WO2013099656A1 - Substrat en verre pour support d'enregistrement d'informations et procédé de production associé - Google Patents

Substrat en verre pour support d'enregistrement d'informations et procédé de production associé Download PDF

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Publication number
WO2013099656A1
WO2013099656A1 PCT/JP2012/082485 JP2012082485W WO2013099656A1 WO 2013099656 A1 WO2013099656 A1 WO 2013099656A1 JP 2012082485 W JP2012082485 W JP 2012082485W WO 2013099656 A1 WO2013099656 A1 WO 2013099656A1
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WIPO (PCT)
Prior art keywords
glass base
grinding
polishing
base plates
base plate
Prior art date
Application number
PCT/JP2012/082485
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English (en)
Japanese (ja)
Inventor
小松　隆史
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コニカミノルタ株式会社
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Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Publication of WO2013099656A1 publication Critical patent/WO2013099656A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/005—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor for mass articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • the present invention relates to a glass substrate for information recording media and a method for manufacturing the same, and in particular, a glass substrate for information recording media mounted as part of an information recording medium in an information recording device such as a hard disk drive (HDD), and It relates to the manufacturing method.
  • HDD hard disk drive
  • An information recording medium (magnetic disk) is mounted inside an information recording device such as a hard disk drive.
  • the information recording medium is manufactured by forming a magnetic recording layer for magnetic recording on the main surface of a disk-shaped glass substrate having a hole in the center.
  • a glass substrate used for manufacturing an information recording medium is referred to as an information recording medium glass substrate (hereinafter also simply referred to as a glass substrate).
  • a method for manufacturing a glass substrate for an information recording medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 2006-236561 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2007-250145 (Patent Document 2).
  • the impact resistance required for information recording media tends to increase year by year.
  • the impact resistance of the information recording medium is reduced.
  • the inner and outer peripheral end faces of the information recording medium need to be formed sufficiently smooth by polishing.
  • a glass substrate (glass base plate) is ground by a grinding process and then polished with a polishing slurry. From the standpoint of improving manufacturing efficiency, etc., when performing polishing on the inner peripheral end face or outer peripheral end face of the glass base plate, the glass base plate is batch-polished in a state where a plurality of glass base plates are stacked. May be processed.
  • the present inventors examined the cause of variation between end surfaces (end surface shape before polishing treatment) of a plurality of stacked glass base plates, and the cause was grinding the end surfaces of the glass base plates. It was found that this was caused by the end face grinding process.
  • the end surface of the glass base plate is ground using the grinding surface of the grindstone.
  • the shape of the end face of the glass base plate after the grinding treatment has a unique wrinkle for each grinding surface of the grindstone because the shape of the grinding face of the grindstone is transferred almost as it is to the end face of the glass base plate.
  • glass base plates having different end face shapes ( ⁇ ) are mixed in the plurality of stacked glass base plates. It will be.
  • the inventors of the present invention can overlap a plurality of glass base plates that have been ground with different grindstones or different grinding surfaces, so that the shape (end surface before polishing treatment) is between the end faces of the plurality of stacked glass base plates. It was found that the variation in the shape of the end surfaces of the plurality of glass base plates that had been subjected to batch polishing was caused.
  • An object of the present invention is to provide a glass substrate for an information recording medium capable of suppressing the occurrence of variation in shape and a method for manufacturing the same.
  • a method for manufacturing a glass substrate for an information recording medium comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface.
  • the first grinding step of grinding the end face of the glass base plate for one sheet and the second grindstone grinding surface are used to grind the end face of the glass base plate for the second number of the predetermined number.
  • the first number of glass base plates ground in the first grinding step and the second ground ground in the second grinding step.
  • a method of manufacturing a glass substrate for an information recording medium comprising: preparing a predetermined number of glass base plates having end faces; and using a first grindstone grinding surface, Using the first grinding step of grinding the end face of the glass base plate for the first number of sheets and the second grinding wheel grinding surface, the end face of the glass base plate for the second number of the predetermined number of sheets is used.
  • a second grinding step for grinding and a plurality of the glass base plates of the predetermined number of the ground end surfaces are stacked, and the end surfaces of the plurality of the glass base plates in a stacked state are used as a polishing member
  • the first glass sheets ground in the first grinding step are stacked as a continuous mass
  • the plurality of stacked glass elements are stacked. The end face of the plate is polished.
