WO2013172048A1 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
WO2013172048A1
WO2013172048A1 PCT/JP2013/050778 JP2013050778W WO2013172048A1 WO 2013172048 A1 WO2013172048 A1 WO 2013172048A1 JP 2013050778 W JP2013050778 W JP 2013050778W WO 2013172048 A1 WO2013172048 A1 WO 2013172048A1
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WO
WIPO (PCT)
Prior art keywords
mask
substrate
processing apparatus
rotary
substrate processing
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Application number
PCT/JP2013/050778
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English (en)
French (fr)
Japanese (ja)
Inventor
鈴木　智也
弘樹 小宮山
Original Assignee
株式会社ニコン
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 株式会社ニコン filed Critical 株式会社ニコン
Priority to JP2014515508A priority Critical patent/JP6123797B2/ja
Publication of WO2013172048A1 publication Critical patent/WO2013172048A1/ja

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Definitions

  • the present invention relates to a substrate processing apparatus.
  • This application claims priority based on US Provisional Application No. 61 / 648,956 filed on May 18, 2012, the contents of which are incorporated herein by reference.
  • a transparent electrode such as ITO or a semiconductor substance such as Si is deposited on a flat glass substrate, a metal material is evaporated, a photoresist is applied, and a circuit pattern is formed.
  • the circuit pattern is formed by transferring, developing the photoresist after the transfer, and then etching.
  • a roll-to-roll method hereinafter simply referred to as “roll method” in which a display element is formed on a flexible substrate (for example, a film member such as polyimide, PET, or metal foil).
  • a technique has been proposed (see, for example, Patent Document 1).
  • Patent Document 2 a flexible long sheet (substrate) that is wound around a feed roller and traveled is disposed in the vicinity of the outer peripheral portion of a rotatable cylindrical mask, and the mask pattern is continuous.
  • techniques for exposing a substrate have been proposed.
  • the dimension in the circumferential direction of the mask pattern is about 85 cm (30 cm ⁇ ⁇ ⁇ 0. 9).
  • the peripheral speed of the pattern surface (outer peripheral surface) of the rotating mask is 5 cm / second and the minimum size (line width, etc.) of the pattern to be transferred is 5 ⁇ m, the transfer time of the entire mask pattern is approximately 17 seconds (85/5). Therefore, the stability (constant speed) of the peripheral speed during this period is important. Assuming that the absolute value of the peripheral speed fluctuates by 0.05% on average, a feed error of 2.5 ⁇ m occurs per second.
  • the feeding error is about 43 ⁇ m at the maximum, which is not acceptable when considering the overlay exposure considering the minimum pattern size (5 ⁇ m).
  • the rotational speed variation (wow / flutter) of the rotary mask is ⁇ 0.05%, a relative feed error of ⁇ 2.5 ⁇ m / second can locally occur, so the minimum pattern size (5 ⁇ m ) Transfer fidelity.
  • An object of an aspect of the present invention is to provide a substrate processing apparatus capable of synchronously driving a mask and a substrate with high accuracy.
  • a long substrate having flexibility is supported in a part of the circumferential surface of a rotatable rolling element and is transported in the long direction and is rotatable.
  • a substrate processing apparatus for repeatedly transferring a pattern formed on a peripheral surface of a rotary mask onto a surface to be processed of the substrate, wherein a portion involved in the transfer of the outer peripheral surface of the rotary mask and a surface to be processed of the substrate have a predetermined distance
  • a mask holding portion that supports the rotating mask with respect to the rolling element, and a magnetic gear transmission system that transmits one rotational force of the rolling element and the rotating mask with the magnetic force as the other rotational force.
  • a substrate processing apparatus is provided.
  • a substrate transport mechanism for transporting a flexible long substrate in a long direction while being supported by a part of the circumferential surface of a rotatable rolling element.
  • a mask holding mechanism that holds a rotating mask that has a mask pattern curved in a cylindrical shape with a predetermined radius and that can rotate around the axis of the cylinder, and illumination that irradiates a part of the mask pattern formed on the rotating mask with illumination light
  • a transfer mechanism that transfers a part of the mask pattern to the surface to be processed of the substrate, and a magnetic gear transmission system that transmits one of the rolling elements and the rotating mask as a rotational force by the magnetic force.
  • a substrate processing apparatus is provided.
  • the mask and the substrate can be driven in synchronization with high accuracy, and the mask pattern can be transferred to the substrate with high accuracy.
  • FIG. 1 is a schematic external perspective view of a substrate processing apparatus according to an embodiment.
  • FIG. FIG. 3 is a development view of a substrate wound around a rotating drum. The figure explaining operation
  • FIG. 5 is a schematic external perspective view of a substrate processing apparatus according to a second embodiment. The elements on larger scale of a fixed plate and a mask unit.
  • FIG. 1 is a schematic external perspective view of a substrate processing apparatus 100 according to the first embodiment
  • FIG. 2 is a schematic external perspective view of a mask unit MU in the substrate processing apparatus 100
  • FIG. FIG. 4 is a cross-sectional view taken along a plane including the axis AX1A (AX1B) (first rotation axis), and
  • FIG. 4 is an enlarged view of part A in FIG.
  • the substrate processing apparatus 100 performs exposure processing on a flexible belt-like (long) substrate (for example, a belt-like film member) S with a pattern of a mask M curved into a cylindrical surface with a predetermined radius.
