WO2013099657A1 - Glass substrate for information recording medium and method for producing same - Google Patents

Glass substrate for information recording medium and method for producing same Download PDF

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Publication number
WO2013099657A1
WO2013099657A1 PCT/JP2012/082488 JP2012082488W WO2013099657A1 WO 2013099657 A1 WO2013099657 A1 WO 2013099657A1 JP 2012082488 W JP2012082488 W JP 2012082488W WO 2013099657 A1 WO2013099657 A1 WO 2013099657A1
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WO
WIPO (PCT)
Prior art keywords
brush
polishing
information recording
glass substrate
peripheral end
Prior art date
Application number
PCT/JP2012/082488
Other languages
French (fr)
Japanese (ja)
Inventor
小松　隆史
Original Assignee
コニカミノルタ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Priority to CN201280062603.3A priority Critical patent/CN104160445B/en
Priority to JP2013551615A priority patent/JP6215709B2/en
Publication of WO2013099657A1 publication Critical patent/WO2013099657A1/en

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • the present invention relates to a glass substrate for information recording media and a method for manufacturing the same, and in particular, a glass substrate for information recording media mounted as part of an information recording medium in an information recording device such as a hard disk drive (HDD), and It relates to the manufacturing method.
  • HDD hard disk drive
  • An information recording medium (magnetic disk) is mounted inside an information recording device such as a hard disk drive.
  • the information recording medium is manufactured by forming a magnetic recording layer for magnetic recording on the main surface of a disk-shaped glass substrate having a hole in the center.
  • a glass substrate used for manufacturing an information recording medium is referred to as an information recording medium glass substrate (hereinafter also simply referred to as a glass substrate).
  • a method for manufacturing a glass substrate for an information recording medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 2007-098484 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2007-245319 (Patent Document 2).
  • the inner peripheral end surface of a glass substrate is ground by grinding and then polished with a polishing slurry and a polishing brush. From the standpoint of improving production efficiency and the like, when performing polishing on the inner peripheral end surface of the glass base plate, the glass base plate is batch-polished in a state where a plurality of glass base plates are stacked. Sometimes.
  • the present invention provides a glass substrate for an information recording medium in which inner peripheral end surfaces of a plurality of glass base plates are polished more smoothly even when batch-polishing a plurality of glass base plates, and a method for manufacturing the same The purpose is to provide.
  • the method for manufacturing a glass substrate for information recording medium includes a step of preparing a plurality of glass base plates having an inner peripheral end surface, and a bristles made of a plurality of brush bristle members are outer peripheral surfaces of a shaft member.
  • a step of preparing a polishing brush planted in a spiral shape, and a plurality of the glass base plates, and then the inner peripheral end surfaces of the glass base plates and the brush bristles in a stacked state The step of disposing the polishing brush so that the front ends of the bundle face each other, and the polishing brush is rotated, and the inner peripheral end surfaces of the plurality of glass base plates in a stacked state Polishing the inner peripheral end face of the plurality of glass base plates by sliding a brush bristle bundle, and in a direction parallel to the rotation axis of the polishing brush, a plurality of the above
  • the brush bristle is a plurality of the above
  • the width of the region formed by the tips of each of the plurality of brush hairs extending from the planting base is smaller than the width of the planting base where the brush hair material is planted on the shaft member. Further, it is planted on the shaft member.
  • the plurality of brush bristle members have 95% or more of the plurality of brush bristle tips at the surface of the shaft member.
  • the shaft center member is planted so as to be located within a range of ⁇ 40% with respect to the center line in the width direction of the planting base extending in a direction perpendicular to the vertical direction.
  • the plurality of brush bristle materials are planted on the shaft member so that the tips of the bristle bundles have an arc shape. Yes.
  • the glass substrate for information recording medium based on the present invention is manufactured using the above-described method for manufacturing a glass substrate for information recording medium based on the present invention.
  • the glass substrate for an information recording medium in which inner peripheral end surfaces of the plurality of glass base plates are polished more smoothly even when a plurality of glass base plates are subjected to a batch polishing process, the glass substrate for an information recording medium in which inner peripheral end surfaces of the plurality of glass base plates are polished more smoothly, and A manufacturing method can be obtained.
  • FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2. It is a top view which shows the information recording medium provided with the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment.
  • FIG. 5 is a cross-sectional view taken along line VV in FIG. 4. It is a flowchart which shows the manufacturing method of the glass substrate for information recording media in embodiment.
  • FIG. 1 is a perspective view showing the information recording apparatus 30.
  • the information recording apparatus 30 includes the glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium (hereinafter also simply referred to as a glass substrate) in the embodiment as the information recording medium 10.
  • the information recording device 30 includes an information recording medium 10, a housing 20, a head slider 21, a suspension 22, an arm 23, a vertical shaft 24, a voice coil 25, a voice coil motor 26, a clamp member 27, and a fixing screw. 28.
  • a spindle motor (not shown) is installed on the upper surface of the housing 20.
  • An information recording medium 10 such as a magnetic disk is rotatably fixed to the spindle motor by a clamp member 27 and a fixing screw 28.
  • the information recording medium 10 is rotationally driven by this spindle motor at, for example, several thousand rpm.
  • a chemically strengthened layer 12 see FIG. 5
  • a magnetic recording layer 14 see FIGS. 4 and 5 are formed on the glass substrate 1. To be manufactured.
  • the arm 23 is attached so as to be swingable around the vertical axis 24.
  • a suspension 22 formed in a leaf spring (cantilever) shape is attached to the tip of the arm 23.
  • a head slider 21 is attached to the tip of the suspension 22 so as to sandwich the information recording medium 10.
  • a voice coil 25 is attached to the opposite side of the arm 23 from the head slider 21.
  • the voice coil 25 is clamped by a magnet (not shown) provided on the housing 20.
  • a voice coil motor 26 is constituted by the voice coil 25 and the magnet.
  • a predetermined current is supplied to the voice coil 25.
  • the arm 23 swings around the vertical axis 24 by the action of electromagnetic force generated by the current flowing through the voice coil 25 and the magnetic field of the magnet.
  • the suspension 22 and the head slider 21 also swing in the direction of the arrow AR1.
  • the head slider 21 reciprocates on the front and back surfaces of the information recording medium 10 in the radial direction of the information recording medium 10.
  • a magnetic head (not shown) provided on the head slider 21 performs a seek operation.
  • the head slider 21 While the seek operation is performed, the head slider 21 receives a levitation force due to the air flow generated as the information recording medium 10 rotates. Due to the balance between the levitation force and the elastic force (pressing force) of the suspension 22, the head slider 21 travels with a constant flying height with respect to the surface of the information recording medium 10. By the traveling, the magnetic head provided on the head slider 21 can record and reproduce information (data) on a predetermined track in the information recording medium 10.
  • the information recording apparatus 30 on which the glass substrate 1 is mounted as a part of the members constituting the information recording medium 10 is configured as described above.
  • FIG. 2 is a plan view showing glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium according to the present embodiment.
  • 3 is a cross-sectional view taken along the line III-III in FIG.
  • the glass substrate 1 (glass substrate for information recording medium) used as a part of the information recording medium 10 (see FIGS. 4 and 5) has a main surface 2, a main surface 3, It has the inner peripheral end surface 4, the hole 5, and the outer peripheral end surface 6, and is formed in a disk shape as a whole.
  • the hole 5 is provided so as to penetrate from one main surface 2 toward the other main surface 3.
  • a chamfer 7 is formed between the main surface 2 and the inner peripheral end surface 4 and between the main surface 3 and the inner peripheral end surface 4.
  • a chamfered portion 8 (chamfer portion) is formed between the main surface 2 and the outer peripheral end surface 6 and between the main surface 3 and the outer peripheral end surface 6, a chamfered portion 8 (chamfer portion) is formed.
  • the size of the glass substrate 1 is, for example, 0.8 inch, 1.0 inch, 1.8 inch, 2.5 inch, or 3.5 inch.
  • the thickness of the glass substrate is, for example, 0.30 mm to 2.2 mm from the viewpoint of preventing breakage.
  • the glass substrate has an outer diameter of about 64 mm, an inner diameter of about 20 mm, and a thickness of about 0.8 mm.
  • the thickness of the glass substrate is a value calculated by averaging the values measured at a plurality of arbitrary points to be pointed on the glass substrate.
  • FIG. 4 is a plan view showing an information recording medium 10 provided with a glass substrate 1 as an information recording medium.
  • FIG. 5 is a cross-sectional view taken along the line VV in FIG.
  • the information recording medium 10 includes a glass substrate 1, a chemical strengthening layer 12, and a magnetic recording layer 14.
  • Chemical strengthening layer 12 is formed to cover main surfaces 2 and 3, inner peripheral end surface 4, and outer peripheral end surface 6 of glass substrate 1.
  • the magnetic recording layer 14 is formed so as to cover a predetermined region on the main surfaces 2 and 3 of the chemical strengthening layer 12.
  • a hole 15 is formed inside the inner peripheral end face 4.
  • the information recording medium 10 is fixed to a spindle motor provided on the housing 20 (see FIG. 1) using the holes 15.
  • the magnetic recording layer 14 is formed on both (both sides) the chemical strengthening layer 12 formed on the main surface 2 and the chemical strengthening layer 12 formed on the main surface 3. Is formed.
  • the magnetic recording layer 14 may be provided only on the chemical strengthening layer 12 (one side) formed on the main surface 2, or on the chemical strengthening layer 12 (one side) formed on the main surface 3. It may be provided.
  • the magnetic recording layer 14 is formed by spin-coating a thermosetting resin in which magnetic particles are dispersed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1 (spin coating method).
  • the magnetic recording layer 14 may be formed by a sputtering method or an electroless plating method performed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1.
  • the thickness of the magnetic recording layer 14 is about 0.3 ⁇ m to 1.2 ⁇ m for the spin coating method, about 0.04 ⁇ m to 0.08 ⁇ m for the sputtering method, and about 0.05 ⁇ m to about the electroless plating method. 0.1 ⁇ m. From the viewpoint of thinning and high density, the magnetic recording layer 14 is preferably formed by sputtering or electroless plating.
  • a Co-based alloy or the like containing Ni or Cr as a main component is added for the purpose of adjusting the residual magnetic flux density. Is preferably used.
  • the surface of the magnetic recording layer 14 may be thinly coated with a lubricant.
  • a lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon.
  • the magnetic recording layer 14 may be provided with a base layer or a protective layer as necessary.
  • the underlayer in the information recording medium 10 is selected according to the type of magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
  • the underlayer provided on the magnetic recording layer 14 is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked.
  • a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.
  • Examples of the protective layer for preventing wear and corrosion of the magnetic recording layer 14 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus together with the underlayer and the magnetic film. These protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.
  • Another protective layer may be formed on the protective layer or instead of the protective layer.
  • tetraalkoxylane is diluted with an alcohol-based solvent on a Cr layer, and then colloidal silica fine particles are dispersed and applied, followed by baking to form a silicon oxide (SiO 2 ) layer. It may be formed.
  • the glass substrate manufacturing method (S100) in the present embodiment includes a glass base plate preparation step (S10), an alumina polishing step (S20), a coring step (S30), an end surface grinding step (S40), and an end surface polishing step ( S50), a lapping process (S60), a polishing process (S70), and a chemical strengthening process (S80).
  • a magnetic recording layer deposition step (S200) is performed on the glass substrate obtained through the chemical strengthening step (S80).
  • the information recording medium 10 (see FIGS. 4 and 5) is obtained through the magnetic recording layer deposition step (S200).
  • the details of the steps S10 to S80 constituting the glass substrate manufacturing method (S100) will be described in order. In the following description, the simple cleaning appropriately performed between the steps S10 to S80 will be described in detail. It may not be listed.
  • a predetermined number of substantially disk-shaped glass base plates constituting the glass substrate are prepared.
  • the glass base plate can be obtained, for example, by directly pressing molten glass using an upper mold, a lower mold, and a body mold.
