WO2014136861A1 - Élément composite comportant un film décoratif ayant un brillant métallique - Google Patents

Élément composite comportant un film décoratif ayant un brillant métallique Download PDF

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Publication number
WO2014136861A1
WO2014136861A1 PCT/JP2014/055723 JP2014055723W WO2014136861A1 WO 2014136861 A1 WO2014136861 A1 WO 2014136861A1 JP 2014055723 W JP2014055723 W JP 2014055723W WO 2014136861 A1 WO2014136861 A1 WO 2014136861A1
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Prior art keywords
film
composite member
decorative film
layer
base material
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PCT/JP2014/055723
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English (en)
Japanese (ja)
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瀧　優介
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株式会社ニコン
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/005—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
    • B32B9/007—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/554—Wear resistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/584—Scratch resistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/702—Amorphous
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/718—Weight, e.g. weight per square meter
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment

Definitions

  • the present invention relates to a composite member in which a decorative film having a metallic luster is formed as an uppermost layer, and an optical component and an electronic component including the composite member.
  • Metals such as aluminum alloys and resins are used as base materials for composite members that make up the body of digital cameras and mobile phones.
  • Design elements such as the shape and appearance of such composite members are important factors that greatly influence the commercial value of digital cameras, mobile phones, and the like.
  • the appearance of the base material formed from the resin is poor in quality, and may be insufficient in terms of adding commercial value. Therefore, conventionally, a composite member in which a metal film is formed as a decorative film on a lightweight and inexpensive resin base material molded by a method such as injection molding has been used. As a result, the composite member could be given a metallic luster, and an attempt was made to ensure high-quality design.
  • the present invention has been made in view of such circumstances, and an object thereof is to provide a composite member having a metallic luster and a metallic material feeling and having high wear resistance. Furthermore, an object of this invention is to provide an optical component and an electronic component provided with such a composite member.
  • a composite member comprising: A substrate; A decorative film as the uppermost layer covering the substrate; A composite member in which the decorative film is amorphous carbon doped with metal and has a thickness of 10 nm or more is provided.
  • the decorative film may have a thickness of 300 nm or less.
  • the decorative film may have an electrical resistivity in a range of 1 ⁇ 10 ⁇ 5 ⁇ cm to 8 ⁇ 10 ⁇ 3 ⁇ cm.
  • the decorative film may have a hardness of 10 GPa to 20 GPa.
  • an underlayer may be provided between the base material and the decorative film.
  • the foundation layer may include a resin layer.
  • the underlayer may be a transparent layer and / or a colored layer.
  • a colored layer may be provided between the base material and the decorative film, and a transparent layer may be further provided between the colored layer and the base material.
  • the decorative film may be provided directly on the base material.
  • the base material may be a colored base material.
  • the decorative layer may have a thickness of 10 to 20 nm.
  • the base material may be plastic.
  • the metal may be titanium or aluminum.
  • the base material may be a camera housing part.
  • an optical apparatus provided with the composite member of the first aspect is provided.
  • an electronic apparatus including the composite member of the first aspect is provided.
  • the composite member 100 of 1st Embodiment has the base material 60 and the decoration film
  • the “uppermost layer” means a layer that appears on the outermost surface of the composite member, and no other layer exists on the layer.
  • the “decorative film” is a film formed to enhance the design of the product on all or part of the part appearing on the appearance of the product, and does not appear on the product appearance due to connection with other members.
  • the decorative film does not include a film formed on the part, for example, a film that is formed on a part that is in sliding contact with another member and is not exposed to the outside in a use state.
  • the base material 60 of the composite member 100 is formed of, for example, a metal such as aluminum or stainless steel, an inorganic material such as ceramic, an organic material such as resin, or the like, and has an arbitrary shape. It is possible to use a camera housing component having the same. Since the resin is inexpensive and has a small specific gravity, it is possible to reduce the weight of the composite member and to mass-produce it at low cost by using the base material 60 formed by injection molding of the resin. As the resin, a resin (plastic) suitable for mass production processes such as injection molding is preferable.
