WO2014075354A1 - 一种液晶显示装置及其制造方法 - Google Patents

一种液晶显示装置及其制造方法 Download PDF

Info

Publication number
WO2014075354A1
WO2014075354A1 PCT/CN2012/085390 CN2012085390W WO2014075354A1 WO 2014075354 A1 WO2014075354 A1 WO 2014075354A1 CN 2012085390 W CN2012085390 W CN 2012085390W WO 2014075354 A1 WO2014075354 A1 WO 2014075354A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid crystal
crystal display
dimensional
layer
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2012/085390
Other languages
English (en)
French (fr)
Inventor
徐亮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US13/806,966 priority Critical patent/US20140139799A1/en
Publication of WO2014075354A1 publication Critical patent/WO2014075354A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices

Definitions

  • Liquid crystal display device and method of manufacturing same
  • the present invention relates to the field of image display, and in particular to a liquid crystal display device and a method of fabricating the same. Background technique
  • TFT-LCDs thin film transistor liquid crystal displays
  • the aperture ratio is simply the ratio of the effective light transmission area to the total area through which light can pass. When light is emitted through the backlight, not all of the light can pass through the panel. For example, various wirings and the TFT itself, as well as storage capacitors for storing voltage, will block the light, resulting in a low aperture ratio.
  • various wirings and the TFT itself, as well as storage capacitors for storing voltage will block the light, resulting in a low aperture ratio.
  • the impedance of the line rises, and a thicker, thicker, or more conductive metal wiring is required. The thickness cannot be increased indefinitely.
  • the best conductivity materials are metallic silver and copper. The better and more practical conductive materials are estimated to have no breakthrough for a long time, so you can only choose to increase the line width. However, this will The aperture ratio of the TFT-LCD is further reduced.
  • the technical problem to be solved by the present invention is to provide a liquid crystal display device which can effectively increase the aperture ratio and a method of manufacturing the same.
  • the present invention provides a liquid crystal display device, comprising: a glass substrate;
  • a gate line or a source drain line disposed along an outer surface of the solid pattern layer.
  • the solid pattern layer is located below the gate line or the source drain line.
  • the three-dimensional pattern layer includes a top surface and a bottom surface parallel to each other, and two sides connecting the top surface and the bottom surface, and the two sides respectively form a male angle with the glass substrate, and the male angle is between 0 degrees and 90 degrees. Between degrees.
  • the glass substrate comprises a lower glass plate and an upper glass plate disposed in parallel, the gate line is located on the lower glass plate, and the three-dimensional pattern layer is located under a thick portion of the gate line.
  • a photoresist spacer is disposed between the solid pattern layer and the upper glass plate. Further, the solid pattern layer is located above the gate line or the source drain line, and the gate line or the source drain line forms a recessed structure.
  • the three-dimensional pattern layer is a photoresist spacer.
  • the three-dimensional pattern layer is made of an organic film material and is cured by ultraviolet light or heat. Further, the thickness of the solid graphics layer is between lum and 10 um.
  • the invention also provides a method for manufacturing a liquid crystal display device, comprising the following steps:
  • a three-dimensional pattern layer is protruded from the glass substrate, and a triangular angle is formed between the three-dimensional pattern layer and the glass substrate;
  • a gate line or a source drain line is disposed along an outer surface of the solid pattern layer, and the solid pattern layer is located under the gate line or the source drain line.
  • the three-dimensional pattern layer includes a top surface and a bottom surface parallel to each other, and two sides connecting the top surface and the bottom surface, and the two sides respectively form a male angle with the glass substrate, and the male angle is between 0 degrees and 90 degrees. Between degrees.
  • the glass substrate includes a lower glass plate and an upper glass plate disposed in parallel, the gate line is located on the lower glass plate, and the three-dimensional pattern layer is located at a portion of the gate line Next.
  • the method further includes the steps of:
  • a photoresist spacer is disposed between the solid pattern layer and the upper glass sheet.
  • the present invention also provides a method of fabricating a liquid crystal display device, comprising the steps of: providing a glass substrate;
  • a three-dimensional pattern layer is protruded from the glass substrate, and a triangular angle is formed between the three-dimensional pattern layer and the glass substrate;
  • the solid pattern layer being located above the gate line or the source drain line;
  • the three-dimensional pattern layer is removed or partially removed under the gate line and/or source drain line by a process such as exposure, development, or the like.
  • the liquid crystal display device and the manufacturing method thereof provided by the present invention break the TFT-LCD to be a planar limitation, and the gate, source and drain layers are no longer a planar wiring, but are arranged on the increased stereoscopic graphic layer.
