WO2015032202A1 - 一种阵列基板、柔性显示器件及阵列基板的制作方法 - Google Patents

一种阵列基板、柔性显示器件及阵列基板的制作方法 Download PDF

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Publication number
WO2015032202A1
WO2015032202A1 PCT/CN2014/075262 CN2014075262W WO2015032202A1 WO 2015032202 A1 WO2015032202 A1 WO 2015032202A1 CN 2014075262 W CN2014075262 W CN 2014075262W WO 2015032202 A1 WO2015032202 A1 WO 2015032202A1
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substrate
flexible substrate
flexible
array substrate
array
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English (en)
French (fr)
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秦纬
周伟峰
程鸿飞
苏京
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to US14/408,518 priority Critical patent/US9905577B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G5/00—Control arrangements or circuits for visual indicators common to cathode-ray tube indicators and other visual indicators
    • G09G5/003—Details of a display terminal, the details relating to the control arrangement of the display terminal and to the interfaces thereto
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0214—Manufacture or treatment of multiple TFTs using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/411—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/688—Flexible insulating substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

Definitions

  • FlexiWe displays refers to a type of flexible display that can be fabricated into ultra-thin, oversized, flexible display devices or display technologies.
  • the main features of a flexible display can be described in three words: thin, light, and soft.
  • the prior art flexible substrate is generally divided into two regions: a portion is a non-bendable region (a flexible substrate generally located in a peripheral region of the flexible substrate), and a portion is a bendable region, as shown in the figure, in the column substrate i
  • the position of the driving module 4 is set to be a non-bendable area.
  • the driving module 4 is connected to the data line 2 and the gate line 3 to drive the thin film transistor TFT 5 disposed in the panel. Therefore, the substrate needs to have a position where the driving module 4 is disposed. A certain strength to ensure that it is not easy to bend.
  • the current method is to arrange the driving module 4 on the array layer 6 as shown in FIG.
  • the array layer is described as follows.
  • the array layer that is, the display structure on the array substrate, generally includes a gate line, an insulating layer, a data line, a TFT, and the like.
  • the flexible substrate 7 is bent at the end, which is equivalent to providing two flexible substrates at the periphery, which increases the strength, but the above method has at least the following disadvantages: In the process of bending, it is difficult to ensure the flatness at the same time.
  • An object of the embodiments of the present invention is to provide an array substrate, a flexible display device, and a method for fabricating an array substrate, which ensure the strength of the non-bendable region in a simple and reliable manner.
  • an embodiment of the present invention provides an array substrate including a flexible substrate divided into a display area and a peripheral area, and an array layer formed on the flexible substrate, wherein the flexible substrate located in the display area has a first thickness. At least a portion of the flexible substrate located in the peripheral region has a second thickness greater than the first thickness. In the above array substrate, wherein the flexible substrate located in the peripheral region has a second thickness; the minute portion may extend to the display region.
  • the array substrate is further provided with a driving module for driving the array layer, and the driving module is disposed above the portion of the flexible substrate located at the peripheral region having the second thickness.
  • a portion having a second thickness is correspondingly disposed on opposite side edges of the flexible substrate.
  • an embodiment of the present invention further provides a flexible display device, including the above, in order to achieve the above object, an embodiment of the present invention further provides a method for fabricating an array substrate, including:
  • the upper surface of the substrate includes at least one recessed structure distributed on the edge; forming a flexible substrate divided into the display region and the peripheral region on the upper surface of the substrate, wherein the flexible substrate corresponds to the recess a portion of the structure is a portion of the flexible substrate located in the peripheral region, the portion of the flexible substrate corresponding to the recessed structure having a second thickness greater than a first thickness of the flexible substrate at the display region;
  • An array layer is formed on the flexible substrate.
  • a portion of the flexible substrate corresponding to the recessed structure having a second thickness is extended to the display region.
  • the method for fabricating the above array substrate further comprising:
  • the method for fabricating the above array substrate further comprising:
  • the array substrate is peeled off from the substrate.
  • the recessed structures are distributed on opposite sides of the substrate.
  • the thickened portion can be disposed to meet the strength requirement of the non-bendable region.
  • the thickened portion can be formed at one time by the substrate having the corresponding recessed structure, thereby reducing the process complexity.
  • FIG. 1 is a schematic structural view of a prior art flexible array substrate
  • FIG. 2 is a schematic cross-sectional view showing a prior art flexible array substrate
  • FIG. 3 is a schematic cross-sectional view of various flexible array substrates according to an embodiment of the present invention.
  • FIG. 11a is a schematic flow chart of fabricating an array substrate according to an embodiment of the present invention.
  • the peripheral portion of the column substrate is provided with a thickened portion, and the strength of the non-bendable region is ensured by the integrally formed thickened portion. In this way, the complexity of the process is reduced and the quality of the product is guaranteed.
  • the array substrate of the embodiment of the present invention includes a flexible substrate 7 divided into a display area and a peripheral area, and an array layer 6 formed on the flexible substrate 7, wherein the flexible substrate located in the display area has The first thickness dl, at least a portion of the flexible substrate located in the peripheral region has a second thickness d2 greater than the first thickness dl.
  • the thickened portion can be disposed to satisfy the strength requirement of the non-bendable region.
  • the thickened portion can be formed at one time by the substrate having the corresponding recessed structure, thereby reducing the process complexity.
  • each portion of the flexible substrate in Fig. 2 is the same, but is bent.
