TWI611996B - Substrate processing apparatus - Google Patents

Abstract

The substrate processing apparatus of the present invention transports a long strip substrate (S) having flexibility in a long direction while being supported by a part of a circumferential surface of a rotatable rolling body (30), and will form The pattern on the peripheral surface of the rotatable rotating mask is repeatedly transferred to the processed surface of the substrate. The substrate processing apparatus includes a mask holding unit (MU1 to MU5) that supports the rotating light with respect to the rolling body in such a manner that a portion on the outer peripheral surface of the rotating mask is transferred with respect to the processed surface of the substrate at a specific interval A cover; and a magnetic gear transmission system (GD), which transmits the rotational force of one of the rolling body and the rotating photomask as the rotational force of the other by magnetic force.

Description

Substrate processing device

The present invention relates to a substrate processing apparatus.

This application claims priority based on US Patent Provisional Application No. 61 / 648,956, filed on May 18, 2012, and the contents are incorporated herein by reference.

In large-screen display elements such as liquid crystal display elements, a transparent electrode such as ITO (Indium Tin Oxides) or a semiconductor substance such as Si is deposited on a flat glass substrate, and then a metal material is vapor-deposited, and a photoresist is applied to the substrate. After the circuit pattern is printed, the photoresist is developed, and then a circuit pattern is formed by etching. However, with the enlargement of the display screen and the enlargement of the glass substrate, it is difficult to carry the substrate.

Therefore, it is proposed to form a display element on a flexible substrate (for example, a film member such as polyimide, PET (Polyethylene Terephthalate), metal foil, etc.), which is called A technology of a roll to roll method (hereinafter, simply referred to as a "roll method") (for example, refer to Patent Document 1).

Further, Patent Document 2 proposes a flexible long sheet (substrate) which is arranged close to the outer periphery of a rotatable cylindrical mask and is wound around a feed roller and moves. A technique for continuously exposing a pattern to a substrate.

[Prior technical literature] [Patent Literature]

[Patent Document 1] International Publication No. 2008/129819

[Patent Document 2] Japanese Publication No. 60-019037

However, the prior art described above has the following problems.

As a mechanism for synchronously moving the peripheral speed of the rotating photomask and the substrate feed speed (peripheral speed) at a specific ratio (for example, 1: 1), for example, a method using a gear to transmit a rotational force is considered. In this case, It is difficult to maintain the stability of the speed with high precision due to the vibration and abrasion of the gear meshing, so that it is driven synchronously, and it even adversely affects the accuracy (transfer fidelity) when transferring the pattern of the photomask to the substrate. Possibility.

For example, when a mask pattern to be transferred is formed on the periphery of a rotating mask with a diameter of 30 cm and about 90% of the entire circumference, the size of the mask pattern in the circumferential direction is about 85 cm (30 cm × π × 0.9). ). If the peripheral speed of the pattern surface (outer peripheral surface) of the rotating mask is set to 5 cm / sec, and the minimum size (line width, etc.) of the pattern to be transferred is set to 5 μm, the transfer time of the entire mask pattern is approximately At 17 seconds (85/5), the stability of the peripheral speed (constant velocity) during this period becomes important.

If the absolute value of the peripheral speed is changed by an average of 0.05%, a feed error of 2.5 μm will be generated every 1 second. If this is continued during the transfer time, the relative feed error of the mask pattern and the substrate will be about 43 μm at the maximum. This is an unacceptable situation when considering the case of overlapping exposures that take into account the minimum pattern size (5 μm).

In addition, when the speed unevenness (wow and flutter) of the vibration of the rotating photomask is ± 0.05%, a relative feed error of ± 2.5 μm / sec can be locally generated, so It will reduce the transfer fidelity of the smallest pattern size (5 μm).

An object of aspects of the present invention is to provide a substrate processing apparatus capable of driving a photomask and a substrate with high precision and synchronization.

According to an aspect of the present invention, there is provided a substrate processing apparatus in which a long substrate having flexibility is supported by a part of a circumferential surface of a rotatable rolling body A substrate processing apparatus that transfers a pattern in a long direction and transfers a pattern formed on a peripheral surface of a rotatable rotating photomask to a processed surface of a substrate repeatedly. The substrate processing device includes a photomask holding section for rotating the photomask. The portion of the outer peripheral surface that is related to the transfer and the processed surface of the substrate are arranged at a specific interval from the rolling body to support the rotating photomask; and a magnetic gear transmission system that separates one of the rolling body and the rotating photomask. Rotating force is transmitted as magnetic force of the other by magnetic force.

According to another aspect of the present invention, there is provided a substrate processing apparatus having a substrate transfer mechanism that supports a flexible long substrate in a state of being supported by a part of a circumferential surface of a rotatable rolling body at Conveying in a long direction; a mask holding mechanism having a mask pattern bent into a cylindrical shape with a specific radius and holding a rotating mask rotatable around a cylinder axis; a transfer mechanism having a pair of An illumination system that illuminates part of the mask pattern of the rotating photomask, and transfers part of the photomask pattern to the processed surface of the substrate; and a magnetic gear transmission system that transfers one of the rolling body and the rotating photomask. Rotating force is transmitted as magnetic force of the other by magnetic force.

In one aspect of the present invention, the photomask and the substrate can be synchronously driven with high accuracy, and the pattern of the photomask can be transferred to the substrate with high accuracy.

20‧‧‧Rotating Photomask

22‧‧‧Air cushion (gas supply department)

30‧‧‧rotating cylinder (rolling body)

40‧‧‧ Pass the Ministry of Liberation

100‧‧‧ substrate processing equipment

AX1A, AX1B‧‧‧‧Axis of rotation (1st rotation axis)

AX2‧‧‧rotation axis (second rotation axis)

MU, MU1 ~ MU5‧‧‧ Mask unit (mask holding unit)

GD‧‧‧ Magnetic Gear Transmission

SU‧‧‧ substrate holding unit

M‧‧‧Photomask

S, P‧‧‧ substrate

FIG. 1 is a schematic external perspective view of a substrate processing apparatus according to this embodiment.

FIG. 2 is a schematic external perspective view of a mask unit in a substrate processing apparatus.

3 is a cross-sectional view of the photomask unit cut along a plane including a rotation axis.

FIG. 4 is an enlarged view of part A in FIG. 3.

FIG. 5 is a diagram showing a servo system provided in a drive control section that controls the rotation of the rotary photomask.

Fig. 6 is a development view of a rotating photomask.

Fig. 7 is a development view of a substrate wound around a rotating drum.

FIG. 8 is a diagram illustrating the operation of the magnetic gear unit.

FIG. 9 is a schematic external perspective view of a substrate processing apparatus according to a second embodiment.

Fig. 10 is an enlarged view of a part of the fixing plate and the mask unit.

11 is a view in which the mask unit is cut in a plane including a rotation axis AX1B and a rotation axis AX2.

Fig. 12 is a schematic configuration diagram of a magnetic gear transmission mechanism according to a third embodiment.

Fig. 13 is a schematic configuration diagram of a magnetic gear transmission mechanism according to a third embodiment.

FIG. 14 is a diagram showing a configuration of a device manufacturing system.

