WO2015051649A1 - 显示面板、显示装置以及显示面板的制造方法 - Google Patents

显示面板、显示装置以及显示面板的制造方法 Download PDF

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Publication number
WO2015051649A1
WO2015051649A1 PCT/CN2014/080390 CN2014080390W WO2015051649A1 WO 2015051649 A1 WO2015051649 A1 WO 2015051649A1 CN 2014080390 W CN2014080390 W CN 2014080390W WO 2015051649 A1 WO2015051649 A1 WO 2015051649A1
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WO
WIPO (PCT)
Prior art keywords
display panel
substrate
barrier layer
conductive film
jumper
Prior art date
Application number
PCT/CN2014/080390
Other languages
English (en)
French (fr)
Inventor
陈东
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/409,394 priority Critical patent/US20160274404A1/en
Publication of WO2015051649A1 publication Critical patent/WO2015051649A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13454—Drivers integrated on the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13452—Conductors connecting driver circuitry and terminals of panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • Display panel display device, and manufacturing method of display panel
  • the present invention relates to the field of liquid crystal display, and in particular to a display panel, a display device, and a method of manufacturing the display panel. Background technique
  • the circuit board (IC) cannot be placed on the left and right sides of the color filter substrate of the display panel. Therefore, the display panel of the mobile phone and the tablet computer generally uses GOA. technology.
  • the GOA technology is: the Gate Driver on Array, which directly forms the gate driver circuit (Gate driver ICs) on the array (Array) substrate.
  • the area where the gate drive circuit is provided is called GOA. region.
  • the application of this technology can reduce the display panel production process and reduce product cost.
  • a gate insulating mask that is, a GI mask (Gate Insulator mask), or a jumper made of ITO (Indium Tin Oxide) may be used.
  • the present invention is directed to the latter case. .
  • a sealant containing metal particles to turn on the common electrode of the array substrate and the common conductive film on the color film of the color filter substrate (Com ITO but if sealed
  • the glue is unintentionally applied to the corresponding position of the GOA area on the left and right sides of the color filter substrate, the jumper of the ⁇ material of the GOA area and the common conductive film on the color film may be turned on, which may result in the GOA area being unable to be normal work.
  • the existing ⁇ -type or VA-type display panel uses the GOA technology, if the ITO mask is not used, but when the ITO material is used, the sealant is applied. Keep the sealant away from the jumper area of the GOA area, which will increase the width of the border of the display panel by about 0.5 mm, which cannot meet the requirements of the mobile product for the narrow border of the display panel.
  • An object of the present invention is to provide a display panel using a GOA technology, a display device, and a method of manufacturing the display panel.
  • a display panel includes a first substrate and a second substrate disposed opposite to the first substrate, wherein the first substrate is provided with a common conductive film, and the second substrate is disposed on the second substrate There is a jumper for supplying power to the gate driving circuit, wherein a whole or a portion of the common conductive film corresponding to the region where the jumper is located is provided with a barrier layer for insulating the common conductive film from the jumper .
  • the first substrate is a color filter substrate
  • the::::: substrate is an array substrate
  • the barrier layer is disposed on the first The outer side of the common conductive film on the substrate.
  • the common conductive film has a glue-coated region for applying a sealant containing conductive particles, and the glue-coated region and the common conductive film
  • An area corresponding to the area where the jumper is located has an overlapping portion, and the barrier layer covers at least the overlapping portion.
  • the barrier layer covers only the overlapping portion.
  • the material of the barrier layer is optionally a negative photoresist or a positive photoresist.
  • the barrier layer has a thickness of less than 2 ⁇ m.
  • the barrier layer has a thickness of 1 ⁇ m.
  • a supporting spacer is disposed between the first substrate and the second substrate, so that the barrier layer and the spacer are made of the same material. Set on the same layer.
  • the spacer is a column spacer.
  • a display device comprising the display panel as described above.
  • a method of manufacturing a display panel comprising the steps of: providing a common conductive film on a first substrate, and providing a jump for powering the gate driving circuit on the second substrate A barrier layer for insulating the common conductive film from the jumper is formed in all or a portion of the common conductive film corresponding to the region where the jumper is located.
  • the first substrate is a color filter substrate
  • the second substrate is an array substrate
  • the barrier layer is disposed on the first substrate. The outer side of the common conductive film.
  • the common conductive film has a glue-coated region for applying a sealant containing conductive particles, the glue-coated region and the common
  • An area of the conductive film corresponding to a region where the jumper is located has an overlapping portion, and the barrier layer covers at least the overlapping portion.
  • the barrier layer has a thickness of less than 2 ⁇ m.
  • the first substrate and the second substrate which are provided in the same layer and have the same material, while forming the barrier layer a spacer that acts as a support.