  • a disk-shaped glass base plate may be obtained by cutting out with a grinding wheel from a sheet glass formed by using a downdraw method or a float method.
  • alumina polishing is performed on a predetermined number of glass base plates.
  • the purpose of this alumina polishing treatment is to improve dimensional accuracy and shape accuracy.
  • the alumina polishing process is performed using a lapping apparatus. By using alumina abrasive grains of particle size # 400, setting the load to about 100 kg and rotating the inner and outer rotation gears, both main surfaces of the glass base plate housed in the carrier are polished.
  • the inner peripheral end face and the outer peripheral end face of a predetermined number of glass base plates are ground using a grinding wheel, and further, a predetermined chamfering process is performed on the inner peripheral end face and the outer peripheral end face.
  • a predetermined chamfering process is performed on the inner peripheral end face and the outer peripheral end face.
  • the inner peripheral end surface 4 of the glass base plate 1 is ground into a predetermined shape having a chamfered portion 7
  • the outer peripheral end surface 6 of the glass base plate 1 is ground into a predetermined shape having a chamfered portion 8. Is done.
  • the end surface polishing step (S50) includes an inner peripheral end surface polishing step (S51) and an outer peripheral end surface polishing step (S52).
  • a polishing brush 80 (abrasive member) is used in the inner peripheral end surface polishing step (S51).
  • the polishing brush 80 is configured by a brush bristle bundle 81 made of a plurality of brush bristle materials being spirally planted on the outer peripheral surface of a cylindrical shaft center member 82. A further detailed configuration of the polishing brush 80 will be described later with reference to FIGS. 9 and 10.
  • the glass base plate 1 on which the inner peripheral end face 4 and the outer peripheral end face have been ground was overlapped in a block shape (block body 9), for example, 400 pieces each as shown in FIG. 8. In a state, it is fixed using a predetermined fixing jig (not shown). A spacer or the like may be provided between the adjacent glass base plates 1.
  • the polishing brush After the plurality of glass base plates 1 are positioned and fixed, the polishing brush so that the inner peripheral end surfaces 4 of the plurality of glass base plates 1 in a stacked state and the tips of the brush bristle bundles 81 face each other. 80 is arranged inside the inner peripheral end face 4. In this state, the polishing brush 80 is rotated, and the brush bristle bundle 81 is slid with respect to the inner peripheral end surfaces 4 of the plurality of glass base plates 1 in a stacked state. The inner peripheral end face 4 is polished.
  • the polishing brush 80 used in the inner peripheral end face polishing step (S51) in the present embodiment is configured as follows.
  • the brush bristle bundle 81 of the polishing brush 80 includes a plurality of brush bristle materials 83 and 83.
  • the plurality of brush bristle materials 83, 83 are arranged on the planting base R1 in which the plurality of brush bristle materials 83, 83 are planted on the shaft center member 82.
  • the shaft center member 82 is planted so that the width W2 of the region R2 formed by the tips of each of the plurality of brush bristle materials 83, 83 extending from the planting base R1 is smaller than the width W1. Yes.
  • the plurality of brush bristle materials 83, 83 have a tip of the brush bristle material 83, 83 of 95% or more of the plural brush bristle members. Ranges Q and Q within ⁇ 40% with respect to the center line 81C in the width direction of the planting base R1 extending in a direction perpendicular to the surface of the core member 82 (ranges when projected in a direction parallel to the center line 81C) It is good to be planted in the shaft center member 82 so that it may be located in the inside.
  • each of a plurality of brush bristle materials 83, 83 is used.
  • the bristles contact the inner peripheral end surface 4 and the chamfered portion 7 of the glass base plate 1.
  • the bristles of each of the plurality of brush bristle materials 83, 83 are in contact with the inner peripheral end face 4 and the chamfered portion 7 of the glass base plate 1, they are concentrated in a narrow range, and the chamfered portions of the adjacent glass base plates 1. It becomes possible to apply a heavy load periodically between the sevens. Thereby, the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1 is effectively removed, and a good processing rate for the chamfered portion 7 is obtained. It is possible to secure.
  • a plurality of brush bristle materials 83, 83 are planted so as to stand vertically with respect to the surface of the shaft center member 82. At the same time, they are arranged with substantially equal intervals.
  • brush bristle material 83 of polishing brush 80Z has an inner periphery. By abutting against the end face 4 and the chamfered portion 7, it spreads outward.
  • the bristles of each of the plurality of brush bristle materials 83 and 83 do not concentrate in a narrow range when contacting the inner peripheral end surface 4 and the chamfered portion 7 of the glass base plate 1.
  • a constant weak load is always applied between the chamfered portions 7, 7 of the adjacent glass base plates 1, and unlike the polishing brush 80 of the present embodiment, a strong load is periodically applied. I can't call it. As a result, it becomes difficult to effectively remove the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1.
  • each of the bristles of the plurality of brush bristle materials 83, 83 has the inner peripheral end face 4 and the chamfer of the glass base plate 1.
  • the sludge 88 polishing waste
  • the same polishing brush 80 is used for the outer peripheral end surface polishing step (S52).
  • the outer peripheral end face polishing step (S52) the outer peripheral end face 6 is polished in a state where a plurality of glass base plates 1 are stacked, as in the inner peripheral end face polishing step (S51).
  • the polishing process may be performed in a state where the block body 9 (see FIG. 8) and the polishing brush 80 are completely immersed in the polishing liquid.
  • the polishing treatment may be performed while the polishing slurry is poured (spread) between the outer peripheral end face 6 and the polishing brush 80.
  • polishing process After the glass base plate 1 that has undergone the lapping process (S60) is washed, a polishing process is performed. Polishing is performed on the main surfaces 2 and 3 of the glass base plate 1 using a polishing apparatus (hard and soft polishing pads).
  • the glass base plate 1 is immersed in the chemical strengthening solution for 3 to 4 hours. Since the entire surface of the glass base plate 1 is chemically strengthened during the immersion, the plurality of glass base plates 1 are accommodated in a holder or the like so that the plurality of glass base plates 1 are held by the respective end faces. It is preferable to be immersed in a state.
  • the alkali metal ions such as lithium ions and sodium ions contained in the glass base plate 1 are replaced by alkali metal ions such as potassium ions having a larger ion radius than these ions (ion exchange method). Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and both main surfaces of the glass base plate are strengthened.
  • the glass base plate 1 is ultrasonically cleaned using a high frequency of 950 kHz, or cleaned using an alkaline detergent so that the adhered matter remaining on the glass base plate 1 is eliminated. To do. Thereafter, the glass base plate 1 is dried using IPA vapor. Thus, the glass substrate in the present embodiment is obtained.
  • the glass substrate manufacturing method (S100) in the present embodiment is configured as described above.
  • Magnetic recording layers are formed on both main surfaces (or one of the main surfaces) of the glass substrate that has been subjected to the chemical strengthening treatment.
  • the magnetic recording layer includes, for example, an adhesion layer made of a Cr alloy, a soft magnetic layer made of a CoFeZr alloy, an orientation control underlayer made of Ru, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer made of a C system, and an F system.
  • an adhesion layer made of a Cr alloy
  • a soft magnetic layer made of a CoFeZr alloy
  • an orientation control underlayer made of Ru
  • a perpendicular magnetic recording layer made of a CoCrPt alloy
  • a protective layer made of a C system
  • F system F system
  • each of the bristles of the plurality of brush bristle materials 83 of the polishing brush 80 has the inner peripheral end face 4 and the chamfered chamfer of the glass base plate 1.
  • the sludge 88 polishing waste
  • the number of processed sheets is 400 blocks 9, and the rotational speed of the polishing brush 80 having the spiral brush bristles 81 is set to 4000 rpm.
  • the rotational speed of the block body 9 was set to 30 rpm.
  • the inner diameter of the hole 5 of the glass base plate 1 is 20.01 mm, and the polishing time is 20 min.
  • polishing slurry was poured between the inner peripheral end face 4 and the polishing brush 80.
  • the polishing brush used in the inner peripheral end face polishing step different ones were used in Examples 1 to 3 and Comparative Examples 1 to 3 as described later.
  • brush polishing was used and cerium oxide was used in the outer peripheral end face polishing.
  • the concentration of cerium oxide was 15 wt%.
  • the polishing brush used in Comparative Example 1 has a brush bristle material 83 with a length L of 4 mm, and the brush bristle material 83 has a planting range R of 1.5 mm.
  • the bristle tip range Q of the brush bristle material 83 is 1.05 mm.
  • the Q / R ratio calculated from the planting range R and the hair tip range Q is 70%.
  • the bristle tip 81 has a radial tip shape.
  • the polishing brush used in Comparative Example 2 has a brush bristle material 83 with a length L of 4 mm, and the brush bristle material 83 has a planting range R of 1.5 mm.
  • the bristle tip range Q of the brush bristle material 83 is 0.75 mm.
  • the Q / R ratio calculated from the planting range R and the hair tip range Q is 50%.
  • the bristle tip 81 has a flat tip shape.
  • Example 1 With reference to FIGS. 13, 16, and 17, in the polishing brush used in Example 1, the length L of the brush bristle material 83 is 4 mm, and the planting range R of the brush bristle material 83 is 1.
  • the bristle tip range Q of the brush bristle material 83 is 0.60 mm.
  • the Q / R ratio calculated from the planting range R and the hair tip range Q is 40%.
  • the bristles of the bristle bundle 81 have a curl shape (arc shape) so as to draw an arc 89 (see FIG. 17).
  • Example 2 Referring to FIGS. 13, 16, and 17, similarly to Example 1, the polishing brush used in Example 2 has a length L of the brush bristle material 83 of 4 mm.
  • the planting range R is 1.5 mm.
  • the bristle tip range Q of the brush bristle material 83 is 0.45 mm.
  • the Q / R ratio calculated from the planting range R and the hair tip range Q is 30%.
  • the bristles 81 of the bristle bundle 81 have a curl shape (arc shape) so as to draw an arc 89 (see FIG. 17).
  • the polishing brush used in Comparative Example 3 has a length L of the brush bristle material 83 of 4 mm, and a planting range R of the brush bristle material 83 is 1.2 mm.
  • the bristle tip range Q of the brush bristle material 83 is 0.60 mm.
  • the Q / R ratio calculated from the planting range R and the hair tip range Q is 50%.
  • the bristle tip 81 has a flat tip shape.
  • Example 3 With reference to FIG. 13 and FIG. 19, in the polishing brush used in Example 3, the length L of the brush bristle material 83 is 4 mm, the planting range R of the brush bristle material 83 is 1.5 mm, The bristle tip range Q of the brush bristle material 83 is 0.60 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 40%.
  • the bristle tip 81 has a flat tip shape.
  • the chamfered portion 7 (chamber surface) of the inner peripheral end face 4 was inspected.
  • the chamfered portion 7 of the inner peripheral end face 4 is measured for roughness using an AFM (Dimension 3100 manufactured by Beco Co., Ltd. and measurement software NanoScope 7.2), and the value of the surface roughness Ra is 1.0 nm or more.
  • the ratio of the glass base plate 1 is investigated, the case where the ratio of the corresponding glass base plate 1 is 10% or more is B evaluation, the case of less than 10% and 6% or more is A evaluation, and the case of less than 6% It was set as S evaluation.
  • the information recording medium 10 formed by subjecting the glass base plate 1 to film formation is incorporated into an actual information recording device 30 (hard disk drive), and 50 read / write tests are performed for each condition. It was confirmed.
  • Example 3 As shown in FIG. 13, as a result, in Examples 1 to 3, the state of the chamfered portion 7 was A evaluation or S evaluation, whereas in Comparative Examples 1 to 3, all were B evaluation. there were. Moreover, in Examples 1 and 2, evaluation better than Example 3 was obtained.
  • the tip of the brush bristle material 83 penetrates deeply between the chamfered portions 7 and 7, thereby making the chamfered portion 7 uneven. It is thought that it was possible to polish without any problems.
