WO2013172048A1 - Substrate processing apparatus - Google Patents

Abstract

This substrate processing apparatus transfers a flexible long substrate (S) in the length direction in a state wherein the substrate is supported by means of a part of the circumferential surface of a rotating rolling body (30), and a pattern formed on the circumferential surface of a rotatable mask that can rotate is repeatedly transferred to a substrate surface to be processed. The substrate processing apparatus is provided with: mask holding sections (MU1-MU5), which support the rotatable mask with respect to the rolling body such that a rotatable mask portion involved in the transfer of the outer circumferential surface, and the substrate surface to be processed are disposed at a predetermined interval; and a magnetic gear transmission system (GD) which transmits, by means of a magnetic force, the rotating force of the rolling body or the rotatable mask as the rotating force of the other one of the rolling body and the rotatable mask.

Description

Substrate processing equipment

The present invention relates to a substrate processing apparatus.
This application claims priority based on US Provisional Application No. 61 / 648,956 filed on May 18, 2012, the contents of which are incorporated herein by reference.

In a large screen display element such as a liquid crystal display element, a transparent electrode such as ITO or a semiconductor substance such as Si is deposited on a flat glass substrate, a metal material is evaporated, a photoresist is applied, and a circuit pattern is formed. The circuit pattern is formed by transferring, developing the photoresist after the transfer, and then etching. However, since the glass substrate is enlarged with an increase in the screen size of the display element, it is difficult to carry the substrate.
Therefore, it is called a roll-to-roll method (hereinafter simply referred to as “roll method”) in which a display element is formed on a flexible substrate (for example, a film member such as polyimide, PET, or metal foil). A technique has been proposed (see, for example, Patent Document 1).

Further, in Patent Document 2, a flexible long sheet (substrate) that is wound around a feed roller and traveled is disposed in the vicinity of the outer peripheral portion of a rotatable cylindrical mask, and the mask pattern is continuous. In particular, techniques for exposing a substrate have been proposed.

International Publication No. 2008/1229819 Japanese Utility Model Publication No. 60-019037

However, the following problems exist in the conventional technology as described above.
As a mechanism for synchronously moving the peripheral speed of the rotary mask and the substrate feed speed (peripheral speed) at a predetermined ratio (for example, 1: 1), for example, it is conceivable to transmit a rotational force using a gear, In this case, vibration, wear, and the like due to the meshing of the gears are generated, and it is difficult to perform synchronous driving while maintaining high-speed stability with high accuracy. As a result, accuracy when transferring the mask pattern to the substrate ( May adversely affect (transfer fidelity).
For example, when a mask pattern to be transferred is formed on the outer periphery of a rotating mask having a diameter of 30 cm over about 90% of the entire circumference, the dimension in the circumferential direction of the mask pattern is about 85 cm (30 cm × π × 0. 9). If the peripheral speed of the pattern surface (outer peripheral surface) of the rotating mask is 5 cm / second and the minimum size (line width, etc.) of the pattern to be transferred is 5 μm, the transfer time of the entire mask pattern is approximately 17 seconds (85/5). Therefore, the stability (constant speed) of the peripheral speed during this period is important.
Assuming that the absolute value of the peripheral speed fluctuates by 0.05% on average, a feed error of 2.5 μm occurs per second. If this continues for the transfer time, the relative relationship between the mask pattern and the substrate is assumed. The feeding error is about 43 μm at the maximum, which is not acceptable when considering the overlay exposure considering the minimum pattern size (5 μm).
In addition, when the rotational speed variation (wow / flutter) of the rotary mask is ± 0.05%, a relative feed error of ± 2.5 μm / second can locally occur, so the minimum pattern size (5 μm ) Transfer fidelity.

An object of an aspect of the present invention is to provide a substrate processing apparatus capable of synchronously driving a mask and a substrate with high accuracy.

According to one aspect of the present invention, a long substrate having flexibility is supported in a part of the circumferential surface of a rotatable rolling element and is transported in the long direction and is rotatable. A substrate processing apparatus for repeatedly transferring a pattern formed on a peripheral surface of a rotary mask onto a surface to be processed of the substrate, wherein a portion involved in the transfer of the outer peripheral surface of the rotary mask and a surface to be processed of the substrate have a predetermined distance A mask holding portion that supports the rotating mask with respect to the rolling element, and a magnetic gear transmission system that transmits one rotational force of the rolling element and the rotating mask with the magnetic force as the other rotational force. A substrate processing apparatus is provided.

According to another aspect of the present invention, a substrate transport mechanism for transporting a flexible long substrate in a long direction while being supported by a part of the circumferential surface of a rotatable rolling element. A mask holding mechanism that holds a rotating mask that has a mask pattern curved in a cylindrical shape with a predetermined radius and that can rotate around the axis of the cylinder, and illumination that irradiates a part of the mask pattern formed on the rotating mask with illumination light A transfer mechanism that transfers a part of the mask pattern to the surface to be processed of the substrate, and a magnetic gear transmission system that transmits one of the rolling elements and the rotating mask as a rotational force by the magnetic force. A substrate processing apparatus is provided.

In the aspect of the present invention, the mask and the substrate can be driven in synchronization with high accuracy, and the mask pattern can be transferred to the substrate with high accuracy.

1 is a schematic external perspective view of a substrate processing apparatus according to an embodiment. The schematic external perspective view of the mask unit in a substrate processing apparatus. Sectional drawing which fractured | ruptured the mask unit at the plane containing a rotating shaft line. The figure which expanded the A section in FIG. The figure which shows the servo system provided in the drive control part which controls rotation of a rotation mask. FIG. FIG. 3 is a development view of a substrate wound around a rotating drum. The figure explaining operation | movement of a magnetic gear part. FIG. 5 is a schematic external perspective view of a substrate processing apparatus according to a second embodiment. The elements on larger scale of a fixed plate and a mask unit. The figure which cut | disconnected the mask unit in the plane containing rotation axis AX1B and rotation axis AX2. The schematic block diagram of the magnetic gearwheel transmission mechanism which concerns on 3rd Embodiment. The schematic block diagram of the magnetic gearwheel transmission mechanism which concerns on 3rd Embodiment. The figure which shows the structure of a device manufacturing system. The figure which shows another form of a magnetic gearwheel transmission mechanism. The figure which shows another form of the substrate processing apparatus using the magnetic gearwheel transmission mechanism of FIG.

Hereinafter, embodiments of the substrate processing apparatus of the present invention will be described with reference to FIGS.
(First embodiment)
In the first embodiment, a case where a plurality of mask patterns are superimposed and transferred on a substrate will be described.

FIG. 1 is a schematic external perspective view of a substrate processing apparatus 100 according to the first embodiment, FIG. 2 is a schematic external perspective view of a mask unit MU in the substrate processing apparatus 100, and FIG. FIG. 4 is a cross-sectional view taken along a plane including the axis AX1A (AX1B) (first rotation axis), and FIG. 4 is an enlarged view of part A in FIG.