  • a negative photoresist layer is coated on the common conductive film; and the negative photoresist layer is used to form a barrier layer And exposing the area for forming the column spacer; removing the unexposed portion of the negative photoresist layer, forming a barrier layer and a column spacer.
  • a method of manufacturing a display panel according to the above-described embodiment of the present invention wherein, optionally, the negative for forming a barrier layer when exposing a region of the negative photoresist layer for forming a barrier layer
  • the area of the photoresist layer has a light transmission rate of less than 5%.
  • the common conductive film has a glue application area for applying the sealant, a corresponding area of the glue application area, and The corresponding region of the region where the jumper is located has an overlapping portion, and the region of the negative photoresist layer corresponding to the overlapping portion and the region for forming the column spacer is exposed.
  • the method includes the steps of: providing a common conductive film on the color filter substrate, and providing a jump for supplying power to the gate driving circuit on the array substrate Applying a positive photoresist layer on the common conductive film; after covering the region of the positive photoresist layer corresponding to the region where the jumper is located and the region for forming the column spacer Exposing the positive photoresist layer; removing the exposed portion of the positive photoresist layer, forming a barrier layer for insulating the common conductive film from the jumper, and supporting the color filter substrate, Column spacers of the array substrate.
  • the display panel and the display device of the present invention provide a barrier layer between the common conductive film and the region where the jumper is located, so that the sealant does not have to be away from the region where the GOA jumper is located, thereby reducing the frame width of the display panel of the present invention by 0.5 mm. Left and right, meet the narrow border requirements of the display panel.
  • a four-mask (4 mask) can be realized to manufacture a narrow-frame TN-type display panel.
  • the width of the frame of the display panel can be reduced by about 0.5 mm, which better satisfies the requirements for the narrow frame of the display panel.
  • FIG. 1 is a front view showing the structure of a display panel according to an embodiment of the present invention.
  • FIG. 2 is a partially enlarged longitudinal sectional structural view of a display panel according to an embodiment of the present invention
  • FIG. 3 (a), FIG. 3 (b), and FIG. 3 (c) illustrate a method of manufacturing a display panel according to an embodiment of the present invention; a schematic diagram of part of the steps;
  • 4(a) and 4(b) are partial schematic views showing a method of manufacturing a display panel according to another embodiment of the present invention. detailed description
  • the display panel of one embodiment of the present invention passes through a region where the common conductive film and the jumper are located
  • the barrier layer is disposed so that the sealant does not have to be disposed away from the jumper region of the GOA region, thereby reducing the frame width of the display panel of the present invention by about 0.5 mm, which is special for meeting the narrow frame requirements of the mobile product for the display panel. advantageous.
  • FIG. 1 is a schematic front view of a display panel, wherein a dotted area in the middle is a working area 20 including an active area, and two sides are jumpers including a GOA area. Area 10.
  • the sealant needs to avoid the jumper area 10 .
  • FIG. 2 is a partially enlarged longitudinal sectional structural view of the display panel, which is a portion including the jumper region 10.
  • the display panel includes a first substrate 1, a second substrate 2 disposed opposite the first substrate 1, and a sealant 3 disposed between the first substrate 1 and the second substrate 2.
  • the conductive particles 31 are contained in the sealant.
  • the first substrate 1 is provided with a common conductive film 4, and the second substrate 2 is provided with a jumper 5 for supplying power to the gate driving circuit.
  • the jumper 5 is optionally made of ITO.
  • the jumper area 10 (referred to as jumper area 10) in the area called GOA area.
  • An insulating barrier layer 6 is provided at a position where the common conductive film 4 is opposite to the region where the jumper 5 is located (i.e., the jumper region 10).
  • an insulating barrier layer 6 is optionally provided on the surface of the common conductive film 4 at a position opposite to the region where the jumper 5 is located (i.e., the jumper region 10).
  • the first substrate 1 may be a color filter substrate
  • the second substrate 2 may be an array substrate
  • the barrier layer 6 is disposed on the outer surface of the common conductive film 4 on the first substrate 1.
  • the outermost side of the common conductive film 4 of the first substrate 1 has a glue application region 41 which is previously designed to apply a sealant, and the glue application region 41 and the area of the common conductive film 4 and the jumper 5 are
  • the corresponding area has overlapping portions, and the barrier layer 6 is preferably disposed outside the overlapping portion. That is, the barrier layer 6 preferably covers at least the overlapping portion. 2 shows that the glue application area 41 completely covers the area corresponding to the area where the jumper 5 is located, and the overlap portion is the area where the common conductive film 4 corresponds to the area where the jumper 5 is located.
  • the glued area 41 may only partially overlap with the area corresponding to the area where the jumper 5 is located, and the same effect can be achieved by simply providing a barrier layer on the overlapped portion.
