WO2014190734A1 - 着色感光树脂组合物、含该组合物的彩色滤光片和显示装置 - Google Patents
着色感光树脂组合物、含该组合物的彩色滤光片和显示装置 Download PDFInfo
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- WO2014190734A1 WO2014190734A1 PCT/CN2013/089598 CN2013089598W WO2014190734A1 WO 2014190734 A1 WO2014190734 A1 WO 2014190734A1 CN 2013089598 W CN2013089598 W CN 2013089598W WO 2014190734 A1 WO2014190734 A1 WO 2014190734A1
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- Prior art keywords
- photosensitive resin
- resin composition
- solvent
- colored photosensitive
- composition according
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/02—Materials and properties organic material
- G02F2202/022—Materials and properties organic material polymeric
- G02F2202/023—Materials and properties organic material polymeric curable
Definitions
- Coloring photosensitive resin composition coloring photosensitive resin composition, color filter containing the same, and display device
- Embodiments of the present invention relate to a colored photosensitive resin composition, a color filter comprising the composition, and a display device. Background technique
- Color filters are key components for color display of liquid crystal displays.
- the preparation method of the color filter includes a dyeing method, a pigment dispersion method, a printing method, an electrophoresis method, and the like.
- the most widely used method is the pigment dispersion method.
- the pigment dispersion method is to disperse a pigment with an alkali-soluble resin, a binder, and a monomer solvent to obtain a colored photosensitive resin composition, and then apply the colored photosensitive resin composition on a transparent substrate, by baking, mask exposure, development, and the like.
- the process finally forms a color filter having good film formation, heat resistance, solvent resistance, development compatibility, and excellent pattern precision.
- the components of the colored photosensitive resin composition directly affect its colorimetric properties.
- An embodiment of the present invention provides a colored photosensitive resin composition
- a colored photosensitive resin composition comprising a pigment dispersion liquid, an alkali soluble resin, a photopolymerizable compound, a photopolymerization initiator, an auxiliary agent, an additive, and a solvent, wherein 100% by weight of the total solvent is used.
- the solvent includes 60% to 85% of propylene glycol oxime ether acetate and 15% to 40% of a dibasic acid ester.
- the dibasic acid ester is selected from any one or more of the following: dinonyl succinate, diethyl succinate, dibutyl succinate, diisooctyl succinate, glutaric acid Diterpene ester, diethyl glutarate, dibutyl glutarate, diisooctyl glutarate, dinonyl adipate, diethyl adipate, dibutyl adipate and adipic acid Isooctyl ester.
- the colored photosensitive resin composition comprises 5% to 40% of an alkali-soluble resin, 1% to 15% of a photopolymerizable compound, and 4% by weight based on 100% by weight of the total of the coloring photosensitive resin composition. 45% pigment dispersion, 0.1%-3% photopolymerization initiator, 40%-70% solvent and 0.1%-1% auxiliary.
- the pigment dispersion liquid comprises, according to the total weight of the pigment dispersion liquid, 8% to 20% of the pigment, 2.5% to 10% of the dispersant, 1% to 6% of the binder resin, and 65%. ⁇ 85% solvent.
- the solvent used in the pigment dispersion liquid is 100% by weight based on the total weight of the solvent, and comprises 60% to 85% of propylene glycol oxime ether acetate and 15% to 40% of a dibasic acid ester.
- the pigment is a phthalocyanine, azo or pyrrolopyrrole organic pigment.
- the dispersant is an amide polymer, a modified polyurethane polymer or an acrylate block copolymer.
- the binder resin is an epoxy resin.
- the alkali-soluble resin is an aromatic acid acrylate, a styrene and maleic anhydride copolymer, a urethane acrylate, a hydroxyl group-containing polyester acrylate or a combination thereof.
- the photopolymerizable compound is a vinyl compound, maleimide or phthalimide or a combination thereof.
- the photopolymerization initiator is an acetophenone, an aromatic ketone, an aroma stone sulfonium salt, an iodonium salt or a ferrocenium salt.
- the auxiliary agent is selected from at least one of the following: an ultraviolet absorber, a silicone leveling agent, a silicone type leveling agent, a diphenyl polysiloxane, a nonylphenyl polysiloxane, an organic Modified silicone or organically modified fluorinated siloxane.
- Another embodiment of the present invention provides a color filter.
- the color filter provided by the present invention comprises a color film, wherein the color film is made of the above colored photosensitive resin composition.
- Another embodiment of the present invention provides a display device including the above color filter.
- Figure 1 is a schematic view of a glass substrate coated with a red photosensitive resin composition prepared in Comparative Example 1;
- FIG. 2 is a schematic view of a glass substrate coated with a red photosensitive resin composition prepared in Comparative Example 2.
- Figure 3 is a schematic view of a glass substrate coated with a red photosensitive resin composition prepared in Comparative Example 3;
- Figure 4 is a schematic view showing a glass substrate coated with a red photosensitive resin composition prepared in Example 1 of the present invention
- Figure 6 is a schematic view showing a glass substrate coated with a red photosensitive resin composition prepared in Example 3 of the present invention.
