WO2013099656A1 - Glass substrate for information recording medium and method for producing same - Google Patents

Glass substrate for information recording medium and method for producing same Download PDF

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Publication number
WO2013099656A1
WO2013099656A1 PCT/JP2012/082485 JP2012082485W WO2013099656A1 WO 2013099656 A1 WO2013099656 A1 WO 2013099656A1 JP 2012082485 W JP2012082485 W JP 2012082485W WO 2013099656 A1 WO2013099656 A1 WO 2013099656A1
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WIPO (PCT)
Prior art keywords
glass base
grinding
polishing
base plates
base plate
Prior art date
Application number
PCT/JP2012/082485
Other languages
French (fr)
Japanese (ja)
Inventor
小松 隆史
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コニカミノルタ株式会社
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Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Publication of WO2013099656A1 publication Critical patent/WO2013099656A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/005Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor for mass articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • the present invention relates to a glass substrate for information recording media and a method for manufacturing the same, and in particular, a glass substrate for information recording media mounted as part of an information recording medium in an information recording device such as a hard disk drive (HDD), and It relates to the manufacturing method.
  • HDD hard disk drive
  • An information recording medium (magnetic disk) is mounted inside an information recording device such as a hard disk drive.
  • the information recording medium is manufactured by forming a magnetic recording layer for magnetic recording on the main surface of a disk-shaped glass substrate having a hole in the center.
  • a glass substrate used for manufacturing an information recording medium is referred to as an information recording medium glass substrate (hereinafter also simply referred to as a glass substrate).
  • a method for manufacturing a glass substrate for an information recording medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 2006-236561 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2007-250145 (Patent Document 2).
  • the impact resistance required for information recording media tends to increase year by year.
  • the impact resistance of the information recording medium is reduced.
  • the inner and outer peripheral end faces of the information recording medium need to be formed sufficiently smooth by polishing.
  • a glass substrate (glass base plate) is ground by a grinding process and then polished with a polishing slurry. From the standpoint of improving manufacturing efficiency, etc., when performing polishing on the inner peripheral end face or outer peripheral end face of the glass base plate, the glass base plate is batch-polished in a state where a plurality of glass base plates are stacked. May be processed.
  • the present inventors examined the cause of variation between end surfaces (end surface shape before polishing treatment) of a plurality of stacked glass base plates, and the cause was grinding the end surfaces of the glass base plates. It was found that this was caused by the end face grinding process.
  • the end surface of the glass base plate is ground using the grinding surface of the grindstone.
  • the shape of the end face of the glass base plate after the grinding treatment has a unique wrinkle for each grinding surface of the grindstone because the shape of the grinding face of the grindstone is transferred almost as it is to the end face of the glass base plate.
  • glass base plates having different end face shapes ( ⁇ ) are mixed in the plurality of stacked glass base plates. It will be.
  • the inventors of the present invention can overlap a plurality of glass base plates that have been ground with different grindstones or different grinding surfaces, so that the shape (end surface before polishing treatment) is between the end faces of the plurality of stacked glass base plates. It was found that the variation in the shape of the end surfaces of the plurality of glass base plates that had been subjected to batch polishing was caused.
  • An object of the present invention is to provide a glass substrate for an information recording medium capable of suppressing the occurrence of variation in shape and a method for manufacturing the same.
  • a method for manufacturing a glass substrate for an information recording medium comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface.
  • the first grinding step of grinding the end face of the glass base plate for one sheet and the second grindstone grinding surface are used to grind the end face of the glass base plate for the second number of the predetermined number.
  • the first number of glass base plates ground in the first grinding step and the second ground ground in the second grinding step.
  • a method of manufacturing a glass substrate for an information recording medium comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface, Using the first grinding step of grinding the end face of the glass base plate for the first number of sheets and the second grinding wheel grinding surface, the end face of the glass base plate for the second number of the predetermined number of sheets is used.
  • a second grinding step for grinding and a plurality of the glass base plates of the predetermined number of the ground end surfaces are stacked, and the end surfaces of the plurality of the glass base plates in a stacked state are used as a polishing member
  • the first glass sheets ground in the first grinding step are stacked as a continuous mass
  • the plurality of stacked glass elements are stacked. The end face of the plate is polished.
  • the method for manufacturing a glass substrate for an information recording medium further includes a step of preparing a rod-shaped positioning member, and the glass base plate is directed from one main surface to the other main surface.
  • the end surface is an inner peripheral end surface that forms the hole, and in the step of polishing the inner peripheral end surface, the plurality of glass base plates in the stacked state are By inserting the positioning member into the hole, the plurality of glass base plates in a stacked state are positioned, and the outer diameter of the positioning member is ⁇ 0.05 mm or more with respect to the inner diameter of the hole. It is a dimension of 03 mm or less.
  • the polishing member is a polishing brush having a plurality of brush bristle materials on a surface thereof, and in the step of polishing the end surface, the end surfaces of the plurality of stacked glass base plates are used for the polishing. It is ground by the brush bristle material of the brush, and the length from the root to the hair tip of the brush bristle material is within 4 mm.
  • a polishing slurry is poured between the polishing member and the end face.
  • the first grinding wheel grinding surface and / or the second grinding wheel grinding surface are in contact with the end surface along the circumferential direction of the glass base plate. Slide.
  • the glass substrate for information recording medium based on the present invention is manufactured using the above-described method for manufacturing a glass substrate for information recording medium based on the present invention.
  • the present invention even when batch polishing is performed on a plurality of glass base plates, information recording that can suppress the occurrence of variation in shape between the end faces of the plurality of glass base plates.
  • a glass substrate for a medium and a manufacturing method thereof can be obtained.
  • FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2. It is a top view which shows the information recording medium provided with the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment.
  • FIG. 5 is a cross-sectional view taken along line VV in FIG. 4. It is a flowchart which shows the manufacturing method of the glass substrate for information recording media in embodiment.
  • sectional drawing which shows a mode that the glass base plate from which end surface shape differs is mixed in a block body. It is sectional drawing (the 1) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. It is sectional drawing (the 2) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. It is sectional drawing which shows a mode when polishing slurry is poured between the brush for grinding
  • FIG. 1 is a perspective view showing the information recording apparatus 30.
  • the information recording apparatus 30 includes the glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium (hereinafter also simply referred to as a glass substrate) in the embodiment as the information recording medium 10.
  • the information recording device 30 includes an information recording medium 10, a housing 20, a head slider 21, a suspension 22, an arm 23, a vertical shaft 24, a voice coil 25, a voice coil motor 26, a clamp member 27, and a fixing screw. 28.
  • a spindle motor (not shown) is installed on the upper surface of the housing 20.
  • An information recording medium 10 such as a magnetic disk is rotatably fixed to the spindle motor by a clamp member 27 and a fixing screw 28.
  • the information recording medium 10 is rotationally driven by this spindle motor at, for example, several thousand rpm.
  • a chemically strengthened layer 12 see FIG. 5
  • a magnetic recording layer 14 see FIGS. 4 and 5 are formed on the glass substrate 1. To be manufactured.
  • the arm 23 is attached so as to be swingable around the vertical axis 24.
  • a suspension 22 formed in a leaf spring (cantilever) shape is attached to the tip of the arm 23.
  • a head slider 21 is attached to the tip of the suspension 22 so as to sandwich the information recording medium 10.
  • a voice coil 25 is attached to the opposite side of the arm 23 from the head slider 21.
  • the voice coil 25 is clamped by a magnet (not shown) provided on the housing 20.
  • a voice coil motor 26 is constituted by the voice coil 25 and the magnet.
  • a predetermined current is supplied to the voice coil 25.
  • the arm 23 swings around the vertical axis 24 by the action of electromagnetic force generated by the current flowing through the voice coil 25 and the magnetic field of the magnet.
  • the suspension 22 and the head slider 21 also swing in the direction of the arrow AR1.
  • the head slider 21 reciprocates on the front and back surfaces of the information recording medium 10 in the radial direction of the information recording medium 10.
  • a magnetic head (not shown) provided on the head slider 21 performs a seek operation.
  • the head slider 21 While the seek operation is performed, the head slider 21 receives a levitation force due to the air flow generated as the information recording medium 10 rotates. Due to the balance between the levitation force and the elastic force (pressing force) of the suspension 22, the head slider 21 travels with a constant flying height with respect to the surface of the information recording medium 10. By the traveling, the magnetic head provided on the head slider 21 can record and reproduce information (data) on a predetermined track in the information recording medium 10.
  • the information recording apparatus 30 on which the glass substrate 1 is mounted as a part of the members constituting the information recording medium 10 is configured as described above.
  • FIG. 2 is a plan view showing glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium according to the present embodiment.
  • 3 is a cross-sectional view taken along the line III-III in FIG.
  • the glass substrate 1 (glass substrate for information recording medium) used as a part of the information recording medium 10 (see FIGS. 4 and 5) has a main surface 2, a main surface 3, It has the inner peripheral end surface 4, the hole 5, and the outer peripheral end surface 6, and is formed in a disk shape as a whole.
  • the hole 5 is provided so as to penetrate from one main surface 2 toward the other main surface 3.
  • a chamfer 7 is formed between the main surface 2 and the inner peripheral end surface 4 and between the main surface 3 and the inner peripheral end surface 4.
  • a chamfered portion 8 (chamfer portion) is formed between the main surface 2 and the outer peripheral end surface 6 and between the main surface 3 and the outer peripheral end surface 6, a chamfered portion 8 (chamfer portion) is formed.
  • the size of the glass substrate 1 is, for example, 0.8 inch, 1.0 inch, 1.8 inch, 2.5 inch, or 3.5 inch.
  • the thickness of the glass substrate is, for example, 0.30 mm to 2.2 mm from the viewpoint of preventing breakage.
  • the glass substrate has an outer diameter of about 64 mm, an inner diameter of about 20 mm, and a thickness of about 0.8 mm.
  • the thickness of the glass substrate is a value calculated by averaging the values measured at a plurality of arbitrary points to be pointed on the glass substrate.
  • FIG. 4 is a plan view showing an information recording medium 10 provided with a glass substrate 1 as an information recording medium.
  • FIG. 5 is a cross-sectional view taken along the line VV in FIG.
  • the information recording medium 10 includes a glass substrate 1, a chemical strengthening layer 12, and a magnetic recording layer 14.
  • Chemical strengthening layer 12 is formed to cover main surfaces 2 and 3, inner peripheral end surface 4, and outer peripheral end surface 6 of glass substrate 1.
  • the magnetic recording layer 14 is formed so as to cover a predetermined region on the main surfaces 2 and 3 of the chemical strengthening layer 12.
  • a hole 15 is formed inside the inner peripheral end face 4.
  • the information recording medium 10 is fixed to a spindle motor provided on the housing 20 (see FIG. 1) using the holes 15.
  • the magnetic recording layer 14 is formed on both (both sides) the chemical strengthening layer 12 formed on the main surface 2 and the chemical strengthening layer 12 formed on the main surface 3. Is formed.
  • the magnetic recording layer 14 may be provided only on the chemical strengthening layer 12 (one side) formed on the main surface 2, or on the chemical strengthening layer 12 (one side) formed on the main surface 3. It may be provided.
  • the magnetic recording layer 14 is formed by spin-coating a thermosetting resin in which magnetic particles are dispersed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1 (spin coating method).
  • the magnetic recording layer 14 may be formed by a sputtering method or an electroless plating method performed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1.
  • the thickness of the magnetic recording layer 14 is about 0.3 ⁇ m to 1.2 ⁇ m for the spin coating method, about 0.04 ⁇ m to 0.08 ⁇ m for the sputtering method, and about 0.05 ⁇ m to about the electroless plating method. 0.1 ⁇ m. From the viewpoint of thinning and high density, the magnetic recording layer 14 is preferably formed by sputtering or electroless plating.
  • a Co-based alloy or the like containing Ni or Cr as a main component is added for the purpose of adjusting the residual magnetic flux density. Is preferably used.
  • the surface of the magnetic recording layer 14 may be thinly coated with a lubricant.
  • a lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon.
  • the magnetic recording layer 14 may be provided with a base layer or a protective layer as necessary.
  • the underlayer in the information recording medium 10 is selected according to the type of magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
  • the underlayer provided on the magnetic recording layer 14 is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked.
  • a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.
  • Examples of the protective layer for preventing wear and corrosion of the magnetic recording layer 14 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus together with the underlayer and the magnetic film. These protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.
  • Another protective layer may be formed on the protective layer or instead of the protective layer.
  • tetraalkoxylane is diluted with an alcohol-based solvent on a Cr layer, and then colloidal silica fine particles are dispersed and applied, followed by baking to form a silicon oxide (SiO 2 ) layer. It may be formed.
  • the glass substrate manufacturing method (S100) in the present embodiment includes a glass base plate preparation step (S10), an alumina polishing step (S20), a coring step (S30), an end surface grinding step (S40), and an end surface polishing step ( S50), a lapping process (S60), a polishing process (S70), and a chemical strengthening process (S80).
  • a magnetic recording layer deposition step (S200) is performed on the glass substrate obtained through the chemical strengthening step (S80).
  • the information recording medium 10 (see FIGS. 4 and 5) is obtained through the magnetic recording layer deposition step (S200).
  • the details of the steps S10 to S80 constituting the glass substrate manufacturing method (S100) will be described in order. In the following description, the simple cleaning appropriately performed between the steps S10 to S80 will be described in detail. It may not be listed.
  • a predetermined number of substantially disk-shaped glass base plates constituting the glass substrate are prepared.
  • the glass base plate can be obtained, for example, by directly pressing molten glass using an upper mold, a lower mold, and a body mold.
  • a disk-shaped glass base plate may be obtained by cutting out with a grinding wheel from a sheet glass formed by using a downdraw method or a float method.
  • alumina polishing is performed on a predetermined number of glass base plates.
  • the purpose of this alumina polishing treatment is to improve dimensional accuracy and shape accuracy.
  • the alumina polishing process is performed using a lapping apparatus. By using alumina abrasive grains of particle size # 400, setting the load to about 100 kg and rotating the inner and outer rotation gears, both main surfaces of the glass base plate housed in the carrier are polished.
  • the end surface grinding step (S40) in the present embodiment includes a first grinding step (S41) and a second grinding step (S42).
  • a grinding wheel 40 when a grinding process is performed on the inner peripheral end face 4 of a predetermined number of glass base plates 1 (glass substrate), a grinding wheel 40 is used.
  • the grinding wheel 40 includes grinding surfaces 41 to 46 and is rotatably supported by support portions 47 and 48.
  • the grinding surface 41 is brought into contact with the inner peripheral end surface 4 of the glass base plate 1 while the grinding wheel 40 receives driving force and rotates in the direction of the arrow AR40.
  • the inner peripheral end surface 4 of the glass base plate 1 has a chamfered portion 7 by sliding in the circumferential direction of the glass base plate 1 with the grinding surface 41 in contact with the inner peripheral end surface 4 of the glass base plate 1. It is ground to the shape.
  • First grinding step S41 In the end surface grinding step (S40) of the present embodiment, the inner circumference of the glass base plate 1 corresponding to the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. A grinding process is performed on the end surface 4 using a grinding surface 41 (first grinding wheel grinding surface). The service life of the grinding surface 41 expires by the grinding process for the first number of sheets.