Fig. 15 is a view showing another form of the magnetic gear transmission mechanism.

FIG. 16 is a diagram showing another embodiment of a substrate processing apparatus using the magnetic gear transmission mechanism of FIG. 15.

Hereinafter, an embodiment of a substrate processing apparatus according to the present invention will be described with reference to FIGS. 1 to 14.

(First Embodiment)

In the first embodiment, a case where a plurality of photomask patterns are superimposed on a substrate and transferred is described.

FIG. 1 is a schematic external perspective view of the substrate processing apparatus 100 of the first embodiment, FIG. 2 is a schematic external perspective view of the mask unit MU in the substrate processing apparatus 100, and FIG. 3 is a view including a rotation axis AX1A (AX1B) (First rotation axis) A cross-sectional view of the photomask unit MU cut by a plane, and FIG. 4 is an enlarged view of part A in FIG. 3.

The substrate processing apparatus 100 is a person who exposes a pattern of a mask M that is curved into a cylindrical shape with a specific radius to a flexible strip-shaped (long) substrate (for example, a strip-shaped film member) S. The lighting unit 10 (not shown in FIG. 1, see FIG. 3) and the mask unit MU1 MU5, the substrate holding unit SU, the magnetic gear transmission mechanism GD, and a control unit (not shown) are mainly constituted. In the following description, the mask units MU1 to MU5 are collectively referred to as a mask unit MU as appropriate.

In this embodiment, the vertical direction is set to the Z direction, and the rotation axes AX1A and AX1B of the mask units MU1 to MU5 and the direction parallel to the rotation axis AX2 of the substrate holding unit SU are set to the Y direction. The direction orthogonal to the Z direction and the Y direction will be described as the X direction.

The illuminating section 10 is a person who irradiates the illumination light to the illumination area of the rotating reticle 20 in the mask unit MU, and uses a straight tube type to radiate the illumination light for exposure in the same manner as a fluorescent lamp, or a cylindrical shape. Both sides of the quartz rod are led with illumination light and a diffusing member is provided on the back side, or LEDs arranged in the Y direction with a plurality of LEDs emitting light in the ultraviolet region with a wavelength of 400 nm or less are housed in a supporting rotating mask The inner space of the inner cylinder 21 of 20.

As the light source of the illumination light, for example, bright ultraviolet rays (g-line, h-line, i-line), KrF excimer laser light (wavelength 248 nm), and far-ultraviolet light (DUV (Deep Ultraviolet) light), such as ArF, are used. Solid-state light sources such as excimer laser light (wavelength 193 nm), semiconductor lasers, or LEDs.

Among the mask units MU1 to MU5, the mask units MU1 to MU3 are sequentially arranged along the rotation axis AX1A. Among the mask units MU1 to MU5, the mask units MU4 to MU5 are sequentially arranged along the rotation axis AX1B. Moreover, the mask unit MU4 is arrange | positioned in the middle position of the mask units MU1, MU2 with respect to the Y direction, and the mask unit MU5 is arrange | positioned in the middle position with respect to the Y direction in the mask units MU2, MU3.

The rotation axes AX1A and AX1B are arranged at fixed angular intervals around the rotation axis AX2 in the direction of, for example, 90 °.

Each of the mask units MU1 to MU5 includes, as shown in FIGS. 2 and 3, a rotary mask 20, an inner tube 21, an air cushion (mask holding portion) 22, a holder 23, a driving portion MT, and a flange portion 25. To both ends of the cylindrical rotating reticle 20, a ring-shaped holder 23 is fastened to form an integrated body. The status setting. A cylindrical inner tube 21 is inserted inside the rotating photomask 20 and the holder 23 in the direction of the rotation axis AX1A (or AX1B).

The rotary photomask 20 is formed of a cylindrical quartz or the like that can transmit illumination light, and a specific pattern is formed on the outer peripheral surface (peripheral surface) 20a thereof. In addition, the rotary reticle 20 is opposed to the inner tube by an air cushion 22 (a gas supply unit, which will be described in detail below) as a fluid bearing provided at an outer peripheral position of the inner tube 21 facing the inner peripheral surface of the rotary photomask 20. 21 is supported freely in a non-contact (or low friction state) direction in the direction of the rotation axis AX1A (or AX1B) and in the direction about the rotation axis AX1A (or AX1B).

The holder 23 is formed in a circular shape from a metal material, and as shown in FIG. 4, the outer peripheral surface and the inner peripheral surface of the end portion in the Y direction of the rotary mask 20 are clamped and supported.

The inner tube 21 is provided on a base portion (the main structure of the exposure device) (not shown), and both ends of the rotation axis AX1A (or AX1B) direction are rotatably supported by the flange portion 25 via air bearings 26.

The air cushion AP of a porous material provided on the outer peripheral surface of the flange portion 25 is arranged such that the pattern area of the outer peripheral surface 20 a of the rotary mask 20 and the processed surface of the substrate S shown in FIG. 1 are arranged at a specific interval. The substrate S wound around the rotating tube 30 supports the rotating photomask 20 and the inner tube 21. The ring-shaped air cushion AP is formed of a porous cushion that supplies (sprays) air as a gas between the outer peripheral surface and the substrate S, and thus can support the inner tube 21 and the rotating photomask 20 without contacting the surface of the substrate S. .

The porous air cushion AP is located on each outer peripheral surface of the flange portion 25 provided on both sides of the rotation axis AX1A (or AX1B) direction of the inner cylinder 21 over the entire circumference of the rotation axis AX1A (or AX1B) direction. It is provided around the rotation axis AX1A (or AX1B) in a certain interval.

The driving unit MT is each extended in the direction of rotation axis AX1A (or AX1B) (axis direction, Y direction) and the direction around the rotation axis AX1A (or AX1B) via the holder 23. A person who applies a thrust force in each direction to drive the rotary reticle 20 is provided with a pair on both sides of the rotation axis 20 in the direction of the rotation axis AX1A (or AX1B).

Each drive unit MT is configured by, for example, a voice coil type motor that independently applies thrust to the two-axis directions of the extension direction (axial direction) of the rotation axis AX1A (or AX1B) and the rotation axis AX1A (or AX1B). Magnet (permanent magnet) MG and coil body CU.

It should be noted that the thrust in the extension direction (axial direction) of the rotation axis AX1A (or AX1B) may be provided by only one of the pair of driving portions MT.

字狀之剖面形狀。 The surface of the magnet MG on the outer side of the holder 23 in the Y direction extends over the entire circumference around the rotation axis AX1A (or AX1B) direction and protrudes in the rotation axis AX1A (AX1B) direction. The coil body CU is integrally fixed to the flange portion 25 by a ring-shaped connecting portion 24 while maintaining a gap with respect to the outer peripheral surface of the inner cylinder 21, and has a radial direction centering on the rotation axis AX1A (AX1B). Hair magnet MG

Z-shaped cross-sectional shape.

Inside the ring-shaped connecting portion 24 shown in FIG. 2, as shown in detail in FIG. 4, magnets forming one magnetic gear portion GM1 of the magnetic gear transmission mechanism GD are arranged at a fixed pitch in the circumferential direction. The energization of the coil body CU is controlled by the drive control unit DC. In addition, the coil body CU does not necessarily need to be provided throughout the entire circumference, and a plurality of coil bodies CU may be provided at a specific interval in the circumferential direction (for example, a structure in which three locations are provided at 120 ° intervals).

