WO2014203594A1 - Élément métallique poreux et procédé de production - Google Patents

Élément métallique poreux et procédé de production Download PDF

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Publication number
WO2014203594A1
WO2014203594A1 PCT/JP2014/060253 JP2014060253W WO2014203594A1 WO 2014203594 A1 WO2014203594 A1 WO 2014203594A1 JP 2014060253 W JP2014060253 W JP 2014060253W WO 2014203594 A1 WO2014203594 A1 WO 2014203594A1
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WIPO (PCT)
Prior art keywords
layer
chromium
nickel
tin
metal
Prior art date
Application number
PCT/JP2014/060253
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English (en)
Japanese (ja)
Inventor
奥野　一樹
真嶋　正利
賢吾 塚本
斉 土田
英敏 斉藤
Original Assignee
住友電気工業株式会社
富山住友電工株式会社
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Publication date
Application filed by 住友電気工業株式会社, 富山住友電工株式会社 filed Critical 住友電気工業株式会社
Priority to US14/899,275 priority Critical patent/US10287646B2/en
Priority to EP14812928.1A priority patent/EP3012893B1/fr
Priority to KR1020157035006A priority patent/KR20160021769A/ko
Priority to CN201480033871.1A priority patent/CN105307802B/zh
Publication of WO2014203594A1 publication Critical patent/WO2014203594A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0068—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for particular articles not mentioned below
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/11—Making porous workpieces or articles
    • B22F3/1121—Making porous workpieces or articles by using decomposable, meltable or sublimatable fillers
    • B22F3/1137—Making porous workpieces or articles by using decomposable, meltable or sublimatable fillers by coating porous removable preforms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/002—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of porous nature
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/08—Alloys with open or closed pores
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/02—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/11—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of chromium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/027—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC.
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/70—Carriers or collectors characterised by shape or form
    • H01M4/80—Porous plates, e.g. sintered carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/023—Porous and characterised by the material
    • H01M8/0232—Metals or alloys
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2207/00—Aspects of the compositions, gradients
    • B22F2207/01—Composition gradients
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Definitions

  • the present invention relates to a porous metal body that can be used as a current collector for various batteries, capacitors, fuel cells and the like.
  • the problem to be solved by the present invention is to provide a metal porous body made of a nickel-tin binary alloy and a metal porous body excellent in corrosion resistance compared to a metal porous body made of a nickel-chromium binary alloy, It is.
  • the inventors have a three-dimensional network-like skeleton, and are a porous metal body containing at least nickel, tin, and chromium, and the concentration of chromium contained in the porous metal body is the surface of the skeleton of the porous metal body. It has been found that the above-mentioned problem can be solved by adopting a configuration in which it is the highest in the above and becomes lower toward the inside of the skeleton. The above configuration allows one or more elements different from nickel, tin, and chromium to be intentionally or inevitably included in the metal porous body as long as the above-described problems can be solved.
  • ⁇ ⁇ According to the present invention, it is possible to provide a metal porous body that is superior in corrosion resistance compared to conventional metal porous bodies made of nickel-tin binary alloys and metal porous bodies made of nickel-chromium binary alloys.
  • the porous metal body according to one aspect of the present invention has a three-dimensional network skeleton, includes at least nickel, tin, and chromium, and the concentration of chromium contained in the porous metal body is that of the skeleton of the porous metal body. It is the highest on the surface and becomes lower toward the inside of the skeleton.
  • the amount of chromium (mass) in the interior is relatively small compared to a completely porous metal body, and the influence on the corrosion resistance of the porous metal body is greatest. It is possible to increase the chromium concentration on the surface of the skeleton of the porous metal body that is a part. For this reason, it is possible to reduce the amount of chromium used in manufacturing, and hence the material cost, compared to a porous metal body having a uniform chromium concentration from the surface of the skeleton to the inside.
  • the chromium concentration on the surface of the skeleton of the porous metal body is preferably 3% by mass or more and 70% by mass or less, more preferably 5% by mass or more and 50% by mass or less.