  • polycarbonate polyethylene, polyvinyl chloride, polystyrene, ABS resin, polypropylene, polyvinyl acetate, acrylic resin (PMMA), polyethylene terephthalate (PET), fluororesin such as polytetrafluoroethylene (PTFE), polyetheretherketone (PEEK), polyamideimide (PAI), polyphenylene sulfide (PPS), polyester resin, and glass fiber and carbon in these resins
  • PTFE polytetrafluoroethylene
  • PEEK polyetheretherketone
  • PAI polyamideimide
  • PPS polyphenylene sulfide
  • polyester resin glass fiber and carbon in these resins
  • glass fiber and carbon in these resins Various thermoplastic resins such as a resin to which fibers are added can be used.
  • the base material 60 may be colored by, for example, kneading a pigment or a dye into the base material.
  • the decorative film 80 is made of amorphous carbon doped with metal.
  • the amorphous carbon, sp 3 bonded carbon sp 3 -C, carbon composition carbon sp 2 -C of sp 2 bonded corresponding to graphite is a mixture randomly corresponding to the diamond (hereinafter, as "a-C ”).
  • Amorphous carbon is a material that has the characteristics of both diamond and graphite, and has high hardness and excellent wear resistance.
  • Ti, Ni, Cr, Al, Mg can be used from the viewpoint of wear resistance of the decorative film 80, metallic appearance (metallic luster) and material feeling, particularly metallic appearance. Cu, Fe, Ag, Au, Pt and the like. Of these, Ti, Al, Cr, Ni, and Fe are preferable, and Ti and Al are particularly preferable.
  • the metal content (dope amount) in the decorative film 80 is 1 to 33 at%, particularly 1 to 20 at%, in order to maintain the wear resistance and the metallic appearance and texture of the decorative film 80 appropriately. desirable. When the content is less than 1 at%, the metallic appearance (metallic luster) and the material feeling are insufficient. If the content exceeds 20 at%, the hardness of the decorative film 80 decreases and the wear resistance tends to deteriorate.
  • the amorphous carbon layer doped with metal of the decorative film 80 has a thickness of 10 nm or more. If the thickness of the decorative film 80 is less than 10 nm, it is difficult to recognize the metallic luster of the decorative film 80. Furthermore, the amorphous carbon layer doped with metal of the decorative film 80 preferably has a film thickness of 300 nm or less. When the film thickness of the decorative film 80 exceeds 300 nm, a lot of film formation time and material for the decorative film 80 are required, and the productivity of the manufacturing process of the composite member 100 is reduced. In this respect, the upper limit of the thickness of the decorative film 80 is particularly preferably 100 nm.
  • the thickness of the decorative film 80 is 20 nm or less, the light transmittance of the decorative film 80 increases, and the hue of the substrate 60 can be seen through the decorative film 80. Therefore, when the base material 60 colored in a desired color or a colored layer on the base material 60 is provided, the composite member 100 having a desired color metallic luster can be obtained, so that the film of the decorative film 80 is used. More preferably, the thickness is 10 nm to 20 nm.
  • the amorphous carbon layer doped with metal of the decorative film 80 preferably has an electrical resistivity in the range of 1 ⁇ 10 ⁇ 5 ⁇ cm to 8 ⁇ 10 ⁇ 3 ⁇ cm.
  • Low electrical resistivity is a property unique to metal binding materials having free electrons.
  • a metallic texture due to metallic luster and high heat transfer is also a property that can be obtained by the presence of free electrons. Therefore, when the electrical resistivity of the decorative film 80 is equal to or lower than the above upper limit, the decorative film 80 has free electrons. Therefore, the composite member 100 including the decorative film 80 may have a desired metallic luster and metallic feel. it can.
  • the electrical resistivity of the decorative film 80 is less than the lower limit, the film is extremely soft like a noble metal, and the wear resistance of the composite member 100 including the decorative film 80 becomes insufficient. Is appropriate.
  • the amorphous carbon doped with metal of the decorative film 80 preferably has a hardness of 10 GPa to 20 GPa.
  • the hardness of the decorative film 80 is less than the lower limit, the wear resistance of the composite member 100 including the decorative film 80 becomes insufficient, and the composite member 100 may be damaged or the decorative film 80 may be peeled off.
  • the hardness of the decorative film 80 exceeds the above upper limit, it becomes a transparent film having almost no free electrons and does not exhibit a metallic luster.
