emitted from the light source 4.
- a light drawing unit 5 that partially cures the photocurable resin 3, and a control unit 6 that controls the light source 4 and the light drawing unit 5.
- an ultraviolet curable photocurable resin 3 is used.
- the light source 4 emits a light beam having a wavelength for curing the photocurable resin 3.
- Most of the gel nails (photocurable resin 3) currently on the market require a wavelength in the range of approximately 365 nm to 410 nm in order to be cured. Therefore, in the present embodiment, a semiconductor laser having a wavelength peak near 405 nm is used as the light source 4. Further, as the optical drawing unit 5, a scanning reflection mirror 7 whose reflection angle is controlled by the control unit 6 is used.
- the scanning type reflection mirror 7 a known mirror such as a polygon mirror or a galvanometer mirror is used.
- the reflection mirror 7 includes an actuator 8 and a mirror unit 12.
- the actuator 8 is a biaxial drive and is a MEMS (Micro Electro Mechanical Systems) device using a Si substrate and a piezoelectric film.
- MEMS Micro Electro Mechanical Systems
- the actuator 8 includes a rectangular support frame 9, a rectangular movable frame 10 disposed inside the support frame 9, a rectangular movable portion 11 disposed inside the movable frame 10, and a first vibration. Part 14 and second vibrating part 16.
- the movable frame 10 is connected to the support frame 9 via the first vibrating portion 14.
- the pair of first vibrating portions 14 performs a twisting operation with the first rotation shaft 13 as a rotation center.
- the movable part 11 is connected to the movable frame 10 via the second vibrating part 16.
- the second vibrating portion 16 performs a twisting operation with the second rotation shaft 15 orthogonal to the first rotation shaft 13 as the rotation center.
- the first vibration unit 14 is provided with a first drive unit 17.
- the first drive unit 17 is connected to the control unit 6.
- the torsional operation of the first drive unit 17 is controlled by a control signal from the control unit 6.
- the first drive unit 17 has a laminated structure in which a piezoelectric layer made of PZT or the like is interposed between upper and lower electrodes made of Ti, Au, or the like. Then, by applying a potential difference between the upper and lower electrodes of the first drive unit 17, a twisting operation around the first rotation shaft 13 is excited in the first vibration unit 14.
- the second driving unit 18 is provided in the second vibrating unit 16.
- the second drive unit 18 is connected to the control unit 6.
- the second drive unit 18 excites a twisting operation around the second rotation shaft 15 to the second vibrating unit 16.
- the mirror part 12 is arranged on the surface of the movable part 11 of the actuator 8 configured as described above, and the reflection mirror 7 can scan the light beam emitted from the light source 4 in the biaxial direction.
- the control unit 6 controls the light source 4 and the light drawing unit 5.
- the control unit 6 controls the irradiation amount and irradiation time of the light beam emitted from the light source 4 and the reflection angle of the mirror unit 12 provided in the actuator 8. Then, a light beam is scanned on the surface of the photocurable resin 3 applied to the surface of the nail 1, and the photocurable resin 3 is partially cured. In this way, a drawing pattern is formed.
- the drawing pattern In forming the drawing pattern, as shown in FIG. 3, when the drawing pattern is dense and dense, the region where the drawing pattern is dense is more likely to be crushed than the rough region. This pattern collapse is considered to be caused by bleeding due to diffusion of irradiated light inside the photocurable resin 3. Therefore, if the same control is performed when a dense drawing pattern is formed and when a rough drawing pattern is formed, the following problem occurs. If a rough drawing pattern is formed by setting drawing conditions suitable for a dense drawing pattern, the rough drawing pattern cannot be formed well due to insufficient exposure.
- the control unit 6 can control the light source 4 and the light drawing unit 5 to partially cure the photocurable resin 3.
- the nail forming apparatus 2 can set control conditions for each unit section obtained by subdividing a drawing area.
- the control conditions can be made different between the drawing region where the dense drawing pattern is formed and the drawing region where the rough drawing pattern is formed. That is, the control unit 6 can form an optimum drawing pattern by controlling the light source 4 and the light drawing unit 5 according to the density of the drawing pattern. Formation of an optimum drawing pattern according to the density of the drawing pattern can be realized as follows.
- the irradiation time of the light beam emitted from the light source 4 to the drawing area where the drawing pattern is formed is controlled by the control unit 6.
- the irradiation time is determined for each unit section of the subdivided drawing area.
- control unit 6 controls the magnitude of the light beam emitted from the light source 4 to the drawing area where the drawing pattern is formed.