The substrate processing apparatus 100 performs exposure processing on a flexible belt-like (long) substrate (for example, a belt-like film member) S with a pattern of a mask M curved into a cylindrical surface with a predetermined radius. The illumination unit 10 (not shown in FIG. 1, see FIG. 3), the mask units MU1 to MU5, the substrate holding unit SU, the magnetic gear transmission mechanism GD, and the control unit (not shown) are mainly configured. In the following description, the mask units MU1 to MU5 are collectively referred to as a mask unit MU as appropriate.

In the present embodiment, the vertical direction is the Z direction, and the directions parallel to the rotation axes AX1A and AX1B of the mask units MU1 to MU5 and the rotation axis AX2 of the substrate holding unit SU are the Y directions, and the Z and Y directions are The direction orthogonal to the X direction will be described.

The illumination unit 10 irradiates illumination light toward the illumination area of the rotary mask 20 in the mask unit MU. The illumination unit 10 emits illumination light for exposure radially in a straight tube type like a fluorescent lamp, Uses one in which illumination light is introduced from both ends of a cylindrical quartz rod and a diffusion member is provided on the back side, or a plurality of LEDs that emit light in the ultraviolet region with a wavelength of 400 nm or less arranged in the Y direction. And is accommodated in the internal space of the inner cylinder 21 that supports the rotary mask 20.
As a light source of illumination light, for example, bright lines (g line, h line, i line) emitted from a lamp light source, far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm), ArF excimer laser light (wavelength) 193 nm), solid state light sources such as semiconductor lasers and LEDs are used.

Of the mask units MU1 to MU5, the mask units MU1 to MU3 are sequentially arranged along the rotation axis AX1A. Of the mask units MU1 to MU5, the mask units MU4 to MU5 are sequentially arranged along the rotation axis AX1B. The mask unit MU4 is disposed at an intermediate position between the mask units MU1 and MU2 with respect to the Y direction, and the mask unit MU5 is disposed at an intermediate position between the mask units MU2 and MU3 with respect to the Y direction.
The rotation axes AX1A and AX1B are arranged at a certain angular interval, for example, 90 °, around the rotation axis AX2.

Each mask unit MU1 to MU5 includes a rotary mask 20, an inner cylinder 21, an air pad (mask holding portion) 22, a holder 23, a drive portion MT, and a flange portion 25, as shown in FIGS. At both ends of the cylindrical rotary mask 20, an annular holder 23 is fixed and provided in an integrated state. Inside the rotary mask 20 and the holder 23, a cylindrical inner cylinder 21 is inserted in the direction of the rotation axis AX1A (or AX1B).

The rotary mask 20 is formed of cylindrical quartz or the like that can transmit illumination light, and a predetermined pattern is formed on an outer peripheral surface (peripheral surface) 20a thereof. Further, the air mask 22 is a fluid bearing provided at the outer peripheral position of the inner cylinder 21 facing the inner peripheral surface of the rotary mask 20 (a gas supply unit, details will be described later). It is supported so as to be movable in a non-contact (or low friction state) in the direction of the rotation axis AX1A (or AX1B) and the direction around the rotation axis AX1A (or AX1B).
The holder 23 is formed in an annular shape with a metal material, and supports the outer peripheral surface and inner peripheral surface of the end portion in the Y direction of the rotary mask 20 as shown in FIG.

The inner cylinder 21 is installed on a base (not shown) (body structure of the exposure apparatus), and supports the flange 25 via air bearings 26 at both ends in the direction of the rotation axis AX1A (or AX1B). To do.
In the air pad AP made of a porous material provided on the outer peripheral surface of the flange portion 25, the pattern area of the outer peripheral surface 20a of the rotary mask 20 and the surface to be processed of the substrate S shown in FIG. As described above, the rotary mask 20 and the inner cylinder 21 are supported with respect to the substrate S wound around the rotary drum 30. Since the ring-shaped air pad AP is formed of a porous pad that supplies (spouts) air as a gas between the outer peripheral surface and the substrate S, the inner cylinder 21 does not contact the surface of the substrate S. And the rotating mask 20 can be supported.
The porous air pad AP is formed on each outer peripheral surface of the flange portion 25 provided on both sides of the inner cylinder 21 in the direction of the rotation axis AX1A (or AX1B), over the entire circumference in the direction around the rotation axis AX1A (or AX1B), or The rotation axis line AX1A (or AX1B) is provided at a predetermined interval around the rotation axis line AX1A (or AX1B).

The drive unit MT drives the rotary mask 20 through the holder 23 by applying a thrust to the extending direction (axial direction, Y direction) of the rotational axis AX1A (or AX1B) and the direction around the rotational axis AX1A (or AX1B). In other words, a pair is provided on both sides of the rotary mask 20 in the direction of the rotation axis AX1A (or AX1B).
Each driving unit MT is a voice coil motor, for example, that applies thrust independently in the two axial directions of the extending direction (axial direction) of the rotational axis AX1A (or AX1B) and the rotational axis AX1A (or AX1B). It is comprised and is provided with the magnetism body (permanent magnet) MG and the coil body CU.
In addition, as for the thrust in the extension direction (axial direction) of the rotation axis AX1A (or AX1B), only one of the pair of drive units MT may be applied.

The magnetism generator MG is provided on the outer surface in the Y direction of the holder 23 so as to protrude in the direction of the rotation axis AX1A (AX1B) over the entire circumference around the rotation axis AX1A (or AX1B). The coil body CU is integrally fixed to the flange portion 25 by a ring-shaped connecting portion 24 with a gap with respect to the outer peripheral surface of the inner cylinder 21, and has a diameter centered on the rotation axis AX1A (AX1B). It has a U-shaped cross-sectional shape that sandwiches the magnetic generator MG with respect to the direction.
Inside the ring-shaped connecting portion 24 shown in FIG. 2, as shown in detail in FIG. 4, the magnet rows of one magnetic gear portion GM1 constituting the magnetic gear transmission mechanism GD are arranged at a constant pitch in the circumferential direction. Is done. Energization of the coil body CU is controlled by the drive control unit DC. Note that the coil body CU does not necessarily have to be provided over the entire circumference, and may have a configuration in which a plurality of coil bodies CU are provided at predetermined intervals in the circumferential direction (for example, a configuration in which three locations are provided at 120 ° intervals).
In addition, the coil body CU provides a rotational thrust for applying a thrust (rotational torque) in the direction around the rotational axis AX1A (or AX1B) between the flange portion 25 (connecting portion 24) and the rotary mask 20 (and the holder 23). Coil group for translation and a coil group for translational thrust that gives a linear driving force in the extending direction (axial direction, Y direction) of the rotation axis AX1A, and the magnitude of the current supplied to each coil group is controlled by a drive control unit. By individually adjusting with DC, the rotational thrust and the translational thrust can be controlled independently.