  • the composite member 200 of this embodiment includes a base layer between the base material 60 and the decorative film 80 as shown in FIG.
  • the foundation layer in the second embodiment is the transparent layer 120.
  • the transparent layer 120 can be formed by spray coating a resin called a clear coat.
  • the base layer transparent layer 120
  • the composite member 200 including the transparent layer 120 between the base material 60 and the decorative film 80 can have high quality appearance quality with small roughness and few defects.
  • the composite member 300 of this embodiment includes an underlayer between the base material 60 and the decorative film 80.
  • the ground layer in the third embodiment is a colored layer 140.
  • the thickness of the decorative film 80 is preferably 10 to 20 nm.
  • the colored layer 80 can be formed by spray-coating a clear coat resin containing a pigment or dye that absorbs light in a specific wavelength band.
  • the composite member 400 of this embodiment includes a base layer between the base material 60 and the decorative film 80 as shown in FIG.
  • the foundation layer in the fourth embodiment includes a colored layer 140 and a transparent layer 120 between the colored layer 140 and the substrate 60.
  • the thickness of the decorative film 80 is preferably 10 to 20 nm.
  • the transparent layer 120 can be formed by spray coating a resin called a clear coat. By forming the transparent layer 120, when the surface of the substrate 60 has irregularities or defects, the irregularities and defects of the substrate 60 can be filled. Therefore, the composite member 400 including the transparent layer 120 between the base material 60 and the decorative film 80 can have high quality appearance quality with small roughness and few defects.
  • the FCVA film forming apparatus 1 mainly includes an arc plasma generating unit 10, a filter unit 20, and a film forming chamber unit 30.
  • the arc plasma generation unit 10 and the film forming chamber unit 30 are connected by the filter unit 20, and the pressure of the film forming chamber unit 30 is set to a vacuum degree of about 10 ⁇ 5 [Torr] by a vacuum device (not shown).
  • the arc plasma generator 10 is provided with a target 11 which is a cathode and an anode (striker), and an arc discharge is generated by bringing the striker into contact with the target 11 and separating immediately after the striker.
  • a target 11 which is a cathode and an anode (striker)
  • arc plasma carbon plasma
  • the neutral carbon particles and carbon ions generated by the arc plasma fly through the filter unit 20 toward the film forming chamber unit 30.
  • a graphite target containing a metal and not containing hydrogen is used.
  • the metal species include Ti, Ni, Cr, Al, Mg, Cu, Fe, Ag, Au, and Pt as described above.
  • the filter unit 20 is provided with a duct 23 around which an electromagnetic coil 21 is wound and an ion scanning coil 25.
  • the duct 23 is bent twice in two orthogonal directions between the arc plasma generating unit 10 and the film forming chamber unit 30, and an electromagnet coil 21 is wound around the outer periphery thereof. Since the duct 23 has such a bent structure (double bend structure), neutral particles in the duct 23 are removed by colliding with the inner wall surface and being deposited.
  • Lorentz force acts on the charged particles inside the duct 23, and is concentrated in the central region of the duct cross section, flies along the duct bend, and enters the film forming chamber 30.
  • Can lead That is, the electromagnetic coil 21 and the duct 23 constitute a narrow-band electromagnetic spatial filter that allows only charged particles to pass with high efficiency.
  • the ion scanning coil 25 scans the beam of charged particles that passes through the duct 23 and enters the film forming chamber 30 as described above, and is uniformly aC: on the surface of the substrate 32 held by the holder 31.
  • An M film is formed.
  • the base material may be an arbitrary material made of an organic material such as a resin or an inorganic material such as a metal or ceramic.
  • a plastic such as a resin, or a metal such as aluminum or stainless steel is used.
  • the film forming chamber section 30 is provided with a plate-shaped holder 31 facing the outlet of the filter section 20, and a base material 32 is set on the surface of the holder 31.
  • the holder 31 can be rotated around its rotation axis by a motor 35.
  • An arbitrary bias can be set to the holder 31 by a power source 37.
  • a component having a composite member as described above is also provided.
  • the composite member of the above embodiment can be used for parts of various applications from the viewpoint of the high wear resistance, the metallic appearance (metallic luster) and the metallic material feeling of the composite member. Suitable for parts such as digital cameras, optical devices such as binoculars, glasses, etc., electronic devices such as mobile phones, smartphones, portable music devices, portable video devices, etc. .