- the magnitude of the light output is determined for each unit section of the drawing area.
- Optimized control for each subdivided unit section can be realized by a combination of control conditions for light irradiation time and light output size.
- the nail forming apparatus 2 is preferably provided with a communication unit 19 for obtaining a drawing pattern from the outside.
- a wired communication unit such as a USB or a wireless communication unit such as a wireless LAN or Bluetooth (registered trademark) can be used.
- a wireless LAN is used as the communication unit 19.
- the drawing pattern is transferred to the control unit 6 using a wireless LAN that is the communication unit 19, for example, a drawing pattern selected in advance using a smartphone or a personal computer.
- a drawing pattern selected in advance using a smartphone or a personal computer.
- the nail forming apparatus 2 preferably has a positioning portion 20 that determines the position of the nail 1 to be drawn.
- a guide for restricting the insertion amount of a finger and fixing the position of the nail 1 by contacting the tip of the nail 1 is described. What is necessary is just to achieve the objective which fixes the position of the nail
- the positioning unit 20 By providing the positioning unit 20, the position of the nail 1 can be fixed, so that fine drawing can be performed.
- the surface of the nail 1 has a convex curved shape as shown in FIG. Therefore, the irradiation distance from the reflection mirror 7 is different between the end 1a and the center 1b of the claw 1.
- the light source 4 is a semiconductor laser having a high linearity of irradiation light, and the nail 1 is irradiated with the high linearity light beam via the reflection mirror 7.
- a variation in the beam spot diameter caused by a difference in distance from the light source 4 is small, and a deterioration in drawing accuracy on the curved surface is suppressed. For this reason, more precise drawing is possible.
- the incident angle ⁇ 1 of the light beam with respect to the tangent plane 1c of the end 1a of the curved nail 1 is smaller than the incident angle ⁇ 2 of the tangential plane 1d of the central portion 1b of the nail, the irradiation area of the light beam is more in the end 1a. It becomes larger than the central portion 1b. Therefore, the light receiving amount per unit area with respect to the light beam is smaller in the end portion 1a than in the central portion 1b. Therefore, it is preferable that the light beam output to the end portion 1 a of the claw 1 is stronger than the light beam output to the central portion 1 b of the claw 1.
- adjustment can also be made by making the irradiation time of the light beam to the end 1a of the claw 1 longer than the irradiation time of the light beam to the central portion 1b of the claw 1.
- the adjustment of the irradiation time can be controlled by adjusting the displacement speed of the reflection angle of the reflection mirror 7.
- precise control of the reflection angle is difficult. Therefore, as a method for controlling the irradiation time without controlling the reflection angle, there is light emission control of the light source.
- the light control the number of times the light source is turned on within a time during which the light beam scans per unit area is controlled. If a semiconductor laser is used, the number of lighting operations can be controlled by controlling a clock signal for controlling the emission of the semiconductor laser. By using a semiconductor laser as the light source, the irradiation time can be easily adjusted.
- the case where a semiconductor laser having high light rectilinearity is used as the light source 4 has been described.
- an ultraviolet lamp or a semiconductor light emitting element having a high emission light divergence may be used as the light source 4.
- the light straightness of the emitted light can be obtained by interposing a collimator lens (not shown) between the light source 4 and the reflection mirror 7. If the straightness of the emitted light can be obtained, the same effect as that obtained when a semiconductor laser is used can be obtained.
- a projection device such as a digital mirror device or a liquid crystal device may be used as the scanning means.
- the storage unit 21 is provided in the control unit 6 and a typical drawing pattern is stored in the storage unit 21 in advance, drawing can be performed based on the held drawing pattern. If the storage unit 21 is provided in the control unit 6, a drawing pattern can be selected without using the communication unit 19, and the transfer time of the drawing pattern can be shortened.
- the nail forming apparatus 2 further includes a nail detection unit 22 that detects the three-dimensional shape of the nail 1, and a first nail detected by the nail detection unit 22.
- the control unit 6 controls at least one of the light source 4 and the reflection mirror 7 according to the information.
- Feedback control is possible by inputting information (first information) detected by the nail detection unit 22 to the control unit 6 at any time. Therefore, correction control of the reflection angle of the reflection mirror 7 and the irradiation timing of the light source 4 can be performed in the nail forming apparatus 2.
- the nail detection unit 22 various methods such as an image using a camera or an optical method such as light reflection can be used. By performing feedback control using the nail detection unit 22, accurate drawing can be performed even when the drawing target nail 1 moves.
