WO2013191091A1 - 反射防止構造体、転写用型、これらの製造方法、及び、表示装置 - Google Patents
反射防止構造体、転写用型、これらの製造方法、及び、表示装置 Download PDFInfo
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- WO2013191091A1 WO2013191091A1 PCT/JP2013/066427 JP2013066427W WO2013191091A1 WO 2013191091 A1 WO2013191091 A1 WO 2013191091A1 JP 2013066427 W JP2013066427 W JP 2013066427W WO 2013191091 A1 WO2013191091 A1 WO 2013191091A1
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- Prior art keywords
- region
- concavo
- moth
- eye
- antireflection
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
Definitions
- the present invention relates to an antireflection structure, a transfer mold, a manufacturing method thereof, and a display device. More specifically, the present invention relates to an antireflection structure having a moth-eye structure on the surface, a transfer mold, a manufacturing method thereof, and a display device having the moth-eye structure on a display surface.
- FPD flat panel display
- display devices such as portable information terminals such as liquid crystal televisions, smartphones, and tablets having FPDs have become common.
- FPD is applied to TVs, personal digital assistants, etc. as described above, FPDs are frequently used in bright places, and good visibility is required not only in dark rooms but also in bright places. It is done.
- An FPD is a display device that is generally manufactured using a substrate made of glass. However, since light is reflected on the surface of the display device in a bright place, the reflected light makes it difficult to view an image. Yes.
- Conventional FPDs have been subjected to low reflection (LR) processing and anti-glare (AG) processing as methods for reducing surface reflection.
- a moth-eye that can obtain an anti-reflection effect without using optical interference.
- Eyes of the eye Structure has been attracting attention.
- the moth-eye structure is arranged on the surface of the article to be anti-reflective treated by arranging the concave and convex patterns that are finer than the AG treatment and spaced at a wavelength equal to or smaller than the wavelength of light (for example, 400 nm or less) without any gaps.
- the change in the refractive index at the boundary between the two is made pseudo-continuous, almost all of the light is transmitted regardless of the refractive index interface, and the light reflection on the surface of the article can be almost eliminated.
- an antireflection film that reduces the reflection of visible light on the surface of the base material by being placed on the base material, and the antireflection film is the first against visible light that passes through the antireflection film.
- a wavelength dispersion structure that imparts a chromatic dispersion of, and contains a wavelength dispersion material that imparts a second wavelength dispersion to visible light that passes through the antireflection film, and the visible light that passes through the antireflection film is An antireflection film having flat transmission wavelength dispersion in the visible light region is disclosed (see, for example, Patent Document 1).
- a mold having a fine concavo-convex pattern is prepared, and after a film for forming the concavo-convex pattern is formed on the surface of the display device, the film surface is formed.
- a method of transferring a concavo-convex pattern of a mold onto a film surface by pressing a mold see, for example, Patent Documents 2, 3, 5 to 7
- etching a film surface using a metal film as a mask to form the concavo-convex pattern
- the method of forming for example, refer patent document 4 etc. are mentioned.
- Examples of the method for forming the concave / convex pattern of the mold include a method of performing anodic oxidation and etching, an electron beam drawing method, and the like.
- the chromatic dispersion of the moth-eye is made neutral by giving the lower film a characteristic (for example, an example of a schematic cross-sectional view of a conventional antireflection film [Fig. 34]).
- the concept of correcting the chromatic dispersion characteristic of moth-eye is proposed.
- these prior arts focus only on the low reflection treatment on the surface of the display device, and have not devised or studied a technique for displaying on a part of the display device or the like.
- the display can be performed while utilizing the characteristics of the moth-eye, it can be applied to various applications.
- a logo for the purpose of performing such a display, for example, when a method of making part of the ink opaque by, for example, placing ink i on the surface of the moth eye by printing, the moth-eye function disappears in that part, and the surface reflection As the number increases, the transmittance also decreases (region 1015 in FIG. 33). If such a moth eye is installed in front of the display device, the display image may not be visible or may become difficult to see.
- the moth-eye structure makes the surface reflection extremely small, when the part of the film having the moth-eye structure is filled with opaque components such as printing ink, the moth-eye effect of that part disappears and the reflection is large At the same time, the transmittance decreases and becomes very conspicuous. That is, in FIG. 33, the moth-eye portion (region 1013) has high light transmittance and small surface reflection, but when the moth-eye is filled with ink i or the like, direct reflection and scattering of the portion (region 1015) increase and transmission. The rate further decreases, and the area 1015 becomes too conspicuous in comparison with the area 1013. There was room for ingenuity to prevent the display as a display device, such as making it possible to recognize characters, symbols or figures such as logos at any time, rather than being visible at any time. .
- An object of the present invention is to provide an antireflection structure, a transfer mold, a manufacturing method thereof, and a display device capable of reducing the transmittance and sufficiently improving the transmittance.
- the present inventors create a moth-eye region having partially different characteristics in the region where the moth-eye is formed, in other words, Various studies were made to mix areas with different reflection characteristics (actively create areas). This makes it possible to use the region for expressing a logo or the like in its shape, or to enhance visibility by using slight reflection coloring by moth eyes. Then, when a part of the region having different characteristics is mixed, the inventors of the present invention have specific different regions other than this because the surface reflection property is different from the surrounding low reflection moth-eye structure region. Focused on what seemed to stand out from.
- the inventors of the present invention have made various studies to overcome such problems, and according to the character, symbol, or figure portion such as a logo, the height of the unevenness of the moth eye of that portion, or the shape of the unevenness It has been found that the chromatic dispersion of the reflected light of the part can be preferably made different from the surroundings by making the (shape) different from the surroundings of the part or by making the shape flat without the moth-eye structure. It was.
- the portion of the logo or the like has a moth eye shape, so that the reflectance of the portion does not extremely increase. Accordingly, it is difficult to see the logo and the like from the front, but in the oblique direction, the reflection effect of the moth eye is different, so that it looks thin. In this way, by mixing regions with partially different reflection characteristics in the moth eye region having the moth eye function, characters, symbols or figures such as logos are not visible at any time, but under certain conditions. By making it recognizable, display as a display device can be prevented.
- the height of some moth-eye structures is set low.
- the chromatic dispersion in the region 15 looks a little reddish compared to the region 13 where the height of the moth-eye structure is high because the reflection of the red region of visible light increases.
- the reflectance is low due to the presence of the moth-eye shape, so that the light transmittance does not extremely decrease, and scattering and reflection do not increase to the extent shown in FIG. In this way, the inventors have arrived at the present invention by conceiving that the above problems can be solved brilliantly.
- the present invention is different from the invention described in Patent Document 1 described above in that a region having a moth-eye shape and different wavelength dispersion is actively produced.
- a configuration in which another layer is provided below the antireflection film or the like of the present invention may be employed.
- the color can be suitably changed as in the present invention.
- the first aspect of the present invention is an antireflection structure having a concavo-convex structure formed of a transparent body, the width between adjacent vertices being less than or equal to the visible light wavelength, and the antireflection structure described above.
- the planar shape is an antireflection structure that constitutes at least one selected from the group consisting of characters, symbols, and figures.
- the antireflection structure of the present invention has a fine concavo-convex structure (hereinafter also referred to as a first concavo-convex structure or a moth-eye structure) having a width (pitch) between adjacent vertices equal to or less than a visible light wavelength.
- “below the visible light wavelength” means 380 nm or less which is the lower limit of a general visible light wavelength region. Preferably, it is 300 nm or less, More preferably, it is 200 nm or less.
- the second region in the antireflection structure of the present invention is usually partitioned with respect to the first region to constitute at least one selected from the group consisting of characters, symbols, and figures, which is preferably It will be visually recognized.
- the characters, symbols, and figures may not be visible when the antireflection structure is viewed in plan, but may be visible when viewed from an oblique direction.
- the second area is in contact with the first area and is surrounded by the first area that surrounds the second area, thereby constituting at least one selected from the group consisting of characters, symbols, and figures.
- the planar shape of the second region constitutes at least one selected from the group consisting of characters, symbols, and figures
- the shape itself is at least one shape selected from the group consisting of characters, symbols, and figures.
- a character refers to a code used to express a language
- a symbol refers to a code other than a character.
- the figure only needs to indicate a specific shape by the outline of the second region other than the reference numeral.
- the second region is used to raise visibility and call attention. For example, it is for preventing accidents such as a collision by recognizing the presence of a wall with an antireflection film.
- the second region is used as a logo and / or an advertisement.
- the second region is preferably recognized as a color difference from the surrounding first region.
- the antireflection structure of the present invention may be an antireflection film made of a transparent resin.
- the concavo-convex structure in the first region and the structure in the second region are usually made of a transparent resin.
- a transparent resin a resin that is curable under certain conditions, such as a photo-curable resin and a thermosetting resin, is preferable for forming a high-definition moth-eye structure.
- the antireflection film is used, for example, by being thinly formed on a substrate plane.
- the substrate on which the antireflection film is formed include a polarizing plate, an acrylic protective plate, a hard coat layer disposed on the polarizing plate surface, and a polarizing plate surface, which are members constituting the outermost surface of the display device.
- An antiglare layer By arranging the antireflection film on the observation surface side of the display device in this way, it is possible to blur the reflection of the image due to the reflected light and make the image inconspicuous.
- the structure of the second region is a concavo-convex structure in which the width between adjacent vertices is not more than the visible light wavelength.
- the uneven structure in the first region and the uneven structure in the second region may be different in height and other shapes.