  • the step of grinding the inner peripheral end face of the first number of glass base plates out of a predetermined number using the grinding surface 41 (first grindstone grinding face) is the first grinding step (S41) (inner peripheral end face 4). Corresponds to the grinding step).
  • Step S42 Thereafter, a grinding process is performed on the inner peripheral end face 4 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets using the grinding surface 42 (second grinding wheel grinding surface).
  • the service life of the grinding surface 42 expires by the second number of grinding processes.
  • the step of grinding the inner peripheral end surface of the second number of glass base plates out of a predetermined number using the grinding surface 42 (second grindstone grinding surface) is the second grinding step (S42) (inner peripheral end surface 4).
  • the 2nd grindstone grinding surface of this invention you may form in the grindstone 40 for grinding same as the grinding surface 41, or other grinding different from the grinding grindstone 40 in which the grinding surface 41 is formed. It may be formed on a grinding wheel for use.
  • a grinding wheel 50 is used.
  • the grinding wheel 50 includes grinding surfaces 51 to 56, and is rotatably supported by support portions 57 and 58.
  • the grinding surface 51 is brought into contact with the outer peripheral end surface 6 of the glass base plate 1 while the grinding wheel 50 receives driving force and rotates in the direction of the arrow AR50.
  • the outer peripheral end surface 6 of the glass base plate 1 has a predetermined shape having a chamfered portion 8 by sliding in the circumferential direction of the glass base plate 1 in a state where the ground surface 51 is in contact with the outer peripheral end surface 6 of the glass base plate 1. To be ground.
  • First grinding step S41 In the end surface grinding step (S40) of the present embodiment, the outer peripheral end surface of the glass base plate 1 of the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. 6 is ground using a grinding surface 51 (first grinding wheel grinding surface). The service life of the grinding surface 51 expires by the grinding process for the first number of sheets.
  • the step of grinding the inner peripheral end surface of the first number of glass base plates out of a predetermined number using the grinding surface 51 (first grindstone grinding surface) is the first grinding step (S41) (of the outer peripheral end surface 6). This corresponds to the grinding process.
  • the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground simultaneously, and the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground separately.
  • Step S42 Thereafter, a grinding process is performed using the grinding surface 52 (second grinding wheel grinding surface) on the outer peripheral end face 6 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets.
  • the service life of the grinding surface 52 is expired by the second number of grinding processes.
  • the step of grinding the outer peripheral end surface of the second number of glass substrates out of the predetermined number using the grinding surface 52 (second grinding wheel grinding surface) is the second grinding step (S42) (other than the outer peripheral end surface 6). Corresponds to the grinding step).
  • the end surface polishing step (S50) includes an inner peripheral end surface polishing step (S51) and an outer peripheral end surface polishing step (S52).
  • the fixing jig 60 includes a lid member 61 and a pedestal 64.
  • the lid member 61 has one opening 62 in the center and four openings 63 in the vicinity of the periphery.
  • the pedestal 64 has one opening 65 in the center and a support member 66 on the surface in the vicinity of the periphery.
  • the positions of the four support members 66 correspond to the positions of the four openings 63 provided in the lid member 61, and the four support members 66 are inserted into the four openings 63, respectively. 64 are fixed to each other.
  • the positioning tool 70 includes a pedestal 71 and a rod-shaped portion 72 (bar-shaped positioning member).
  • the rod-like portion 72 is formed in a columnar shape, and is provided so as to stand perpendicularly to the surface of the pedestal 71 at the center of the pedestal 71.
  • the glass base plate 1 on which the inner peripheral end face 4 and the outer peripheral end face 6 have been ground is placed in a block shape (block body 9), for example, in a state where 400 pieces are stacked.
  • 60 is accommodated inside four support members 66 (see arrow AR9).
  • the glass base plates 1 may be sequentially accommodated one by one so as to be laminated inside the four support members 66 of the fixing jig 60. After the plurality of glass base plates 1 are arranged inside the fixing jig 60, the positioning tool 70 is inserted from the opening 65.
  • FIG. 10 is a cross-sectional view showing a state in which the positioning tool 70 is inserted from the opening 65.
  • the plurality of glass base plates 1 are positioned (aligned) so as to be aligned on substantially the same straight line by the contact between the inner peripheral end face 4 and the rod-shaped portion 72.
  • the outer diameter D72 of the rod-like portion 72 (positioning member) is preferably a dimension of ⁇ 0.05 mm or more and ⁇ 0.03 mm or less with respect to the inner diameter D4 of the hole 5.
  • 400 glass base plates 1 are fixed between the lid member 61 and the pedestal 64 as the block body 9 while being positioned by the positioning tool 70.
  • a spacer or the like may be provided between the adjacent glass base plates 1.
  • the outer diameter D72 of the rod-like portion 72 is ⁇ 0.
  • the plurality of glass base plates 1 can be positioned with high accuracy.
  • a polishing brush 80 (abrasive member) is used when the polishing process is performed on the inner peripheral end surface 4 and the outer peripheral end surface 6 of the plurality of glass base plates 1.
  • the polishing brush 80 includes a plurality of brush bristle materials 81 and a shaft portion 82.
  • the brush bristle material 81 provided on the surface of the polishing brush 80 is disposed so as to surround the shaft portion 82 in a spiral shape.
  • the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is preferably 4 mm or less.
  • the grinding surface 41 and the grinding surface 42 of the grinding wheel 40 used in the first grinding step S41 of the end surface grinding step (S40) are slightly different from each other due to the influence of manufacturing errors and the like. Have different shapes. It is difficult to completely eliminate this manufacturing error, and the same applies to the grinding surfaces 43 to 46 shown in FIG. The same applies to the grinding surfaces 51 to 56 shown in FIG.
  • the chamfering grinding surface 41 a of the grinding surface 41 and the chamfering grinding surface 42 a of the grinding surface 42 are formed to have the same shape. Even in this case, the chamfering grinding surface 41 c of the grinding surface 41 may be formed longer than the chamfering grinding surface 42 c of the grinding surface 42. Further, the grinding surface 41b for end surface processing in the grinding surface 41 may be formed to be inclined as compared with the grinding surface 42b for end surface processing in the grinding surface 42.
  • a plurality of glass base plates of a predetermined number of the inner peripheral end face 4 that have been ground are stacked and a plurality of the stacked base plates are stacked.
  • the inner peripheral end surface 4 of the glass base plate is polished using the polishing brush 80, the first number of glass base plates 1A ground in the first grinding step (S41) and the second grinding step (S42)
  • the plurality of stacked glass base plates 1A Alternatively, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B are polished.
  • a polishing brush 80 (brush hairs) is obtained by performing a polishing process by stacking only a plurality of glass base plates 1A out of the first number of sheets ground in the first grinding step (S41).
  • the occurrence of unevenness in how the material 81) hits the inner peripheral end face 4 is suppressed, and as a result, variations in shape occur between the inner peripheral end faces 4 of the plurality of glass base plates 1A subjected to batch polishing. This is also suppressed.
  • a polishing process is performed by stacking only a plurality of glass base plates 1 ⁇ / b> B out of the second number of sheets ground in the second grinding step (S ⁇ b> 42).
  • the occurrence of unevenness in the manner in which the polishing brush 80 (brush bristle material 81) hits the inner peripheral end surface 4 is suppressed, and as a result, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B subjected to batch polishing processing. It is also possible to suppress the variation in shape between them.
  • the polishing process may be performed in a state in which block body 9 (see FIG. 9) and polishing brush 80 are completely immersed in the polishing liquid.
  • the polishing process may be performed while the polishing slurry is poured (spread) between the inner peripheral end surface 4 and the polishing brush 80.
  • the block body 9 and the polishing brush 80 are accommodated in a region surrounded in a liquid-tight manner by the cylindrical side wall 91, the bottom plate 93, and the lid member 92.
  • the polishing treatment is performed while polishing slurry is poured from the opening 95 provided in the center of the lid member 92 using the nozzle 90.
  • the polishing process is performed batchwise so that the plates 1B are not confused.
  • the end surface polishing step (S50) in the present embodiment only the inner peripheral end surface polishing step (S51) is performed in a batch manner so that the glass base plate 1A and the glass base plate 1B are not confused with each other.
  • the polishing process may be performed batchwise so that the glass base plate 1A and the glass base plate 1B are not confused with each other.
  • Polishing is performed after washing
  • the glass base plate 1 is immersed in the chemical strengthening solution for 3 to 4 hours. Since the entire surface of the glass base plate 1 is chemically strengthened during the immersion, the plurality of glass base plates 1 are accommodated in a holder or the like so that the plurality of glass base plates 1 are held by the respective end faces. It is preferable to be immersed in a state.
  • the alkali metal ions such as lithium ions and sodium ions contained in the glass base plate 1 are replaced by alkali metal ions such as potassium ions having a larger ion radius than these ions (ion exchange method). Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and both main surfaces of the glass base plate are strengthened.
  • the glass base plate 1 is ultrasonically cleaned using a high frequency of 950 kHz, or cleaned using an alkaline detergent so that the adhered matter remaining on the glass base plate 1 is eliminated. To do. Thereafter, the glass base plate 1 is dried using IPA vapor. Thus, the glass substrate in the present embodiment is obtained.
  • the glass substrate manufacturing method (S100) in the present embodiment is configured as described above.
  • Magnetic recording layers are formed on both main surfaces (or one of the main surfaces) of the glass substrate that has been subjected to the chemical strengthening treatment.
  • the magnetic recording layer includes, for example, an adhesion layer made of a Cr alloy, a soft magnetic layer made of a CoFeZr alloy, an orientation control underlayer made of Ru, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer made of a C system, and an F system.
  • an adhesion layer made of a Cr alloy
  • a soft magnetic layer made of a CoFeZr alloy
  • an orientation control underlayer made of Ru
  • a perpendicular magnetic recording layer made of a CoCrPt alloy
  • a protective layer made of a C system
  • F system F system
  • the inner peripheral end surfaces 4 of the predetermined number of glass base plates 1A and 1B whose inner peripheral end surfaces 4 are ground are polished using the polishing brush 80.
  • the first number of glass base plates 1A ground in the first grinding step (S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other.
  • stacked several glass base plate is grind
  • the said structure it is suppressed that a nonuniformity arises in the contact method with respect to the internal peripheral end surface 4 of the brush 80 for polishing (brush bristle material 81), and, as a result, of the some glass base plate 1 grind
  • the glass base plate 1 having high smoothness can be obtained on the inner peripheral end face 4, it is possible to improve the impact resistance as the glass base plate 1.
  • the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is within 4 mm, the end face of the glass base plate 1
  • the brush bristle material 81 of the polishing brush 80 abuts, the pressure distribution received by the end face of the glass base plate 1 is easily affected by the unevenness of the end face.
  • the glass base plate 1A and the glass base plate 1B are not mixed with each other, the influence of the end surface irregularities is suppressed, and the brush bristle material 81 of the polishing brush 80 Even if the length W81 from the root to the hair tip is within 4 mm, the glass base plate 1 having high smoothness can be obtained.
  • the polishing process is performed while the polishing slurry is poured between the inner peripheral end surface 4 and the polishing brush 80, the sludge (polishing waste) is discharged as compared with a device that is completely immersed in the polishing liquid.
  • the capacity is lowered and the processing rate is also lowered.
  • the processing rate is improved even with a flow-through type polishing apparatus, and the polishing amount The non-uniformity is eliminated and the yield rate is improved.
  • the ground surface slides in the circumferential direction of the glass base plate 1 with the ground surface in contact with the end face of the glass base plate 1. Since the end surface of the glass base plate 1 is ground only in the circumferential direction, the processing apparatus can be simplified.
  • Example 1 to 4 Referring to FIG. 19, as an example, an experiment was conducted on Examples 1 to 4 based on the above-described embodiment and Comparative Examples 1 to 4 for these.
  • the glass base plate preparation process, the alumina polishing process for ensuring flatness, and the coring process are the same conditions as in the above-described embodiment.
  • the end surface grinding process in Examples 1 to 4, a plurality of glass base plates 1 are ground using the same grinding surface with the same grindstone, and in Comparative Examples 1 to 4, the same grindstone is used. The grinding process was implemented with respect to the several glass base plate 1 using the grinding surface by a different grinding surface or a different grindstone.
  • the glass base plate is not mixed in Examples 1 to 4, and in Comparative Examples 1 to 4, the inner peripheral end face 4 polished by a different polishing face is used.
  • the glass base plate 1 to be mixed was mixed.
  • brush polishing was used and cerium oxide was used.
  • polishing conditions for the inner peripheral end face 400 block bodies 9 were processed at one time, the rotation speed of the polishing brush 80 was set to 4000 rpm, and the rotation speed of the block body 9 was set to 30 rpm.
  • the inner diameter of the hole 5 of the glass base plate 1 is 20.01 mm, and the polishing time is 20 min.
  • Example 1 the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 2 In Example 2, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 3 In Example 3, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 4 In Example 4, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • the block body 9 was comprised so that the glass base plate 1 might be mixed, and the polishing process was performed with respect to the block body 9 as mentioned above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm.
  • Comparative Example 2 In Comparative Example 2, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Comparative Example 3 In Comparative Example 3, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Comparative Example 4 In Comparative Example 4, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • the inner peripheral end face 4 was inspected for the glass base plates 1 obtained in Examples 1 to 4 and Comparative Examples 1 to 4.
  • the inner peripheral end surface 4 is measured for roughness using AFM (Dimension 3100 manufactured by Beco Co., Ltd. and measurement software NanoScope 7.2), and the glass base plate having a surface roughness Ra of 1.0 nm or more.
  • the ratio of 1 was investigated, the case where the ratio of the corresponding glass base plate 1 was 10% or more was B evaluation, the case of less than 10% 6% or more was A evaluation, and the case of less than 6% was S evaluation.
  • an information recording medium 10 formed by subjecting the glass base plate 1 to film formation is incorporated into an actual information recording device 30 (hard disk drive), and 40 shock resistance tests are performed for each condition. went.
  • an impact resistance test an impact of 1000 G was applied to the information recording device 30 in the vertical direction, and the presence / absence state (good product rate) of the surface of the information recording medium 10 after the test was confirmed.
  • the external dimensions of the rod-like portion 72 of the positioning tool 70 As for the external dimensions of the rod-like portion 72 of the positioning tool 70, a better result is obtained when -0.05 mm than the case of -0.07 mm with respect to the inner diameter of the hole 5 of the glass base plate 1. Obtained. In the case of ⁇ 0.05 mm, the inner peripheral end face 4 is considered to be uniformly polished. When the outer dimension of the rod-like portion 72 is less than ⁇ 0.03 mm with respect to the inner diameter of the hole 5 of the glass base plate 1, it is not inserted well into the hole 5 of the glass base plate 1, and it is somewhat difficult to use. there were.
  • the first grinding step A plurality of glass base plates are arranged so that the first number of glass base plates 1A ground in S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other.
  • the inner peripheral end surfaces 4 of the plurality of stacked glass base plates are polished in the stacked state, unevenness occurs in the manner in which the polishing brush 80 (brush bristle material 81) contacts the inner peripheral end surface 4.

