WO2012046553A1 - エポキシ樹脂用硬化剤組成物、硬化性樹脂組成物及びその硬化物 - Google Patents
エポキシ樹脂用硬化剤組成物、硬化性樹脂組成物及びその硬化物 Download PDFInfo
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- WO2012046553A1 WO2012046553A1 PCT/JP2011/070990 JP2011070990W WO2012046553A1 WO 2012046553 A1 WO2012046553 A1 WO 2012046553A1 JP 2011070990 W JP2011070990 W JP 2011070990W WO 2012046553 A1 WO2012046553 A1 WO 2012046553A1
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- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- PUMIRPCJLHGLOT-UHFFFAOYSA-N 3,5-diethyloxane-2,6-dione Chemical compound CCC1CC(CC)C(=O)OC1=O PUMIRPCJLHGLOT-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-M 4-chlorobenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-M 0.000 description 1
- ZHNFOHFZWIRCNY-UHFFFAOYSA-N 4-ethoxybenzenesulfonic acid Chemical compound CCOC1=CC=C(S(O)(=O)=O)C=C1 ZHNFOHFZWIRCNY-UHFFFAOYSA-N 0.000 description 1
- BRIXOPDYGQCZFO-UHFFFAOYSA-N 4-ethylphenylsulfonic acid Chemical compound CCC1=CC=C(S(O)(=O)=O)C=C1 BRIXOPDYGQCZFO-UHFFFAOYSA-N 0.000 description 1
- IWYVYUZADLIDEY-UHFFFAOYSA-N 4-methoxybenzenesulfonic acid Chemical compound COC1=CC=C(S(O)(=O)=O)C=C1 IWYVYUZADLIDEY-UHFFFAOYSA-N 0.000 description 1
- XBWHBPMCIGBGTA-UHFFFAOYSA-N 5-methyl-2-oxaspiro[3.5]non-5-ene-1,3-dione Chemical compound CC1=CCCCC11C(=O)OC1=O XBWHBPMCIGBGTA-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- XJZOBGFUKSQCEY-UHFFFAOYSA-N 6-(2-undecyl-1H-imidazol-5-yl)-1,3,5-triazine-2,4-diamine Chemical compound N1C(CCCCCCCCCCC)=NC=C1C1=NC(N)=NC(N)=N1 XJZOBGFUKSQCEY-UHFFFAOYSA-N 0.000 description 1
- RNGKTOCAINTFOP-UHFFFAOYSA-N 6-[2-(2-ethyl-5-methyl-1h-imidazol-4-yl)ethyl]-1,3,5-triazine-2,4-diamine Chemical compound N1C(CC)=NC(CCC=2N=C(N)N=C(N)N=2)=C1C RNGKTOCAINTFOP-UHFFFAOYSA-N 0.000 description 1
- MGLJQAJTEGTWNU-UHFFFAOYSA-N 6-[2-(2-methyl-1h-imidazol-5-yl)ethyl]-1,3,5-triazine-2,4-diamine Chemical compound N1C(C)=NC=C1CCC1=NC(N)=NC(N)=N1 MGLJQAJTEGTWNU-UHFFFAOYSA-N 0.000 description 1
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- MSQOTSIJDGLSBS-UHFFFAOYSA-N C1(=CC=CC=C1)C=1NC(=C(N1)C)CO.C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO Chemical compound C1(=CC=CC=C1)C=1NC(=C(N1)C)CO.C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO MSQOTSIJDGLSBS-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- SCKXCAADGDQQCS-UHFFFAOYSA-N Performic acid Chemical compound OOC=O SCKXCAADGDQQCS-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- PWAPCRSSMCLZHG-UHFFFAOYSA-N cyclopentylidene Chemical group [C]1CCCC1 PWAPCRSSMCLZHG-UHFFFAOYSA-N 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 229940105990 diglycerin Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229960005150 glycerol Drugs 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FYAQQULBLMNGAH-UHFFFAOYSA-N hexane-1-sulfonic acid Chemical compound CCCCCCS(O)(=O)=O FYAQQULBLMNGAH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- WUOSYUHCXLQPQJ-UHFFFAOYSA-N n-(3-chlorophenyl)-n-methylacetamide Chemical compound CC(=O)N(C)C1=CC=CC(Cl)=C1 WUOSYUHCXLQPQJ-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- RJQRCOMHVBLQIH-UHFFFAOYSA-N pentane-1-sulfonic acid Chemical compound CCCCCS(O)(=O)=O RJQRCOMHVBLQIH-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- HNDXKIMMSFCCFW-UHFFFAOYSA-N propane-2-sulphonic acid Chemical compound CC(C)S(O)(=O)=O HNDXKIMMSFCCFW-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- JBCJMTUHAXHILC-UHFFFAOYSA-N zinc;octanoic acid Chemical compound [Zn+2].CCCCCCCC(O)=O JBCJMTUHAXHILC-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
- B29C39/006—Monomers or prepolymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/02—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles
- B29C39/10—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. casting around inserts or for coating articles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4284—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with other curing agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Definitions
- the present invention relates to a curing agent composition for an epoxy resin useful for preparing a curable resin composition useful for optical semiconductor encapsulation, etc., a curable resin composition containing the curing agent composition for an epoxy resin,
- the present invention relates to a cured product of a curable resin composition and an optical semiconductor device in which an optical semiconductor element is sealed with the cured product.
- epoxy resin As a resin for sealing an optical semiconductor element such as a light emitting diode (LED), an optical sensor, a light emitting element for optical communication, and a light receiving element, epoxy resin is used because of its high transparency.
- a curing agent composition for an epoxy resin for curing such an epoxy resin As a curing agent composition for an epoxy resin for curing such an epoxy resin, a curing agent composition comprising an acid anhydride curing agent and a curing accelerator such as a tertiary amine is generally used.
- a curing agent composition comprising an acid anhydride curing agent and a curing accelerator such as a tertiary amine is generally used.
- a curing accelerator such as a tertiary amine is stored for a long period of time, there arises a problem that the mixture is colored or carbon dioxide is generated due to a decarboxylation reaction to swell the container.
- Patent Document 1 Japanese Patent Publication No.
- Patent Document 2 Japanese Patent Laid-Open No. 2005-75915
- a storage stability improver comprising a hydroxybenzoic acid ester
- Patent Document 1 when ethylene glycol is blended in a mixed solution of an acid anhydride and a curing accelerator such as a tertiary amine and stored for a long period of time, the generation of carbon dioxide is suppressed, but gradually precipitated. There arises a problem that a product (precipitate) is generated and the mixed solution becomes cloudy.
- the method described in Patent Document 2 requires the use of a special hydroxybenzoic acid ester that cannot be said to be easily available, resulting in a high cost.
- an object of the present invention is to provide a curing agent composition for epoxy resins that is extremely low in carbon dioxide generation even when stored for a long period of time, is transparent without white turbidity due to precipitates, and can be prepared at low cost.
- a curable resin composition containing the epoxy resin curing agent composition, a cured product of the curable resin composition, and an optical semiconductor device in which an optical semiconductor element is sealed with the cured product It is in.
- the other object of the present invention is to provide an epoxy resin curing agent composition capable of suppressing the generation of bubbles even during curing, a curable resin composition containing the epoxy resin curing agent composition, and It is in providing the hardened
- the present inventor has formulated a specific compound into an acid anhydride curing agent and a curing accelerator. It was found that the production of the product can be remarkably suppressed, and furthermore, the generation of bubbles can be suppressed even when the epoxy resin is cured, and the present invention has been completed.
- the present invention contains an acid anhydride curing agent (A), a curing accelerator (B), and at least one diol (C) selected from neopentyl glycol and 1,3-butanediol.
- An epoxy resin curing agent composition is provided.
- the amount of the diol (C) used is preferably 0.5 to 15 parts by weight with respect to 100 parts by weight of the acid anhydride curing agent (A).
