WO2013061574A1 - 薄膜半導体装置 - Google Patents
薄膜半導体装置 Download PDFInfo
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- WO2013061574A1 WO2013061574A1 PCT/JP2012/006771 JP2012006771W WO2013061574A1 WO 2013061574 A1 WO2013061574 A1 WO 2013061574A1 JP 2012006771 W JP2012006771 W JP 2012006771W WO 2013061574 A1 WO2013061574 A1 WO 2013061574A1
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
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Abstract
Description
図7に示す従来の薄膜半導体装置900において、チャネル保護層960として有機材料を用いる場合、非結晶シリコン層950には、高い局在準位密度と高いバンドギャップとが要求される。しかしながら、単一の層からなる非結晶シリコン層950によってこのような性能を実現するのは極めて困難である。
以下、図面を参照して、本発明に係る薄膜半導体装置及びその製造方法を説明する。なお、以下で説明する実施の形態は、いずれも本発明の好ましい一具体例を示すものである。従って、以下の実施の形態で示される数値、形状、材料、構成要素、構成要素の配置位置及び接続形態、工程、工程の順序などは、一例であり、本発明を限定する主旨ではない。よって、以下の実施の形態における構成要素のうち、請求項に記載されていない構成要素は、本発明の課題を達成するのに必ずしも必要ではない。また、各図は模式図であり、必ずしも厳密に図示したものではない。なお、各図面において、実質的に同一の構成、動作、及び効果を表す要素については、同一の符号を付す。
11 アクティブマトリクス基板
12 画素
13 有機EL素子
14 陽極
15 有機EL層
16 陰極
17 走査線
18 映像信号線
21 駆動トランジスタ
22 スイッチングトランジスタ
21G,22G,120,920 ゲート電極
21S,22S,191,981 ソース電極
21D,22D,192,982 ドレイン電極
23 コンデンサ
100,900,900A,900B 薄膜半導体装置
110,910 基板
130,930 ゲート絶縁膜
140 チャネル層
140M 結晶シリコン薄膜
150 第1非晶質半導体層
150M 第1アモルファスシリコン膜
160,960 チャネル保護層
160M 絶縁膜
170M 第2アモルファスシリコン膜
171,172 第2非晶質半導体層
180M コンタクト層用膜
181,182,971,972 コンタクト層
940 結晶シリコン層
950 非結晶シリコン層
Claims (8)
- 基板と、
前記基板上に形成されたゲート電極と、
前記ゲート電極上に形成されたゲート絶縁膜と、
前記ゲート絶縁膜上に形成された多結晶半導体からなるチャネル層と、
前記チャネル層上に形成された第1非晶質半導体層と、
前記第1非晶質半導体層上に形成された有機絶縁層と、
前記第1非晶質半導体層及び前記チャネル層の一方側の側面及び他方側の側面のそれぞれに形成された一対の第2非晶質半導体層と、
前記一対の第2非晶質半導体層それぞれの上に、前記第2非晶質半導体層を介して前記チャネル層の側面にコンタクトするように形成された一対のコンタクト層と、
前記一対のコンタクト層の一方の上に形成されたソース電極、及び前記コンタクト層の他方の上に形成されたドレイン電極とを備え、
前記ゲート電極、前記チャネル層、前記第1非晶質半導体層、及び前記有機絶縁層は、上面視したときに外形輪郭線が一致するように積層され、
前記第1非晶質半導体層の局在準位密度は、前記第2非晶質半導体層の局在準位密度より高く、
前記第2非晶質半導体層のバンドギャップは、前記第1非晶質半導体層のバンドギャップより大きい
薄膜半導体装置。 - 前記有機絶縁層の下面の外形輪郭線は、上面視したときに、前記ゲート電極の外形輪郭線の内側に、0.5μm以下後退している
請求項1に記載の薄膜半導体装置。 - 前記有機絶縁層の下面の外形輪郭線は、上面視したときに、前記ゲート電極の外形輪郭線の内側に、前記第2非晶質半導体層の膜厚以上後退している
請求項2に記載の薄膜半導体装置。 - 前記一対の第2非晶質半導体層、前記一対のコンタクト層、前記ソース電極、及び前記ドレイン電極は、前記有機絶縁層の上面の一部および前記有機絶縁層の側面に延在する
請求項1~3のいずれか1項に記載の薄膜半導体装置。 - 前記第1非晶質半導体層の膜厚は、50nm以下である