In the configuration of the mask unit MU as described above, the inner cylinder 21 is fixedly installed with respect to the exposure apparatus main body, and both the flange portion 25 (connecting portion 24) and the rotary mask 20 are rotational axes with respect to the inner cylinder 21. AX1A (AX1B) is supported rotatably in a non-contact (low friction) state.
Further, the flange portion 25 is constrained by a bearing 26 so as not to slightly move with respect to the inner cylinder 21 in the extension direction (axial direction, Y direction) of the rotation axis AX1A (AX1B). Therefore, the rotary mask 20 slightly moves in the extending direction (axial direction, Y direction) of the rotation axis AX1A (AX1B) between the flange portions 25 on both sides by the translational thrust generated by the drive unit MT.
Further, the flange portion 25 (and the coil body CU) is predetermined around the inner cylinder 21 by a rotational torque applied from the outside through a magnetic gear portion GM1 provided along the outer peripheral surface of the ring-shaped connecting portion 24. Rolls (rotates) at a rotation speed of.
At the same time, when a predetermined current is supplied to the coil group for rotational thrust in the coil body CU, the rotary mask 20 also rotates at a speed synchronized (tuned) with the flange portion 25 (connecting portion 24).
The flange portion 25 (and the connecting portion 24 and the coil that rotate (rotate) via the magnetic gear transmission mechanism GD are servo-controlled by the drive control unit DC by controlling the magnitude and direction of the current flowing through the coil group for rotational thrust. The rotational speed of the rotary mask 20 can be different from the body CU), the direction of relative rotation can be reversed, or the rotary mask 20 can be kept stationary.

For such servo control, in this embodiment, a servo system as shown in FIG. 5 is provided. FIG. 5 is a view of the partially fractured surface of FIG. 4 as viewed in the YZ plane. For servo control, a grating scale GS2 for encoder measurement is formed on the outer peripheral surface of the rotary mask 20 over the entire circumference. In order to read the lattice scale GS2, an encoder head EH2 installed in the exposure apparatus main body is provided.
In the drive control unit DC, a two-phase signal from the encoder head EH2 is input, and a counter circuit 201 that sequentially measures the rotational angle position of the rotary mask 20 (lattice scale GS2), and a measurement value from the counter circuit 201 are input. When the difference between the rotation speed of the rotation mask 20 and the rotation speed command value based on the command information 200 changes from a predetermined value (a reference value held in the storage unit REF), an arithmetic circuit that generates a deviation signal thereof 202, a drive circuit 203 that provides the deviation signal as a drive signal to the coil group for rotational thrust in the coil body CU, and a drive circuit 204 that provides a drive signal to the coil group for translational thrust in the coil body CU are provided. It has been.
In the servo system of FIG. 5, when the flange portion 25 (connecting portion 24) rotates at a constant rotational speed via the magnetic gear transmission mechanism GD, the rotary mask 20 can be rotated synchronously based on that. . However, the synchronous rotation here is not necessarily limited to the rotation at the same speed, but includes the case where the rotation speed of the flange portion 25 and the rotation speed of the rotary mask 20 maintain a predetermined ratio. .

Further, in the servo system of FIG. 5, what is important at the time of exposure is the peripheral speed of the mask pattern surface (outer peripheral surface 20a) of the rotary mask 20, and when the peripheral speed deviates from a predetermined reference speed. The drive circuit 203 may give a drive signal to the coil group for rotational thrust in the coil body CU.
In this way, even if the rotational speed of the flange portion 25 differs from the set speed or uneven speed occurs, the rotary mask 20 can be stably rotated at a constant speed regardless of such error factors. it can. Furthermore, regardless of the rotational speed of the flange portion 25, the rotary mask 20 can be rotated at a set arbitrary speed or made stationary.
If the grating scale GS2 is a two-dimensional grating and the encoder head EH2 is also capable of measuring the displacement in the Y direction (extension direction (axial direction) of the rotation axes AX1A and AX1B), the displacement of the rotary mask 20 in the Y direction. Can be measured with high accuracy on the basis of the exposure apparatus main body (encoder head EH2), and a servo system that provides a drive signal to the coil group for translational thrust in the coil body CU via the drive circuit 204 can be easily configured. it can.

On the other hand, the substrate holding unit SU includes a rotating drum (rolling element) 30 as shown in FIG.
The rotary drum 30 is formed in a columnar shape that is parallel to the Y axis and rotates around the rotation axis AX2 set on the −Z side of the rotation axis AX1B and on the + X side of the rotation axis AX1A. The outer peripheral surface of the rotary drum 30 is a substrate holding surface 31 that holds the substrate S in contact therewith. Projecting portions 32 having a smaller diameter than the rotating drum 30 and projecting coaxially are provided on both end surfaces of the rotating drum 30 in the Y direction.
In the present embodiment, as shown in FIG. 1, a drive device 33 that rotationally drives the rotary drum 30 is provided. The drive device 33 is controlled by the drive control unit DC described above.

FIG. 6 is a development view of the rotary mask 20. A symbol Xs in FIG. 6 indicates the movement direction (rotation direction) of the rotary mask 20.
As shown in FIG. 6A, the illumination unit 10 in the mask units MU1 to MU3 includes an illumination region IR1 that illuminates a range over the pattern region MA of the rotary mask 20 in the Y direction. Similarly, as shown in FIG. 6B, the illumination unit 10 in the mask units MU4 to MU5 includes an illumination region IR2 that illuminates a range over the pattern formation region MA of the rotary mask 20 in the Y direction.
Each illumination region IR1, IR2 is formed in a trapezoidal shape having triangular portions at both ends in the Y direction. The illumination regions IR1 and IR2 are formed such that the direction of the triangular portion (that is, the position of the short side of the pair of parallel lines) is opposite to the X direction.

In the present embodiment, the pattern formation area MA of the rotary mask 20 moves in the direction of the symbol Xs with the rotation of the mask holding unit 22 and passes through the illumination area IR1 (illumination area IR2). FIG. 7 is a development view of the substrate S wound around the rotary drum 30. A symbol Xs in FIG. 7 indicates the moving direction (rotating direction) of the rotating drum 30.
As shown in FIG. 7, the mask units MU1 to MU5 are arranged so that transfer areas PA1 to PA5 illuminated with illumination light (exposure light) from a pattern transmitted through the rotary mask 20 are adjacent to areas adjacent to each other in the Y direction. It is arranged in a staggered pattern so that (the trapezoidal triangular part) overlaps.
Therefore, for example, the area on the substrate S that passes through the transfer area PA1 due to the rotation of the rotating drum 30 partially overlaps the area on the substrate S that passes through the transfer area PA2 due to the rotation of the rotating drum 30. The shapes and the like of the transfer area PA1 and the transfer area PA2 are set so that the exposure amount in the overlapping region in the circumferential direction is substantially the same as the exposure amount in the non-overlapping region.