  • the illumination unit 10 (not shown in FIG. 1, see FIG. 3), the mask units MU1 to MU5, the substrate holding unit SU, the magnetic gear transmission mechanism GD, and the control unit (not shown) are mainly configured.
  • the mask units MU1 to MU5 are collectively referred to as a mask unit MU as appropriate.
  • the vertical direction is the Z direction
  • the directions parallel to the rotation axes AX1A and AX1B of the mask units MU1 to MU5 and the rotation axis AX2 of the substrate holding unit SU are the Y directions
  • the Z and Y directions are The direction orthogonal to the X direction will be described.
  • the illumination unit 10 irradiates illumination light toward the illumination area of the rotary mask 20 in the mask unit MU.
  • the illumination unit 10 emits illumination light for exposure radially in a straight tube type like a fluorescent lamp, Uses one in which illumination light is introduced from both ends of a cylindrical quartz rod and a diffusion member is provided on the back side, or a plurality of LEDs that emit light in the ultraviolet region with a wavelength of 400 nm or less arranged in the Y direction. And is accommodated in the internal space of the inner cylinder 21 that supports the rotary mask 20.
  • a light source of illumination light for example, bright lines (g line, h line, i line) emitted from a lamp light source, far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm), ArF excimer laser light (wavelength) 193 nm), solid state light sources such as semiconductor lasers and LEDs are used.
  • DUV light far ultraviolet light
  • KrF excimer laser light wavelength 248 nm
  • ArF excimer laser light wavelength 193 nm
  • solid state light sources such as semiconductor lasers and LEDs are used.
  • the mask units MU1 to MU5 are sequentially arranged along the rotation axis AX1A.
  • the mask units MU4 to MU5 are sequentially arranged along the rotation axis AX1B.
  • the mask unit MU4 is disposed at an intermediate position between the mask units MU1 and MU2 with respect to the Y direction
  • the mask unit MU5 is disposed at an intermediate position between the mask units MU2 and MU3 with respect to the Y direction.
  • the rotation axes AX1A and AX1B are arranged at a certain angular interval, for example, 90 °, around the rotation axis AX2.
  • Each mask unit MU1 to MU5 includes a rotary mask 20, an inner cylinder 21, an air pad (mask holding portion) 22, a holder 23, a drive portion MT, and a flange portion 25, as shown in FIGS.
  • an annular holder 23 is fixed and provided in an integrated state.
  • a cylindrical inner cylinder 21 is inserted in the direction of the rotation axis AX1A (or AX1B).
  • the rotary mask 20 is formed of cylindrical quartz or the like that can transmit illumination light, and a predetermined pattern is formed on an outer peripheral surface (peripheral surface) 20a thereof.
  • the air mask 22 is a fluid bearing provided at the outer peripheral position of the inner cylinder 21 facing the inner peripheral surface of the rotary mask 20 (a gas supply unit, details will be described later). It is supported so as to be movable in a non-contact (or low friction state) in the direction of the rotation axis AX1A (or AX1B) and the direction around the rotation axis AX1A (or AX1B).
  • the holder 23 is formed in an annular shape with a metal material, and supports the outer peripheral surface and inner peripheral surface of the end portion in the Y direction of the rotary mask 20 as shown in FIG.
  • the inner cylinder 21 is installed on a base (not shown) (body structure of the exposure apparatus), and supports the flange 25 via air bearings 26 at both ends in the direction of the rotation axis AX1A (or AX1B). To do.
  • the air pad AP made of a porous material provided on the outer peripheral surface of the flange portion 25, the pattern area of the outer peripheral surface 20a of the rotary mask 20 and the surface to be processed of the substrate S shown in FIG. As described above, the rotary mask 20 and the inner cylinder 21 are supported with respect to the substrate S wound around the rotary drum 30.
  • the ring-shaped air pad AP is formed of a porous pad that supplies (spouts) air as a gas between the outer peripheral surface and the substrate S, the inner cylinder 21 does not contact the surface of the substrate S. And the rotating mask 20 can be supported.
  • the porous air pad AP is formed on each outer peripheral surface of the flange portion 25 provided on both sides of the inner cylinder 21 in the direction of the rotation axis AX1A (or AX1B), over the entire circumference in the direction around the rotation axis AX1A (or AX1B), or
  • the rotation axis line AX1A (or AX1B) is provided at a predetermined interval around the rotation axis line AX1A (or AX1B).
  • the drive unit MT drives the rotary mask 20 through the holder 23 by applying a thrust to the extending direction (axial direction, Y direction) of the rotational axis AX1A (or AX1B) and the direction around the rotational axis AX1A (or AX1B).
  • a pair is provided on both sides of the rotary mask 20 in the direction of the rotation axis AX1A (or AX1B).
  • Each driving unit MT is a voice coil motor, for example, that applies thrust independently in the two axial directions of the extending direction (axial direction) of the rotational axis AX1A (or AX1B) and the rotational axis AX1A (or AX1B).
  • the magnetism generator MG is provided on the outer surface in the Y direction of the holder 23 so as to protrude in the direction of the rotation axis AX1A (AX1B) over the entire circumference around the rotation axis AX1A (or AX1B).