  • Example 3 in which the hair tip range Q is equal to that in Example 1 and the hair tip range Q is equal to the planting range R, an unfavorable result was obtained as compared with Example 1. This is considered to be a result of a decrease in the polishing rate because the bristles of the brush bristle material 83 fall in a specific direction when they hit the glass base plate 1.
  • Example 3 the tip part as the bristle bundle 81 was made flat by devising the planting method.
  • the result of the end face inspection was A evaluation, but the recording characteristic test was slightly lower than Example 1.
  • Example 3 the roughness of the chamfered portion 7 reached the acceptable level, but it was found that there was a variation in the values near the main surface and near the inner peripheral end surface 4. This is considered to be caused by the fact that the bristles of the brush bristle material 83 concentrated at the tip are better in the gap of the chamfered portion 7 in the first embodiment than in the third embodiment.
  • the hair tips of the plurality of brush bristle materials 83, 83 of the polishing brush 80 are within the glass base plate 1.
  • sludge polishing waste

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Geochemistry & Mineralogy (AREA)
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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

In the present invention, in an abrasive brush (80) used in a step for abrading the inner peripheral edge surfaces of a stacked plurality of glass element plates, brush bristle bundles (81) comprising a plurality of brush bristle members (83) are spirally implanted in the outer peripheral surface of a shaft core member (82), and in the direction parallel to the rotational axis (85) of the abrasive brush (80), the plurality of brush bristle members (83) are implanted in the shaft core member (82) in a manner so that compared to the width (W1) of the implantation base (R1) at which the brush bristle members (83) are implanted in the shaft core member (82), the width (W2) of the region (R2) formed by the tips of the plurality of brush bristle members (83) extending from the implantation base (R1) is smaller.

Description

情報記録媒体用ガラス基板およびその製造方法Glass substrate for information recording medium and manufacturing method thereof
　本発明は、情報記録媒体用ガラス基板およびその製造方法に関し、特に、ハードディスクドライブ（ＨＤＤ：Hard　Disk　Drive）等の情報記録装置に情報記録媒体の一部として搭載される情報記録媒体用ガラス基板およびその製造方法に関する。 The present invention relates to a glass substrate for information recording media and a method for manufacturing the same, and in particular, a glass substrate for information recording media mounted as part of an information recording medium in an information recording device such as a hard disk drive (HDD), and It relates to the manufacturing method.
　ハードディスクドライブ等の情報記録装置の内部には、情報記録媒体（磁気ディスク）が搭載される。情報記録媒体は、中央に孔を有する円盤状のガラス基板の主表面上に、磁気記録用の磁気記録層が成膜されることによって製造される。 An information recording medium (magnetic disk) is mounted inside an information recording device such as a hard disk drive. The information recording medium is manufactured by forming a magnetic recording layer for magnetic recording on the main surface of a disk-shaped glass substrate having a hole in the center.
　情報記録媒体の製造に用いられるガラス基板は、情報記録媒体用ガラス基板（以下、単にガラス基板ともいう）という。情報記録媒体用ガラス基板の製造方法は、たとえば特開２００７－０９８４８４号公報（特許文献１）および特開２００７－２４５３１９号公報（特許文献２）に開示されている。 A glass substrate used for manufacturing an information recording medium is referred to as an information recording medium glass substrate (hereinafter also simply referred to as a glass substrate). A method for manufacturing a glass substrate for an information recording medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 2007-098484 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2007-245319 (Patent Document 2).
特開２００７－０９８４８４号公報JP 2007-098484 A 特開２００７－２４５３１９号公報JP 2007-245319 A
　コンピューター等の使用用途および使用環境の拡大に伴い、情報記録媒体（磁気ディスク）に求められる耐衝撃性や、溶出物の発生防止についての要求も年々高まる傾向にある。情報記録媒体の内周端面に微細なクラックが存在している場合、情報記録媒体の耐衝撃性が低下する。耐衝撃性を向上させるためには、情報記録媒体を構成するガラス素板の内周端面は、研磨加工によって十分に平滑に形成されている必要がある。 With the expansion of the usage and environment of computers and the like, demands for information recording media (magnetic disks) required for impact resistance and prevention of elution are also increasing year by year. When fine cracks are present on the inner peripheral end face of the information recording medium, the impact resistance of the information recording medium is lowered. In order to improve the impact resistance, the inner peripheral end face of the glass base plate constituting the information recording medium needs to be formed sufficiently smoothly by polishing.
　一般的に、高い平滑性を得るために、ガラス基板（ガラス素板）の内周端面は、研削加工によって研削された後、研磨スラリーおよび研磨用ブラシを用いて研磨される。製造効率を向上させる等の観点から、ガラス素板の内周端面に対して研磨加工を行なう場合、ガラス素板は、複数のガラス素板同士が重ねられた状態でバッチ的に研磨処理されることがある。 Generally, in order to obtain high smoothness, the inner peripheral end surface of a glass substrate (glass base plate) is ground by grinding and then polished with a polishing slurry and a polishing brush. From the standpoint of improving production efficiency and the like, when performing polishing on the inner peripheral end surface of the glass base plate, the glass base plate is batch-polished in a state where a plurality of glass base plates are stacked. Sometimes.
　本発明は、複数のガラス素板に対してバッチ的に研磨処理する場合であっても、複数のガラス素板の内周端面がより平滑に研磨される情報記録媒体用ガラス基板およびその製造方法を提供することを目的とする。 The present invention provides a glass substrate for an information recording medium in which inner peripheral end surfaces of a plurality of glass base plates are polished more smoothly even when batch-polishing a plurality of glass base plates, and a method for manufacturing the same The purpose is to provide.
　本発明に基づく情報記録媒体用ガラス基板の製造方法は、内周端面を有する複数枚のガラス素板を準備する工程と、複数本のブラシ毛材からなるブラシ毛束が軸心部材の外周面に螺旋状に植え付けられた研磨用ブラシを準備する工程と、複数枚の上記ガラス素板を重ねた後、重ねられた状態にある複数枚の上記ガラス素板の上記内周端面と上記ブラシ毛束の先端とが互いに対向するように上記研磨用ブラシを配置する工程と、上記研磨用ブラシを回転させ、重ねられた状態にある複数枚の上記ガラス素板の上記内周端面に対して上記ブラシ毛束を摺動させることにより、複数枚の上記ガラス素板の上記内周端面を研磨する工程と、を備え、上記研磨用ブラシの回転軸に対して平行な方向において、複数本の上記ブラシ毛材は、複数本の上記ブラシ毛材が上記軸心部材に植え付けられている植え付け基部の幅に比べて、その植え付け基部から延びる複数本の上記ブラシ毛材の各々の先端によって形成される領域の幅の方が小さくなるように、上記軸心部材に植え付けられている。 The method for manufacturing a glass substrate for information recording medium according to the present invention includes a step of preparing a plurality of glass base plates having an inner peripheral end surface, and a bristles made of a plurality of brush bristle members are outer peripheral surfaces of a shaft member. A step of preparing a polishing brush planted in a spiral shape, and a plurality of the glass base plates, and then the inner peripheral end surfaces of the glass base plates and the brush bristles in a stacked state The step of disposing the polishing brush so that the front ends of the bundle face each other, and the polishing brush is rotated, and the inner peripheral end surfaces of the plurality of glass base plates in a stacked state Polishing the inner peripheral end face of the plurality of glass base plates by sliding a brush bristle bundle, and in a direction parallel to the rotation axis of the polishing brush, a plurality of the above The brush bristle is a plurality of the above The width of the region formed by the tips of each of the plurality of brush hairs extending from the planting base is smaller than the width of the planting base where the brush hair material is planted on the shaft member. Further, it is planted on the shaft member.
　好ましくは、上記研磨用ブラシの回転軸に対して平行な方向において、複数本の上記ブラシ毛材は、複数本のうちの９５％以上の上記ブラシ毛材の先端が、上記軸心部材の表面に対して垂直な方向に延びる上記植え付け基部の幅方向の中心線を基準として±４０％以内の範囲内に位置するように、上記軸心部材に植え付けられている。 Preferably, in a direction parallel to the rotation axis of the polishing brush, the plurality of brush bristle members have 95% or more of the plurality of brush bristle tips at the surface of the shaft member. The shaft center member is planted so as to be located within a range of ± 40% with respect to the center line in the width direction of the planting base extending in a direction perpendicular to the vertical direction.
　好ましくは、上記研磨用ブラシの回転軸に対して平行な方向において、複数本の上記ブラシ毛材は、上記ブラシ毛束としての先端が円弧状を呈するように、上記軸心部材に植え付けられている。 Preferably, in a direction parallel to the rotation axis of the polishing brush, the plurality of brush bristle materials are planted on the shaft member so that the tips of the bristle bundles have an arc shape. Yes.
　本発明に基づく情報記録媒体用ガラス基板は、本発明に基づく上記の情報記録媒体用ガラス基板の製造方法を使用して製造される。 The glass substrate for information recording medium based on the present invention is manufactured using the above-described method for manufacturing a glass substrate for information recording medium based on the present invention.
　本発明によれば、複数のガラス素板に対してバッチ的に研磨処理する場合であっても、複数のガラス素板の内周端面がより平滑に研磨される情報記録媒体用ガラス基板およびその製造方法を得ることができる。 According to the present invention, even when a plurality of glass base plates are subjected to a batch polishing process, the glass substrate for an information recording medium in which inner peripheral end surfaces of the plurality of glass base plates are polished more smoothly, and A manufacturing method can be obtained.
実施の形態における情報記録媒体用ガラス基板の製造方法を使用することによって製造されたガラス基板を備える情報記録装置を示す斜視図である。It is a perspective view which shows an information recording device provided with the glass substrate manufactured by using the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法によって製造されたガラス基板を示す平面図である。It is a top view which shows the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment. 図２中のＩＩＩ－ＩＩＩ線に沿った矢視断面図である。FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2. 実施の形態における情報記録媒体用ガラス基板の製造方法によって製造されたガラス基板を備えた情報記録媒体を示す平面図である。It is a top view which shows the information recording medium provided with the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment. 図４中のＶ－Ｖ線に沿った矢視断面図である。FIG. 5 is a cross-sectional view taken along line VV in FIG. 4. 実施の形態における情報記録媒体用ガラス基板の製造方法を示すフロー図である。It is a flowchart which shows the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる研磨用ブラシを示す斜視図である。It is a perspective view which shows the brush for grinding | polishing used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる研磨用ブラシを示す側面図である。It is a side view which shows the brush for grinding | polishing used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる研磨用ブラシを拡大して模式的に示す側面図である。It is a side view which expands and shows typically the polishing brush used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程（内周端面研磨工程）が実施されている様子を拡大して示す側面図である。It is a side view which expands and shows a mode that the end surface grinding | polishing process (inner peripheral end surface grinding | polishing process) of the manufacturing method of the glass substrate for information recording media in embodiment is implemented. 比較例における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる研磨用ブラシを拡大して模式的に示す側面図である。It is a side view which expands and shows typically the polishing brush used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in a comparative example. 比較例における情報記録媒体用ガラス基板の製造方法の端面研磨工程（内周端面研磨工程）が実施されている様子を拡大して示す側面図である。It is a side view which expands and shows a mode that the end surface grinding | polishing process (inner peripheral end surface grinding | polishing process) of the manufacturing method of the glass substrate for information recording media in a comparative example is implemented. 実施の形態に関する実施例および比較例の条件および結果を示す図である。It is a figure which shows the conditions and result of the Example and comparative example regarding embodiment. 実施の形態に関する比較例１に用いられた研磨用ブラシを模式的に示す側面図である。It is a side view which shows typically the brush for grinding | polishing used for the comparative example 1 regarding embodiment. 実施の形態に関する比較例２に用いられた研磨用ブラシを模式的に示す側面図である。It is a side view which shows typically the brush for grinding | polishing used for the comparative example 2 regarding embodiment. 実施の形態に関する実施例１，２に用いられた研磨用ブラシを模式的に示す側面図である。It is a side view which shows typically the brush for grinding | polishing used for Example 1, 2 regarding embodiment. 実施の形態に関する実施例１，２に用いられた研磨用ブラシを拡大して模式的に示す側面図である。It is a side view which expands and shows typically the brush for grinding | polishing used for Example 1, 2 regarding embodiment. 実施の形態に関する比較例３に用いられた研磨用ブラシを模式的に示す側面図である。It is a side view which shows typically the brush for grinding | polishing used for the comparative example 3 regarding embodiment. 実施の形態に関する実施例３に用いられた研磨用ブラシを模式的に示す側面図である。It is a side view which shows typically the brush for grinding | polishing used for Example 3 regarding embodiment.