- the present invention also provides a curable resin composition
- a curable resin composition comprising, as essential components, an epoxy compound (D) having two or more epoxy groups in the molecule and the epoxy resin curing agent composition.
- At least one alicyclic epoxy compound as the epoxy compound (D).
- the present invention further provides a cured product obtained by curing the curable resin composition.
- the present invention further provides an optical semiconductor device in which an optical semiconductor element is sealed with a cured product of the curable resin composition.
- the storage stability is greatly improved, and even when the curing agent composition for epoxy resin is stored for a long period of time, The generation of carbon dioxide is extremely small, and white turbidity due to precipitates does not occur. Further, since an inexpensive and inexpensive compound is used, the cost is low. Furthermore, even when the epoxy resin is cured, the generation of bubbles can be remarkably suppressed. Therefore, an optical semiconductor device with extremely high reliability can be stably supplied, which is extremely valuable industrially.
- the epoxy resin curing agent composition of the present invention comprises an acid anhydride curing agent (A), a curing accelerator (B), and at least one diol selected from neopentyl glycol and 1,3-butanediol. (C) is contained.
- acid anhydride curing agent (A) As the acid anhydride-based curing agent (A), a curing agent generally used for curing an epoxy compound can be used, but a liquid one at room temperature is preferable. Specifically, for example, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, dodecenyl succinic anhydride, methylendomethylenetetrahydrophthalic anhydride, 2,4-diethylpentanedioic anhydride, cyclohexane-1,2, Examples thereof include 4-tricarboxylic acid-1,2-anhydride.
- acid anhydrides that are solid at room temperature such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylcyclohexene dicarboxylic acid anhydride, and the like, can be used within a range that does not impair molding workability.
- an acid anhydride that is solid at room temperature it is preferably dissolved in a liquid acid anhydride at room temperature and used as a liquid mixture at room temperature.
- the acid anhydride curing agent (A) can be used alone or in combination of two or more.
- the acid anhydride-based curing agent (A) As the acid anhydride-based curing agent (A), the product name “Licacid MH-700” (manufactured by Shin Nippon Rika Co., Ltd.), the product name “Licacid MH” (manufactured by Shin Nippon Rika Co., Ltd.), and the product name “HN-5500” (Hitachi Commercial products such as those manufactured by Kasei Kogyo Co., Ltd. can also be used.
- the curing accelerator (B) is not particularly limited as long as it is a curing accelerator generally used for accelerating the curing of epoxy compounds.
- a curing accelerator generally used for accelerating the curing of epoxy compounds.
- tertiary amines, tertiary amine salts, imidazoles, organophosphorus compounds Quaternary ammonium salts, quaternary phosphonium salts, organometallic salts, boron compounds, and the like can be used.
- a hardening accelerator (B) can be used individually by 1 type or in combination of 2 or more types.
- Tertiary amines include, for example, lauryl dimethylamine, N, N-dimethylcyclohexylamine, N, N-dimethylbenzylamine, N, N-dimethylaniline, (N, N-dimethylaminomethyl) phenol, 2,4 , 6-tris (N, N-dimethylaminomethyl) phenol, 1,8-diazabicyclo [5.4.0] undecene-7 (DBU), 1,5-diazabicyclo [4.3.0] nonene-5 ( DBN).
- lauryl dimethylamine N, N-dimethylcyclohexylamine, N, N-dimethylbenzylamine, N, N-dimethylaniline, (N, N-dimethylaminomethyl) phenol, 2,4 , 6-tris (N, N-dimethylaminomethyl) phenol, 1,8-diazabicyclo [5.4.0] undecene-7 (DBU), 1,5-diazabicyclo [4.3
- Examples of the tertiary amine salt include carboxylates, sulfonates, and inorganic acid salts of the tertiary amine.
- Examples of the carboxylate include salts of carboxylic acids having 1 to 30 carbon atoms (particularly 1 to 10 carbon atoms) such as octylate (particularly salts of fatty acids).