The coil body CU is composed of a coil group for rotary thrust, which is provided between the flange portion 25 (connecting portion 24) and the rotating mask 20 (and the holder 23) about the rotation axis AX1A (or AX1B). ) Direction thrust (rotational torque); and coil groups for simultaneous thrust, which give a linear driving force to the extension direction (axis direction, Y direction) of the rotation axis AX1A, and each coil group is individually adjusted by the drive control section DC The magnitude of the current that is energized can independently control the rotary thrust and the parallel thrust.

In the configuration of the photomask unit MU as described above, the inner tube 21 is fixedly disposed with respect to the exposure device body, and the flange portion 25 (connecting portion 24) and the rotating photomask 20 are both opposed to the inner tube. 21 is freely supported in a non-contact (low friction) state around the rotation axis AX1A (AX1B).

In addition, the flange portion 25 is restrained by the bearing 26 so as not to move in the extending direction (axial direction, Y direction) of the rotation axis AX1A (AX1B) with respect to the inner cylinder 21. Therefore, by the simultaneous thrust of the driving portion MT, the rotary mask 20 moves slightly between the flange portions 25 on both sides in the extension direction (axial direction, Y direction) of the rotation axis AX1A (AX1B).

Furthermore, the flange portion 25 (and the coil body CU) is wound around the inner cylinder 21 at a specific rotation speed by a rotational torque imparted from the outside via a magnetic gear portion GM1 provided along the outer peripheral surface of the annular connection portion 24. Scroll (rotate).

At this time, if a specific current is simultaneously supplied to the coil group for the rotary thrust in the coil body CU, the rotary reticle 20 also rotates at a speed synchronized with the flange portion 25 (the connection portion 24) (with the same pace).

The magnitude and direction of the current flowing in the coil group for the rotary thrust are controlled by the drive control unit DC servo. The flange portion 25 (and the connecting portion 24 and the flange portion 25) can be rotated (rotated) through the magnetic gear transmission mechanism GD. The coil body CU) gives the rotational speed difference of the rotating photomask 20, or reverses the direction of relative rotation, or maintains the rotating photomask 20 in a stationary state.

In order to perform such servo control, in this embodiment, a servo system as shown in FIG. 5 is provided. FIG. 5 is a view of a part of the cut surface of FIG. 4 viewed in the YZ plane. For servo control, a grating scale GS2 for encoder measurement is formed on the outer periphery of the rotary mask 20 over the entire circumference. In order to read the grating scale, GS2, the encoder head EH2 is set, and the encoder head EH2 is set on the exposure device body.

In the drive control section DC, the following are provided: a counting circuit 201 that inputs a two-phase signal from the encoder head EH2 and successively measures the rotation angle position of the rotary reticle 20 (grating scale GS2); an arithmetic circuit 202 whose input comes from The measurement value of the counting circuit 201 is manufactured when the difference between the rotation speed of the rotary mask 20 and the rotation speed command value based on the command information 200 changes from a specific value (the reference value held in the memory section REF). Deviation signal Circuit 203, which uses the deviation signal as a drive signal to the coil group for rotary thrust in the coil body CU; and drive circuit 204, which gives the coil group drive signal for the parallel thrust in the coil body CU.

In the servo system of FIG. 5, when the flange portion 25 (the connecting portion 24) is rotated at a fixed rotation speed via the magnetic gear transmission mechanism GD, the rotating reticle 20 can be synchronously rotated based on this. However, the so-called synchronous rotation is not necessarily limited to the case where the rotation is performed at the same speed, and also includes the case where the rotation speed of the flange portion 25 and the rotation speed of the rotary mask 20 maintain a specific ratio.

In the servo system of FIG. 5, it is important that the peripheral speed of the mask pattern surface (outer peripheral surface 20 a) of the rotary mask 20 is exposed during exposure. If the peripheral speed deviates from a predetermined reference speed, it may be used. The driving circuit 203 gives a coil group driving signal for the rotational thrust in the coil body CU.

If handled in this way, even if the rotation speed of the flange portion 25 is different from the set speed, or speed unevenness occurs, the rotary mask 20 can be stably rotated at a fixed speed regardless of such an error. Furthermore, regardless of the rotation speed of the flange portion 25, the rotating photomask 20 can be rotated or stopped at an arbitrary set speed.

Furthermore, if the grating scale GS2 is set to a two-dimensional grating, the encoder head EH2 can also be used to measure the displacement in the Y direction (the extension directions (axial directions) of the rotation axes AX1A and AX1B), and the exposure device body ( The encoder head EH2) measures the position displacement in the Y direction of the rotary reticle 20 with high accuracy as a reference, and can simply constitute a servo system that provides a coil group drive signal to the parallel thrust in the coil body CU via the drive circuit 204.

On the other hand, as shown in FIG. 1, the substrate holding unit SU includes a rotating cylinder (rolling body) 30.

The rotating cylinder 30 is parallel to the Y axis and is formed into a cylindrical shape that rotates around a rotation axis AX2 provided on the −Z side of the rotation axis AX1B and on the + X side of the rotation axis AX1A. Make the outer peripheral surface of the rotating cylinder 30 It becomes the substrate holding surface 31 of the contact holding substrate S. On the two ends of the rotating cylinder 30 in the Y direction, protruding portions 32 having a diameter smaller than that of the rotating cylinder 30 and protruding coaxially are provided.

In this embodiment, as shown in FIG. 1, a driving device 33 for rotationally driving the rotary cylinder 30 is provided. The drive device 33 is controlled by the drive control unit DC.

FIG. 6 is a development view of the rotary photomask 20. A symbol Xs in FIG. 6 indicates a moving direction (rotating direction) of the rotary mask 20.

As shown in FIG. 6 (a), the illumination unit 10 in the mask units MU1 to MU3 is provided with an illumination region IR1 in the Y direction that illuminates the range of the pattern region MA of the rotary mask 20. Similarly, as shown in FIG. 6 (b), the illumination unit 10 in the mask units MU4 to MU5 includes an illumination region IR2 in the Y direction that illuminates the pattern formation region MA of the rotary mask 20.

Each of the illumination regions IR1 and IR2 is formed in a ladder shape having triangular portions at both ends in the Y direction. In the illumination areas IR1 and IR2, the directions of the above-mentioned triangular portions (that is, the positions of the short sides among a pair of parallel lines) are formed opposite to each other with respect to the X direction.

In this embodiment, the pattern forming area MA of the rotary mask 20 moves in the direction of the symbol Xs with the rotation of the mask holding portion 22 and passes through the illumination area IR1 (illumination area IR2). FIG. 7 is a developed view of the substrate S wound around the rotating drum 30. A symbol Xs in FIG. 7 indicates a moving direction (rotating direction) of the rotary cylinder 30.