　本発明に基づいた実施の形態および各実施例について、以下、図面を参照しながら説明する。実施の形態および各実施例の説明において、個数、量などに言及する場合、特に記載がある場合を除き、本発明の範囲は必ずしもその個数、量などに限定されない。実施の形態および各実施例の説明において、同一の部品、相当部品に対しては、同一の参照番号を付し、重複する説明は繰り返さない場合がある。 Embodiments and examples based on the present invention will be described below with reference to the drawings. In the description of the embodiments and the examples, when the number, amount, and the like are referred to, the scope of the present invention is not necessarily limited to the number, amount, and the like unless otherwise specified. In the description of the embodiment and each example, the same parts and corresponding parts are denoted by the same reference numerals, and redundant description may not be repeated.
　［実施の形態］
　（情報記録装置３０）
　図１を参照して、まず、情報記録装置３０について説明する。図１は、情報記録装置３０を示す斜視図である。情報記録装置３０は、実施の形態における情報記録媒体用ガラス基板（以下、単にガラス基板ともいう）の製造方法によって製造されたガラス基板１を、情報記録媒体１０として備える。 [Embodiment]
(Information recording device 30)
First, the information recording device 30 will be described with reference to FIG. FIG. 1 is a perspective view showing the information recording apparatus 30. The information recording apparatus 30 includes the glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium (hereinafter also simply referred to as a glass substrate) in the embodiment as the information recording medium 10.
　具体的には、情報記録装置３０は、情報記録媒体１０、筐体２０、ヘッドスライダー２１、サスペンション２２、アーム２３、垂直軸２４、ボイスコイル２５、ボイスコイルモーター２６、クランプ部材２７、および固定ネジ２８を備える。筐体２０の上面上には、スピンドルモーター（図示せず）が設置される。 Specifically, the information recording device 30 includes an information recording medium 10, a housing 20, a head slider 21, a suspension 22, an arm 23, a vertical shaft 24, a voice coil 25, a voice coil motor 26, a clamp member 27, and a fixing screw. 28. A spindle motor (not shown) is installed on the upper surface of the housing 20.
　磁気ディスクなどの情報記録媒体１０は、クランプ部材２７および固定ネジ２８によって、上記のスピンドルモーターに回転可能に固定される。情報記録媒体１０は、このスピンドルモーターによって、たとえば数千ｒｐｍの回転数で回転駆動される。詳細は図４および図５を参照して後述されるが、情報記録媒体１０は、ガラス基板１に化学強化層１２（図５参照）および磁気記録層１４（図４および図５参照）が形成されることによって製造される。 An information recording medium 10 such as a magnetic disk is rotatably fixed to the spindle motor by a clamp member 27 and a fixing screw 28. The information recording medium 10 is rotationally driven by this spindle motor at, for example, several thousand rpm. Although details will be described later with reference to FIGS. 4 and 5, in the information recording medium 10, a chemically strengthened layer 12 (see FIG. 5) and a magnetic recording layer 14 (see FIGS. 4 and 5) are formed on the glass substrate 1. To be manufactured.
　アーム２３は、垂直軸２４回りに揺動可能に取り付けられる。アーム２３の先端には、板バネ（片持ち梁）状に形成されたサスペンション２２が取り付けられる。サスペンション２２の先端には、ヘッドスライダー２１が情報記録媒体１０を挟み込むように取り付けられる。 The arm 23 is attached so as to be swingable around the vertical axis 24. A suspension 22 formed in a leaf spring (cantilever) shape is attached to the tip of the arm 23. A head slider 21 is attached to the tip of the suspension 22 so as to sandwich the information recording medium 10.
　アーム２３のヘッドスライダー２１とは反対側には、ボイスコイル２５が取り付けられる。ボイスコイル２５は、筐体２０上に設けられたマグネット（図示せず）によって挟持される。ボイスコイル２５およびこのマグネットにより、ボイスコイルモーター２６が構成される。 A voice coil 25 is attached to the opposite side of the arm 23 from the head slider 21. The voice coil 25 is clamped by a magnet (not shown) provided on the housing 20. A voice coil motor 26 is constituted by the voice coil 25 and the magnet.
　ボイスコイル２５には所定の電流が供給される。アーム２３は、ボイスコイル２５に流れる電流と上記マグネットの磁場とにより発生する電磁力の作用によって、垂直軸２４回りに揺動する。アーム２３の揺動によって、サスペンション２２およびヘッドスライダー２１も矢印ＡＲ１方向に揺動する。ヘッドスライダー２１は、情報記録媒体１０の表面上および裏面上を、情報記録媒体１０の半径方向に往復移動する。ヘッドスライダー２１に設けられた磁気ヘッド（図示せず）はシーク動作を行なう。 A predetermined current is supplied to the voice coil 25. The arm 23 swings around the vertical axis 24 by the action of electromagnetic force generated by the current flowing through the voice coil 25 and the magnetic field of the magnet. As the arm 23 swings, the suspension 22 and the head slider 21 also swing in the direction of the arrow AR1. The head slider 21 reciprocates on the front and back surfaces of the information recording medium 10 in the radial direction of the information recording medium 10. A magnetic head (not shown) provided on the head slider 21 performs a seek operation.
　当該シーク動作が行なわれる一方で、ヘッドスライダー２１は、情報記録媒体１０の回転に伴って発生する空気流により、浮揚力を受ける。当該浮揚力とサスペンション２２の弾性力（押圧力）とのバランスによって、ヘッドスライダー２１は情報記録媒体１０の表面に対して一定の浮上量で走行する。当該走行によって、ヘッドスライダー２１に設けられた磁気ヘッドは、情報記録媒体１０内の所定のトラックに対して情報（データ）の記録および再生を行なうことが可能となる。ガラス基板１が情報記録媒体１０を構成する部材の一部として搭載される情報記録装置３０は、以上のように構成される。 While the seek operation is performed, the head slider 21 receives a levitation force due to the air flow generated as the information recording medium 10 rotates. Due to the balance between the levitation force and the elastic force (pressing force) of the suspension 22, the head slider 21 travels with a constant flying height with respect to the surface of the information recording medium 10. By the traveling, the magnetic head provided on the head slider 21 can record and reproduce information (data) on a predetermined track in the information recording medium 10. The information recording apparatus 30 on which the glass substrate 1 is mounted as a part of the members constituting the information recording medium 10 is configured as described above.
　（ガラス基板１）
　図２は、本実施の形態に基づく情報記録媒体用ガラス基板の製造方法によって製造されるガラス基板１を示す平面図である。図３は、図２中のＩＩＩ－ＩＩＩ線に沿った矢視断面図である。 (Glass substrate 1)
FIG. 2 is a plan view showing glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium according to the present embodiment. 3 is a cross-sectional view taken along the line III-III in FIG.
　図２および図３に示すように、情報記録媒体１０（図４および図５参照）にその一部として用いられるガラス基板１（情報記録媒体用ガラス基板）は、主表面２、主表面３、内周端面４、孔５、および外周端面６を有し、全体として円盤状に形成される。孔５は、一方の主表面２から他方の主表面３に向かって貫通するように設けられる。主表面２と内周端面４との間、および、主表面３と内周端面４との間には、面取部７がそれぞれ形成される。主表面２と外周端面６との間、および、主表面３と外周端面６との間には、面取部８（チャンファー部）が形成される。 As shown in FIGS. 2 and 3, the glass substrate 1 (glass substrate for information recording medium) used as a part of the information recording medium 10 (see FIGS. 4 and 5) has a main surface 2, a main surface 3, It has the inner peripheral end surface 4, the hole 5, and the outer peripheral end surface 6, and is formed in a disk shape as a whole. The hole 5 is provided so as to penetrate from one main surface 2 toward the other main surface 3. A chamfer 7 is formed between the main surface 2 and the inner peripheral end surface 4 and between the main surface 3 and the inner peripheral end surface 4. Between the main surface 2 and the outer peripheral end surface 6 and between the main surface 3 and the outer peripheral end surface 6, a chamfered portion 8 (chamfer portion) is formed.
　ガラス基板１の大きさは、たとえば０．８インチ、１．０インチ、１．８インチ、２．５インチ、または３．５インチである。ガラス基板の厚さは、破損防止の観点から、たとえば０．３０ｍｍ～２．２ｍｍである。本実施の形態におけるガラス基板の大きさは、外径が約６４ｍｍ、内径が約２０ｍｍ、厚さが約０．８ｍｍである。ガラス基板の厚さとは、ガラス基板上の点対象となる任意の複数の点で測定した値の平均によって算出される値である。 The size of the glass substrate 1 is, for example, 0.8 inch, 1.0 inch, 1.8 inch, 2.5 inch, or 3.5 inch. The thickness of the glass substrate is, for example, 0.30 mm to 2.2 mm from the viewpoint of preventing breakage. In the present embodiment, the glass substrate has an outer diameter of about 64 mm, an inner diameter of about 20 mm, and a thickness of about 0.8 mm. The thickness of the glass substrate is a value calculated by averaging the values measured at a plurality of arbitrary points to be pointed on the glass substrate.
　（情報記録媒体１０）
　図４は、情報記録媒体としてガラス基板１を備えた情報記録媒体１０を示す平面図である。図５は、図４中のＶ－Ｖ線に沿った矢視断面図である。 (Information recording medium 10)
FIG. 4 is a plan view showing an information recording medium 10 provided with a glass substrate 1 as an information recording medium. FIG. 5 is a cross-sectional view taken along the line VV in FIG.
　図４および図５に示すように、情報記録媒体１０は、ガラス基板１と、化学強化層１２と、磁気記録層１４とを含む。化学強化層１２は、ガラス基板１の主表面２，３、内周端面４、および外周端面６を覆うように形成される。磁気記録層１４は、化学強化層１２の主表面２，３上の所定の領域を覆うように形成される。ガラス基板１の内周端面４上に化学強化層１２が形成されることによって、内周端面４の内側に孔１５が形成される。孔１５を利用して、情報記録媒体１０は筐体２０（図１参照）上に設けられたスピンドルモーターに対して固定される。 4 and 5, the information recording medium 10 includes a glass substrate 1, a chemical strengthening layer 12, and a magnetic recording layer 14. Chemical strengthening layer 12 is formed to cover main surfaces 2 and 3, inner peripheral end surface 4, and outer peripheral end surface 6 of glass substrate 1. The magnetic recording layer 14 is formed so as to cover a predetermined region on the main surfaces 2 and 3 of the chemical strengthening layer 12. By forming the chemical strengthening layer 12 on the inner peripheral end face 4 of the glass substrate 1, a hole 15 is formed inside the inner peripheral end face 4. The information recording medium 10 is fixed to a spindle motor provided on the housing 20 (see FIG. 1) using the holes 15.
　図５に示す情報記録媒体１０においては、主表面２上に形成された化学強化層１２と主表面３上に形成された化学強化層１２との双方（両面）の上に、磁気記録層１４が形成されている。磁気記録層１４は、主表面２上に形成された化学強化層１２の上（片面）にのみ設けられていてもよく、主表面３上に形成された化学強化層１２の上（片面）に設けられていてもよい。 In the information recording medium 10 shown in FIG. 5, the magnetic recording layer 14 is formed on both (both sides) the chemical strengthening layer 12 formed on the main surface 2 and the chemical strengthening layer 12 formed on the main surface 3. Is formed. The magnetic recording layer 14 may be provided only on the chemical strengthening layer 12 (one side) formed on the main surface 2, or on the chemical strengthening layer 12 (one side) formed on the main surface 3. It may be provided.