- the second region can be suitably displayed as a character, a symbol, or a figure by utilizing the slight reflection coloring by the moth eye.
- the concavo-convex structure of the second region is preferably different from the concavo-convex structure of the first region in apex height. Moreover, it is preferable that the uneven structure of the second region is different in shape from the uneven structure of the first region.
- the shape of the concavo-convex structure is different from the form in which the heights of the protrusions are different, the form in which the pitch between the protrusions and the inclination of the protrusions are different, and the form in which these forms are combined.
- the structure of the second region is not a concavo-convex structure in which the width between adjacent vertices is less than or equal to the visible light wavelength.
- Examples of the structure different from the concavo-convex structure of the first region in the second region include a flat shape and a concavo-convex structure in which the width between adjacent vertices exceeds the visible light wavelength.
- a flat shape is preferable.
- the flat shape may be, for example, in the manufacturing process, the width between adjacent vertices is less than or equal to the visible light wavelength, and is not provided with an uneven structure (moth eye) composed of a transparent resin, During the manufacturing process, the width between adjacent vertices is less than or equal to the visible light wavelength, and a concavo-convex structure (moth eye) composed of a transparent resin is provided, but the transparent resin fills the concavo-convex structure and the surface is flat.
- an uneven structure moth eye
- a concavo-convex structure (moth eye) composed of a transparent resin
- the second aspect of the present invention is a method for producing an antireflection structure having a concavo-convex structure formed of a transparent body, the width between adjacent vertices being equal to or less than the visible light wavelength, A first region having the concavo-convex structure on the surface, and a second region having a structure composed of a transparent body different from the concavo-convex structure of the first region on the surface, and a plane of the second region
- the shape is a method of manufacturing an antireflection structure that constitutes at least one selected from the group consisting of characters, symbols, and figures.
- the manufacturing method of the antireflection structure of the present invention is to deform the concavo-convex structure in a partial region after forming the concavo-convex structure.
- Deformation means adding a transparent resin to fill all or part of the concavo-convex structure, or changing the height and shape by changing the processing conditions and / or the number of treatments for forming the concavo-convex structure.
- the partial area is a second area according to the present invention.
- the method for producing an antireflection structure of the present invention may be a method for producing an antireflection film composed of a transparent resin.
- the uneven structure of the first region and the structure of the second region are usually made of a transparent resin.
- the preferable form of the antireflection structure manufactured by the manufacturing method of the present invention is the same as the preferable form of the antireflection structure of the present invention described above.
- a transfer mold having a concavo-convex structure on the surface where the width between adjacent vertices is less than or equal to a visible light wavelength, the transfer mold having a concavo-convex structure on the surface. And a second region having a structure different from the concavo-convex structure of the first region on the surface, and the second region forms at least one selected from the group consisting of characters, symbols, and figures A transfer mold having a planar shape.
- the fourth aspect of the present invention is a method for producing a transfer mold having a concavo-convex structure on the surface where the width between adjacent vertices is less than or equal to the visible light wavelength.
- the production method comprises a metal film on a substrate. Forming a first region having the concavo-convex structure on the surface of the metal film, and a second step forming a second region having a structure different from the concavo-convex structure of the first region.
- the second region is a method for manufacturing a transfer mold having a planar shape forming at least one selected from the group consisting of characters, symbols, and figures.
- the second step in the production method of the present invention is preferably for forming holes in the metal film at regular intervals by at least anodic oxidation.
- the second step in the manufacturing method of the present invention is to make the first region and the second region differently by changing the number of treatments and / or treatment time of the anodizing treatment and / or etching treatment. Preferably there is.
- the manufacturing method is one in which the first region and the second region are separately formed using a mask in the anodizing process and / or the etching process.
- a fifth aspect of the present invention is a display device in which a transparent body having a concavo-convex structure having a width between adjacent vertices of a visible light wavelength or less on the surface is disposed on the display surface, the transparent body having the concavo-convex structure.
- a first region having a structure on the surface, and a second region having a structure different from the concave-convex structure of the first region on the surface, and the planar shape of the second region is composed of characters, symbols, and figures
- the uneven structure of the first region and the structure of the second region are preferably made of a transparent resin.
- the display device of the present invention preferably includes the antireflection structure of the present invention or the antireflection structure obtained by the production method of the antireflection structure of the present invention on the display surface.
- the antireflection structure of the present invention is installed on the front surface (observer side surface) of the display device and is attached to the display device.
- the display device of the present invention may be a display device having the function of the antireflection structure of the present invention on the front surface.
- the display device of the present invention include a liquid crystal display (LCD) device, a plasma display panel (PDP), and an electroluminescence (EL) display.
- the electroluminescence display an organic electroluminescence display (OELD) is preferable.
- the present invention can be used particularly suitably in a display device in which a material that reflects light such as electrodes and wiring is generally used in the device.
- the display surface display An excellent low reflection effect can be obtained for any reflection that occurs between the outer surface of the panel and the inside of the display device.
- the second region is used as a logo and / or an advertisement when in a non-display state.
- the preferred form of the concavo-convex structure or the like in the display device of the present invention is the same as the preferred form of the concavo-convex structure or the like in the antireflection structure of the present invention described above.
- the antireflection structure, the transfer mold, the manufacturing method thereof, and the display device of the present invention include other components as long as such components are essential. May not be included, and is not particularly limited.
- the antireflection structure, the transfer mold, the manufacturing method thereof, and the concavo-convex structure included in the display device according to the present invention are required to have a width (pitch) between adjacent vertices equal to or less than a visible light wavelength.
- the height from the top to the bottom may be equal to or less than the visible light wavelength or may be equal to or greater than the visible light wavelength.
- reflection in a structure having a moth-eye structure, reflection can be sufficiently reduced by the moth-eye structure and the transmittance can be sufficiently improved while a part of regions having different reflection characteristics are mixed. .
- FIG. 2 is a schematic plan view of an antireflection film according to Embodiment 1.
- FIG. It is a cross-sectional schematic diagram which shows the convex part from which the height in a moth eye structure differs. It is a graph which shows the reflectance (%) with respect to the wavelength (nm) in each convex part shown in FIG. 2 is a schematic cross-sectional view of a moth-eye structure of the antireflection film of Embodiment 1.
- FIG. 2 is a schematic cross-sectional view of a moth-eye structure of the antireflection film of Embodiment 1.
- FIG. 6 is a schematic plan view of an antireflection film according to a modification of Embodiment 1.
- FIG. 6 is an example of a schematic cross-sectional view of an antireflection film of a modification of the first embodiment.
- FIG. 6 is an example of a schematic cross-sectional view of an antireflection film of a modification of the first embodiment.
- FIG. It is a cross-sectional schematic diagram when light is incident on the antireflection film shown in FIG. It is a cross-sectional schematic diagram when light is incident on the antireflection film shown in FIG. 7 from an oblique direction.
- region A shown in FIGS. 9 and 10 when light is incident at an incident angle of 5 ° from the surface normal and when light is incident at an incident angle of 60 ° from the surface normal ( nm) is a graph showing the reflectance (%).
- FIG. 6 is a schematic diagram of a transfer mold according to Embodiment 2.
- FIG. 6 is a schematic cross-sectional view showing a manufacturing flow of a transfer mold according to Embodiment 2.
- FIG. 6 is a photograph showing a cross section of a transfer mold of Embodiment 2.
- 6 is a photograph showing a cross section of a transfer mold of Embodiment 2.
- FIG. 10 is a schematic view showing a cross section in the course of the manufacturing process of the transfer mold of the first modified example of Embodiment 2.
- 6 is a schematic diagram showing a cross section of a transfer mold according to a first modification of Embodiment 2.
- FIG. 10 is a schematic view showing a cross section in the course of the manufacturing process of the transfer mold of the second modified example of Embodiment 2.
- FIG. 6 is a schematic diagram showing a cross section of a transfer mold according to a second modification of Embodiment 2.
- FIG. It is a schematic diagram which shows the cross section in the middle of the manufacturing process of the antireflection film of the 3rd modification of Embodiment 2.
- 6 is a schematic diagram showing a cross section of an antireflection film of a third modification of Embodiment 2.
- FIG. 10 is a schematic view showing a cross section in the course of the manufacturing process of the transfer mold of the fourth modified example of Embodiment 2.
- FIG. 6 is a schematic diagram showing a cross section of a transfer mold according to a second modification of Embodiment 2.
- FIG. It is a schematic diagram which shows the cross section in the middle of the manufacturing process of the antireflection film of the 3rd modification of Embodiment 2.
- 6 is
- FIG. 10 is a schematic diagram showing a cross section of a transfer mold according to a fourth modified example of Embodiment 2.
- FIG. 10 is a schematic diagram showing a cross section in the middle of the manufacturing process of a transfer mold of a fifth modification of Embodiment 2.
- FIG. 10 is a schematic diagram illustrating a cross section of a transfer mold according to a fifth modification of the second embodiment. It is a schematic diagram which shows the cross section in the middle of the manufacturing process of the antireflection film of the 6th modification of Embodiment 2. It is a schematic diagram which shows the cross section of the antireflection film of the 6th modification of Embodiment 2. 2 is an example of a schematic cross-sectional view of an antireflection film of Comparative Example 1.
- FIG. It is an example of the cross-sectional schematic diagram of the conventional antireflection film.
- a concavo-convex structure in which the width between adjacent vertices is less than or equal to the visible light wavelength (380 nm or less) is referred to as a “moth-eye structure”.