  • the chromium concentration on the surface of the skeleton of the porous metal body is less than 3% by mass, the corrosion resistance decreases.
  • the chromium concentration on the surface of the skeleton of the porous metal body is larger than 70% by mass, the ratio of chromium oxide on the surface of the skeleton is large, so that the contact resistance increases.
  • the present inventors have found that by adopting the following configurations (3) to (12), it is possible to produce a porous metal body that solves the above problems.
  • the chromium-dispersed tin layer forming step includes supplying a chromium powder to the tin plating bath and stirring the tin plating bath to disperse the chromium powder in the tin plating bath; and forming the nickel layer into the tin plating bath And a chromium-dispersed tin plating step immersed in the substrate.
  • a layer forming step, a nickel layer forming step of forming a nickel layer on the surface of the conductive coating layer, a tin layer forming step of forming a tin layer on the surface of the nickel layer, and a chromium layer on the surface of the tin layer A chromium layer forming step to be formed, and a heat treatment step in which metal atoms diffuse between the nickel layer, the tin layer and the chromium layer by heating.
  • a chromium layer is formed on the surface of the tin layer by a vapor phase method.
  • the chromium layer forming step the chromium layer is formed on the surface of the tin layer by immersing the tin layer in a chromium plating bath.
  • the configuration of (7) above it is possible to form a layer having a high chromium concentration on the skeleton surface of the porous body with a small amount of chromium.
  • a chromium layer is formed on the surface of the tin layer by applying a mixture of the chromium powder and the binder to the surface of the tin layer.
  • a chromium layer is formed on the surface of the nickel-tin alloy layer by a vapor phase method.
  • the chromium layer is formed on the surface of the nickel-tin alloy layer by immersing the nickel-tin alloy layer in a chromium plating bath.
  • the configuration of (11) above it is possible to form a layer with a high chromium concentration on the surface of the skeleton of the porous body with a small amount of chromium.
  • a chromium layer is formed on the surface of the nickel-tin alloy layer by applying a mixture of the chromium powder and the binder to the surface of the nickel-tin alloy layer.
  • One specific example of the “metal porous body having a three-dimensional network skeleton” is Celmet (registered trademark of Sumitomo Electric Industries, Ltd.).
  • the “porous substrate made of a resin material” a known or commercially available material can be adopted as long as it is a porous material made of a resin.
  • the porous substrate made of a resin material include a foam made of a resin material, a nonwoven fabric made of a resin material, a felt made of a resin material, a three-dimensional network made of a resin material, or a combination thereof. Is mentioned.
  • the kind of resin material which comprises a porous body base material is not specifically limited, What can be removed by incineration is desirable.
  • Specific examples of the foam made of a resin material include foamed urethane, foamed styrene, and foamed melamine resin.
  • urethane foam or the like is desirable.
  • the shape of the porous substrate is a sheet, it is desirable that the material is flexible (cannot be folded when bent) from the viewpoint of handling.
  • the porosity of the porous substrate is not limited and is appropriately selected depending on the application, but is usually 60% to 98%, more preferably 80% to 96%.
  • the thickness of the porous substrate is not limited and is appropriately selected depending on the application, but is usually 150 ⁇ m or more and 5000 ⁇ m or less, more preferably 200 ⁇ m or more and 2000 ⁇ m or less, and further preferably 300 ⁇ m or more and 1200 ⁇ m or less.
  • Conductive coating layer refers to a layer formed on the surface of a porous substrate made of a resin material and having conductivity.
  • the conductive coating layer forming step various methods can be adopted as long as the conductive coating layer can be formed on the surface of the porous substrate.
  • Specific examples of the “conductive coating layer forming step” include conductive powder on the surface of the porous substrate (for example, powder of metal material such as stainless steel, crystalline graphite, carbon such as amorphous carbon black, etc.
  • a method of applying a mixture of a powder and a binder a method of forming a layer made of a conductive metal material on the surface of a porous substrate by electroless plating, sputtering, vapor deposition, ion plating, etc. Is mentioned.
