WO2012132647A1 - テラヘルツ波分光計測装置 - Google Patents
テラヘルツ波分光計測装置 Download PDFInfo
- Publication number
- WO2012132647A1 WO2012132647A1 PCT/JP2012/054159 JP2012054159W WO2012132647A1 WO 2012132647 A1 WO2012132647 A1 WO 2012132647A1 JP 2012054159 W JP2012054159 W JP 2012054159W WO 2012132647 A1 WO2012132647 A1 WO 2012132647A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- terahertz wave
- prism
- measured
- spectroscopic
- arrangement
- Prior art date
Links
- 238000005259 measurement Methods 0.000 claims description 44
- 239000000523 sample Substances 0.000 claims description 29
- 230000003595 spectral effect Effects 0.000 claims description 9
- 230000000644 propagated effect Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 31
- 239000000126 substance Substances 0.000 abstract description 6
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000001514 detection method Methods 0.000 description 11
- 238000007405 data analysis Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910007709 ZnTe Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 230000005697 Pockels effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000001055 reflectance spectroscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
Definitions
- the present invention relates to a spectroscopic measurement apparatus using a terahertz wave.
- a terahertz wave generating element is integrally provided on the incident surface of the internal total reflection prism
- a terahertz wave detecting element is integrally provided on the emission surface of the internal total reflection prism.
- the object to be measured is arranged on the upper surface of the integrated prism, and the correlation between the terahertz wave reflected by the upper surface and the probe light is detected by the terahertz wave detecting element.
- the optical constant is measured.
- the upper surface of the integrated prism needs to be cleaned each time measurement is performed, and a device for smoothly measuring a plurality of objects to be measured is a further problem. It was.
- the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a terahertz wave spectrometer that can smoothly measure a plurality of objects to be measured.
- a terahertz wave spectrometer includes a light source that emits laser light, a branching unit that branches the laser light emitted from the light source into pump light and probe light, and a branching unit.
- a terahertz wave generating element that generates terahertz waves by the incidence of branched pump light, a terahertz wave incident surface, an output surface, and a surface to be measured, and propagates the terahertz waves incident from the incident surface inside
- a spectroscopic prism that is reflected or transmitted by the arrangement surface and is output from the output surface, a terahertz wave that is output from the output surface of the spectroscopic prism, and the probe light that is branched at the branching portion are incident, and between the terahertz wave and the probe light
- a terahertz wave detecting element for detecting the correlation, and in the spectroscopic prism, the prism portion including the arrangement surface is slidable with respect to the main body portion.
- the arrangement surface of the prism portion is characterized in that arrangement area measured object is placed is provided with a plurality along the sliding direction.
- the spectroscopic prism is provided with a prism portion that is slidable with respect to the main body portion.
- a plurality of arrangement regions in which the object to be measured is arranged are provided along the slide direction on the arrangement surface of the prism portion. Therefore, after the measurement of the optical constant for one object to be measured is completed, the prism part is slid to move the next object to be measured on the optical path of the terahertz wave, thereby smoothly measuring a plurality of objects to be measured. It can be carried out.
- a reference region in which the object to be measured is not arranged is further provided on the arrangement surface of the prism portion. In this case, the measurement from the reference measurement to the measurement of the object to be measured can be performed continuously.
- a handle portion is provided in the prism portion. In this case, it becomes easy to slide the prism portion with respect to the main body portion and to remove the prism portion from the main body portion.
- a plurality of objects to be measured can be measured smoothly.
- FIG. 1 is a diagram illustrating an embodiment of a terahertz wave spectrometer according to the present invention.
- FIG. 2 is a perspective view of an integrated prism used in the terahertz wave spectroscopic measurement apparatus shown in FIG. 1.
- FIG. 3 is a side view of FIG. 2. It is a flowchart which shows the procedure which derives
- the laser light source 2 is a light source that generates a femtosecond pulse laser.