- the surface of the region where the moth-eye structure is formed is referred to as a “moth-eye surface”.
- a sheet having a moth-eye structure on the surface is referred to as a “moth-eye sheet”, and a film having a moth-eye structure on the surface is referred to as a “moth-eye film”.
- FIG. 1 is a schematic plan view of an antireflection film according to the first embodiment.
- the antireflection film 11 according to Embodiment 1 has a first region having a concavo-convex structure (first moth-eye structure) made of a transparent resin having a period smaller than the visible light wavelength (width between adjacent vertices) on the surface. 13 and a second region having a concavo-convex structure on the surface, which is different from the concavo-convex structure of the first region, having a period shorter than the visible light wavelength (width between adjacent vertices) and made of a transparent resin. Different regions) 15.
- the first region 13 and the second region 15 having a moth-eye structure are regions in which a concavo-convex structure for reducing reflection on the surface of the antireflection film 11 is formed.
- the antireflection film 11 of Embodiment 1 corresponds to a moth-eye sheet.
- the first embodiment as shown in FIG. 1, portions having different reflection characteristics are provided so that a pattern is arranged at a specific position of the antireflection film 11 or entirely.
- the logo 15L, the specific figure 15F, and the like are made visible.
- the symbols can also be made visible.
- the second region 15 constituting such a character, symbol, or figure is not formed on the moth-eye sheet by printing or breaking the moth-eye structure, but is formed so that the chromatic dispersion characteristics are changed in advance. A different concavo-convex structure is formed above, and this is transferred and formed.
- the first region is formed on a mold, and the second region in which the height of the moth-eye shape (convex portion of the concavo-convex structure) is 10% to 20% lower than the first region
- the second region in which the height of the moth-eye shape (convex portion of the concavo-convex structure) is 10% to 20% lower than the first region
- Such characters, symbols or figures are formed on the film by making them on a mold in a form and transferring them. If comprised in this way, a moth eye will be formed also in the part of a character, a symbol, or a figure. Therefore, the low reflection characteristic due to the moth-eye shape in the antireflection film is not significantly impaired and can be sufficiently improved.
- the moth-eye in the second region which is 10% to 20% lower, can be sufficiently excellent without impairing the display performance when used in a display device in combination with the moth-eye in the first region.
- characters, symbols, or figures can be recognized slightly in comparison with the first region having a moth-eye shape as well. This is useful for preventing accidents caused by, for example, product and manufacturer advertisements and / or high transparency of moth eyes. Alternatively, it can be suitably used as a design accent.
- FIG. 2 is a schematic cross-sectional view showing convex portions having different heights in the moth-eye structure.
- FIG. 3 is a graph showing the reflectance (%) with respect to the wavelength (nm) in each convex portion shown in FIG.
- the moth-eye-shaped protrusions (convex portions) usually have a pitch of 200 nm or less and a height of about 200 nm. This is determined so that the area having the moth-eye shape is sufficiently low and constant in the visible light range (having a reflectance that does not vary greatly depending on the wavelength).
- the wavelength characteristic (wavelength dependence) of the reflectance changes. 2 and 3 briefly describe the situation.
- the projection height of the moth eye is set to 200 nm or more. When this height is about 170 nm, the reflectance increases from the red region of visible light. Therefore, the surface of the moth eye looks a little reddish.
- the graph of FIG. 3 shows the wavelength dependence of the reflectance of the region where the moth-eye having different heights shown in FIG. 2 is formed.
- the height of the moth-eye protrusions is increased, a remarkable change is observed particularly in the long wavelength region.
- the reflectance in the red region is high, indicating that the moth-eye surface is reddish.
- the waveform indicating the reflectance in the figure is flat, and there is no particular maximum for the visible light wavelength, and the reflectance is also kept very low over the entire visible light wavelength.
- the reflected color from is not colorless and is almost colorless. It can be seen that the color reflected from the moth-eye surface looks different depending on the height.
- This graph is a regular reflection graph when the incident angle of incident light is 5 °. The color of the reflection changes depending on the angle from which the moth eye is viewed.
- the moth eye is tilted from the vertical direction with respect to the moth eye surface, the apparent height decreases, and the reflection increases in the red region. Therefore, the moth-eye with a height of 185 nm is more reddish when viewed from an oblique direction.
- FIGS. 4 and 5 are schematic cross-sectional views of the moth-eye structure of the antireflection film of the first embodiment. If the protrusion on a part of the moth-eye surface (second region 15) is made lower than the protrusion on the first region 13 as shown by the double arrows in FIGS. 4 and 5, for example, as described above, 185 nm If the height is made, the reflected light R of the moth eye in the second region 15 can be set to be reddish, for example.
- the protrusions in the other region that is, the first region 13 where the height of the moth eye is high
- the reflected light in that region is very small and the reflected light has a specific color. Is not emphasized.
- the second region 15 in contrast with the first region 13 is partially formed as a character, symbol, or figure as shown in FIG. 1, these characters, symbols, or figures are colored on the moth-eye surface. Is recognized as a changed area.
- the colored second region 15 since the colored second region 15 also has a moth-eye structure, low reflection characteristics are maintained as shown in the graph of FIG. Therefore, when viewed through this moth eye, the character, symbol, or figure portion of the second region 15 is not overemphasized. That is, even when this antireflection film (moth eye sheet) 11 is bonded to the display surface of the display device, it is not difficult to see characters, symbols, or figures superimposed on the displayed image.
- a logo or the like is displayed because the reflection on the surface to which the antireflection film 11 is attached is thin and characters, symbols, or figures appear to be raised. And can be used for advertising.
- the moth-eye shape of some regions is different from the moth-eye shape of other regions (embodiment 2 and fourth to sixth modifications of embodiment 2). The same effect can be exhibited particularly remarkably.
- the projections having a reflection characteristic having a height of 280 nm shown in FIGS. 2 and 3 are reflected on the surface of the glass surface on which the antireflection film 11 is applied. Is extremely low, an accident may occur, such as a person not being aware of the glass surface and hitting the glass surface. If the characters, symbols or figures of the second region 15 are put in the antireflection film 11, the visibility of the antireflection film 11 can be improved, so that it can be used for safety promotion and accident prevention.
- the reflectance (Y) of the protrusion (P 185 ) having a height of 185 nm is 0.059%.
- the reflectance (Y) of the protrusion (P 210 ) having a height of 210 nm is 0.057%.
- the reflectance (Y) of the protrusion (P 280 ) having a height of 280 nm is 0.031%.
- the reflectance (%) refers to the Y value of the “XYZ color system (CIE 1931 color system)”. In other words, in the XYZ color system, the Y value among the X value, the Y value, and the Z value of the object color due to reflection obtained by the following equation.
- the Y value is clear from the above formula, but is an integral value in the visible light range of wavelengths 380 nm to 780 nm, and does not mean the reflectance at a specific wavelength.
- FIG. 6 is a schematic plan view of an antireflection film according to a modification of the first embodiment.
- 7 and 8 are examples of schematic cross-sectional views of an antireflection film according to a modification of the first embodiment.
- FIG. 6 schematically shows a cross section taken along the line AB shown in FIG.
- a character, symbol, or figure such as a logo is put in the antireflection film (moth eye sheet) 111 on which the moth eye is formed, a method of making the moth eye of the portion (second region 115) non-functional, There is a method of changing the reflection characteristics of the moth eye in the two regions 115). For example, as shown in FIG.
- the simplest method is to directly print the character with ink or the like without changing the structure of the moth-eye made of transparent resin.
- opaque ink when opaque ink is used, light cannot be transmitted, so the other side cannot be seen (when opaque ink is used, this corresponds to Comparative Example 1 described later). Therefore, as a case where the characteristics of the moth eye are not functioned, (1) a method in which the moth eye shape is not formed in that portion can be mentioned. That is, as shown in FIG. 7, it is possible to adopt a configuration that does not have a moth-eye structure in part.
- the moth eye may be filled with a transparent material such as a transparent resin.
- the second region is common to the first region in that the second region is light transmissive, and an antireflection film having moth eyes formed thereon is placed in front of the display device.
- the letters, symbols or figures formed when attached to a glass plate constituting a window or a wall and looking through the antireflection film do not significantly sacrifice the light transmittance.
- the reflection due to the difference in refractive index existing at the substrate interface occurs at the place where the moth-eye function is lost (second region 115 in FIG. 7).
- the base material refractive index of the transparent resin constituting the moth-eye surface is 1.5 and the surrounding area is air, the portion without the moth-eye function has a reflectance of 4%, and the moth-eye forming portion (reflectance of about 0) 0.1%).
- the base material refractive index of the resin portion having no moth-eye function is 1.5. This difference in reflectance is easily visible, and in this case, the region can be clearly recognized as a difference in reflection even when viewed from the front.
- the reflection characteristic is changed by giving a difference to the shape of the moth eye
- display of characters, symbols or figures is realized by the difference in the reflectance characteristic depending on the shape of the moth eye.
- the second region 215 has a moth-eye shape
- the difference in reflectance between the inside and outside of the second region 215 (the reflectance of the first region 213 and the reflection of the second region 215).
- the difference from the rate is a slight difference. Accordingly, when the moth-eye surface is viewed from the front, the second region 215 is clearly indistinguishable. However, when the moth-eye surface is viewed from an oblique direction, the difference in reflectance between the two regions tends to increase.
- the region 215 is easily visible.