  • Line, the line width of the solid figure is significantly increased relative to the plane, but its occlusion area of light is the projection of the solid figure on the plane, thus achieving the increase of the line width, without increasing or not significantly increasing the shading. The effect of the area.
  • FIG. 1 is a schematic cross-sectional view showing the formation of a gate line on a conventional glass substrate.
  • FIG. 2 is a schematic plan view of a glass substrate according to an embodiment of the present invention.
  • FIG 3 is a cross-sectional view of a liquid crystal display device according to Embodiment 1 of the present invention.
  • FIG. 4 is a cross-sectional view showing a liquid crystal display device according to a third embodiment of the present invention.
  • Figure 5 is a cross-sectional view showing a liquid crystal display device according to a fifth embodiment of the present invention.
  • the usual TFT-LCD design is either a gate layer or a source/drain layer on a plane. Designed so that all metal wiring areas block the passage of light.
  • the invention breaks
  • the TFT-LCD is a planar limitation.
  • the gate, source and drain layers are no longer a planar wiring, but are wired on the increased stereoscopic graphics layer.
  • the line width of the solid graphics is significantly increased relative to the plane.
  • the occlusion area of the light is the projection of the solid figure on the plane, which achieves the effect of increasing the line width without increasing or significantly increasing the shading area.
  • the gate lines 11 are formed in a planar form on the glass substrate 10.
  • the width W1 is increased, the light-shielding area is increased and the aperture ratio is lowered.
  • the invention is improved by the following examples.
  • 2 is a schematic plan view of a glass substrate according to an embodiment of the present invention.
  • the structure and layout of the glass substrate are the same as those of the prior art
  • FIGS. 3-5 are schematic views of the AA, the cross-sectional view of the specific structure. different.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • the liquid crystal display device of the present embodiment includes a glass substrate 30, and a three-dimensional pattern layer 32 protruding from the glass substrate 30.
  • the three-dimensional pattern layer 32 is located under the gate line 31, and the three-dimensional pattern layer 32 and the glass are provided.
  • a taper angle ⁇ is formed between the substrates 30.
  • the three-dimensional pattern layer 32 is made of an organic film material which may be ultraviolet-cured or thermally hardened.
  • the thickness of the three-dimensional graphics layer 32 is between lum and 10 um.
  • the three-dimensional pattern layer 32 includes top and bottom surfaces that are parallel to each other, and two sides that connect the top surface and the bottom surface, wherein the bottom surface is bonded to the glass substrate 20.
  • the two sides can respectively form a taper angle ⁇ with the glass substrate 30, between 0 degrees and 90 degrees.
  • the three-dimensional pattern layer 32 has an isosceles trapezoidal cross section, and the two sides are respectively formed with the glass substrate 30.
  • the taper angles ⁇ are equal.
  • the gate lines 31 are disposed along the top surface and both sides of the solid pattern layer 32. Since the three-dimensional pattern layer 32 protrudes from the glass substrate 30 to have a certain thickness, the gate line 31 is converted into a three-dimensional form from the original flat form. Thus, the width of the gate line 31 will be the sum of its widths on the top and both sides of the solid pattern layer 32, i.e., D1 + D2 + D3 shown in FIG. Compared with the width W1 of the gate line 31 in Fig. 1, it is undoubtedly increased a lot, and can meet the product design requirements, especially large-sized products.
  • the light-shielding area is the projection of the solid pattern layer 32 on the glass substrate 30, as shown in Fig. 3, that is, the area of the bottom surface having a width D4.
  • the aperture ratio increased by 3.3%.
  • the gate line width of 15um is not particularly wide on the actual product, so the actual overall effect will be higher than 3.3% (the larger the width, the more obvious the effect).
  • Embodiment 2 is a diagrammatic representation of Embodiment 1:
  • a second embodiment of the present invention provides a method for fabricating a liquid crystal display device according to the first embodiment of the present invention, which includes the following steps:
  • a three-dimensional pattern layer is protruded on the glass substrate, the three-dimensional pattern layer is located below the gate line, and forms a cone angle ⁇ with the glass substrate;
  • a three-dimensional pattern layer is retained under the gate line and the source drain line by a process such as exposure and development;
  • the gate and subsequent layers are fabricated, and the fabrication process is the same as that of the conventional TFT-LCD process.
  • Embodiment 3 is the technical features of the three-dimensional graphics layer.
  • the present embodiment provides a liquid crystal display device. As shown in FIG. 4, the difference from the first embodiment is that the present embodiment does not have a three-dimensional graphic layer 42 under all the gate lines 41, but is selected in comparison. The thick part is set. At the same time, a photo spacer 43 is formed above the solid pattern layer 42.