Abstract

In the present invention, the inner peripheral edge surfaces (4) of a first number of glass element plates (1) are ground using a grinding surface (41), and the inner peripheral edge surfaces (4) of a second number of glass element plates (1) are ground using an abrasive surface (42). When stacking a plurality of glass element plates (1) and abrading the inner peripheral edge surfaces (4) thereof, the glass element plates (1) from among the first number of glass element plates (1) and the glass element plates (1) from among the second number of glass element plates are caused not to be intermingled with each other.

Description

情報記録媒体用ガラス基板およびその製造方法Glass substrate for information recording medium and manufacturing method thereof
 本発明は、情報記録媒体用ガラス基板およびその製造方法に関し、特に、ハードディスクドライブ(HDD:Hard Disk Drive)等の情報記録装置に情報記録媒体の一部として搭載される情報記録媒体用ガラス基板およびその製造方法に関する。 The present invention relates to a glass substrate for information recording media and a method for manufacturing the same, and in particular, a glass substrate for information recording media mounted as part of an information recording medium in an information recording device such as a hard disk drive (HDD), and It relates to the manufacturing method.
 ハードディスクドライブ等の情報記録装置の内部には、情報記録媒体(磁気ディスク)が搭載される。情報記録媒体は、中央に孔を有する円盤状のガラス基板の主表面上に、磁気記録用の磁気記録層が成膜されることによって製造される。 An information recording medium (magnetic disk) is mounted inside an information recording device such as a hard disk drive. The information recording medium is manufactured by forming a magnetic recording layer for magnetic recording on the main surface of a disk-shaped glass substrate having a hole in the center.
 情報記録媒体の製造に用いられるガラス基板は、情報記録媒体用ガラス基板(以下、単にガラス基板ともいう)という。情報記録媒体用ガラス基板の製造方法は、たとえば特開2006-236561号公報(特許文献1)および特開2007-250145号公報(特許文献2)に開示されている。 A glass substrate used for manufacturing an information recording medium is referred to as an information recording medium glass substrate (hereinafter also simply referred to as a glass substrate). A method for manufacturing a glass substrate for an information recording medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 2006-236561 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2007-250145 (Patent Document 2).
特開2006-236561号公報JP 2006-236561 A 特開2007-250145号公報JP 2007-250145 A
 コンピューター等の使用用途および使用環境の拡大に伴い、情報記録媒体(磁気ディスク)に求められる耐衝撃性も年々高まる傾向にある。情報記録媒体の内外周の端面(特に内周端面)に微細なクラックが存在している場合、情報記録媒体の耐衝撃性が低下する。耐衝撃性を向上させるためには、情報記録媒体の内外周の端面は、研磨加工によって十分に平滑に形成されている必要がある。 With the expansion of the usage and environment of computers and the like, the impact resistance required for information recording media (magnetic disks) tends to increase year by year. When fine cracks are present on the inner and outer peripheral end faces (particularly the inner peripheral end face) of the information recording medium, the impact resistance of the information recording medium is reduced. In order to improve the impact resistance, the inner and outer peripheral end faces of the information recording medium need to be formed sufficiently smooth by polishing.
 一般的に、高い平滑性を得るために、ガラス基板(ガラス素板)は、研削加工によって研削された後、研磨スラリーを用いて研磨される。製造効率を向上させる等の観点から、ガラス素板の内周端面または外周端面に対して研磨加工を行なう場合、ガラス素板は、複数のガラス素板同士が重ねられた状態でバッチ的に研磨処理されることがある。 Generally, in order to obtain high smoothness, a glass substrate (glass base plate) is ground by a grinding process and then polished with a polishing slurry. From the standpoint of improving manufacturing efficiency, etc., when performing polishing on the inner peripheral end face or outer peripheral end face of the glass base plate, the glass base plate is batch-polished in a state where a plurality of glass base plates are stacked. May be processed.
 本発明者らは、重ねられた複数のガラス素板の端面同士の間に形状(研磨処理前の端面形状)のばらつきがあると、研磨ブラシの端面に対する当り方にムラが生じることとなり、その結果、バッチ的に研磨処理された複数のガラス素板の端面同士の間に形状のばらつきが生じてしまうことが分かった。 When the present inventors have variations in shape (end surface shape before polishing treatment) between the end surfaces of a plurality of stacked glass base plates, unevenness occurs in the manner of contact with the end surface of the polishing brush. As a result, it was found that variation in shape occurred between the end surfaces of the plurality of glass base plates that were subjected to batch polishing.
 さらに本発明者らは、重ねられた複数のガラス素板同士の端面(研磨処理前の端面形状)同士の間にばらつきが生じる原因について検討したところ、その原因は、ガラス素板の端面を研削する端面研削工程に起因していることが分かった。 Furthermore, the present inventors examined the cause of variation between end surfaces (end surface shape before polishing treatment) of a plurality of stacked glass base plates, and the cause was grinding the end surfaces of the glass base plates. It was found that this was caused by the end face grinding process.
 具体的には、端面研削工程においては、砥石の研削面を用いてガラス素板の端面が研削される。研削処理後のガラス素板の端面形状は、砥石の研削面の形状がガラス素板の端面にほぼそのまま転写されるため、砥石の研削面毎に固有の癖を持つ。異なる砥石または異なる研削面で研削加工された複数のガラス素板同士を重ねると、重ねられた複数のガラス素板の中には、相互に異なる端面形状(癖)を有するガラス素板が混在することとなる。 Specifically, in the end surface grinding step, the end surface of the glass base plate is ground using the grinding surface of the grindstone. The shape of the end face of the glass base plate after the grinding treatment has a unique wrinkle for each grinding surface of the grindstone because the shape of the grinding face of the grindstone is transferred almost as it is to the end face of the glass base plate. When a plurality of glass base plates ground with different grindstones or different grinding surfaces are stacked, glass base plates having different end face shapes (端) are mixed in the plurality of stacked glass base plates. It will be.
 したがって本発明者らは、異なる砥石または異なる研削面で研削加工された複数のガラス素板同士を重ねることが、重ねられた複数のガラス素板の端面同士の間に形状(研磨処理前の端面形状)のばらつきが生じる原因であり、そのことに起因して、バッチ的に研磨処理された複数のガラス素板の端面同士の端面形状にばらつきが生じていることが分かった。 Therefore, the inventors of the present invention can overlap a plurality of glass base plates that have been ground with different grindstones or different grinding surfaces, so that the shape (end surface before polishing treatment) is between the end faces of the plurality of stacked glass base plates. It was found that the variation in the shape of the end surfaces of the plurality of glass base plates that had been subjected to batch polishing was caused.
 本発明は、上記のような実情に鑑みてなされたものであって、複数のガラス素板に対してバッチ的に研磨処理する場合であっても、複数のガラス素板の端面同士の間に形状のばらつきが発生することを抑制可能な情報記録媒体用ガラス基板およびその製造方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and even when a plurality of glass base plates are subjected to a batch polishing treatment, the end faces of the plurality of glass base plates are between each other. An object of the present invention is to provide a glass substrate for an information recording medium capable of suppressing the occurrence of variation in shape and a method for manufacturing the same.
 本発明のある局面に基づく情報記録媒体用ガラス基板の製造方法は、端面を有する所定枚数のガラス素板を準備する工程と、第1砥石研削面を使用して、上記所定枚数のうちの第1枚数分の上記ガラス素板の上記端面を研削する第1研削工程と、第2砥石研削面を使用して、上記所定枚数のうちの第2枚数分の上記ガラス素板の上記端面を研削する第2研削工程と、上記端面が研削された上記所定枚数のうちの複数の上記ガラス素板を重ねるとともに、その重ねられた状態の複数の上記ガラス素板の上記端面を研磨部材を使用して研磨する工程と、を備え、上記端面を研磨する工程においては、上記第1研削工程において研削された上記第1枚数分の上記ガラス素板と上記第2研削工程において研削された上記第2枚数分の上記ガラス素板とが相互に混在しないように複数の上記ガラス素板が重ねられた状態で、その重ねられた複数の上記ガラス素板の上記端面が研磨される。 According to an aspect of the present invention, there is provided a method for manufacturing a glass substrate for an information recording medium, comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface. The first grinding step of grinding the end face of the glass base plate for one sheet and the second grindstone grinding surface are used to grind the end face of the glass base plate for the second number of the predetermined number. A second grinding step and a plurality of the glass base plates out of the predetermined number of the end surfaces ground, and the end surfaces of the plurality of the glass base plates in a stacked state using a polishing member. And polishing the end face. In the step of polishing the end face, the first number of glass base plates ground in the first grinding step and the second ground ground in the second grinding step. The above glass base plate for the number of sheets There in a state of being stacked plurality of the glass workpiece to not mix with each other, the end faces of the plurality of the raw material glass plate superposed thereof is polished.
 本発明の他の局面に基づく情報記録媒体用ガラス基板の製造方法は、端面を有する所定枚数のガラス素板を準備する工程と、第1砥石研削面を使用して、上記所定枚数のうちの第1枚数分の上記ガラス素板の上記端面を研削する第1研削工程と、第2砥石研削面を使用して、上記所定枚数のうちの第2枚数分の上記ガラス素板の上記端面を研削する第2研削工程と、上記端面が研削された上記所定枚数のうちの複数の上記ガラス素板を重ねるとともに、その重ねられた状態の複数の上記ガラス素板の上記端面を研磨部材を使用して研磨する工程と、を備え、上記端面を研磨する工程においては、上記第1研削工程において研削された上記第1枚数分の上記ガラス素板が連続するひと固まりとして重ねられた状態で、その重ねられた複数の上記ガラス素板の上記端面が研磨され、上記第2研削工程において研削された上記第2枚数分の上記ガラス素板が連続するひと固まりとして重ねられた状態で、その重ねられた複数の上記ガラス素板の上記端面が研磨される。 According to another aspect of the present invention, there is provided a method of manufacturing a glass substrate for an information recording medium, comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface, Using the first grinding step of grinding the end face of the glass base plate for the first number of sheets and the second grinding wheel grinding surface, the end face of the glass base plate for the second number of the predetermined number of sheets is used. A second grinding step for grinding and a plurality of the glass base plates of the predetermined number of the ground end surfaces are stacked, and the end surfaces of the plurality of the glass base plates in a stacked state are used as a polishing member And in the step of polishing the end face, the first glass sheets ground in the first grinding step are stacked as a continuous mass, On top of that stacked multiple In the state where the end face of the glass base plate is polished and the second number of glass base plates ground in the second grinding step are stacked as a continuous lump, the plurality of stacked glass elements are stacked. The end face of the plate is polished.
 好ましくは、本発明に基づく上記の情報記録媒体用ガラス基板の製造方法は、棒状の位置決め部材を準備する工程をさらに備え、上記ガラス素板には、一方の主表面から他方の主表面に向かって貫通する孔が設けられており、上記端面は、上記孔を形成する内周端面であり、上記内周端面を研磨する工程においては、重ねられた状態にある複数の上記ガラス素板の上記孔に上記位置決め部材が差し込まれることによって、重ねられた状態にある複数の上記ガラス素板は位置決めされ、上記位置決め部材の外径は、上記孔の内径に対して-0.05mm以上-0.03mm以下の寸法である。 Preferably, the method for manufacturing a glass substrate for an information recording medium according to the present invention further includes a step of preparing a rod-shaped positioning member, and the glass base plate is directed from one main surface to the other main surface. And the end surface is an inner peripheral end surface that forms the hole, and in the step of polishing the inner peripheral end surface, the plurality of glass base plates in the stacked state are By inserting the positioning member into the hole, the plurality of glass base plates in a stacked state are positioned, and the outer diameter of the positioning member is −0.05 mm or more with respect to the inner diameter of the hole. It is a dimension of 03 mm or less.
 好ましくは、上記研磨部材は、複数本のブラシ毛材を表面に有する研磨用ブラシであり、上記端面を研磨する工程においては、重ねられた複数の上記ガラス素板の上記端面が、上記研磨用ブラシの上記ブラシ毛材によって研磨され、上記ブラシ毛材の根元から毛先までの長さは、4mm以内である。 Preferably, the polishing member is a polishing brush having a plurality of brush bristle materials on a surface thereof, and in the step of polishing the end surface, the end surfaces of the plurality of stacked glass base plates are used for the polishing. It is ground by the brush bristle material of the brush, and the length from the root to the hair tip of the brush bristle material is within 4 mm.
 好ましくは、上記端面を研磨する工程においては、上記研磨部材と上記端面との間に研磨スラリーが流し込まれる。 Preferably, in the step of polishing the end face, a polishing slurry is poured between the polishing member and the end face.
 好ましくは、上記ガラス素板の上記端面を研削する際、上記第1砥石研削面およびまたは上記第2砥石研削面は、上記端面に対して接触した状態で上記ガラス素板の周方向に沿って摺動する。 Preferably, when the end surface of the glass base plate is ground, the first grinding wheel grinding surface and / or the second grinding wheel grinding surface are in contact with the end surface along the circumferential direction of the glass base plate. Slide.
 本発明に基づく情報記録媒体用ガラス基板は、本発明に基づく上記の情報記録媒体用ガラス基板の製造方法を使用して製造される。 The glass substrate for information recording medium based on the present invention is manufactured using the above-described method for manufacturing a glass substrate for information recording medium based on the present invention.
 本発明によれば、複数のガラス素板に対してバッチ的に研磨処理する場合であっても、複数のガラス素板の端面同士の間に形状のばらつきが発生することを抑制可能な情報記録媒体用ガラス基板およびその製造方法を得ることができる。 According to the present invention, even when batch polishing is performed on a plurality of glass base plates, information recording that can suppress the occurrence of variation in shape between the end faces of the plurality of glass base plates. A glass substrate for a medium and a manufacturing method thereof can be obtained.
実施の形態における情報記録媒体用ガラス基板の製造方法を使用することによって製造されたガラス基板を備える情報記録装置を示す斜視図である。It is a perspective view which shows an information recording device provided with the glass substrate manufactured by using the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法によって製造されたガラス基板を示す平面図である。It is a top view which shows the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment. 図2中のIII-III線に沿った矢視断面図である。FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2. 実施の形態における情報記録媒体用ガラス基板の製造方法によって製造されたガラス基板を備えた情報記録媒体を示す平面図である。It is a top view which shows the information recording medium provided with the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment. 図4中のV-V線に沿った矢視断面図である。FIG. 5 is a cross-sectional view taken along line VV in FIG. 4. 実施の形態における情報記録媒体用ガラス基板の製造方法を示すフロー図である。It is a flowchart which shows the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の研削工程(内周端面側)が行なわれている様子を示す断面図である。It is sectional drawing which shows a mode that the grinding process (inner peripheral end surface side) of the manufacturing method of the glass substrate for information recording media in embodiment is performed. 実施の形態における情報記録媒体用ガラス基板の製造方法の研削工程(外周端面側)が行なわれている様子を示す断面図である。It is sectional drawing which shows a mode that the grinding process (periphery end surface side) of the manufacturing method of the glass substrate for information recording media in embodiment is performed. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる固定治具および位置決め具を示す斜視図である。It is a perspective view which shows the fixing jig and positioning tool used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程において、位置決め具が固定治具の開口から差し込まれた状態を示す断面図である。It is sectional drawing which shows the state in which the positioning tool was inserted from opening of the fixing jig in the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程において、位置決め具が固定治具の開口から引き抜かれた状態を示す断面図である。It is sectional drawing which shows the state by which the positioning tool was extracted from the opening of the fixing jig in the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程に用いられる研磨用ブラシを示す斜視図である。It is a perspective view which shows the brush for grinding | polishing used for the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程において、ガラス素板の孔の内側に研磨用ブラシが配置された状態を示す断面図である。It is sectional drawing which shows the state by which the brush for grinding | polishing was arrange | positioned inside the hole of a glass base plate in the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研削工程に用いられる研削用砥石を拡大して示す図である。It is a figure which expands and shows the grindstone used for the end surface grinding process of the manufacturing method of the glass substrate for information recording media in embodiment. ブロック体の中に端面形状の異なるガラス素板が混在している様子を示す断面図である。It is sectional drawing which shows a mode that the glass base plate from which end surface shape differs is mixed in a block body. ブロック体の中に端面形状の異なるガラス素板が混在していない様子を示す断面図(その1)である。It is sectional drawing (the 1) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. ブロック体の中に端面形状の異なるガラス素板が混在していない様子を示す断面図(その2)である。It is sectional drawing (the 2) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. 実施の形態における情報記録媒体用ガラス基板の製造方法の端面研磨工程において、研磨用ブラシとガラス素板の内周端面との間に研磨スラリーが流し込まれる際の様子を示す断面図である。It is sectional drawing which shows a mode when polishing slurry is poured between the brush for grinding | polishing and the internal peripheral end surface of a glass base plate in the end surface grinding | polishing process of the manufacturing method of the glass substrate for information recording media in embodiment. 実施の形態に関する実施例および比較例の条件および結果を示す図である。It is a figure which shows the conditions and result of the Example and comparative example regarding embodiment.