  • the method for manufacturing a glass substrate for an information recording medium further includes a step of preparing a rod-shaped positioning member, and the glass base plate is directed from one main surface to the other main surface.
  • the end surface is an inner peripheral end surface that forms the hole, and in the step of polishing the inner peripheral end surface, the plurality of glass base plates in the stacked state are By inserting the positioning member into the hole, the plurality of glass base plates in a stacked state are positioned, and the outer diameter of the positioning member is ⁇ 0.05 mm or more with respect to the inner diameter of the hole. It is a dimension of 03 mm or less.
  • the polishing member is a polishing brush having a plurality of brush bristle materials on a surface thereof, and in the step of polishing the end surface, the end surfaces of the plurality of stacked glass base plates are used for the polishing. It is ground by the brush bristle material of the brush, and the length from the root to the hair tip of the brush bristle material is within 4 mm.
  • a polishing slurry is poured between the polishing member and the end face.
  • the first grinding wheel grinding surface and / or the second grinding wheel grinding surface are in contact with the end surface along the circumferential direction of the glass base plate. Slide.
  • the glass substrate for information recording medium based on the present invention is manufactured using the above-described method for manufacturing a glass substrate for information recording medium based on the present invention.
  • the present invention even when batch polishing is performed on a plurality of glass base plates, information recording that can suppress the occurrence of variation in shape between the end faces of the plurality of glass base plates.
  • a glass substrate for a medium and a manufacturing method thereof can be obtained.
  • FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2. It is a top view which shows the information recording medium provided with the glass substrate manufactured by the manufacturing method of the glass substrate for information recording media in embodiment.
  • FIG. 5 is a cross-sectional view taken along line VV in FIG. 4. It is a flowchart which shows the manufacturing method of the glass substrate for information recording media in embodiment.
  • sectional drawing which shows a mode that the glass base plate from which end surface shape differs is mixed in a block body. It is sectional drawing (the 1) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. It is sectional drawing (the 2) which shows a mode that the glass base plate from which end surface shape differs is not mixed in a block body. It is sectional drawing which shows a mode when polishing slurry is poured between the brush for grinding
  • FIG. 1 is a perspective view showing the information recording apparatus 30.
  • the information recording apparatus 30 includes the glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium (hereinafter also simply referred to as a glass substrate) in the embodiment as the information recording medium 10.
  • the information recording device 30 includes an information recording medium 10, a housing 20, a head slider 21, a suspension 22, an arm 23, a vertical shaft 24, a voice coil 25, a voice coil motor 26, a clamp member 27, and a fixing screw. 28.
  • a spindle motor (not shown) is installed on the upper surface of the housing 20.
  • An information recording medium 10 such as a magnetic disk is rotatably fixed to the spindle motor by a clamp member 27 and a fixing screw 28.
  • the information recording medium 10 is rotationally driven by this spindle motor at, for example, several thousand rpm.
  • a chemically strengthened layer 12 see FIG. 5
  • a magnetic recording layer 14 see FIGS. 4 and 5 are formed on the glass substrate 1. To be manufactured.
  • the arm 23 is attached so as to be swingable around the vertical axis 24.
  • a suspension 22 formed in a leaf spring (cantilever) shape is attached to the tip of the arm 23.
  • a head slider 21 is attached to the tip of the suspension 22 so as to sandwich the information recording medium 10.
  • a voice coil 25 is attached to the opposite side of the arm 23 from the head slider 21.
  • the voice coil 25 is clamped by a magnet (not shown) provided on the housing 20.
  • a voice coil motor 26 is constituted by the voice coil 25 and the magnet.
  • a predetermined current is supplied to the voice coil 25.
  • the arm 23 swings around the vertical axis 24 by the action of electromagnetic force generated by the current flowing through the voice coil 25 and the magnetic field of the magnet.
  • the suspension 22 and the head slider 21 also swing in the direction of the arrow AR1.
  • the head slider 21 reciprocates on the front and back surfaces of the information recording medium 10 in the radial direction of the information recording medium 10.
  • a magnetic head (not shown) provided on the head slider 21 performs a seek operation.