The magnetic gear transmission mechanism GD transmits the rotational force of the rotary drum 30 in a non-contact manner (using magnetic force) as the rotational force of the rotary mask 20 (connecting portion 24), and includes a belt drive mechanism VD and a magnetic gear portion. GM1 and GM2 are provided. As shown in FIG. 1, the belt drive mechanism VD has a configuration in which a belt VL is stretched (installed in a tensioned state) on the protruding portion 32 of the rotary drum 30 and the pulleys PL1 and PL2.
The pulley PL1 is integrally provided on the −X side of the mask units MU1 to MU3 at the −Y side end of the shaft ST1 that extends in the Y direction and is arranged to be rotatable about the axis. The pulley PL2 is integrally provided on the −X side of the mask units MU4 to MU5 at the −Y side end portion of the shaft ST2 that extends in the Y direction and is rotatable around the axis.

As shown in FIG. 2, a disk-shaped magnetic gear portion GM2 is disposed on the shaft ST1 at a position facing the magnetic gear portion GM1 of the ring-shaped connecting portion 24 with a gap from the magnetic gear portion GM1. .
As shown in FIG. 8, the magnetic gear portion GM2 has a plurality of S poles S2 and N poles N2 alternately with a predetermined pitch and a predetermined peripheral length around the shaft ST1 (shaft ST2) as shown in FIG. It has magnetic patterns (permanent magnets) arranged one by one. The magnetic gear portion GM1 includes a plurality of S-poles S1 and N-poles N1 around the rotation axis AX1A (rotation axis AX1B) alternately at the same pitch and the same circumference as the magnetic gear portion GM2 on the peripheral surface (eight in FIG. 8 each). Each of which is provided with a magnetic pattern (permanent magnet).

The outer diameters of the protrusion 32 of the rotary drum 30, the pulleys PL1 and PL2, and the magnetic gear portions GM1 and GM2 are determined by the circumferential speed of the rotary mask 20 (connection portion 24) and the peripheral speed of the rotary drum 30 (conveyance speed of the substrate S). ) Are set to be substantially the same.

The operation of the magnetic gear transmission mechanism GD in the substrate processing apparatus 100 having the above configuration will be described. When the rotary drum 30 is rotated around the rotation axis AX2 (second rotation axis) by driving the driving device 33, the pulleys PL1 and PL2 are moved at a speed corresponding to the outer diameter ratio with the protrusion 32 by the belt drive mechanism VD. Rotate.

The rotations of the pulleys PL1 and PL2 are transmitted via the shafts ST1 and ST2, and the magnetic gear portions GM2 rotate. At this time, in the magnetic gear portion GM2, for example, as shown in FIG. 8A, when the magnetic gear portion GM1 and the S pole S2 are opposed to each other, magnetic forces in the attracting directions act on the magnetic gear portion. The north pole N1 of the part GM1 is opposed.
Then, for example, when the magnetic gear part GM2 rotates in the clockwise direction in FIG. 8, as shown in FIG. 8B, the S pole S2 that applies the magnetic force in the direction attracting to the N pole N1 moves away. The magnetic pole part GM1 acts as a traction force on the magnetic pole part N1 of the magnetic gear part GM1 by approaching the magnetic pole part N2 that causes the magnetic force in the repulsive direction to act on the magnetic pole part N1. It rotates at a speed corresponding to the outer diameter ratio (peripheral length ratio) with GM2.
Therefore, the rotary mask 20 is rotated by the rotational driving force of the rotary drum 30 transmitted in a non-contact manner by the magnetic gear transmission mechanism GD, together with the rotational driving force applied by the drive unit MT by the magnet generator MG and the coil body CU. Synchronously rotate around AX1A (rotation axis AX1B).

As described above, when the rotary drum 30 rotates around the rotation axis AX2 by driving the driving device 33, the rotary mask 20 in the mask units MU1 to MU3 is rotated around the rotation axis AX1A by the magnetic gear transmission mechanism GD, and the mask unit MU4. The rotary mask 20 in MU5 rotates around the rotation axis AX1B.
And when illumination light is irradiated from the illumination part 10, in the illumination area | region IR1 (illumination area | region IR2), the pattern of the rotation mask 20 is illuminated from the inner peripheral side. Exposure light from each pattern in the mask units MU1 to MU3 is applied to the transfer areas PA1 to PA5 on the substrate S, respectively.

Therefore, each pattern of the rotary mask 20 in the mask units MU1 to MU5 is connected and transferred on the substrate S in the width direction. The pattern of the rotary mask 20 is repeatedly transferred to the substrate S by continuous rotation of the rotary mask 20 and continuous conveyance of the substrate S by continuous rotation of the rotary drum 30.

During the exposure process, before the exposure process, or after the exposure process, the alignment of the position of the rotary mask 20 around the rotation axis AX1A (rotation axis AX1B) and the position of the rotation axis AX1A (rotation axis AX1B) is as follows. For example, based on the measurement result of the mask mark of the rotary mask 20 and the substrate mark of the substrate S, the holder 23 and the rotary mask 20 are rotated via the magnetic generator MG of the drive unit MT by the energization control of the drive control unit DC. It is performed by finely moving in the direction around the axis AX1A (rotation axis AX1B) or in the direction of the rotation axis AX1A (rotation axis AX1B).

As described above, in the present embodiment, the rotational force of the rotary drum 30 is transmitted as the rotational force of the rotary mask 20 through the non-contact type driving mechanism MT by the non-contact type magnetic gear transmission mechanism GD. High-accuracy synchronous driving is possible without causing vibration, wear, noise, dust, or the like as in the case of transmitting the rotational force by a contact type such as the above. In particular, in the present embodiment, since the rotational force is transmitted through the magnetic gear portions GM1 and GM2, lubrication or the like is unnecessary, which can contribute to improvement in work efficiency and cleanliness.
Moreover, in this embodiment, since the rotary mask 20 is hold | maintained by the air pad 22 so that rotation without contact is possible, it becomes possible to hold | maintain the rotary mask 20 stably.

Further, in the present embodiment, a plurality of mask units MU1 to MU5 are arranged, and patterns set by the mask units MU1 to MU5 are connected in the width direction on the substrate S, so that a pattern with a large area is formed. It becomes possible.
In the present embodiment, when the patterns are connected in the width direction on the substrate S, the patterns are transferred with an error in the width direction because the patterns are partially connected to each other. Even in this case, it is possible to prevent a large difference from the exposure energy amount applied to the non-overlapping portion.

(Second Embodiment)
Next, a second embodiment of the substrate processing apparatus 100 will be described with reference to FIGS. In the first embodiment, the configuration in which the rotational force of the rotary drum 30 is transmitted as the rotational force of the rotary mask 20 via the belt drive mechanism VD is illustrated. However, in the present embodiment, the belt drive mechanism VD is not used. explain.
In these drawings, the same components as those of the first embodiment shown in FIGS. 1 to 8 are denoted by the same reference numerals, and the description thereof is omitted.