  • the coil body CU is integrally fixed to the flange portion 25 by a ring-shaped connecting portion 24 with a gap with respect to the outer peripheral surface of the inner cylinder 21, and has a diameter centered on the rotation axis AX1A (AX1B). It has a U-shaped cross-sectional shape that sandwiches the magnetic generator MG with respect to the direction.
  • the magnet rows of one magnetic gear portion GM1 constituting the magnetic gear transmission mechanism GD are arranged at a constant pitch in the circumferential direction. Is done.
  • Energization of the coil body CU is controlled by the drive control unit DC.
  • the coil body CU does not necessarily have to be provided over the entire circumference, and may have a configuration in which a plurality of coil bodies CU are provided at predetermined intervals in the circumferential direction (for example, a configuration in which three locations are provided at 120 ° intervals).
  • the coil body CU provides a rotational thrust for applying a thrust (rotational torque) in the direction around the rotational axis AX1A (or AX1B) between the flange portion 25 (connecting portion 24) and the rotary mask 20 (and the holder 23).
  • Coil group for translation and a coil group for translational thrust that gives a linear driving force in the extending direction (axial direction, Y direction) of the rotation axis AX1A, and the magnitude of the current supplied to each coil group is controlled by a drive control unit. By individually adjusting with DC, the rotational thrust and the translational thrust can be controlled independently.
  • the inner cylinder 21 is fixedly installed with respect to the exposure apparatus main body, and both the flange portion 25 (connecting portion 24) and the rotary mask 20 are rotational axes with respect to the inner cylinder 21.
  • AX1A (AX1B) is supported rotatably in a non-contact (low friction) state.
  • the flange portion 25 is constrained by a bearing 26 so as not to slightly move with respect to the inner cylinder 21 in the extension direction (axial direction, Y direction) of the rotation axis AX1A (AX1B).
  • the rotary mask 20 slightly moves in the extending direction (axial direction, Y direction) of the rotation axis AX1A (AX1B) between the flange portions 25 on both sides by the translational thrust generated by the drive unit MT. Further, the flange portion 25 (and the coil body CU) is predetermined around the inner cylinder 21 by a rotational torque applied from the outside through a magnetic gear portion GM1 provided along the outer peripheral surface of the ring-shaped connecting portion 24. Rolls (rotates) at a rotation speed of.
  • the rotary mask 20 when a predetermined current is supplied to the coil group for rotational thrust in the coil body CU, the rotary mask 20 also rotates at a speed synchronized (tuned) with the flange portion 25 (connecting portion 24).
  • the flange portion 25 (and the connecting portion 24 and the coil that rotate (rotate) via the magnetic gear transmission mechanism GD are servo-controlled by the drive control unit DC by controlling the magnitude and direction of the current flowing through the coil group for rotational thrust.
  • the rotational speed of the rotary mask 20 can be different from the body CU), the direction of relative rotation can be reversed, or the rotary mask 20 can be kept stationary.
  • FIG. 5 is a view of the partially fractured surface of FIG. 4 as viewed in the YZ plane.
  • a grating scale GS2 for encoder measurement is formed on the outer peripheral surface of the rotary mask 20 over the entire circumference.
  • an encoder head EH2 installed in the exposure apparatus main body is provided.
  • a two-phase signal from the encoder head EH2 is input, and a counter circuit 201 that sequentially measures the rotational angle position of the rotary mask 20 (lattice scale GS2), and a measurement value from the counter circuit 201 are input.
  • an arithmetic circuit that generates a deviation signal thereof 202, a drive circuit 203 that provides the deviation signal as a drive signal to the coil group for rotational thrust in the coil body CU, and a drive circuit 204 that provides a drive signal to the coil group for translational thrust in the coil body CU are provided. It has been.
  • the rotary mask 20 can be rotated synchronously based on that.
  • the synchronous rotation is not necessarily limited to the rotation at the same speed, but includes the case where the rotation speed of the flange portion 25 and the rotation speed of the rotary mask 20 maintain a predetermined ratio. .
  • the peripheral speed of the mask pattern surface (outer peripheral surface 20a) of the rotary mask 20 is the peripheral speed of the mask pattern surface (outer peripheral surface 20a) of the rotary mask 20, and when the peripheral speed deviates from a predetermined reference speed.
  • the drive circuit 203 may give a drive signal to the coil group for rotational thrust in the coil body CU. In this way, even if the rotational speed of the flange portion 25 differs from the set speed or uneven speed occurs, the rotary mask 20 can be stably rotated at a constant speed regardless of such error factors. it can. Furthermore, regardless of the rotational speed of the flange portion 25, the rotary mask 20 can be rotated at a set arbitrary speed or made stationary.
  • the grating scale GS2 is a two-dimensional grating and the encoder head EH2 is also capable of measuring the displacement in the Y direction (extension direction (axial direction) of the rotation axes AX1A and AX1B), the displacement of the rotary mask 20 in the Y direction.
  • the displacement in the Y direction extension direction (axial direction) of the rotation axes AX1A and AX1B
  • the substrate holding unit SU includes a rotating drum (rolling element) 30 as shown in FIG.
  • the rotary drum 30 is formed in a columnar shape that is parallel to the Y axis and rotates around the rotation axis AX2 set on the ⁇ Z side of the rotation axis AX1B and on the + X side of the rotation axis AX1A.