請求項1~4のいずれか1項に記載の薄膜半導体装置。 - 基板を準備する第1工程と、
前記基板上にゲート電極と形成する第2工程と、
前記ゲート電極上にゲート絶縁膜を形成する第3工程と、
前記ゲート絶縁膜上に結晶半導体層を形成する第4工程と、
前記結晶半導体層上に、非晶質半導体層を形成する第5工程と、
前記非晶質半導体層上に、有機絶縁層を形成する第6工程と、
前記結晶半導体層および前記非晶質半導体層をエッチングして、前記ゲート電極に重畳する位置にチャネル層及び第1非晶質半導体層を形成する第7工程と、
前記チャネル層及び前記第1非晶質半導体層の一方側の側面及び他方側の側面のそれぞれに第2非晶質半導体層を形成する第8工程と、
前記一対の第2非晶質半導体層それぞれの上に、前記第2非晶質半導体層を介して前記チャネル層の側面にコンタクトするように一対のコンタクト層を形成する第9工程と、
前記一対のコンタクト層の一方の上にソース電極を形成し、及び前記一対のコンタクト層の他方の上にドレイン電極を形成する第9工程とを含み、
前記第6工程では、前記非晶質半導体層上に有機絶縁層の前駆体の有機材料を塗布し、乾燥させる工程と、前記基板の前記ゲート電極が形成された面と反対側の面から、前記有機材料に対して前記ゲート電極をマスクに用いて前記有機材料を感光させる光で露光する工程と、前記有機材料を現像する工程とにより、前記有機絶縁層の下面の外形輪郭線が、上面視したときに、前記ゲート電極の外形輪郭線の内側に後退するように形成する
薄膜半導体装置の製造方法。 - 前記第7工程において、現像された前記有機絶縁層をマスクに用いて前記エッチングを行うことにより、前記有機絶縁層の下面の外形輪郭線が、上面視したときに、前記ゲート電極の外形輪郭線の内側に、前記第2非晶質半導体層の膜厚以上後退するように形成する
請求項6に記載の薄膜半導体装置の製造方法。 - 前記第1非晶質半導体層の局在準位密度は、前記第2非晶質半導体層の局在準位密度より高くなるように形成され、
前記第2非晶質半導体層のバンドギャップは、前記第1非晶質半導体層のバンドギャップより大きくなるように形成される
請求項6又は7に記載の薄膜半導体装置の製造方法。
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CN201280004416.XA CN103314444B (zh) | 2011-10-28 | 2012-10-23 | 薄膜半导体器件以及薄膜半导体器件的制造方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104425621A (zh) * | 2013-08-23 | 2015-03-18 | 业鑫科技顾问股份有限公司 | 薄膜晶体管及使用该薄膜晶体管之显示阵列基板 |
CN104425266A (zh) * | 2013-08-23 | 2015-03-18 | 业鑫科技顾问股份有限公司 | 薄膜晶体管及使用该薄膜晶体管之显示阵列基板的制造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013118233A1 (ja) * | 2012-02-06 | 2013-08-15 | パナソニック株式会社 | 薄膜半導体装置の製造方法及び薄膜半導体装置 |
WO2014156133A1 (ja) | 2013-03-26 | 2014-10-02 | パナソニック株式会社 | 電子デバイス及び電子デバイスの製造方法 |
US9508866B1 (en) | 2013-07-05 | 2016-11-29 | Joled Inc. | Thin-film transistor element, method for manufacturing same, and display device |
JP2017143135A (ja) * | 2016-02-09 | 2017-08-17 | 株式会社ジャパンディスプレイ | 薄膜トランジスタ |
CN105845737B (zh) * | 2016-05-17 | 2019-07-02 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制造方法、阵列基板、显示装置 |
KR20180045964A (ko) * | 2016-10-26 | 2018-05-08 | 삼성디스플레이 주식회사 | 표시 장치 및 그의 제조 방법 |
CN107221503A (zh) * | 2017-06-02 | 2017-09-29 | 京东方科技集团股份有限公司 | 一种薄膜晶体管的制作方法、薄膜晶体管及显示基板 |
CN109508135B (zh) * | 2017-09-15 | 2022-05-27 | 上海耕岩智能科技有限公司 | 一种基于指纹识别的电子设备执行命令方法及电子设备 |