The substrate processing apparatus 100 shown in FIG. 9 includes mask units MU1 to MU2 arranged along the rotation axis AX1A, a mask unit MU3 arranged along the rotation axis AX1B, a substrate holding unit SU, and a magnetic gear transmission mechanism GD (FIG. 11).
In the present embodiment, three mask units MU1 to MU3 are provided, but as in the first embodiment, the patterns of the mask units MU1 to MU3 overlap each other in the width direction (Y direction) of the substrate S. Although the transfer region on the substrate S is set so as to be connected in the combined state, the description thereof is omitted.

The rotation axis AX1A is arranged at a position on the −X side of the rotation axis AX2 and at an angle θ1 on the + Z side with respect to the horizontal direction (XY plane) in the direction around the rotation axis AX2, and the rotation axis AX1B is the rotation axis AX2 Further, on the + X side, with respect to the direction around the rotation axis AX2, it is arranged at a position at an angle θ2 on the + Z side with respect to the horizontal direction (XY plane).
The angles θ1 and θ2 are set to 45 degrees as an example. If the winding angle of the substrate S wound around the rotating drum 30 (the angle at which the substrate S is in close contact with the outer peripheral surface of the rotating drum 30) is ω °. 180 ° − (θ1 + θ2) <ω °.

The mask units MU1 to MU2 are line segments orthogonal to both the rotation axis AX1A and the rotation axis AX2 on the fixed plate 15A disposed on the −X side of the rotary drum 30 and inclined around the axis parallel to the rotation axis AX1A by an angle θ1. In the direction (hereinafter simply referred to as the inter-axis direction).
Similarly, the mask unit MU3 is spaced apart in the direction of the axis between the rotation axis AX1B and the rotation axis AX2 on the fixed plate 15B disposed at an angle θ2 around the axis parallel to the rotation axis AX1B on the + X side of the rotation drum 30.・ It is provided so as to be freely accessible (movable).
Since the mask units MU1 to MU2 provided on the fixed plate 15A and the mask unit MU3 provided on the fixed plate 15B have the same configuration, in the following description, the mask unit MU3 provided on the fixed plate 15B will be described. A representative explanation will be given.

FIG. 10 is a partially enlarged view of the fixing plate 15B and the mask unit MU3.
As shown in FIG. 10, the fixed plate 15 </ b> B is provided with a stage portion 16 that supports the mask unit MU <b> 3 movably in the Y direction and the inter-axis direction at the flange portion 27.
The stage unit 16 moves in the Y direction along the Y guide 28Y provided along the Y direction. The stage portion 16 is provided with an inter-axis guide 28J provided along the inter-axis direction. In the mask unit MU3, the slide portion 29 provided on the flange portion 27 is guided by the inter-axis guide 28J and moves in the inter-axis direction.

In the vicinity of the slide portion 29 provided at the side end of the flange portion 27, a slit 27 a is formed in a range longer than the length of the slide portion 29 along the inter-axis direction. The thickness between the slit 27a and the slide portion 29 is set to a thickness that can be elastically deformed even when the weight of the mask unit MU3 is added.

FIG. 11 is a cross-sectional view of the mask unit MU3 cut along a plane including the rotation axis AX1B and the rotation axis AX2. As shown in FIG. 11, the mask unit MU3 includes a thrust bearing TB provided between the holder 23 located on the −Y side and the flange portion 25, and a space between the holder 23 located on the + Y side and the flange portion 25. And an ultrasonic motor 17 provided in the apparatus.

The ultrasonic motor 17 adjusts the position of the rotary mask 20 and the magnetic gear portion GM1 around the rotation axis AX1B, and is a ring-shaped stator 17A fixed to the flange portion 25 and a ring connected to the holder 23. And a rotor 17B in the form of a ring.
The rotor 17B does not rotate about the rotation axis AX1B with respect to the holder 23, but is coupled so as to be finely movable in the extending direction (axial direction) of the rotation axis AX1B, and is attached to the stator 17A side by a preload spring 18. They are touching by force.

The flange portion 27 is fixedly provided at both ends of the inner cylinder 21, and a value obtained by adding the thickness of the substrate S to the radius of the substrate holding surface 31 of the rotating drum 30 on the surface facing the rotating drum 30. A holding part 34 cut out in an arc shape having a radius of is provided. Similar to the air pad AP shown in FIG. 3 or FIG. 4, the holding portion 34 is formed of a porous pad that ejects air from the arc-shaped surface in the radial direction.

In the rotary drum 30, a magnetic gear part GM2 is embedded over the entire circumference on the same plane as the substrate holding surface 31 at a position facing the magnetic gear part GM1 in the Y direction.
Other configurations are the same as those of the first embodiment.

In the substrate processing apparatus 100 having the above-described configuration, the load of the component force corresponding to the angle θ2 of the weight of the mask unit MU3 supported by the stage unit 16 is rotated via the substrate S wound around the surface of the rotating drum 30. The mask unit MU3 is supported in a state of being applied as a preload to the 30 side.
At this time, since air is ejected from the holding part 34, the mask unit MU3 is in a non-contact state in a state where a predetermined amount of gap (gap at the time of proximity exposure) is formed between the rotary mask 20 and the substrate S. Is supported on the substrate S.

Further, when the holding unit 34 is supported by the rotating drum 30 (substrate S) due to manufacturing errors or installation errors of the slide unit 29 and the inter-axis guide 28J, the positions of the holding unit 34 and the rotating drum 30 (substrate S) are as follows. If they are shifted, the holding portion 34 and the rotating drum 30 may be supported in a biased state.
In this case, the thin portion between the slit 27a and the slide portion 29 functions as a leaf spring, and elastically deforms in the direction in which the offset load is eliminated, so that the holding portion 34 of the rotary drum 30 (substrate S) is It can be supported on the surface in a predetermined positional relationship.

Here, when one of the holding portions 34 (flange portion 27) in the mask units MU1 and MU3 is positioned on the rotary drum 30 outside the substrate S, the substrate S is placed between the other of the holding portions 34. A step corresponding to the thickness occurs, and the rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2 are not parallel.
In this case, a shim having the same thickness as that of the substrate S is attached to the substrate holding surface 31 of the rotating drum 30 facing the holding portion 34 located outside, and the rotating drum 30 supports the shim through the shim. The rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2 can be maintained in a parallel state.

When the rotating drum 30 rotates about the rotation axis AX2, the rotational force is transmitted to the magnetic gear portion GM1 in a non-contact manner by the traction force due to the magnetic force as the magnetic gear portion GM2 rotates.
The rotational force transmitted to the magnetic gear portion GM1 is transmitted to the rotary mask 20 via the flange portion 25, the ultrasonic motor 17, the holder 23, and the thrust bearing TB, and the rotary mask 20 in the mask units MU1 to MU2 rotates. While rotating around AX1A, the rotating mask 20 in the mask unit MU3 also rotates around the rotation axis AX1B.