  • the liquid crystal display device of the present embodiment includes a glass substrate 40 including a lower glass plate 40a and an upper glass plate 40b disposed in parallel, and the gate line 41 is located on the lower glass plate 40a, and the thick portion thereof Below, a three-dimensional pattern layer 42 is disposed protruding from the lower glass sheet 40a, and a male angle ⁇ is formed between the three-dimensional pattern layer 42 and the lower glass sheet 40a. Further, a photoresist spacer 43 is provided between the solid pattern layer 42 and the upper glass plate 40b.
  • the photoresist spacer 43 is made of a photoreactive material and can provide support between the upper and lower glass plates 40a and 40b. It must be uniformly distributed, otherwise the uneven distribution of the photoresist causes some of the photoresist spacers to be clustered together. It will block the passage of light, and it will not be able to maintain the proper gap between the upper and lower glass plates 40a and 40b, and the uneven distribution of the electric field will occur, which will affect the gray scale performance of the liquid crystal.
  • the three-dimensional pattern layer 42 is selected to be disposed under the thicker gate line 41.
  • the thickness of the photoresist spacer 43 can be reduced, that is, the thickness thereof is The distance HI between the upper and lower glass sheets 40a, 40b is reduced to the distance H2 between the top surface of the three-dimensional pattern layer 42 and the upper glass sheet 40b.
  • the solid pattern layer 42 can be directly used as a photoresist spacer, and no additional photoresist spacers are needed, thereby saving process flow and materials.
  • the thickness of the solid pattern layer 42 is determined in accordance with the height of the photoresist spacer.
  • Embodiment 4 is a diagrammatic representation of Embodiment 4:
  • a fourth embodiment of the present invention provides a method for fabricating a liquid crystal display device according to Embodiment 3 of the present invention, which includes the following steps:
  • a glass substrate comprising a lower glass plate and an upper glass plate disposed in parallel; under the thicker portion of the gate line, a three-dimensional graphic layer is disposed protruding from the lower glass plate; after the three-dimensional graphic layer is formed, the exposure is performed a process of developing, etc., retaining a solid pattern layer under the gate line and the source drain line;
  • the fabrication of the gate and subsequent layers, the fabrication process and the general The TFT-LCD process is the same.
  • the above steps are different from the second embodiment in that the position of the solid pattern layer is set.
  • the three-dimensional layer is disposed under the portion where the gate line is thick.
  • the method of the embodiment further includes the step of disposing a photoresist spacer, that is, providing a photoresist spacer between the three-dimensional pattern layer and the upper glass sheet.
  • the thickness is required to satisfy the height of the photoresist spacer, and the three-dimensional pattern layer is used as the photoresist spacer.
  • Embodiment 5 is the technical features of the three-dimensional graphics layer.
  • the present embodiment provides a liquid crystal display device.
  • the first embodiment of the present invention is different in that the three-dimensional pattern layer 52 is located above the gate line 51, and the three-dimensional pattern layer 52 is formed. It is removed or partially removed, so that the gate line 51 becomes a concave structure.
  • the liquid crystal display device of the present embodiment includes a glass substrate 50, a three-dimensional pattern layer 52 protrudingly disposed on the glass substrate 50, and a gate line 51 disposed along an outer surface of the three-dimensional pattern layer 52.
  • the three-dimensional pattern layer 52 is located at the gate line.
  • a male angle ⁇ is formed between the solid pattern layer 52 and the glass substrate 50.
  • Example 6 The technical features of the three-dimensional graphics layer are the same as those of the first embodiment of the present invention, and are not described herein again.
  • Example 6 The technical features of the three-dimensional graphics layer are the same as those of the first embodiment of the present invention, and are not described herein again.
  • a sixth embodiment of the present invention provides a method of fabricating a liquid crystal display device according to Embodiment 5 of the present invention, which includes the following steps:
  • a three-dimensional pattern layer is protruded on the glass substrate, the three-dimensional pattern layer is located above the gate line, and forms a cone angle ⁇ with the glass substrate;
  • the three-dimensional pattern layer is removed or partially removed under the gate line and/or the source drain line by a process such as exposure, development, or the like;
  • the gate and subsequent layers are fabricated, and the fabrication process is the same as that of the conventional TFT-LCD process.
  • Embodiments 5 and 6 of such a technical solution enable the organic layer not only to increase the aperture ratio, but also serve as an insulating layer to prevent some defects of the base substrate.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)