As shown in FIG. 7, in the mask units MU1 to MU5, the transfer areas PA1 to PA5 illuminated by the illumination light (exposure light) from the pattern that passes through the rotating mask 20 are adjacent to each other in the Y direction. It is arranged in a staggered manner so as to overlap the end portion (the triangular portion of the trapezoid).

Therefore, for example, a region on the substrate S that passes through the transfer area PA1 by the rotation of the rotary drum 30 and a region on the substrate S that passes through the transfer area PA2 by the rotation of the rotary drum 30 overlap. The transfer area PA1 and the transfer area PA2 have their respective shapes and the like set such that the exposure amount in a region overlapping in the circumferential direction is substantially the same as the exposure amount in a region not overlapping.

The magnetic gear transmission mechanism GD uses the rotating force of the rotating cylinder 30 as the rotating light The rotation force of the cover 20 (connection portion 24) is transmitted non-contactly (using magnetic force), and includes a belt drive mechanism VD, and magnetic gear portions GM1 and GM2. As shown in FIG. 1, the belt drive mechanism VD has a configuration in which a belt VL is provided (provided in a state of tension) on the protrusions 32 and the pulleys PL1 and PL2 of the rotating cylinder 30.

The pulley PL1 is integrally provided on the -X side of the mask units MU1 to MU3 at an end portion of the -Y side of the shaft ST1 that is freely arranged in the Y direction and rotates about the axis. The pulley PL2 is integrally provided at an end portion on the -Y side of the shaft ST2 that is arranged freely in the Y direction and pivots about the axis, on the -X side of the mask units MU4 to MU5.

In the shaft ST1, as shown in FIG. 2, the disk-shaped magnetic gear portion GM2 and the magnetic gear portion GM1 are arranged at a position opposed to the magnetic gear portion GM1 of the annular connection portion 24.

As shown in FIG. 8, the magnetic gear portion GM2 includes S poles S2 and N poles N2 alternately around the shaft ST1 (shaft ST2) at a predetermined pitch and a predetermined circumference (two in FIG. 8 each). ) 'S magnetic pattern (permanent magnet). The magnetic gear section GM1 includes S poles S1 and N poles N1 alternately around the rotation axis AX1A (rotation axis AX1B) on the peripheral surface, and a plurality of them are arranged at the same pitch and the same circumference as the magnetic gear section GM2 (eight of each in FIG. 8 ) 'S magnetic pattern (permanent magnet).

The outer diameters of the protruding portion 32, the pulleys PL1, PL2, and the magnetic gear portions GM1 and GM2 of the rotating cylinder 30 are determined by the peripheral speed of the rotating reticle 20 (connecting portion 24) and the peripheral speed of the rotating cylinder 30 (conveyance of the substrate S). Speed) is set in approximately the same way.

The operation of the magnetic gear transmission mechanism GD in the substrate processing apparatus 100 configured as described above will be described. When the rotating cylinder 30 is rotated around the rotation axis AX2 (the second rotation axis) by the drive of the driving device 33, the pulleys PL1 and PL2 correspond to the ratio of the outer diameter of the protrusions 32 by the belt drive mechanism VD. The speeds rotate independently.

The rotation of the pulleys PL1 and PL2 is transmitted via the shafts ST1 and ST2, and each magnetic gear The part GM2 rotates. At this time, in the magnetic gear portion GM2, for example, as shown in FIG. 8 (a), when the magnetic gear portion GM1 and the S pole S2 face each other, the magnetic gear acts in the direction of mutual attraction, and the magnetic gear The N pole N1 of the part GM1 is opposed.

Further, if the magnetic gear portion GM2 is rotated clockwise in FIG. 8, for example, as shown in FIG. 8 (b), the S pole S2 that exerts a magnetic force acting in the direction of attraction with respect to the N pole N1 is far away, and relatively The N-pole N2, which acts as a magnetic force in the direction of repulsion of the N-pole N1, approaches, whereby these magnetic forces act as a traction force on the N-pole N1 of the magnetic gear part GM1. The magnetic gear part GM1 corresponds to the magnetic gear part GM2. It rotates at the speed of the outer diameter ratio (perimeter ratio).

Therefore, the rotary reticle 20 uses the rotational driving force provided by the driving part MT generated by the magnetizer MG and the coil body CU and the rotational driving force of the rotating cylinder 30 transmitted by the non-contact by the magnetic gear transmission mechanism GD, and It rotates synchronously about the rotation axis AX1A (rotation axis AX1B).

In this way, if the rotating cylinder 30 is rotated about the rotation axis AX2 by the driving of the driving device 33, the magnetic mask transmission mechanism GD rotates the rotation mask 20 in the mask units MU1 to MU3 about the rotation axis AX1A, and the light The rotating photomask 20 in the cover units MU4 to MU5 rotates about the rotation axis AX1B.

In addition, when the illumination light is radiated from the illuminating section 10, the pattern of the rotary mask 20 is illuminated from the inner peripheral side in the illumination region IR1 (illumination region IR2). The exposure light from each pattern in the mask units MU1 to MU3 is irradiated onto the transfer areas PA1 to PA5 on the substrate S, respectively.

Therefore, the respective patterns of the rotary mask 20 in the mask units MU1 to MU5 are connected to the substrate S in the width direction and transferred. Furthermore, the substrate S is continuously conveyed by the continuous rotation of the rotary photomask 20 and the continuous rotation of the rotary cylinder 30, whereby the pattern of the rotary photomask 20 is repeatedly transferred to the substrate S.

In the above exposure processing, or before or after the exposure processing, the calibration about the position around the rotation axis AX1A (rotation axis AX1B) direction and the rotation axis AX1A (rotation axis AX1B) direction of the rotary reticle 20, for example Proceed as follows: based on measurement As a result of the mask mark of the rotary reticle 20 and the substrate mark of the substrate S, the holder 23 and the rotary reticle 20 are rotated around the rotation axis AX1A by the energization control of the drive control section DC and the magnet MG of the drive section MT. (Rotation axis AX1B) direction or rotation axis AX1A (rotation axis AX1B) direction micro-movement.

As described above, in this embodiment, since the non-contact magnetic gear transmission mechanism GD transmits the rotation force of the rotating cylinder 30 as the rotation force of the rotation mask 20 via the non-contact driving unit MT, it is not Vibration or abrasion, noise, dust, etc. are generated when the rotational force is transmitted by contact such as gears, and high-precision synchronous driving can be realized. In particular, in the present embodiment, since the rotational force is transmitted through the magnetic gear portions GM1 and GM2, oiling and the like are not required, which can also contribute to improvement of work efficiency and cleaning.

In addition, in this embodiment, since the rotary mask 20 is rotatably held in a non-contact manner by the air cushion 22, the rotary mask 20 can be stably held.

Furthermore, in this embodiment, since a plurality of mask units MU1 to MU5 are arranged and the patterns set in the mask units MU1 to MU5 are connected on the substrate S in the width direction, a pattern with a large area can be formed.

In addition, in this embodiment, when the patterns are connected on the substrate S in the width direction, they are connected in a state where one part of each pattern overlaps with each other. Therefore, even if there is an error in the position of the pattern in the width direction, the pattern is transferred. In such a case, it is also possible to prevent a situation where there is a large difference from the exposure energy given to the non-repeating portion.