　磁気記録層１４は、磁性粒子を分散させた熱硬化性樹脂をガラス基板１の主表面２，３上の化学強化層１２にスピンコートすることによって形成される（スピンコート法）。磁気記録層１４は、ガラス基板１の主表面２，３上の化学強化層１２に対して実施されるスパッタリング法または無電解めっき法等により形成されてもよい。 The magnetic recording layer 14 is formed by spin-coating a thermosetting resin in which magnetic particles are dispersed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1 (spin coating method). The magnetic recording layer 14 may be formed by a sputtering method or an electroless plating method performed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1.
　磁気記録層１４の膜厚は、スピンコート法の場合は約０．３μｍ～１．２μｍ、スパッタリング法の場合は約０．０４μｍ～０．０８μｍ、無電解めっき法の場合は約０．０５μｍ～０．１μｍである。薄膜化および高密度化の観点からは、磁気記録層１４はスパッタリング法または無電解めっき法によって形成されるとよい。 The thickness of the magnetic recording layer 14 is about 0.3 μm to 1.2 μm for the spin coating method, about 0.04 μm to 0.08 μm for the sputtering method, and about 0.05 μm to about the electroless plating method. 0.1 μm. From the viewpoint of thinning and high density, the magnetic recording layer 14 is preferably formed by sputtering or electroless plating.
　磁気記録層１４に用いる磁性材料としては、高い保持力を得る目的で結晶異方性の高いＣｏを主成分とし、残留磁束密度を調整する目的でＮｉまたはＣｒを加えたＣｏ系合金などを付加的に用いることが好適である。 As a magnetic material used for the magnetic recording layer 14, a Co-based alloy or the like containing Ni or Cr as a main component is added for the purpose of adjusting the residual magnetic flux density. Is preferably used.
　磁気ヘッドの滑りをよくするために、磁気記録層１４の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、たとえば液体潤滑剤であるパーフロロポリエーテル（ＰＦＰＥ）をフレオン系などの溶媒で希釈したものが挙げられる。 In order to improve the sliding of the magnetic head, the surface of the magnetic recording layer 14 may be thinly coated with a lubricant. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon.
　磁気記録層１４には、必要に応じて下地層または保護層を設けてもよい。情報記録媒体１０における下地層は、磁性膜の種類に応じて選択される。下地層の材料としては、たとえば、Ｃｒ、Ｍｏ、Ｔａ、Ｔｉ、Ｗ、Ｖ、Ｂ、Ａｌ、またはＮｉなどの非磁性金属から選ばれる少なくとも一種以上の材料が挙げられる。 The magnetic recording layer 14 may be provided with a base layer or a protective layer as necessary. The underlayer in the information recording medium 10 is selected according to the type of magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
　磁気記録層１４に設ける下地層は、単層に限らず、同一または異種の層を積層した複数層構造としても構わない。たとえば、Ｃｒ／Ｃｒ、Ｃｒ／ＣｒＭｏ、Ｃｒ／ＣｒＶ、ＮｉＡｌ／Ｃｒ、ＮｉＡｌ／ＣｒＭｏ、または、ＮｉＡｌ／ＣｒＶ等の多層下地層としてもよい。 The underlayer provided on the magnetic recording layer 14 is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.
　磁気記録層１４の摩耗および腐食を防止する保護層としては、たとえば、Ｃｒ層、Ｃｒ合金層、カーボン層、水素化カーボン層、ジルコニア層、またはシリカ層が挙げられる。これらの保護層は、下地層および磁性膜など共にインライン型スパッタ装置で連続して形成されることができる。これらの保護層は、単層としてもよく、または、同一若しくは異種の層からなる多層構成としてもよい。 Examples of the protective layer for preventing wear and corrosion of the magnetic recording layer 14 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus together with the underlayer and the magnetic film. These protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.
　上記保護層上に、あるいは上記保護層に代えて、他の保護層を形成してもよい。たとえば、上記保護層に代えて、Ｃｒ層の上にテトラアルコキシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成して酸化ケイ素（ＳｉＯ２）層を形成してもよい。 Another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, tetraalkoxylane is diluted with an alcohol-based solvent on a Cr layer, and then colloidal silica fine particles are dispersed and applied, followed by baking to form a silicon oxide (SiO 2 ) layer. It may be formed.
　（ガラス基板の製造方法）
　次に、図６に示すフローチャート図を用いて、本実施の形態におけるガラス基板（情報記録媒体用ガラス基板）の製造方法（Ｓ１００）について説明する。本実施の形態におけるガラス基板の製造方法（Ｓ１００）は、ガラス素板準備工程（Ｓ１０）、アルミナ研磨工程（Ｓ２０）、コアリング加工工程（Ｓ３０）、端面研削工程（Ｓ４０）、端面研磨工程（Ｓ５０）、ラップ加工工程（Ｓ６０）、ポリッシュ加工工程（Ｓ７０）、および、化学強化工程（Ｓ８０）を備える。 (Glass substrate manufacturing method)
Next, the manufacturing method (S100) of the glass substrate (glass substrate for information recording media) in this Embodiment is demonstrated using the flowchart figure shown in FIG. The glass substrate manufacturing method (S100) in the present embodiment includes a glass base plate preparation step (S10), an alumina polishing step (S20), a coring step (S30), an end surface grinding step (S40), and an end surface polishing step ( S50), a lapping process (S60), a polishing process (S70), and a chemical strengthening process (S80).
　化学強化工程（Ｓ８０）を経ることによって得られたガラス基板に対して、磁気記録層成膜工程（Ｓ２００）が実施される。磁気記録層成膜工程（Ｓ２００）を経ることによって、情報記録媒体１０（図４および図５参照）が得られる。以下、ガラス基板の製造方法（Ｓ１００）を構成する各工程Ｓ１０～Ｓ８０の詳細について順に説明する、以下の説明において、各工程Ｓ１０～Ｓ８０の間に適宜行なわれる簡易的な洗浄については、詳細に記載していない場合がある。 A magnetic recording layer deposition step (S200) is performed on the glass substrate obtained through the chemical strengthening step (S80). The information recording medium 10 (see FIGS. 4 and 5) is obtained through the magnetic recording layer deposition step (S200). Hereinafter, the details of the steps S10 to S80 constituting the glass substrate manufacturing method (S100) will be described in order. In the following description, the simple cleaning appropriately performed between the steps S10 to S80 will be described in detail. It may not be listed.
　（Ｓ１０：ガラス素板準備工程）
　まず、ガラス基板を構成する略円盤状のガラス素板が所定枚数分だけ準備される。ガラス素板は、たとえば、溶融ガラスを、上型、下型、胴型を用いてダイレクトプレスすることによって得られる。この際、ダイレクトプレス法の代わりに、ダウンドロー法またはフロート法を使用して形成したシートガラスから、研削砥石で切り出して円板状のガラス素板を得てもよい。 (S10: Glass base plate preparation process)
First, a predetermined number of substantially disk-shaped glass base plates constituting the glass substrate are prepared. The glass base plate can be obtained, for example, by directly pressing molten glass using an upper mold, a lower mold, and a body mold. At this time, instead of the direct press method, a disk-shaped glass base plate may be obtained by cutting out with a grinding wheel from a sheet glass formed by using a downdraw method or a float method.
　（Ｓ２０：アルミナ研磨工程）
　次いで、所定枚数のガラス素板に対してアルミナ研磨処理が実施される。このアルミナ研磨処理は、寸法精度および形状精度の向上を目的としている。アルミナ研磨処理は、ラッピング装置を用いて行なわれる。粒度＃４００のアルミナ砥粒を用い、荷重を１００ｋｇ程度に設定して、内転ギアと外転ギアとを回転させることによって、キャリア内に収納したガラス素板の両主表面が研磨される。 (S20: Alumina polishing step)
Next, alumina polishing is performed on a predetermined number of glass base plates. The purpose of this alumina polishing treatment is to improve dimensional accuracy and shape accuracy. The alumina polishing process is performed using a lapping apparatus. By using alumina abrasive grains of particle size # 400, setting the load to about 100 kg and rotating the inner and outer rotation gears, both main surfaces of the glass base plate housed in the carrier are polished.
　（Ｓ３０：コアリング加工工程）
　次に、円筒状の砥石を使用して、所定枚数のガラス素板の中心部に孔がそれぞれ形成される。この孔は、図２および図３中における孔５に対応するものであり、情報記録媒体１０をスピンドルモーターに固定する際に使用されるものである。 (S30: Coring process)
Next, using a cylindrical grindstone, holes are respectively formed in the central portions of a predetermined number of glass base plates. This hole corresponds to the hole 5 in FIGS. 2 and 3, and is used when the information recording medium 10 is fixed to the spindle motor.
　（Ｓ４０：端面研削工程）
　端面研削工程（Ｓ４０）においては、研削用の砥石を用いて、所定枚数のガラス素板の内周端面および外周端面がそれぞれ研削され、さらに内周端面および外周端面に対して所定の面取り加工が実施される。これらの加工によって、ガラス素板１の内周端面４は、面取部７を有する所定の形状に研削され、ガラス素板１の外周端面６は、面取部８を有する所定の形状に研削される。 (S40: End grinding process)
In the end face grinding step (S40), the inner peripheral end face and the outer peripheral end face of a predetermined number of glass base plates are ground using a grinding wheel, and further, a predetermined chamfering process is performed on the inner peripheral end face and the outer peripheral end face. To be implemented. By these processes, the inner peripheral end surface 4 of the glass base plate 1 is ground into a predetermined shape having a chamfered portion 7, and the outer peripheral end surface 6 of the glass base plate 1 is ground into a predetermined shape having a chamfered portion 8. Is done.
　（Ｓ５０：端面研磨工程）
　次に、酸化セリウムなどの研磨スラリーを用いた端面研磨工程（Ｓ５０）が実施される。端面研磨工程（Ｓ５０）は、内周端面研磨工程（Ｓ５１）および外周端面研磨工程（Ｓ５２）を含む。 (S50: End face polishing step)
Next, an end surface polishing step (S50) using a polishing slurry such as cerium oxide is performed. The end surface polishing step (S50) includes an inner peripheral end surface polishing step (S51) and an outer peripheral end surface polishing step (S52).
　図７を参照して、内周端面研磨工程（Ｓ５１）の際には、研磨用ブラシ８０（研磨部材）が用いられる。研磨用ブラシ８０は、複数本のブラシ毛材からなるブラシ毛束８１が円柱状の軸心部材８２の外周面に螺旋状に植え付けられることによって構成される。研磨用ブラシ８０の更なる詳細な構成については、図９および図１０を参照して後述する。 Referring to FIG. 7, a polishing brush 80 (abrasive member) is used in the inner peripheral end surface polishing step (S51). The polishing brush 80 is configured by a brush bristle bundle 81 made of a plurality of brush bristle materials being spirally planted on the outer peripheral surface of a cylindrical shaft center member 82. A further detailed configuration of the polishing brush 80 will be described later with reference to FIGS. 9 and 10.
　図８を参照して、内周端面４および外周端面の研削処理が実施されたガラス素板１は、図８に示すように、たとえば４００枚ずつブロック状（ブロック体９）に重ね合わせられた状態で所定の固定治具（図示せず）を用いて固定される。隣接するガラス素板１同士の間には、スペーサーなどが設けられているとよい。 Referring to FIG. 8, the glass base plate 1 on which the inner peripheral end face 4 and the outer peripheral end face have been ground was overlapped in a block shape (block body 9), for example, 400 pieces each as shown in FIG. 8. In a state, it is fixed using a predetermined fixing jig (not shown). A spacer or the like may be provided between the adjacent glass base plates 1.
