WO2014073676A1 - Dispositif de production et procédé de production de film à motif - Google Patents

Dispositif de production et procédé de production de film à motif Download PDF

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Publication number
WO2014073676A1
WO2014073676A1 PCT/JP2013/080376 JP2013080376W WO2014073676A1 WO 2014073676 A1 WO2014073676 A1 WO 2014073676A1 JP 2013080376 W JP2013080376 W JP 2013080376W WO 2014073676 A1 WO2014073676 A1 WO 2014073676A1
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WO
WIPO (PCT)
Prior art keywords
film
mask
light
pattern
liquid crystal
Prior art date
Application number
PCT/JP2013/080376
Other languages
English (en)
Japanese (ja)
Inventor
英章 香川
和宏 沖
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Publication of WO2014073676A1 publication Critical patent/WO2014073676A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G02F1/133631—Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Abstract

La présente invention porte sur un dispositif et un procédé de production de film à motif, avec lesquels un film à motif ayant un motif en bande présentant une largeur de ligne individuelle hautement précise et un espacement hautement précis entre chaque ligne peut être produit de manière efficace. Le dispositif de production de la présente invention produit un film à différence de phase à motif. Un dispositif d'exposition de lumière fourni au dispositif de production irradie, avec une lumière d'éclairage provenant d'une unité de source lumineuse, par l'intermédiaire d'une unité de masque, un film qui est transporté en continu. L'unité de masque comporte un premier masque et un second masque qui sont disposés avec une distance (D) entre ceux-ci. Une pluralité de fentes agencées dans la direction de largeur du film sont formées respectivement dans le premier masque et le second masque. Le premier masque et le second masque sont assemblés de telle sorte que les fentes respectives de ceux-ci se chevauchent les unes les autres complètement dans le trajet de lumière de la lumière d'éclairage.
PCT/JP2013/080376 2012-11-12 2013-11-11 Dispositif de production et procédé de production de film à motif WO2014073676A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-248069 2012-11-12
JP2012248069A JP2014095845A (ja) 2012-11-12 2012-11-12 パターンフィルムの製造装置及び製造方法

Publications (1)

Publication Number Publication Date
WO2014073676A1 true WO2014073676A1 (fr) 2014-05-15

Family

ID=50684767

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2013/080376 WO2014073676A1 (fr) 2012-11-12 2013-11-11 Dispositif de production et procédé de production de film à motif

Country Status (2)

Country Link
JP (1) JP2014095845A (fr)
WO (1) WO2014073676A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425472A (zh) * 2015-12-31 2016-03-23 武汉华星光电技术有限公司 液晶显示面板及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0897119A (ja) * 1994-09-26 1996-04-12 Fujitsu Ltd 露光装置
JP2005148354A (ja) * 2003-11-14 2005-06-09 Dainippon Printing Co Ltd フォトマスク、露光装置、液晶パネル部材、液晶パネル部材の製造装置、液晶パネル部材の製造方法
JP2011069994A (ja) * 2009-09-25 2011-04-07 Toppan Printing Co Ltd 偏光露光装置
JP2011174966A (ja) * 2010-02-23 2011-09-08 Seiko Epson Corp 液晶表示装置の製造方法
WO2012046541A1 (fr) * 2010-10-06 2012-04-12 株式会社ブイ・テクノロジー Dispositif d'exposition
JP2012103361A (ja) * 2010-11-08 2012-05-31 V Technology Co Ltd 露光装置
JP2012198522A (ja) * 2011-03-04 2012-10-18 Dainippon Printing Co Ltd パターン配向膜の製造方法、それを用いたパターン位相差フィルムの製造方法およびその製造装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029461A (ja) * 2002-06-26 2004-01-29 Toshiba Corp フォトマスク、露光方法及び半導体装置の製造方法
JP2006285122A (ja) * 2005-04-05 2006-10-19 Toppan Printing Co Ltd 両面マスクの作製方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0897119A (ja) * 1994-09-26 1996-04-12 Fujitsu Ltd 露光装置
JP2005148354A (ja) * 2003-11-14 2005-06-09 Dainippon Printing Co Ltd フォトマスク、露光装置、液晶パネル部材、液晶パネル部材の製造装置、液晶パネル部材の製造方法
JP2011069994A (ja) * 2009-09-25 2011-04-07 Toppan Printing Co Ltd 偏光露光装置
JP2011174966A (ja) * 2010-02-23 2011-09-08 Seiko Epson Corp 液晶表示装置の製造方法
WO2012046541A1 (fr) * 2010-10-06 2012-04-12 株式会社ブイ・テクノロジー Dispositif d'exposition
JP2012103361A (ja) * 2010-11-08 2012-05-31 V Technology Co Ltd 露光装置
JP2012198522A (ja) * 2011-03-04 2012-10-18 Dainippon Printing Co Ltd パターン配向膜の製造方法、それを用いたパターン位相差フィルムの製造方法およびその製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425472A (zh) * 2015-12-31 2016-03-23 武汉华星光电技术有限公司 液晶显示面板及其制备方法
CN105425472B (zh) * 2015-12-31 2019-09-17 武汉华星光电技术有限公司 液晶显示面板及其制备方法

Also Published As

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