 本発明に基づいた実施の形態および各実施例について、以下、図面を参照しながら説明する。実施の形態および各実施例の説明において、個数、量などに言及する場合、特に記載がある場合を除き、本発明の範囲は必ずしもその個数、量などに限定されない。実施の形態および各実施例の説明において、同一の部品、相当部品に対しては、同一の参照番号を付し、重複する説明は繰り返さない場合がある。 Embodiments and examples based on the present invention will be described below with reference to the drawings. In the description of the embodiments and the examples, when the number, amount, and the like are referred to, the scope of the present invention is not necessarily limited to the number, amount, and the like unless otherwise specified. In the description of the embodiment and each example, the same parts and corresponding parts are denoted by the same reference numerals, and redundant description may not be repeated.
 [実施の形態]
 (情報記録装置30)
 図1を参照して、まず、情報記録装置30について説明する。図1は、情報記録装置30を示す斜視図である。情報記録装置30は、実施の形態における情報記録媒体用ガラス基板(以下、単にガラス基板ともいう)の製造方法によって製造されたガラス基板1を、情報記録媒体10として備える。
[Embodiment]
(Information recording device 30)
First, the information recording device 30 will be described with reference to FIG. FIG. 1 is a perspective view showing the information recording apparatus 30. The information recording apparatus 30 includes the glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium (hereinafter also simply referred to as a glass substrate) in the embodiment as the information recording medium 10.
 具体的には、情報記録装置30は、情報記録媒体10、筐体20、ヘッドスライダー21、サスペンション22、アーム23、垂直軸24、ボイスコイル25、ボイスコイルモーター26、クランプ部材27、および固定ネジ28を備える。筐体20の上面上には、スピンドルモーター(図示せず)が設置される。 Specifically, the information recording device 30 includes an information recording medium 10, a housing 20, a head slider 21, a suspension 22, an arm 23, a vertical shaft 24, a voice coil 25, a voice coil motor 26, a clamp member 27, and a fixing screw. 28. A spindle motor (not shown) is installed on the upper surface of the housing 20.
 磁気ディスクなどの情報記録媒体10は、クランプ部材27および固定ネジ28によって、上記のスピンドルモーターに回転可能に固定される。情報記録媒体10は、このスピンドルモーターによって、たとえば数千rpmの回転数で回転駆動される。詳細は図4および図5を参照して後述されるが、情報記録媒体10は、ガラス基板1に化学強化層12(図5参照)および磁気記録層14(図4および図5参照)が形成されることによって製造される。 An information recording medium 10 such as a magnetic disk is rotatably fixed to the spindle motor by a clamp member 27 and a fixing screw 28. The information recording medium 10 is rotationally driven by this spindle motor at, for example, several thousand rpm. Although details will be described later with reference to FIGS. 4 and 5, in the information recording medium 10, a chemically strengthened layer 12 (see FIG. 5) and a magnetic recording layer 14 (see FIGS. 4 and 5) are formed on the glass substrate 1. To be manufactured.
 アーム23は、垂直軸24回りに揺動可能に取り付けられる。アーム23の先端には、板バネ(片持ち梁)状に形成されたサスペンション22が取り付けられる。サスペンション22の先端には、ヘッドスライダー21が情報記録媒体10を挟み込むように取り付けられる。 The arm 23 is attached so as to be swingable around the vertical axis 24. A suspension 22 formed in a leaf spring (cantilever) shape is attached to the tip of the arm 23. A head slider 21 is attached to the tip of the suspension 22 so as to sandwich the information recording medium 10.
 アーム23のヘッドスライダー21とは反対側には、ボイスコイル25が取り付けられる。ボイスコイル25は、筐体20上に設けられたマグネット(図示せず)によって挟持される。ボイスコイル25およびこのマグネットにより、ボイスコイルモーター26が構成される。 A voice coil 25 is attached to the opposite side of the arm 23 from the head slider 21. The voice coil 25 is clamped by a magnet (not shown) provided on the housing 20. A voice coil motor 26 is constituted by the voice coil 25 and the magnet.
 ボイスコイル25には所定の電流が供給される。アーム23は、ボイスコイル25に流れる電流と上記マグネットの磁場とにより発生する電磁力の作用によって、垂直軸24回りに揺動する。アーム23の揺動によって、サスペンション22およびヘッドスライダー21も矢印AR1方向に揺動する。ヘッドスライダー21は、情報記録媒体10の表面上および裏面上を、情報記録媒体10の半径方向に往復移動する。ヘッドスライダー21に設けられた磁気ヘッド(図示せず)はシーク動作を行なう。 A predetermined current is supplied to the voice coil 25. The arm 23 swings around the vertical axis 24 by the action of electromagnetic force generated by the current flowing through the voice coil 25 and the magnetic field of the magnet. As the arm 23 swings, the suspension 22 and the head slider 21 also swing in the direction of the arrow AR1. The head slider 21 reciprocates on the front and back surfaces of the information recording medium 10 in the radial direction of the information recording medium 10. A magnetic head (not shown) provided on the head slider 21 performs a seek operation.
 当該シーク動作が行なわれる一方で、ヘッドスライダー21は、情報記録媒体10の回転に伴って発生する空気流により、浮揚力を受ける。当該浮揚力とサスペンション22の弾性力(押圧力)とのバランスによって、ヘッドスライダー21は情報記録媒体10の表面に対して一定の浮上量で走行する。当該走行によって、ヘッドスライダー21に設けられた磁気ヘッドは、情報記録媒体10内の所定のトラックに対して情報(データ)の記録および再生を行なうことが可能となる。ガラス基板1が情報記録媒体10を構成する部材の一部として搭載される情報記録装置30は、以上のように構成される。 While the seek operation is performed, the head slider 21 receives a levitation force due to the air flow generated as the information recording medium 10 rotates. Due to the balance between the levitation force and the elastic force (pressing force) of the suspension 22, the head slider 21 travels with a constant flying height with respect to the surface of the information recording medium 10. By the traveling, the magnetic head provided on the head slider 21 can record and reproduce information (data) on a predetermined track in the information recording medium 10. The information recording apparatus 30 on which the glass substrate 1 is mounted as a part of the members constituting the information recording medium 10 is configured as described above.
 (ガラス基板1)
 図2は、本実施の形態に基づく情報記録媒体用ガラス基板の製造方法によって製造されるガラス基板1を示す平面図である。図3は、図2中のIII-III線に沿った矢視断面図である。
(Glass substrate 1)
FIG. 2 is a plan view showing glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium according to the present embodiment. 3 is a cross-sectional view taken along the line III-III in FIG.
 図2および図3に示すように、情報記録媒体10(図4および図5参照)にその一部として用いられるガラス基板1(情報記録媒体用ガラス基板)は、主表面2、主表面3、内周端面4、孔5、および外周端面6を有し、全体として円盤状に形成される。孔5は、一方の主表面2から他方の主表面3に向かって貫通するように設けられる。主表面2と内周端面4との間、および、主表面3と内周端面4との間には、面取部7がそれぞれ形成される。主表面2と外周端面6との間、および、主表面3と外周端面6との間には、面取部8(チャンファー部)が形成される。 As shown in FIGS. 2 and 3, the glass substrate 1 (glass substrate for information recording medium) used as a part of the information recording medium 10 (see FIGS. 4 and 5) has a main surface 2, a main surface 3, It has the inner peripheral end surface 4, the hole 5, and the outer peripheral end surface 6, and is formed in a disk shape as a whole. The hole 5 is provided so as to penetrate from one main surface 2 toward the other main surface 3. A chamfer 7 is formed between the main surface 2 and the inner peripheral end surface 4 and between the main surface 3 and the inner peripheral end surface 4. Between the main surface 2 and the outer peripheral end surface 6 and between the main surface 3 and the outer peripheral end surface 6, a chamfered portion 8 (chamfer portion) is formed.
 ガラス基板1の大きさは、たとえば0.8インチ、1.0インチ、1.8インチ、2.5インチ、または3.5インチである。ガラス基板の厚さは、破損防止の観点から、たとえば0.30mm~2.2mmである。本実施の形態におけるガラス基板の大きさは、外径が約64mm、内径が約20mm、厚さが約0.8mmである。ガラス基板の厚さとは、ガラス基板上の点対象となる任意の複数の点で測定した値の平均によって算出される値である。 The size of the glass substrate 1 is, for example, 0.8 inch, 1.0 inch, 1.8 inch, 2.5 inch, or 3.5 inch. The thickness of the glass substrate is, for example, 0.30 mm to 2.2 mm from the viewpoint of preventing breakage. In the present embodiment, the glass substrate has an outer diameter of about 64 mm, an inner diameter of about 20 mm, and a thickness of about 0.8 mm. The thickness of the glass substrate is a value calculated by averaging the values measured at a plurality of arbitrary points to be pointed on the glass substrate.
 (情報記録媒体10)
 図4は、情報記録媒体としてガラス基板1を備えた情報記録媒体10を示す平面図である。図5は、図4中のV-V線に沿った矢視断面図である。
(Information recording medium 10)
FIG. 4 is a plan view showing an information recording medium 10 provided with a glass substrate 1 as an information recording medium. FIG. 5 is a cross-sectional view taken along the line VV in FIG.
 図4および図5に示すように、情報記録媒体10は、ガラス基板1と、化学強化層12と、磁気記録層14とを含む。化学強化層12は、ガラス基板1の主表面2,3、内周端面4、および外周端面6を覆うように形成される。磁気記録層14は、化学強化層12の主表面2,3上の所定の領域を覆うように形成される。ガラス基板1の内周端面4上に化学強化層12が形成されることによって、内周端面4の内側に孔15が形成される。孔15を利用して、情報記録媒体10は筐体20(図1参照)上に設けられたスピンドルモーターに対して固定される。 4 and 5, the information recording medium 10 includes a glass substrate 1, a chemical strengthening layer 12, and a magnetic recording layer 14. Chemical strengthening layer 12 is formed to cover main surfaces 2 and 3, inner peripheral end surface 4, and outer peripheral end surface 6 of glass substrate 1. The magnetic recording layer 14 is formed so as to cover a predetermined region on the main surfaces 2 and 3 of the chemical strengthening layer 12. By forming the chemical strengthening layer 12 on the inner peripheral end face 4 of the glass substrate 1, a hole 15 is formed inside the inner peripheral end face 4. The information recording medium 10 is fixed to a spindle motor provided on the housing 20 (see FIG. 1) using the holes 15.
 図5に示す情報記録媒体10においては、主表面2上に形成された化学強化層12と主表面3上に形成された化学強化層12との双方(両面)の上に、磁気記録層14が形成されている。磁気記録層14は、主表面2上に形成された化学強化層12の上(片面)にのみ設けられていてもよく、主表面3上に形成された化学強化層12の上(片面)に設けられていてもよい。 In the information recording medium 10 shown in FIG. 5, the magnetic recording layer 14 is formed on both (both sides) the chemical strengthening layer 12 formed on the main surface 2 and the chemical strengthening layer 12 formed on the main surface 3. Is formed. The magnetic recording layer 14 may be provided only on the chemical strengthening layer 12 (one side) formed on the main surface 2, or on the chemical strengthening layer 12 (one side) formed on the main surface 3. It may be provided.
 磁気記録層14は、磁性粒子を分散させた熱硬化性樹脂をガラス基板1の主表面2,3上の化学強化層12にスピンコートすることによって形成される(スピンコート法)。磁気記録層14は、ガラス基板1の主表面2,3上の化学強化層12に対して実施されるスパッタリング法または無電解めっき法等により形成されてもよい。 The magnetic recording layer 14 is formed by spin-coating a thermosetting resin in which magnetic particles are dispersed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1 (spin coating method). The magnetic recording layer 14 may be formed by a sputtering method or an electroless plating method performed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1.
 磁気記録層14の膜厚は、スピンコート法の場合は約0.3μm~1.2μm、スパッタリング法の場合は約0.04μm~0.08μm、無電解めっき法の場合は約0.05μm~0.1μmである。薄膜化および高密度化の観点からは、磁気記録層14はスパッタリング法または無電解めっき法によって形成されるとよい。 The thickness of the magnetic recording layer 14 is about 0.3 μm to 1.2 μm for the spin coating method, about 0.04 μm to 0.08 μm for the sputtering method, and about 0.05 μm to about the electroless plating method. 0.1 μm. From the viewpoint of thinning and high density, the magnetic recording layer 14 is preferably formed by sputtering or electroless plating.
 磁気記録層14に用いる磁性材料としては、高い保持力を得る目的で結晶異方性の高いCoを主成分とし、残留磁束密度を調整する目的でNiまたはCrを加えたCo系合金などを付加的に用いることが好適である。 As a magnetic material used for the magnetic recording layer 14, a Co-based alloy or the like containing Ni or Cr as a main component is added for the purpose of adjusting the residual magnetic flux density. Is preferably used.
 磁気ヘッドの滑りをよくするために、磁気記録層14の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、たとえば液体潤滑剤であるパーフロロポリエーテル(PFPE)をフレオン系などの溶媒で希釈したものが挙げられる。 In order to improve the sliding of the magnetic head, the surface of the magnetic recording layer 14 may be thinly coated with a lubricant. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon.
 磁気記録層14には、必要に応じて下地層または保護層を設けてもよい。情報記録媒体10における下地層は、磁性膜の種類に応じて選択される。下地層の材料としては、たとえば、Cr、Mo、Ta、Ti、W、V、B、Al、またはNiなどの非磁性金属から選ばれる少なくとも一種以上の材料が挙げられる。 The magnetic recording layer 14 may be provided with a base layer or a protective layer as necessary. The underlayer in the information recording medium 10 is selected according to the type of magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
 磁気記録層14に設ける下地層は、単層に限らず、同一または異種の層を積層した複数層構造としても構わない。たとえば、Cr/Cr、Cr/CrMo、Cr/CrV、NiAl/Cr、NiAl/CrMo、または、NiAl/CrV等の多層下地層としてもよい。 The underlayer provided on the magnetic recording layer 14 is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.