- FIG. 9 is a schematic cross-sectional view when light is incident on the antireflection film shown in FIG.
- FIG. 10 is a schematic cross-sectional view when light is incident on the antireflection film shown in FIG. 7 from an oblique direction.
- FIG. 11 shows a case where light is incident at an incident angle of 5 ° from the surface normal in the region A shown in FIGS. 9 and 10 and a case where light is incident at an incident angle of 60 ° from the surface normal. It is a graph which shows the reflectance (%) with respect to each wavelength (nm).
- FIG. 12 shows a case where light is incident at an incident angle of 5 ° from the surface normal in the region B shown in FIGS.
- the refractive index of the transparent resin which is a moth-eye forming medium
- the state is nearly vertical (for example, the incident angle [incident angle from the surface normal direction] is 5 °).
- the incident light is recognized by the difference between the reflectance of the region A of about 0.1% and the reflectance of the region B of 4%, even from the front. Is done.
- the region B has a high reflectance, the portion can be seen through (a translucent region), so that even if it is placed in front of the display device, the display screen of the display device is not visually obstructed. Since the region B can be seen from any direction, generally, the reflectance is extremely lowered by an antireflection film having a moth-eye shape, etc., and there is a concern about a collision accident due to the fact that there is no wall. By providing such a region B in a part of the wall, it is recognized that there is a wall, which is particularly useful for preventing accidents.
- FIG. 13 is a schematic cross-sectional view when light is incident on the antireflection film shown in FIG.
- FIG. 14 is a schematic cross-sectional view when light is incident on the antireflection film shown in FIG. 8 from an oblique direction.
- FIG. 15 is a graph of reflectance (%) with respect to wavelength (nm) in the region A shown in FIGS. 13 and 14 when the incident angle of incident light is changed.
- FIG. 16 is a graph of reflectance (%) with respect to wavelength (nm) in the region B shown in FIGS. 13 and 14 when the incident angle of incident light is changed.
- the graphs shown in FIGS. 15 and 16 are obtained by measuring the reflectance with respect to moth-eye surfaces having moth-eye having different heights. In each graph, the reflectance is measured by changing the incident angle of the light with respect to the normal direction of the moth-eye surface.
- the moth-eye surface has the lowest reflectance for light incident at an angle close to vertical. It can be seen that the reflectance gradually increases from the longer wavelength side as the incident angle (angle difference from the normal of the moth-eye surface) increases. In addition, it can be seen that the reflectance rises more slowly with respect to the incident angle when the height of the moth eye is higher (the moth eye with the height of 280 nm in the region A).
- a region A in which a moth eye with a high height (projection height 280 nm) is arranged and a region B in which a moth eye with a low height (projection height 190 nm) is arranged are adjacent to each other. If both are formed, the reflectivity is very low from the graphs shown in FIG. 15 and FIG. 16 for the incidence angle close to the vertical in both regions, and the difference is also a slight difference.
- the region is hardly understood or the slightly lower one (region B) is recognized as a region that produces reddish reflected light.
- the incident angle becomes large, for example, 60 °
- the difference between the two areas is recognized because the reflectance is about 2% in the areas A and B, and the boundary between the two areas is also recognized. Will be.
- the difference between the two regions is not noticeable in the front.
- the region B becomes conspicuous because the reflection characteristics of both regions are different from each other.
- characters, symbols or figures are recognized. It is to be noted that changing the height in this way does not require changing the anodic oxidation conditions and the etching conditions between the regions even when producing a transfer mold as will be described later. Since B can be made separately, it is preferable.
- the unevenness of the moth-eye structure of the antireflection film of Embodiment 1 has a plurality of minute protrusions arranged side by side with a repeating unit having a period smaller than the visible light wavelength.
- the top of the convex portion is the apex, and the point where the convex portions are in contact with each other is the bottom point.
- the width between adjacent vertices of the moth-eye structure is indicated by the distance between the two points when the perpendicular is lowered from the vertex of the convex portion to the same plane (when the moth-eye surface is viewed in plan).
- the height from the top of the moth-eye structure to the bottom point is indicated by the distance when a perpendicular is dropped from the top of the convex portion to the plane where the bottom point is located.
- the width between adjacent vertices of the moth-eye structure is 380 nm or less, preferably 300 nm or less, more preferably 200 nm or less. It is sufficient that the width is substantially controlled within such a numerical value range as a whole, and a part of the width may not be controlled within these numerical ranges.
- the unit structure of the moth-eye structure is shown to be conical, but the unit structure may be, for example, a quadrangular pyramid.
- the unit structure is not particularly limited as long as it is a concavo-convex structure in which a vertex and a bottom point are formed and the width is controlled within the above numerical range.
- the moth-eye structure provided in the antireflection film of Embodiment 1 is composed of a convex portion and a base portion. As light travels from one medium to another, it refracts at the interface of these media. The degree of refraction is determined by the refractive index of the medium through which light travels. For example, it has a refractive index of about 1.0 for air and about 1.5 for resin.
- the unit structure of the concavo-convex structure formed on the surface of the antireflection film has a conical shape, that is, has a shape in which the width gradually decreases toward the tip.
- the convex portion located at the interface between the air layer and the antireflection film is refracted from the refractive index of air of about 1.0 to the refractive index of the film constituent material (about 1.5 for resin). It can be considered that the rate is increasing gradually and continuously. Since the amount of light reflected is proportional to the difference in refractive index between the media, almost all of the light passes through the antireflection film by making the light refraction interface virtually non-existent in this way. The reflectance on the film surface is greatly reduced.
- the display device is a liquid crystal display device (LCD), and includes the antireflection film according to the first embodiment on the display surface.
- the display surface has a moth-eye structure while partially mixing regions having different reflection characteristics. The reflection can be sufficiently reduced and the transmittance can be sufficiently improved.
- the panel portion of the LCD according to Embodiment 1 includes a pair of substrates and a liquid crystal layer sandwiched between the pair of substrates.
- Examples of the pair of substrates include a configuration in which one substrate is an array substrate and the other substrate is a color filter substrate.
- An electrode is disposed on at least one of the pair of substrates to generate an electric field generated by the electrodes.
- the liquid crystal layer can be driven and controlled by the influence.
- there is a mode in which one of the substrates serves as both an array substrate and a color filter substrate and is not particularly limited.
- the method for controlling the alignment of the liquid crystal molecules in the liquid crystal layer is not particularly limited, such as a TN (Twisted Nematic) mode, a VA (Vertical Alignment) mode, and an IPS (In-Plane Switching) mode.
- a light control element such as a polarizing plate is provided on each surface of the array substrate and the color filter substrate opposite to the liquid crystal layer.
- the array substrate is configured by arranging wirings, electrodes, and the like for controlling the alignment of liquid crystal molecules in a liquid crystal layer on a support substrate such as glass or plastic.
- the liquid crystal driving method include a passive matrix type and an active matrix type.
- wirings are arranged so as to cross each other, and a plurality of regions surrounded by these wirings. Constitutes a matrix shape.
- materials such as aluminum (Al), silver (Ag), tantalum nitride (TaN), titanium nitride (TiN), and molybdenum nitride (MoN) are excellent in terms of functionality and productivity. Yes.
- a semiconductor switching element such as a thin film transistor (TFT: Thin Film Transistor) is disposed at the intersection of each wiring to control a signal transmitted from each wiring.
- TFT thin film transistor
- the TFT has an electrode for applying a bias voltage to the semiconductor layer, and this electrode material is also reflective because the material used for the wiring and electrode is preferably used.
- An interlayer insulating film is formed on these wirings and TFTs. Further, on the interlayer insulating film, a pixel electrode formed of a light-transmitting material is overlapped with a region surrounded by the wirings. Be placed.
- the pixel electrode is made of a light-transmitting metal oxide such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
- a resin layer such as a color filter layer or a black matrix layer is disposed on a support substrate such as glass or plastic. Further, a counter electrode formed of a light-transmitting material is disposed over the resin layer. The counter electrode is also made of a metal oxide such as ITO or IZO, like the pixel electrode.
- the antireflection film of Embodiment 1 is provided on the display surface (observation surface) side of the color filter substrate.
- the display device of Embodiment 1 is not limited to such an LCD, and can be used for any display device such as a PDP or an EL.
- FIG. 17 is a schematic diagram of a transfer mold according to the second embodiment.
- a transfer mold 321 such as a roll mold having a female pattern on the surface.
- a method for producing an antireflection film with a roll-type transfer mold 321 is shown.
- the roll-type transfer mold 321 is, for example, a roll mold produced by cutting aluminum (Al), or a thin sleeve tube serving as a base material on which an aluminum film is formed.
- the surface is fabricated by repeatedly performing anodizing treatment and etching treatment.
- alumina Al 2 O 3
- anodized porous alumina in which a large number of minute holes (pores) of the order of visible light wavelength or less are formed by anodizing aluminum is used as a transfer mold. Create a wide range on the surface.
- the shape of the irregularities of the anodized porous alumina is finally a triangle when viewed in cross section, and the shape is formed by repeating pore formation by anodizing of aluminum and etching of the anodized film. .
- a mold is produced by a flow (anodization 5 times, etching 4 times) in which anodization, etching, anodization, etching, anodization, etching, anodization, etching and anodization are performed in this order.
- a flow anodization 5 times, etching 4 times
- anodization, etching, anodization, etching, anodization, etching, anodization, etching and anodization are performed in this order.