Abstract

一种液晶显示装置包括：玻璃基板（30）；突出设置在所述玻璃基板（30）上的立体图形层（32），所述立体图形层（32）与所述玻璃基板（30）之间形成锥形角；以及沿所述立体图形层外表面设置的栅极线（31）或源漏极线。一种液晶显示装置的制造方法打破了TFT-LCD是一个平面的局限，栅极、源漏极层不再是一个平面上配线，而是在增加设置的立体图形层上配线，立体图形的线宽相对于平面显著增大，但是其对光的遮挡面积却是这个立体图形在平面上的投影，这样达到了既增大了线宽，又没有增加或者没有显著增加遮光面积的效果。

Description

一种液晶显示装置及其制造方法
本申请要求于 2012 年 11 月 19 日提交中国专利局、 申请号为 201210467632.X, 发明名称为 "一种液晶显示装置及其制造方法" 的中国专 利申请的优先权， 上述专利的全部内容通过引用结合在本申请中。 技术领域
本发明涉及图像显示领域， 尤其涉及一种液晶显示装置及其制造方法。 背景技术
随着信息社会的发展， 人们对显示设备的需求得到了增长。 为了满足这 种需求， 最近几种平板显示设备， 例如： 液晶显示器（LCD )、 等离子体显 示器件（PDP )、 有机发光二极管显示器（OLED )都得到了迅猛的发展。 在 平板显示器件当中， 液晶显示器由于其重量低、 体积小、 能耗低的优点， 已 经基本取代了冷阴极显示设备。 在液晶显示器中， 薄膜晶体管液晶显示器 ( TFT-LCD )具有轻、 薄、 省电等优势， 且生产技术成熟， 供应链稳定， 成 本更具竟争力， 所以在相当长的时间内， TFT-LCD将是显示技术的主流。
液晶显示器中有一个很重要的规格是亮度， 而决定亮度最重要的因素是 开口率。 开口率筒单来说就是光线能透过的有效透光区域与全部面积的比 例。 当光线经由背光板发射出来时， 并不是所有的光线都能穿过面板， 例如 各种配线以及 TFT本身， 还有储存电压用的储存电容等， 都会遮蔽光线， 导 致开口率不高。 在大尺寸 TFT-LCD 中， 由于尺寸变大， 线路的阻抗上升， 就需要用更粗、更厚或者导电率更好的金属配线。厚度是无法无限度增加的， 导电率最好的材料是金属银和铜， 更好更实用的导电材料估计在很长时间内 都不会有突破， 因此只能选择增加线宽， 然而这将进一步降低 TFT-LCD的 开口率。
发明内容
本发明所要解决的技术问题在于，提供一种可以有效提高开口率的液晶 显示装置及其制造方法。 为了解决上述技术问题， 本发明提供一种液晶显示装置， 包括： 玻璃基板；
突出设置在所述玻璃基板上的立体图形层， 所述立体图形层与所述玻璃 基板之间形成锥形角； 以及
沿所述立体图形层外表面设置的栅极线或源漏极线。
进一步地， 所述立体图形层位于栅极线或源漏极线之下。
进一步地， 所述立体图形层包括相互平行的顶面和底面， 以及连接顶面 和底面的两侧面， 两侧面分别与玻璃基板之间形成雄形角， 所述雄形角在 0 度到 90度之间。
进一步地， 所述玻璃基板包括平行设置的下玻璃板和上玻璃板， 所述栅 极线位于所述下玻璃板上， 所述立体图形层位于所述栅极线较粗的部分之 下。
进一步地， 在所述立体图形层与所述上玻璃板之间设置有光阻间隙物。 进一步地， 所述立体图形层位于栅极线或源漏极线之上， 所述栅极线或 源漏极线形成下凹结构。
进一步地， 所述立体图形层为光阻间隙物。
进一步地，所述立体图形层为有机膜材料制成，并经紫外硬化或热硬化。 进一步地， 所述立体图形层的厚度在 lum~10um之间。
本发明还提供一种液晶显示装置的制造方法， 包括以下步骤：
提供一玻璃基板；
在所述玻璃基板上突出设置一立体图形层， 所述立体图形层与所述玻璃 基板之间形成锥形角；
沿所述立体图形层外表面设置栅极线或源漏极线， 所述立体图形层位于 所述栅极线或源漏极线之下。
进一步地， 所述立体图形层包括相互平行的顶面和底面， 以及连接顶面 和底面的两侧面， 两侧面分别与玻璃基板之间形成雄形角， 所述雄形角在 0 度到 90度之间。
进一步地， 所述玻璃基板包括平行设置的下玻璃板和上玻璃板， 所述栅 极线位于所述下玻璃板上， 所述立体图形层位于所述栅极线较粗的部分之 下。
进一步地， 还包括步骤：
在所述立体图形层与所述上玻璃板之间设置光阻间隙物。
本发明还提供一种液晶显示装置的制造方法， 包括以下步骤： 提供一玻璃基板；
在所述玻璃基板上一突出设置立体图形层， 所述立体图形层与所述玻璃 基板之间形成锥形角；
沿所述立体图形层外表面设置栅极线或源漏极线， 所述立体图形层位于 所述栅极线或源漏极线之上；
立体图形层形成后， 通过曝光、显影等工艺， 在所述栅极线和 /或源漏极 线下方去除或部分去除所述立体图形层。