- Fig. 7 is a schematic view showing a glass substrate coated with a red photosensitive resin composition prepared in Example 4 of the present invention. detailed description
- the colored photosensitive resin composition of the embodiment of the present invention comprises a pigment dispersion liquid, an alkali soluble resin, a photopolymerizable compound, a photopolymerization initiator, an auxiliary agent, and a solvent, wherein the solvent comprises 60% by weight based on 100% of the total weight of the solvent. ⁇ 85% propylene glycol oxime ether acetate and 15% to 40% dibasic acid ester.
- the surface fluidity of the colored photosensitive resin composition is controlled by improving the composition of the solvent, and the difference in surface tension is eliminated to adjust the surface flow of the coating film to leave the coating film flat, thereby using the colored photosensitive resin according to the embodiment of the present invention.
- the color filter prepared by the composition has enhanced surface flatness, reduced edge residue, and improved edge uniformity.
- the colored photosensitive resin composition comprises 5% to 40% of an alkali-soluble resin, 1% to 15% of a photopolymerizable compound, and 4% to 45% of a pigment based on 100% by weight based on the total weight of the photosensitive photosensitive resin composition.
- a pigment dispersion liquid an alkali soluble resin, a photopolymerizable compound, a photopolymerization initiator, and an auxiliary agent are all known in the art.
- a pigment dispersions, alkali-soluble resins, photopolymerizable compounds, photopolymerization initiators, and auxiliary agents are exemplified, and the present invention is not limited to the examples.
- the pigment may be a phthalocyanine, azo or pyrrolopyrrole organic pigment
- the dispersant may be an amide polymer, a modified polyurethane polymer or an acrylate block copolymer
- An epoxy resin such as a dispersion resin 2388
- the alkali soluble resin may be an aromatic acid acrylate, a styrene and maleic anhydride copolymer, a urethane acrylate, a hydroxyl group-containing polyester acrylate or a combination thereof
- a photopolymerizable compound may be a vinyl compound, maleimide or phthalimide or a combination thereof
- the photopolymerization initiator may be an acetophenone, an aromatic ketone, an aromatic sulfonium salt, an iodonium salt or a ferrocenium salt
- the auxiliary agent may be selected from at least one of the following: an ultraviolet absorber, a silicone leveling agent, a silicone type leveling agent
- the colored photosensitive composition may further comprise one or more additives, such as additive KH560 (epoxypropoxy trimethoxysilane obtained from Shin-Etsu Chemical Co., Ltd.) and/or additive DL602 (from Japan) Shin-Etsu Chemical's aminopropyl-decyldimethoxysilane); when present, may be present in an amount from 0.05 to 1.5% by weight based on the total weight of the colored photosensitive composition.
- additive KH560 epoxypropoxy trimethoxysilane obtained from Shin-Etsu Chemical Co., Ltd.
- additive DL602 from Japan
- Shin-Etsu Chemical's aminopropyl-decyldimethoxysilane when present, may be present in an amount from 0.05 to 1.5% by weight based on the total weight of the colored photosensitive composition.
- the colored photosensitive composition can be mixed by a general method commonly used in the art, and is not particularly limited.
- the colored photosensitive resin composition of the embodiment of the present invention can be used for preparing a color filter.
- the preparation process of the color filter may be carried out by a technique commonly used in the art, and is not particularly limited.
- the colored photosensitive resin composition of the present invention is better described below in conjunction with specific examples,
- the red photosensitive resin is taken as an example, and the photosensitive resin of other colors can be determined according to the selection of the pigment dispersion, which is not limited herein.