  • the electroless plating treatment using nickel include a method of immersing the porous substrate in a known electroless nickel plating bath such as a nickel sulfate aqueous solution containing sodium hypophosphite. Further, if necessary, the porous base material may be immersed in an activation liquid (a cleaning liquid manufactured by Kanisen Co., Ltd.) containing a small amount of palladium ions before being immersed in the plating bath.
  • an activation liquid a cleaning liquid manufactured by Kanisen Co., Ltd.
  • a porous substrate is fixed to a substrate holder, and ionization is performed by applying a DC voltage between the substrate holder and a target (nickel) while introducing an inert gas.
  • a target nickel
  • examples thereof include a method in which the inert gas collided with nickel and the blown-off nickel particles are deposited on the surface of the porous substrate.
  • the conductive coating layer only needs to be continuously (conductable) on the surface of the porous substrate, and the basis weight (amount of adhesion to the porous substrate) is not limited.
  • the conductive coating layer When nickel is used, it is usually 5 g / m 2 or more and 15 g / m 2 or less, more preferably 7 g / m 2 or more and 10 g / m 2 or less.
  • the “nickel layer” is a layer composed of nickel (a simple substance), and allows one or more elements different from nickel to be intentionally or inevitably contained as long as the above-described problems can be solved. .
  • chrome powder examples include chromium alone powder, chromium oxide powder, and the like.
  • a tin layer in which chromium powder is dispersed is a layer in which chromium powder is dispersed inside a layer composed of tin (a simple substance). Allows intentional or unavoidable inclusion of one or more kinds of other elements as long as the above problem can be solved.
  • the “tin layer” is a layer composed of tin (a simple substance), and allows one or more elements different from tin to be intentionally or inevitably contained as long as the above-mentioned problems can be solved. .
  • Chromium layer is a layer composed of chromium (a simple substance) or chromium oxide, and contains one or more elements different from chromium intentionally or unavoidably as long as the above problems can be solved. Is acceptable.
  • Gas phase method is a general term for a method of forming a thin film using a gas.
  • gas phase method include sputtering, vapor deposition, ion plating, pulsed laser deposition (PLD), and the like.
  • the “binder” is a material that fixes the chromium powder to the surface of the porous skeleton.
  • specific examples of the binder include various known materials such as polyvinylidene fluoride, styrene butadiene rubber, carboxymethyl cellulose, polytetrafluoroethylene, polyethylene, polypropylene, and polyvinyl alcohol.
  • the porous substrate made of resin material can be removed by burning a porous substrate made of a resin material or dissolving it with a chemical solution.
  • the porous substrate made of resin material is removed by burning, the temperature at which the porous substrate made of resin material is burned and the temperature at which the metal porous body is held during the heat treatment step If there is not much difference between the heat treatment step and the heat treatment step, the porous substrate made of resin material can be removed (the heat treatment step can remove the porous substrate made of resin material). is there).
  • Example 1 Chrome powder dispersion plating The details of Example 1 will be described below.
  • Example 1 is a nickel-tin-chromium alloy porous body, which is an embodiment of the present invention.
  • a 1.5 mm thick foamed polyurethane sheet (pore diameter 0.45 mm) was prepared as a three-dimensional network resin (one embodiment of a porous substrate made of a resin material).
  • 90 g of graphite having an average particle diameter of 0.5 ⁇ m was dispersed in 0.5 L of a 10% by mass acrylic ester resin aqueous solution, and an adhesive paint was produced at this ratio.
  • the foamed polyurethane sheet was continuously dipped in the paint, squeezed with a roll, and then dried to give a conductive treatment, thereby forming a conductive coating layer on the surface of the three-dimensional network resin.
  • the viscosity of the conductive coating was adjusted with a thickener, and the coating weight of the conductive coating after drying was adjusted to 69 g / m 2 so as to obtain a desired alloy composition.
  • a coating film of a conductive paint containing carbon powder is formed on the surface of the three-dimensional network resin.
  • a mixture of tin and chrome powder is 75 g / m in a tin plating solution in which 300 g / m 2 of nickel is dispersed by electroplating on a three-dimensional network resin that has been subjected to a conductive treatment, and then chromium particles having a volume average particle size of 5 ⁇ m are dispersed.