本发明所提供的液晶显示装置及其制造方法， 打破 TFT-LCD是一个平 面的局限， 栅极、 源漏极层不再是一个平面上配线， 而是在增加设置的立体 图形层上配线， 立体图形的线宽相对于平面显著增大， 但是其对光的遮挡面 积却是这个立体图形在平面上的投影， 这样达到了既增大了线宽， 又没有增 加或者没有显著增加遮光面积的效果。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案， 下面将对实 施例或现有技术描述中所需要使用的附图作筒单地介绍， 显而易见地， 下面 描述中的附图仅仅是本发明的一些实施例， 对于本领域普通技术人员来讲， 在不付出创造性劳动的前提下， 还可以根据这些附图获得其他的附图。
图 1是现有玻璃基板上栅极线形成剖面示意图。
图 2是本发明实施例的玻璃基板平面示意图。
图 3是本发明实施例一所提供的液晶显示装置剖面示意图。
图 4是本发明实施例三所提供的液晶显示装置剖面示意图。
图 5是本发明实施例五所提供的液晶显示装置剖面示意图。
具体实施方式
下面参考附图对本发明的优选实施例进行描述。
通常的 TFT-LCD设计无论是栅极层， 还是源漏极层都是在一个平面上 进行设计的， 这样所有的金属配线面积都会阻挡光线的通过。 本发明打破
TFT-LCD是一个平面的局限， 栅极、 源漏极层不再是一个平面上配线， 而是 在增加设置的立体图形层上配线， 立体图形的线宽相对于平面显著增大， 但 是其对光的遮挡面积却是这个立体图形在平面上的投影， 这样达到了既增大 了线宽， 又没有增加或者没有显著增加遮光面积的效果。
请首先参照图 1所示， 目前的液晶显示装置中， 栅极线 11以平面形式 形成在玻璃基板 10上。如前所述，若增加其宽度 W1 ,则必将增大遮光面积， 降低开口率。 本发明通过以下实施例对其进行改进。 其中， 图 2为本发明实 施例的玻璃基板平面示意图， 从平面示意图上看， 其结构与布局与现有设计 相同， 而图 3-5均为其 A-A，向的剖面示意图， 具体结构有所不同。
实施例一：
如图 3所示， 本实施例的液晶显示装置， 包括玻璃基板 30, 突出设置在 玻璃基板 30上的立体图形层 32, 立体图形层 32位于栅极线 31之下， 立体 图形层 32与玻璃基板 30之间形成锥形角 α。
立体图形层 32为有机膜材料制成， 该有机膜材料可以是紫外硬化的， 也可以是热硬化的。 立体图形层 32的厚度在 lum~10um之间。
立体图形层 32 包括相互平行的顶面和底面， 以及连接顶面和底面的两 侧面， 其中底面与玻璃基板 20贴合。 两侧面分别可和玻璃基板 30之间形成 锥形角 α , 在 0度到 90度之间， 作为优选的， 立体图形层 32截面为等腰梯 形， 两侧面分别与玻璃基板 30之间形成的锥形角 α相等。
具体的， 栅极线 31是沿立体图形层 32的顶面和两侧面设置。 由于立体 图形层 32突出于玻璃基板 30,具有一定厚度， 因此栅极线 31即由原先的平 面形式转换为立体形式。 这样， 栅极线 31的宽度将是其在立体图形层 32的 顶面和两侧面上的宽度之和， 即图 3所示的 Dl+D2+D3。 相对于图 1中栅极 线 31的宽度 W1而言， 无疑增大了许多， 能够满足产品设计需要， 尤其是 大尺寸产品。 另一方面， 本实施例中栅极线 31 的宽度虽然显著增大， 然而 其遮光面积为立体图形层 32在玻璃基板 30上的投影， 如图 3所示， 即宽度 为 D4的底面面积。
下面通过实例来计算图 3的设计相对图 1的设计在开口率上的效益。 例如， 对于一个子像素大小是 100um*300um的液晶显示器： 按图 1所示的通常设计：
假设此液晶显示器的栅极线宽度 15um, Com线宽度 15um, 则栅极线和 Com配线遮挡面积比为： ( 15+15 ) /300=10%；
采用图 3所示本实施例的设计：
假设立体图形层 22截面为等腰梯形，其厚度为 4.3um,锥形角 α =60度， 立体图形层 22的顶面宽度 Dl=5um,底面宽度 D4=10um,则 D2=D3=( D4-D1 ) /2*Cos60。=5謹，
则金属配线的有效宽度=01+02+03=1511111；
金属配线的遮挡宽度 =D4=10um;
则栅极线和 Com配线遮挡面积比为： （ 10+10 ) /300=6.7%；
开口率提升 3.3%。
考虑到实际情况 15um的栅极线宽度在实际产品上并不是特别的宽， 所 以实际的总体效果会高于 3.3% (宽度越大， 效果越明显）。
由此也可以看出， 在不影响工艺的前提下， 锥形角 α越大越好， 这样可 以使得在增加栅极线 31有效宽度（D1+D2+D3 ) 的同时， 遮挡宽度（ D4 ) 非常接近顶面宽度（D1 ), 栅极线和 Com配线遮挡面积比进一步减小， 开口 率进一步提升。
实施例二：