　複数のガラス素板１が位置決めおよび固定された後、重ねられた状態にある複数枚のガラス素板１の内周端面４とブラシ毛束８１の先端とが互いに対向するように、研磨用ブラシ８０が内周端面４の内側に配置される。この状態で研磨用ブラシ８０を回転させ、重ねられた状態にある複数枚のガラス素板１の内周端面４に対してブラシ毛束８１を摺動させることによって、複数枚のガラス素板１の内周端面４が研磨される。 After the plurality of glass base plates 1 are positioned and fixed, the polishing brush so that the inner peripheral end surfaces 4 of the plurality of glass base plates 1 in a stacked state and the tips of the brush bristle bundles 81 face each other. 80 is arranged inside the inner peripheral end face 4. In this state, the polishing brush 80 is rotated, and the brush bristle bundle 81 is slid with respect to the inner peripheral end surfaces 4 of the plurality of glass base plates 1 in a stacked state. The inner peripheral end face 4 is polished.
　図９を参照して、ここで、本実施の形態における内周端面研磨工程（Ｓ５１）に用いられる研磨用ブラシ８０は、次のように構成される。上述のとおり、研磨用ブラシ８０のブラシ毛束８１は、複数本のブラシ毛材８３，８３から構成される。研磨用ブラシ８０の回転軸８５に対して平行な方向において、複数本のブラシ毛材８３，８３は、複数本のブラシ毛材８３，８３が軸心部材８２に植え付けられている植え付け基部Ｒ１の幅Ｗ１に比べて、その植え付け基部Ｒ１から延びる複数本のブラシ毛材８３，８３の各々の先端によって形成される領域Ｒ２の幅Ｗ２の方が小さくなるように、軸心部材８２に植え付けられている。 Referring to FIG. 9, here, the polishing brush 80 used in the inner peripheral end face polishing step (S51) in the present embodiment is configured as follows. As described above, the brush bristle bundle 81 of the polishing brush 80 includes a plurality of brush bristle materials 83 and 83. In a direction parallel to the rotation shaft 85 of the polishing brush 80, the plurality of brush bristle materials 83, 83 are arranged on the planting base R1 in which the plurality of brush bristle materials 83, 83 are planted on the shaft center member 82. The shaft center member 82 is planted so that the width W2 of the region R2 formed by the tips of each of the plurality of brush bristle materials 83, 83 extending from the planting base R1 is smaller than the width W1. Yes.
　好ましくは、研磨用ブラシ８０の回転軸８５に対して平行な方向において、複数本のブラシ毛材８３，８３は、複数本のうちの９５％以上のブラシ毛材８３，８３の先端が、軸心部材８２の表面に対して垂直な方向に延びる植え付け基部Ｒ１の幅方向の中心線８１Ｃを基準として±４０％以内の範囲Ｑ，Ｑ（中心線８１Ｃに平行な方向で投影視した場合の範囲）内に位置するように、軸心部材８２に植え付けられているとよい。 Preferably, in the direction parallel to the rotation shaft 85 of the polishing brush 80, the plurality of brush bristle materials 83, 83 have a tip of the brush bristle material 83, 83 of 95% or more of the plural brush bristle members. Ranges Q and Q within ± 40% with respect to the center line 81C in the width direction of the planting base R1 extending in a direction perpendicular to the surface of the core member 82 (ranges when projected in a direction parallel to the center line 81C) It is good to be planted in the shaft center member 82 so that it may be located in the inside.
　図１０を参照して、重ねられた状態にある複数枚のガラス素板１の内周端面４を研磨用ブラシ８０を用いて研磨する際には、複数のブラシ毛材８３，８３の各々の毛先が、ガラス素板１の内周端面４および面取部７に当接する。複数のブラシ毛材８３，８３の各々の毛先は、ガラス素板１の内周端面４および面取部７に接触する際、狭い範囲に集中し、隣り合うガラス素板１の面取部７，７同士の間にも定期的に強い荷重をかけることが可能となる。これにより、隣り合うガラス素板１の面取部７，７同士の間に残留しているスラッジ８８（研磨屑）は効果的に除去されることとなり、面取部７に対する良好な加工レートを確保する事が可能となる。 Referring to FIG. 10, when polishing inner peripheral end surfaces 4 of a plurality of glass base plates 1 in an overlapped state using polishing brush 80, each of a plurality of brush bristle materials 83, 83 is used. The bristles contact the inner peripheral end surface 4 and the chamfered portion 7 of the glass base plate 1. When the bristles of each of the plurality of brush bristle materials 83, 83 are in contact with the inner peripheral end face 4 and the chamfered portion 7 of the glass base plate 1, they are concentrated in a narrow range, and the chamfered portions of the adjacent glass base plates 1. It becomes possible to apply a heavy load periodically between the sevens. Thereby, the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1 is effectively removed, and a good processing rate for the chamfered portion 7 is obtained. It is possible to secure.
　図１１を参照して、これに対して、比較例における研磨用ブラシ８０Ｚにおいては、複数本のブラシ毛材８３，８３が、軸心部材８２の表面に対して垂直に起立するように植え付けられるとともに、相互に略均等な間隔を持って配置されている。 Referring to FIG. 11, on the other hand, in the polishing brush 80 </ b> Z in the comparative example, a plurality of brush bristle materials 83, 83 are planted so as to stand vertically with respect to the surface of the shaft center member 82. At the same time, they are arranged with substantially equal intervals.
　図１２を参照して、重ねられた状態にある複数枚のガラス素板１の内周端面４を研磨用ブラシ８０Ｚを用いて研磨する際、研磨用ブラシ８０Ｚのブラシ毛材８３は、内周端面４および面取部７に当接することによって外側に向かって広がってしまう。複数のブラシ毛材８３，８３の各々の毛先は、ガラス素板１の内周端面４および面取部７に接触する際、狭い範囲に集中することはない。隣り合うガラス素板１の面取部７，７同士の間に対しては、常に一定の弱い荷重が掛けられるのみで、本実施の形態の研磨用ブラシ８０とは異なり定期的に強い荷重をかけることはできない。結果として、隣り合うガラス素板１の面取部７，７同士の間に残留しているスラッジ８８（研磨屑）を効果的に除去することは困難となる。 Referring to FIG. 12, when polishing inner peripheral end surfaces 4 of a plurality of glass base plates 1 in an overlapped state using polishing brush 80Z, brush bristle material 83 of polishing brush 80Z has an inner periphery. By abutting against the end face 4 and the chamfered portion 7, it spreads outward. The bristles of each of the plurality of brush bristle materials 83 and 83 do not concentrate in a narrow range when contacting the inner peripheral end surface 4 and the chamfered portion 7 of the glass base plate 1. A constant weak load is always applied between the chamfered portions 7, 7 of the adjacent glass base plates 1, and unlike the polishing brush 80 of the present embodiment, a strong load is periodically applied. I can't call it. As a result, it becomes difficult to effectively remove the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1.
　したがって、本実施の形態におけるガラス基板の製造方法に用いられる研磨用ブラシ８０によれば、複数のブラシ毛材８３，８３の各々の毛先は、ガラス素板１の内周端面４および面取部７に接触する際、狭い範囲に集中し、隣り合うガラス素板１の面取部７，７同士の間にも定期的に強い荷重をかけることが可能となる。これにより、隣り合うガラス素板１の面取部７，７同士の間に残留しているスラッジ８８（研磨屑）は効果的に除去されることとなり、面取部７に対する良好な加工レートを確保する事が可能となる。 Therefore, according to the polishing brush 80 used in the method for manufacturing a glass substrate in the present embodiment, each of the bristles of the plurality of brush bristle materials 83, 83 has the inner peripheral end face 4 and the chamfer of the glass base plate 1. When contacting the part 7, it concentrates on a narrow range and it becomes possible to apply a heavy load regularly also between the chamfering parts 7 and 7 of the adjacent glass base plate 1. FIG. Thereby, the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1 is effectively removed, and a good processing rate for the chamfered portion 7 is obtained. It is possible to secure.
　外周端面研磨工程（Ｓ５２）については、研磨用ブラシ８０と同様なものが用いられる。外周端面研磨工程（Ｓ５２）の際には、内周端面研磨工程（Ｓ５１）と同様に、複数枚のガラス素板１が重ねられた状態で外周端面６が研磨される。端面研磨工程（Ｓ５０）においては、ブロック体９（図８参照）および研磨用ブラシ８０が研磨液の中に完全に浸漬された状態で研磨処理が実施されても良いが、内周端面４または外周端面６と研磨用ブラシ８０との間に研磨スラリーが流し込まれつつ（掛け流されつつ）、研磨処理が実施されてもよい。 For the outer peripheral end surface polishing step (S52), the same polishing brush 80 is used. In the outer peripheral end face polishing step (S52), the outer peripheral end face 6 is polished in a state where a plurality of glass base plates 1 are stacked, as in the inner peripheral end face polishing step (S51). In the end surface polishing step (S50), the polishing process may be performed in a state where the block body 9 (see FIG. 8) and the polishing brush 80 are completely immersed in the polishing liquid. The polishing treatment may be performed while the polishing slurry is poured (spread) between the outer peripheral end face 6 and the polishing brush 80.
　（Ｓ６０：ラップ加工工程）
　図６を再び参照して、端面研磨工程（Ｓ５０）を経たガラス素板１（ガラス素板１）を洗浄した後、ラッピング加工が行なわれる。砥粒の粒度をより細かいものに変更した後、ガラス素板１の主表面２，３に対してラッピング装置を用いたラッピング加工が行なわれる。 (S60: Lapping process)
Referring to FIG. 6 again, lapping is performed after cleaning glass substrate 1 (glass substrate 1) that has undergone the end surface polishing step (S50). After changing the grain size of the abrasive grains to a finer one, lapping using a lapping device is performed on the main surfaces 2 and 3 of the glass base plate 1.
　（Ｓ７０：ポリッシュ加工工程）
　ラップ加工工程（Ｓ６０）を経たガラス素板１を洗浄した後、ポリッシュ加工が行なわれる。研磨装置（硬質および軟質の研磨パッド）を用いて、ガラス素板１の主表面２，３に対してポリッシュ加工が行なわれる。 (S70: Polishing process)
After the glass base plate 1 that has undergone the lapping process (S60) is washed, a polishing process is performed. Polishing is performed on the main surfaces 2 and 3 of the glass base plate 1 using a polishing apparatus (hard and soft polishing pads).
　（Ｓ８０：化学強化工程）
　次に、洗浄工程を終えたガラス素板１に化学強化処理を実施する。化学強化処理槽を準備し、その中に硝酸カリウム（６０％）と硝酸ナトリウム（４０％）とを混合した化学強化液を貯留する。化学強化液を３００℃～４００℃に加熱するとともに、洗浄済みのガラス素板１を２００℃～３００℃に予熱する。 (S80: Chemical strengthening process)
Next, a chemical strengthening process is implemented to the glass base plate 1 which finished the washing | cleaning process. A chemical strengthening treatment tank is prepared, and a chemical strengthening liquid in which potassium nitrate (60%) and sodium nitrate (40%) are mixed is stored therein. The chemical strengthening liquid is heated to 300 ° C. to 400 ° C. and the cleaned glass base plate 1 is preheated to 200 ° C. to 300 ° C.
　化学強化液中に、ガラス素板１が３時間～４時間浸漬される。浸漬の際には、ガラス素板１の表面全体が化学強化されるため、複数のガラス素板１が各々の端面で保持されるように、複数のガラス素板１がホルダー等に収納された状態で浸漬されることが好ましい。 The glass base plate 1 is immersed in the chemical strengthening solution for 3 to 4 hours. Since the entire surface of the glass base plate 1 is chemically strengthened during the immersion, the plurality of glass base plates 1 are accommodated in a holder or the like so that the plurality of glass base plates 1 are held by the respective end faces. It is preferable to be immersed in a state.