  • the outer peripheral surface of the rotary drum 30 is a substrate holding surface 31 that holds the substrate S in contact therewith. Projecting portions 32 having a smaller diameter than the rotating drum 30 and projecting coaxially are provided on both end surfaces of the rotating drum 30 in the Y direction.
  • a drive device 33 that rotationally drives the rotary drum 30 is provided.
  • the drive device 33 is controlled by the drive control unit DC described above.
  • FIG. 6 is a development view of the rotary mask 20.
  • a symbol Xs in FIG. 6 indicates the movement direction (rotation direction) of the rotary mask 20.
  • the illumination unit 10 in the mask units MU1 to MU3 includes an illumination region IR1 that illuminates a range over the pattern region MA of the rotary mask 20 in the Y direction.
  • the illumination unit 10 in the mask units MU4 to MU5 includes an illumination region IR2 that illuminates a range over the pattern formation region MA of the rotary mask 20 in the Y direction.
  • Each illumination region IR1, IR2 is formed in a trapezoidal shape having triangular portions at both ends in the Y direction.
  • the illumination regions IR1 and IR2 are formed such that the direction of the triangular portion (that is, the position of the short side of the pair of parallel lines) is opposite to the X direction.
  • FIG. 7 is a development view of the substrate S wound around the rotary drum 30.
  • a symbol Xs in FIG. 7 indicates the moving direction (rotating direction) of the rotating drum 30.
  • the mask units MU1 to MU5 are arranged so that transfer areas PA1 to PA5 illuminated with illumination light (exposure light) from a pattern transmitted through the rotary mask 20 are adjacent to areas adjacent to each other in the Y direction. It is arranged in a staggered pattern so that (the trapezoidal triangular part) overlaps.
  • the area on the substrate S that passes through the transfer area PA1 due to the rotation of the rotating drum 30 partially overlaps the area on the substrate S that passes through the transfer area PA2 due to the rotation of the rotating drum 30.
  • the shapes and the like of the transfer area PA1 and the transfer area PA2 are set so that the exposure amount in the overlapping region in the circumferential direction is substantially the same as the exposure amount in the non-overlapping region.
  • the magnetic gear transmission mechanism GD transmits the rotational force of the rotary drum 30 in a non-contact manner (using magnetic force) as the rotational force of the rotary mask 20 (connecting portion 24), and includes a belt drive mechanism VD and a magnetic gear portion.
  • GM1 and GM2 are provided.
  • the belt drive mechanism VD has a configuration in which a belt VL is stretched (installed in a tensioned state) on the protruding portion 32 of the rotary drum 30 and the pulleys PL1 and PL2.
  • the pulley PL1 is integrally provided on the ⁇ X side of the mask units MU1 to MU3 at the ⁇ Y side end of the shaft ST1 that extends in the Y direction and is arranged to be rotatable about the axis.
  • the pulley PL2 is integrally provided on the ⁇ X side of the mask units MU4 to MU5 at the ⁇ Y side end portion of the shaft ST2 that extends in the Y direction and is rotatable around the axis.
  • a disk-shaped magnetic gear portion GM2 is disposed on the shaft ST1 at a position facing the magnetic gear portion GM1 of the ring-shaped connecting portion 24 with a gap from the magnetic gear portion GM1.
  • the magnetic gear portion GM2 has a plurality of S poles S2 and N poles N2 alternately with a predetermined pitch and a predetermined peripheral length around the shaft ST1 (shaft ST2) as shown in FIG. It has magnetic patterns (permanent magnets) arranged one by one.
  • the magnetic gear portion GM1 includes a plurality of S-poles S1 and N-poles N1 around the rotation axis AX1A (rotation axis AX1B) alternately at the same pitch and the same circumference as the magnetic gear portion GM2 on the peripheral surface (eight in FIG. 8 each). Each of which is provided with a magnetic pattern (permanent magnet).
  • the outer diameters of the protrusion 32 of the rotary drum 30, the pulleys PL1 and PL2, and the magnetic gear portions GM1 and GM2 are determined by the circumferential speed of the rotary mask 20 (connection portion 24) and the peripheral speed of the rotary drum 30 (conveyance speed of the substrate S). ) Are set to be substantially the same.
  • the operation of the magnetic gear transmission mechanism GD in the substrate processing apparatus 100 having the above configuration will be described.
  • the rotary drum 30 is rotated around the rotation axis AX2 (second rotation axis) by driving the driving device 33, the pulleys PL1 and PL2 are moved at a speed corresponding to the outer diameter ratio with the protrusion 32 by the belt drive mechanism VD. Rotate.
  • the rotations of the pulleys PL1 and PL2 are transmitted via the shafts ST1 and ST2, and the magnetic gear portions GM2 rotate.
  • the magnetic gear portion GM2 for example, as shown in FIG. 8A, when the magnetic gear portion GM1 and the S pole S2 are opposed to each other, magnetic forces in the attracting directions act on the magnetic gear portion.
  • the north pole N1 of the part GM1 is opposed.
  • the S pole S2 that applies the magnetic force in the direction attracting to the N pole N1 moves away.