- Examples of the sulfonate include p-toluenesulfonate, benzenesulfonate, methanesulfonate, and ethanesulfonate.
- tertiary amine salts include salts of 1,8-diazabicyclo [5.4.0] undecene-7 (DBU) (for example, p-toluenesulfonate, octylate).
- DBU 1,8-diazabicyclo [5.4.0] undecene-7
- imidazoles examples include 2-methylimidazole, 2-ethylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1 -Cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 2,4-diamino-6- (2-methylimidazolylethyl) -1,3,5-triazine, 2,4-diamino-6- (2-Undecylimidazolyl ) -1,3,
- organic phosphorus compound examples include triphenylphosphine and triphenyl phosphite.
- Examples of the quaternary ammonium salt include tetraethylammonium bromide and tetrabutylammonium bromide.
- a quaternary phosphonium salt for example, the following formula (1) (Wherein R 1 , R 2 , R 3 and R 4 are the same or different and represent a hydrocarbon group having 1 to 16 carbon atoms, X represents an anion residue of carboxylic acid or organic sulfonic acid)
- R 1 , R 2 , R 3 and R 4 are the same or different and represent a hydrocarbon group having 1 to 16 carbon atoms, X represents an anion residue of carboxylic acid or organic sulfonic acid)
- the compound etc. which are represented by these are mentioned.
- hydrocarbon group having 1 to 16 carbon atoms examples include straight chain such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, pentyl, hexyl, octyl, decyl, dodecyl groups, etc. Or branched alkyl group; linear or branched alkenyl group such as vinyl, allyl, crotyl group; aryl group such as phenyl, toluyl, xylyl, naphthyl, anthryl, phenanthryl group; benzyl, phenethyl group, etc. And aralkyl groups. Among these, a linear or branched alkyl group having 1 to 6 carbon atoms, particularly a butyl group is preferable.
- Examples of the “carboxylic acid” in the “anionic residue of carboxylic acid or organic sulfonic acid” include aliphatic monocarboxylic acids having 1 to 20 carbon atoms such as octanoic acid, decanoic acid, lauric acid, myristic acid, palmitic acid and the like. 1,2,4,5-cyclohexanetetracarboxylic acid, bicyclo [2.2.1] heptane-2,3-dicarboxylic acid, methylbicyclo [2.2.1] heptane-2,3-dicarboxylic acid, etc.
- Examples thereof include alicyclic carboxylic acids (monocyclic alicyclic mono- or polycarboxylic acids, cross-linked cyclic mono- or polycarboxylic acids).
- the alicyclic ring of the alicyclic carboxylic acid includes a linear or branched alkyl group having 1 to 4 carbon atoms such as a methyl group, an alkoxy group having 1 to 4 carbon atoms such as a methoxy group, and a chlorine atom.
- a substituent such as a halogen atom may be bonded.
- the carboxylic acid an aliphatic monocarboxylic acid having 10 to 18 carbon atoms and an alicyclic polycarboxylic acid having 8 to 18 carbon atoms are preferable.
- organic sulfonic acid in the “anionic residue of carboxylic acid or organic sulfonic acid” include methanesulfonic acid, ethanesulfonic acid, 1-propanesulfonic acid, 2-propanesulfonic acid, 1-butanesulfonic acid, Aliphatic sulfonic acids such as 1-pentanesulfonic acid, 1-hexanesulfonic acid, 1-octanesulfonic acid, 1-decanesulfonic acid, 1-dodecanesulfonic acid (for example, aliphatic sulfonic acids having 1 to 16 carbon atoms) Benzenesulfonic acid, p-toluenesulfonic acid, 4-ethylbenzenesulfonic acid, 3- (linear or branched octyl) benzenesulfonic acid, 4- (linear or branched octyl) benzenesulfonic acid, 3
- quaternary phosphonium salts include tetrabutylphosphonium decanoate, tetrabutylphosphonium laurate, tetrabutylphosphonium myristate, tetrabutylphosphonium palmitate, tetrabutylphosphonium cation and bicyclo [2.2.