- the shape of the minute hole formed becomes a tapered shape (tapered shape) toward the inside of the mold.
- the transfer mold is not limited to the above-described cut aluminum roll mold or a thin sleeve tube formed with an aluminum film, but also a glass substrate, SUS, Ni, and other metal materials, as well as polypropylene, polymethylpentene, Polyolefin resins and polycarbonate resins of cyclic olefin polymers (typically, product names such as norbornene resins such as “ZEONOR” [manufactured by ZEON CORPORATION], product names “ARTON” [manufactured by JSR Corporation], etc.] It may be a resin material such as polyethylene terephthalate, polyethylene naphthalate, or triacetyl cellulose. The shape may be flat.
- a desired pattern 325 is applied in advance by printing such as a stamp using a resin such as a resist before anodizing treatment. Thereafter, surface treatment such as anodizing treatment and etching treatment is performed.
- the formed pattern 325 is dissolved and removed with a solvent. Thereafter, anodization and etching are performed again. As a result, the number of processing steps is reduced where the pattern 325 is formed as compared with the surrounding area. Therefore, after the anodic oxidation treatment and the etching treatment are performed a plurality of times, the portion where the pattern 325 is initially formed is formed with a shallower depth of the mold compared to the surrounding area (transfer). The second region of the mold 321 for use). The moth-eye surface transferred with the mold formed in this way has a lower height only at the corresponding pattern (constitutes the second region in the antireflection film). This second region has a different reflection characteristic from the surrounding first region.
- FIG. 18 is a schematic cross-sectional view showing the manufacturing flow of the transfer mold according to the second embodiment, and (P 1 ) to (P 4 ) show the respective manufacturing steps.
- 19 and 20 are photographs showing a cross section of the transfer mold of the second embodiment.
- an aluminum film is formed on a substrate such as a thin sleeve tube (step P 1 ).
- the film thickness can be, for example, 1.0 ⁇ m.
- anodic oxidation is performed (step P 2 ) under the conditions of anodic oxidation at an applied voltage of 80 V in a liquid having an oxalic acid concentration of 0.6 wt% and a liquid temperature of 5 ° C.
- the anodization time is 30 seconds, for example.
- the anodizing treatment step P 2 together with the aluminum film is aluminum oxide 322AO, depending on the applied voltage, it can be a hole in roughly regular intervals.
- an etching step (step P 3) in phosphoric acid solution.
- the conditions are, for example, phosphoric acid 1 mol / l, a liquid temperature of 30 ° C., and this time is, for example, 30 minutes.
- etching step P 3 holes drilled into previously, isotropically etched, the diameter of the hole made by the anodic oxidation is widened (widening).
- anodizing treatment step P 2 subsequently carrying out anodizing treatment step P 2 again. Conditions are implemented under the same conditions as the previous time. In this step, anodized holes further advance in the holes widened in the previous etching process, and the holes progress in the film thickness direction. Subsequently carrying out the etching process P 3 as widening. By this process, the hole deeply formed in the previous time (the second anodizing process P 2 ) and the hole processed and widened before that (the first anodizing process P 2 and the etching process P 3 ). Both are etched to further widen the hole.
- step P 4 in FIG. 18 By thus carrying out a plurality of times anodizing and the etching process, as shown in step P 4 in FIG. 18, it is possible to form pores of a desired substantially cone. That is, as shown in the photographs shown in FIGS. 19 and 20, an inverted cone hole is formed on the surface of the transfer mold.
- the shape of the hole is controlled by an anodic oxidation time and an etching time.
- the photograph shown in FIG. 19 is an example in which a hole is formed deeply
- the photograph shown in FIG. 20 is an example in which a hole is formed shallowly. It is also controlled by the number of anodic oxidation and etching performed a plurality of times.
- the shape of one region (second region) of the corresponding transfer mold may be formed shallow, for example. Therefore, a pattern is first printed on a mold with a resist or the like, anodized and etched once, the resist is peeled off, and then the entire region is subjected to anodization and etching to cover the resist. Can be formed shallowly.
- a moth-eye structure is produced from the transfer mold produced in the above process.
- the base material is bonded, and ultraviolet (UV) light is irradiated to the resin layer.
- UV ultraviolet
- a photopolymerizable resin solution is applied onto a substrate (for example, a TAC film) sent by a conveyor system by, for example, a gravure roll coating method, a die coating method, or the like, and the resin is dried at 80 ° C.
- a film having a moth-eye structure can be produced by transferring the unevenness of the transfer mold by a general roll-to-roll method or the like in which these are successively performed.
- various methods such as replication methods, such as a hot press method (embossing method), injection molding method, a sol gel method, the lamination method of a fine unevenness shaping sheet, the transfer method of a fine unevenness layer May be appropriately selected according to the use of the antireflection article, the material of the base material, and the like.
- Method (1) A part of the moth-eye shape is eliminated (the uneven structure is eliminated). Thereby, the area
- (1) -i Method related to a mold.
- (1) -iA Fill the uneven structure of the mold.
- (1) -iB A moth-eye structure is not formed in a part of the mold during the process.
- (1) -iBa A part of the mold is masked so that the anodizing process / etching process (AO / Et) cannot be performed.
- (1) -ii A method relating to a film. Specifically, the portion (second region) of the film is filled.
- (2) -i Method related to a mold. Specifically, the protrusion is partially made low.
- (2) -iA The shape is changed by omitting part of AO / Et.
- (2) -iAA Mask a part of the mold and perform AO / Et. Remove the mask along the way.
- (2) -iB Fill a part of the mold.
- (2) -iBa Fill with printing that can be controlled by changing the coating amount minutely, such as inkjet.
- (2) -iC The shape is changed by changing the resistance of a part of the mold.
- (2) -iCa Change the film thickness.
- (2) -iCB Change material.
- (2) -iD Partially change the mold manufacturing conditions.
- (2) -iDa The electrode at the time of AO is made to match the character, symbol or figure, and the distance between the electrodes is reduced.
- (2) -ii A method relating to a film. Specifically, the portion (second region) of the film is partially filled with printing that can control the coating amount minutely, such as inkjet.
- FIG. 21 is a schematic diagram illustrating a cross-section in the middle of the manufacturing process of the transfer mold according to the first modification of the second embodiment.
- FIG. 22 is a schematic diagram illustrating a cross section of a transfer mold according to a first modification of the second embodiment.
- FIG. 23 is a schematic diagram illustrating a cross section in the course of the manufacturing process of the transfer mold according to the second modification of the second embodiment.
- FIG. 24 is a schematic diagram illustrating a cross section of a transfer mold according to a second modification of the second embodiment.
- the mask M is applied only to a part of the mold (second region 524 in the manufacturing process), and the uneven structure is not formed in that part (second region 525).
- FIG. 25 is a schematic view showing a cross section in the middle of the manufacturing process of the antireflection film of the third modification of the second embodiment.
- FIG. 26 is a schematic diagram illustrating a cross section of an antireflection film according to a third modification of the second embodiment. The function is lost by filling the moth eye with a transparent resin in a part (second region 615) on the antireflection film (film).
- FIG. 27 is a schematic view showing a cross section in the middle of the manufacturing process of the transfer mold of the fourth modified example of the second embodiment.
- FIG. 28 is a schematic diagram illustrating a cross section of a transfer mold according to a fourth modification of the second embodiment.
- Part of anodization (AO) / etching (Et) which is a moth-eye type manufacturing process, is partially skipped by masking. Since not all of them are skipped, the area corresponding to the mask portion (second area 725) has a lower moth-eye shape than the surrounding first area 723.
- FIG. 29 is a schematic view showing a cross section in the middle of the manufacturing process of the transfer mold of the fifth modified example of the second embodiment.
- FIG. 30 is a schematic diagram illustrating a cross section of a transfer mold according to a fifth modification of the second embodiment. As shown in FIG. 29, it is assumed that after the moth-eye type is manufactured as usual, the specific region (second region 825) is coated with the resin r (the hole may not be completely filled).
- FIG. 31 is a schematic view showing a cross section in the course of the manufacturing process of the antireflection film of the sixth modification of the second embodiment.
- FIG. 32 is a schematic diagram illustrating a cross section of an antireflection film according to a sixth modification of the second embodiment. A transparent resin is applied to a partial region of the film transferred from the moth-eye mold (second region 915 in FIG. 32. The moth-eye is not completely filled).
- the antireflection structure of the present invention and the display device of the present invention including the transfer mold can be produced, the antireflection structure, and It can be said that this is an embodiment of a display device.
- the embodiment about the antireflection structure mentioned above can produce the display apparatus of this invention provided with an antireflection structure, it can be said that it is embodiment about a display apparatus.
- the configuration of the concavo-convex structure of the present invention can be confirmed by observing with an electron microscope (SEM).
- the moth-eye structure provided in the antireflection film of Embodiment 2 is the same as the moth-eye structure provided in the antireflection film of Embodiment 1, and is designed so that the width between adjacent vertices is equal to or less than the visible light wavelength.
- the configuration of the first embodiment described above can be applied as appropriate.
- the surface shape of the transfer mold and the surface shape of the antireflection film and the display device in the above-described embodiment are substantially flat except for the irregularities due to the moth-eye structure, but the sandblast treatment is performed in advance prior to the anodizing treatment.
- a scattering uneven structure may be provided.
- the main component of the antireflection film may be a resin such as a photocurable resin or a thermosetting resin that is cured under certain conditions from the viewpoint of precisely forming a moth-eye structure.