- a femtosecond pulse laser with an average power of 120 mW and a repetition rate of 77 MHz is output from the laser light source 2.
- the femtosecond pulse laser emitted from the laser light source 2 is divided into pump light 48 and probe light 49 by the beam splitter 13 through the mirrors 11 and 12.
- the mirrors 14 and 15 and the lens 16 are provided in the probe light optical path C1 through which the probe light 49 propagates.
- the probe light 49 is collected by the lens 16 and enters a terahertz wave detecting element 33 described later.
- a delay unit 21 and a modulator 22 are provided in the optical path C2 for pump light through which the pump light 48 propagates.
- the delay unit 21 includes a pair of mirrors 23 and 24 and a reflecting prism 25 installed on the movable stage 26. The position of the reflecting prism 25 is moved back and forth with respect to the pair of mirrors 23 and 24, thereby pump light. 48 delay adjustments are possible.
- the modulator 22 is a part that switches between transmission and blocking of the pump light 48 by, for example, an optical chopper. Based on the signal from the control unit 5, the modulator 22 modulates transmission and blocking of the pump light 48 at 1 kHz, for example.
- the terahertz wave generating element 32 for example, a nonlinear optical crystal such as ZnTe, an antenna element such as an optical switch using GaAs, a semiconductor such as InAs, a superconductor, or the like can be used.
- the pulse of the terahertz wave T generated from these elements is generally about several picoseconds.
- the terahertz wave detection element 33 for example, an antenna element such as an electro-optic crystal such as ZnTe or an optical switch using GaAs can be used.
- an electro-optic crystal such as ZnTe or an optical switch using GaAs
- the probe light 49 receives birefringence due to the Pockels effect.
- the amount of birefringence of the probe light 49 is proportional to the electric field strength of the terahertz wave T. Therefore, the terahertz wave T can be detected by detecting the birefringence amount of the probe light 49.
- thermosetting adhesive For fixing the terahertz wave generating element 32 and the terahertz wave detecting element 33, for example, a thermosetting adhesive is used.
- the adhesive used at this time is transparent at the wavelength of the terahertz wave T, and is an intermediate refraction between the refractive index of each of the terahertz wave generating element 32 and the terahertz wave detecting element 33 and the refractive index of the spectral prism 31. It is preferable to have a refractive index or an equivalent refractive index.
- the edges of the terahertz wave generating element 32 and the terahertz wave detecting element 33 may be hardened with an adhesive.
- the prism portion 52 whose top surface is the arrangement surface 31 c is a separate body from the main body portion 51.
- the prism portion 52 is formed in a triangular cross-section with Si as in the case of the main body portion 51.
- the main body portion 51 is viewed from the upper surface side, the direction intersecting the optical path of the terahertz wave T inside the integrated prism 3.
- the main part 51 extends longer than the width of the main part 51.
- MgO can be used in addition to Si.
- FIG. 4 is a flowchart showing a procedure for deriving the optical constant of the DUT 34 using the terahertz wave spectrometer 1.
- the terahertz wave T is incident on the arrangement surface 31c of the spectroscopic prism 31 as P-polarized light.
- step S01 and S02 first, reference measurement and sample measurement are performed using the terahertz wave spectrometer 1 (steps S01 and S02).
- the prism portion 52 is aligned with the main body portion 51 so that the terahertz wave T propagating inside the integrated prism 3 is reflected by the reference region L, and a substance (for example, air) whose optical constant is known. Measure for.
- a ratio P between the reference amplitude R ref and the sample amplitude R sig is obtained by the equation (1), and a phase difference ⁇ between the reference phase ⁇ ref and the sample phase ⁇ sig is obtained by the equation (2) (step S04). Further, using the ratio P and the phase difference ⁇ described above, a value q is determined as shown in Expression (3) (step S05).
- step S07 After deriving the optical constants for one object to be measured in the above procedure, it is determined whether or not the measurement has been completed for all the objects to be measured (step S07).