(Second Embodiment)

Next, a second embodiment of the substrate processing apparatus 100 will be described with reference to FIGS. 9 to 11. In the first embodiment described above, the configuration in which the rotational force of the rotary cylinder 30 is transmitted as the rotational force of the rotary photomask 20 via the belt drive mechanism VD is exemplified. However, in the present embodiment, the structure without the belt drive mechanism VD is used. Be explained.

In these drawings, the same constituent elements as those of the first embodiment shown in Figs. 1 to 8 are used. The same symbols are attached to the elements, and descriptions thereof are omitted.

The substrate processing apparatus 100 shown in FIG. 9 includes mask units MU1 to MU2 arranged along the rotation axis AX1A, a mask unit MU3 arranged along the rotation axis AX1B, a substrate holding unit SU, and a magnetic gear transmission mechanism GD (see FIG. 11). .

In this embodiment, three photomask units MU1 to MU3 are provided. As in the first embodiment, the patterns of the photomask units MU1 to MU3 are arranged in the width direction (Y direction) of the substrate S so that the ends overlap. The transfer mode on the substrate S is set in the state of connection, but the description is omitted.

The rotation axis AX1A is located on the -X side from the rotation axis AX2. The rotation axis AX2 is positioned on the + Z side with respect to the horizontal direction (XY plane) at an angle θ1, and the rotation axis AX1B is located on the + X side from the rotation axis AX2. The position about the rotation axis AX2 with respect to the horizontal direction (XY plane) is arranged on the + Z side and at a position θ 2.

The angles θ 1 and θ 2 are set to 45 degrees as an example. However, if the winding angle of the substrate S wound around the rotating drum 30 (the angle at which the substrate S is in close contact with the outer peripheral surface of the rotating drum 30) is ω °, A relationship of 180 °-(θ 1 + θ 2) <ω ° is sufficient.

The photomask units MU1 to MU2 are attached to a fixed plate 15A arranged on the -X side of the rotating cylinder 30 about an axis θ1 parallel to the axis of rotation AX1A, so as to be orthogonal to both the axis of rotation AX1A and the axis of rotation AX2 The direction of the line segment (hereinafter, simply referred to as the inter-axis direction) is provided so as to be separated and approached freely (freely moving).

Similarly, the mask unit MU3 is mounted on the fixed plate 15B arranged on the + X side of the rotating cylinder 30 around the axis parallel to the axis of rotation AX1B at an angle of inclination θ 2 so as to be in the direction of the axis between the axis of rotation AX1B and the axis of rotation AX2 Set up and move freely (close to move).

In addition, since the mask units MU1 to MU2 provided on the fixed plate 15A have the same configuration as the mask unit MU3 provided on the fixed plate 15B, the following description will be representative of the components provided on the fixed plate 15B. The mask unit MU3 will be described.

FIG. 10 is a partially enlarged view of the fixing plate 15B and the mask unit MU3.

As shown in FIG. 10, a stage portion 16 is provided on the fixed plate 15B, and it supports the photomask unit MU3 in the flange portion 27 to move freely in the Y direction and the above-mentioned axis direction.

The stage portion 16 moves in the Y direction along a Y guide plate 28Y provided in the Y direction. An inter-axis guide plate 28J is provided on the stage portion 16 and is provided in the inter-axis direction. In the mask unit MU3, the sliding portion 29 provided in the flange portion 27 is guided in the inter-axis direction by being guided by the inter-axis guide plate 28J.

In the vicinity of the sliding portion 29 provided at the side end of the flange portion 27, a slit 27a is formed over the range of the length of the sliding portion 29 in the inter-axis direction. The thickness of the wall between the slit 27a and the sliding portion 29 is set to a thickness that can elastically deform even when the own weight of the mask unit MU3 is applied.

11 is a cross-sectional view of the photomask unit MU3 cut along a plane including the rotation axis AX1B and the rotation axis AX2. As shown in FIG. 11, the mask unit MU3 includes a thrust bearing TB provided between the holder 23 and the flange portion 25 on the −Y side, and an ultrasonic motor 17: provided on the + Y side. Between the holder 23 and the flange portion 25.

The ultrasonic motor 17 is a person who adjusts the positions of the rotating photomask 20 and the magnetic gear portion GM1 around the rotation axis AX1B. The ultrasonic motor 17 includes a ring-shaped stator 17A fixed to the flange portion 25 and a ring-shaped rotor connected to the holder 23. 17B composition.

The rotor 17B does not rotate around the rotation axis AX1B with respect to the holder 23, but is movably coupled in the extension direction (axis direction) of the rotation axis AX1B, and contacts the stator 17A side with a specific applied force by a preload spring 18.

The flange portion 27 is fixed to both ends of the inner cylinder 21 and is provided. A radius obtained by adding the radius of the substrate holding surface 31 having the rotary cylinder 30 and the thickness of the substrate S to the surface facing the rotary cylinder 30 is provided. It is cut into an arc-shaped holding portion 34. Similarly to the air cushion AP shown in FIG. 3 or FIG. 4, the holding portion 34 is formed of a porous cushion that ejects air from a circular arc-shaped surface in a radial direction.

Inside the rotating cylinder 30, facing the magnetic gear part GM1 in the Y direction The magnetic gear portion GM2 is buried over the entire circumference on the same plane as the substrate holding surface 31.

The other structures are the same as those of the first embodiment.

In the substrate processing apparatus 100 configured as described above, the mask unit MU3 is supported in a state in which the weight of the component corresponding to the angle θ 2 of the self-weight of the mask unit MU3 is supported by the rotation by being wound around The substrate S on the surface of the cylinder 30 is applied to the rotating cylinder 30 side as a preload.

At this time, since the air is ejected from the holding portion 34, the photomask unit MU3 is supported on the substrate S in a non-contact manner in a state where a certain amount of distance (the distance between close exposures) is formed between the rotating photomask 20 and the substrate S.

In addition, due to manufacturing errors or setting errors of the sliding portion 29 and the inter-axis guide plate 28J, when the holding portion 34 is supported by the rotating tube 30 (substrate S), the positions of the holding portion 34 and the rotating tube 30 (substrate S) are deviated. In this case, the holding portion 34 and the rotating cylinder 30 may be supported in an unbalanced state.

In this case, the thin-walled portion between the slit 27a and the sliding portion 29 functions as a leaf spring, and by elastically deforming in a direction in which the partial load is eliminated, the holding portion 34 can be supported to rotate in a specific positional relationship. The surface of the barrel 30 (substrate S).

Here, in a case where one of the holding portions 34 (the flange portion 27) in the photomask units MU1 and MU3 is located on the rotating tube 30 which is biased to the outside from the substrate S, it is between the holding portion 34 and the other of the holding portions 34. A step difference in the thickness of the substrate S occurs, and the rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2 become non-parallel.

In this case, an interstitial sheet having the same thickness as the substrate S is attached to the substrate holding surface 31 of the rotary cylinder 30 opposite to the holding part 34 located on the outside, and is supported by the rotary cylinder 30 via the interstitial sheet. This can maintain the parallel state of the rotation axis AX1A (rotation axis AX1B) and the rotation axis AX2.