  • Examples 1-7 Using an FCVA film forming apparatus 1 as shown in FIG. 5, an aC: Ti film (titanium-doped amorphous carbon film) was produced as an amorphous carbon layer on the substrate by the FCVA method.
  • a target 11 containing a metal element a sintered graphite target containing 2.15 [at%] of Ti was used. The sintered graphite target used was dehydrated. A polycarbonate substrate was used as the base material.
  • aC As the operating condition of the FCVA film forming apparatus 1 when forming the Ti film, the current of the arc power source (cathode side power source) in the arc plasma generation unit 10 is 60 A, and the current of the electromagnetic coil 21 in the filter unit 20 (filter Current) was 13 A, the anode-side power source current (anode current) in the arc plasma generator 10 was 8 A, and the voltage (duct voltage) of the ion scanning coil 25 was 0.2 V. The bias power supply voltage was floating.
  • the aC Ti film was adjusted to various film thicknesses as shown in the table of FIG. 6 by controlling the film formation time.
  • Examples 8 and 9 Using the FCVA film forming apparatus 1 used in Examples 1 to 7, an aC: Al film (aluminum-doped amorphous carbon film) was formed as an amorphous carbon layer on the substrate by the FCVA method.
  • aC: Al film aluminum-doped amorphous carbon film
  • the target 11 containing a metal element a sintered graphite target containing 8.5 [at%] of Al was used. The sintered graphite target used was dehydrated. A polycarbonate substrate was used as the base material.
  • the arc current of the arc power source (cathode side power source) in the arc plasma generation unit 10 is 70 A
  • the current of the electromagnetic coil 21 in the filter unit 20 The filter current was 13 A
  • the anode-side power source current (anode current) in the arc plasma generator 10 was 8 A
  • the voltage (duct voltage) of the ion scanning coil 25 was 0.2 V.
  • the bias power supply voltage was floating.
  • the film thickness of the aC: Al film was adjusted to 15 nm and 300 nm, respectively, by controlling the film formation time.
  • Comparative Example 1 A Ti film was produced on the substrate by the FCVA method using the FCVA film forming apparatus 1 used in the examples.
  • a Ti target was used as the target 11.
  • a polycarbonate substrate was used as the substrate.
  • the arc current of the arc power source (cathode side power source) in the arc plasma generation unit 10 is 140 A
  • the current (filter current) of the electromagnet coil 21 in the filter unit 20 is
  • the current (anode current) of the anode side power source in the arc plasma generator 10 was 10.5 A
  • the voltage (duct voltage) of the ion scanning coil 25 was 0.5 V.
  • the bias power supply voltage was floating.
  • the thickness of the Ti film was set to 200 nm by controlling the film formation time.
  • Comparative Example 2 An aC: Ti film was prepared in the same manner as in Example 1 except that the film thickness of the aC: Ti film was changed to 5 nm.
  • the reflectance and transmittance at a wavelength of 500 nm were measured with a visible spectrophotometer. Further, the chromaticity of the sample was measured with a color computer SM-4 type manufactured by Suga Test Instruments Co., Ltd. The results are shown in the table of FIG.
  • the samples of Examples 1 to 9 had a reflectance of 29.7 to 34.1%.
  • the sample of Comparative Example 1 had a reflectance of 53.2%.
  • the sample of Comparative Example 2 had a reflectance of 10.7%.
  • the wear resistance of the samples of Examples 1 to 9 and Comparative Examples 1 and 2 was evaluated by a steel wool test.
  • the steel wool test is performed by a rubbing tester (manufactured by Kei Este Co., Ltd.) attached with steel wool (steel wool No. 0000), and the steel wool is pressed against the sample with a load of 200 gf and reciprocated 80 times with an amplitude of 30 mm.
  • the case where no scratch was visually confirmed was accepted (denoted as “ ⁇ ” in the table), and the case where a scratch was visually confirmed was regarded as unacceptable (denoted as “x” in the table).
  • the results are shown in the table of FIG. All of the samples of Examples 1 to 9 passed, but the samples of Comparative Examples 1 and 2 failed because they were scratched by steel wool.