- organic metal salt examples include tin octylate, zinc octylate, dibutyltin dilaurate, and an aluminum acetylacetone complex.
- boron compounds include boron trifluoride and triphenyl borate.
- the blending amount of the curing accelerator (B) varies depending on the type of the acid anhydride curing agent (A), but is usually 0.01 to 15 with respect to 100 parts by weight of the acid anhydride curing agent (A). Parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.5 to 8 parts by weight.
- At least one diol (C) selected from neopentyl glycol and 1,3-butanediol is used as an essential component.
- neopentyl glycol and / or 1,3-butanediol the long-term storage stability of the curing agent composition is remarkably improved, and carbon dioxide is not generated even when the curing agent composition is stored for a long period of time. There is almost no white turbidity due to precipitates, and transparency can be maintained.
- the blending amount of the diol (C) varies depending on the type of the acid anhydride curing agent (A), but is usually 0.5 to 15 parts by weight with respect to 100 parts by weight of the acid anhydride curing agent (A).
- the amount is preferably 1 to 10 parts by weight, more preferably 1.5 to 8 parts by weight. If the amount of the diol (C) is too small, the effect of addition becomes small. On the other hand, if the amount is too large, the viscosity increases when the curable resin composition is prepared, and the pot life tends to be shortened.
- the epoxy resin curing agent composition of the present invention may be composed of only the acid anhydride curing agent (A), the curing accelerator (B), and the diol (C). Other components may be included as long as the effects of the invention are not hindered.
- the proportion of the total amount of the acid anhydride curing agent (A), curing accelerator (B) and diol (C) in the curing agent composition for epoxy resin of the present invention is, for example, 50% by weight or more, preferably 80% by weight. As mentioned above, More preferably, it is 95 weight% or more.
- the curable resin composition of this invention contains the epoxy compound (D) which has 2 or more of epoxy groups in a molecule
- Epoxy compound having two or more epoxy groups in the molecule (D) It does not specifically limit as an epoxy compound (D) which has two or more epoxy groups in a molecule
- numerator For example, an alicyclic epoxy compound, a bisphenol-type diepoxy compound, an aliphatic polyhydric alcohol polyglycidyl ether, etc. can be used. An epoxy compound (D) can be used individually by 1 type or in combination of 2 or more types.
- the alicyclic epoxy compound is not particularly limited as long as it is a compound having a cycloaliphatic skeleton and two or more epoxy groups in the molecule.
- Adjacent one in which the epoxy group constitutes the cycloaliphatic skeleton An epoxy compound having two or more alicyclic epoxy groups formed containing two carbon atoms is preferred. Examples of such alicyclic epoxy compounds include compounds represented by the following formula (2).
- the alicyclic epoxy compound represented by the general formula (2) is produced by oxidizing a corresponding alicyclic olefin compound with an aliphatic percarboxylic acid or the like. Those produced by using them are preferred in that they have a high epoxidation rate (Japanese Patent Application Laid-Open No. 2002-275169).
- Y represents a single bond or a linking group.
- the linking group include a divalent hydrocarbon group, a carbonyl group (—CO—), an ether bond (—O—), and an ester bond. (—COO—), amide bond (—CONH—), carbonate bond (—OCOO—), and groups in which a plurality of these are linked.
- the divalent hydrocarbon group include linear or branched alkylene groups having 1 to 18 carbon atoms (particularly 1 to 6) and divalent alicyclic hydrocarbon groups (particularly divalent cycloalkylene groups). And the like are preferably exemplified.
- Examples of the linear or branched alkylene group include methylene, methylmethylene, dimethylmethylene, ethylene, propylene, and trimethylene groups.
- Examples of the divalent alicyclic hydrocarbon group include 1,2-cyclopentylene, 1,3-cyclopentylene, cyclopentylidene, 1,2-cyclohexylene, 1,3-cyclohexylene, Examples include 1,4-cyclohexylene and cyclohexylidene groups.