- the prism portion 52 is further slid, and the procedure from step S02 to step S06 is repeatedly executed for the next device under test 34.
- the height of the upper surface of the main body portion 61 is lower than that in FIG. 3, and the side surfaces 62 b and 62 b protrude from the upper surface of the main body portion 61 when the prism portion 62 is fitted into the main body portion 61. .
- the side surfaces 62b and 62b can function as the handle portion of the prism portion 62, and the sliding of the prism portion 62 with respect to the main body portion 61 and the removal of the prism portion 62 from the main body portion 61 are facilitated.
- the handle portions 62c and 62c make it easier to handle the prism portion 62.
- the position of the handle is not particularly limited as long as it does not interfere with the propagation of the terahertz wave T and the arrangement of the measurement object 34.
- flat surfaces 71 b and 72 b parallel to the arrangement surface 31 c are formed on the bottom of the groove 71 a of the main body 71 and the bottom of the prism 72, and the prism 52 is fitted to the main body 51.
- a space S may be formed between the flat surfaces 71b and 72b when it is inserted. Also with this configuration, the prism portion 72 can be easily handled.
- the terahertz wave T transmitted through the object to be measured 34 is refracted at the fitting portion between the main body portion 51 and the prism portion 82, returns to the same optical path as when the prism portion 52 is fitted, and is reflected by the second optical surface 31e. The light is reflected and emitted from the emission surface 31b. A tolerance of about ⁇ 1 ° is allowed.
- the prism portion 82 is slid to move the next measured object 34 onto the optical path of the terahertz wave T. Measurement of the measurement object 34 can be performed smoothly.
- SYMBOLS 1 Total reflection spectroscopy measuring device, 2 ... Laser light source, 3 ... Integrated prism, 13 ... Beam splitter (branch part), 31 ... Spectral prism, 31a ... Incident surface, 31b ... Outgoing surface, 31c ... Arrangement surface, 32 ... Terahertz wave generating element, 33... Terahertz wave detecting element, 34 .. object to be measured, 48... Pump light, 49 .. probe light, 51, 61, 71 .. main body part, 52, 62, 72, 82. Handle part, K ... arrangement region, L ... reference region, S ... space, T ... terahertz wave.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
Claims (4)
- レーザ光を出射する光源と、
前記光源から出射されたレーザ光をポンプ光とプローブ光とに分岐する分岐部と、
前記分岐部で分岐した前記ポンプ光の入射によってテラヘルツ波を発生させるテラヘルツ波発生素子と、
前記テラヘルツ波の入射面・出射面及び被測定物の配置面を有し、前記入射面から入射した前記テラヘルツ波を内部で伝播させると共に前記配置面で反射又は透過させて前記出射面から出射させる分光プリズムと、
前記分光プリズムの前記出射面から出射した前記テラヘルツ波と、前記分岐部で分岐した前記プローブ光とが入射し、前記テラヘルツ波と前記プローブ光との間の相関を検出するテラヘルツ波検出素子と、を備え、
前記分光プリズムにおいて、前記配置面を含むプリズム部分が本体部分に対してスライド可能となっており、当該プリズム部分の前記配置面に、前記被測定物が配置される配置領域がスライド方向に沿って複数設けられていることを特徴とするテラヘルツ波分光計測装置。 - 前記プリズム部分の前記配置面に、前記被測定物が配置されない参照領域が更に設けられていることを特徴とする請求項1記載のテラヘルツ波分光計測装置。