  • the insulating barrier layer 6 is provided on the common conductive film 4 in the region corresponding to the region where the jumper 5 is located, even if the conductive particles in the sealant 3 are as shown in FIG. 31 is located between the jumper 5 and the common conductive film 41, and also due to the presence of the barrier layer 6, The electrical connection between the jumper 5 and the common conductive film 41 is not caused, so that the normal operation of the GOA area can be ensured.
  • the sealant when the sealant is applied, there is no need to move away from the GOA area as in the prior art, so that the width of the frame of the display panel can be reduced by about 0.5 mm, which can better meet the narrow bezel requirements of the mobile product for the display panel.
  • the display panel of the embodiment of the present invention wherein the first substrate 1 as a color filter substrate may be provided with a usual black matrix 7, red (Red, R), green (Green, G), blue (Blue, B) color. Adhesive layer, etc. That is, the color filter substrate may be a conventional color film substrate, which will not be described in detail herein.
  • a display panel according to an embodiment of the present invention wherein the barrier layer 6 has a thickness of less than about 2 ⁇ m.
  • the thickness of the barrier layer 6 is about 1 micrometer.
  • a display device includes the display panel of the present invention.
  • the display device may be any product or component having a display function such as a liquid crystal panel, an electronic paper, an OLED panel, a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • a display function such as a liquid crystal panel, an electronic paper, an OLED panel, a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • the manufacturing method of the display panel of the present invention can employ a four-time mask manufacturing method. As shown in Fig. 3 (a), Fig. 3 (b) and Fig. 3 (c), an embodiment of the method of manufacturing the display panel of the present invention includes the following steps:
  • Forming the color filter substrate 1 the specific formation method can be similar to the conventional method for manufacturing a color filter substrate; for example, forming a black matrix, red (Red, R), green (Green, G), blue (Blue) on the substrate , B) a color layer (not shown) of the necessary layer 7 of the color film substrate, thereby forming the color filter substrate 1.
  • a common conductive film 4 is disposed on the color filter substrate 1.
  • the method and the arrangement position of the common conductive film 4 can be the same as the conventional method.
  • a common conductive film 4 is disposed on the color filter substrate 1. .
  • the method of providing the common conductive film 4 may be a conventional method.
  • a negative photoresist layer 8 is coated on the common conductive film 4; wherein the negative photoresist 8 forms an insoluble matter after illumination, and a negative photoresist is applied to form a negative photoresist layer 8 .
  • a mask 9 is provided in a region outside the predetermined region where the barrier layer 6 is to be formed, and an intermediate member as shown in Fig. 3 (b) is formed.
  • FIG. 3(c) Exposing the surface of the intermediate member formed in FIG. 3(b), then removing the mask 9 and covering it A portion of the negative photoresist layer 8 of the cap is formed to form a barrier layer 6 at a predetermined position as shown in Fig. 3(c).
  • a color filter substrate 1 having a barrier layer 6 which can be used as a display panel as shown in FIG.
  • the array substrate is fabricated simultaneously with or before or after the color substrate, and the array substrate can be fabricated in the same manner as the conventional method, and will not be described in detail herein.
  • a jumper 5 for supplying power to the gate driving circuit is disposed at a predetermined position on the array substrate 2 of the present embodiment; the area where the jumper is located is opposite to the position of the barrier layer 6 formed on the color filter substrate 1. .
  • a sealant is applied to the predetermined glue application area, and the color filter substrate 1 and the array substrate 2 thus formed are laminated.
  • the manufacturing method of the display panel of the embodiment of the present invention wherein, optionally, when the region corresponding to the jumper region of the negative photoresist layer 8 is exposed, the negative photoresist layer 8 and the jumper are
  • the light passage rate of the area corresponding to the area is less than 5%.
  • the design is such that the thickness of the barrier layer 6 is as small as possible, and the thickness of the barrier layer 6 is reduced to ensure the thickness of the sealant to ensure the wet area of the coating.
  • the thickness of the barrier layer 6 is preferably about 1 micrometer.
  • the manufacturing method of the display panel of the above embodiment of the present invention optionally, wherein the common conductive film 4 has a glue application area 41 for applying a sealant, if the glue application area 41 and the negative photoresist
  • the region of the layer 8 corresponding to the jumper region 10 has an overlapping portion, and the overlapping portion can be exposed by using the mask 9, that is, the barrier layer 6 is formed only on the overlapping portion, without having to be at all with the jump
  • a barrier layer 6 is formed on the corresponding region of the line region 10. This effect is to reduce the area of the barrier layer.