 磁気記録層14の摩耗および腐食を防止する保護層としては、たとえば、Cr層、Cr合金層、カーボン層、水素化カーボン層、ジルコニア層、またはシリカ層が挙げられる。これらの保護層は、下地層および磁性膜など共にインライン型スパッタ装置で連続して形成されることができる。これらの保護層は、単層としてもよく、または、同一若しくは異種の層からなる多層構成としてもよい。 Examples of the protective layer for preventing wear and corrosion of the magnetic recording layer 14 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus together with the underlayer and the magnetic film. These protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.
 上記保護層上に、あるいは上記保護層に代えて、他の保護層を形成してもよい。たとえば、上記保護層に代えて、Cr層の上にテトラアルコキシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成して酸化ケイ素(SiO)層を形成してもよい。 Another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, tetraalkoxylane is diluted with an alcohol-based solvent on a Cr layer, and then colloidal silica fine particles are dispersed and applied, followed by baking to form a silicon oxide (SiO 2 ) layer. It may be formed.
 (ガラス基板の製造方法)
 次に、図6に示すフローチャート図を用いて、本実施の形態におけるガラス基板(情報記録媒体用ガラス基板)の製造方法(S100)について説明する。本実施の形態におけるガラス基板の製造方法(S100)は、ガラス素板準備工程(S10)、アルミナ研磨工程(S20)、コアリング加工工程(S30)、端面研削工程(S40)、端面研磨工程(S50)、ラップ加工工程(S60)、ポリッシュ加工工程(S70)、および、化学強化工程(S80)を備える。
(Glass substrate manufacturing method)
Next, the manufacturing method (S100) of the glass substrate (glass substrate for information recording media) in this Embodiment is demonstrated using the flowchart figure shown in FIG. The glass substrate manufacturing method (S100) in the present embodiment includes a glass base plate preparation step (S10), an alumina polishing step (S20), a coring step (S30), an end surface grinding step (S40), and an end surface polishing step ( S50), a lapping process (S60), a polishing process (S70), and a chemical strengthening process (S80).
 化学強化工程(S80)を経ることによって得られたガラス基板に対して、磁気記録層成膜工程(S200)が実施される。磁気記録層成膜工程(S200)を経ることによって、情報記録媒体10(図4および図5参照)が得られる。以下、ガラス基板の製造方法(S100)を構成する各工程S10~S80の詳細について順に説明する、以下の説明において、各工程S10~S80の間に適宜行なわれる簡易的な洗浄については、詳細に記載していない場合がある。 A magnetic recording layer deposition step (S200) is performed on the glass substrate obtained through the chemical strengthening step (S80). The information recording medium 10 (see FIGS. 4 and 5) is obtained through the magnetic recording layer deposition step (S200). Hereinafter, the details of the steps S10 to S80 constituting the glass substrate manufacturing method (S100) will be described in order. In the following description, the simple cleaning appropriately performed between the steps S10 to S80 will be described in detail. It may not be listed.
 (S10:ガラス素板準備工程)
 まず、ガラス基板を構成する略円盤状のガラス素板が所定枚数分だけ準備される。ガラス素板は、たとえば、溶融ガラスを、上型、下型、胴型を用いてダイレクトプレスすることによって得られる。この際、ダイレクトプレス法の代わりに、ダウンドロー法またはフロート法を使用して形成したシートガラスから、研削砥石で切り出して円板状のガラス素板を得てもよい。
(S10: Glass base plate preparation process)
First, a predetermined number of substantially disk-shaped glass base plates constituting the glass substrate are prepared. The glass base plate can be obtained, for example, by directly pressing molten glass using an upper mold, a lower mold, and a body mold. At this time, instead of the direct press method, a disk-shaped glass base plate may be obtained by cutting out with a grinding wheel from a sheet glass formed by using a downdraw method or a float method.
 (S20:アルミナ研磨工程)
 次いで、所定枚数のガラス素板に対してアルミナ研磨処理が実施される。このアルミナ研磨処理は、寸法精度および形状精度の向上を目的としている。アルミナ研磨処理は、ラッピング装置を用いて行なわれる。粒度#400のアルミナ砥粒を用い、荷重を100kg程度に設定して、内転ギアと外転ギアとを回転させることによって、キャリア内に収納したガラス素板の両主表面が研磨される。
(S20: Alumina polishing step)
Next, alumina polishing is performed on a predetermined number of glass base plates. The purpose of this alumina polishing treatment is to improve dimensional accuracy and shape accuracy. The alumina polishing process is performed using a lapping apparatus. By using alumina abrasive grains of particle size # 400, setting the load to about 100 kg and rotating the inner and outer rotation gears, both main surfaces of the glass base plate housed in the carrier are polished.
 (S30:コアリング加工工程)
 次に、円筒状の砥石を使用して、所定枚数のガラス素板の中心部に孔がそれぞれ形成される。この孔は、図2および図3中における孔5に対応するものであり、情報記録媒体10をスピンドルモーターに固定する際に使用されるものである。
(S30: Coring process)
Next, using a cylindrical grindstone, holes are respectively formed in the central portions of a predetermined number of glass base plates. This hole corresponds to the hole 5 in FIGS. 2 and 3, and is used when the information recording medium 10 is fixed to the spindle motor.
 (S40:端面研削工程)
 端面研削工程(S40)においては、所定枚数のガラス素板の内周端面および外周端面がそれぞれ研削され、さらに内周端面および外周端面に対して所定の面取り加工が実施される。本実施の形態における端面研削工程(S40)は、第1研削工程(S41)および第2研削工程(S42)を含む。
(S40: End grinding process)
In the end surface grinding step (S40), the inner peripheral end surface and the outer peripheral end surface of the predetermined number of glass base plates are ground, respectively, and a predetermined chamfering process is performed on the inner peripheral end surface and the outer peripheral end surface. The end surface grinding step (S40) in the present embodiment includes a first grinding step (S41) and a second grinding step (S42).
 図7を参照して、所定枚数のガラス素板1(ガラス基板)の内周端面4に対して研削処理を実施する場合には、研削用砥石40が用いられる。研削用砥石40は、研削面41~46を備え、支持部47,48によって回転可能に支持される。研削用砥石40が駆動力を受けて矢印AR40方向に回転しつつ、研削面41がガラス素板1の内周端面4に接触される。研削面41がガラス素板1の内周端面4に接触した状態でガラス素板1の周方向に摺動することによって、ガラス素板1の内周端面4は、面取部7を有する所定の形状に研削される。 Referring to FIG. 7, when a grinding process is performed on the inner peripheral end face 4 of a predetermined number of glass base plates 1 (glass substrate), a grinding wheel 40 is used. The grinding wheel 40 includes grinding surfaces 41 to 46 and is rotatably supported by support portions 47 and 48. The grinding surface 41 is brought into contact with the inner peripheral end surface 4 of the glass base plate 1 while the grinding wheel 40 receives driving force and rotates in the direction of the arrow AR40. The inner peripheral end surface 4 of the glass base plate 1 has a chamfered portion 7 by sliding in the circumferential direction of the glass base plate 1 with the grinding surface 41 in contact with the inner peripheral end surface 4 of the glass base plate 1. It is ground to the shape.
 (第1研削工程S41)
 本実施の形態の端面研削工程(S40)においては、上記の各工程によって準備された所定枚数(たとえば1万枚)のうちの第1枚数分(たとえば2000枚)のガラス素板1の内周端面4に対して、研削面41(第1砥石研削面)を用いて研削処理が実施される。第1枚数分の研削処理によって、研削面41の使用耐用回数が満了する。研削面41(第1砥石研削面)を使用して所定枚数のうちの第1枚数分のガラス素板の内周端面を研削する当該工程が、第1研削工程(S41)(内周端面4の研削工程)に相当する。
(First grinding step S41)
In the end surface grinding step (S40) of the present embodiment, the inner circumference of the glass base plate 1 corresponding to the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. A grinding process is performed on the end surface 4 using a grinding surface 41 (first grinding wheel grinding surface). The service life of the grinding surface 41 expires by the grinding process for the first number of sheets. The step of grinding the inner peripheral end face of the first number of glass base plates out of a predetermined number using the grinding surface 41 (first grindstone grinding face) is the first grinding step (S41) (inner peripheral end face 4). Corresponds to the grinding step).
 (第2研削工程S42)
 その後、所定枚数のうちの第2枚数分(たとえば他の2000枚)のガラス素板1の内周端面4に対して、研削面42(第2砥石研削面)を用いて研削処理が実施される。第2枚数分の研削処理によって、研削面42の使用耐用回数が満了する。研削面42(第2砥石研削面)を使用して所定枚数のうちの第2枚数分のガラス素板の内周端面を研削する当該工程が、第2研削工程(S42)(内周端面4の他の研削工程)に相当する。なお、本発明の第2砥石研削面としては、研削面41と同一の研削用砥石40に形成されていてもよいし、研削面41が形成されている研削用砥石40とは異なる他の研削用砥石に形成されているものであってもよい。
(Second grinding step S42)
Thereafter, a grinding process is performed on the inner peripheral end face 4 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets using the grinding surface 42 (second grinding wheel grinding surface). The The service life of the grinding surface 42 expires by the second number of grinding processes. The step of grinding the inner peripheral end surface of the second number of glass base plates out of a predetermined number using the grinding surface 42 (second grindstone grinding surface) is the second grinding step (S42) (inner peripheral end surface 4). Corresponds to the other grinding step). In addition, as the 2nd grindstone grinding surface of this invention, you may form in the grindstone 40 for grinding same as the grinding surface 41, or other grinding different from the grinding grindstone 40 in which the grinding surface 41 is formed. It may be formed on a grinding wheel for use.
 以降、研削面43~46を使用して、必要な枚数分の研削処理がガラス素板1の内周端面4に対して順次実施される。 Thereafter, a necessary number of grinding processes are sequentially performed on the inner peripheral end face 4 of the glass base plate 1 using the grinding surfaces 43 to 46.
 図8を参照して、同様に、所定枚数のガラス素板1(ガラス基板)の外周端面6に対して研削処理を実施する場合には、研削用砥石50が用いられる。研削用砥石50は、研削面51~56を備え、支持部57,58によって回転可能に支持される。研削用砥石50が駆動力を受けて矢印AR50方向に回転しつつ、研削面51がガラス素板1の外周端面6に接触される。研削面51がガラス素板1の外周端面6に接触した状態でガラス素板1の周方向に摺動することによって、ガラス素板1の外周端面6は、面取部8を有する所定の形状に研削される。 Referring to FIG. 8, similarly, when grinding processing is performed on the outer peripheral end surface 6 of a predetermined number of glass base plates 1 (glass substrate), a grinding wheel 50 is used. The grinding wheel 50 includes grinding surfaces 51 to 56, and is rotatably supported by support portions 57 and 58. The grinding surface 51 is brought into contact with the outer peripheral end surface 6 of the glass base plate 1 while the grinding wheel 50 receives driving force and rotates in the direction of the arrow AR50. The outer peripheral end surface 6 of the glass base plate 1 has a predetermined shape having a chamfered portion 8 by sliding in the circumferential direction of the glass base plate 1 in a state where the ground surface 51 is in contact with the outer peripheral end surface 6 of the glass base plate 1. To be ground.
 (第1研削工程S41)
 本実施の形態の端面研削工程(S40)においては、上記の各工程によって準備された所定枚数(たとえば1万枚)のうちの第1枚数分(たとえば2000枚)のガラス素板1の外周端面6に対して、研削面51(第1砥石研削面)を用いて研削処理が実施される。第1枚数分の研削処理によって、研削面51の使用耐用回数が満了する。研削面51(第1砥石研削面)を使用して所定枚数のうちの第1枚数分のガラス素板の内周端面を研削する当該工程が、第1研削工程(S41)(外周端面6の研削工程)に相当する。第1研削工程S41としては、内周端面4と外周端面6とは同時に研削されても良いし、内周端面4と外周端面6とは別々に研削されてもよい。
(First grinding step S41)
In the end surface grinding step (S40) of the present embodiment, the outer peripheral end surface of the glass base plate 1 of the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. 6 is ground using a grinding surface 51 (first grinding wheel grinding surface). The service life of the grinding surface 51 expires by the grinding process for the first number of sheets. The step of grinding the inner peripheral end surface of the first number of glass base plates out of a predetermined number using the grinding surface 51 (first grindstone grinding surface) is the first grinding step (S41) (of the outer peripheral end surface 6). This corresponds to the grinding process. As 1st grinding process S41, the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground simultaneously, and the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground separately.
 (第2研削工程S42)
 その後、所定枚数のうちの第2枚数分(たとえば他の2000枚)のガラス素板1の外周端面6対して、研削面52(第2砥石研削面)を用いて研削処理が実施される。第2枚数分の研削処理によって、研削面52の使用耐用回数が満了する。研削面52(第2砥石研削面)を使用して所定枚数のうちの第2枚数分のガラス素板の外周端面を研削する当該工程が、第2研削工程(S42)(外周端面6の他の研削工程)に相当する。
(Second grinding step S42)
Thereafter, a grinding process is performed using the grinding surface 52 (second grinding wheel grinding surface) on the outer peripheral end face 6 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets. The service life of the grinding surface 52 is expired by the second number of grinding processes. The step of grinding the outer peripheral end surface of the second number of glass substrates out of the predetermined number using the grinding surface 52 (second grinding wheel grinding surface) is the second grinding step (S42) (other than the outer peripheral end surface 6). Corresponds to the grinding step).
 以降、研削面53~56を使用して、必要な枚数分の研削処理がガラス素板1の外周端面6に対して順次実施される。 Thereafter, a necessary number of grinding processes are sequentially performed on the outer peripheral end face 6 of the glass base plate 1 using the grinding surfaces 53 to 56.
 (S50:端面研磨工程)
 次に、酸化セリウムなどの研磨スラリーを用いた端面研磨工程(S50)が実施される。端面研磨工程(S50)は、内周端面研磨工程(S51)および外周端面研磨工程(S52)を含む。
(S50: End face polishing step)
Next, an end surface polishing step (S50) using a polishing slurry such as cerium oxide is performed. The end surface polishing step (S50) includes an inner peripheral end surface polishing step (S51) and an outer peripheral end surface polishing step (S52).
 図9を参照して、内周端面研磨工程(S51)および外周端面研磨工程(S52)の際には、上記の各工程とは別途に準備された固定治具60および位置決め具70が用いられる。固定治具60は、蓋部材61、および台座64を含む。蓋部材61は、中央に1つの開口62を有し、周縁近傍に4つの開口63を有する。台座64は、中央に1つの開口65を有し、周縁近傍の表面に支持部材66を有する。4つの支持部材66の位置は、蓋部材61に設けられた4つの開口63の位置にそれぞれ対応しており、4つの開口63にそれぞれ4つの支持部材66が差し込まれて、蓋部材61および台座64は相互に固定される。 Referring to FIG. 9, in the inner peripheral end surface polishing step (S51) and the outer peripheral end surface polishing step (S52), fixing jig 60 and positioning tool 70 prepared separately from the above steps are used. . The fixing jig 60 includes a lid member 61 and a pedestal 64. The lid member 61 has one opening 62 in the center and four openings 63 in the vicinity of the periphery. The pedestal 64 has one opening 65 in the center and a support member 66 on the surface in the vicinity of the periphery. The positions of the four support members 66 correspond to the positions of the four openings 63 provided in the lid member 61, and the four support members 66 are inserted into the four openings 63, respectively. 64 are fixed to each other.