  • At least a portion of the flexible substrate located in the peripheral region has a second thickness d2 greater than the first thickness dl, which merely indicates that the flexible substrate located in the peripheral region has The relatively thickened portion, but this does not mean that the thickened portion can only exist in the flexible substrate located in the peripheral region.
  • FIG. 4 is a schematic structural diagram of another array substrate according to an embodiment of the present invention, wherein It is apparent that the thickened portion not only covers the peripheral area but also extends to the display area.
  • the flexible substrate located in the peripheral region has a second thickness d2 greater than the first thickness dl, which merely indicates the flexible substrate located in the peripheral region.
  • d2 the first thickness
  • dl the flexible substrate located in the peripheral region
  • FIG. 5 it is a schematic structural view of still another array substrate according to an embodiment of the present invention. It can be clearly seen that the thickened portion covers only a part of the peripheral region and also extends to the display region.
  • FIG. 6 is a schematic structural view of still another array substrate according to an embodiment of the present invention, wherein it can be clearly seen that the thickened portion covers only a part of the peripheral region, but does not extend to the display region.
  • FIG. 7 is a schematic structural view of still another array substrate according to an embodiment of the present invention, wherein it can be clearly seen that the thickened portion covers only a portion of the middle of the flexible substrate located in the peripheral region.
  • the thickened portion may be disposed only on one side of the flexible substrate, but may be simultaneously disposed on opposite sides of the flexible substrate, that is, having a second thickness.
  • the portions are correspondingly disposed on opposite sides of the flexible substrate.
  • the array substrate is further provided with a driving module for driving the array layer, and the driving module is disposed above the portion of the flexible substrate located at the peripheral region having the second thickness.
  • two driving modules 4 may be disposed on opposite sides of the array substrate, so that the driving is more flexible.
  • portion having the second thickness can also be used to thicken the flexible substrate of other peripheral regions, such as the bezel region in the flexible substrate located in the peripheral region, etc., which will not be described in detail herein.
  • the thickened portion and the portion which is not thickened are stepped, but it should be understood that the thickened portion may also be a thickened portion in which the thickness continuously changes, as shown in Fig. 9. And Figure 10 shows.
  • the thickening portion may be one or more, and the thickening portion may have other possible structures, such as a trapezoidal structure, a triangular structure, etc., which will not be described in detail herein.
  • the embodiment of the invention further discloses a flexible display device, comprising any of the above array substrates,
  • the structure and working principle of the array substrate are the same as those in the foregoing embodiment, and details are not described herein again.
  • the structure of other parts of the flexible display device can refer to the prior art, and will not be described in detail herein.
  • the flexible display device can be: a product or a component having any display function such as a liquid crystal panel, an electronic paper, a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, or the like.
  • the embodiment of the present invention further provides a method for fabricating an array substrate, wherein, as shown in FIG. 11 a to FIG.
  • Step A1 providing a substrate 8, the upper surface of the substrate includes at least one recessed structure 801 distributed on the edge;
  • Step A2 forming a flexible substrate 7 partitioned between the display area and the peripheral area on the upper surface of the substrate, wherein the portion of the flexible substrate 7 corresponding to the recessed structure is a part of the flexible substrate located in the peripheral area, the flexible substrate 7 corresponds to the recessed portion of the portion having a first thickness (11 of the second thickness of the flexible substrate (12;
  • step A3 an array layer 6 is formed on the flexible substrate 7.
  • the portion of the flexible substrate 7 corresponding to the recessed structure having the second thickness d2 is extended to the display region.
  • the flexible substrate When the flexible substrate is in the process of coating and molding, the upper surface of the entire flexible substrate 7 is uniform, and since the substrate 8 has the recessed structure 801, the flexible substrate 7 is formed to have a larger thickness corresponding to the position of the recessed structure 801.
  • the thickened portion has a higher strength relative to the portion having a thickness di, and thus can satisfy the strength requirement of the non-bendable region.
  • the thickened portion can be formed by providing a substrate having a recessed structure, and it is very simple to implement without adding any steps.
  • the thickening portion may be disposed only on one side of the array substrate, but may be simultaneously disposed on opposite sides of the array substrate, that is, having a second thickness.
  • the portions are correspondingly disposed on opposite sides of the array substrate.
  • the driving module is disposed above the portion of the flexible substrate located in the peripheral region having the second thickness.
  • the manufacturing method of the array substrate of the embodiment of the present invention is as shown in FIG. 1 ld, and further includes: Step A4, providing a driving module 4 in a peripheral area of the flexible substrate 7, to obtain the array base
  • the driving module 4 is disposed above the portion of the flexible substrate located in the peripheral region having the second thickness d2.
  • the portion of the flexible substrate 7 having the thickened portion can provide better strength due to the larger thickness. This part is difficult to bend and provides good protection for the drive module.
  • the array substrate structure can be peeled off from the substrate to obtain an array substrate as shown in FIG.
  • the gate driving module for driving the gate lines in the driving module can be formed together with the array layer by a GOA (Gate on Array) method.
  • GOA Gate on Array
  • the above-mentioned one thickening structure is set as an example in the position corresponding to the driving module, but it should be understood that the thickening structure may also be set in other positions, the number It can also be multiple. As in a particular embodiment of the invention, the recessed features may be distributed on opposite sides of the substrate.
  • the recessed structures distributed on opposite sides of the substrate may be symmetrically distributed.
  • the substrate may be a substrate of various materials suitable for forming a flexible substrate and being easily peeled off.
  • the substrate is a glass substrate, which may be repeated multiple times. use.