In this configuration, in order to adjust the position (phase in the rotation direction) around the rotation axis AX1A (rotation axis AX1B) of the rotary mask 20 with respect to the substrate S, the vibration progresses in the circumferential direction on the stator 17A of the ultrasonic motor 17. A wave may be applied to rotate the rotor 17B by a predetermined amount with respect to the stator 17A.
Further, the position adjustment of the rotary mask 20 in the rotation axis AX1A (rotation axis AX1B) direction with respect to the substrate S may be performed by using the stage unit 16 to shift the entire mask units MU1 to MU3 in the Y direction.

In addition, since the radius (curvature) of the holding unit 34 is set according to the thickness of the substrate S set in advance, when the thickness of the substrate S is changed, There is a deviation in the circumferential direction according to the distance between the ends of the holding portion 34 (that is, the length of the chord of the arc portion forming the holding portion 34).
For this reason, the distance between the end portions of the holding portion 34 is set according to the variation range of the thickness of the substrate S and the allowable deviation of the gap amount.
For example, assuming that the radius of the substrate holding surface 31 of the rotary drum 30 is 125 mm, the thickness change range of the substrate S is 100 μm, and the allowable deviation of the gap amount is 3 μm, the geometrical calculation results in about 1/2 of the radius of the substrate holding surface 31. In addition, by reducing the distance between the end portions of the holding portion 34, it is possible to cope with the change in the thickness of the substrate S without changing the radius of the holding portion 34.

Thus, in this embodiment, in addition to obtaining the same operation and effect as in the first embodiment, since the magnetic gear portion GM2 is provided in the rotary drum 30, a device such as a belt drive mechanism is separately provided. There is no need to use it, and the size and cost of the apparatus can be reduced.
Furthermore, since the error factor generated in the belt drive mechanism can be eliminated, the rotary mask 20 and the rotary drum 30 can be synchronously driven with higher accuracy.

(Third embodiment)
Next, a third embodiment of the substrate processing apparatus 100 will be described with reference to FIGS.
In the first embodiment, the rotational force of the rotary drum 30 is always transmitted as the rotational force of the rotary mask 20 by the belt drive mechanism VD in the magnetic gear transmission mechanism GD. However, in this embodiment, the rotational force is transmitted. The structure which provides the transmission release part which cancels | releases is demonstrated.
In this figure, the same reference numerals are given to the same elements as those of the first embodiment shown in FIGS. 1 to 8, and the description thereof is omitted.

As shown in FIG. 12, the magnetic gear transmission mechanism GD in the present embodiment includes a belt drive mechanism VD and a transmission release portion 40.
The shaft ST1 (ST2) in the belt drive mechanism VD is provided with a contact portion 41 having a larger diameter than the shaft ST1 (ST2) and a shaft portion 42 having a smaller diameter than the contact portion 41. The contact portion 41 supports the inner peripheral side of the pulley PL1 (PL2) via a bearing 43 so as to be relatively rotatable. The shaft portion 42 is provided with a pusher support portion 45 via a bearing 44.

The transmission release part 40 includes a clutch part 46, a pusher 47, and an urging spring 48.
The clutch portion 46 has a cylindrical portion 46a inserted into the shaft portion 42 with a smaller diameter than the through hole 39a formed in the end wall portion 39 of the pulley PL1 (PL2), and a side of the cylindrical portion 46a facing the contact portion 41. A contact portion 46b provided at the end and formed at a larger diameter than the through hole 39a, and provided at an end portion on the side facing the pusher support portion 45 of the cylindrical portion 46a and formed at a larger diameter than the through hole 39a. And a large-diameter portion 46c.
In the large diameter portion 46 c, a tapered surface 49 is formed at a position facing the pusher 47, which is gradually inclined away from the pusher 47 in the length direction of the shaft portion 42 toward the outer diameter side.

The urging spring 48 is provided between the large-diameter portion 46c and the end wall portion 39 of the pulley PL1 (PL2), and applies urging forces in directions away from each other.

The pusher 47 is provided as a pair with the shaft portion 42 interposed therebetween, and includes a spherical portion 47 a at a position facing the tapered surface 49.
Further, as shown in FIG. 12, each pusher 47 has a transmission position where the ball portion 47a is engaged with the tapered surface 49 near the shaft portion 42, and the ball portion 47a is separated from the shaft portion 42 as shown in FIG. And the release position where the engagement with the tapered surface 49 is released.
When the pusher 47 is located at the transmission position, the contact portion 46 b of the clutch portion 46 is brought into contact with the contact portion 41 against the urging force of the urging spring 48.

In the magnetic gear transmission mechanism GD configured as described above, when the pusher 47 moves to the transmission position and the contact portion 46b of the clutch portion 46 is in contact with the contact portion 41 as shown in FIG. When the pulley PL1 (PL2) is rotated via the belt VL by the rotational force of 30, the large-diameter portion 46c is rotated by the frictional force accompanying the biasing of the biasing spring 48, and between the contact portions 46b and 41 that are in contact with each other. The contact portion 41 is rotated by the frictional force.
As a result, the rotational force of the rotary drum 30 is transmitted to the rotary mask 20 via the magnetic gear portion GM1 shown in FIG. 2 by rotating the magnetic gear portion GM2 via the shaft ST1 (ST2).

On the other hand, when the pusher 47 is moved to the release position and the contact portion 46b of the clutch portion 46 is separated from the contact portion 41 as shown in FIG. 13, the contact portions 46b and 41 are separated, so that the shaft ST and The magnetic gear part GM2 does not rotate. Accordingly, the rotational force of the rotary drum 30 is not transmitted to the rotary mask 20.
Therefore, with the pusher 47 positioned at the transmission position, the rotational force of the rotary drum 30 is transmitted to the rotary mask 20 to perform the above-described exposure process, and the pusher 47 is positioned at the release position, thereby It becomes possible to stop the transmission of the rotational force with the rotary mask 20.

(Device manufacturing system)
Next, a device manufacturing system provided with the substrate processing apparatus 100 will be described with reference to FIG.
FIG. 14 is a diagram showing a partial configuration of a device manufacturing system (flexible display manufacturing line) SYS. Here, a flexible substrate P (sheet, film, ultra-thin glass sheet, etc.) drawn from the supply roll FR1 is sequentially passed through n processing devices U1, U2, U3, U4, U5,. The example until it is wound up on the collection roll FR2 is shown.
The host control device CONT performs overall control of the processing devices U1 to Un constituting the production line. Here, the substrate S described in each of the previous embodiments is referred to as a substrate P.

In FIG. 14, the orthogonal coordinate system XYZ is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the transport direction (long direction) of the substrate P is set to the Y direction. Shall be. The substrate P may be activated by modifying the surface in advance by a predetermined pretreatment, or may have a fine partition structure (uneven structure) for precise patterning formed on the surface.