　ガラス素板１に含まれるリチウムイオン、ナトリウムイオン等のアルカリ金属イオンは、これらのイオンに比べてイオン半径の大きなカリウムイオン等のアルカリ金属イオンによって置換される（イオン交換法）。イオン半径の違いによって生じる歪みより、イオン交換された領域に圧縮応力が発生し、ガラス素板の両主表面が強化される。 The alkali metal ions such as lithium ions and sodium ions contained in the glass base plate 1 are replaced by alkali metal ions such as potassium ions having a larger ion radius than these ions (ion exchange method). Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and both main surfaces of the glass base plate are strengthened.
　以上の各工程が終了した後、ガラス素板１に残存している付着物がなくなるように、ガラス素板１は９５０ｋＨｚの高周波を用いて超音波洗浄されたり、アルカリ洗剤を用いて洗浄されたりする。その後、ＩＰＡベーパーを用いてガラス素板１は乾燥される。以上により、本実施の形態におけるガラス基板が得られる。 After the above steps are completed, the glass base plate 1 is ultrasonically cleaned using a high frequency of 950 kHz, or cleaned using an alkaline detergent so that the adhered matter remaining on the glass base plate 1 is eliminated. To do. Thereafter, the glass base plate 1 is dried using IPA vapor. Thus, the glass substrate in the present embodiment is obtained.
　化学強化工程を経た後にガラス基板１の主表面上に残留している付着物が除去されることによって、ガラス基板１（図２および図３参照）を用いて製造される磁気ディスクなどの情報記録媒体１０（図４および図５参照）にヘッドクラッシュが発生することが低減される。本実施の形態におけるガラス基板の製造方法（Ｓ１００）としては、以上のように構成される。 Information recording such as a magnetic disk manufactured using the glass substrate 1 (see FIGS. 2 and 3) by removing the deposits remaining on the main surface of the glass substrate 1 after the chemical strengthening process. The occurrence of head crashes in the medium 10 (see FIGS. 4 and 5) is reduced. The glass substrate manufacturing method (S100) in the present embodiment is configured as described above.
　（Ｓ２００：磁気薄膜形成工程）
　化学強化処理が完了したガラス基板の両主表面（またはいずれか一方の主表面）に対し、磁気記録層が形成される。磁気記録層は、たとえば、Ｃｒ合金からなる密着層、ＣｏＦｅＺｒ合金からなる軟磁性層、Ｒｕからなる配向制御下地層、ＣｏＣｒＰｔ合金からなる垂直磁気記録層、Ｃ系からなる保護層、およびＦ系からなる潤滑層が順次成膜されることによって形成される。磁気記録層の形成によって、図４および図５に示す情報記録媒体１０を得ることができる。 (S200: Magnetic thin film formation process)
Magnetic recording layers are formed on both main surfaces (or one of the main surfaces) of the glass substrate that has been subjected to the chemical strengthening treatment. The magnetic recording layer includes, for example, an adhesion layer made of a Cr alloy, a soft magnetic layer made of a CoFeZr alloy, an orientation control underlayer made of Ru, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer made of a C system, and an F system. Are formed by sequentially forming the lubricating layer. By forming the magnetic recording layer, the information recording medium 10 shown in FIGS. 4 and 5 can be obtained.
　（作用・効果）
　上述したように、本実施の形態におけるガラス基板の製造方法においては、研磨用ブラシ８０の複数のブラシ毛材８３，８３の各々の毛先は、ガラス素板１の内周端面４および面取部７に接触する際、狭い範囲に集中し、隣り合うガラス素板１の面取部７，７同士の間にも定期的に強い荷重をかけることが可能となる。これにより、隣り合うガラス素板１の面取部７，７同士の間に残留しているスラッジ８８（研磨屑）は効果的に除去されることとなり、面取部７に対する良好な加工レートを確保する事が可能となる。 (Action / Effect)
As described above, in the glass substrate manufacturing method according to the present embodiment, each of the bristles of the plurality of brush bristle materials 83 of the polishing brush 80 has the inner peripheral end face 4 and the chamfered chamfer of the glass base plate 1. When contacting the part 7, it concentrates on a narrow range and it becomes possible to apply a heavy load regularly also between the chamfering parts 7 and 7 of the adjacent glass base plate 1. FIG. Thereby, the sludge 88 (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1 is effectively removed, and a good processing rate for the chamfered portion 7 is obtained. It is possible to secure.
　［実験例］
　図１３を参照して、実施例として、上記の実施の形態に基づく実施例１～３と、これらに対する比較例１～３とについて実験を行なった。実施例１～３および比較例１～３において、ガラス素板準備工程、平坦度を確保するアルミナ研磨工程、コアリング加工工程、および端面研削工程については、上述の実施の形態と同一の条件である。 [Experimental example]
Referring to FIG. 13, as an example, experiments were performed on examples 1 to 3 based on the above-described embodiment and comparative examples 1 to 3 for these. In Examples 1 to 3 and Comparative Examples 1 to 3, the glass base plate preparation process, the alumina polishing process for ensuring flatness, the coring process, and the end face grinding process are performed under the same conditions as in the above-described embodiment. is there.
　内周端面研磨工程における内周端面の研磨条件としては、一回の加工枚数を４００枚のブロック体９とし、螺旋状のブラシ毛束８１を有する研磨用ブラシ８０の回転数は４０００ｒｐｍに設定し、ブロック体９の回転数は３０ｒｐｍに設定した。ガラス素板１の孔５の内径は２０．０１ｍｍであり、研磨加工時間は２０ｍｉｎである。研磨の際には、研磨スラリーを内周端面４と研磨用ブラシ８０との間に掛け流した。内周端面研磨工程に用いた研磨ブラシについては、後述するように、実施例１～３および比較例１～３においてそれぞれ異なるものを使用した。外周端面研磨においては、ブラシ研磨とし、酸化セリウムを使用した。酸化セリウムの濃度は１５ｗｔ％とした。 As polishing conditions for the inner peripheral end face in the inner peripheral end face polishing step, the number of processed sheets is 400 blocks 9, and the rotational speed of the polishing brush 80 having the spiral brush bristles 81 is set to 4000 rpm. The rotational speed of the block body 9 was set to 30 rpm. The inner diameter of the hole 5 of the glass base plate 1 is 20.01 mm, and the polishing time is 20 min. At the time of polishing, polishing slurry was poured between the inner peripheral end face 4 and the polishing brush 80. As the polishing brush used in the inner peripheral end face polishing step, different ones were used in Examples 1 to 3 and Comparative Examples 1 to 3 as described later. In the outer peripheral end face polishing, brush polishing was used and cerium oxide was used. The concentration of cerium oxide was 15 wt%.
　ラップ加工においては、実施例１～３および比較例１～３に共通して、両面研磨機およびダイヤモンドシート固定砥粒による研削を行なった。ポリッシュ加工工程においては、実施例１～３および比較例１～３に共通して、第１ポリッシュ加工工程（Ｐ１）として、セリア砥粒および硬質ウレタンパッドを使用し、第２ポリッシュ加工工程（Ｐ２）として、コロイダルシリカ砥粒および硬質スウェードパッドを使用した。その後、得られたガラス素板１に対して化学強化を行ない、ガラス基板を得た。 In lapping, grinding was performed with a double-side polishing machine and diamond sheet fixed abrasive grains in common with Examples 1 to 3 and Comparative Examples 1 to 3. In the polishing process, in common with Examples 1 to 3 and Comparative Examples 1 to 3, the first polishing process (P1) uses ceria abrasive grains and a hard urethane pad, and the second polishing process (P2 ), Colloidal silica abrasive grains and hard suede pads were used. Thereafter, the obtained glass base plate 1 was chemically strengthened to obtain a glass substrate.
　（比較例１）
　図１３および図１４を参照して、比較例１において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．５ｍｍであり、ブラシ毛材８３の毛先範囲Ｑは１．０５ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、７０％である。ブラシ毛束８１の毛先形状としては、放射状を呈している。 (Comparative Example 1)
With reference to FIGS. 13 and 14, the polishing brush used in Comparative Example 1 has a brush bristle material 83 with a length L of 4 mm, and the brush bristle material 83 has a planting range R of 1.5 mm. The bristle tip range Q of the brush bristle material 83 is 1.05 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 70%. The bristle tip 81 has a radial tip shape.
　（比較例２）
　図１３および図１５を参照して、比較例２において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．５ｍｍであり、ブラシ毛材８３の毛先範囲Ｑは０．７５ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、５０％である。ブラシ毛束８１の毛先形状としては、平坦状を呈している。 (Comparative Example 2)
Referring to FIGS. 13 and 15, the polishing brush used in Comparative Example 2 has a brush bristle material 83 with a length L of 4 mm, and the brush bristle material 83 has a planting range R of 1.5 mm. The bristle tip range Q of the brush bristle material 83 is 0.75 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 50%. The bristle tip 81 has a flat tip shape.
　（実施例１）
　図１３、図１６、および図１７を参照して、実施例１において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．５ｍｍであり、ブラシ毛材８３の毛先範囲Ｑは０．６０ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、４０％である。ブラシ毛束８１の毛先形状としては、円弧８９（図１７参照）を描くようにカール状（円弧状）を呈している。 Example 1
With reference to FIGS. 13, 16, and 17, in the polishing brush used in Example 1, the length L of the brush bristle material 83 is 4 mm, and the planting range R of the brush bristle material 83 is 1. The bristle tip range Q of the brush bristle material 83 is 0.60 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 40%. The bristles of the bristle bundle 81 have a curl shape (arc shape) so as to draw an arc 89 (see FIG. 17).
　（実施例２）
　図１３、図１６、および図１７を参照して、実施例１と同様に、実施例２において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．５ｍｍである。実施例２においては、ブラシ毛材８３の毛先範囲Ｑは０．４５ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、３０％である。ブラシ毛束８１の毛先形状としては、実施例１と同様に、円弧８９（図１７参照）を描くようにカール状（円弧状）を呈している。 (Example 2)
Referring to FIGS. 13, 16, and 17, similarly to Example 1, the polishing brush used in Example 2 has a length L of the brush bristle material 83 of 4 mm. The planting range R is 1.5 mm. In Example 2, the bristle tip range Q of the brush bristle material 83 is 0.45 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 30%. As in the case of the first embodiment, the bristles 81 of the bristle bundle 81 have a curl shape (arc shape) so as to draw an arc 89 (see FIG. 17).
　（比較例３）
　図１３および図１８を参照して、比較例３において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．２ｍｍであり、ブラシ毛材８３の毛先範囲Ｑは０．６０ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、５０％である。ブラシ毛束８１の毛先形状としては、平坦状を呈している。 (Comparative Example 3)
With reference to FIG. 13 and FIG. 18, the polishing brush used in Comparative Example 3 has a length L of the brush bristle material 83 of 4 mm, and a planting range R of the brush bristle material 83 is 1.2 mm. The bristle tip range Q of the brush bristle material 83 is 0.60 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 50%. The bristle tip 81 has a flat tip shape.
　（実施例３）
　図１３および図１９を参照して、実施例３において用いた研磨用ブラシは、ブラシ毛材８３の長さＬが４ｍｍであり、ブラシ毛材８３の植付範囲Ｒは１．５ｍｍであり、ブラシ毛材８３の毛先範囲Ｑは０．６０ｍｍである。植付範囲Ｒと毛先範囲Ｑとから算出されるＱ／Ｒ比は、４０％である。ブラシ毛束８１の毛先形状としては、平坦状を呈している。 (Example 3)
With reference to FIG. 13 and FIG. 19, in the polishing brush used in Example 3, the length L of the brush bristle material 83 is 4 mm, the planting range R of the brush bristle material 83 is 1.5 mm, The bristle tip range Q of the brush bristle material 83 is 0.60 mm. The Q / R ratio calculated from the planting range R and the hair tip range Q is 40%. The bristle tip 81 has a flat tip shape.