  • the head slider 21 While the seek operation is performed, the head slider 21 receives a levitation force due to the air flow generated as the information recording medium 10 rotates. Due to the balance between the levitation force and the elastic force (pressing force) of the suspension 22, the head slider 21 travels with a constant flying height with respect to the surface of the information recording medium 10. By the traveling, the magnetic head provided on the head slider 21 can record and reproduce information (data) on a predetermined track in the information recording medium 10.
  • the information recording apparatus 30 on which the glass substrate 1 is mounted as a part of the members constituting the information recording medium 10 is configured as described above.
  • FIG. 2 is a plan view showing glass substrate 1 manufactured by the method for manufacturing a glass substrate for information recording medium according to the present embodiment.
  • 3 is a cross-sectional view taken along the line III-III in FIG.
  • the glass substrate 1 (glass substrate for information recording medium) used as a part of the information recording medium 10 (see FIGS. 4 and 5) has a main surface 2, a main surface 3, It has the inner peripheral end surface 4, the hole 5, and the outer peripheral end surface 6, and is formed in a disk shape as a whole.
  • the hole 5 is provided so as to penetrate from one main surface 2 toward the other main surface 3.
  • a chamfer 7 is formed between the main surface 2 and the inner peripheral end surface 4 and between the main surface 3 and the inner peripheral end surface 4.
  • a chamfered portion 8 (chamfer portion) is formed between the main surface 2 and the outer peripheral end surface 6 and between the main surface 3 and the outer peripheral end surface 6, a chamfered portion 8 (chamfer portion) is formed.
  • the size of the glass substrate 1 is, for example, 0.8 inch, 1.0 inch, 1.8 inch, 2.5 inch, or 3.5 inch.
  • the thickness of the glass substrate is, for example, 0.30 mm to 2.2 mm from the viewpoint of preventing breakage.
  • the glass substrate has an outer diameter of about 64 mm, an inner diameter of about 20 mm, and a thickness of about 0.8 mm.
  • the thickness of the glass substrate is a value calculated by averaging the values measured at a plurality of arbitrary points to be pointed on the glass substrate.
  • FIG. 4 is a plan view showing an information recording medium 10 provided with a glass substrate 1 as an information recording medium.
  • FIG. 5 is a cross-sectional view taken along the line VV in FIG.
  • the information recording medium 10 includes a glass substrate 1, a chemical strengthening layer 12, and a magnetic recording layer 14.
  • Chemical strengthening layer 12 is formed to cover main surfaces 2 and 3, inner peripheral end surface 4, and outer peripheral end surface 6 of glass substrate 1.
  • the magnetic recording layer 14 is formed so as to cover a predetermined region on the main surfaces 2 and 3 of the chemical strengthening layer 12.
  • a hole 15 is formed inside the inner peripheral end face 4.
  • the information recording medium 10 is fixed to a spindle motor provided on the housing 20 (see FIG. 1) using the holes 15.
  • the magnetic recording layer 14 is formed on both (both sides) the chemical strengthening layer 12 formed on the main surface 2 and the chemical strengthening layer 12 formed on the main surface 3. Is formed.
  • the magnetic recording layer 14 may be provided only on the chemical strengthening layer 12 (one side) formed on the main surface 2, or on the chemical strengthening layer 12 (one side) formed on the main surface 3. It may be provided.
  • the magnetic recording layer 14 is formed by spin-coating a thermosetting resin in which magnetic particles are dispersed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1 (spin coating method).
  • the magnetic recording layer 14 may be formed by a sputtering method or an electroless plating method performed on the chemical strengthening layer 12 on the main surfaces 2 and 3 of the glass substrate 1.
  • the thickness of the magnetic recording layer 14 is about 0.3 ⁇ m to 1.2 ⁇ m for the spin coating method, about 0.04 ⁇ m to 0.08 ⁇ m for the sputtering method, and about 0.05 ⁇ m to about the electroless plating method. 0.1 ⁇ m. From the viewpoint of thinning and high density, the magnetic recording layer 14 is preferably formed by sputtering or electroless plating.
  • a Co-based alloy or the like containing Ni or Cr as a main component is added for the purpose of adjusting the residual magnetic flux density. Is preferably used.
  • the surface of the magnetic recording layer 14 may be thinly coated with a lubricant.