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Abstract

一种阵列基板、柔性显示器件及阵列基板的制作方法。该阵列基板，包括划分为位于显示区和外围区的柔性基板（7）以及在所述柔性基板（7）上形成的阵列层（6），所述位于显示区的柔性基板（7）具有第一厚度，所述位于外围区的柔性基板的至少一部分具有大于所述第一厚度的第二厚度。阵列基板的制作方法中柔性基板的加厚部能够通过具有相应的凹陷结构（801）的基板（8）进行一次形成。还提供了一种具有所述阵列基板的柔性显示器件。

Description

柔板显示（ FlexiWe displays) 是指一类使用柔性基板， 可以制造成超薄、 超大、可弯曲的显示器件或显示技术。 柔性显示的最主要特点可以用三个字 来描述： 薄、 轻、 柔。
现有技术的柔性基板一般分为两个区域： 一部分是不可弯折区域 （一般 位于柔性基板的外围区的柔性基板）， 一部分是可弯折区域， 如图〗所示， 在 列基板 i中设置驱动模块 4的位置为不可弯折区， 该驱动模块 4与数据线 2以及栅线 3连接， 来驱动面板中设置的薄膜晶体管 TFT 5， 所以基板在设置 有驱动模块 4的位置需要具有有一定强度， 以保证不易弯折。
目前的方法是， 如图 2所示， 将驱动模块 4设置于阵列层 6之上。
在此对阵列层筒单说明如下。 在本发明的具体实施例中， 该阵列层即阵 列基板上的显示结构， 一般情况下包括栅线、 绝缘层、 数据线、 TFT等结构。
如图 2所示， 在目前的方法中， 柔性基板 7在末端弯折， 相当于在外围 设置了两层柔性基板， 这虽然加大了强度， 然而上述的方式至少存在如下缺 点： 需要增加一道弯折的工序， 同时弯折的地方很难保证平整。
本发明实施例的目的在于提供一种阵列基板、 柔性显示器件及阵列基板 的制作方法， 以简单可靠的方式保证不可弯折区域的强度。
为了实现上述目的， 本发明实施例提供了一种阵列基板， 包括划分为位 于显示区和外围区的柔性基板以及在柔性基板上形成的阵列层， 所述位于显 示区的柔性基板具有第一厚度， 所述位于外围区的柔性基板的至少一部分具 有大于第一厚度的第二厚度。 上述的阵列基板， 其中, 所述位于外围区的柔性基板的具有第二厚度的 ；分可延伸到显示区。
上述的阵列基板， 其中, 所述阵列基板还设置有用于驱动所述阵列层的 驱动模块， ^还驱动模块设置于所述位于外围区的柔性基板的具有第二厚度 的部分的上方。
上述的阵列基板， 其中， 具有第二厚度的部分对应地设置于所述柔性基 板的相对的两个侧边。
为了实现上述目的， 本发明实施例还提供了一种柔性显示器件， 包括上 为了实现上述目的， 本发明实施例还提供了一种阵列基板的制作方法， 包括：
提供基板， 所述基板的上表面上包括至少一个分布于边缘的凹陷结构； 在所述基板的上表面上形成划分为位于显示区和外围区的柔性基板， 其 中，柔性基板对应于所述凹陷结构的部分为位于外围区的柔性基板的一部分， 柔性基板对应于所述凹陷结构的部分具有大于位于显示区的柔性基板的第一 厚度的第二厚度；
在所述柔性基板上形成阵列层。
上述的阵列基板的制作方法， 其中， 使柔性基板对应于所述凹陷结构的 具有第二厚度的部分延伸到显示区。
上述的阵列基板的制作方法， 其中， 还包括；
在所述位于外围区的柔性基板设置用于驱动所述阵列层的驱动模块， 得 到所述阵列基板， 所述驱动模块设置于所述位于外围区的柔性基板的具有第 二厚度的部分的上方。
上述的阵列基板的制作方法， 其中， 还包括；
丛所述基板上剥离所述阵列基板。
上述的阵列基板的制作方法， 其中， 所述凹陷结构分布于所述基板相对 的两个侧边。