 位置決め具70は、台座71および棒状部72(棒状の位置決め部材)を含む。棒状部72は、円柱状に形成され、台座71の中央において台座71の表面に対して垂直に起立するように設けられる。 The positioning tool 70 includes a pedestal 71 and a rod-shaped portion 72 (bar-shaped positioning member). The rod-like portion 72 is formed in a columnar shape, and is provided so as to stand perpendicularly to the surface of the pedestal 71 at the center of the pedestal 71.
 内周端面4および外周端面6の研削処理が実施されたガラス素板1は、図9に示すように、たとえば400枚ずつブロック状(ブロック体9)に重ね合わせられた状態で、固定治具60の4つの支持部材66の内側に収容される(矢印AR9参照)。ガラス素板1は、固定治具60の4つの支持部材66の内側に、積層されるように1枚ずつ順次収容されてもよい。複数のガラス素板1が固定治具60の内部に配置された後、位置決め具70が開口65から差し込まれる。 As shown in FIG. 9, the glass base plate 1 on which the inner peripheral end face 4 and the outer peripheral end face 6 have been ground is placed in a block shape (block body 9), for example, in a state where 400 pieces are stacked. 60 is accommodated inside four support members 66 (see arrow AR9). The glass base plates 1 may be sequentially accommodated one by one so as to be laminated inside the four support members 66 of the fixing jig 60. After the plurality of glass base plates 1 are arranged inside the fixing jig 60, the positioning tool 70 is inserted from the opening 65.
 図10は、位置決め具70が開口65から差し込まれた状態を示す断面図である。複数のガラス素板1は、内周端面4と棒状部72との当接によって、略同一直線上に並ぶように位置決め(整列)される。この際、棒状部72(位置決め部材)の外径D72は、孔5の内径D4に対して-0.05mm以上-0.03mm以下の寸法であるとよい。 FIG. 10 is a cross-sectional view showing a state in which the positioning tool 70 is inserted from the opening 65. The plurality of glass base plates 1 are positioned (aligned) so as to be aligned on substantially the same straight line by the contact between the inner peripheral end face 4 and the rod-shaped portion 72. At this time, the outer diameter D72 of the rod-like portion 72 (positioning member) is preferably a dimension of −0.05 mm or more and −0.03 mm or less with respect to the inner diameter D4 of the hole 5.
 たとえば400枚のガラス素板1は、位置決め具70によって位置決めされた状態で、ブロック体9として蓋部材61および台座64の間に固定される。隣接するガラス素板1同士の間には、スペーサーなどが設けられているとよい。複数のガラス素板1が位置決めおよび挟持固定された後、固定治具60から位置決め具70が引き抜かれる(図11参照)。 For example, 400 glass base plates 1 are fixed between the lid member 61 and the pedestal 64 as the block body 9 while being positioned by the positioning tool 70. A spacer or the like may be provided between the adjacent glass base plates 1. After the plurality of glass base plates 1 are positioned and sandwiched and fixed, the positioning tool 70 is pulled out from the fixing jig 60 (see FIG. 11).
 図11に示すように、複数のガラス素板1を固定治具60を用いて挟持固定する際に、棒状部72(位置決め部材)の外径D72が孔5の内径D4に対して-0.05mm以上-0.03mm以下の寸法であることによって、複数のガラス素板1は、精度良く位置決めされることができる。 As shown in FIG. 11, when the plurality of glass base plates 1 are clamped and fixed using the fixing jig 60, the outer diameter D72 of the rod-like portion 72 (positioning member) is −0. With the dimensions of 05 mm or more and −0.03 mm or less, the plurality of glass base plates 1 can be positioned with high accuracy.
 図12を参照して、複数のガラス素板1の内周端面4および外周端面6に対して研磨処理を実施する際には、研磨用ブラシ80(研磨部材)が用いられる。研磨用ブラシ80は、複数本のブラシ毛材81と軸部82とを含む。研磨用ブラシ80の表面に設けられたブラシ毛材81は、軸部82の周囲を螺旋状に取り囲むように配置される。 Referring to FIG. 12, a polishing brush 80 (abrasive member) is used when the polishing process is performed on the inner peripheral end surface 4 and the outer peripheral end surface 6 of the plurality of glass base plates 1. The polishing brush 80 includes a plurality of brush bristle materials 81 and a shaft portion 82. The brush bristle material 81 provided on the surface of the polishing brush 80 is disposed so as to surround the shaft portion 82 in a spiral shape.
 図13を参照して、研磨処理(特に内周端面4の研磨処理)に用いられる研磨用ブラシ80のブラシ毛材81の根元から毛先までの長さW81は、4mm以内であるとよい。 Referring to FIG. 13, the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is preferably 4 mm or less.
 図14を参照して、ここで、上述の端面研削工程(S40)の第1研削工程S41に用いられる研削用砥石40の研削面41および研削面42は、製作誤差などの影響によって、互いにわずかに異なる形状を有している。この製作誤差を完全に無くすことは困難であり、これらについては図7に示す研削面43~46についても同様である。また、これらについては、図8に示す研削面51~56についても同様である。 Referring to FIG. 14, here, the grinding surface 41 and the grinding surface 42 of the grinding wheel 40 used in the first grinding step S41 of the end surface grinding step (S40) are slightly different from each other due to the influence of manufacturing errors and the like. Have different shapes. It is difficult to completely eliminate this manufacturing error, and the same applies to the grinding surfaces 43 to 46 shown in FIG. The same applies to the grinding surfaces 51 to 56 shown in FIG.
 図14に示すように、たとえば、研削面41のうちの面取り加工用の研削面41aと、研削面42のうちの面取り加工用の研削面42aとが互いに同一形状となるように形成されている場合であっても、研削面41のうちの面取り加工用の研削面41cが、研削面42のうちの面取り加工用の研削面42cに比べて長く形成される場合がある。また、研削面41のうちの端面加工用の研削面41bが、研削面42のうちの端面加工用の研削面42bに比べて傾いて形成される場合もある。 As shown in FIG. 14, for example, the chamfering grinding surface 41 a of the grinding surface 41 and the chamfering grinding surface 42 a of the grinding surface 42 are formed to have the same shape. Even in this case, the chamfering grinding surface 41 c of the grinding surface 41 may be formed longer than the chamfering grinding surface 42 c of the grinding surface 42. Further, the grinding surface 41b for end surface processing in the grinding surface 41 may be formed to be inclined as compared with the grinding surface 42b for end surface processing in the grinding surface 42.
 図15を参照して、上述のブロック体9(図9参照)の中に、研削用砥石40の研削面41を用いて研削されたガラス素板1Aと、研削用砥石40の研削面42を用いて研削されたガラス素板1Bとが混在しているとする。この場合、研磨用ブラシ80を矢印AR80方向に回転させてガラス素板1A,1Bの各々の内周端面4に対して研磨処理を実施したとしても、研磨用ブラシ80の内周端面4に対する当り方にムラが生じることとなり、その結果、バッチ的に研磨処理された複数のガラス素板1A,1Bの内周端面4同士の間に形状のばらつきが生じてしまう。これは、複数のガラス素板1A,1Bの外周端面6についても同様である。 Referring to FIG. 15, the glass base plate 1 </ b> A ground using the grinding surface 41 of the grinding wheel 40 and the grinding surface 42 of the grinding wheel 40 in the block body 9 (see FIG. 9). It is assumed that the glass base plate 1B ground by use is mixed. In this case, even if the polishing brush 80 is rotated in the direction of the arrow AR80 and the inner peripheral end face 4 of each of the glass base plates 1A and 1B is subjected to the polishing process, the polishing brush 80 hits the inner peripheral end face 4. As a result, unevenness occurs, and as a result, variations in shape occur between the inner peripheral end faces 4 of the plurality of glass base plates 1A and 1B that have been subjected to batch polishing. The same applies to the outer peripheral end faces 6 of the plurality of glass base plates 1A and 1B.
 図16を参照して、本実施の形態におけるガラス基板の製造方法においては、内周端面4が研削された所定枚数のうちの複数のガラス素板を重ねるとともに、その重ねられた状態の複数のガラス素板の内周端面4を研磨用ブラシ80を使用して研磨する際、第1研削工程(S41)において研削された第1枚数分のガラス素板1Aと第2研削工程(S42)において研削された第2枚数分のガラス素板1Bとが相互に混在しないように複数のガラス素板1Aまたは複数のガラス素板1Bが重ねられた状態で、その重ねられた複数のガラス素板1Aまたは複数のガラス素板1Bの内周端面4が研磨される。第1研削工程(S41)において研削された第1枚数分のガラス素板1Aが連続するひと固まりとして重ねられた状態で、その重ねられた複数のガラス素板1Aの端面が研磨される。第2研削工程(S42)において研削された第2枚数分のガラス素板1Bが連続するひと固まりとして重ねられた状態で、その重ねられた複数のガラス素板1Bの前記端面が研磨される。 Referring to FIG. 16, in the method for manufacturing a glass substrate in the present embodiment, a plurality of glass base plates of a predetermined number of the inner peripheral end face 4 that have been ground are stacked and a plurality of the stacked base plates are stacked. When the inner peripheral end surface 4 of the glass base plate is polished using the polishing brush 80, the first number of glass base plates 1A ground in the first grinding step (S41) and the second grinding step (S42) In a state where a plurality of glass base plates 1A or a plurality of glass base plates 1B are stacked so that the second number of ground glass base plates 1B are not mixed with each other, the plurality of stacked glass base plates 1A Alternatively, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B are polished. In the state where the first number of glass base plates 1A ground in the first grinding step (S41) are stacked as a continuous lump, the end surfaces of the plurality of stacked glass base plates 1A are polished. In a state where the second number of glass base plates 1B ground in the second grinding step (S42) are stacked as a continuous lump, the end surfaces of the stacked glass base plates 1B are polished.
 図16に示すように、第1研削工程(S41)において研削された第1枚数分のうちの複数のガラス素板1Aのみを重ねて研磨処理を実施することにより、研磨用ブラシ80(ブラシ毛材81)の内周端面4に対する当たり方にムラが生じることは抑制され、結果として、バッチ的に研磨処理された複数のガラス素板1Aの内周端面4同士の間に形状のばらつきが生じることも抑制される。 As shown in FIG. 16, a polishing brush 80 (brush hairs) is obtained by performing a polishing process by stacking only a plurality of glass base plates 1A out of the first number of sheets ground in the first grinding step (S41). The occurrence of unevenness in how the material 81) hits the inner peripheral end face 4 is suppressed, and as a result, variations in shape occur between the inner peripheral end faces 4 of the plurality of glass base plates 1A subjected to batch polishing. This is also suppressed.
 図17を参照して、ガラス素板1Bについても同様に、第2研削工程(S42)において研削された第2枚数分のうちの複数のガラス素板1Bのみを重ねて研磨処理を実施することにより、研磨用ブラシ80(ブラシ毛材81)の内周端面4に対する当たり方にムラが生じることは抑制され、結果として、バッチ的に研磨処理された複数のガラス素板1Bの内周端面4同士の間に形状のばらつきが生じることも抑制される。 Referring to FIG. 17, similarly for glass base plate 1 </ b> B, a polishing process is performed by stacking only a plurality of glass base plates 1 </ b> B out of the second number of sheets ground in the second grinding step (S <b> 42). Thus, the occurrence of unevenness in the manner in which the polishing brush 80 (brush bristle material 81) hits the inner peripheral end surface 4 is suppressed, and as a result, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B subjected to batch polishing processing. It is also possible to suppress the variation in shape between them.
 図18を参照して、端面研磨工程(S50)においては、ブロック体9(図9参照)および研磨用ブラシ80が研磨液の中に完全に浸漬された状態で研磨処理が実施されても良いが、図18に示すように、内周端面4と研磨用ブラシ80との間に研磨スラリーが流し込まれつつ(掛け流されつつ)、研磨処理が実施されてもよい。 Referring to FIG. 18, in the end surface polishing step (S50), the polishing process may be performed in a state in which block body 9 (see FIG. 9) and polishing brush 80 are completely immersed in the polishing liquid. However, as shown in FIG. 18, the polishing process may be performed while the polishing slurry is poured (spread) between the inner peripheral end surface 4 and the polishing brush 80.
 この場合、円筒状の側壁91と、底板93と、蓋部材92とによって液密状に囲まれた領域内に、ブロック体9および研磨用ブラシ80が収容される。蓋部材92の中央に設けられた開口95から、ノズル90を用いて研磨スラリーが流し込まれつつ、研磨処理が実施される。 In this case, the block body 9 and the polishing brush 80 are accommodated in a region surrounded in a liquid-tight manner by the cylindrical side wall 91, the bottom plate 93, and the lid member 92. The polishing treatment is performed while polishing slurry is poured from the opening 95 provided in the center of the lid member 92 using the nozzle 90.
 図6を再び参照して、本実施の形態における端面研磨工程(S50)においては、内周端面研磨工程(S51)および外周端面研磨工程(S52)の双方において、それぞれガラス素板1Aおよびガラス素板1Bが混同しないようにバッチ的に研磨処理を実施する。なお、本実施の形態における端面研磨工程(S50)としては、内周端面研磨工程(S51)においてのみ、それぞれガラス素板1Aおよびガラス素板1Bが混同しないようにバッチ的に研磨処理を実施してもよいし、外周端面研磨工程(S52)においてのみ、それぞれガラス素板1Aおよびガラス素板1Bが混同しないようにバッチ的に研磨処理を実施してもよい。 Referring to FIG. 6 again, in the end surface polishing step (S50) in the present embodiment, both the glass base plate 1A and the glass base plate in both the inner peripheral end surface polishing step (S51) and the outer peripheral end surface polishing step (S52), respectively. The polishing process is performed batchwise so that the plates 1B are not confused. Note that as the end surface polishing step (S50) in the present embodiment, only the inner peripheral end surface polishing step (S51) is performed in a batch manner so that the glass base plate 1A and the glass base plate 1B are not confused with each other. Alternatively, only in the outer peripheral end surface polishing step (S52), the polishing process may be performed batchwise so that the glass base plate 1A and the glass base plate 1B are not confused with each other.
 (S60:ラップ加工工程)
 端面研磨工程(S50)を経たガラス素板1(ガラス素板1A,1B)を洗浄した後、ラッピング加工が行なわれる。砥粒の粒度をより細かいものに変更した後、ガラス素板1の主表面2,3に対してラッピング装置を用いたラッピング加工が行なわれる。
(S60: Lapping process)
After the glass base plate 1 ( glass base plates 1A and 1B) that has undergone the end surface polishing step (S50) is washed, lapping is performed. After changing the grain size of the abrasive grains to a finer one, lapping using a lapping device is performed on the main surfaces 2 and 3 of the glass base plate 1.