  • the magnetic pole part GM1 acts as a traction force on the magnetic pole part N1 of the magnetic gear part GM1 by approaching the magnetic pole part N2 that causes the magnetic force in the repulsive direction to act on the magnetic pole part N1. It rotates at a speed corresponding to the outer diameter ratio (peripheral length ratio) with GM2. Therefore, the rotary mask 20 is rotated by the rotational driving force of the rotary drum 30 transmitted in a non-contact manner by the magnetic gear transmission mechanism GD, together with the rotational driving force applied by the drive unit MT by the magnet generator MG and the coil body CU. Synchronously rotate around AX1A (rotation axis AX1B).
  • the rotary mask 20 in the mask units MU1 to MU3 is rotated around the rotation axis AX1A by the magnetic gear transmission mechanism GD, and the mask unit MU4.
  • the rotary mask 20 in MU5 rotates around the rotation axis AX1B.
  • illumination light is irradiated from the illumination part 10, in the illumination area
  • each pattern of the rotary mask 20 in the mask units MU1 to MU5 is connected and transferred on the substrate S in the width direction.
  • the pattern of the rotary mask 20 is repeatedly transferred to the substrate S by continuous rotation of the rotary mask 20 and continuous conveyance of the substrate S by continuous rotation of the rotary drum 30.
  • the alignment of the position of the rotary mask 20 around the rotation axis AX1A (rotation axis AX1B) and the position of the rotation axis AX1A (rotation axis AX1B) is as follows. For example, based on the measurement result of the mask mark of the rotary mask 20 and the substrate mark of the substrate S, the holder 23 and the rotary mask 20 are rotated via the magnetic generator MG of the drive unit MT by the energization control of the drive control unit DC. It is performed by finely moving in the direction around the axis AX1A (rotation axis AX1B) or in the direction of the rotation axis AX1A (rotation axis AX1B).
  • the rotational force of the rotary drum 30 is transmitted as the rotational force of the rotary mask 20 through the non-contact type driving mechanism MT by the non-contact type magnetic gear transmission mechanism GD.
  • High-accuracy synchronous driving is possible without causing vibration, wear, noise, dust, or the like as in the case of transmitting the rotational force by a contact type such as the above.
  • since the rotational force is transmitted through the magnetic gear portions GM1 and GM2, lubrication or the like is unnecessary, which can contribute to improvement in work efficiency and cleanliness.
  • a plurality of mask units MU1 to MU5 are arranged, and patterns set by the mask units MU1 to MU5 are connected in the width direction on the substrate S, so that a pattern with a large area is formed. It becomes possible.
  • the patterns are connected in the width direction on the substrate S, the patterns are transferred with an error in the width direction because the patterns are partially connected to each other. Even in this case, it is possible to prevent a large difference from the exposure energy amount applied to the non-overlapping portion.
  • the substrate processing apparatus 100 shown in FIG. 9 includes mask units MU1 to MU2 arranged along the rotation axis AX1A, a mask unit MU3 arranged along the rotation axis AX1B, a substrate holding unit SU, and a magnetic gear transmission mechanism GD (FIG. 11).
  • three mask units MU1 to MU3 are provided, but as in the first embodiment, the patterns of the mask units MU1 to MU3 overlap each other in the width direction (Y direction) of the substrate S.
  • the transfer region on the substrate S is set so as to be connected in the combined state, the description thereof is omitted.
  • the rotation axis AX1A is arranged at a position on the ⁇ X side of the rotation axis AX2 and at an angle ⁇ 1 on the + Z side with respect to the horizontal direction (XY plane) in the direction around the rotation axis AX2, and the rotation axis AX1B is the rotation axis AX2 Further, on the + X side, with respect to the direction around the rotation axis AX2, it is arranged at a position at an angle ⁇ 2 on the + Z side with respect to the horizontal direction (XY plane).
  • the angles ⁇ 1 and ⁇ 2 are set to 45 degrees as an example. If the winding angle of the substrate S wound around the rotating drum 30 (the angle at which the substrate S is in close contact with the outer peripheral surface of the rotating drum 30) is ⁇ °. 180 ° ⁇ ( ⁇ 1 + ⁇ 2) ⁇ °.
  • the mask units MU1 to MU2 are line segments orthogonal to both the rotation axis AX1A and the rotation axis AX2 on the fixed plate 15A disposed on the ⁇ X side of the rotary drum 30 and inclined around the axis parallel to the rotation axis AX1A by an angle ⁇ 1.
  • the direction hereinafter simply referred to as the inter-axis direction).
  • the mask unit MU3 is spaced apart in the direction of the axis between the rotation axis AX1B and the rotation axis AX2 on the fixed plate 15B disposed at an angle ⁇ 2 around the axis parallel to the rotation axis AX1B on the + X side of the rotation drum 30. ⁇ It is provided so as to be freely accessible (movable). Since the mask units MU1 to MU2 provided on the fixed plate 15A and the mask unit MU3 provided on the fixed plate 15B have the same configuration, in the following description, the mask unit MU3 provided on the fixed plate 15B will be described. A representative explanation will be given.
  • FIG. 10 is a partially enlarged view of the fixing plate 15B and the mask unit MU3.
  • the fixed plate 15 ⁇ / b> B is provided with a stage portion 16 that supports the mask unit MU ⁇ b> 3 movably in the Y direction and the inter-axis direction at the flange portion 27.
  • the stage unit 16 moves in the Y direction along the Y guide 28Y provided along the Y direction.
  • the stage portion 16 is provided with an inter-axis guide 28J provided along the inter-axis direction.