When the rotating cylinder 30 rotates about the rotation axis AX2, a magnetic gear is attached. The part GM2 rotates, and the rotational force is transmitted to the magnetic gear part GM1 non-contact by the traction force generated by the magnetic force.

The rotational force transmitted to the magnetic gear portion GM1 is transmitted to the rotary mask 20 through the flange portion 25, the ultrasonic motor 17, the retainer 23, and the thrust bearing TB. The rotary mask 20 in the mask units MU1 to MU2 around the rotation axis AX1A rotates synchronously, and the rotating photomask 20 in the photomask unit MU3 also rotates synchronously about the rotation axis AX1B.

In this configuration, in order to adjust the position (phase of the rotation direction) of the rotating mask 20 about the rotation axis AX1A (rotation axis AX1B) with respect to the substrate S, the vibration traveling wave in the circumferential direction of the stator 17A of the ultrasonic motor 17 is only required. Instead, the rotor 17B may be rotationally driven with respect to the stator 17A by a specific amount.

In addition, the position adjustment with respect to the direction of the rotation axis AX1A (rotation axis AX1B) of the rotary mask 20 of the substrate S may be performed by displacing the entire mask units MU1 to MU3 in the Y direction by the stage portion 16.

In addition, since the radius (curvature) of the holding portion 34 is set according to the thickness of the substrate S set in advance, when the thickness of the substrate S is changed, the distance between the substrate S and the holding portion 34 depends on the holding portion 34. The distance between the end portions (that is, the length of the chord forming the arc portion of the holding portion 34) is offset in the circumferential direction.

Therefore, the distance between the ends of the holding portion 34 is set in accordance with the variation range of the thickness of the substrate S and the allowable deviation of the pitch amount.

For example, if the radius of the substrate holding surface 31 of the rotary cylinder 30 is set to 125 mm, the variation range of the thickness of the substrate S is set to 100 μm, and the allowable deviation of the pitch amount is set to 3 μm, then the holding portion can be obtained by geometric calculation. The distance between the end portions of 34 is smaller than about 1/2 of the radius of the substrate holding surface 31, so that the thickness of the substrate S can be changed without changing the radius of the holding portion 34.

As described above, in this embodiment, in addition to obtaining the same function and effect as the first embodiment described above, since the magnetic gear portion GM2 is provided on the rotary cylinder 30, it is not necessary to separately External use of a belt-type drive mechanism and other devices can reduce the size and cost of the device.

Furthermore, since the cause of the error caused by the belt drive mechanism can be eliminated, the rotary photomask 20 and the rotary cylinder 30 can be driven in synchronization with higher accuracy.

(Third Embodiment)

Next, a third embodiment of the substrate processing apparatus 100 will be described with reference to FIGS. 12 and 13.

In the first embodiment described above, the rotation force of the rotating cylinder 30 is transmitted at any time as the rotation force of the rotating mask 20 by the belt drive mechanism VD in the magnetic gear transmission mechanism GD. However, in this embodiment, the The configuration of the transmission liberation unit that stops the transmission of the rotational force will be described.

In this figure, the same components as those in the first embodiment shown in FIGS. 1 to 8 are denoted by the same reference numerals, and descriptions thereof will be omitted.

As shown in FIG. 12, the magnetic gear transmission mechanism GD in this embodiment includes a belt drive mechanism VD and a transmission liberation unit 40.

The shaft ST1 (ST2) in the belt drive mechanism VD is provided with a contact portion 41 having a diameter larger than the shaft ST1 (ST2) and a shaft portion 42 having a diameter smaller than the contact portion 41. The contact portion 41 rotatably supports the inner peripheral side of the pulley PL1 (PL2) relatively via a bearing 43. A thruster support portion 45 is provided on the shaft portion 42 via a bearing 44.

The transmission and release section 40 includes a clutch section 46, a thruster 47, and a biasing spring 48.

The clutch portion 46 includes a cylindrical portion 46a having a diameter smaller than the through hole 39a formed in the end wall portion 39 of the pulley PL1 (PL2) and inserted into the shaft portion 42; a contact portion 46b provided in the cylindrical portion 46a and the contact portion 41 An end portion on the side opposite to the through hole 39a is formed; and a large diameter portion 46c is provided on an end of the barrel portion 46a on the side opposite to the thruster support portion 45 and is formed to have a larger diameter than the through hole 39a. .

In the large-diameter portion 46c, a tapered surface 49 is formed at a position facing the pusher 47, and the tapered surface 49 gradually inclines in a direction away from the pusher 47 along the length direction of the shaft portion 42 toward the outer diameter side.

The urging spring 48 is provided between the large-diameter portion 46c and the end wall portion 39 of the pulley PL1 (PL2) and applies the urging force to these directions of separation.

A pair of thrusters 47 is provided to sandwich the shaft portion 42, and a ball portion 47 a is provided at a position facing the tapered surface 49.

Further, each of the thrusters 47 approaches the transmission portion where the shaft portion 42 approaches the shaft portion 42 as shown in FIG. 12, and the ball portion 47 a engages with the tapered surface 49 as shown in FIG. 13, and the ball portion 47 a moves away from the shaft portion 42 as shown in FIG. 13. Move between the release positions where the engagement of face 49 is released.

When the pusher 47 is located at the transmission position, the contact portion 46 b of the clutch portion 46 contacts the contact portion 41 against the urging force of the urging spring 48.

In the magnetic gear transmission mechanism GD configured as described above, when the thruster 47 is moved to the transmission position and the contact portion 46b of the clutch portion 46 is in contact with the contact portion 41 as shown in FIG. 12, if the pulley PL1 (PL2) is When the rotational force of the rotating cylinder 30 is rotated via the conveyor belt VL, the large-diameter portion 46c is rotated by the frictional force accompanying the urging force of the urging spring 48, and the contact portion 41 is caused by friction between the contact portions 46b, 41 that are in contact with each other. Force while rotating.

Thereby, the magnetic gear portion GM2 is rotated via the shaft ST1 (ST2), whereby the rotational force of the rotating cylinder 30 is transmitted to the rotating photomask 20 via the magnetic gear portion GM1 shown in FIG. 2.

On the other hand, when the thruster 47 is moved to the released position and the contact portion 46b of the clutch portion 46 is separated from the contact portion 41 as shown in FIG. 13, the contact portions 46b and 41 are separated, whereby the shaft ST and the magnetic gear The part GM2 does not rotate. Therefore, the rotating force of the rotating cylinder 30 is not transmitted to the rotating mask 20.

Therefore, in a state where the pusher 47 is positioned at the transmission position, the rotating force of the rotary tube 30 is transmitted to the rotary photomask 20 to perform the above-mentioned exposure processing, and the rotary tube 30 can be stopped by positioning the pusher 47 at the release position. Transmission of rotational force with the rotating mask 20.

(Device Manufacturing System)

Next, a device manufacturing system including the substrate processing apparatus 100 will be described with reference to FIG. 14. Bright.

FIG. 14 is a diagram showing a configuration of a part of a device manufacturing system (flexible display manufacturing line) SYS. Here, it is shown that the flexible substrate P (sheet, film, ultra-thin glass sheet, etc.) drawn from the supply roller FR1 passes through the n processing devices U1, U2, U3, U4, U5, ... Un in this order, until An example of winding up on the recovery roll FR2.