  • Example 10 A sample was prepared in the same manner as in Example 2 except that an ultraviolet curable coating layer was formed between the substrate and the aC: Ti film.
  • the UV-curing coat layer was prepared by manually spray-coating a commercially available UV lacquer acrylic lacquer paint on a polycarbonate substrate.
  • the film thickness of the ultraviolet curable coating layer was 8 ⁇ m.
  • Example 11 A sample was prepared in the same manner as in Example 8 except that an ultraviolet curable coating layer was formed between the substrate and the aC: Al film.
  • the ultraviolet curable coating layer was produced by the spray coating method in the same manner as in Example 10.
  • the film thickness of the ultraviolet curable coating layer was 8 ⁇ m.
  • Example 12 A sample was prepared in the same manner as in Example 10 except that a pigmented ultraviolet curable coating layer was formed between the ultraviolet curable coating layer and the aC: Ti film.
  • the UV-cured coat layer containing the pigment was prepared by manually spray-coating a commercially available UV-curable clear coating composition with a blue pigment blended onto the UV-cured coat layer.
  • the film thickness of the ultraviolet curable coating layer containing the pigment was 8 ⁇ m.
  • Example 13 A sample was prepared in the same manner as in Example 11 except that an ultraviolet curable coating layer containing a pigment was formed between the ultraviolet curable coating layer and the aC: Al film.
  • the pigmented UV curable coating layer was prepared in the same manner as in Example 12.
  • the film thickness of the ultraviolet curable coating layer containing the pigment was 8 ⁇ m.
  • Comparative Example 3 A sample was prepared in the same manner as in Example 11 except that an Al film was formed instead of the aC: Al film.
  • the Al film was produced by the FCVA film forming apparatus 1 used in the examples.
  • the arc current of the arc power source (cathode side power source) in the arc plasma generation unit 10 is 160 A
  • the current (filter current) of the electromagnetic coil 21 in the filter unit 20 is
  • the current (anode current) of the anode side power source in the arc plasma generator 10 was 10.5 A
  • the voltage (duct voltage) of the ion scanning coil 25 was 0.5 V.
  • the bias power supply voltage was floating.
  • the thickness of the Al film was set to 200 nm by controlling the film formation time.
  • Comparative Example 4 A sample was prepared in the same manner as in Comparative Example 3 except that an ultraviolet curable coating layer was formed on an Al film having a thickness of 20 nm.
  • the ultraviolet curable coating layer was prepared by the spray coating method in the same manner as in Example 10.
  • the film thickness of the ultraviolet curable coating layer was 8 ⁇ m.
  • the thickness of the Al film was set to 20 nm by controlling the film formation time.
  • Comparative Example 5 A sample was prepared in the same manner as in Example 13 except that an Al film was formed instead of the aC: Al film.
  • the Al film was produced in the same manner as in Comparative Example 3.
  • the thickness of the Al film was set to 20 nm by controlling the film formation time.
  • Comparative Example 6 A sample was prepared in the same manner as in Comparative Example 5 except that an ultraviolet curable coating layer was formed on an Al film having a thickness of 20 nm.
  • the ultraviolet curable coating layer was prepared by the spray coating method in the same manner as in Example 10.
  • the film thickness of the ultraviolet curable coating layer was 8 ⁇ m.
  • the thickness of the Al film was set to 20 nm by controlling the film formation time.
  • Example 10 to 13 and Comparative Examples 3 to 6 For the samples of Examples 10 to 13 and Comparative Examples 3 to 6 produced as described above, the presence or absence of metallic luster was measured in the same manner as in Example 1. The results are shown in the table of FIG.
  • the samples of Comparative Examples 4 and 6 on which the UV-cured coating layer was not formed did not have a metallic luster (metallic material feeling).
  • the samples of Comparative Examples 4 and 6 seem to have a metallic texture at first glance, but because of the gloss from the metal film seen through the UV cured coating layer, It feels different from the metallic luster that can be felt when viewing. Thus, it can be seen that in order to obtain a metallic feel, it is necessary to dispose a layer having metallic luster on the outermost layer.
  • the aC: M film used in the examples has wear resistance and metallic luster (metallic material feeling).
  • a member having such an aC: M film formed on the surface has high appearance quality due to metallic luster and can maintain appearance quality for a long time due to high wear resistance.