- step b Add 100 mg of red pigment PR254 to the dispersion prepared in step a, stir for 1 hour, c: add 500 g of solvent to the liquid prepared in step b, and grind for 2 hours, wherein the total weight of the solvent is 100% by weight, the solvent comprises 60% propylene glycol oxime ether acetate, 15% dinonyl succinate, 10% dinonyl adipate, 15% diisooctyl succinate.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/240,538 US9291894B2 (en) | 2013-05-30 | 2013-12-16 | Colored photosensitive resin composition and colored filter and display device containing such composition |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310210128.6A CN103293856B (zh) | 2013-05-30 | 2013-05-30 | 着色感光树脂组合物、彩色滤光片和显示装置 |
| CN201310210128.6 | 2013-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2014190734A1 true WO2014190734A1 (zh) | 2014-12-04 |
Family
ID=49094980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2013/089598 Ceased WO2014190734A1 (zh) | 2013-05-30 | 2013-12-16 | 着色感光树脂组合物、含该组合物的彩色滤光片和显示装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9291894B2 (zh) |
| CN (1) | CN103293856B (zh) |
| WO (1) | WO2014190734A1 (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103293856B (zh) | 2013-05-30 | 2015-04-01 | 京东方科技集团股份有限公司 | 着色感光树脂组合物、彩色滤光片和显示装置 |
| JP6420634B2 (ja) * | 2014-03-26 | 2018-11-07 | 株式会社Adeka | レジスト組成物、カラーレジスト組成物及び該組成物を用いたカラーフィルタ |
| CN104166310A (zh) * | 2014-07-17 | 2014-11-26 | 京东方科技集团股份有限公司 | 黑矩阵组合物及其制备方法、显示面板和显示装置 |
| KR101840595B1 (ko) * | 2017-03-21 | 2018-03-20 | 동우 화인켐 주식회사 | 적색 화소용 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치 |
| KR102108232B1 (ko) * | 2017-03-21 | 2020-05-08 | 동우 화인켐 주식회사 | 적색 화소용 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치 |
| JP7025939B2 (ja) * | 2018-01-23 | 2022-02-25 | サカタインクス株式会社 | カラーフィルター用顔料分散組成物及びカラーフィルター用レジスト組成物 |
| CN110187602B (zh) * | 2019-05-14 | 2020-10-13 | 深圳市华星光电技术有限公司 | 彩色光刻胶组合物 |
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| JP2000256565A (ja) * | 1999-03-08 | 2000-09-19 | Idemitsu Kosan Co Ltd | 蛍光変換膜用樹脂組成物、蛍光変換膜およびカラー化有機エレクトロルミネッセンス素子 |
| US20030036006A1 (en) * | 2001-03-26 | 2003-02-20 | Shipley Company, L.L.C. | Methods for monitoring photoresists |
| CN101295051A (zh) * | 2007-04-26 | 2008-10-29 | 富士胶片株式会社 | 滤色器及其制造方法以及显示装置 |
| CN101750887A (zh) * | 2008-12-19 | 2010-06-23 | 京东方科技集团股份有限公司 | 感光树脂组合物 |
| JP2010184880A (ja) * | 2009-02-10 | 2010-08-26 | Mitsubishi Chemicals Corp | ジベンゾピロメテンホウ素キレート化合物及びその製造方法、並びにこれを用いた太陽電池、光重合性組成物、光記憶媒体、発光素子、光学フィルター、及び医療診断用蛍光色素 |
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| CN103293856A (zh) * | 2013-05-30 | 2013-09-11 | 京东方科技集团股份有限公司 | 着色感光树脂组合物、彩色滤光片和显示装置 |
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| JP5002323B2 (ja) * | 2007-04-27 | 2012-08-15 | 東京応化工業株式会社 | 含フッ素高分子化合物、液浸露光用ポジ型レジスト組成物、及びレジストパターン形成方法 |
| CN101760042B (zh) * | 2008-12-24 | 2013-03-27 | 京东方科技集团股份有限公司 | 颜料分散方法、颜料混合物、光固化油墨和热固化油墨 |
| JP5308871B2 (ja) * | 2009-03-06 | 2013-10-09 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法 |
| CN102081301B (zh) * | 2009-11-26 | 2014-10-22 | 京东方科技集团股份有限公司 | 感光树脂组合物及其制备方法 |
| JP5283747B2 (ja) * | 2011-02-09 | 2013-09-04 | 富士フイルム株式会社 | 着色感放射線性組成物、カラーフィルタ、その製造方法、固体撮像素子、及び液晶表示装置 |
-
2013
- 2013-05-30 CN CN201310210128.6A patent/CN103293856B/zh active Active
- 2013-12-16 US US14/240,538 patent/US9291894B2/en not_active Expired - Fee Related
- 2013-12-16 WO PCT/CN2013/089598 patent/WO2014190734A1/zh not_active Ceased
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000256565A (ja) * | 1999-03-08 | 2000-09-19 | Idemitsu Kosan Co Ltd | 蛍光変換膜用樹脂組成物、蛍光変換膜およびカラー化有機エレクトロルミネッセンス素子 |
| US20030036006A1 (en) * | 2001-03-26 | 2003-02-20 | Shipley Company, L.L.C. | Methods for monitoring photoresists |
| CN101295051A (zh) * | 2007-04-26 | 2008-10-29 | 富士胶片株式会社 | 滤色器及其制造方法以及显示装置 |
| CN101750887A (zh) * | 2008-12-19 | 2010-06-23 | 京东方科技集团股份有限公司 | 感光树脂组合物 |
| JP2010184880A (ja) * | 2009-02-10 | 2010-08-26 | Mitsubishi Chemicals Corp | ジベンゾピロメテンホウ素キレート化合物及びその製造方法、並びにこれを用いた太陽電池、光重合性組成物、光記憶媒体、発光素子、光学フィルター、及び医療診断用蛍光色素 |
| CN102566270A (zh) * | 2010-11-19 | 2012-07-11 | 株式会社东进世美肯 | 光致抗蚀剂组合物 |
| CN103045015A (zh) * | 2013-01-25 | 2013-04-17 | 深圳市万佳原丝印器材有限公司 | 液态感光成像碱显影抗阳极氧化油墨及其制备方法 |
| CN103293856A (zh) * | 2013-05-30 | 2013-09-11 | 京东方科技集团股份有限公司 | 着色感光树脂组合物、彩色滤光片和显示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US9291894B2 (en) | 2016-03-22 |
| CN103293856B (zh) | 2015-04-01 |
| CN103293856A (zh) | 2013-09-11 |
| US20150153643A1 (en) | 2015-06-04 |
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