- a material transparent beads or the like having a refractive index different from the refractive index of the resin material that is a main component of the antireflection film may be scattered.
- the anodic oxidation process shown in Embodiment 2 uses oxalic acid, other acidic electrolytic solutions such as sulfuric acid and phosphoric acid, or alkaline electrolytic solutions may be used.
- the manufacturing method of the transfer mold for forming the moth-eye structure on the antireflection film has been described, the manufacturing method of the transfer mold is not limited to these means. In addition to the above-described anodizing and etching methods, an electron beam drawing method, a laser beam interference exposure method, and the like can be given.
- Embodiment 1 showed an example of the antireflection film as the antireflection structure of the present invention
- the antireflection structure of the present invention is not limited to the antireflection film.
- building materials such as window glass, water tanks, etc. It can be applied to all visually recognized objects such as underwater glasses and tools for visual recognition.
- the moth-eye structure is composed of a transparent body, but the base material provided under the moth-eye structure is not limited to a transparent body, and is an opaque body or a light-transmitting one.
- the substrate may be, for example, a colored glass substrate, a black colored acrylic substrate, a photographic film, or the like. If a moth-eye structure formed of a material having the same refractive index is imparted to a transparent substrate made of glass, acrylic, etc., the surface reflection of the transparent substrate can be remarkably suppressed and transmission visibility can be increased. The effect of reducing the surface reflection due to can be obtained even when the substrate is not a transparent body.
- Such a surface can be used decoratively.
- a moth-eye structure formed of a transparent material may be directly attached, or a moth-eye structure formed of a transparent material is used as a transparent substrate. This transparent substrate may be attached to the top.
- FIG. 33 is an example of a schematic cross-sectional view of the antireflection film of Comparative Example 1.
- the symbols are directly printed with the ink i without changing the structure of the moth eye composed of the transparent resin. Since the opaque ink i is used, light cannot be transmitted, and the other side cannot be seen.
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Abstract
Description
ここで、このような表示をおこなうことを目的として、例えば印刷によりインクiをモスアイ表面上に入れる等、一部を不透明にする方法を採ったとき、その部分はモスアイ機能が消失し、表面反射が多くなるとともに透過率も低下する(図33における領域1015)。表示装置の前面にこのようなモスアイを設置すれば、表示画像が見えない、又は、見え辛くなってしまうおそれがある。
このように、上記課題をみごとに解決することができることに想到し、本発明に到達したものである。
(1)表示状態(オン)にある表示装置が背景に無い場合に、宣伝、ロゴ、標識等を表示する。例えば、表示装置等の前面に置かれたモスアイシートで、表示装置が表示状態(オフ)となっている場合に、宣伝、ロゴ表示をすることができる。また、モスアイ形状はガラス等に貼り合わされると、表面反射が極端に低くなるため、ガラスの存在が容易に視認されなくなり、このため無意識に衝突し事故に発展する場合もあるところ、一部反射が有れば、壁を認識することができ、事故を防止できる。
なお、文字は、言語を表記するのに用いる符号を言い、記号は、文字以外の符号を言う。図形は、符号以外の、第2領域の輪郭線により特定の形状を示すものであればよい。
例えば、反射防止膜が貼られた壁の存在を認識させて衝突等の事故を防ぐためのものである。
上記第2領域における、第1領域の凹凸構造とは異なる構造は、例えば、平坦な形状、隣接する頂点間の幅が可視光波長を超える凹凸構造が挙げられるが、例えば平坦な形状が好ましい。上記平坦な形状は、例えば、製造工程中において、隣接する頂点間の幅が可視光波長以下であり、透明樹脂から構成される凹凸構造(モスアイ)が設けられていないものであってもよく、製造工程中において、隣接する頂点間の幅が可視光波長以下であり、透明樹脂から構成される凹凸構造(モスアイ)が設けられたが、更に、透明樹脂が該凹凸構造を埋めて表面が平坦化された透明樹脂から構成されるものであってもよく、いずれの形態もそれぞれ好ましい。
本発明の反射防止構造体の製造方法は、透明樹脂から構成される反射防止膜の製造方法であってもよい。上記反射防止膜の製造方法により製造される反射防止膜は、通常、第1領域がもつ凹凸構造、及び、第2領域がもつ構造が、透明樹脂から構成される。
本発明の製造方法により製造される反射防止構造体の好ましい形態は、それぞれ、上述した本発明の反射防止構造体の好ましい形態と同様である。
また本発明の製造方法における上記第2工程は、陽極酸化処理、及び/又は、エッチング処理の、処理回数、及び/又は、処理時間を変えて第1領域と第2領域とを作り分けるものであることが好ましい。
本発明の表示装置における上記第1領域がもつ凹凸構造、及び、上記第2領域がもつ構造は、透明樹脂から構成されることが好ましい。
本発明の表示装置は、非表示状態の時に、上記第2領域がロゴ及び/又は宣伝として用いられることが好ましい。
本発明の表示装置における凹凸構造等の好ましい形態は、上述した本発明の反射防止構造体における凹凸構造等の好ましい形態と同様である。
図1は、実施形態1の反射防止膜の平面模式図である。実施形態1の反射防止膜11は、表面に、可視光波長よりも周期(隣接する頂点間の幅)の小さな、透明樹脂から構成される凹凸構造(第1のモスアイ構造)をもつ第1領域13、及び、第1領域がもつ凹凸構造とは異なる、可視光波長よりも周期(隣接する頂点間の幅)の小さな、透明樹脂から構成される凹凸構造を表面にもつ第2領域(特性の異なる領域)15を有する。モスアイ構造を有する第1領域13、第2領域15は、反射防止膜11の表面での反射を低減するための凹凸構造が形成された領域である。実施形態1の反射防止膜11は、モスアイシートに相当する。
このように構成すると、文字、記号又は図形の部分にもモスアイが形成される。したがって、反射防止膜におけるモスアイ形状による低反射特性が大きく損なわれることは無く、充分に優れたものとすることができる。したがって、10%~20%低い第2領域のモスアイは、第1領域のモスアイと組み合わせて表示装置に用いられたときに、表示性能を損うことなく充分に優れたものとすることができる上に、表示装置を非表示状態として使用しない場合等に、モスアイ形状を同様に有する第1領域との対比において、うっすらと文字、記号又は図形を認識させることができる。
これは、例えば、製品やメーカーの宣伝、及び/又は、モスアイの透明性が高いことに起因する事故を防止(ぶつかり防止)するために役立つ。または、デザイン上のアクセントとして好適に使用できる。
モスアイ形状の突起(凸部)は、200nm以下のピッチと200nm程度の高さが通常採られる。これは、モスアイ形状をもつ領域が、可視光領域において、充分に低く、一定した(波長により大きく反射率が変動しない)反射特性を持つように決められている。