- the nail forming apparatus 2 further includes a light source output measuring unit 23 that measures the output magnitude of the light beam emitted from the light source 4, and the control unit 6 according to the second information measured by the light source output measuring unit 23. Controls at least one of the light source 4 and the reflecting mirror 7.
- the nail molding apparatus 2 can perform drawing with higher accuracy.
- the light source output measurement part 23 it can be comprised with the beam splitter 23a and the light receiving element 23b provided in the optical path.
- the user applies a photocurable resin 3 as a nail material to the surface of his nails 1 to which nail art is applied (resin application step S1).
- resin application step S1 it is not necessary to form a drawing pattern with the photocurable resin 3, and it is only necessary to apply to the entire nail.
- a drawing pattern is selected, and the light irradiation position and irradiation time are controlled by the control unit 6 according to feedback information such as the drawing pattern, the three-dimensional shape of the nail 1 and the output size, and the photocuring of the drawing region 3a is performed.
- the curing resin is partially cured (curing step S2).
- the nail forming apparatus 2 described with reference to FIG. 1 is used, and the control unit 6 controls at least one of the light source 4 and the reflection mirror 7 according to the density of the drawing pattern. Since the control of the irradiation time of the nail forming apparatus 2 and the magnitude of the light output is the same as described above, the description thereof is omitted here.
- the curing wavelength differs depending on the type of the photocurable resin 3, it is preferable to have a plurality of light sources 4 having different wavelengths as the light source 4.
- the control unit 6 it is preferable that the control conditions differ according to the different wave shapes.
- the nail forming apparatus 2 is installed in the nail salon, and the practitioner performs the present operation.
- the form of the nail forming apparatus 2 may be used.
- variations in drawing accuracy due to skills dependent on the practitioner can be prevented, and the treatment time can be shortened.
- the nail molding apparatus of the present invention can easily form a drawing pattern on a nail or an artificial nail. This is particularly effective when the user forms a drawing pattern on the user's own nails.
Abstract
Description
以下、本発明の実施の形態について図1~図5を参照しながら説明する。
図1は、爪1にネイルアートを描画する(描画パターンを形成する)ネイル成形装置2を示す模式図である。ネイル成形装置2は、爪1(または付け爪)の表面に光硬化性樹脂3を用いた描画パターンを形成するネイル成形装置2であって、光源4と、光源4から射出される光線を用いて光硬化性樹脂3を部分的に硬化させる光描画部5と、光源4および光描画部5を制御する制御部6とを備える。
次に、反射ミラー7の構成の詳細について図2を参照しながら説明する。
次にネイル成形装置2の動作について図1を参照しながら説明する。
ネイル成形装置2は、描画する爪1の位置を決める位置決め部20を有することが好ましい。本実施の形態では、爪1の先が接触することで指の挿入量を規制し爪1の位置を固定するガイドを記載している。爪1の位置を固定する目的を達成できればよく、上記方法に限られるものではない。位置決め部20を設けることにより、爪1の位置を固定することができるので、精細な描画を施すことが可能となる。
以上で説明したネイル成形装置2を用いたネイル成形方法を、図5を参照しながら説明する。
2 ネイル成形装置
3 光硬化性樹脂
3a 描画領域
3b 未硬化領域
4 光源
5 光描画部
6 制御部
7 反射ミラー
8 アクチュエータ
9 支持枠
10 可動枠
11 可動部
12 ミラー部
13 第1の回動軸
14 第1の振動部
15 第2の回動軸
16 第2の振動部
19 通信部
20 位置決め部
21 記憶部
22 爪検出部
23 光源出力測定部
23a ビームスプリッタ