  • the slide portion 29 provided on the flange portion 27 is guided by the inter-axis guide 28J and moves in the inter-axis direction.
  • a slit 27 a is formed in a range longer than the length of the slide portion 29 along the inter-axis direction.
  • the thickness between the slit 27a and the slide portion 29 is set to a thickness that can be elastically deformed even when the weight of the mask unit MU3 is added.
  • FIG. 11 is a cross-sectional view of the mask unit MU3 cut along a plane including the rotation axis AX1B and the rotation axis AX2.
  • the mask unit MU3 includes a thrust bearing TB provided between the holder 23 located on the ⁇ Y side and the flange portion 25, and a space between the holder 23 located on the + Y side and the flange portion 25.
  • an ultrasonic motor 17 provided in the apparatus.
  • the ultrasonic motor 17 adjusts the position of the rotary mask 20 and the magnetic gear portion GM1 around the rotation axis AX1B, and is a ring-shaped stator 17A fixed to the flange portion 25 and a ring connected to the holder 23. And a rotor 17B in the form of a ring.
  • the rotor 17B does not rotate about the rotation axis AX1B with respect to the holder 23, but is coupled so as to be finely movable in the extending direction (axial direction) of the rotation axis AX1B, and is attached to the stator 17A side by a preload spring 18. They are touching by force.
  • the flange portion 27 is fixedly provided at both ends of the inner cylinder 21, and a value obtained by adding the thickness of the substrate S to the radius of the substrate holding surface 31 of the rotating drum 30 on the surface facing the rotating drum 30.
  • a holding part 34 cut out in an arc shape having a radius of is provided. Similar to the air pad AP shown in FIG. 3 or FIG. 4, the holding portion 34 is formed of a porous pad that ejects air from the arc-shaped surface in the radial direction.
  • a magnetic gear part GM2 is embedded over the entire circumference on the same plane as the substrate holding surface 31 at a position facing the magnetic gear part GM1 in the Y direction.
  • Other configurations are the same as those of the first embodiment.
  • the load of the component force corresponding to the angle ⁇ 2 of the weight of the mask unit MU3 supported by the stage unit 16 is rotated via the substrate S wound around the surface of the rotating drum 30.
  • the mask unit MU3 is supported in a state of being applied as a preload to the 30 side.
  • the mask unit MU3 is in a non-contact state in a state where a predetermined amount of gap (gap at the time of proximity exposure) is formed between the rotary mask 20 and the substrate S. Is supported on the substrate S.
  • the positions of the holding unit 34 and the rotating drum 30 (substrate S) are as follows. If they are shifted, the holding portion 34 and the rotating drum 30 may be supported in a biased state. In this case, the thin portion between the slit 27a and the slide portion 29 functions as a leaf spring, and elastically deforms in the direction in which the offset load is eliminated, so that the holding portion 34 of the rotary drum 30 (substrate S) is It can be supported on the surface in a predetermined positional relationship.
  • the substrate S is placed between the other of the holding portions 34.
  • a step corresponding to the thickness occurs, and the rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2 are not parallel.
  • a shim having the same thickness as that of the substrate S is attached to the substrate holding surface 31 of the rotating drum 30 facing the holding portion 34 located outside, and the rotating drum 30 supports the shim through the shim.
  • the rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2 can be maintained in a parallel state.
  • the rotational force is transmitted to the magnetic gear portion GM1 in a non-contact manner by the traction force due to the magnetic force as the magnetic gear portion GM2 rotates.
  • the rotational force transmitted to the magnetic gear portion GM1 is transmitted to the rotary mask 20 via the flange portion 25, the ultrasonic motor 17, the holder 23, and the thrust bearing TB, and the rotary mask 20 in the mask units MU1 to MU2 rotates. While rotating around AX1A, the rotating mask 20 in the mask unit MU3 also rotates around the rotation axis AX1B.
  • the vibration progresses in the circumferential direction on the stator 17A of the ultrasonic motor 17.
  • a wave may be applied to rotate the rotor 17B by a predetermined amount with respect to the stator 17A.
  • the position adjustment of the rotary mask 20 in the rotation axis AX1A (rotation axis AX1B) direction with respect to the substrate S may be performed by using the stage unit 16 to shift the entire mask units MU1 to MU3 in the Y direction.
  • the radius (curvature) of the holding unit 34 is set according to the thickness of the substrate S set in advance, when the thickness of the substrate S is changed, There is a deviation in the circumferential direction according to the distance between the ends of the holding portion 34 (that is, the length of the chord of the arc portion forming the holding portion 34). For this reason, the distance between the end portions of the holding portion 34 is set according to the variation range of the thickness of the substrate S and the allowable deviation of the gap amount.
  • the geometrical calculation results in about 1/2 of the radius of the substrate holding surface 31.
  • the distance between the end portions of the holding portion 34 it is possible to cope with the change in the thickness of the substrate S without changing the radius of the holding portion 34.
  • the magnetic gear portion GM2 is provided in the rotary drum 30, a device such as a belt drive mechanism is separately provided. There is no need to use it, and the size and cost of the apparatus can be reduced. Furthermore, since the error factor generated in the belt drive mechanism can be eliminated, the rotary mask 20 and the rotary drum 30 can be synchronously driven with higher accuracy.