CN113314615A (zh) * | 2021-06-04 | 2021-08-27 | 华南理工大学 | 一种薄膜晶体管以及制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10270701A (ja) * | 1997-03-27 | 1998-10-09 | Advanced Display:Kk | 薄膜トランジスタおよびその製法 |
JP2001119029A (ja) * | 1999-10-18 | 2001-04-27 | Fujitsu Ltd | 薄膜トランジスタ及びその製造方法及びそれを備えた液晶表示装置 |
JP2009076894A (ja) * | 2007-08-31 | 2009-04-09 | Semiconductor Energy Lab Co Ltd | 表示装置及び表示装置の作製方法 |
JP2010287634A (ja) * | 2009-06-09 | 2010-12-24 | Casio Computer Co Ltd | トランジスタを有するトランジスタ基板及びトランジスタを有するトランジスタ基板の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS644071A (en) | 1987-06-26 | 1989-01-09 | Nippon Telegraph & Telephone | Thin film transistor and manufacture thereof |
JPH098311A (ja) | 1995-06-21 | 1997-01-10 | Hitachi Ltd | 薄膜半導体装置の製造方法とその構造 |
JP4524298B2 (ja) | 2007-06-04 | 2010-08-11 | パナソニック株式会社 | 半導体装置の製造方法 |
JP2009049384A (ja) | 2007-07-20 | 2009-03-05 | Semiconductor Energy Lab Co Ltd | 発光装置 |
JP2010135640A (ja) | 2008-12-05 | 2010-06-17 | Panasonic Corp | 電界効果トランジスタ |
JP5367092B2 (ja) | 2010-06-04 | 2013-12-11 | パナソニック株式会社 | 薄膜トランジスタ基板の製造方法 |
JP5849215B2 (ja) | 2010-06-21 | 2016-01-27 | パナソニックIpマネジメント株式会社 | 紫外半導体発光素子 |
CN102959712A (zh) | 2011-06-17 | 2013-03-06 | 松下电器产业株式会社 | 薄膜晶体管以及薄膜晶体管的制造方法 |
-
2012
- 2012-10-23 US US13/997,802 patent/US8796692B2/en active Active
- 2012-10-23 WO PCT/JP2012/006771 patent/WO2013061574A1/ja active Application Filing
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10270701A (ja) * | 1997-03-27 | 1998-10-09 | Advanced Display:Kk | 薄膜トランジスタおよびその製法 |
JP2001119029A (ja) * | 1999-10-18 | 2001-04-27 | Fujitsu Ltd | 薄膜トランジスタ及びその製造方法及びそれを備えた液晶表示装置 |
JP2009076894A (ja) * | 2007-08-31 | 2009-04-09 | Semiconductor Energy Lab Co Ltd | 表示装置及び表示装置の作製方法 |
JP2010287634A (ja) * | 2009-06-09 | 2010-12-24 | Casio Computer Co Ltd | トランジスタを有するトランジスタ基板及びトランジスタを有するトランジスタ基板の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104425621A (zh) * | 2013-08-23 | 2015-03-18 | 业鑫科技顾问股份有限公司 | 薄膜晶体管及使用该薄膜晶体管之显示阵列基板 |
CN104425266A (zh) * | 2013-08-23 | 2015-03-18 | 业鑫科技顾问股份有限公司 | 薄膜晶体管及使用该薄膜晶体管之显示阵列基板的制造方法 |
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