上述的阵列基板的制作方法， 其中， 分布于所述基板的相对的两个侧边 本发明实施例的阵列基板中， 由于柔性基板在外围区具有加厚部， 因而 该加厚部的设置能够满足不可弯折区域的强度要求。 同时， 该加厚部能够通 过具有相应的凹陷结构的基板来一次形成， 从而降低了工艺复杂度。
图 1表示现有技术的柔性阵列基板的结构示意图；
图 2表示现有技术的柔性阵列基板的截面示意图；
图 3图 10为本发明实施例的各种柔性阵列基板的截面示意图； 图 11a图〗le为本发明实施例的制作阵列基板的流程示意图。
本发明实施例的阵列基板、 柔性显示器件及 列基板的制作方法中， 将 列基板的外围区设置加厚部， 通过该一体成型的加厚部来保证不可弯折区 域的强度。 这样， 既降低了工艺流程的复杂度， 又保证了产品的质量。
本发明实施例的阵列基板， 如图 3所示， 包括划分为位于显示区和外围 区的柔性基板 7和在柔性基板 7上形成的阵列层 6， 其中， 所述位于显示区 的柔性基板具有第一厚度 dl， 所述位于外围区的柔性基板的至少一部分具有 大于第一厚度 dl的第二厚度 d2。
如图 3所示， 本发明实施例的 列基板中， 由于柔性基板 7在外围区具 有加厚部， 因而该加厚部的设置能够满足不可弯折区域的强度要求。 同时， 该加厚部能够通过具有相应的凹陷结构的基板来一次形成， 从而降低了工艺 复杂度。
在此， 应该说明的是， 图 2中柔性基板的每一部分的厚度都是相同的， 只不过是弯折的。
在此， 应当予以说明的是， 在本发明具体实施例中， 所述位于外围区的 柔性基板的至少一部分具有大于第一厚度 dl 的第二厚度 d2， 这仅仅表明位 于外围区的柔性基板具有相对加厚的部位， 但这并不表示该加厚的部位只能 存在于位于外围区的柔性基板。
如图 4所示， 为本发明实施例的另一种阵列基板的结构示意图， 其中可 以明显看出， 该加厚部位不但覆盖了外围区， 同时还延伸到了显示区。
在此， 应当予以说明的是， 在本发明具体实施例中， 所述位于外围区的 柔性基板的至少一部分具有大于第一厚度 dl 的第二厚度 d2, 这仅汉表明位 于外围区的柔性基板具有相对加厚的部位， 但这并不表示位于外围区的柔性 基板全部都具有第二厚度 d2。
如图 5所示， 为本发明实施例的再一种阵列基板的结构示意图， 其中可 以明显看出， 该加厚部位仅覆盖了外围区的一部分， 同时还延伸到了显示区。
如图 6所示， 为本发明实施例的又一种阵列基板的结构示意图， 其中可 以明显看出， 该加厚部位仅覆盖了外围区的一部分， 但没有延伸到显示区。
如图 7所示， 为本发明实施例的又一种阵列基板的结构示意图， 其中可 以明显看出， 该加厚部位仅覆盖了位于外围区的柔性基板中间的一部分。
同时， 在本发明的具体实施例中， 该加厚部可以仅设置于柔性基板的一 个侧边， 但也可以同时设置于柔性基板的相对的两个侧边， 也就是说， 具有 第二厚度的部分对应地设置于所述柔性基板的相对的两个侧边。
本发明实施例中， 所述阵列基板还设置有用于驱动所述阵列层的驱动模 块， 所述驱动模块设置于所述位于外围区的柔性基板的具有第二厚度的部分 的上方。
具有第二厚度的部分对应地设置于所述阵列基板的相对的两个侧边时， 如图 8所示， 可以在阵列基板相对的两侧来设置两个驱动模块 4， 这样驱动 更加灵活。
但应当理解的是， 该具有第二厚度的部分也可以用于来加厚其他外围区 的柔性基板， 如位于外围区的柔性基板中的边框区等， 在此不一一详细说明。
而且在上述的图 3至图 8中， 加厚部与不加厚的部分之间呈阶梯状， 但 应当理解的是， 该加厚部也可以是厚度连续变化的加厚部， 如图 9和图 10所 示。
但应当理解的是， 上述的加厚部可以是一个， 也可以是多个， 同时该加 厚部还可能具有其他可能的结构， 如梯形结构， 三角形结构等， 在此不一一 详细说明。