最も低い高さ185nmでは赤領域の反射率が高くなり、モスアイ面が赤色を帯びることを示している。高さ210nmでは、赤領域の反射は抑えられ、緑色を帯びた色に見える。最も高い高さ280nmでは、図中の反射率を示した波形はフラットであり、可視光波長に対する極大は特になく、その反射率も可視光波長の全域で大変低く抑えられているから、モスアイ面からの反射色は、特に色はつかなく無色に近い。
このように高さによって、モスアイ面からの反射色はその色が異なって見えることが分かる。
尚、このグラフは入射光の入射角を5°とした場合の正反射のグラフである。
どの角度からモスアイを見るかでも反射の色味は変わり、モスアイ面に対して鉛直方向から傾くと見かけの高さが低くなることから、赤色領域の反射から増える。従って、高さ185nmのモスアイでは斜めから見るとより赤みが強調される。
モスアイ面の一部(第2領域15)における突起を、図4、図5に両矢印で示したように、第1領域13における突起と比較して低く作れば、例えば上述したように185nmの高さに作り込めば、その第2領域15のモスアイの反射光Rは例えば赤みを帯びたように設定可能である。一方、その他の領域つまりモスアイの高さが高い第1領域13における突起を上述したように280nmの高さに作れば、その領域の反射光は極めて少ないうえに、その反射光は、特定の色が強調されることはない。
このような第1領域13との対比における第2領域15を、図1に示したように一部に文字、記号又は図形として形成すれば、これらの文字、記号又は図形は、モスアイ面で色が変わった領域として認識される。
つまり、この反射防止膜(モスアイシート)11が表示装置の表示面に貼り合わされた場合でも、表示された画像に文字、記号又は図形が重なって見え難くなることはない。一方、表示装置が非表示状態(電源オフ)にされたような場合では、反射防止膜11が貼り合わされた面の反射で薄く、文字、記号又は図形が浮き出るように見えるため、ロゴ等を表示して宣伝に用いることが可能である。なお、実施形態1以外の、一部の領域のモスアイ形状を他の領域のモスアイ形状と異なるものとする実施形態(実施形態2、及び、実施形態2の第4~第6変形例)についても、同様の効果を特に顕著に発揮できる。
なお、反射率(%)は、「XYZ表色系(CIE1931表色系)」のY値をいう。言い換えれば、XYZ表色系における、下記式によって求められる反射による物体色のX値、Y値、Z値のうちのY値を言う。
図6は、実施形態1の変形例の反射防止膜の平面模式図である。図7及び図8は、実施形態1の変形例の反射防止膜の断面模式図の一例である。それぞれ、図6に示したA-B線に沿った断面を模式的に示している。
モスアイが形成された反射防止膜(モスアイシート)111に、ロゴ等の文字、記号又は図形を入れる場合、その部分(第2領域115)のモスアイを機能しない構造とする方法と、その部分(第2領域115)のモスアイの反射特性を変える方法とがある。
例えば図6のように、モスアイシートに文字「A」を入れる場合、最も単純な方法は、透明樹脂から構成されるモスアイの構造を変えることなく、インク等で文字を直接プリントする方法がある。しかし、不透明なインクを用いると光まで透過出来なくなるので、向こうが見通せなくなる(不透明なインクを用いる場合は、後述する比較例1に該当する。)。
したがって、モスアイの特性を機能させない場合としては、(1)モスアイ形状をその部分に形成しない方法が挙げられる。すなわち、図7のように一部にモスアイ構造を有しない構成とすることができる。
同等の効果を得る別の方法として、モスアイを透明樹脂等の透明な材料で埋めてもよい。
これら(1)、(2)の方法は何れも、第1領域とともに、第2領域が、光透過性がある点において共通であり、モスアイを形成した反射防止膜が、表示装置の前に置かれる場合、窓や壁等を構成するガラス板に取り付けられ、反射防止膜を通して向こう側を見る場合に、形成される文字、記号又は図形が、その光透過性を大幅に犠牲にしない。
この反射率の差は視認されやすく、この場合正面から見たときもその写り込みの差として明確に領域が認識されやすくなる。
上記(1)の方法のように、一部領域(以下、領域Bとする。)にモスアイを形成しない場合、又はモスアイの機能を消滅させた場合では、モスアイ形成領域(以下、領域Aとする。)とモスアイ形成しない領域(領域B)との反射率に差が生じる。
モスアイの形成媒体である透明樹脂の屈折率が1.5で、周りが空気であるとすれば、垂直に近い状態(例えば、入射角〔面法線方向からの入射角度〕が5°)で入射された光は、図11及び図12に示したグラフの如く、領域Aの反射率約0.1%と、領域Bの反射率4%の差で、正面からでも写り込みの差が認識される。
しかし、領域Bは反射率が高くても、その部分は見通せる(透光領域である)ため、表示装置の前に置いても表示装置の表示画面を視覚的に妨げることはない。
領域Bは、どの方向からでも見えるため、一般的にはモスアイ形状をもつ反射防止膜等によって反射率が極端に下がり、壁が有ることが視認されないことによる衝突事故が懸念されるところ、モスアイ面の一部にこのような領域Bを設けることで、壁が有ることが認識されるので、事故防止として特に有用である。
なお、図15、図16に示したグラフは、高さの異なるモスアイをもつモスアイ面に対して反射率を測定したものである。それぞれのグラフとも、モスアイ面の法線方向に対し、光線の入射角度を変化させて反射率を測定している。
入射角が大きくなり、例えば60°になった場合、領域Aと領域Bでは、反射率に約2%程の開きがあるため、両領域の違いが認識され、両領域間の境界も認識されることになる。
なお、このように高さを変える方が、後述するような転写用型の作製時においても、陽極酸化条件とエッチング条件を領域間で変更しなくてもよく、簡単でより確実に領域A及びBの作り分けができるので、好ましい。
図17は、実施形態2の転写用型の模式図である。以下に、一部の反射特性が異なるモスアイ面の作製方法について詳しく説明する。
モスアイは、表面にその雌型となるパターンを形成したロール型等の転写用型321による連続転写にて形成される。ここでは、一例としてロール型の転写用型321で反射防止膜を作製する方法を示す。
ロール型の転写用型321は、例えば、アルミニウム(Al)を切削することで作製されたロール型、又は、基材となる薄いスリーブ管の表面にアルミニウムの膜を形成したもの等において、これらアルミニウムの表面を陽極酸化処理とエッチング処理とを繰返しおこなうことで作製される。すなわち、アルミニウムを陽極酸化することによって可視光波長オーダー以下の微小な穴(細孔)が多数形成されたアルミナ(Al2O3)(以下、陽極酸化ポーラスアルミナともいう。)を転写用型の表面に広い範囲で作製する。最終的に陽極酸化ポーラスアルミナが有する凹凸の形状は断面視したときに三角形であり、その形状は、アルミニウムの陽極酸化による細孔形成と、陽極酸化膜のエッチングとが繰り返されることによって形成される。
これにより、パターン325が形成されていたところは、その周りと比較して、処理工程が少なくなる。したがって、陽極酸化処理とエッチング処理とをそれぞれ複数回実施した後では、最初にパターン325が有ったところは、その周りと比べて、形成された型の深さが浅く形成されている(転写用型321における第2領域。)。
このように形成された型で転写されたモスアイ面は、対応するパターンの所のみ、その高さが低くなる(反射防止膜における第2領域を構成する)。この第2領域は、周りの第1領域と反射特性が異なることになる。
先ず、上述したように薄いスリーブ管等の基材の上にアルミニウム膜を成膜する(工程P1)。その膜厚は、例えば1.0μmとすることができる。次に、陽極酸化を実施する(工程P2)がその条件は、シュウ酸0.6wt%、液温5℃の液中で、印加電圧80Vとして陽極酸化を実施する。この陽極酸化時間を調節することで、形成される穴の大きさ(深さ)に違いが生まれる。陽極酸化時間は、例えば30秒で実施される。この陽極酸化処理工程P2では、アルミニウム膜が酸化アルミニウム322AOになるとともに、印加電圧に応じて、大よそ一定の間隔で穴を開けることができる。
次に、上記工程で作製した転写用型からモスアイ構造を作製する。この工程は例えば転写用型の表面上に、透光性を有する光重合性樹脂溶液を滴下したのち、基材を貼り合わせ、紫外(UV)光を該樹脂層に対して照射して樹脂層を硬化させ、その後硬化してできた樹脂フィルム及び基材フィルムの積層フィルムを型から剥離する方法で作製される。ここでは、コンベアー方式で送られてくる基材(例えば、TACフィルム)上に、光重合性樹脂溶液を例えばグラビアロールによるコート法、ダイコート法等で塗布し、80℃下で樹脂を乾燥させる。そして回転するロール状の転写用型に押し当てて、2J/cm2積算光量で露光を施した後に転写型から剥離する。これらを順次連続して実施する一般的なロール・ツー・ロール方式等で転写型の凹凸を転写してモスアイ構造をもったフィルムを作製することができる。
なお、この方法に限られず、例えば、熱プレス法(エンボス法)、射出成形法、ゾルゲル法等の複製法、又は、微細凹凸賦形シートのラミネート法、微細凹凸層の転写法等の各種方法を、反射防止物品の用途及び基材の材料等に応じて適宜選択すればよい。
実施形態2の変形例の反射防止膜の製造方法について、以下に詳述する。以下に示す製造方法では、まず、実施形態2の変形例の反射防止膜に凹凸を形成するための転写用型を作製し、次に、基材表面に塗布された樹脂膜の表面にその転写用型を押し当て、転写用型の凹凸形状を膜表面に転写(インプリント)し、それと同時に樹脂膜に所定の条件を加えて反射防止膜表面に転写された凹凸形状を硬化させて所定の凹凸形状を成型する。以下では、反射防止膜の作製方法として、反射防止膜を作製するための転写用型の作製方法についても言及する。
方法
(1)一部のモスアイ形状を無くしてしまう(凹凸構造を無くす)。
これにより、モスアイ形状を無くした領域(第2領域)は、特に視認し易いものとなる。正面からでも写り込みの差で認識できる(実施形態1の変形例、後述する実施形態2の第1~第3変形例)。危険防止用途にはこちらの方が良い。
(1)-i:型に関する方法。
(1)-i-A:型の凹凸構造を埋める。
(1)-i-B:型の一部にモスアイ構造を工程途中で作らない。
(1)-i-B-a:型の一部にマスクをして、陽極酸化処理工程/エッチング処理工程(AO/Et)が出来ないようにする。
(1)-ii:フィルムに関する方法。具体的には、フィルムのその部分(第2領域)を埋める。
(2)一部の領域のモスアイ形状を変える。この方法は、正面からでは認識し難いため煩わしくないという利点がある。斜め方向からの方がはっきり視認できる(実施形態1、実施形態2、後述する実施形態2の第4~第6変形例)。例えば、ロゴや宣伝を表示するのに好ましい。