  • a method of manufacturing a display panel according to an embodiment of the present invention optionally, as shown in FIG. 4(a) and FIG. 4(b), in the jumper region 10 of the negative photoresist layer 8 with the mask 9 or While the corresponding region 50 of the overlapping portion is exposed, the region for forming the column spacer (for example, the column spacer region 21) may be exposed; thus, the barrier layer 6 may be simultaneously formed and used to support the color film.
  • the formation of the barrier layer 6 of the embodiment of the present invention does not require additional additional steps, as long as The barrier layer 6 and the shape and position of the column spacers 40 are formed, and the corresponding mask 9 is designed to form the barrier layer 6 and the column spacers 40 having different functions at one time.
  • Such a method is an improvement based on the original method, on the one hand, a display panel with a reduced frame width is formed, and on the other hand, manufacturing cost and manufacturing complexity are compared with the original method. There was no increase in the degree.
  • a common conductive film is disposed on the color filter substrate, and a jumper for supplying power to the gate driving circuit is disposed on the array substrate;
  • the exposed portion of the positive photoresist layer is removed, a barrier layer for insulating the common conductive film from the jumper is formed, or a column spacer for supporting the color filter substrate and the array substrate is simultaneously formed.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种显示面板、显示装置以及显示面板的制造方法，其中，显示面板，包括第一基板（1）、与所述第一基板（1）相对设置的第二基板（2），所述第一基板（1）上设置有公共导电薄膜（4），所述第二基板（2）上设置有用于为栅极驱动电路供电的跳线（5），其中，所述公共导电薄膜（4）的与所述跳线（5）所在区域对应的整个或部分区域设置有用于使公共导电薄膜（4）与所述跳线（5）相互绝缘的阻挡层（6）。该显示面板和显示装置使显示面板的边框宽度可以缩小，满足移动产品对显示面板的窄边框要求。利用该显示面板的制造方法可以实现4次掩模制造窄边框TN型的显示面板，不必增加掩模次数，同时满足显示面板的窄边框要求。

Description

显示面板、 显示装置以及显示面板的制造方法 相关申请的交叉引用
本申请要求并享有申请号为 201310478367.X， 申请日为 2013年 10月 12 日， 名称为 "显示面板、 显示装置以及显示面板的制造方法" 的中国发明专 利申请的优先权， 其公开的内容通过引用被整体合并到此处。 技术领域
本发明涉及液晶显示领域， 特别是涉及一种显示面板、 显示装置以及显 示面板的制造方法。 背景技术