  • the amorphous carbon film doped with metal is a tetrahedral amorphous carbon film doped with metal (ta-C: M film). Met.
  • the ta-C: M film can be formed by the FCVA method using a carbon target containing a metal element.
  • the present invention is not limited to these embodiments and examples.
  • titanium and aluminum are shown as an example of the metal doping element M of aC: M.
  • the metal doping element is a film based on aC. Any other metal element such as Ni, Cr, Mg, Cu, Fe, Ag, Au, or Pt may be used.
  • the part having the composite member of this embodiment can be applied to a wide range of uses.
  • Electronic devices for example, digital cameras, optical devices such as binoculars and glasses, mobile phones, smartphones, portable music devices, portable video devices, etc., whose design elements such as shape and appearance are important factors that greatly influence the product value.
  • Electronic devices are important factors that greatly influence the product value.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

L'invention porte sur un élément composite (100), lequel élément comprend un substrat (60), et un film décoratif (80) qui recouvre ledit substrat, et dans lequel ledit film décoratif (80) est du carbone amorphe dopé par un métal, et présente une épaisseur de 10 nm ou plus. A cet effet, la présente invention porte sur : un élément composite qui présente une excellente résistance à l'usure et qui possède, formé sur celui-ci, un film décoratif ayant un brillant métallique et une texture métallique ; et un composant optique et un composant électronique comportant ledit élément composite.
PCT/JP2014/055723 2013-03-06 2014-03-06 Élément composite comportant un film décoratif ayant un brillant métallique WO2014136861A1 (fr)

Applications Claiming Priority (2)

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JP2013-043964 2013-03-06
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113542553A (zh) * 2021-06-15 2021-10-22 荣耀终端有限公司 一种摄像头装饰件、制作方法及电子设备
CN115896695A (zh) * 2023-01-09 2023-04-04 北京华锐臻隆技术有限公司 耐氙灯测试的复合板材及其镀膜方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6326350A (ja) * 1985-12-17 1988-02-03 テヒニシェ、ユニベルジテ−ト、カルル−マルクス−シュタット 機械的かつ腐食的に応力がかかるエレメント用の硬質被覆物
JP2002501575A (ja) * 1997-05-30 2002-01-15 パティノール アーエス 真空内でダイヤモンド質のカーボン薄膜を成膜する方法
JP3134340U (ja) * 2007-06-01 2007-08-09 株式会社Ｎｃｃ 物品の装飾コーティング構造
JP2009293110A (ja) * 2008-06-09 2009-12-17 Toyota Central R&D Labs Inc 被覆部材の製造方法および被覆部材
WO2011138967A1 (fr) * 2010-05-07 2011-11-10 株式会社ニコン Film conducteur coulissant, élément formé à partir d'un film conducteur coulissant, et procédé de production de celui-ci

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6326350A (ja) * 1985-12-17 1988-02-03 テヒニシェ、ユニベルジテ−ト、カルル−マルクス−シュタット 機械的かつ腐食的に応力がかかるエレメント用の硬質被覆物
JP2002501575A (ja) * 1997-05-30 2002-01-15 パティノール アーエス 真空内でダイヤモンド質のカーボン薄膜を成膜する方法
JP3134340U (ja) * 2007-06-01 2007-08-09 株式会社Ｎｃｃ 物品の装飾コーティング構造
JP2009293110A (ja) * 2008-06-09 2009-12-17 Toyota Central R&D Labs Inc 被覆部材の製造方法および被覆部材
WO2011138967A1 (fr) * 2010-05-07 2011-11-10 株式会社ニコン Film conducteur coulissant, élément formé à partir d'un film conducteur coulissant, et procédé de production de celui-ci

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113542553A (zh) * 2021-06-15 2021-10-22 荣耀终端有限公司 一种摄像头装饰件、制作方法及电子设备
WO2022262431A1 (fr) * 2021-06-15 2022-12-22 荣耀终端有限公司 Élément de décoration de caméra, procédé de fabrication et dispositif électronique
CN115896695A (zh) * 2023-01-09 2023-04-04 北京华锐臻隆技术有限公司 耐氙灯测试的复合板材及其镀膜方法

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