  • a lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon.
  • the magnetic recording layer 14 may be provided with a base layer or a protective layer as necessary.
  • the underlayer in the information recording medium 10 is selected according to the type of magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
  • the underlayer provided on the magnetic recording layer 14 is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked.
  • a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.
  • Examples of the protective layer for preventing wear and corrosion of the magnetic recording layer 14 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus together with the underlayer and the magnetic film. These protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.
  • Another protective layer may be formed on the protective layer or instead of the protective layer.
  • tetraalkoxylane is diluted with an alcohol-based solvent on a Cr layer, and then colloidal silica fine particles are dispersed and applied, followed by baking to form a silicon oxide (SiO 2 ) layer. It may be formed.
  • the glass substrate manufacturing method (S100) in the present embodiment includes a glass base plate preparation step (S10), an alumina polishing step (S20), a coring step (S30), an end surface grinding step (S40), and an end surface polishing step ( S50), a lapping process (S60), a polishing process (S70), and a chemical strengthening process (S80).
  • a magnetic recording layer deposition step (S200) is performed on the glass substrate obtained through the chemical strengthening step (S80).
  • the information recording medium 10 (see FIGS. 4 and 5) is obtained through the magnetic recording layer deposition step (S200).
  • the details of the steps S10 to S80 constituting the glass substrate manufacturing method (S100) will be described in order. In the following description, the simple cleaning appropriately performed between the steps S10 to S80 will be described in detail. It may not be listed.
  • a predetermined number of substantially disk-shaped glass base plates constituting the glass substrate are prepared.
  • the glass base plate can be obtained, for example, by directly pressing molten glass using an upper mold, a lower mold, and a body mold.
  • a disk-shaped glass base plate may be obtained by cutting out with a grinding wheel from a sheet glass formed by using a downdraw method or a float method.
  • alumina polishing is performed on a predetermined number of glass base plates.
  • the purpose of this alumina polishing treatment is to improve dimensional accuracy and shape accuracy.
  • the alumina polishing process is performed using a lapping apparatus. By using alumina abrasive grains of particle size # 400, setting the load to about 100 kg and rotating the inner and outer rotation gears, both main surfaces of the glass base plate housed in the carrier are polished.
  • the end surface grinding step (S40) in the present embodiment includes a first grinding step (S41) and a second grinding step (S42).
  • a grinding wheel 40 when a grinding process is performed on the inner peripheral end face 4 of a predetermined number of glass base plates 1 (glass substrate), a grinding wheel 40 is used.
  • the grinding wheel 40 includes grinding surfaces 41 to 46 and is rotatably supported by support portions 47 and 48.
  • the grinding surface 41 is brought into contact with the inner peripheral end surface 4 of the glass base plate 1 while the grinding wheel 40 receives driving force and rotates in the direction of the arrow AR40.
  • the inner peripheral end surface 4 of the glass base plate 1 has a chamfered portion 7 by sliding in the circumferential direction of the glass base plate 1 with the grinding surface 41 in contact with the inner peripheral end surface 4 of the glass base plate 1. It is ground to the shape.
  • First grinding step S41 In the end surface grinding step (S40) of the present embodiment, the inner circumference of the glass base plate 1 corresponding to the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. A grinding process is performed on the end surface 4 using a grinding surface 41 (first grinding wheel grinding surface). The service life of the grinding surface 41 expires by the grinding process for the first number of sheets.
  • the step of grinding the inner peripheral end face of the first number of glass base plates out of a predetermined number using the grinding surface 41 (first grindstone grinding face) is the first grinding step (S41) (inner peripheral end face 4). Corresponds to the grinding step).
  • Step S42 Thereafter, a grinding process is performed on the inner peripheral end face 4 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets using the grinding surface 42 (second grinding wheel grinding surface).
  • the service life of the grinding surface 42 expires by the second number of grinding processes.
  • the step of grinding the inner peripheral end surface of the second number of glass base plates out of a predetermined number using the grinding surface 42 (second grindstone grinding surface) is the second grinding step (S42) (inner peripheral end surface 4).
  • the 2nd grindstone grinding surface of this invention you may form in the grindstone 40 for grinding same as the grinding surface 41, or other grinding different from the grinding grindstone 40 in which the grinding surface 41 is formed. It may be formed on a grinding wheel for use.