The substrate P wound around the supply roll FR1 is pulled out by the nipped drive roller DR1 and conveyed to the processing device U1, and the center of the substrate P in the Y direction (width direction) is set by the edge position controller EPC1. Servo control is performed so as to be within a range of about ± 10 μm to several tens μm with respect to the position.

The processing device U1 continuously applies a photosensitive functional liquid (photoresist, photosensitive silane coupling material, UV curable resin liquid, etc.) to the surface of the substrate P by a printing method with respect to the transport direction (long direction) of the substrate P or This is a coating apparatus for selectively coating.
In the processing apparatus U1, a coating mechanism including a pressure drum DR2 around which the substrate P is wound, and a coating roller for uniformly coating the photosensitive functional liquid on the surface of the substrate P on the pressure drum DR2. Gp1, a drying mechanism Gp2 for rapidly removing a solvent or moisture contained in the photosensitive functional liquid applied to the substrate P, and the like are provided.

The processing device U2 heats the substrate P conveyed from the processing device U1 to a predetermined temperature (for example, about several tens to 120 ° C.), and stabilizes the photosensitive functional layer applied on the surface. It is.
In the processing apparatus U2, a plurality of rollers and an air turn bar for returning and conveying the substrate P, a heating chamber HA1 for heating the substrate P that has been carried in, and the temperature of the heated substrate P are as follows: A cooling chamber HA2 and a nipped drive roller DR3 are provided for lowering the temperature so as to match the ambient temperature of the post-process (processing device U3).

The processing apparatus U3 as the substrate processing apparatus 100 applies ultraviolet patterning light corresponding to the circuit pattern or wiring pattern for display to the photosensitive functional layer of the substrate P (substrate S) conveyed from the processing apparatus U2. An exposure apparatus for irradiation.
In the processing apparatus U3, an edge position controller EPC that controls the center of the substrate P in the Y direction (width direction) to a fixed position, the nipped drive roller DR4, and the substrate P are partially wound with a predetermined tension, and the substrate A rotary drum DR5 (rotary drum 30) for supporting a pattern exposed portion on P in a uniform cylindrical surface, and two sets of drive rollers DR6 for giving a predetermined slack (play) DL to the substrate P, DR7 etc. are provided.

Further, in the processing apparatus U3, a transmission type cylindrical mask DM (mask unit MU) and an illumination mechanism IU (illumination) provided in the cylindrical mask DM and illuminating a mask pattern formed on the outer peripheral surface of the cylindrical mask DM. Part 10) and a part of the substrate P supported in a cylindrical surface by the rotary drum DR5, in order to relatively align (align) the image of a part of the mask pattern of the cylindrical mask DM and the substrate P. Alignment microscopes AM1 and AM2 for detecting an alignment mark or the like formed in advance on P are provided.

The processing device U4 is a wet processing device that performs wet development processing, electroless plating processing, and the like on the photosensitive functional layer of the substrate P conveyed from the processing device U3. In the processing apparatus U4, there are provided three processing tanks BT1, BT2, and BT3 layered in the Z direction, a plurality of rollers for bending and transporting the substrate P, a nip driving roller DR8, and the like.

The processing apparatus U5 is a heating and drying apparatus that warms the substrate P conveyed from the processing apparatus U4 and adjusts the moisture content of the substrate P wetted by the wet process to a predetermined value, but the details are omitted.
After that, the substrate P that has passed through several processing devices and passed through the last processing device Un in the series of processes is wound up on the collection roll FR2 via the nipped drive roller DR1. Also during the winding, the edge position controller EPC2 controls the Y of the drive roller DR1 and the recovery roll FR2 so that the center in the Y direction (width direction) of the substrate P or the substrate end in the Y direction does not vary in the Y direction. The relative position in the direction is successively corrected and controlled.

In the device manufacturing system SYS, since the substrate processing apparatus 100 described above is used as the processing apparatus U3, vibration, wear, noise, dust, and the like are generated when a rotational force is transmitted by a contact type such as a gear. Therefore, highly accurate synchronous driving is possible, and a mask pattern having a relatively large size can be faithfully transferred onto the substrate. Therefore, it becomes possible to manufacture devices such as display panels and electronic circuits with higher definition.

As described above, the preferred embodiments according to the present invention have been described with reference to the accompanying drawings, but it goes without saying that the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

For example, in the above embodiment, the configuration in which the rotation axes of the magnetic gear portions GM1 and GM2 are parallel to each other is illustrated, but the present invention is not limited to this. As a transmission form of the magnetic gear, as shown in FIG. 15, the magnetic gear is arranged around the rotation axis parallel to the Y axis in the vicinity of the outer peripheral surface of the first magnetic gear GMa that can rotate around the rotation axis parallel to the Z axis. Even when the outer peripheral surface of the rotatable second magnetic gear GMb is arranged, the rotational force can be transmitted between the two magnetic gears GMa and GMb.
As described above, the magnetic gear transmission mechanism in which the rotation axes are arranged in directions orthogonal to each other is described in, for example, the republication publication WO2007-10780 (EP1906054A1).
Therefore, when using a magnetic gear transmission mechanism capable of converting the rotational force to 90 degrees, for example, as shown in FIG. A gear portion GM1B is provided, and a magnetic gear portion GM2 having a shaft ST1 (ST2) extending in a direction orthogonal to the rotation axis of the magnetic gear portion GM1A and the magnetic gear portion GM1B as a rotation axis is close to the magnetic gear portions GM1A and GM1B. It is good also as a structure provided.
In this case, the magnetic gear portion GM1A corresponds to the first magnetic pattern portion, the magnetic gear portion GM1B corresponds to the second magnetic pattern portion, and the magnetic gear portion GM2 provided on the shaft ST1 (ST2) is the third magnetic pattern portion. It corresponds to the pattern part.
With such a configuration, the distance between the rotary mask 20 and the rotary drum 30 is widened by extending the shaft ST1 (ST2), so that an image of the pattern of the rotary mask 20 is projected onto the substrate wound around the rotary drum 30. A projection optical system or the like can be provided.

In the second embodiment, the configuration in which the inclination angles of the fixed plates 15A and 15B supporting the mask units MU1 to MU3 are made constant is not limited to this. For example, the inclination angles of the fixed plates 15A and 15B are exemplified. An angle adjusting device for adjusting the angle may be provided. In this configuration, the load applied as a preload to the rotating drum 30 among the dead weights of the mask units MU1 to MU3 can be adjusted according to the inclination angles of the fixed plates 15A and 15B.

Furthermore, in the above embodiment, when the holding unit 34 is supported by the rotary drum 30, a predetermined amount of gap is formed between the rotary mask 20 and the substrate S. Without being provided, a driving device for independently driving the mask units MU1 to MU3 with respect to the rotary drum 30 is provided, and the mask units MU1 to MU3 according to the gap amount to be formed between the rotary mask 20 and the substrate S. The position in the inter-axis direction may be adjusted by a drive source such as a piezo actuator.