- n is an integer of 1 to 30.
- alicyclic epoxy compound in addition to the above, (ii) only one of the two epoxy groups is an alicyclic epoxy group formed by including two adjacent carbon atoms constituting the cycloaliphatic skeleton.
- An epoxy compound for example, limonene diepoxide
- a glycidyl ether compound for example, Also, a glycidyl ether type epoxy compound having a cyclic aliphatic skeleton and a glycidyl ether group can be used.
- Specific examples of the above compound include the following compounds.
- R is a group obtained by dividing q OH from a q-valent alcohol [R— (OH) q ], p is an integer of 1 to 50, and q is an integer of 1 to 10. In the groups in q parentheses, p may be the same or different.
- q-valent alcohol [R— (OH) q ] includes monohydric alcohols such as methanol, ethanol, 1-propanol, isopropyl alcohol, 1-butanol; ethylene glycol, 1,2-propanediol, 1,3- Divalent alcohols such as propanediol, 1,4-butanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, polypropylene glycol; glycerin, diglycerin, erythritol , Trivalent or higher alcohols such as trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol.
- monohydric alcohols such as methanol, ethanol, 1-propanol, isopropyl alcohol, 1-butanol
- the alcohol may be polyether polyol, polyester polyol, polycarbonate polyol, polyolefin polyol, or the like.
- the alcohol is preferably an aliphatic alcohol having 1 to 10 carbon atoms (particularly an aliphatic polyhydric alcohol such as trimethylolpropane).
- a polyfunctional epoxy compound having 3 or more epoxy groups may be used. Specifically, the following compounds are exemplified.
- a, b, c, d, e, and f are integers from 0 to 30.
- bisphenol diepoxy compound known compounds can be used, and examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, and bisphenol S type epoxy resin.
- the aliphatic polyhydric alcohol polyglycidyl ether is not particularly limited.
- Examples of the “aliphatic polyhydric alcohol” in the aliphatic polyhydric alcohol polyglycidyl ether include, for example, ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4- Divalent alcohols such as butanediol, 1,5-pentanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, dipropylene glycol, polypropylene glycol; glycerin, di Examples include trivalent or higher alcohols such as glycerin, polyglycerin, erythritol, trimethylolethane, trimethylolpropane, pentaerythritol, and dipentaerythrito
- aliphatic polyhydric alcohol polyglycidyl ether examples include 1,6-hexanediol diglycidyl ether, 1,4-butanediol diglycidyl ether, trimethylolpropane polyglycidyl ether, diethylene glycol diglycidyl ether, neopentyl glycol Examples include diglycidyl ether, propylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and polyethylene glycol diglycidyl ether.
- the epoxy compound (D) is preferably in a liquid form from the viewpoint of improving the workability at the time of preparation and casting.
- it is a solid epoxy compound as a simple substance, it can be used as long as the viscosity (25 ° C.) of the curable resin composition after blending each component is, for example, 20000 mPa ⁇ s or less.
- the viscosity (25 ° C.) of the epoxy compound (D) (a mixture of all the epoxy compounds used) is, for example, 50 to 50000 mPa ⁇ s, preferably 100 to 30000 mPa ⁇ s, and more preferably 200 to 20000 mPa ⁇ s. When this viscosity is too large, molding workability such as casting workability tends to be lowered.
- alicyclic epoxy compounds particularly, epoxy compounds having an alicyclic epoxy group formed by including two adjacent carbon atoms in which the epoxy group constitutes a cycloaliphatic skeleton
- the present invention is particularly useful when the curable resin composition contains an alicyclic epoxy compound.
- an alicyclic epoxy compound in the epoxy compound (D) (in particular, an epoxy compound having an alicyclic epoxy group in which the epoxy group is formed to include two adjacent carbon atoms constituting the cycloaliphatic skeleton) ) Is preferably 30% by weight or more, more preferably 50% by weight or more, and particularly preferably 80% by weight or more.