  • a grinding wheel 50 is used.
  • the grinding wheel 50 includes grinding surfaces 51 to 56, and is rotatably supported by support portions 57 and 58.
  • the grinding surface 51 is brought into contact with the outer peripheral end surface 6 of the glass base plate 1 while the grinding wheel 50 receives driving force and rotates in the direction of the arrow AR50.
  • the outer peripheral end surface 6 of the glass base plate 1 has a predetermined shape having a chamfered portion 8 by sliding in the circumferential direction of the glass base plate 1 in a state where the ground surface 51 is in contact with the outer peripheral end surface 6 of the glass base plate 1. To be ground.
  • First grinding step S41 In the end surface grinding step (S40) of the present embodiment, the outer peripheral end surface of the glass base plate 1 of the first number (for example, 2000) of the predetermined number (for example, 10,000) prepared in the above-described steps. 6 is ground using a grinding surface 51 (first grinding wheel grinding surface). The service life of the grinding surface 51 expires by the grinding process for the first number of sheets.
  • the step of grinding the inner peripheral end surface of the first number of glass base plates out of a predetermined number using the grinding surface 51 (first grindstone grinding surface) is the first grinding step (S41) (of the outer peripheral end surface 6). This corresponds to the grinding process.
  • the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground simultaneously, and the inner peripheral end surface 4 and the outer peripheral end surface 6 may be ground separately.
  • Step S42 Thereafter, a grinding process is performed using the grinding surface 52 (second grinding wheel grinding surface) on the outer peripheral end face 6 of the second number of glass sheets (for example, another 2000) of the predetermined number of sheets.
  • the service life of the grinding surface 52 is expired by the second number of grinding processes.
  • the step of grinding the outer peripheral end surface of the second number of glass substrates out of the predetermined number using the grinding surface 52 (second grinding wheel grinding surface) is the second grinding step (S42) (other than the outer peripheral end surface 6). Corresponds to the grinding step).
  • the end surface polishing step (S50) includes an inner peripheral end surface polishing step (S51) and an outer peripheral end surface polishing step (S52).
  • the fixing jig 60 includes a lid member 61 and a pedestal 64.
  • the lid member 61 has one opening 62 in the center and four openings 63 in the vicinity of the periphery.
  • the pedestal 64 has one opening 65 in the center and a support member 66 on the surface in the vicinity of the periphery.
  • the positions of the four support members 66 correspond to the positions of the four openings 63 provided in the lid member 61, and the four support members 66 are inserted into the four openings 63, respectively. 64 are fixed to each other.
  • the positioning tool 70 includes a pedestal 71 and a rod-shaped portion 72 (bar-shaped positioning member).
  • the rod-like portion 72 is formed in a columnar shape, and is provided so as to stand perpendicularly to the surface of the pedestal 71 at the center of the pedestal 71.
  • the glass base plate 1 on which the inner peripheral end face 4 and the outer peripheral end face 6 have been ground is placed in a block shape (block body 9), for example, in a state where 400 pieces are stacked.
  • 60 is accommodated inside four support members 66 (see arrow AR9).
  • the glass base plates 1 may be sequentially accommodated one by one so as to be laminated inside the four support members 66 of the fixing jig 60. After the plurality of glass base plates 1 are arranged inside the fixing jig 60, the positioning tool 70 is inserted from the opening 65.
  • FIG. 10 is a cross-sectional view showing a state in which the positioning tool 70 is inserted from the opening 65.
  • the plurality of glass base plates 1 are positioned (aligned) so as to be aligned on substantially the same straight line by the contact between the inner peripheral end face 4 and the rod-shaped portion 72.
  • the outer diameter D72 of the rod-like portion 72 (positioning member) is preferably a dimension of ⁇ 0.05 mm or more and ⁇ 0.03 mm or less with respect to the inner diameter D4 of the hole 5.
  • 400 glass base plates 1 are fixed between the lid member 61 and the pedestal 64 as the block body 9 while being positioned by the positioning tool 70.
  • a spacer or the like may be provided between the adjacent glass base plates 1.
  • the outer diameter D72 of the rod-like portion 72 is ⁇ 0.
  • the plurality of glass base plates 1 can be positioned with high accuracy.