本发明实施例二提供一种本发明实施例一所述的液晶显示装置的制造 方法， 包括以下步骤：
提供一玻璃基板；
在玻璃基板上突出设置一立体图形层， 立体图形层位于栅极线之下， 并 且与玻璃基板之间形成锥形角 α；
立体图形层形成后， 通过曝光、 显影等工艺， 在栅极线和源漏极线下方 保留立体图形层；
立体图形层形成后， 进行栅极及后续各层的制作， 制作工艺和普通的 TFT-LCD工艺相同。
有关立体图形层的技术特征与本发明实施例一相同， 此处不再赘述。 实施例三：
本实施例提供一种液晶显示装置， 如图 4所示， 与实施例一的不同之处 在于， 本实施例不是在所有的栅极线 41下方都有立体图形层 42, 而是选择 在较粗的部分才设置。 同时在立体图形层 42的上方制作光阻间隙物（Photo Spacer ) 43。
具体的， 本实施例的液晶显示装置， 包括玻璃基板 40, 该玻璃基板 40 包括平行设置的下玻璃板 40a和上玻璃板 40b, 栅极线 41位于下玻璃板 40a 上， 其较粗的部分之下， 突出于下玻璃板 40a设置一立体图形层 42, 立体图 形层 42与下玻璃板 40a之间形成雄形角 α。 并且， 在立体图形层 42与上玻 璃板 40b之间设置光阻间隙物 43。
光阻间隙物 43为光反应性材料制成， 可提供上下玻璃板 40a、 40b之间 的支撑， 它必须均勾的分布， 不然一但分布不均造成部分光阻间隙物聚集在 一起， 反而会阻碍光线通过， 也无法维持上下玻璃板 40a、 40b的适当间隙 ( gap ), 会出现电场分布不均的现象， 进而影响液晶的灰阶表现。
由于立体图形层 42本身具有一定厚度，选择在较粗的栅极线 41下设置 立体图形层 42,这样制作光阻间隙物 43时，光阻间隙物 43的厚度可以减小， 即其厚度从上下玻璃板 40a、 40b之间的距离 HI减小为立体图形层 42顶面 与上玻璃板 40b之间的距萬 H2。
进一步地， 本实施例还可以将立体图形层 42直接作为光阻间隙物， 不 需要另外制作光阻间隙物， 节省工艺流程和材料。 立体图形层 42的厚度根 据光阻间隙物的高度需要来确定。
实施例四：
本发明实施例四提供一种本发明实施例三所述的液晶显示装置的制造 方法， 包括以下步骤：
提供一玻璃基板， 该玻璃基板包括平行设置的下玻璃板和上玻璃板； 在栅极线较粗的部分之下， 突出于下玻璃板设置一立体图形层； 立体图形层形成后， 通过曝光、 显影等工艺， 在栅极线和源漏极线下方 保留立体图形层；
立体图形层形成后， 进行栅极及后续各层的制作， 制作工艺和普通的 TFT-LCD工艺相同。
上述步骤与实施例二相比， 区别在于立体图形层的设置位置， 本实施例 中立体层设在栅极线较粗的部分之下。
本实施例的方法在立体图形层形成后， 还包括设置光阻间隙物的步骤， 即在立体图形层与上玻璃板之间设置光阻间隙物。
作为进一步改进， 设置立体图形层时， 使之厚度满足光阻间隙物的高度 需要， 将立体图形层作为光阻间隙物。
有关立体图形层的技术特征与本发明实施例一相同， 此处不再赘述。 实施例五：
本实施例提供一种液晶显示装置， 如图 5所示， 本发明实施例一的不同 之处在于， 本实施例中立体图形层 52位于栅极线 51之上， 立体图形层 52 形成后将被去除或部分去除， 使栅极线 51成为下凹结构。
具体的， 本实施例的液晶显示装置， 包括玻璃基板 50, 突出设置在玻璃 基板 50上的立体图形层 52, 沿立体图形层 52外表面设置栅极线 51 , 立体 图形层 52位于栅极线 51之上， 立体图形层 52与玻璃基板 50之间形成雄形 角 α。 立体图形层 52形成后， 通过曝光、 显影等工艺， 在栅极线下方的立 体图形层 52将被去除或部分去除， 栅极线 51将形成下凹结构。
有关立体图形层的技术特征与本发明实施例一相同， 此处不再赘述。 实施例六：
本发明实施例六提供一种本发明实施例五所述的液晶显示装置的制造 方法， 包括以下步骤：
提供一玻璃基板；
在玻璃基板上一突出设置立体图形层， 立体图形层位于栅极线之上， 并 且与玻璃基板之间形成锥形角 α；
立体图形层形成后， 通过曝光、显影等工艺， 在栅极线和 /或源漏极线下 方去除或部分去除立体图形层；
立体图形层形成后， 进行栅极及后续各层的制作， 制作工艺和普通的 TFT-LCD工艺相同。
有关立体图形层的技术特征与本发明实施例一相同， 此处不再赘述。 实施例五、 六这样的技术方案， 使得有机层不仅可以提高开口率， 而且 可以作为隔绝层， 防止基底基板的一些缺陷。
应当理解的是， 上述所有实施例虽然均描述的是栅极线， 但同样也适用 于源漏极线。
以上所揭露的仅为本发明较佳实施例而已， 当然不能以此来限定本发明 之权利范围， 因此依本发明权利要求所作的等同变化， 仍属本发明所涵盖的 范围。