移动产品对显示面板的窄边框要求越来越高， 为了对应这种要求， 显示 面板的彩膜基板的左右两侧不能放置电路板（IC)， 因此目前手机与平板电脑 的显示面板普遍使用 GOA技术。
GOA技术即： 阵列基板行驱动技术（Gate Driver on Array), 是直接将栅 极驱动电路（Gate driver ICs)制作在阵列 ( Array )基板上， 该设置有栅极驱 动电路的区域被称为 GOA区域。 该技术的应用可以减少显示面板制作程序， 且降低产品成本。
使用 GOA技术生产显示面板时， 可以使用栅极绝缘掩模， 即 GI mask (Gate Insulator mask), 也可以使用 ITO ( Indium Tin Oxide , 氧化铟锡）材质 的跳线， 本发明针对后一种情况。
对于 ΤΝ型与 VA型的显示面板来说，通过涂布和连接包含金属粒子的密 封胶，以导通阵列基板的公共电极与彩膜基板的彩膜上的公共导电薄膜（Com ITO 但是如果密封胶被无意涂布在彩膜基板的左右两侧的 GOA区域相对 应的位置时， 就可能会导通 GOA区域的 ΙΤΟ材质的跳线与彩膜上的公共导 电薄膜， 这样会导致 GOA区域无法正常工作。
为了避免这个问题， 现有的 ΤΝ型或 VA型的显示面板在使用 GOA技术 时， 如不使用 GI mask, 而是使用 ITO材质的跳线时， 都采用涂布密封胶时， 使密封胶远离 GOA区域的跳线区域， 这样会使显示面板的边框宽度增加 0.5 毫米左右， 不能满足移动产品对显示面板的窄边框要求。 发明内容
本发明的目的是提供一种边框较窄的使用 GOA技术的显示面板、显示装 置以及显示面板的制造方法。
根据本发明的实施例， 提供一种显示面板， 包括第一基板、 与所述第一 基板相对设置的第二基板， 所述第一基板上设置有公共导电薄膜， 所述第二 基板上设置有用于为栅极驱动电路供电的跳线， 其中， 所述公共导电薄膜的 与所述跳线所在区域对应的整个或部分区域设置有用于使公共导电薄膜与所 述跳线相互绝缘的阻挡层。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述第一基板 为彩膜基板， 所述第::：::基板为阵列基板， 所述阻挡层设置于所述第一基板上 的所述公共导电薄膜的外侧。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述公共导电 薄膜上有用于涂覆含有导电粒子的密封胶的涂胶区域， 所述涂胶区域与所述 公共导电薄膜的与所述跳线所在区域相对应的区域有重叠部分， 所述阻挡层 至少覆盖所述重叠部分。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述阻挡层仅 覆盖所述重叠部分。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述阻挡层的 材料为负性光刻胶或正性光刻胶。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述阻挡层的 厚度小于 2微米。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述阻挡层的 厚度为 1微米。
根据本发明的上述实施例的显示面板， 其中， 可选择地， 在第一基板与 第二基板之间设置有起支撑作用的隔垫物， 所以阻挡层与所述隔垫物用相同 的材料设置于同层。 根据本发明的上述实施例的显示面板， 其中， 可选择地， 所述隔垫物为 柱状隔垫物。
根据本发明的另一实施例， 提供-一种显示装置， 其中， 包括如上所述的 显示面板。
根据本发明的另一实施例， 提供一种显示面板的制造方法， 其中， 包括 以下步骤： 在第一基板上设置公共导电薄膜， 在第二基板上设置用于为栅极 驱动电路供电的跳线； 在所述公共导电薄膜的与所述跳线所在区域对应的整 个或部分区域形成用于使公共导电薄膜与所述跳线相互绝缘的阻挡层。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 所 述第一基板为彩膜基板， 所述第二基板为阵列基板， 所述阻挡层设置于所述 第一基板上的所述公共导电薄膜的外侧。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 所 述公共导电薄膜上有用于涂覆含有导电粒子的密封胶的涂胶区域， 所述涂胶 区域与所述公共导电薄膜的与所述跳线所在区域相对应的区域有重叠部分， 所述阻挡层至少覆盖所述重叠部分。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 所 述阻挡层的厚度小于 2微米。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 在 形成阻挡层的同时， 形成设置于同层的、 具有相同的材料的、 在第一基板与 第二基板之间起支承作用的隔垫物。