- 前記プリズム部分に取手部が設けられていることを特徴とする請求項1又は2記載のテラヘルツ波分光計測装置。
- 前記プリズム部分と前記本体部分との間の一部にスペースが存在していることを特徴とする請求項1~3のいずれか一項記載のテラヘルツ波分光計測装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12764439.1A EP2693200B1 (en) | 2011-03-29 | 2012-02-21 | Terahertz-wave spectrometer |
JP2013507263A JP5894575B2 (ja) | 2011-03-29 | 2012-02-21 | テラヘルツ波分光計測装置 |
US14/005,841 US9696206B2 (en) | 2011-03-29 | 2012-02-21 | Terahertz-wave spectrometer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011072408 | 2011-03-29 | ||
JP2011-072408 | 2011-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012132647A1 true WO2012132647A1 (ja) | 2012-10-04 |
Family
ID=46930408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2012/054159 WO2012132647A1 (ja) | 2011-03-29 | 2012-02-21 | テラヘルツ波分光計測装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9696206B2 (ja) |
EP (1) | EP2693200B1 (ja) |
JP (1) | JP5894575B2 (ja) |
WO (1) | WO2012132647A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013179856A1 (ja) * | 2012-05-29 | 2013-12-05 | 浜松ホトニクス株式会社 | プリズム部材、テラヘルツ波分光計測装置、及びテラヘルツ波分光計測方法 |
EP3029495A4 (en) * | 2013-07-30 | 2017-03-01 | Hamamatsu Photonics K.K. | Wave plate and divided prism member |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104677497B (zh) * | 2015-02-13 | 2017-01-11 | 上海理工大学 | 一种太赫兹波性能的检测装置和方法 |
ITUA20161345A1 (it) * | 2016-03-04 | 2017-09-04 | Eltek Spa | Dispositivo sensore per contenitori di sostanze liquide |
JP7014623B2 (ja) * | 2018-01-29 | 2022-02-01 | 浜松ホトニクス株式会社 | テラヘルツ波分光計測装置 |
CN108931494B (zh) * | 2018-06-28 | 2023-11-21 | 福州大学 | 一种基于高阻硅的太赫兹衰减全反射检测装置及其使用方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000121551A (ja) * | 1998-10-16 | 2000-04-28 | Mitsubishi Chemicals Corp | 濃度測定装置 |
JP2006200931A (ja) * | 2005-01-18 | 2006-08-03 | Fuji Photo Film Co Ltd | センサユニット |
JP2007024540A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | センサユニット及び全反射減衰を利用した測定装置 |
JP2007271361A (ja) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | 測定装置及びセンサユニットの保持方法 |
JP2008224449A (ja) | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | 全反射テラヘルツ波測定装置 |
JP2008224452A (ja) * | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | 全反射テラヘルツ波測定装置 |
JP2008224451A (ja) * | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | テラヘルツ波測定装置 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4602869A (en) * | 1983-12-05 | 1986-07-29 | Harrick Nicolas J | Internal reflection prism liquid cell |
JPS61232412A (ja) | 1985-04-08 | 1986-10-16 | Matsushita Electric Ind Co Ltd | 光スイツチ |
DE3715481A1 (de) * | 1987-05-06 | 1988-11-24 | Naumann Dieter | Kuevettenanordnung fuer diskrete vergleichende reflektionsspektroskopische messungen |
DE3830002A1 (de) * | 1988-08-31 | 1990-03-01 | Naumann Dieter | Vorrichtung fuer eine bewegliche kuevette fuer vergleichende reflektionsspektroskopische messungen |
US6586193B2 (en) * | 1996-04-25 | 2003-07-01 | Genicon Sciences Corporation | Analyte assay using particulate labels |
JP3739537B2 (ja) | 1997-03-26 | 2006-01-25 | 大日本印刷株式会社 | 光学的分析装置用測定チップ |