(2)-i:型に関する方法。具体的には、部分的に突起を低く作る。
(2)-i-A:AO/Etの一部を省くことで、形状を変える。
(2)-i-A-a:型の一部にマスクを行い、AO/Etを実施する。途中でマスクを剥がす。
(2)-i-B:型の一部を埋める。
(2)-i-B-a:インクジェットのような、塗出量を微小に変化して制御できる印刷で埋める。
(2)-i-C:型の一部の抵抗を変えることで、形状を変える。
(2)-i-C-a:膜厚を変える。
(2)-i-C-b:材料を変える。
(2)-i-D:型作製の条件を一部変える。
(2)-i-D-a:AO時の電極を文字、記号又は図形に合わせた形状にし、電極間距離を詰める。
(2)-ii:フィルムに関する方法。具体的には、フィルムのその部分(第2領域)をインクジェットのような、微小に塗出量が制御できる印刷で部分的に埋める。
図21は、実施形態2の第1変形例の転写用型の製造工程途中における断面を示す模式図である。図22は、実施形態2の第1変形例の転写用型の断面を示す模式図である。
モスアイ型を一旦形成した後、その一部を埋めることで、モスアイが転写できる領域(第1領域423)、及び、モスアイが転写できない領域(第2領域425)を形成する。なお、本明細書中、転写用型におけるモスアイ構造を、モスアイ型とも言う。
図23は、実施形態2の第2変形例の転写用型の製造工程途中における断面を示す模式図である。図24は、実施形態2の第2変形例の転写用型の断面を示す模式図である。
転写用型の製造工程中に型の一部(製造工程中の第2領域524)だけにマスクMを施し、その部分(第2領域525)に凹凸構造を形成させない。
図25は、実施形態2の第3変形例の反射防止膜の製造工程途中における断面を示す模式図である。図26は、実施形態2の第3変形例の反射防止膜の断面を示す模式図である。
反射防止膜(フィルム)上の一部(第2領域615)に透明樹脂でモスアイを埋めることでその機能を消失させる。
図27は、実施形態2の第4変形例の転写用型の製造工程途中における断面を示す模式図である。図28は、実施形態2の第4変形例の転写用型の断面を示す模式図である。
モスアイ型の作製工程である、陽極酸化(AO)/エッチング(Et)の一部を、マスクをすることで一部スキップさせる。全てスキップさせるわけでないので、マスク部分に対応する領域(第2領域725)は、周りの第1領域723よりもモスアイ形状の高さが低い。
図29は、実施形態2の第5変形例の転写用型の製造工程途中における断面を示す模式図である。図30は、実施形態2の第5変形例の転写用型の断面を示す模式図である。
図29に示したようにモスアイ型を通常通り作製した後に、特定領域(第2領域825)を、樹脂rが塗布されたものとする(ホールを完全に埋めてしまわない。)。
図31は、実施形態2の第6変形例の反射防止膜の製造工程途中における断面を示す模式図である。図32は、実施形態2の第6変形例の反射防止膜の断面を示す模式図である。
モスアイ型から転写されたフィルムの一部領域に透明樹脂を塗布する(図32における第2領域915。モスアイを全て埋めない。)。
本発明の凹凸構造等の構成は、電子顕微鏡(SEM)で観察することにより確認することができる。
上述した実施形態における転写用型の表面形状、反射防止膜及び表示装置の表面形状は、モスアイ構造による凹凸を除けば、表面はほぼ平坦であるが、陽極酸化処理よりも先にあらかじめサンドブラスト処理を行っておく等して、散乱凹凸構造を設けても構わない。
上述した各実施形態において反射防止膜の主成分は、モスアイ構造を精密に形成するという観点から、一定の条件で硬化する光硬化性樹脂、熱硬化性樹脂等の樹脂を用いることができる。ここで、反射防止膜の下地層(内部)等には、部分的に反射防止膜の主成分である樹脂材料の屈折率と異なる屈折率を有する材料(透明ビーズ等)を散在させてもよい。
また、実施形態2において示した陽極酸化処理工程は、シュウ酸を用いるものであったが、その他の硫酸、燐酸等の酸性電解液、又は、アルカリ性電解溶液を用いてもよい。
更に、反射防止膜に対してモスアイ構造を形成するための転写用型の製造方法について説明したが、転写用型の製造方法はこれらの手段に限定されない。上述のような陽極酸化及びエッチングを行う方法のほかに、電子線描画法、レーザー光の干渉露光を行う方法等が挙げられる。
図33は、比較例1の反射防止膜の断面模式図の一例である。透明樹脂から構成されるモスアイの構造を変えることなく、インクiで記号を直接プリントしている。不透明なインクiを用いるため、光が透過出来なくなるので、向こうが見通せなくなる。
13、113、213、613、913:(反射防止膜の)第1領域
15、115、215、615、915:(反射防止膜の)第2領域
15L:ロゴ
15F:図形
321:転写用型
322AO、322AOEt、323AO:酸化アルミニウム
322Al、322AlEt、323Al:アルミニウム
323、423、523、723、823:(転写用型の)第1領域
325、425、525、725、825:(転写用型の)第2領域
422、522、722、822:(製造中の転写用型の)第1領域
424、524、724、824:(製造中の転写用型の)第2領域
612、912:(製造中の反射防止膜の)第1領域
614、914:(製造中の反射防止膜の)第2領域
1013、1015:領域
i:インク
M:マスク
r:樹脂
Claims (20)
- 隣接する頂点間の幅が可視光波長以下であり、透明体で構成された凹凸構造を表面に有する反射防止構造体であって、
該反射防止構造体は、該凹凸構造を表面にもつ第1領域、及び、該第1領域がもつ凹凸構造とは異なる、透明体で構成された構造を表面にもつ第2領域を有し、
該第2領域の平面形状は、文字、記号及び図形からなる群より選択される少なくとも1つを構成する
ことを特徴とする反射防止構造体。 - 前記第2領域は、視認性を高めて注意を喚起するために用いられるものである
ことを特徴とする請求項1に記載の反射防止構造体。 - 前記第2領域は、ロゴ及び/又は宣伝として用いられている
ことを特徴とする請求項1又は2に記載の反射防止構造体。 - 透明樹脂から構成される反射防止膜であることを特徴とする請求項1~3のいずれかに記載の反射防止構造体。
- 前記第2領域がもつ構造は、隣接する頂点間の幅が可視光波長以下である凹凸構造である
ことを特徴とする請求項4に記載の反射防止構造体。 - 前記第2領域がもつ凹凸構造は、前記第1領域がもつ凹凸構造と、頂点の高さが異なる
ことを特徴とする請求項5に記載の反射防止構造体。 - 前記第2領域がもつ凹凸構造は、前記第1領域がもつ凹凸構造と、形状が異なる
ことを特徴とする請求項5又は6に記載の反射防止構造体。 - 前記第2領域がもつ構造は、隣接する頂点間の幅が可視光波長以下である凹凸構造ではない
ことを特徴とする請求項1~3のいずれかに記載の反射防止構造体。 - 隣接する頂点間の幅が可視光波長以下であり、透明体で構成された凹凸構造を表面に有する反射防止構造体の製造方法であって、
該製造方法は、該凹凸構造を表面にもつ第1領域、及び、該第1領域がもつ凹凸構造とは異なる、透明体で構成された構造を表面にもつ第2領域を形成し、
該第2領域の平面形状は、文字、記号及び図形からなる群より選択される少なくとも1つを構成する
ことを特徴とする反射防止構造体の製造方法。 - 前記反射防止構造体の製造方法は、前記凹凸構造を形成した後、一部の領域における該凹凸構造を変形するものである
ことを特徴とする請求項9に記載の反射防止構造体の製造方法。 - 透明樹脂から構成される反射防止膜の製造方法であることを特徴とする請求項9又は10に記載の反射防止構造体の製造方法。
- 隣接する頂点間の幅が可視光波長以下である凹凸構造を表面に有する転写用型であって、
該転写用型は、該凹凸構造を表面にもつ第1領域、及び、該第1領域がもつ凹凸構造とは異なる構造を表面にもつ第2領域を有し、
該第2領域は、文字、記号及び図形からなる群より選択される少なくとも1つを形成する平面形状を有する
ことを特徴とする転写用型。 - 隣接する頂点間の幅が可視光波長以下である凹凸構造を表面に有する転写用型の製造方法であって、
該製造方法は、基材の上に金属膜を形成する第1工程、
該金属膜の表面に、該凹凸構造をもつ第1領域、及び、該第1領域がもつ凹凸構造とは異なる構造をもつ第2領域を形成する第2工程を含み、
該第2領域は、文字、記号及び図形からなる群より選択される少なくとも1つを形成する平面形状を有する
ことを特徴とする転写用型の製造方法。 - 前記第2工程は、少なくとも陽極酸化処理により金属膜に一定の間隔で穴を形成するものである
ことを特徴とする請求項13に記載の転写用型の製造方法。 - 前記第2工程は、陽極酸化処理、及び/又は、エッチング処理の、処理回数、及び/又は、処理時間を変えて第1領域と第2領域とを作り分けるものである
ことを特徴とする請求項13又は14に記載の転写用型の製造方法。 - 前記製造方法は、陽極酸化処理、及び/又は、エッチング処理にて、マスクを用いて第1領域と第2領域とを作り分けるものである
ことを特徴とする請求項13~15のいずれかに記載の転写用型の製造方法。 - 隣接する頂点間の幅が可視光波長以下である凹凸構造を表面に有する透明体が表示面に配置された表示装置であって、
該透明体は、該凹凸構造を表面にもつ第1領域、及び、該第1領域がもつ凹凸構造とは異なる構造を表面にもつ第2領域を有し、
該第2領域の平面形状は、文字、記号及び図形からなる群より選択される少なくとも1つを構成する
ことを特徴とする表示装置。 - 前記第1領域の凹凸構造、及び、前記第2領域の構造は、透明樹脂から構成される
ことを特徴とする請求項17に記載の表示装置。 - 前記表示装置は、液晶表示装置、プラズマディスプレイパネル、又は、有機エレクトロルミネッセンスディスプレイである
ことを特徴とする請求項17又は18に記載の表示装置。 - 前記表示装置が非表示状態の時に前記第2領域がロゴ及び/又は宣伝として用いられる
ことを特徴とする請求項17~19のいずれかに記載の表示装置。
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CN104395784B (zh) | 2016-09-07 |
JPWO2013191091A1 (ja) | 2016-05-26 |
CN104395784A (zh) | 2015-03-04 |
JP6105577B2 (ja) | 2017-03-29 |
US20150241603A1 (en) | 2015-08-27 |
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