Claims

权 利 要 求
1、 一种液晶显示装置， 其中， 包括：
玻璃基板；
突出设置在所述玻璃基板上的立体图形层， 所述立体图形层与所述玻璃 基板之间形成锥形角； 以及
沿所述立体图形层外表面设置的栅极线或源漏极线。
2、 根据权利要求 1所述的液晶显示装置， 其中， 所述立体图形层位于 栅极线或源漏极线之下。
3、 根据权利要求 2所述的液晶显示装置， 其中， 所述立体图形层包括 相互平行的顶面和底面， 以及连接顶面和底面的两侧面， 两侧面分别与玻璃 基板之间形成锥形角， 所述雄形角在 0度到 90度之间。
4、 根据权利要求 2所述的液晶显示装置， 其中， 所述玻璃基板包括平 行设置的下玻璃板和上玻璃板， 所述栅极线位于所述下玻璃板上， 所述立体 图形层位于所述栅极线较粗的部分之下。
5、 根据权利要求 4所述的液晶显示装置， 其中， 在所述立体图形层与 所述上玻璃板之间设置有光阻间隙物。
6、 根据权利要求 1所述的液晶显示装置， 其中， 所述立体图形层位于 栅极线或源漏极线之上， 所述栅极线或源漏极线形成下凹结构。
7、 根据权利要求 4所述的液晶显示装置， 其中， 所述立体图形层为光 阻间隙物。
8、 根据权利要求 6所述的液晶显示装置， 其中， 所述立体图形层为光 阻间隙物。
9、 根据权利要求 2所述的液晶显示装置， 其中， 所述立体图形层为有 机膜材料制成， 并经紫外硬化或热硬化。
10、 根据权利要求 6所述的液晶显示装置， 其中， 所述立体图形层为有 机膜材料制成， 并经紫外硬化或热硬化。
11、 根据权利要求 2所述的液晶显示装置， 其中， 所述立体图形层的厚 度在 1謹~10謹之间。
12、 根据权利要求 6所述的液晶显示装置， 其中， 所述立体图形层的厚 度在 1謹~10謹之间。
13、 一种液晶显示装置的制造方法， 包括以下步骤：
提供一玻璃基板；
在所述玻璃基板上突出设置一立体图形层，所述立体图形层与所述玻璃 基板之间形成锥形角；
沿所述立体图形层外表面设置栅极线或源漏极线， 所述立体图形层位于 所述栅极线或源漏极线之下。
14、 根据权利要求 13所述的制造方法， 其中， 所述立体图形层包括相 互平行的顶面和底面， 以及连接顶面和底面的两侧面， 两侧面分别与玻璃基 板之间形成雄形角， 所述雄形角在 0度到 90度之间。
15、 根据权利要求 14所述的制造方法， 其中， 所述玻璃基板包括平行 设置的下玻璃板和上玻璃板， 所述栅极线位于所述下玻璃板上， 所述立体图 形层位于所述栅极线较粗的部分之下。
16、 根据权利要求 15所述的制造方法， 其中， 还包括步骤：
在所述立体图形层与所述上玻璃板之间设置光阻间隙物。
17、 一种液晶显示装置的制造方法， 包括以下步骤：
提供一玻璃基板；
在所述玻璃基板上一突出设置立体图形层， 所述立体图形层与所述玻璃 基板之间形成锥形角；
沿所述立体图形层外表面设置栅极线或源漏极线， 所述立体图形层位于 所述栅极线或源漏极线之上；
立体图形层形成后， 通过曝光、显影等工艺， 在所述栅极线和 /或源漏极 线下方去除或部分去除所述立体图形层。
PCT/CN2012/085390 2012-11-19 2012-11-28 一种液晶显示装置及其制造方法 Ceased WO2014075354A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/806,966 US20140139799A1 (en) 2012-11-19 2012-11-28 Liquid crystal display and the manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210467632.XA CN102929061B (zh) 2012-11-19 2012-11-19 一种液晶显示装置及其制造方法
CN201210467632.X 2012-11-19

Publications (1)

Publication Number Publication Date
WO2014075354A1 true WO2014075354A1 (zh) 2014-05-22

Family

ID=47643895

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2012/085390 Ceased WO2014075354A1 (zh) 2012-11-19 2012-11-28 一种液晶显示装置及其制造方法

Country Status (2)