- the blending ratio of the epoxy compound (D) having two or more epoxy groups in the molecule and the epoxy resin curing agent composition of the present invention is selected in consideration of curability and the like. it can.
- the amount of the acid anhydride curing agent (A) in the curable resin composition is 0.5 to 1.5 equivalents per equivalent of epoxy groups of all epoxy compounds contained in the curable resin composition. It is preferable to mix
- curing agent composition for epoxy resins so that it may become.
- the amount of the acid anhydride-based curing agent (A) used is too small, the curing becomes insufficient, and the toughness of the cured product tends to decrease. On the other hand, when the amount is too large, the cured product is colored and the hue deteriorates. There is.
- the amount of the curing accelerator (B) is, for example, 0.01 to 15 parts by weight, preferably 0.1 to 10 parts by weight with respect to 100 parts by weight of the epoxy compound (D). Part by weight, more preferably 0.5 to 8 parts by weight.
- the blending amount of the curing accelerator is too small, the curing accelerating effect may be insufficient, and when it is too large, the hue in the cured product may be deteriorated.
- an ester such as a diester
- a polyhydric carboxylic acid anhydride such as an alicyclic polycarboxylic acid anhydride
- a polyhydric alcohol such as a polyalkylene glycol
- the amount of the ester used is, for example, 0.1 to 10 parts by weight, preferably 0.5 to 8 parts by weight with respect to 100 parts by weight of the epoxy compound (D) contained in the curable resin composition of the present invention. is there.
- silicone-based or fluorine-based antifoaming agent, leveling agent, silane coupling agent, surfactant, inorganic as long as the viscosity of the curable resin composition and the transparency of the cured product are not impaired.
- the compounding quantity of these various additives is 5 weight% or less with respect to the whole curable resin composition, for example.
- the curable resin composition of the present invention may contain a solvent, but if the amount of the solvent is too large, bubbles may be formed in the cured resin, and preferably 10% by weight or less based on the entire curable composition. In particular, it is 1% by weight or less.
- the ratio of the epoxy compound (D) to the total amount of the acid anhydride-based curing agent (A), the curing accelerator (B), the diol (C), and other components is epoxy.
- the total amount of the acid anhydride curing agent (A), the curing accelerator (B), the diol (C) and other components is preferably 70 to 200 parts by weight with respect to 100 parts by weight of the compound (D). More preferably, it is 80 to 160 parts by weight.
- curing agent (A), a hardening accelerator (B), diol (C), and an epoxy compound (D) accounts for the curable resin composition of this invention is 50 weight, for example. % Or more, preferably 70% by weight or more, and more preferably 90% by weight or more.
- the viscosity (25 ° C.) of the curable resin composition of the present invention is, for example, 50 to 5000 mPa ⁇ s, preferably 100 to 4000 mPa ⁇ s, and more preferably 200 to 3000 mPa ⁇ s.
- this viscosity is too large, it is difficult for bubbles to escape, and molding workability such as sealing workability and casting workability tends to deteriorate.
- the curable resin composition of the present invention is prepared, for example, by mixing an epoxy compound (D) and other components added as necessary to prepare an agent A (that is, an epoxy resin composition), and an acid anhydride.
- a B agent that is, a curing agent composition for epoxy resin
- a agent and B agent are prepared by mixing the system curing agent (A), the curing accelerator (B), the diol (C), and other components added as necessary. Subsequently, it manufactures by stirring and mixing A agent and B agent in a predetermined
- the order of addition of each component at the time of preparation of the B agent (curing agent composition for epoxy resin) is not particularly limited.
- the temperature at the time of stirring / mixing when preparing the agent A is, for example, 30 to 150 ° C., preferably 35 to 130 ° C.
- the temperature at the time of stirring and mixing when preparing the agent B is, for example, 30 to 100 ° C., preferably 35 to 80 ° C.