  • the rotational force of the rotary drum 30 is always transmitted as the rotational force of the rotary mask 20 by the belt drive mechanism VD in the magnetic gear transmission mechanism GD.
  • the rotational force is transmitted.
  • releases is demonstrated.
  • the same reference numerals are given to the same elements as those of the first embodiment shown in FIGS. 1 to 8, and the description thereof is omitted.
  • the magnetic gear transmission mechanism GD in the present embodiment includes a belt drive mechanism VD and a transmission release portion 40.
  • the shaft ST1 (ST2) in the belt drive mechanism VD is provided with a contact portion 41 having a larger diameter than the shaft ST1 (ST2) and a shaft portion 42 having a smaller diameter than the contact portion 41.
  • the contact portion 41 supports the inner peripheral side of the pulley PL1 (PL2) via a bearing 43 so as to be relatively rotatable.
  • the shaft portion 42 is provided with a pusher support portion 45 via a bearing 44.
  • the transmission release part 40 includes a clutch part 46, a pusher 47, and an urging spring 48.
  • the clutch portion 46 has a cylindrical portion 46a inserted into the shaft portion 42 with a smaller diameter than the through hole 39a formed in the end wall portion 39 of the pulley PL1 (PL2), and a side of the cylindrical portion 46a facing the contact portion 41.
  • a contact portion 46b provided at the end and formed at a larger diameter than the through hole 39a, and provided at an end portion on the side facing the pusher support portion 45 of the cylindrical portion 46a and formed at a larger diameter than the through hole 39a.
  • a large-diameter portion 46c In the large diameter portion 46 c, a tapered surface 49 is formed at a position facing the pusher 47, which is gradually inclined away from the pusher 47 in the length direction of the shaft portion 42 toward the outer diameter side.
  • the urging spring 48 is provided between the large-diameter portion 46c and the end wall portion 39 of the pulley PL1 (PL2), and applies urging forces in directions away from each other.
  • the pusher 47 is provided as a pair with the shaft portion 42 interposed therebetween, and includes a spherical portion 47 a at a position facing the tapered surface 49. Further, as shown in FIG. 12, each pusher 47 has a transmission position where the ball portion 47a is engaged with the tapered surface 49 near the shaft portion 42, and the ball portion 47a is separated from the shaft portion 42 as shown in FIG. And the release position where the engagement with the tapered surface 49 is released.
  • the contact portion 46 b of the clutch portion 46 is brought into contact with the contact portion 41 against the urging force of the urging spring 48.
  • FIG. 14 is a diagram showing a partial configuration of a device manufacturing system (flexible display manufacturing line) SYS.
  • a flexible substrate P sheet, film, ultra-thin glass sheet, etc. drawn from the supply roll FR1 is sequentially passed through n processing devices U1, U2, U3, U4, U5,. The example until it is wound up on the collection roll FR2 is shown.
  • the host control device CONT performs overall control of the processing devices U1 to Un constituting the production line.
  • the substrate S described in each of the previous embodiments is referred to as a substrate P.
  • the orthogonal coordinate system XYZ is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the transport direction (long direction) of the substrate P is set to the Y direction.
  • the substrate P may be activated by modifying the surface in advance by a predetermined pretreatment, or may have a fine partition structure (uneven structure) for precise patterning formed on the surface.
  • the substrate P wound around the supply roll FR1 is pulled out by the nipped drive roller DR1 and conveyed to the processing device U1, and the center of the substrate P in the Y direction (width direction) is set by the edge position controller EPC1.
  • Servo control is performed so as to be within a range of about ⁇ 10 ⁇ m to several tens ⁇ m with respect to the position.
  • the processing device U1 continuously applies a photosensitive functional liquid (photoresist, photosensitive silane coupling material, UV curable resin liquid, etc.) to the surface of the substrate P by a printing method with respect to the transport direction (long direction) of the substrate P or
  • a coating apparatus for selectively coating In the processing apparatus U1, a coating mechanism including a pressure drum DR2 around which the substrate P is wound, and a coating roller for uniformly coating the photosensitive functional liquid on the surface of the substrate P on the pressure drum DR2.
  • Gp1 a drying mechanism Gp2 for rapidly removing a solvent or moisture contained in the photosensitive functional liquid applied to the substrate P, and the like are provided.
  • the processing device U2 heats the substrate P conveyed from the processing device U1 to a predetermined temperature (for example, about several tens to 120 ° C.), and stabilizes the photosensitive functional layer applied on the surface. It is.
  • a predetermined temperature for example, about several tens to 120 ° C.
  • a plurality of rollers and an air turn bar for returning and conveying the substrate P, a heating chamber HA1 for heating the substrate P that has been carried in, and the temperature of the heated substrate P are as follows:
  • a cooling chamber HA2 and a nipped drive roller DR3 are provided for lowering the temperature so as to match the ambient temperature of the post-process (processing device U3).
  • the processing apparatus U3 as the substrate processing apparatus 100 applies ultraviolet patterning light corresponding to the circuit pattern or wiring pattern for display to the photosensitive functional layer of the substrate P (substrate S) conveyed from the processing apparatus U2.
  • An exposure apparatus for irradiation In the processing apparatus U3, an edge position controller EPC that controls the center of the substrate P in the Y direction (width direction) to a fixed position, the nipped drive roller DR4, and the substrate P are partially wound with a predetermined tension, and the substrate A rotary drum DR5 (rotary drum 30) for supporting a pattern exposed portion on P in a uniform cylindrical surface, and two sets of drive rollers DR6 for giving a predetermined slack (play) DL to the substrate P, DR7 etc. are provided.