  • m 2 was deposited to form an electroplating layer (one embodiment of a nickel layer and a tin layer containing chromium powder).
  • nickel was a nickel sulfamate plating solution
  • tin was an organic acid bath.
  • Heat treatment process About the metal porous body obtained at the said process, first, it heat-processed for 15 minutes at 800 degreeC in air
  • Example 1 a porous alloy body having a thickness of 1.5 mm, a basis weight of 375 g / m 2 , nickel 80% by mass, tin 15% by mass, and chromium 5% by mass was obtained (Sample 1).
  • Example 2 Nickel plating / tin plating / chromium sputtering Since Example 2 is the same as Example 1 up to the conductive treatment, detailed description is omitted.
  • nickel was a nickel sulfamate plating solution
  • tin was a sulfuric acid bath.
  • a nickel plating layer and a tin plating layer are formed on the coating film of the conductive paint containing carbon powder.
  • 3 g / m 2 of chromium was deposited on the nickel tin porous body by sputtering. Sputtering was performed with a sputtering apparatus into which an inert atmosphere gas was introduced, and the gas pressure during film formation was 0.5 Pa.
  • Example 2 Since the heat treatment step in Example 2 is the same as the heat treatment step in Example 1, detailed description thereof is omitted.
  • the three-dimensional network resin is removed by thermal decomposition.
  • the nickel plating layer, the tin plating layer, and the chromium sputter layer are reduced by the carbon powder contained in the conductive coating layer.
  • the nickel plating layer, the tin plating layer, and the chromium sputter layer are alloyed by thermal diffusion.
  • a porous alloy body having a thickness of 1.5 mm, a basis weight of 363 g / m 2 , nickel of 82.7% by mass, tin of 16.5% by mass and chromium of 0.8% by mass was obtained (Sample 2).
  • Example 3 Nickel plating / tin plating / chromium plating
  • Example 3 the method up to tin plating is the same as in Example 2, and therefore detailed description thereof is omitted.
  • Chromium plating was performed using a commercially available trivalent chromium plating solution and plating with a chromium basis weight of 30 g / m 2 . Since the heat treatment step in Example 3 is the same as the heat treatment step in Example 1, detailed description thereof is omitted. Through the heat treatment step, the three-dimensional network resin is removed by thermal decomposition.
  • the nickel plating layer, the tin plating layer, and the chromium plating layer are reduced by the carbon powder contained in the conductive coating layer. Further, the nickel plating layer, the tin plating layer, and the chromium plating layer are alloyed by thermal diffusion. Finally, a porous alloy body having a thickness of 1.5 mm, a basis weight of 390 g / m 2 , 76.9% by mass of nickel, 15.4% by mass of tin, and 7.7% by mass of chromium was obtained (Sample 3).
  • Example 4 Nickel plating / tin plating / chrome powder coating Since the same method as in Example 2 up to tin plating in Example 4, detailed description is omitted. By going through the steps so far, a porous metal body of nickel 300 g / m 2 and tin 60 g / m 2 was obtained. Subsequently, 12 g of chromium particles having a volume average particle diameter of 3 ⁇ m were dispersed in 0.5 L of a 10% by mass acrylic ester resin aqueous solution, and a chromium powder coating material was produced at this ratio.
  • the porous metal body was immersed in the paint continuously, and the excess paint was removed with an air brush and then dried to form a chromium powder coating layer on the surface of the porous metal body.
  • the viscosity of the coating material was adjusted with a thickener, and the coating weight of the conductive coating material after drying was adjusted to 69 g / m 2 so as to obtain a desired alloy composition. Since the heat treatment step in Example 4 is the same as the heat treatment step in Example 1, detailed description thereof is omitted. Through this step, the three-dimensional network resin is removed by thermal decomposition. The nickel plating layer, tin plating layer, and chromium powder coating layer are reduced by the carbon powder contained in the conductive coating layer.
  • nickel plating layer, tin plating layer and chromium powder coating layer are alloyed by thermal diffusion.