Moreover, in the said embodiment, although the pattern was formed in the rotation mask 20, it is not limited to this, The sheet-like mask which has a pattern is made into a transparent cylindrical body (product made from quartz with uniform thickness). It may be configured to be wound around a tube-shaped cylinder or the like.

Incidentally, in FIG. 1 or FIG. 16, the rotational driving force is transmitted by the magnetic gear between the rotary mask 20 and the rotary drum 30. For example, in FIG. 16, the shaft ST1 (ST2) May be connected to a rotary motor (rotary drive source) as a drive source.
In this case, the rotational torque of the two magnetic gear portions GM2 provided on the shaft ST1 (ST2) is such that the magnetic gear portion GM1A (rotary mask 20) faces the one magnetic gear portion GM2 in a non-contact manner, and the other magnetic gear portion. It is transmitted to the magnetic gear part GM1B (rotary drum 30) that faces the GM2 in a non-contact manner, and the peripheral speed of the pattern surface (cylindrical surface) of the rotary mask 20 and the transport speed of the substrate S are in a predetermined speed relationship (synchronous speed). Set to

DESCRIPTION OF SYMBOLS 20 ... Rotating mask, 22 ... Air pad (gas supply part), 30 ... Rotating drum (rolling body), 40 ... Transmission release part, 100 ... Substrate processing apparatus, AX1A, AX1B ... Rotating axis (first rotating shaft), AX2 ... rotation axis (second rotation axis), GD ... magnetic gear transmission mechanism, M ... mask, MU, MU1 to MU5 ... mask unit (mask holding part), S ... substrate, SU ... substrate holding unit.

Claims (20)

1. A flexible long substrate is supported by a part of the circumferential surface of a rotatable rolling element, and is transported in the long direction and formed on the circumferential surface of a rotatable rotary mask. A substrate processing apparatus that repeatedly transfers the pattern to the processing surface of the substrate,
   A mask holding portion that supports the rotating mask with respect to the rolling element such that a portion involved in the transfer of the outer peripheral surface of the rotating mask and a surface to be processed of the substrate are arranged at a predetermined interval;
   A magnetic gear transmission system that transmits one rotational force of the rolling element and the rotary mask as magnetic force as the other rotational force;
   A substrate processing apparatus comprising:
2. The substrate processing apparatus according to claim 1, wherein the mask holding unit includes a gas supply unit that holds the rotary mask so as to be rotatable about a first rotation axis and supplies a gas to and from the substrate.
3. The substrate processing apparatus according to claim 2, wherein the gas supply unit uses a porous member at a portion from which gas is ejected.
4. The mask holding part has a cylindrical part,
   The substrate processing apparatus according to claim 1, wherein the rotary mask is rotatably held with respect to the cylindrical portion.
5. The substrate processing apparatus according to any one of claims 1 to 4, wherein the rotating mask has a magnetic pattern as a part of the magnetic gear transmission system.
6. 6. The substrate processing apparatus according to claim 1, wherein the rolling element has a magnetic pattern as a part of the magnetic gear transmission system.
7. The substrate processing apparatus according to claim 1, wherein the magnetic gear transmission system has a magnetic pattern that rotates the rolling element and the rotary mask in synchronization.
8. The substrate processing apparatus according to claim 1, wherein the magnetic gear transmission system includes a transmission release unit that stops transmission of rotation between the rolling element and the rotary mask.
9. A plurality of the mask holding portions are used, and are arranged so that the patterns are connected in the width direction of the substrate when the patterns of the respective rotary masks are transferred to the surface to be processed of the substrate. The substrate processing apparatus according to any one of claims 1 to 8.
10. The substrate processing apparatus according to claim 9, wherein the plurality of mask holding units are arranged so as to be connected in the width direction of the substrate in a state where a part of each pattern overlaps each other.
11. The substrate processing apparatus according to claim 9, wherein the plurality of mask holding units are arranged in a staggered manner in the width direction of the substrate.
12. The plurality of mask holders are arranged such that each of the first rotation axes is concentrically centered on a second rotation axis of the rolling element. The substrate processing apparatus as described.
13. The rotating mask is a transmissive mask,
    The substrate processing apparatus according to claim 1, wherein the mask holding unit includes an illumination device that illuminates a pattern of the rotating mask.
14. The substrate processing apparatus according to claim 1, wherein the mask holding unit includes a driving device that moves the rotary mask in a direction parallel to a direction of the second rotation axis.
15. A substrate transport mechanism for transporting a flexible long substrate with a part of a circumferential surface of a rotatable rolling element in the long direction;
    A mask holding mechanism having a mask pattern curved in a cylindrical shape with a predetermined radius, and holding a rotating mask rotatable around the axis of the cylinder;
    A transfer mechanism having an illumination system for irradiating illumination light to a part of the mask pattern formed on the rotary mask, and transferring a part of the mask pattern to the processing surface of the substrate;
    A magnetic gear transmission system that transmits one rotational force of the rolling element and the rotary mask as magnetic force as the other rotational force;
    A substrate processing apparatus comprising:
16. The rotating mask includes first magnetic pattern portions arranged at a constant pitch along a circumferential direction, and the rolling elements include second magnetic pattern portions arranged at a constant pitch along a circumferential direction, The substrate processing apparatus according to claim 15, wherein the gear transmission system includes a third magnetic pattern unit that magnetically couples the first magnetic pattern unit and the second magnetic pattern unit in a non-contact manner. .
17. A substrate transport mechanism for transporting a flexible long substrate in a state of being supported by a part of a circumferential surface of a rotatable rolling element in the long direction;
    A mask holding mechanism having a mask pattern curved in a cylindrical shape with a predetermined radius, and holding a rotating mask rotatable around the axis of the cylinder;
    A transfer mechanism having an illumination system for irradiating illumination light to a part of the mask pattern formed on the rotary mask, and transferring a part of the mask pattern to the processing surface of the substrate;
    A magnetic gear that transmits a rotational force from a rotational drive source to each of the rolling elements and the rotary mask by a magnetic force so that a peripheral speed of the rotary mask and a conveying speed in the longitudinal direction of the substrate have a predetermined relationship. A transmission system;
    A substrate processing apparatus comprising:
18. The magnetic gear transmission system includes a first magnetic gear member provided coaxially with a rotation axis of the rotary mask;
    A second magnetic gear member provided coaxially with the rotation axis of the rolling element;
    A third magnetic gear member for transmitting a rotational force from the rotational drive source to each of the first magnetic gear member and the second magnetic gear member;
    A substrate processing apparatus according to claim 17.
19. 18. The substrate processing apparatus according to claim 17, wherein the transfer mechanism includes a movable mechanism that adjusts a distance between a rotation axis of the rolling element and a rotation axis of the rotary mask.
20. 19. The substrate processing apparatus according to claim 18, wherein the transfer mechanism includes a projection optical system that projects a mask pattern image of the rotating mask onto the substrate supported by a part of a circumferential surface of the rolling element.

Images