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 在 公共导电薄膜上涂布负性光刻胶层； 对所述负性光刻胶层的与用于形成阻挡 层以及用于形成柱状隔垫物的区域曝光；清除负性光刻胶层的没有曝光部分， 形成阻挡层以及柱状隔垫物。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 对 用于形成阻挡层的所述负性光刻胶层的区域曝光时， 用于形成阻挡层的所述 负性光刻胶层的区域光通过率低于 5%。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 所 述公共导电薄膜上有用于涂覆密封胶的涂胶区域， 涂胶区域对应的区域和与 所述跳线所在区域相对应的区域具有重叠部分， 对所述负性光刻胶层的对应 于所述重叠部分以及用于形成柱状隔垫物的区域曝光。
根据本发明的上述实施例的显示面板的制造方法， 其中， 可选择地， 包 括以下歩骤: 在彩膜基板上设置公共导电薄膜， 在阵列基板上设置用于为栅 极驱动电路供电的跳线； 在公共导电薄膜上涂布正性光刻胶层； 对所述正性 光刻胶层的与所述跳线所在区域相对应的区域以及用于形成柱状隔垫物的区 域遮盖后， 对所述正性光刻胶层曝光； 清除正性光刻胶层的曝光部分， 形成 用于使公共导电薄膜与所述跳线绝缘的阻挡层以及用于支承所述彩膜基板、 所述阵列基板的柱状隔垫物。
本发明的显示面板和显示装置通过在公共导电薄膜与跳线所在区域之间 设置阻挡层，这样密封胶不必远离 GOA跳线所在区域， 由此使本发明的显示 面板的边框宽度可以缩小 0.5毫米左右， 满足显示面板的窄边框要求。
利用本发明的显示面板的制造方法可以实现 4次掩模 （4 mask) 制造窄 边框 TN型的显示面板。 利用本发明的显示面板的制造方法制造显示面板， 不必增加掩模次数， 同时使得显示面板的边框宽度可以縮小 0.5 毫米左右， 更好地满足对显示面板的窄边框要求。 附图说明
图 1为本发明的一个实施例的显示面板的主视结构示意图；
图 2为本发明的一个实施例的显示面板的局部放大纵剖结构示意图； 图 3 ( a)、 图 3 (b)、 图 3 ( c)为本发明的一个实施例的显示面板的制造 方法的部分步骤示意图；
图 4 ( a)、 图 4 (b) 为本发明的另一个实施例的显示面板的制造方法的 部分步骤示意图。 具体实施方式
以下结合附图， 进一歩说明本发明的各实施例， 其中各附图只作示意说 明的目的， 其形状与比例等不起限定作用。
本发明的一个实施例的显示面板通过在其公共导电薄膜与跳线所在区域 之间设置阻挡层，这样密封胶不必远离 GOA区域的跳线区域而设置， 由此使 本发明的显示面板的边框宽度可以缩小 0.5mm左右， 对满足移动产品对显示 面板的窄边框要求是特别有利的。
本发明的一个实施例的显示面板，图 1示出显示面板的主视结构示意图， 中间的虚线区为包括有效显示区域 （Active area) 的工作区域 20， 两侧为包 含有 GOA区域的跳线区域 10。现有技术中，密封胶需要避开的跳线区域 10。
具体地讲， 如图 2示出显示面板的局部放大纵剖结构示意图， 其是包含 有跳线区域 10的部分。 其中， 显示面板包括第一基板 1、 与第一基板 1相对 设置的第二基板 2、 以及设置于第-一基板 1和第二基板 2之间的密封胶 3。在 密封胶中含有导电粒子 31。
其中， 第一基板 1上设置有公共导电薄膜 4， 第二基板 2上设置有用于 为栅极驱动电路供电的跳线 5。 其中， 跳线 5可选地由 ITO制成。 跳线 5所 在区域称为 GOA区域的跳线区域 10 (简称跳线区域 10)。 在公共导电薄膜 4 与跳线 5的所在区域（即跳线区域 10)相对的位置上设置有绝缘的阻挡层 6。 为了能实现绝缘效果就好， 可选择地在公共导电薄膜 4的表面上， 与跳线 5 的所在区域 （即跳线区域 10) 相对的位置上设置有绝缘的阻挡层 6。
在上面的实施例中， 第一基板 1可以为彩膜基板， 第二基板 2可以为阵 列基板， 阻挡层 6设置于第一基板 1上的公共导电薄膜 4的外表面。
具体来说， 第一基板 1的公共导电薄膜 4的最外侧， 有预先设计用于涂 覆密封胶的涂胶区域 41， 涂胶区域 41与公共导电薄膜 4的与跳线 5的所在 区域相对应的区域有重叠部分， 阻挡层 6优选设置于重叠部分的外侧。 也就 是说， 阻挡层 6优选至少覆盖该重叠部分。其中， 图 2示出了涂胶区域 41完 全覆盖了与跳线 5的所在区域相对应的区域， 这时重叠部分即为公共导电薄 膜 4与跳线 5的所在区域相对应的区域。在某些情况下， 涂胶区域 41可能与 跳线 5的所在区域相对应的区域只是部分重叠， 那么， 只需在该重叠部分上 设置阻挡层就可以实现同样的效果。