　実施例１～３および比較例１～３によって得られたガラス素板１に対して、内周端面４の面取部７（チャンファー面）の検査を行なった。検査方法としては、内周端面４の面取部７について、ＡＦＭ（ビーコ社製Ｄｉｍｅｎｓｉｏｎ３１００および計測ソフトＮａｎｏＳｃｏｐｅ７．２）を使用して粗さ計測を行い、表面粗さＲａの値が１．０ｎｍ以上であるガラス素板１の割合を調査し、該当するガラス素板１の割合が１０％以上の場合をＢ評価とし、１０％未満６％以上の場合をＡ評価とし、６％未満の場合をＳ評価とした。 For the glass base plate 1 obtained in Examples 1 to 3 and Comparative Examples 1 to 3, the chamfered portion 7 (chamber surface) of the inner peripheral end face 4 was inspected. As an inspection method, the chamfered portion 7 of the inner peripheral end face 4 is measured for roughness using an AFM (Dimension 3100 manufactured by Beco Co., Ltd. and measurement software NanoScope 7.2), and the value of the surface roughness Ra is 1.0 nm or more. The ratio of the glass base plate 1 is investigated, the case where the ratio of the corresponding glass base plate 1 is 10% or more is B evaluation, the case of less than 10% and 6% or more is A evaluation, and the case of less than 6% It was set as S evaluation.
　また、ガラス素板１に成膜処理を施して情報記録媒体１０としたものを、実際の情報記録装置３０（ハードディスクドライブ）に組み込み、各条件について５０台ずつのリードライト試験を行ない、良品率を確認した。 Further, the information recording medium 10 formed by subjecting the glass base plate 1 to film formation is incorporated into an actual information recording device 30 (hard disk drive), and 50 read / write tests are performed for each condition. It was confirmed.
　図１３に示すように、その結果、実施例１～３においては面取部７の状態がいずれもＡ評価またはＳ評価であったのに対して、比較例１～３においてはすべてＢ評価であった。また、実施例１，２においては、実施例３よりも良い評価が得られた。ブラシ毛束８１の毛先形状がカール状（円弧状）を呈していることにより、ブラシ毛材８３の先端部分が面取部７，７間の奥まで入り込む事により、面取部７をムラなく研磨する事ができたものと考えられる。 As shown in FIG. 13, as a result, in Examples 1 to 3, the state of the chamfered portion 7 was A evaluation or S evaluation, whereas in Comparative Examples 1 to 3, all were B evaluation. there were. Moreover, in Examples 1 and 2, evaluation better than Example 3 was obtained. When the bristles of the bristle bundle 81 are curled (arc-shaped), the tip of the brush bristle material 83 penetrates deeply between the chamfered portions 7 and 7, thereby making the chamfered portion 7 uneven. It is thought that it was possible to polish without any problems.
　また、比較例１，２，３においては、ガラス素板１の内周端面４の不十分な研磨に起因し、溶出物が発生してガラス素板１の表面に付着し、成膜後の情報記録媒体１０においてディフェクトとなり、記録特性に異常が発生したものと考えられる。 Moreover, in Comparative Examples 1, 2, and 3, due to insufficient polishing of the inner peripheral end face 4 of the glass base plate 1, an eluate is generated and adheres to the surface of the glass base plate 1, and after film formation It is considered that a defect occurred in the information recording medium 10 and an abnormality occurred in the recording characteristics.
　また、実施例１と毛先範囲Ｑが等しく、毛先範囲Ｑが植付範囲Ｒと等しくした比較例３では、実施例１に比べて好ましくない結果が得られた。これは、ブラシ毛材８３の毛先がガラス素板１に当たる際に特定の方向に寝るため、研磨レートが低下した結果であると考えられる。 Further, in Comparative Example 3 in which the hair tip range Q is equal to that in Example 1 and the hair tip range Q is equal to the planting range R, an unfavorable result was obtained as compared with Example 1. This is considered to be a result of a decrease in the polishing rate because the bristles of the brush bristle material 83 fall in a specific direction when they hit the glass base plate 1.
　また、実施例３では、ブラシ毛束８１としての先端部分を、植付方法の工夫により平坦状とした。端面検査の結果はＡ評価であったが、記録特性試験は実施例１よりもやや低かった。原因を調査したところ、実施例３では面取部７の粗さは合格水準に達しているものの、主表面付近と内周端面４付近とで値にバラツキをもっている事が分かった。これは、先端で集中したブラシ毛材８３の毛先が、実施例１の方が実施例３の場合に比べて面取部７の隙間に上手く入っている事が原因であると考えられる。 Moreover, in Example 3, the tip part as the bristle bundle 81 was made flat by devising the planting method. The result of the end face inspection was A evaluation, but the recording characteristic test was slightly lower than Example 1. When the cause was investigated, in Example 3, the roughness of the chamfered portion 7 reached the acceptable level, but it was found that there was a variation in the values near the main surface and near the inner peripheral end surface 4. This is considered to be caused by the fact that the bristles of the brush bristle material 83 concentrated at the tip are better in the gap of the chamfered portion 7 in the first embodiment than in the third embodiment.
　したがって、本実施例の結果からも、上述の実施の形態における研磨用ブラシ８０によれば、研磨用ブラシ８０の複数のブラシ毛材８３，８３の各々の毛先は、ガラス素板１の内周端面４および面取部７に接触する際、狭い範囲に集中し、隣り合うガラス素板１の面取部７，７同士の間にも定期的に強い荷重をかけることが可能となることがわかる。これにより、隣り合うガラス素板１の面取部７，７同士の間に残留しているスラッジ（研磨屑）は効果的に除去されることとなり、面取部７に対する良好な加工レートを確保する事が可能となることがわかる。 Therefore, also from the result of this example, according to the polishing brush 80 in the above-described embodiment, the hair tips of the plurality of brush bristle materials 83, 83 of the polishing brush 80 are within the glass base plate 1. When contacting the peripheral end surface 4 and the chamfered portion 7, it is possible to concentrate in a narrow range and periodically apply a heavy load between the chamfered portions 7, 7 of the adjacent glass base plates 1. I understand. Thereby, sludge (polishing waste) remaining between the chamfered portions 7 and 7 of the adjacent glass base plates 1 is effectively removed, and a good processing rate for the chamfered portion 7 is secured. It turns out that it is possible to do.
　以上、本発明に基づいた各実施の形態および各実施例について説明したが、今回開示された各実施の形態および各実施例はすべての点で例示であって制限的なものではない。本発明の技術的範囲は請求の範囲によって示され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 As mentioned above, although each embodiment and each Example based on this invention were demonstrated, each embodiment and each Example disclosed this time are illustrations in all points, and are not restrictive. The technical scope of the present invention is defined by the terms of the claims, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.
　１　ガラス基板（ガラス素板）、２，３　主表面、４　内周端面、５，１５　孔、６　外周端面、７，８　面取部、９　ブロック体、１０　情報記録媒体、１２　化学強化層、１４　磁気記録層、２０　筐体、２１　ヘッドスライダー、２２　サスペンション、２３　アーム、２４　垂直軸、２５　ボイスコイル、２６　ボイスコイルモーター、２７　クランプ部材、２８　固定ネジ、３０　情報記録装置、８０，８０Ｚ　研磨用ブラシ、８１　ブラシ毛束、８１Ｃ　中心線、８２　軸心部材、８３　ブラシ毛材、８５　回転軸、８８　スラッジ、８９　円弧、Ｑ　毛先範囲、Ｒ　植付範囲、Ｒ１　植え付け基部、Ｒ２　領域。 DESCRIPTION OF SYMBOLS 1 Glass substrate (glass base plate), 2, 3 main surface, 4 inner peripheral end surface, 5,15 hole, 6 outer peripheral end surface, 7,8 chamfer part, 9 block body, 10 information recording medium, 12 chemical strengthening layer, 14 magnetic recording layer, 20 housing, 21 head slider, 22 suspension, 23 arm, 24 vertical axis, 25 voice coil, 26 voice coil motor, 27 clamp member, 28 fixing screw, 30 information recording device, 80, 80Z for polishing Brush, 81 brush hair bundle, 81C center line, 82 shaft center member, 83 brush hair material, 85 rotating shaft, 88 sludge, 89 arc, Q hair tip range, R planting range, R1 planting base, R2 region.

Claims (4)

  1. 　内周端面を有する複数枚のガラス素板を準備する工程と、
    　複数本のブラシ毛材からなるブラシ毛束が軸心部材の外周面に螺旋状に植え付けられた研磨用ブラシを準備する工程と、
    　複数枚の前記ガラス素板を重ねた後、重ねられた状態にある複数枚の前記ガラス素板の前記内周端面と前記ブラシ毛束の先端とが互いに対向するように前記研磨用ブラシを配置する工程と、
    　前記研磨用ブラシを回転させ、重ねられた状態にある複数枚の前記ガラス素板の前記内周端面に対して前記ブラシ毛束を摺動させることにより、複数枚の前記ガラス素板の前記内周端面を研磨する工程と、を備え、
    　前記研磨用ブラシの回転軸に対して平行な方向において、複数本の前記ブラシ毛材は、複数本の前記ブラシ毛材が前記軸心部材に植え付けられている植え付け基部の幅に比べて、その植え付け基部から延びる複数本の前記ブラシ毛材の各々の先端によって形成される領域の幅の方が小さくなるように、前記軸心部材に植え付けられている、
    情報記録媒体用ガラス基板の製造方法。     Preparing a plurality of glass base plates having an inner peripheral end surface;
    A step of preparing a polishing brush in which a brush bristle bundle composed of a plurality of brush bristle materials is spirally planted on the outer peripheral surface of the shaft center member;
    After the plurality of glass base plates are stacked, the polishing brush is arranged so that the inner peripheral end surfaces of the plurality of glass base plates in the stacked state and the tip of the brush bristle bundle face each other. And a process of
    By rotating the polishing brush and sliding the bristle bundle against the inner peripheral end surfaces of the plurality of glass base plates in a stacked state, Polishing the peripheral end surface, and
    In a direction parallel to the rotational axis of the polishing brush, the plurality of brush bristle materials are compared with the width of the planting base in which the plurality of brush bristle materials are planted on the shaft center member. The shaft center member is planted so that the width of the region formed by the tips of each of the plurality of brush bristle members extending from the planting base is smaller.
    A method for producing a glass substrate for an information recording medium.
  2. 　前記研磨用ブラシの回転軸に対して平行な方向において、複数本の前記ブラシ毛材は、複数本のうちの９５％以上の前記ブラシ毛材の先端が、前記軸心部材の表面に対して垂直な方向に延びる前記植え付け基部の幅方向の中心線を基準として±４０％以内の範囲内に位置するように、前記軸心部材に植え付けられている、
    請求項１に記載の情報記録媒体用ガラス基板の製造方法。     In a direction parallel to the rotation axis of the polishing brush, the plurality of brush bristle members have 95% or more of the plurality of brush bristle tips with respect to the surface of the shaft center member. Planted in the shaft member so as to be within a range of ± 40% with respect to a center line in the width direction of the planting base extending in the vertical direction;
    The manufacturing method of the glass substrate for information recording media of Claim 1.
  3. 　前記研磨用ブラシの回転軸に対して平行な方向において、複数本の前記ブラシ毛材は、前記ブラシ毛束としての先端が円弧状を呈するように、前記軸心部材に植え付けられている、
    請求項２に記載の情報記録媒体用ガラス基板の製造方法。     In a direction parallel to the rotational axis of the polishing brush, the plurality of brush bristle materials are planted on the shaft member such that the tips of the bristle bundles have an arc shape.
    The manufacturing method of the glass substrate for information recording media of Claim 2.
  4. 　請求項１から３のいずれかに記載の情報記録媒体用ガラス基板の製造方法を使用して製造された、
    情報記録媒体用ガラス基板。     It manufactured using the manufacturing method of the glass substrate for information recording media in any one of Claim 1 to 3.
    Glass substrate for information recording media.
PCT/JP2012/082488 2011-12-28 2012-12-14 Glass substrate for information recording medium and method for producing same WO2013099657A1 (en)

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