  • a polishing brush 80 (abrasive member) is used when the polishing process is performed on the inner peripheral end surface 4 and the outer peripheral end surface 6 of the plurality of glass base plates 1.
  • the polishing brush 80 includes a plurality of brush bristle materials 81 and a shaft portion 82.
  • the brush bristle material 81 provided on the surface of the polishing brush 80 is disposed so as to surround the shaft portion 82 in a spiral shape.
  • the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is preferably 4 mm or less.
  • the grinding surface 41 and the grinding surface 42 of the grinding wheel 40 used in the first grinding step S41 of the end surface grinding step (S40) are slightly different from each other due to the influence of manufacturing errors and the like. Have different shapes. It is difficult to completely eliminate this manufacturing error, and the same applies to the grinding surfaces 43 to 46 shown in FIG. The same applies to the grinding surfaces 51 to 56 shown in FIG.
  • the chamfering grinding surface 41 a of the grinding surface 41 and the chamfering grinding surface 42 a of the grinding surface 42 are formed to have the same shape. Even in this case, the chamfering grinding surface 41 c of the grinding surface 41 may be formed longer than the chamfering grinding surface 42 c of the grinding surface 42. Further, the grinding surface 41b for end surface processing in the grinding surface 41 may be formed to be inclined as compared with the grinding surface 42b for end surface processing in the grinding surface 42.
  • a plurality of glass base plates of a predetermined number of the inner peripheral end face 4 that have been ground are stacked and a plurality of the stacked base plates are stacked.
  • the inner peripheral end surface 4 of the glass base plate is polished using the polishing brush 80, the first number of glass base plates 1A ground in the first grinding step (S41) and the second grinding step (S42)
  • the plurality of stacked glass base plates 1A Alternatively, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B are polished.
  • a polishing brush 80 (brush hairs) is obtained by performing a polishing process by stacking only a plurality of glass base plates 1A out of the first number of sheets ground in the first grinding step (S41).
  • the occurrence of unevenness in how the material 81) hits the inner peripheral end face 4 is suppressed, and as a result, variations in shape occur between the inner peripheral end faces 4 of the plurality of glass base plates 1A subjected to batch polishing. This is also suppressed.
  • a polishing process is performed by stacking only a plurality of glass base plates 1 ⁇ / b> B out of the second number of sheets ground in the second grinding step (S ⁇ b> 42).
  • the occurrence of unevenness in the manner in which the polishing brush 80 (brush bristle material 81) hits the inner peripheral end surface 4 is suppressed, and as a result, the inner peripheral end surfaces 4 of the plurality of glass base plates 1B subjected to batch polishing processing. It is also possible to suppress the variation in shape between them.
  • the polishing process may be performed in a state in which block body 9 (see FIG. 9) and polishing brush 80 are completely immersed in the polishing liquid.
  • the polishing process may be performed while the polishing slurry is poured (spread) between the inner peripheral end surface 4 and the polishing brush 80.
  • the block body 9 and the polishing brush 80 are accommodated in a region surrounded in a liquid-tight manner by the cylindrical side wall 91, the bottom plate 93, and the lid member 92.
  • the polishing treatment is performed while polishing slurry is poured from the opening 95 provided in the center of the lid member 92 using the nozzle 90.
  • the polishing process is performed batchwise so that the plates 1B are not confused.
  • the end surface polishing step (S50) in the present embodiment only the inner peripheral end surface polishing step (S51) is performed in a batch manner so that the glass base plate 1A and the glass base plate 1B are not confused with each other.
  • the polishing process may be performed batchwise so that the glass base plate 1A and the glass base plate 1B are not confused with each other.
  • Polishing is performed after washing
  • the glass base plate 1 is immersed in the chemical strengthening solution for 3 to 4 hours. Since the entire surface of the glass base plate 1 is chemically strengthened during the immersion, the plurality of glass base plates 1 are accommodated in a holder or the like so that the plurality of glass base plates 1 are held by the respective end faces. It is preferable to be immersed in a state.
  • the alkali metal ions such as lithium ions and sodium ions contained in the glass base plate 1 are replaced by alkali metal ions such as potassium ions having a larger ion radius than these ions (ion exchange method). Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and both main surfaces of the glass base plate are strengthened.