The higher-level control device CONT controls the processing devices U1 to Un constituting the manufacturing line in a comprehensive manner. Here, the substrate S described in each of the previous embodiments is referred to as a substrate P.

In FIG. 14, the orthogonal coordinate system XYZ is set such that the front surface (or back surface) of the substrate P becomes perpendicular to the XZ surface and the width direction orthogonal to the transport direction (long direction) of the substrate P is set to the Y direction. . In addition, the substrate P may be modified by a specific pretreatment to activate the surface in advance, or a fine partition wall structure (concavo-convex structure) for precise patterning may be formed on the surface.

The substrate P wound around the supply roller FR1 is drawn out by the nip driving roller DR1 and transported to the processing device U1. The center of the substrate P in the Y direction (width direction) is relative to the target by the edge position controller EPC1. The way that the position falls within the range of about a dozen μm to a few tens of μm is servo controlled.

The processing device U1 continuously or selectively coats the photosensitive functional liquid (photoresist, photosensitive silane coupling material, UV (Ultraviolet), etc.) on the surface of the substrate P by the printing method with respect to the conveying direction (long direction) of the substrate P. , UV) curing resin solution, etc.) coating device.

In the processing device U1, an impression roller DR2 on which a substrate P is wound is provided, and an application roller, etc., which is located on the impression roller DR2 and is used to uniformly apply a photosensitive functional liquid on the surface of the substrate P is provided. A coating mechanism Gp1, a drying mechanism Gp2, etc. for quickly removing a solvent or moisture contained in the photosensitive functional liquid applied on the substrate P.

The processing device U2 is used to heat the substrate P transferred from the processing device U1 to a specific temperature (for example, about 10 to 120 ° C), so as to make the photosensitive function coated on the surface Layer stable heating device.

In the processing device U2, a plurality of rollers and emptying rods for folding back the substrate P and carrying it, a heating chamber portion HA1 for heating the substrate P carried in, and a temperature for heating the substrate P to The cooling chamber portion HA2, which is lowered in a manner consistent with the ambient temperature in the subsequent step (processing device U3), the driving roller DR3, etc., which are held.

The processing device U3 as the substrate processing device 100 is an exposure device that irradiates the photosensitive functional layer of the substrate P (substrate S) transferred from the processing device U2 with patterned light corresponding to ultraviolet rays of a circuit pattern or wiring pattern for a display.

In the processing device U3, an edge position controller EPC that controls the center of the Y direction (width direction) of the substrate P to a fixed position, a driving roller DR4 that is clamped, and the substrate P is partially rolled by a specific tension. Around the pattern exposure on the substrate P, the rotating cylinder DR5 (rotating cylinder 30) with the same cylindrical surface is supported, and the two sets of driving rollers are used to give the substrate P a specific degree of relaxation (margin) DL. DR6, DR7, etc.

Furthermore, a transmissive cylindrical mask DM (mask unit MU) and an illumination unit IU (lighting unit 10) are provided in the processing device U3, and are formed in the cylindrical mask DM to illuminate the cylinder. Photomask pattern on the outer surface of the photomask DM; and alignment microscopes AM1 and AM2, which are used to place a photomask of the cylindrical photomask DM on a portion of the substrate P that is supported by a cylindrical tube DR5 by a rotating tube DR5 An image of a part of the pattern is relatively aligned (aligned) with the substrate P, and an alignment mark or the like formed in advance on the substrate P is detected.

The processing device U4 is a wet processing device that performs wet development processing, electroless plating processing, and the like on the photosensitive functional layer of the substrate P transferred from the processing device U3. In the processing device U4, three processing tanks BT1, BT2, and BT3, which are layered in the Z direction, a plurality of rollers that bend and transport the substrate P, and a driving roller DR8 that is held are provided.

The processing device U5 is a heating and drying device that warms the substrate P transferred from the processing device U4 to adjust the moisture content of the substrate P that has been wetted by the wet process to a specific value. Set, but detailed description is omitted.

Thereafter, after passing through several processing apparatuses, the substrate P passing through the last processing apparatus Un of the series of processes is wound up on the recovery roll FR2 through the nip driving roller DR1. During the rolling, the center of the Y direction (width direction) of the substrate P or the substrate end in the Y direction is not dispersed in the Y direction, and the edge position controller EPC2 is used to sequentially correct and control the driving roller DR1 and the recovery roller FR2. Relative position in the Y direction.

In the device manufacturing system SYS, since the substrate processing apparatus 100 is used as the processing apparatus U3, no vibration or abrasion, noise, dust, etc. are generated when the rotational force is transmitted by contact of a gear or the like, and high-precision synchronous driving can be achieved. The relatively large size mask pattern is faithfully transferred to the substrate. Therefore, it is possible to manufacture devices with higher definition display panels, electronic circuits, and the like.

The preferred embodiment of the present invention has been described above with reference to the accompanying drawings, but the present invention is not limited to this example. The shapes and combinations of the constituent members shown in the above examples are examples, and various changes can be made in accordance with design requirements and the like without departing from the spirit of the present invention.

For example, in the said embodiment, although the structure where the rotation axes of the magnetic gear parts GM1 and GM2 are mutually parallel was illustrated, it is not limited to this. As the transmission form of the magnetic gear, as shown in FIG. 15, even if it is arranged close to the outer peripheral surface of the first magnetic gear GMa that can rotate around a rotation axis parallel to the Z axis, it can be rotated around a rotation axis parallel to the Y axis. In the case of the second magnetic gear GMb on the outer peripheral surface, a rotational force can also be transmitted between the two magnetic gears GMa and GMb.

As described above, the magnetic gear transmission mechanism in which rotation axes are arranged in mutually orthogonal directions is described in, for example, Japanese Republication Publication No. WO2007-10780 (EP1906054A1) and the like.

Therefore, when a magnetic gear transmission mechanism capable of converting a rotational force to 90 degrees is used, for example, it may be configured as shown in FIG. The magnetic gear part GM1A is provided with a magnetic gear part GM1B on the outer peripheral surface of the rotating cylinder 30, and an axis ST1 (ST2) extending in a direction orthogonal to the rotation axes of the magnetic gear part GM1A and the magnetic gear part GM1B is used as the rotation axis. The magnetic gear portion GM2 is provided close to the magnetic gear portions GM1A and GM1B.

In this case, the magnetic gear portion GM1A corresponds to the first magnetic pattern portion, the magnetic gear portion GM1B corresponds to the second magnetic pattern portion, and the magnetic gear portion GM2 provided on the shaft ST1 (ST2) corresponds to the third magnetic pattern portion.

With this configuration, the distance between the rotary mask 20 and the rotary cylinder 30 can be enlarged by the extension axis ST1 (ST2), so that an image of the pattern of the rotary mask 20 can be provided to be projected on the winding A projection optical system and the like on the substrate of the barrel 30.