如图 2所示， 由于在公共导电薄膜 4上与跳线 5的所在区域相对应的区 域上设置了绝缘用阻挡层 6， 所以即使如图 2所示的那样， 密封胶 3中的导 电粒子 31位于跳线 5与公共导电薄膜 41之间， 也会由于阻挡层 6的存在， 而不会造成跳线 5与公共导电薄膜 41之间电导通， 从而可以确保 GOA区域 的正常工作。 这样在涂布密封胶时， 就无需像现有技术那样远离 GOA区域， 因此达到了使得显示面板的边框宽度可以缩小 0.5 毫米左右， 可以更好地满 足移动产品对显示面板的窄边框要求。
本发明实施例的显示面板， 其中， 作为彩膜基板的第一基板 1上可以设 置有通常的黑矩阵 7、 红 （Red， R)、 绿 ( Green , G)、 蓝 （Blue, B ) 色胶 层等。 也就是说， 该彩膜基板可以是常规的彩膜基板， 此处不再详细描述。
本发明的一个实施例的显示面板， 其中， 阻挡层 6的材料可以为负性光 刻胶。 也可以使用正性光刻胶。
本发明的一个实施例的显示面板， 其中， 阻挡层 6的厚度小于约 2微米。 如： 阻挡层 6的厚度为约 1微米。
本发明一个实施例的显示装置， 包括本发明的显示面板。
上述显示装置可以为液晶面板、 电子纸、 OLED 面板、 液晶电视、 液晶 显示器、 数码相框、 手机、 平板电脑等任何具有显示功能的产品或部件。
本发明的显示面板的制造方法可以采用 4次掩模 ( 4mask ) 制造方法。 如图 3 ( a)、 图 3 ( b ) 和图 3 (c) 所示， 本发明的显示面板的制造方法 的一个实施例， 包括以下歩骤：
形成彩膜基板 1 ; 该具体的形成方法， 可以与常规的制造彩膜基板的方 法类似； 比如：在基板上形成黑矩阵、红（Red, R)、绿（Green, G)、蓝（Blue, B ) 色胶层 （图中未示出） 等彩膜基板的必要层 7， 从而形成彩膜基板 1。
在彩膜基板 1上设置公共导电薄膜 4， 该设置公共导电薄膜 4的方法与 设置位置可以与常规的方法相同， 如图 3 (a) 所示， 在彩膜基板 1上设置公 共导电薄膜 4。 设置公共导电薄膜 4的方法可以是常规方法。
在上述公共导电薄膜 4上涂布负性光刻胶层 8; 其中， 负性光刻胶 8是 在光照后形成不可溶物质， 涂布负性光刻胶而形成负性光刻胶层 8。
经以上步骤， 形成如图 3 ( a) 所示的中间部件。
在预定的、 要形成阻挡层 6 的区域之外的区域设置掩模 9， 形成如图 3 ( b ) 所示的中间部件。
对该图 3 ( b ) 形成的中间部件表面进行曝光， 然后去除掩模 9和被其覆 盖的部分负性光刻胶层 8， 形成如图 3 ( c ) 所示的在预定位置形成阻挡层 6。 这样的具有阻挡层 6的彩膜基板 1， 其可以用作如图 2所示的显示面板中。
与上述彩色基板同时或在其之前或之后， 制作阵列基板， 该阵列基板的 具体制作方法可以与常规的方法相同， 这里不再详细描述。 只是， 在本实施 例的阵列基板 2上的预定位置设置了用于为栅极驱动电路供电的跳线 5; 该 跳线所在的区域与上述彩膜基板 1上形成的阻挡层 6的位置相对。 最后， 在 预定的涂胶区域涂覆密封胶， 将上述形成的彩膜基板 1和阵列基板 2进行合 膜。
本发明实施例的显示面板的制造方法， 其中， 可选择地， 对负性光刻胶 层 8的与跳线区域相对应的区域曝光时， 负性光刻胶层 8的与所述跳线区域 相对应的区域的光通过率低于 5%。 这样设计是为了使阻挡层 6 的厚度尽量 小， 减小阻挡层 6的厚度可以保证密封胶的厚度以保证涂布的湿面积， 阻挡 层 6厚度优选为 1微米左右。
本发明上述实施例的显示面板的制造方法， 可选择的， 其中， 公共导电 薄膜 4上有用于涂覆密封胶的涂胶区域 41 , 如果所述涂胶区域 41和所述负 性光刻胶层 8与所述跳线区域 10相对应的区域有重叠部分，则可以利用掩模 9对所述重叠部分曝光， 即只在该重叠部分上形成阻挡层 6， 而无需在所有与 所述跳线区域 10相对应的区域上形成阻挡层 6。 这样的效果是可以减少阻挡 层的面积。
本发明实施例的显示面板的制造方法， 可选择的， 如图 4 ( a)和图 4 (b) 所示，在利用掩模 9对负性光刻胶层 8的与跳线区域 10或上述重叠部分相对 应的区域 50曝光的同时， 可以对用于形成柱状隔垫物的区域（如： 柱状隔垫 物区域 21 ) 进行曝光； 这样， 可以同时形成阻挡层 6以及用于支承彩膜基板 1和阵列基板的柱状隔垫物 40。也就是说， 在原有的制造显示面板的方法中， 原来就有形成柱状隔垫物 40的歩骤， 而本发明实施例的阻挡层 6的形成， 无 需新加额外的歩骤，只要根据待形成的阻挡层 6以及柱状隔垫物 40的形状与 位置， 设计相应的掩模 9， 就可以一次性形成具有不同功能的阻挡层 6 以及 柱状隔垫物 40。 这样的方法是在原方法的基础上进行的改进， 一方面形成了 边框宽度缩小的显示面板， 另一方面， 与原方法相比， 制造成本和制造复杂 度均没有增加。
本发明的显示面板的制造方法的其他实施例中， 还可以不利用负性光刻 胶， 而是利用正性光刻胶实现 4次掩模 ( 4mask )制造窄边框 TN型的显示面 板。 可以包括以 . - F歩骤：