  • the glass base plate 1 is ultrasonically cleaned using a high frequency of 950 kHz, or cleaned using an alkaline detergent so that the adhered matter remaining on the glass base plate 1 is eliminated. To do. Thereafter, the glass base plate 1 is dried using IPA vapor. Thus, the glass substrate in the present embodiment is obtained.
  • the glass substrate manufacturing method (S100) in the present embodiment is configured as described above.
  • Magnetic recording layers are formed on both main surfaces (or one of the main surfaces) of the glass substrate that has been subjected to the chemical strengthening treatment.
  • the magnetic recording layer includes, for example, an adhesion layer made of a Cr alloy, a soft magnetic layer made of a CoFeZr alloy, an orientation control underlayer made of Ru, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer made of a C system, and an F system.
  • an adhesion layer made of a Cr alloy
  • a soft magnetic layer made of a CoFeZr alloy
  • an orientation control underlayer made of Ru
  • a perpendicular magnetic recording layer made of a CoCrPt alloy
  • a protective layer made of a C system
  • F system F system
  • the inner peripheral end surfaces 4 of the predetermined number of glass base plates 1A and 1B whose inner peripheral end surfaces 4 are ground are polished using the polishing brush 80.
  • the first number of glass base plates 1A ground in the first grinding step (S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other.
  • stacked several glass base plate is grind
  • the said structure it is suppressed that a nonuniformity arises in the contact method with respect to the internal peripheral end surface 4 of the brush 80 for polishing (brush bristle material 81), and, as a result, of the some glass base plate 1 grind
  • the glass base plate 1 having high smoothness can be obtained on the inner peripheral end face 4, it is possible to improve the impact resistance as the glass base plate 1.
  • the length W81 from the root to the tip of the brush bristle material 81 of the polishing brush 80 used for the polishing process (especially the polishing process of the inner peripheral end face 4) is within 4 mm, the end face of the glass base plate 1
  • the brush bristle material 81 of the polishing brush 80 abuts, the pressure distribution received by the end face of the glass base plate 1 is easily affected by the unevenness of the end face.
  • the glass base plate 1A and the glass base plate 1B are not mixed with each other, the influence of the end surface irregularities is suppressed, and the brush bristle material 81 of the polishing brush 80 Even if the length W81 from the root to the hair tip is within 4 mm, the glass base plate 1 having high smoothness can be obtained.
  • the polishing process is performed while the polishing slurry is poured between the inner peripheral end surface 4 and the polishing brush 80, the sludge (polishing waste) is discharged as compared with a device that is completely immersed in the polishing liquid.
  • the capacity is lowered and the processing rate is also lowered.
  • the processing rate is improved even with a flow-through type polishing apparatus, and the polishing amount The non-uniformity is eliminated and the yield rate is improved.
  • the ground surface slides in the circumferential direction of the glass base plate 1 with the ground surface in contact with the end face of the glass base plate 1. Since the end surface of the glass base plate 1 is ground only in the circumferential direction, the processing apparatus can be simplified.
  • Example 1 to 4 Referring to FIG. 19, as an example, an experiment was conducted on Examples 1 to 4 based on the above-described embodiment and Comparative Examples 1 to 4 for these.
  • the glass base plate preparation process, the alumina polishing process for ensuring flatness, and the coring process are the same conditions as in the above-described embodiment.
  • the end surface grinding process in Examples 1 to 4, a plurality of glass base plates 1 are ground using the same grinding surface with the same grindstone, and in Comparative Examples 1 to 4, the same grindstone is used. The grinding process was implemented with respect to the several glass base plate 1 using the grinding surface by a different grinding surface or a different grindstone.
  • the glass base plate is not mixed in Examples 1 to 4, and in Comparative Examples 1 to 4, the inner peripheral end face 4 polished by a different polishing face is used.
  • the glass base plate 1 to be mixed was mixed.
  • brush polishing was used and cerium oxide was used.
  • polishing conditions for the inner peripheral end face 400 block bodies 9 were processed at one time, the rotation speed of the polishing brush 80 was set to 4000 rpm, and the rotation speed of the block body 9 was set to 30 rpm.
  • the inner diameter of the hole 5 of the glass base plate 1 is 20.01 mm, and the polishing time is 20 min.