JP2000065729A (ja) | 1998-08-25 | 2000-03-03 | Nippon Laser Denshi Kk | 表面プラズモン共鳴角検出装置のセンサーチップ |
AU5566600A (en) * | 1999-06-21 | 2001-01-09 | Hamamatsu Photonics K.K. | Terahertz wave spectrometer |
GB2355309B (en) | 1999-09-27 | 2002-01-09 | Toshiba Res Europ Ltd | A radiation source |
GB0021502D0 (en) * | 2000-09-01 | 2000-10-18 | Central Research Lab Ltd | An attenuated total reflectance sensing head |
JP3747319B2 (ja) | 2002-04-09 | 2006-02-22 | 独立行政法人理化学研究所 | テラヘルツ波発生装置とその同調方法 |
JP4119207B2 (ja) | 2002-09-03 | 2008-07-16 | 日本分光株式会社 | 全反射プリズム及びそれを用いた全反射装置 |
US6930781B2 (en) | 2002-11-26 | 2005-08-16 | Cornell Research Foundation, Inc. | Miniaturized holographic fourier transform spectrometer with digital aberration correction |
US20080014580A1 (en) | 2003-04-17 | 2008-01-17 | Alfano Robert R | Detection of biological molecules using THz absorption spectroscopy |
JP3950818B2 (ja) | 2003-05-29 | 2007-08-01 | アイシン精機株式会社 | 反射型テラヘルツ分光測定装置及び測定方法 |
JP2006091723A (ja) * | 2004-09-27 | 2006-04-06 | Olympus Corp | 倒立顕微鏡 |
CA2582337C (en) * | 2004-09-30 | 2015-03-31 | Picometrix, Llc | Optical delay |
JP4047907B2 (ja) | 2004-11-12 | 2008-02-13 | 松下電器産業株式会社 | 生体情報測定用光学素子およびそれを用いた生体情報測定装置 |
WO2007070575A2 (en) | 2005-12-13 | 2007-06-21 | Massachusetts Institute Of Technology | Optically driven phase-matched terahertz emitter |
WO2007108328A1 (ja) | 2006-03-16 | 2007-09-27 | Kurashiki Boseki Kabushiki Kaisha | 全反射減衰型光学プローブおよびそれを用いた水溶液分光測定装置 |
JP4958220B2 (ja) | 2006-03-16 | 2012-06-20 | 倉敷紡績株式会社 | 全反射減衰型光学プローブおよびそれを用いた水溶液分光測定装置 |
JP5132146B2 (ja) | 2006-03-17 | 2013-01-30 | キヤノン株式会社 | 分析方法、分析装置、及び検体保持部材 |
WO2008147575A2 (en) | 2007-01-11 | 2008-12-04 | Rensselaer Polytechnic Institute | Systems, methods, and devices for handling terahertz radiation |
JP2009210423A (ja) | 2008-03-04 | 2009-09-17 | Sony Corp | テラヘルツ分光装置 |
CN102016548B (zh) | 2008-04-30 | 2012-09-05 | 浜松光子学株式会社 | 全反射太赫兹波测定装置 |
US7781736B2 (en) | 2008-05-19 | 2010-08-24 | Emcore Corporation | Terahertz frequency domain spectrometer with controllable phase shift |
JP2010014642A (ja) | 2008-07-07 | 2010-01-21 | Sony Corp | 光強度測定方法及び光強度測定装置 |
GB0912512D0 (en) | 2009-07-17 | 2009-08-26 | Univ Leeds | Generating and detecting radiation |
JP5240858B2 (ja) | 2009-09-03 | 2013-07-17 | 独立行政法人理化学研究所 | 単色波長可変型テラヘルツ波発生/検出システム及び方法 |
JP5723643B2 (ja) * | 2011-03-22 | 2015-05-27 | 浜松ホトニクス株式会社 | 全反射分光計測方法 |
EP2693199B1 (en) * | 2011-03-29 | 2018-07-11 | Hamamatsu Photonics K.K. | Terahertz-wave spectrometer and prism member |
-
2012
- 2012-02-21 WO PCT/JP2012/054159 patent/WO2012132647A1/ja active Application Filing
- 2012-02-21 EP EP12764439.1A patent/EP2693200B1/en active Active
- 2012-02-21 US US14/005,841 patent/US9696206B2/en active Active
- 2012-02-21 JP JP2013507263A patent/JP5894575B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000121551A (ja) * | 1998-10-16 | 2000-04-28 | Mitsubishi Chemicals Corp | 濃度測定装置 |