在彩膜基板上设置公共导电薄膜， 在阵列基板上设置用于为栅极驱动电 路供电的跳线；
在公共导电薄膜上涂布正性光刻胶层；
利用掩模对所述正性光刻胶层的与跳线区域相对应的区域， 或者进而同 时对用于形成柱状隔垫物的区域遮盖后， 对所述正性光刻胶层曝光；
清除正性光刻胶层的曝光部分， 形成用于使公共导电薄膜与所述跳线绝 缘的阻挡层， 或者同时形成用于支承所述彩膜基板、 所述阵列基板的柱状隔 垫物。 以上仅是本发明的优选实施方式， 应当指出， 对于本技术领域的普通技 术人员来说， 在不脱离本发明原理的前提下， 还可以作出若干改进和润饰， 这些改进和润饰也应视为本发明的保护范围。

Claims

禾 tl
1. 一种显示面板，包括第一基板、与所述第-一基板相对设置的第二基板， 所述第一基板上设置有公共导电薄膜， 所述第二基板上设置有用于为栅极驱 动电路供电的跳线， 其中， 所述公共导电薄膜的与所述跳线所在区域对应的 整个或部分区域设置有用于使公共导电薄膜与所述跳线相互绝缘的阻挡层。
2. 根据权利要求 1所述的显示面板， 其中， 所述第一基板为彩膜基板， 所述第二基板为阵列基板， 所述阻挡层设置于所述第一基板上的所述公共导 电薄膜的外侧。
3. 根据权利要求 2所述的显示面板， 其中， 所述公共导电薄膜上有用于 涂覆含有导电粒子的密封胶的涂胶区域， 所述涂胶区域与所述公共导电薄膜 的与所述跳线所在区域相对应的区域有重叠部分， 所述阻挡层至少覆盖所述 重叠部分。
4. 根据权利要求 3所述的显示面板， 其中， 所述阻挡层仅覆盖所述重叠 部分。
5. 根据权利要求 1〜4任一项所述的显示面板， 其中， 所述阻挡层的材 料为负性光刻胶或正性光刻胶。
6. 根据权利要求 1〜5 任一项所述的显示面板， 其中， 所述阻挡层的厚 度小于 2微米。
7. 根据权利要求 6所述的显示面板，其中，所述阻挡层的厚度为 1微米。
8. 根据权利要求 1〜7任一项所述的显示面板， 其中， 在第一基板与第 二基板之间设置有起支撑作用的隔垫物， 所以阻挡层与所述隔垫物用相同的 材料设置于同层。
9. 根据权利要求 8所述的显示面板， 其中， 所述隔垫物为柱状隔垫物。
10. 一种显示装置， 其中， 包括如 1〜9任一项所述的显示面板。
11. 一种显示面板的制造方法， 其中， 包括以下步骤：
在第一基板上设置公共导电薄膜， 在第二基板上设置用于为栅极驱动电 路供电的跳线；
在所述公共导电薄膜的与所述跳线所在区域对应的整个或部分区域形成 用于使公共导电薄膜与所述跳线相互绝缘的阻挡层。
12. 根据权利要求 11所述的显示面板的制造方法， 其中，
所述第一基板为彩膜基板， 所述第二基板为阵列基板， 所述阻挡层设置 于所述第一基板上的所述公共导电薄膜的外侧。
13. 根据权利要求 11所述的显示面板的制造方法， 其中，
所述公共导电薄膜上有用于涂覆含有导电粒子的密封胶的涂胶区域， 所 述涂胶区域与所述公共导电薄膜的与所述跳线所在区域相对应的区域有重叠 部分， 所述阻挡层至少覆盖所述重叠部分。
14. 根据权利要求 11〜13任一项所述的显示面板， 其中， 所述阻挡层的 厚度小于 2微米。
15. 根据权利要求 11〜14所述的显示面板的制造方法， 其中，
在形成阻挡层的同时， 形成设置于同层的、 具有相同的材料的、 在第一 基板与第:二基板之间起支承作用的隔垫物。
16. 根据权利要求 15所述的显示面板的制造方法， 其中，
在公共导电薄膜上涂布负性光刻胶层；
对所述负性光刻胶层的与用于形成阻挡层以及用于形成柱状隔垫物的区 域曝光；
清除负性光刻胶层的没有曝光部分， 形成阻挡层以及柱状隔垫物。
17. 根据权利要求 16所述的显示面板的制造方法， 其中， 对用于形成阻 挡层的所述负性光刻胶层的区域曝光时， 用于形成阻挡层的所述负性光刻胶 层的区域光通过率低于 5%。
18. 根据权利要求 17所述的显示面板的制造方法， 其中， 所述公共导电 薄膜上有用于涂覆密封胶的涂胶区域， 涂胶区域对应的区域和与所述跳线所 在区域相对应的区域具有重叠部分， 对所述负性光刻胶层的对应于所述重叠 部分以及用于形成柱状隔垫物的区域曝光。
19. 根据权利要求 15所述的显示面板的制造方法，其中，包括以下歩骤 : 在彩膜基板上设置公共导电薄膜， 在阵列基板上设置用于为栅极驱动电 路供电的跳线；
在公共导电薄膜上涂布正性光刻胶层； 对所述正性光刻胶层的与所述跳线所在区域相对应的区域以及用于形成 柱状隔垫物的区域遮盖后， 对所述正性光刻胶层曝光；
清除正性光刻胶层的曝光部分， 形成用于使公共导电薄膜与所述跳线绝 缘的阻挡层以及用于支承所述彩膜基板、 所述阵列基板的柱状隔垫物。
PCT/CN2014/080390 2013-10-12 2014-06-20 显示面板、显示装置以及显示面板的制造方法 WO2015051649A1 (zh)

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