  • Example 1 the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 2 In Example 2, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 3 In Example 3, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Example 4 In Example 4, the block body 9 was configured so that the glass base plate 1 was not mixed, and the block body 9 was subjected to polishing treatment as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • the block body 9 was comprised so that the glass base plate 1 might be mixed, and the polishing process was performed with respect to the block body 9 as mentioned above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm.
  • Comparative Example 2 In Comparative Example 2, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.07 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Comparative Example 3 In Comparative Example 3, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle 81 of the polishing brush 80 is 5 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • Comparative Example 4 In Comparative Example 4, the block body 9 was configured so that the glass base plate 1 was mixed, and the polishing process was performed on the block body 9 as described above.
  • the dimension (outer dimension) of the rod-like portion 72 (positioning member) used as the positioning tool 70 with respect to the inner diameter of the hole 5 of the glass base plate 1 is ⁇ 0.05 mm.
  • the length of the brush bristle material 81 of the polishing brush 80 is 4 mm. At the time of polishing, as shown in FIG. 18 described above, the polishing slurry was flowed between the inner peripheral end face 4 and the polishing brush 80.
  • the inner peripheral end face 4 was inspected for the glass base plates 1 obtained in Examples 1 to 4 and Comparative Examples 1 to 4.
  • the inner peripheral end surface 4 is measured for roughness using AFM (Dimension 3100 manufactured by Beco Co., Ltd. and measurement software NanoScope 7.2), and the glass base plate having a surface roughness Ra of 1.0 nm or more.
  • the ratio of 1 was investigated, the case where the ratio of the corresponding glass base plate 1 was 10% or more was B evaluation, the case of less than 10% 6% or more was A evaluation, and the case of less than 6% was S evaluation.
  • an information recording medium 10 formed by subjecting the glass base plate 1 to film formation is incorporated into an actual information recording device 30 (hard disk drive), and 40 shock resistance tests are performed for each condition. went.
  • an impact resistance test an impact of 1000 G was applied to the information recording device 30 in the vertical direction, and the presence / absence state (good product rate) of the surface of the information recording medium 10 after the test was confirmed.
  • the external dimensions of the rod-like portion 72 of the positioning tool 70 As for the external dimensions of the rod-like portion 72 of the positioning tool 70, a better result is obtained when -0.05 mm than the case of -0.07 mm with respect to the inner diameter of the hole 5 of the glass base plate 1. Obtained. In the case of ⁇ 0.05 mm, the inner peripheral end face 4 is considered to be uniformly polished. When the outer dimension of the rod-like portion 72 is less than ⁇ 0.03 mm with respect to the inner diameter of the hole 5 of the glass base plate 1, it is not inserted well into the hole 5 of the glass base plate 1, and it is somewhat difficult to use. there were.
  • the first grinding step A plurality of glass base plates are arranged so that the first number of glass base plates 1A ground in S41) and the second number of glass base plates 1B ground in the second grinding step (S42) are not mixed with each other.
  • the inner peripheral end surfaces 4 of the plurality of stacked glass base plates are polished in the stacked state, unevenness occurs in the manner in which the polishing brush 80 (brush bristle material 81) contacts the inner peripheral end surface 4.

Abstract

Selon l'invention, les surfaces des bords périphériques internes (4) d'un premier nombre de plaques d'éléments en verre (1) sont meulées au moyen d'une surface de meulage (41), et les surfaces des bords périphériques internes (4) d'un second nombre de plaques d'éléments en verre (1) sont meulées au moyen d'une surface abrasive (42). Lors de l'empilage d'une pluralité de plaques d'éléments en verre (1) et de l'abrasion des surfaces des bords périphériques internes (4) de celles-ci, les plaques d'éléments en verre (1) parmi le premier nombre de plaques d'éléments en verre (1) et les plaques d'éléments en verre (1) parmi le second nombre de plaques d'éléments en verre sont amenées à ne pas s'entremêler.
PCT/JP2012/082485 2011-12-27 2012-12-14 Substrat en verre pour support d'enregistrement d'informations et procédé de production associé WO2013099656A1 (fr)

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CN110732924A (zh) * 2019-10-24 2020-01-31 合肥维信诺科技有限公司 一种研磨装置

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