JP2014095845A - パターンフィルムの製造装置及び製造方法 - Google Patents

パターンフィルムの製造装置及び製造方法 Download PDF

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Publication number
JP2014095845A
JP2014095845A JP2012248069A JP2012248069A JP2014095845A JP 2014095845 A JP2014095845 A JP 2014095845A JP 2012248069 A JP2012248069 A JP 2012248069A JP 2012248069 A JP2012248069 A JP 2012248069A JP 2014095845 A JP2014095845 A JP 2014095845A
Authority
JP
Japan
Prior art keywords
film
mask
light
pattern
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012248069A
Other languages
English (en)
Japanese (ja)
Inventor
Hideaki Kagawa
英章 香川
Kazuhiro Oki
和宏 沖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2012248069A priority Critical patent/JP2014095845A/ja
Priority to PCT/JP2013/080376 priority patent/WO2014073676A1/fr
Publication of JP2014095845A publication Critical patent/JP2014095845A/ja
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G02F1/133631—Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2012248069A 2012-11-12 2012-11-12 パターンフィルムの製造装置及び製造方法 Abandoned JP2014095845A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012248069A JP2014095845A (ja) 2012-11-12 2012-11-12 パターンフィルムの製造装置及び製造方法
PCT/JP2013/080376 WO2014073676A1 (fr) 2012-11-12 2013-11-11 Dispositif de production et procédé de production de film à motif

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012248069A JP2014095845A (ja) 2012-11-12 2012-11-12 パターンフィルムの製造装置及び製造方法

Publications (1)

Publication Number Publication Date
JP2014095845A true JP2014095845A (ja) 2014-05-22

Family

ID=50684767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012248069A Abandoned JP2014095845A (ja) 2012-11-12 2012-11-12 パターンフィルムの製造装置及び製造方法

Country Status (2)

Country Link
JP (1) JP2014095845A (fr)
WO (1) WO2014073676A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425472B (zh) * 2015-12-31 2019-09-17 武汉华星光电技术有限公司 液晶显示面板及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029461A (ja) * 2002-06-26 2004-01-29 Toshiba Corp フォトマスク、露光方法及び半導体装置の製造方法
JP2005148354A (ja) * 2003-11-14 2005-06-09 Dainippon Printing Co Ltd フォトマスク、露光装置、液晶パネル部材、液晶パネル部材の製造装置、液晶パネル部材の製造方法
JP2006285122A (ja) * 2005-04-05 2006-10-19 Toppan Printing Co Ltd 両面マスクの作製方法
JP2011174966A (ja) * 2010-02-23 2011-09-08 Seiko Epson Corp 液晶表示装置の製造方法
JP2012198522A (ja) * 2011-03-04 2012-10-18 Dainippon Printing Co Ltd パターン配向膜の製造方法、それを用いたパターン位相差フィルムの製造方法およびその製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3541327B2 (ja) * 1994-09-26 2004-07-07 富士通株式会社 露光装置
JP2011069994A (ja) * 2009-09-25 2011-04-07 Toppan Printing Co Ltd 偏光露光装置
JP2012083383A (ja) * 2010-10-06 2012-04-26 V Technology Co Ltd 露光装置
JP5678334B2 (ja) * 2010-11-08 2015-03-04 株式会社ブイ・テクノロジー 露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029461A (ja) * 2002-06-26 2004-01-29 Toshiba Corp フォトマスク、露光方法及び半導体装置の製造方法
JP2005148354A (ja) * 2003-11-14 2005-06-09 Dainippon Printing Co Ltd フォトマスク、露光装置、液晶パネル部材、液晶パネル部材の製造装置、液晶パネル部材の製造方法
JP2006285122A (ja) * 2005-04-05 2006-10-19 Toppan Printing Co Ltd 両面マスクの作製方法
JP2011174966A (ja) * 2010-02-23 2011-09-08 Seiko Epson Corp 液晶表示装置の製造方法
JP2012198522A (ja) * 2011-03-04 2012-10-18 Dainippon Printing Co Ltd パターン配向膜の製造方法、それを用いたパターン位相差フィルムの製造方法およびその製造装置

Also Published As

Publication number Publication date
WO2014073676A1 (fr) 2014-05-15

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