23b 受光素子
Claims (12)
- 爪または付け爪の表面に光硬化性樹脂を用いて描画パターンを形成するネイル成形装置であって、
光源と、
前記光源から射出された光線を用いて前記光硬化性樹脂を部分的に硬化させる光描画部と、
前記光源および前記光描画部を制御する制御部と、
を備えたことを特徴とするネイル成形装置。 - 前記制御部は、前記描画パターンの粗密に応じて、前記光源および前記光描画部を制御する
ことを特徴とする請求項1に記載のネイル成形装置。 - 前記光源から前記描画パターンが形成される描画領域に射出される前記光線の照射時間は、前記制御部によって制御され、
前記照射時間は、前記描画領域の単位区画ごと決定される
ことを特徴とする請求項2に記載のネイル成形装置。 - 前記光源から前記描画パターンが形成される描画領域に射出される前記光線の出力の大きさは、前記制御部によって制御され、
前記光線の出力の大きさは、前記描画領域の単位区画ごと決定される
ことを特徴とした請求項2に記載のネイル成形装置。 - 前記爪または付け爪の立体形状を検出する爪検出部を更に備え、
前記爪検出部で検出した第1の情報に応じて前記制御部は前記光源または前記反射ミラーの少なくともいずれか一方を制御する
ことを特徴とする請求項2に記載のネイル成形装置。 - 前記光源の出力の大きさを測定する光源出力測定部を更に備え、
前記光源出力測定部で測定した第2の情報に応じて前記制御部は前記光源または前記反射ミラーの少なくともいずれか一方を制御する
ことを特徴とする請求項5に記載のネイル成形装置。 - 前記光源は波長が異なる複数の光源を有する
ことを特徴とする請求項1に記載のネイル成形装置。 - 前記光源が半導体レーザで構成されており、
前記光描画部が反射ミラーで構成されている
ことを特徴とする請求項1に記載のネイル成形装置。 - 爪または付け爪の表面に光硬化性樹脂を用いて描画パターンを形成するネイル成形方法であって、
前記爪または前記付け爪の表面に前記光硬化性樹脂を塗布する樹脂塗布ステップと、
前記光硬化性樹脂を部分的に硬化させる硬化ステップと、
前記光硬化性樹脂の未硬化部分を除去する除去ステップと、
を備え、
前記硬化ステップにおいて、
光源と、
前記光源から射出された光線を用いて前記光硬化性樹脂を部分的に硬化させる光描画部と、
前記光源および前記光描画部を制御する制御部と、
を有するネイル成形装置を用いて、前記光硬化性樹脂を部分的に硬化させる
ことを特徴とするネイル成形方法。 - 前記制御部は、前記描画パターンの粗密に応じて、前記光源および前記光描画部を制御する
ことを特徴とする請求項9に記載のネイル成形方法。 - 前記光源から前記描画パターンが形成される描画領域に射出される前記光線の照射時間は、前記制御部によって制御され、
前記照射時間は、前記描画領域の単位区画ごと決定される
ことを特徴とする請求項10に記載のネイル成形方法。 - 前記光源から前記描画パターンが形成される描画領域に射出される前記光線の出力の大きさは、前記制御部によって制御され、
前記光線の出力の大きさは、前記描画領域の単位区画ごと決定される
ことを特徴とする請求項10に記載のネイル成形方法。
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US15/022,203 US20160227900A1 (en) | 2013-10-09 | 2014-09-18 | Nail molding device and nail molding method |
CN201480055632.6A CN105611853A (zh) | 2013-10-09 | 2014-09-18 | 指甲成形装置以及指甲成形方法 |
JP2015541426A JPWO2015052877A1 (ja) | 2013-10-09 | 2014-09-18 | ネイル成形装置およびネイル成形方法 |
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JP6428415B2 (ja) * | 2015-03-20 | 2018-11-28 | カシオ計算機株式会社 | 描画装置及び爪形状検出方法 |
US10702044B2 (en) * | 2016-06-30 | 2020-07-07 | L'oreal | Reversible thermochromic/photochromic cosmetic activator |
US10684547B2 (en) * | 2017-01-10 | 2020-06-16 | L'oréal | Devices and methods for non-planar photolithography of nail polish |
CN107028324A (zh) * | 2017-04-14 | 2017-08-11 | 徐校竹 | 一种指甲修型及健康检测仪 |
EP3773063A1 (en) * | 2018-04-13 | 2021-02-17 | Coral Labs, Inc. | System and method for accurate application and curing of nail polish |
IL292623B2 (en) | 2019-10-29 | 2023-11-01 | Nailpro Inc | Systems, devices and methods for automatic nail care |
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2014
- 2014-09-18 CN CN201480055632.6A patent/CN105611853A/zh active Pending
- 2014-09-18 WO PCT/JP2014/004811 patent/WO2015052877A1/ja active Application Filing
- 2014-09-18 US US15/022,203 patent/US20160227900A1/en not_active Abandoned
- 2014-09-18 JP JP2015541426A patent/JPWO2015052877A1/ja active Pending
Patent Citations (2)
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JP2012179320A (ja) * | 2011-03-03 | 2012-09-20 | Casio Computer Co Ltd | ネイルプリント装置および印刷制御方法 |
JP2014008359A (ja) * | 2012-07-03 | 2014-01-20 | Panasonic Corp | 樹脂硬化装置 |
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CN105611853A (zh) | 2016-05-25 |
JPWO2015052877A1 (ja) | 2017-03-09 |
US20160227900A1 (en) | 2016-08-11 |
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