In the second embodiment described above, the configuration in which the inclination angles of the fixing plates 15A and 15B supporting the photomask units MU1 to MU3 are set to be fixed is not limited to this. For example, an adjustment fixing plate 15A, 15B angle adjustment device. In this configuration, the weight of the mask units MU1 to MU3 can be adjusted as a preload to the weight of the rotating cylinder 30 according to the inclination angles of the fixed plates 15A and 15B.

Furthermore, in the above-mentioned embodiment, a structure in which a predetermined distance is formed between the rotary mask 20 and the substrate S when the holding portion 34 is supported by the rotating tube 30 is adopted. For example, the following configuration may be adopted: the holding portion 34 is not provided. A driving device for independently driving the photomask units MU1 to MU3 with respect to the rotating cylinder 30 is provided, and the light is adjusted by a driving source such as a piezoelectric actuator according to the distance between the photomask 20 and the substrate S. Positions of the cover units MU1 to MU3 in the respective inter-axis directions.

Moreover, in the said embodiment, although it is set as the structure which forms a pattern on the rotating mask 20, it is not limited to this, It is good also as a sheet-shaped mask with a pattern wound on a transparent cylinder (uniform wall) Thick quartz tube, etc.).

In the previous FIG. 1 or FIG. 16, it is set between the rotating mask 20 and the rotating cylinder 30. The magnetic driving gear is used to transmit the rotational driving force to each other. For example, in FIG. 16, the shaft ST1 (ST2) may be connected to a rotary motor (rotary driving source) as a driving source.

In this case, the rotational torque of the two magnetic gear portions GM2 provided on the shaft ST1 (ST2) is transmitted to the magnetic gear portion GM1A (rotating reticle 20) which is opposed to one magnetic gear portion GM2 in a non-contact manner and to the other The magnetic gear part GM2 is a non-contact magnetic gear part GM1B (rotating cylinder 30), and the peripheral speed of the pattern surface (cylindrical surface) of the rotary reticle 20 and the conveying speed of the substrate S are set to a specific speed relationship (synchronous speed ).

30‧‧‧rotating cylinder (rolling body)

31‧‧‧ substrate holding surface

32‧‧‧ protrusion

33‧‧‧Drive

AX1A, AX1B‧‧‧‧Axis of rotation (1st rotation axis)

AX2‧‧‧rotation axis (second rotation axis)

MU1 ~ MU5 ‧‧‧ Mask unit (mask holding unit)

ST1, ST2‧‧‧axis

GM2‧‧‧ Magnetic Gear

PL1, PL2‧‧‧ pulley

VD‧‧‧Belt drive mechanism

GD‧‧‧ Magnetic Gear Transmission

SU‧‧‧ substrate holding unit

VL‧‧‧ Conveyor

S‧‧‧ substrate

Claims (15)

A substrate processing apparatus is configured to carry a flexible long substrate in a state of being supported by a part of a circumferential surface of a rotatable rolling body in the above-mentioned long direction, and form the rotatable rotation The pattern of the peripheral surface of the photomask is repeatedly transferred to the surface to be processed of the substrate; it includes a photomask holding portion that uses the portion on the outer peripheral surface of the rotating photomask to be transferred and the surface of the substrate to be processed. A specific spaced-apart arrangement can support the rotary photomask with respect to the rolling body around the first rotation axis as a center; and a gas supply unit configured to supply gas to the gas between the substrate and the photomask holding unit. The ejection portion uses a porous member; a transmission mechanism that transmits the rotational force of one of the rolling elements and the rotary photomask as the rotational force of the other by a magnetic force. For example, the substrate processing apparatus according to the first patent application range, wherein the mask holding portion has a cylindrical portion, and the rotating mask is rotatably held with respect to the cylindrical portion. For example, the substrate processing device of the first or second scope of the patent application, wherein the rotating photomask has a magnetic pattern as part of the transmission mechanism. For example, the substrate processing apparatus of the third scope of the application, wherein the rolling element has a magnetic pattern as a part of the transmission mechanism. For example, the substrate processing device of the first or second scope of the patent application, wherein the transmission mechanism has a magnetic pattern that synchronously rotates the rolling body and the rotating photomask. For example, the substrate processing apparatus of the scope of patent application, wherein the transmission mechanism has a transmission to stop the rotation between the rolling body and the rotating photomask. Passed to the Ministry of Liberation. For example, the substrate processing apparatus of the first patent application range, wherein the photomask holding portion is configured to hold a plurality of the rotating photomasks in a direction of the first rotation axis, and the plurality of rotating photomasks are used for When the respective patterns are transferred to the processing surface of the substrate, the patterns are arranged so as to be connected in the width direction of the substrate. For example, the substrate processing device of the ninth scope of the patent application, wherein the plurality of rotating photomasks are connected in a width direction of the substrate and transferred to the surface to be processed in a state where one part of each of the patterns overlaps each other. It is arranged on the mask holding portion. For example, the substrate processing apparatus according to the seventh aspect of the patent application, wherein the plurality of rotating photomasks are held on the photomask holding portion in a staggered arrangement in a width direction of the substrate. For example, the substrate processing apparatus of the seventh scope of the patent application, wherein the rolling body is arranged to be rotatable about a second rotation axis parallel to the first rotation axis; and each of the first rotation axes of the plurality of rotating photomasks is provided. It is arrange | positioned so that the said 2nd rotation axis | shaft located around the said rolling body may be separated from a predetermined angle. For example, the substrate processing apparatus according to any one of the scope of claims 1 and 7, wherein the rotating photomask is a transmissive photomask; the photomask holding portion has an illuminating device that illuminates a pattern of the rotating photomask. For example, the substrate processing apparatus according to any one of claims 1 and 7, wherein the photomask holding portion includes a driving device that moves the rotary photomask in a direction parallel to the direction of the first rotation axis. A substrate processing apparatus includes a substrate conveying mechanism that will have a flexible long substrate The plate is transported in the above-mentioned long direction in a state of being supported by a part of the circumferential surface of the rolling body rotatable around the rotation axis; the photomask holding mechanism holds a rotation axis arranged parallel to the rotation axis of the rolling body And a rotatable rotating photomask that is curved into a cylindrical photomask pattern with a specific radius from the rotation axis; a transfer mechanism having illumination for illuminating a part of the photomask pattern formed on the rotating photomask System, and transferring a part of the photomask pattern to the processed surface of the substrate; and a movable mechanism that adjusts the interval between the rotation axis of the rolling body and the rotation axis of the rotary mask; a transmission mechanism that uses the rotating light The peripheral speed of the cover and the conveying speed in the strip direction of the substrate have a specific relationship, so that the rotational force of the self-rotation driving source is magnetically transmitted to each of the rolling body and the rotating photomask. For example, the substrate processing apparatus according to item 13 of the patent application, wherein the transmission mechanism includes: a first magnetic gear member provided coaxially with the rotation axis of the rotary photomask; and a second magnetic gear member rotated with the rolling body. The axis is provided coaxially; and a third magnetic gear member that transmits a rotational force from the rotary driving source to each of the first magnetic gear member and the second magnetic gear member. For example, the substrate processing apparatus of claim 14 in which the transfer mechanism is provided with a projection optical system that projects an image of the mask pattern of the rotating mask onto the substrate supported by a part of the circumferential surface of the rolling body .