  • an alloy porous body having a thickness of 1.5 mm, a basis weight of 373 g / m 2 , nickel 80.3% by mass, tin 16.1% by mass, and chromium 3.6% by mass was obtained (Sample 4).
  • Embodiment 5 Nickel-tin alloy plating / chromium sputtering Since Embodiment 5 is the same as Embodiment 1 up to the conductive treatment, detailed description thereof is omitted.
  • a commercially available plating solution was used to obtain a nickel-tin alloy porous metal body having a basis weight of 360 g / m 2.
  • chromium sputtering and heat treatment were performed, and finally the thickness of 1.
  • a porous alloy body of 5 mm, basis weight 363 g / m 2 , nickel 30.3% by mass, tin 68.9% by mass, and chromium 0.8% by mass was obtained (Sample 5).
  • Example 6 Nickel-tin alloy plating / chromium plating
  • a nickel-tin alloy porous body was obtained in the same manner as in Example 5, and chromium plating and heat treatment were performed in the same manner as in Example 3.
  • a porous alloy body having an amount of 390 g / m 2 , nickel 28.2% by mass, tin 64.1% by mass, and chromium 7.7% by mass was obtained (Sample 6).
  • Example 7 Nickel-tin alloy plating / chromium powder coating
  • a nickel-tin alloy porous body was obtained in the same manner as in Example 5, chromium powder coating and heat treatment were performed in the same manner as in Example 4, and the final thickness was 1.5 mm.
  • Comparative Example 1 Details of the porous nickel-tin alloy as Comparative Example 1 will be described below.
  • the viscosity of the conductive paint was adjusted with a thickener so that the coating weight of the conductive paint after drying was 55 g / m 2 so as to obtain a desired alloy composition.
  • a coating film of a conductive paint containing carbon powder is formed on the surface of the three-dimensional network resin.
  • Metal plating process Conductive treatment with 3-dimensional network resin 300 g / m 2 of nickel by electroplating subjected, tin 53 g / m 2 adhered to, to form an electroplating layer.
  • nickel was a nickel sulfamate plating solution
  • tin was a sulfuric acid bath.
  • a nickel plating layer and a tin plating layer are formed on the coating film of the conductive paint containing carbon powder.
  • Heat treatment process About the metal porous body obtained at the said process, first, it heat-processed for 15 minutes at 800 degreeC in air
  • Comparative Example 2 Details of the nickel-chromium alloy porous body as Comparative Example 2 will be described below.
  • the viscosity of the conductive paint was adjusted with a thickener so that the coating weight of the conductive paint after drying was 55 g / m 2 so as to obtain a desired alloy composition.
  • a coating film of a conductive paint containing carbon powder is formed on the surface of the three-dimensional network resin.
  • the electroplating layer was formed by depositing 300 g / m 2 of nickel on the three-dimensional network resin subjected to the conductive treatment by electroplating.
  • a nickel sulfamate plating solution was used as nickel.
  • a nickel plating layer is formed on the coating film of the conductive paint containing carbon powder.
  • Heat treatment process About the metal porous body obtained at the said process, first, it heat-processed for 15 minutes at 800 degreeC in air
  • Chromium diffusion process Chromium was diffused in the nickel porous body obtained in the above process by chromization treatment (powder pack method). Penetration material obtained by mixing nickel powder with chromium powder, ammonium chloride and alumina powder (chromium: 90 mass%, NH 4 Cl: 1 mass%, Al 2 O 3 : 9 mass%) is filled with hydrogen A nickel-chromium alloy porous body was obtained by heating to 800 ° C. in a gas atmosphere.
  • the chromium concentration on the surface of the skeleton was measured by fluorescent X-rays on the front and back sides of the sheet-like samples (Sample 1 to Sample 7, Sample 11, Sample 12) obtained in the above Examples and Comparative Examples. The measurement results are shown in Table 1 below.
  • a portable fluorescent X-ray analyzer (NITON XL3t-700 manufactured by Thermo Fisher Scientific) was used, and the measurement unit was applied to the measured surface of the metal porous body.