本发明实施例还公开了一种柔性显示器件， 包括上述任意的阵列基板， 其中， 阵列基板的结构以及工作原理同上述实施例， 在此不再赘述。 另外， 柔性显示器件其他部分的结构可以参考现有技术， 对此本文不再详细描述。 该柔性显示器件可以为： 液晶面板、 电子纸、 液晶电视、 液晶显示器、 数码 相框、 手机、 平板电脑等具有任何显示功能的产品或部件。
本发明实施例还提供一种阵列基板的制作方法， 其中， 如图 11 a至图 l l f 所示， 包括：
步骤 A1 , 提供基板 8， 所述基板的上表面上包括至少一个分布于边缘的 凹陷结构 801 ;
步骤 A2 ,在所述基板的上表面上形成划分为位于显示区和外围区的柔性 基板 7， 其中， 柔性基板 7对应于所述凹陷结构的部分为位于外围区的柔性 基板的一部分， 柔性基板 7对应于所述凹陷结构的部分具有大于位于显示区 的柔性基板的第一厚度 (11的第二厚度 (12;
步骤 A3， 在所述柔性基板 7上形成阵列层 6。
可选择地，使柔性基板 7对应于所述凹陷结构的具有第二厚度 d2的部分 延伸到显示区。
当柔性基板在涂覆成型的过程中，整个柔性基板 7的上表面都是均匀的， 而由于基板 8存在凹陷结构 801， 因此对应于凹陷结构 801 的位置， 柔性基 板 7会形成厚度较大的加厚部， 其强度相对于厚度为 di的部分更高， 因此能 够满足不可弯折区域的强度要求。 而同时， 通过设置一个具有凹陷结构的基 板即可形成该加厚部， 不用增加任何的工序， 实现也非常简单。
在本发明的具体实施例中，该加厚部可以仅设置于阵列基板的一个侧边， 但也可以是同时设置于阵列基板的相对的两个侧边， 也就是说， 具有第二厚 度的部分对应地设置于所述阵列基板的相对的两个侧边。
当然， 还可以在阵列基板更多的侧边来设置该加厚部， 在此不一一详细 说明。
考虑到对驱动模块的保护， 在本发明的具体实施例中， 所述驱动模块设 置于所述位于外围区的柔性基板的具有第二厚度的部分的上方。
也就是说， 本发明实施例的阵列基板的制作方法如图 i ld所示， 还包括： 步骤 A4， 在所述柔性基板 7的外围区设置驱动模块 4， 得到所述阵列基 板，所述驱动模块 4设置于所述位于外围区的柔性基板的具有第二厚度 d2的 部分的上方。 如图 l id所示， 由于驱动模块 4位于柔性基板 7的具有加厚部 的部分的上方， 而柔性基板 7的具有加厚部的部分由于厚度较大， 因此能够 提供更好的强度， 保证这部分难以弯折， 对驱动模块提供了良好的保护。
在基板上形成上述的阵列基板之后， 即可将该阵列基板结构从基板上剥 离， 得到如图 l i e所示的阵列基板。
当然， 该驱动模块中用于驱动栅线的栅极驱动模块可以通过 GOA (Gate on Array) 方式和阵列层一起形成。
在本发明的具体实施例中， 是以在驱动模块对应的位置来设置上述的一 个加厚结构为例进行的说明， 但应当理解的是， 该加厚结构也可以设置于其 他的位置， 数量也可以是多个。 如在本发明的具体实施例中， 所述凹陷结构 可以分布于所述基板的相对的两个侧边。
在本发明的具体实施例中， 分布于所述基板的相对的两个侧边的凹陷结 构可以是对称分布的。
在制作过程中， 只需要根据加厚结构的位置和数量选择具有对应数量和 对应位置的凹陷结构的基板即可， 在此不一一详细说明。
在本发明的具体实施例中， 该基板可以是各种材质的适用形成柔性基板 且易于剥离的基板， 在本发明具体实施例中， 优选的， 所述基板为玻璃基板， 其可以重复多次使用。
以上所述仅是本发明的优选实施方式， 应当指出， 对于本技术领域的普 通技术人员来说， 在不脱离本发明原理的前提下， 还可以做出若干改进和润 饰， 这些改进和润饰也应视本发明的保护范围。