 (S70:ポリッシュ加工工程)
 ラップ加工工程(S60)を経たガラス素板1(ガラス素板1A,1B)を洗浄した後、ポリッシュ加工が行なわれる。研磨装置(硬質および軟質の研磨パッド)を用いて、ガラス素板1の主表面2,3に対してポリッシュ加工が行なわれる。
(S70: Polishing process)
Polishing is performed after washing | cleaning the glass base plate 1 ( glass base plate 1A, 1B) which passed through the lapping process (S60). Polishing is performed on the main surfaces 2 and 3 of the glass base plate 1 using a polishing apparatus (hard and soft polishing pads).
 (S80:化学強化工程)
 次に、洗浄工程を終えたガラス素板1(ガラス素板1A,1B)に化学強化処理を実施する。化学強化処理槽を準備し、その中に硝酸カリウム(60%)と硝酸ナトリウム(40%)とを混合した化学強化液を貯留する。化学強化液を300℃~400℃に加熱するとともに、洗浄済みのガラス素板1を200℃~300℃に予熱する。
(S80: Chemical strengthening process)
Next, a chemical strengthening process is implemented to the glass base plate 1 ( glass base plate 1A, 1B) which finished the washing | cleaning process. A chemical strengthening treatment tank is prepared, and a chemical strengthening liquid in which potassium nitrate (60%) and sodium nitrate (40%) are mixed is stored therein. The chemical strengthening liquid is heated to 300 ° C. to 400 ° C. and the cleaned glass base plate 1 is preheated to 200 ° C. to 300 ° C.
 化学強化液中に、ガラス素板1が3時間~4時間浸漬される。浸漬の際には、ガラス素板1の表面全体が化学強化されるため、複数のガラス素板1が各々の端面で保持されるように、複数のガラス素板1がホルダー等に収納された状態で浸漬されることが好ましい。 The glass base plate 1 is immersed in the chemical strengthening solution for 3 to 4 hours. Since the entire surface of the glass base plate 1 is chemically strengthened during the immersion, the plurality of glass base plates 1 are accommodated in a holder or the like so that the plurality of glass base plates 1 are held by the respective end faces. It is preferable to be immersed in a state.
 ガラス素板1に含まれるリチウムイオン、ナトリウムイオン等のアルカリ金属イオンは、これらのイオンに比べてイオン半径の大きなカリウムイオン等のアルカリ金属イオンによって置換される(イオン交換法)。イオン半径の違いによって生じる歪みより、イオン交換された領域に圧縮応力が発生し、ガラス素板の両主表面が強化される。 The alkali metal ions such as lithium ions and sodium ions contained in the glass base plate 1 are replaced by alkali metal ions such as potassium ions having a larger ion radius than these ions (ion exchange method). Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and both main surfaces of the glass base plate are strengthened.
 以上の各工程が終了した後、ガラス素板1に残存している付着物がなくなるように、ガラス素板1は950kHzの高周波を用いて超音波洗浄されたり、アルカリ洗剤を用いて洗浄されたりする。その後、IPAベーパーを用いてガラス素板1は乾燥される。以上により、本実施の形態におけるガラス基板が得られる。 After the above steps are completed, the glass base plate 1 is ultrasonically cleaned using a high frequency of 950 kHz, or cleaned using an alkaline detergent so that the adhered matter remaining on the glass base plate 1 is eliminated. To do. Thereafter, the glass base plate 1 is dried using IPA vapor. Thus, the glass substrate in the present embodiment is obtained.
 化学強化工程を経た後にガラス基板1の主表面上に残留している付着物が除去されることによって、ガラス基板1(図2および図3参照)を用いて製造される磁気ディスクなどの情報記録媒体10(図4および図5参照)にヘッドクラッシュが発生することが低減される。本実施の形態におけるガラス基板の製造方法(S100)としては、以上のように構成される。 Information recording such as a magnetic disk manufactured using the glass substrate 1 (see FIGS. 2 and 3) by removing the deposits remaining on the main surface of the glass substrate 1 after the chemical strengthening process. The occurrence of head crashes in the medium 10 (see FIGS. 4 and 5) is reduced. The glass substrate manufacturing method (S100) in the present embodiment is configured as described above.
 (S200:磁気薄膜形成工程)
 化学強化処理が完了したガラス基板の両主表面(またはいずれか一方の主表面)に対し、磁気記録層が形成される。磁気記録層は、たとえば、Cr合金からなる密着層、CoFeZr合金からなる軟磁性層、Ruからなる配向制御下地層、CoCrPt合金からなる垂直磁気記録層、C系からなる保護層、およびF系からなる潤滑層が順次成膜されることによって形成される。磁気記録層の形成によって、図4および図5に示す情報記録媒体10を得ることができる。
(S200: Magnetic thin film formation process)
Magnetic recording layers are formed on both main surfaces (or one of the main surfaces) of the glass substrate that has been subjected to the chemical strengthening treatment. The magnetic recording layer includes, for example, an adhesion layer made of a Cr alloy, a soft magnetic layer made of a CoFeZr alloy, an orientation control underlayer made of Ru, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer made of a C system, and an F system. Are formed by sequentially forming the lubricating layer. By forming the magnetic recording layer, the information recording medium 10 shown in FIGS. 4 and 5 can be obtained.
 (作用・効果)
 上述したように、本実施の形態におけるガラス基板の製造方法においては、内周端面4が研削された所定枚数のガラス素板1A,1Bの内周端面4を研磨用ブラシ80を使用して研磨する際、第1研削工程(S41)において研削された第1枚数分のガラス素板1Aと第2研削工程(S42)において研削された第2枚数分のガラス素板1Bとが相互に混在しないように複数のガラス素板が重ねられた状態で、その重ねられた複数のガラス素板の内周端面4が研磨される。
(Action / Effect)
As described above, in the glass substrate manufacturing method according to the present embodiment, the inner peripheral end surfaces 4 of the predetermined number of glass base plates 1A and 1B whose inner peripheral end surfaces 4 are ground are polished using the polishing brush 80. In doing so, the first number of glass base plates 1A ground in the first grinding step (S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other. Thus, the inner peripheral end surface 4 of the laminated | stacked several glass base plate is grind | polished in the state with which the several glass base plate was piled up.
 当該構成によれば、研磨用ブラシ80(ブラシ毛材81)の内周端面4に対する当たり方にムラが生じることは抑制され、結果として、バッチ的に研磨処理された複数のガラス素板1の内周端面4同士の間に形状のばらつきが生じることも抑制される。結果として、内周端面4において高い平滑性を有するガラス素板1を得ることができるため、ガラス素板1としての耐衝撃性を向上させることが可能となる。これは、外周端面6についても同様である。 According to the said structure, it is suppressed that a nonuniformity arises in the contact method with respect to the internal peripheral end surface 4 of the brush 80 for polishing (brush bristle material 81), and, as a result, of the some glass base plate 1 grind | polished by batch Variations in shape between the inner peripheral end faces 4 are also suppressed. As a result, since the glass base plate 1 having high smoothness can be obtained on the inner peripheral end face 4, it is possible to improve the impact resistance as the glass base plate 1. The same applies to the outer peripheral end face 6.
 また、研磨処理(特に内周端面4の研磨処理)に用いられる研磨用ブラシ80のブラシ毛材81の根元から毛先までの長さW81が4mm以内である場合、ガラス素板1の端面に対して研磨用ブラシ80のブラシ毛材81が当接した際、ガラス素板1の端面の受ける圧力分布が端面凹凸の影響を受けやすくなる。したがって、ガラス素板1Aとガラス素板1Bとが相互に混在しないようにして重ねてこれらを研磨することで、端面凹凸の影響を受けることが抑制され、研磨用ブラシ80のブラシ毛材81の根元から毛先までの長さW81が4mm以内の場合であっても高い平滑性を有するガラス素板1を得ることができる。 Further, when the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is within 4 mm, the end face of the glass base plate 1 On the other hand, when the brush bristle material 81 of the polishing brush 80 abuts, the pressure distribution received by the end face of the glass base plate 1 is easily affected by the unevenness of the end face. Therefore, by overlapping and polishing the glass base plate 1A and the glass base plate 1B so that they are not mixed with each other, the influence of the end surface irregularities is suppressed, and the brush bristle material 81 of the polishing brush 80 Even if the length W81 from the root to the hair tip is within 4 mm, the glass base plate 1 having high smoothness can be obtained.
 また、内周端面4と研磨用ブラシ80との間に研磨スラリーが流し込まれつつ研磨処理が実施される場合、研磨液に完全に液浸する装置と比較して、スラッジ(研磨屑)の排出能力が低くなり、加工レートも低下する。これに対して、ガラス素板1Aとガラス素板1Bとが相互に混在しないようにして重ねてこれらを研磨することにより、掛け流しタイプの研磨装置であっても加工レートが良くなり、研磨量のバラツキが無くなり良品率が向上する。 Further, when the polishing process is performed while the polishing slurry is poured between the inner peripheral end surface 4 and the polishing brush 80, the sludge (polishing waste) is discharged as compared with a device that is completely immersed in the polishing liquid. The capacity is lowered and the processing rate is also lowered. On the other hand, by laminating and polishing the glass base plate 1A and the glass base plate 1B so that they are not mixed with each other, the processing rate is improved even with a flow-through type polishing apparatus, and the polishing amount The non-uniformity is eliminated and the yield rate is improved.
 また、本実施の形態の研削工程においては、研削面がガラス素板1の端面に接触した状態でガラス素板1の周方向に摺動する。ガラス素板1の端面が周方向にのみ研削されるため、加工装置の簡素化を図ることが可能となる。 Also, in the grinding process of the present embodiment, the ground surface slides in the circumferential direction of the glass base plate 1 with the ground surface in contact with the end face of the glass base plate 1. Since the end surface of the glass base plate 1 is ground only in the circumferential direction, the processing apparatus can be simplified.
 [実験例]
 図19を参照して、実施例として、上記の実施の形態に基づく実施例1~4と、これらに対する比較例1~4とについて実験を行なった。実施例1~4および比較例1~4において、ガラス素板準備工程、平坦度を確保するアルミナ研磨工程、およびコアリング加工工程については、上述の実施の形態と同一の条件である。端面研削工程においては、実施例1~4では同一の砥石による同一の研削面を使用して複数のガラス素板1に対して研削処理を実施し、比較例1~4では、同一の砥石による異なる研削面、または異なる砥石による研削面を使用して、複数のガラス素板1に対して研削処理を実施した。
[Experimental example]
Referring to FIG. 19, as an example, an experiment was conducted on Examples 1 to 4 based on the above-described embodiment and Comparative Examples 1 to 4 for these. In Examples 1 to 4 and Comparative Examples 1 to 4, the glass base plate preparation process, the alumina polishing process for ensuring flatness, and the coring process are the same conditions as in the above-described embodiment. In the end surface grinding process, in Examples 1 to 4, a plurality of glass base plates 1 are ground using the same grinding surface with the same grindstone, and in Comparative Examples 1 to 4, the same grindstone is used. The grinding process was implemented with respect to the several glass base plate 1 using the grinding surface by a different grinding surface or a different grindstone.
 内周端面研磨工程においては、図19に示すように、実施例1~4ではガラス素板の混在が無いものとし、比較例1~4においては異なる研磨面で研磨された内周端面4を有するガラス素板1を混在させるものとした。外周端面研磨においては、ブラシ研磨とし、酸化セリウムを使用した。内周端面の研磨条件としては、一回の加工枚数を400枚のブロック体9とし、研磨用ブラシ80の回転数は4000rpmに設定し、ブロック体9の回転数は30rpmに設定した。ガラス素板1の孔5の内径は20.01mmであり、研磨加工時間は20minである。 In the inner peripheral end face polishing step, as shown in FIG. 19, it is assumed that the glass base plate is not mixed in Examples 1 to 4, and in Comparative Examples 1 to 4, the inner peripheral end face 4 polished by a different polishing face is used. The glass base plate 1 to be mixed was mixed. In the outer peripheral end face polishing, brush polishing was used and cerium oxide was used. As polishing conditions for the inner peripheral end face, 400 block bodies 9 were processed at one time, the rotation speed of the polishing brush 80 was set to 4000 rpm, and the rotation speed of the block body 9 was set to 30 rpm. The inner diameter of the hole 5 of the glass base plate 1 is 20.01 mm, and the polishing time is 20 min.
 ラップ加工においては、実施例1~4および比較例1~4に共通して、両面研磨機およびダイヤモンドシート固定砥粒による研削を行なった。ポリッシュ加工工程においては、実施例1~4および比較例1~4に共通して、第1ポリッシュ加工工程(P1)として、セリア砥粒および硬質ウレタンパッドを使用し、第2ポリッシュ加工工程(P2)として、コロイダルシリカ砥粒および硬質スウェードパッドを使用した。その後、得られたガラス素板1に対して化学強化を行ない、ガラス基板を得た。 In lapping, grinding was performed with a double-side polishing machine and diamond sheet fixed abrasive grains in common with Examples 1 to 4 and Comparative Examples 1 to 4. In the polishing process, in common with Examples 1 to 4 and Comparative Examples 1 to 4, as the first polishing process (P1), ceria abrasive grains and hard urethane pads are used, and the second polishing process (P2 ), Colloidal silica abrasive grains and hard suede pads were used. Thereafter, the obtained glass base plate 1 was chemically strengthened to obtain a glass substrate.
 (実施例1)
 実施例1においては、ガラス素板1の混在が無いようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.07mmである。研磨用ブラシ80のブラシ毛材81の長さは5mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
Example 1
In Example 1, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.07 mm. The length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (実施例2)
 実施例2においては、ガラス素板1の混在が無いようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.07mmである。研磨用ブラシ80のブラシ毛材81の長さは4mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Example 2)
In Example 2, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.07 mm. The length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (実施例3)
 実施例3においては、ガラス素板1の混在が無いようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.05mmである。研磨用ブラシ80のブラシ毛材81の長さは5mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Example 3)
In Example 3, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.05 mm. The length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (実施例4)
 実施例4においては、ガラス素板1の混在が無いようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.05mmである。研磨用ブラシ80のブラシ毛材81の長さは4mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Example 4)
In Example 4, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.05 mm. The length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (比較例1)
 比較例1においては、ガラス素板1の混在が有るようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.07mmである。研磨用ブラシ80のブラシ毛材81の長さは5mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Comparative Example 1)
In the comparative example 1, the block body 9 was comprised so that the glass base plate 1 might be mixed, and the polishing process was performed with respect to the block body 9 as mentioned above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.07 mm. The length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (比較例2)
 比較例2においては、ガラス素板1の混在が有るようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.07mmである。研磨用ブラシ80のブラシ毛材81の長さは4mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Comparative Example 2)
In Comparative Example 2, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.07 mm. The length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (比較例3)
 比較例3においては、ガラス素板1の混在が有るようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.05mmである。研磨用ブラシ80のブラシ毛材81の長さは5mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Comparative Example 3)
In Comparative Example 3, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.05 mm. The length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 (比較例4)
 比較例4においては、ガラス素板1の混在が有るようにブロック体9を構成し、そのブロック体9に対して上述のように研磨処理を行なった。位置決め具70として用いた棒状部72(位置決め部材)のガラス素板1の孔5の内径に対する寸法(外形寸法)は、-0.05mmである。研磨用ブラシ80のブラシ毛材81の長さは4mmである。研磨の際には、上述の図18に示すように、研磨スラリーを内周端面4と研磨用ブラシ80との間に掛け流した。
(Comparative Example 4)
In Comparative Example 4, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above. The dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is −0.05 mm. The length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
 実施例1~4および比較例1~4によって得られたガラス素板1に対して、内周端面4の検査を行なった。検査方法としては、内周端面4について、AFM(ビーコ社製Dimension3100および計測ソフトNanoScope7.2)を使用して粗さ計測を行い、表面粗さRaの値が1.0nm以上であるガラス素板1の割合を調査し、該当するガラス素板1の割合が10%以上の場合をB評価とし、10%未満6%以上の場合をA評価とし、6%未満の場合をS評価とした。 The inner peripheral end face 4 was inspected for the glass base plates 1 obtained in Examples 1 to 4 and Comparative Examples 1 to 4. As an inspection method, the inner peripheral end surface 4 is measured for roughness using AFM (Dimension 3100 manufactured by Beco Co., Ltd. and measurement software NanoScope 7.2), and the glass base plate having a surface roughness Ra of 1.0 nm or more. The ratio of 1 was investigated, the case where the ratio of the corresponding glass base plate 1 was 10% or more was B evaluation, the case of less than 10% 6% or more was A evaluation, and the case of less than 6% was S evaluation.