  • the metal porous bodies of Sample 1 to Sample 7 have a higher chromium concentration on the surface than the chromium composition ratio (average value of the chromium composition ratio when viewed as the whole sample) from the metal amount. More specifically, the surface chromium concentration of the metal porous bodies of Sample 1 to Sample 7 is about 4 to 30 times the composition ratio of chromium from the amount of metal. Therefore, the concentration of chromium contained in the porous metal bodies of Samples 1 to 7 is highest on the surface of the skeleton of the porous metal body, and decreases toward the inside of the skeleton.
  • the concentration of chromium contained in the porous metal body of the sample 12 is substantially the same between the surface of the skeleton of the porous metal body and the inside of the skeleton.
  • Example 1 As a method for evaluating the corrosion resistance of the sheet-like samples (Sample 1 to Sample 7, Sample 11, Sample 12) obtained in the above-described Examples and Comparative Examples, a test based on ASTM G5-94 was performed.
  • the acidic aqueous solution used for anodic polarization curve measurement was prepared by adjusting a 1 mol / L sodium sulfate aqueous solution and adjusting the pH with sulfuric acid.
  • the test temperature was 60 ° C., and hydrogen bubbling was performed during the test to obtain a hydrogen saturated state.
  • the potential range of voltammetry was based on a standard hydrogen electrode, from 0 V to 1.0 V considered to be actually applied in the fuel cell, and the sweep rate was 5 mV / s.
  • anodic polarization measurement of the material can be performed and evaluated by the value of the anode current in the potential range actually used in the fuel cell.
  • JIS G0579 JIS G0579, “Method for measuring anode polarization curves of stainless steel”
  • ASTM G5-94 ASTM G5-94 (2004) Standard Reference Test Method for Making Potentiostatic and Potentiodynamic Anodic Polarization Measurements.
  • ASTM G5-94 describes evaluation for fuel cells, and since it has been adopted for corrosion resistance testing of materials in the fuel cell field, evaluation was performed with reference to that method (Chih-Yeh Chung, et al., J.
  • the current values of Sample 1 to Sample 7 are smaller than the current value of Sample 11 at both test potentials of 0.2 V and 0.8 V. Therefore, it can be seen that Samples 1 to 7 have higher corrosion resistance than Sample 11. Further, when Sample 1 and Sample 2 are compared with Sample 12, the current value when the test potential is 0.2 V is larger than that of Sample 12 but the test potential is 0.8 V. The current value of Sample 1 and Sample 2 is about 1/5 that of Sample 12. Therefore, it can be seen that Sample 1 and Sample 2 are superior in corrosion resistance on the high voltage side as compared to Sample 12. Further, the current value when the corrosion resistance test is repeated (fifth time) does not change much in the samples 1 to 7, whereas the current value of 0.2 V increases in the sample 11 and 0 for the sample 12.

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Abstract

L'invention concerne un élément métallique poreux d'excellente résistance à la corrosion par rapport aux éléments métalliques poreux classiques, cet élément métallique poreux comprenant des alliages binaires nickel-étain ou des alliages binaires nickel-chrome. L'élément métallique poreux a un squelette tridimensionnel de type maille et contient au moins du nickel, de l'étain et du chrome, la concentration de chrome de l'élément métallique poreux étant la plus forte à la surface du squelette de l'élément métallique poreux et allant en décroissant vers l'intérieur du squelette. De plus, il est préféré selon un mode de réalisation que la concentration de chrome à la surface du squelette de l'élément métallique poreux soit de 3-70 % en masse.
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US11228043B2 (en) 2015-08-07 2022-01-18 Sumitomo Electric Industries, Ltd. Fuel battery

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US20160130678A1 (en) 2016-05-12
CN105307802B (zh) 2017-07-07
US10287646B2 (en) 2019-05-14
KR20160021769A (ko) 2016-02-26
EP3012893B1 (fr) 2018-08-29
JP2015004088A (ja) 2015-01-08
CN105307802A (zh) 2016-02-03
JP6055378B2 (ja) 2016-12-27
EP3012893A4 (fr) 2016-07-20
EP3012893A1 (fr) 2016-04-27

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