  • a transmission type cylindrical mask DM (mask unit MU) and an illumination mechanism IU (illumination) provided in the cylindrical mask DM and illuminating a mask pattern formed on the outer peripheral surface of the cylindrical mask DM.
  • Part 10 a transmission type cylindrical mask DM (mask unit MU) and an illumination mechanism IU (illumination) provided in the cylindrical mask DM and illuminating a mask pattern formed on the outer peripheral surface of the cylindrical mask DM.
  • Part 10 a part of the substrate P supported in a cylindrical surface by the rotary drum DR5
  • Alignment microscopes AM1 and AM2 for detecting an alignment mark or the like formed in advance on P are provided.
  • the processing device U4 is a wet processing device that performs wet development processing, electroless plating processing, and the like on the photosensitive functional layer of the substrate P conveyed from the processing device U3.
  • the processing apparatus U4 there are provided three processing tanks BT1, BT2, and BT3 layered in the Z direction, a plurality of rollers for bending and transporting the substrate P, a nip driving roller DR8, and the like.
  • the processing apparatus U5 is a heating and drying apparatus that warms the substrate P conveyed from the processing apparatus U4 and adjusts the moisture content of the substrate P wetted by the wet process to a predetermined value, but the details are omitted.
  • the substrate P that has passed through several processing devices and passed through the last processing device Un in the series of processes is wound up on the collection roll FR2 via the nipped drive roller DR1.
  • the edge position controller EPC2 controls the Y of the drive roller DR1 and the recovery roll FR2 so that the center in the Y direction (width direction) of the substrate P or the substrate end in the Y direction does not vary in the Y direction.
  • the relative position in the direction is successively corrected and controlled.
  • the substrate processing apparatus 100 described above is used as the processing apparatus U3, vibration, wear, noise, dust, and the like are generated when a rotational force is transmitted by a contact type such as a gear. Therefore, highly accurate synchronous driving is possible, and a mask pattern having a relatively large size can be faithfully transferred onto the substrate. Therefore, it becomes possible to manufacture devices such as display panels and electronic circuits with higher definition.
  • the configuration in which the rotation axes of the magnetic gear portions GM1 and GM2 are parallel to each other is illustrated, but the present invention is not limited to this.
  • the magnetic gear As a transmission form of the magnetic gear, as shown in FIG. 15, the magnetic gear is arranged around the rotation axis parallel to the Y axis in the vicinity of the outer peripheral surface of the first magnetic gear GMa that can rotate around the rotation axis parallel to the Z axis. Even when the outer peripheral surface of the rotatable second magnetic gear GMb is arranged, the rotational force can be transmitted between the two magnetic gears GMa and GMb.
  • the magnetic gear transmission mechanism in which the rotation axes are arranged in directions orthogonal to each other is described in, for example, the republication publication WO2007-10780 (EP1906054A1). Therefore, when using a magnetic gear transmission mechanism capable of converting the rotational force to 90 degrees, for example, as shown in FIG. A gear portion GM1B is provided, and a magnetic gear portion GM2 having a shaft ST1 (ST2) extending in a direction orthogonal to the rotation axis of the magnetic gear portion GM1A and the magnetic gear portion GM1B as a rotation axis is close to the magnetic gear portions GM1A and GM1B. It is good also as a structure provided.
  • the magnetic gear portion GM1A corresponds to the first magnetic pattern portion
  • the magnetic gear portion GM1B corresponds to the second magnetic pattern portion
  • the magnetic gear portion GM2 provided on the shaft ST1 (ST2) is the third magnetic pattern portion. It corresponds to the pattern part.
  • the configuration in which the inclination angles of the fixed plates 15A and 15B supporting the mask units MU1 to MU3 are made constant is not limited to this.
  • the inclination angles of the fixed plates 15A and 15B are exemplified.
  • An angle adjusting device for adjusting the angle may be provided. In this configuration, the load applied as a preload to the rotating drum 30 among the dead weights of the mask units MU1 to MU3 can be adjusted according to the inclination angles of the fixed plates 15A and 15B.
  • a driving device for independently driving the mask units MU1 to MU3 with respect to the rotary drum 30 is provided, and the mask units MU1 to MU3 according to the gap amount to be formed between the rotary mask 20 and the substrate S.
  • the position in the inter-axis direction may be adjusted by a drive source such as a piezo actuator.
  • the sheet-like mask which has a pattern is made into a transparent cylindrical body (product made from quartz with uniform thickness). It may be configured to be wound around a tube-shaped cylinder or the like.
  • the rotational driving force is transmitted by the magnetic gear between the rotary mask 20 and the rotary drum 30.
  • the shaft ST1 (ST2) May be connected to a rotary motor (rotary drive source) as a drive source.
  • the rotational torque of the two magnetic gear portions GM2 provided on the shaft ST1 (ST2) is such that the magnetic gear portion GM1A (rotary mask 20) faces the one magnetic gear portion GM2 in a non-contact manner, and the other magnetic gear portion.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
PCT/JP2013/050778 2012-05-18 2013-01-17 基板処理装置 WO2013172048A1 (ja)

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