 また、破壊試験として、ガラス素板1に成膜処理を施して情報記録媒体10としたものを、実際の情報記録装置30(ハードディスクドライブ)に組み込み、各条件について40台ずつの耐衝撃試験を行った。耐衝撃試験としては、情報記録装置30に対して鉛直方向に1000Gの衝撃を加え、試験後の情報記録媒体10の表面の破壊の有無状況(良品率)を確認した。 In addition, as a destructive test, an information recording medium 10 formed by subjecting the glass base plate 1 to film formation is incorporated into an actual information recording device 30 (hard disk drive), and 40 shock resistance tests are performed for each condition. went. As an impact resistance test, an impact of 1000 G was applied to the information recording device 30 in the vertical direction, and the presence / absence state (good product rate) of the surface of the information recording medium 10 after the test was confirmed.
 図19に示すように、その結果、実施例1~4においては内周端面4の状態がいずれもA評価またはS評価であったのに対して、比較例1~4においてはすべてB評価であった。また、比較例1~4においては、破壊台数の多い結果が得られた。比較例1~4のガラス素板1の破壊状況を確認したところ、ガラス素板1の内周端面4近傍に内部クラックが発生しており、これが破壊の原因と推定される痕跡が確認された。すなわち、比較例1~4においては、研磨加工前形状にガラス素板1の内周端面同士の間でバラツキが存在していたため、良好な研磨が行なわれなかったものと考えられる。 As shown in FIG. 19, as a result, in Examples 1 to 4, the state of the inner peripheral end face 4 was A evaluation or S evaluation, whereas in Comparative Examples 1 to 4, all were B evaluation. there were. In Comparative Examples 1 to 4, results with a large number of destruction were obtained. As a result of confirming the breaking conditions of the glass base plates 1 of Comparative Examples 1 to 4, an internal crack was generated in the vicinity of the inner peripheral end face 4 of the glass base plate 1, and traces that were estimated to be the cause of the break were confirmed. . In other words, in Comparative Examples 1 to 4, it was considered that good polishing was not performed because there was a variation between the inner peripheral end faces of the glass base plate 1 in the shape before polishing.
 また、位置決め具70の棒状部72の外形寸法としては、ガラス素板1の孔5の内径に対して、-0.07mmの場合に比べて-0.05mmの場合の方が良好な結果が得られた。-0.05mmの場合の方が、内周端面4は均一に研磨されたと考えられる。棒状部72の外形寸法がガラス素板1の孔5の内径に対して-0.03mm未満となる場合は、ガラス素板1の孔5に対して良好に挿通されず、使用がやや困難であった。 As for the external dimensions of the rod-like portion 72 of the positioning tool 70, a better result is obtained when -0.05 mm than the case of -0.07 mm with respect to the inner diameter of the hole 5 of the glass base plate 1. Obtained. In the case of −0.05 mm, the inner peripheral end face 4 is considered to be uniformly polished. When the outer dimension of the rod-like portion 72 is less than −0.03 mm with respect to the inner diameter of the hole 5 of the glass base plate 1, it is not inserted well into the hole 5 of the glass base plate 1, and it is somewhat difficult to use. there were.
 したがって、本実施例の結果からも、内周端面4が研削された所定枚数のガラス素板1A,1Bの内周端面4を研磨用ブラシ80を使用して研磨する際、第1研削工程(S41)において研削された第1枚数分のガラス素板1Aと第2研削工程(S42)において研削された第2枚数分のガラス素板1Bとが相互に混在しないように複数のガラス素板を重ねた状態で、その重ねられた複数のガラス素板の内周端面4が研磨されることにより、研磨用ブラシ80(ブラシ毛材81)の内周端面4に対する当たり方にムラが生じることは抑制され、結果として、バッチ的に研磨処理された複数のガラス素板1の内周端面4同士の間に形状のばらつきが生じることも抑制されることがわかる。当該構成によれば、内周端面4において高い平滑性を有するガラス素板1を得ることができるため、ガラス素板1としての耐衝撃性を向上させることが可能となることがわかる。 Therefore, also from the result of the present embodiment, when the inner peripheral end surfaces 4 of the predetermined number of glass base plates 1A and 1B with the inner peripheral end surfaces 4 ground are polished using the polishing brush 80, the first grinding step ( A plurality of glass base plates are arranged so that the first number of glass base plates 1A ground in S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other. When the inner peripheral end surfaces 4 of the plurality of stacked glass base plates are polished in the stacked state, unevenness occurs in the manner in which the polishing brush 80 (brush bristle material 81) contacts the inner peripheral end surface 4. As a result, it can be seen that variation in shape between the inner peripheral end faces 4 of the plurality of glass base plates 1 polished in batch is also suppressed. According to the said structure, since the glass base plate 1 which has high smoothness in the inner peripheral end surface 4 can be obtained, it turns out that the impact resistance as the glass base plate 1 can be improved.
 以上、本発明に基づいた各実施の形態および各実施例について説明したが、今回開示された各実施の形態および各実施例はすべての点で例示であって制限的なものではない。本発明の技術的範囲は請求の範囲によって示され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 As mentioned above, although each embodiment and each Example based on this invention were demonstrated, each embodiment and each Example disclosed this time are illustrations in all points, and are not restrictive. The technical scope of the present invention is defined by the terms of the claims, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.
 1 ガラス基板(ガラス素板)、2,3 主表面、4 内周端面、5,15 孔、6 外周端面、7,8 面取部、9 ブロック体、10 情報記録媒体、12 化学強化層、14 磁気記録層、20 筐体、21 ヘッドスライダー、22 サスペンション、23 アーム、24 垂直軸、25 ボイスコイル、26 ボイスコイルモーター、27 クランプ部材、28 固定ネジ、30 情報記録装置、40,50 研削用砥石、41,42,43,44,45,46,41a,41b,41c,42a,42b,42c,51,52,53,54,55,56 研削面、47,48,57,58 支持部、60 固定治具、61,92 蓋部材、62,63,65,95 開口、64,71 台座、66 支持部材、70 位置決め具、72 棒状部、80 研磨用ブラシ、81 ブラシ毛材、82 軸部、90 ノズル、91 側壁、93 底板。 DESCRIPTION OF SYMBOLS 1 Glass substrate (glass base plate), 2, 3 main surface, 4 inner peripheral end surface, 5,15 hole, 6 outer peripheral end surface, 7,8 chamfer part, 9 block body, 10 information recording medium, 12 chemical strengthening layer, 14 magnetic recording layer, 20 housing, 21 head slider, 22 suspension, 23 arm, 24 vertical axis, 25 voice coil, 26 voice coil motor, 27 clamp member, 28 fixing screw, 30 information recording device, 40, 50 for grinding Grinding wheel, 41, 42, 43, 44, 45, 46, 41a, 41b, 41c, 42a, 42b, 42c, 51, 52, 53, 54, 55, 56 grinding surface, 47, 48, 57, 58 support, 60 fixing jig, 61, 92 lid member, 62, 63, 65, 95 opening, 64, 71 pedestal, 66 support member, 70 positioning , 72 bar-like portion, 80 a polishing brush 81 brush hairs, 82 shaft portion, 90 a nozzle, 91 a sidewall, 93 a bottom plate.

Claims (7)

  1.  端面を有する所定枚数のガラス素板を準備する工程と、
     第1砥石研削面を使用して、前記所定枚数のうちの第1枚数分の前記ガラス素板の前記端面を研削する第1研削工程と、
     第2砥石研削面を使用して、前記所定枚数のうちの第2枚数分の前記ガラス素板の前記端面を研削する第2研削工程と、
     前記端面が研削された前記所定枚数のうちの複数の前記ガラス素板を重ねるとともに、その重ねられた状態の複数の前記ガラス素板の前記端面を研磨部材を使用して研磨する工程と、を備え、
     前記端面を研磨する工程においては、前記第1研削工程において研削された前記第1枚数分の前記ガラス素板と前記第2研削工程において研削された前記第2枚数分の前記ガラス素板とが相互に混在しないように複数の前記ガラス素板が重ねられた状態で、その重ねられた複数の前記ガラス素板の前記端面が研磨される、
    情報記録媒体用ガラス基板の製造方法。
    Preparing a predetermined number of glass base plates having end faces;
    A first grinding step of grinding the end face of the glass base plate for the first number of the predetermined number of sheets using a first grinding wheel grinding surface;
    A second grinding step of grinding the end face of the glass base plate for a second number of the predetermined number of sheets using a second grinding wheel grinding surface;
    A step of superposing a plurality of the glass base plates of the predetermined number of the ground end surfaces, and polishing the end surfaces of the superposed glass base plates using a polishing member; Prepared,
    In the step of polishing the end surface, the first number of glass base plates ground in the first grinding step and the second number of glass base plates ground in the second grinding step include In a state where a plurality of the glass base plates are stacked so as not to be mixed with each other, the end surfaces of the stacked plurality of glass base plates are polished.
    A method for producing a glass substrate for an information recording medium.
  2.  端面を有する所定枚数のガラス素板を準備する工程と、
     第1砥石研削面を使用して、前記所定枚数のうちの第1枚数分の前記ガラス素板の前記端面を研削する第1研削工程と、
     第2砥石研削面を使用して、前記所定枚数のうちの第2枚数分の前記ガラス素板の前記端面を研削する第2研削工程と、
     前記端面が研削された前記所定枚数のうちの複数の前記ガラス素板を重ねるとともに、その重ねられた状態の複数の前記ガラス素板の前記端面を研磨部材を使用して研磨する工程と、を備え、
     前記端面を研磨する工程においては、前記第1研削工程において研削された前記第1枚数分の前記ガラス素板が連続するひと固まりとして重ねられた状態で、その重ねられた複数の前記ガラス素板の前記端面が研磨され、前記第2研削工程において研削された前記第2枚数分の前記ガラス素板が連続するひと固まりとして重ねられた状態で、その重ねられた複数の前記ガラス素板の前記端面が研磨される、
    情報記録媒体用ガラス基板の製造方法。
    Preparing a predetermined number of glass base plates having end faces;
    A first grinding step of grinding the end face of the glass base plate for the first number of the predetermined number of sheets using a first grinding wheel grinding surface;
    A second grinding step of grinding the end face of the glass base plate for a second number of the predetermined number of sheets using a second grinding wheel grinding surface;
    A step of superposing a plurality of the glass base plates of the predetermined number of the ground end surfaces, and polishing the end surfaces of the superposed glass base plates using a polishing member; Prepared,
    In the step of polishing the end surface, the plurality of glass base plates stacked in the state where the first number of the glass base plates ground in the first grinding step are stacked as a continuous lump. The end surfaces of the plurality of glass base plates stacked in a state in which the second number of glass base plates ground in the second grinding step are stacked as a continuous lump. The end face is polished,
    A method for producing a glass substrate for an information recording medium.
  3.  棒状の位置決め部材を準備する工程をさらに備え、
     前記ガラス素板には、一方の主表面から他方の主表面に向かって貫通する孔が設けられており、
     前記端面は、前記孔を形成する内周端面であり、
     前記内周端面を研磨する工程においては、重ねられた状態にある複数の前記ガラス素板の前記孔に前記位置決め部材が差し込まれることによって、重ねられた状態にある複数の前記ガラス素板は位置決めされ、
     前記位置決め部材の外径は、前記孔の内径に対して-0.05mm以上-0.03mm以下の寸法である、
    請求項1または2に記載の情報記録媒体用ガラス基板の製造方法。
    A step of preparing a rod-shaped positioning member;
    The glass base plate is provided with a hole penetrating from one main surface toward the other main surface,
    The end face is an inner peripheral end face that forms the hole,
    In the step of polishing the inner peripheral end face, the plurality of glass base plates in the stacked state are positioned by inserting the positioning members into the holes of the plurality of glass base plates in the stacked state. And
    The outer diameter of the positioning member is a dimension of −0.05 mm or more and −0.03 mm or less with respect to the inner diameter of the hole.
    The manufacturing method of the glass substrate for information recording media of Claim 1 or 2.
  4.  前記研磨部材は、複数本のブラシ毛材を表面に有する研磨用ブラシであり、
     前記端面を研磨する工程においては、重ねられた複数の前記ガラス素板の前記端面が、前記研磨用ブラシの前記ブラシ毛材によって研磨され、
     前記ブラシ毛材の根元から毛先までの長さは、4mm以内である、
    請求項1から3のいずれかに記載の情報記録媒体用ガラス基板の製造方法。
    The polishing member is a polishing brush having a plurality of brush bristle materials on the surface,
    In the step of polishing the end surface, the end surfaces of the plurality of stacked glass base plates are polished by the brush bristle material of the polishing brush,
    The length from the root of the brush bristle material to the hair tip is within 4 mm,
    The manufacturing method of the glass substrate for information recording media in any one of Claim 1 to 3.
  5.  前記端面を研磨する工程においては、前記研磨部材と前記端面との間に研磨スラリーが流し込まれる、
    請求項1から4のいずれかに記載の情報記録媒体用ガラス基板の製造方法。
    In the step of polishing the end face, a polishing slurry is poured between the polishing member and the end face.
    The manufacturing method of the glass substrate for information recording media in any one of Claim 1 to 4.
  6.  前記ガラス素板の前記端面を研削する際、前記第1砥石研削面およびまたは前記第2砥石研削面は、前記端面に対して接触した状態で前記ガラス素板の周方向に沿って摺動する、
    請求項1から5のいずれかに記載の情報記録媒体用ガラス基板の製造方法。
    When grinding the end surface of the glass base plate, the first grinding wheel grinding surface and / or the second grinding wheel grinding surface slide along the circumferential direction of the glass base plate in contact with the end surface. ,
    The manufacturing method of the glass substrate for information recording media in any one of Claim 1 to 5.
  7.  請求項1から6のいずれかに記載の情報記録媒体用ガラス基板の製造方法を使用して製造された、
    情報記録媒体用ガラス基板。
    It manufactured using the manufacturing method of the glass substrate for information recording media in any one of Claim 1 to 6.
    Glass substrate for information recording media.
PCT/JP2012/082485 2011-12-27 2012-12-14 Glass substrate for information recording medium and method for producing same WO2013099656A1 (en)

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CN110732924A (en) * 2019-10-24 2020-01-31 合肥维信诺科技有限公司 grinding device

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