Claims

1 . 一种阵列基板， 包括划分为位于显示区和外围区的柔性基板以及在所 述柔性基板上形成的 列层， 其中， 所述位于显示区的柔性基板具有第一厚 度， 所述位于外園区的柔性基板的至少一部分具有大于所述第一厚度的第二 厚度。
2, 根据权利要求 1所述的 列基板， 其中， 所述位于外围区的柔性基板 的具有第二厚度的部分可延伸到显示区。
3. 根据权利要求 1或 2所述的阵列基板， 其中， 所述阵列基板还设置有 ， 所述驱动模块设置于所述位于外围区的柔
Figure imgf000009_0001
4. 根据权利要求 1至 3中任意一项所述的阵列基板， 其中， 具有第二厚 度的部分对应地设置于所述柔性基板的相对的两个侧边。
5. 一种柔性显示器件， 包括权利要求 1-4中任意一项所述的阵列基板。
6. 一种阵 基板的制作方法， 其中， 包括:
提供基板， 所述基板的上表面上包括至少一个分布于边缘的凹陷结构； 在所述基板的上表面上形成划分为位于显示区和外围区的柔性基板， 其 中，柔性基板对应于所述凹陷结构的部分为位于外围区的柔性基板的一部分， 柔性基板对应于所述凹陷结构的部分具有大于位于显示区的柔性基板的第一 厚度的第二厚度；
在所述柔性基板上形成阵列层。
7. 根据权利要求 6所述的 列基板的制作方法， 其中， 使柔性基板对应 于所述凹陷结构的具有第二厚度的部分延伸到显示区。
8. 根据权利要求 6或 7所述的阵列基板的制作方法， 其中， 还包括： 在所述位于外围区的柔性基板设置用于驱动所述阵列层的驱动模块， 得 到所述阵列基板， 所述驱动模块设置于所述位于外围区的柔性基板的具有第 二厚度的部分的上方。
9. 根据权利要求 8所述的阵列基板的制作方法， 其中， 在得到所述阵列 基板之后还包括： 从所述基板上剥离所述阵列基板。
10. 根据权利要求 6至 9中任意一项所述的阵列基板的制作方法， 其中， 所述凹陷结构分布于所述基板的相对的两个侧边。
11. 根据权利要求 10所述的阵列基板的制作方法， 其中， 分布于所述基 板的相对的两个侧边的凹陷结构是对称分布的。
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CN103646611A (zh) * 2013-09-04 2014-03-19 京东方科技集团股份有限公司 一种阵列基板、柔性显示器件及阵列基板的制作方法

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TWI676838B (zh) * 2017-11-30 2019-11-11 大陸商昆山國顯光電有限公司 可分離的柔性顯示結構、柔性顯示屏及其製造方法、顯示裝置
US11087647B2 (en) 2017-11-30 2021-08-10 Kunshan Go-Visionox Opto-Electronics Co., Ltd. Detachable flexible display structures, flexible display screens, methods of manufacturing the same, and display devices

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