Country Link
CN (1) CN102929061B (zh)
WO (1) WO2014075354A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102929061B (zh) * 2012-11-19 2016-01-20 深圳市华星光电技术有限公司 一种液晶显示装置及其制造方法
CN105304644A (zh) * 2015-10-15 2016-02-03 京东方科技集团股份有限公司 阵列基板及其制备方法、显示装置
CN105425494B (zh) * 2016-01-18 2018-11-06 深圳市华星光电技术有限公司 Tft阵列基板及显示器
CN119225079A (zh) * 2024-10-29 2024-12-31 合肥京东方光电科技有限公司 一种阵列基板、液晶透镜及显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004294805A (ja) * 2003-03-27 2004-10-21 Advanced Display Inc 液晶表示装置、表示装置の製造方法、パターニング方法
US20050046763A1 (en) * 2003-08-29 2005-03-03 Hitachi Displays, Ltd. Liquid crystal display device
CN101118915A (zh) * 2007-08-08 2008-02-06 友达光电股份有限公司 光感测元件及其制作方法
CN101236993A (zh) * 2007-01-31 2008-08-06 三菱电机株式会社 薄膜晶体管及其制法、以及使用该薄膜晶体管的显示装置
CN102929061A (zh) * 2012-11-19 2013-02-13 深圳市华星光电技术有限公司 一种液晶显示装置及其制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH055898A (ja) * 1991-06-27 1993-01-14 Casio Comput Co Ltd 薄膜素子形成パネル
US5773845A (en) * 1995-11-09 1998-06-30 Lg Electronics Inc. Liquid crystal display device with decreased line width and method of forming the same
US7884891B2 (en) * 2008-01-21 2011-02-08 Beijing Boe Optoelectronics Technology Co., Ltd. Thin film transistor liquid crystal display
CN101661941B (zh) * 2008-08-25 2011-07-20 北京京东方光电科技有限公司 Tft-lcd阵列基板结构及其制备方法
CN101807583B (zh) * 2009-02-18 2011-07-27 北京京东方光电科技有限公司 Tft-lcd阵列基板及其制造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004294805A (ja) * 2003-03-27 2004-10-21 Advanced Display Inc 液晶表示装置、表示装置の製造方法、パターニング方法
US20050046763A1 (en) * 2003-08-29 2005-03-03 Hitachi Displays, Ltd. Liquid crystal display device
CN101236993A (zh) * 2007-01-31 2008-08-06 三菱电机株式会社 薄膜晶体管及其制法、以及使用该薄膜晶体管的显示装置
CN101118915A (zh) * 2007-08-08 2008-02-06 友达光电股份有限公司 光感测元件及其制作方法
CN102929061A (zh) * 2012-11-19 2013-02-13 深圳市华星光电技术有限公司 一种液晶显示装置及其制造方法

Also Published As

Publication number Publication date
CN102929061A (zh) 2013-02-13
CN102929061B (zh) 2016-01-20

Similar Documents

Publication Publication Date Title
CN105511221B (zh) 膜层及其制备方法、基板、显示装置
WO2016165264A1 (zh) 像素单元及其制备方法、阵列基板和显示装置
WO2020207255A1 (zh) 阵列基板及其制备方法、液晶显示面板、液晶显示装置
WO2017008369A1 (zh) Coa型液晶显示面板及其制作方法
CN107170760B (zh) 显示基板的制备方法、显示基板和显示装置
CN104503150A (zh) 液晶面板及其制作方法
CN106098710A (zh) 一种阵列基板及其制备方法、显示装置
CN103869563A (zh) 阵列基板和包括阵列基板的液晶显示装置
CN116207159A (zh) 薄膜晶体管、基板、显示面板
CN104241541A (zh) 有机电致发光器件及显示装置
WO2014187104A1 (zh) 显示面板及其制造方法、显示装置
WO2018120463A1 (zh) 彩色滤光层基板的制造方法及其应用的液晶面板的制造方法
WO2020228168A1 (zh) 阵列基板及其制作方法
CN107068719A (zh) 一种显示基板、其制作方法及显示装置
CN106298811B (zh) 阵列基板及其制备方法、显示装置
WO2019100430A1 (zh) 一种tft阵列基板、制作方法以及液晶显示面板
WO2014075354A1 (zh) 一种液晶显示装置及其制造方法
WO2016206203A1 (zh) 导电结构及其制作方法、阵列基板、显示装置
CN103149763A (zh) Tft-lcd阵列基板、显示面板及其制作方法
WO2016206164A1 (zh) 液晶显示面板及液晶显示面板的制造方法
WO2020056814A1 (zh) 一种柔性显示装置及其制备方法
WO2015003401A1 (zh) 彩色滤光阵列基板及其制造方法
CN104952887A (zh) 一种阵列基板及其制备方法、显示装置
CN103135301B (zh) 一种薄膜晶体管液晶显示器阵列基板
WO2013047455A1 (ja) 液晶パネル

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 13806966

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12888401

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12888401

Country of ref document: EP

Kind code of ref document: A1