JP2006200931A (ja) * | 2005-01-18 | 2006-08-03 | Fuji Photo Film Co Ltd | センサユニット |
JP2007024540A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | センサユニット及び全反射減衰を利用した測定装置 |
JP2007271361A (ja) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | 測定装置及びセンサユニットの保持方法 |
JP2008224449A (ja) | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | 全反射テラヘルツ波測定装置 |
JP2008224452A (ja) * | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | 全反射テラヘルツ波測定装置 |
JP2008224451A (ja) * | 2007-03-13 | 2008-09-25 | Hamamatsu Photonics Kk | テラヘルツ波測定装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013179856A1 (ja) * | 2012-05-29 | 2013-12-05 | 浜松ホトニクス株式会社 | プリズム部材、テラヘルツ波分光計測装置、及びテラヘルツ波分光計測方法 |
JP2013246132A (ja) * | 2012-05-29 | 2013-12-09 | Hamamatsu Photonics Kk | プリズム部材、テラヘルツ波分光計測装置、及びテラヘルツ波分光計測方法 |
US9417182B2 (en) | 2012-05-29 | 2016-08-16 | Hamamatsu Photonics K.K. | Prism member, terahertz-wave spectroscopic measurement device, and terahertz-wave spectroscopic measurement method |
EP3029495A4 (en) * | 2013-07-30 | 2017-03-01 | Hamamatsu Photonics K.K. | Wave plate and divided prism member |
EP3570082A1 (en) * | 2013-07-30 | 2019-11-20 | Hamamatsu Photonics K.K. | Wave plate and divided prism member |
US10591669B2 (en) | 2013-07-30 | 2020-03-17 | Hamamatsu Photonics K.K. | Wave plate and divided prism member |
US10908355B2 (en) | 2013-07-30 | 2021-02-02 | Hamamatsu Photonics K.K. | Wave plate and divided prism member |
Also Published As
Publication number | Publication date |
---|---|
EP2693200B1 (en) | 2019-06-12 |
EP2693200A4 (en) | 2014-09-17 |
US20140014840A1 (en) | 2014-01-16 |
US9696206B2 (en) | 2017-07-04 |
JPWO2012132647A1 (ja) | 2014-07-24 |
JP5894575B2 (ja) | 2016-03-30 |
EP2693200A1 (en) | 2014-02-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5894575B2 (ja) | テラヘルツ波分光計測装置 | |
US8107077B2 (en) | Terahertz spectroscopic apparatus | |
JP5607566B2 (ja) | テラヘルツ波分光計測装置 | |
JP5723643B2 (ja) | 全反射分光計測方法 | |
JP2008224452A (ja) | 全反射テラヘルツ波測定装置 | |
US20110273719A1 (en) | Optical imaging for optical device inspection | |
JP5877942B2 (ja) | 全反射分光計測装置 | |
JP5957294B2 (ja) | プリズム部材、テラヘルツ波分光計測装置、及びテラヘルツ波分光計測方法 | |
US6057928A (en) | Free-space time-domain method for measuring thin film dielectric properties | |
JP5869556B2 (ja) | テラヘルツ波分光計測装置 | |
US10119903B2 (en) | Interferometric ellipsometry and method using conical refraction | |
JP5550521B2 (ja) | 全反射分光計測装置 | |
JP5566826B2 (ja) | 全反射分光計測におけるデータ解析方法 | |
US10480925B2 (en) | Inspecting a slab of material | |
JP2012083166A (ja) | 全反射分光計測装置 | |
US10837833B1 (en) | Speckle enhanced spatial-domain spectrometer | |
Wang et al. | Extracting dielectric parameter based on multiple beam interference principle and FTIR system in terahertz range |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12764439 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2013507263 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14005841 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012764439 Country of ref document: EP |