- a known apparatus such as a rotation / revolution mixer, a planetary mixer, a kneader, a dissolver, or the like can be used.
- a cured product is obtained by injecting the curable resin composition of the present invention into a desired place or mold and curing it.
- the curing temperature is, for example, 45 to 200 ° C, preferably 80 to 190 ° C, more preferably 100 to 180 ° C.
- the curing time is, for example, 30 to 1440 minutes, preferably 45 to 900 minutes, and more preferably 60 to 600 minutes. Curing can also be performed in multiple stages.
- the glass transition temperature of the cured product is preferably 90 ° C or higher, more preferably 110 ° C or higher, from the viewpoint of heat resistance.
- optical semiconductor device In the optical semiconductor device of the present invention, the optical semiconductor element is sealed with a cured product of the curable resin composition of the present invention.
- the optical semiconductor element examples include a light emitting diode, an optical sensor, a light emitting element for optical communication, and a light receiving element.
- the optical semiconductor element is sealed by, for example, injecting the curable resin composition into a predetermined mold in which the optical semiconductor element is installed (or injecting the curable resin composition into the mold, It can be performed by installing a semiconductor element) and heating and curing under predetermined conditions.
- the curing conditions are the same as above.
- the generation of bubbles and the generation of precipitates are extremely small.
- the generation of bubbles during curing is extremely small. For this reason, an optical semiconductor device with extremely high reliability can be stably supplied.
- Example 2 To 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), 1 part by weight of the curing accelerator 2-ethyl-4-methylimidazole is added, After stirring and dissolving at 30 ° C. for 30 minutes, the mixture was cooled to 50 ° C., and further 3.2 parts by weight of neopentyl glycol was added and dissolved by heating and stirring for 4 hours at 50 ° C., followed by cooling to room temperature. A transparent liquid curing agent solution was obtained.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 4 To 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), 1 part by weight of the curing accelerator 2-ethyl-4-methylimidazole is added, After stirring and dissolving at 30 ° C. for 30 minutes, the solution was cooled to 50 ° C., and 2.8 parts by weight of 1,3-butanediol was added, and the mixture was heated and stirred for 4 hours at 50 ° C. Then, a transparent liquid curing agent liquid was obtained at room temperature.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 6 To 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), 1 part by weight of the curing accelerator N, N-dimethylbenzylamine is added, and 60 ° C. The mixture was dissolved by heating and stirring for 30 minutes, and then cooled to 50 ° C. Further, 3.2 parts by weight of neopentyl glycol was added and dissolved by heating and stirring for 4 hours at 50 ° C, and then cooled to room temperature. A transparent liquid curing agent solution was obtained.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 8 Curing accelerator “U-CAT 5003” (manufactured by Sun Apro Co., Ltd.) and 100 parts by weight of Rikacid MH (manufactured by Shin Nippon Rika Co., Ltd .; main component is 4-methylhexahydrophthalic anhydride) 1 part by weight of phosphonium bromide) was added, dissolved by heating and stirring at 60 ° C. for 30 minutes, cooled to 50 ° C., and further 3.2 parts by weight of neopentyl glycol was added and kept at 50 ° C. for 4 hours. After dissolving by heating and stirring, the solution was cooled to room temperature, and a transparent liquid curing agent solution was obtained at room temperature.
- Example 10 Curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) is added to 1,8-diazabicyclo [5.4.0] undecene-7 as a curing accelerator.
- 1 part by weight of p-toluenesulfonic acid salt was added, dissolved by heating and stirring at 60 ° C. for 30 minutes, cooled to 50 ° C., and further 3.2 parts by weight of neopentyl glycol was added and the mixture was kept at 50 ° C. for 4 hours. After dissolving by heating and stirring, the solution was cooled to room temperature, and a transparent liquid curing agent solution was obtained at room temperature.
- Example 11 Add 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) and add 1 part by weight of the curing accelerator tetrabutylphosphonium decanoate at 60 ° C. After dissolving by heating and stirring for 30 minutes, cooling to 50 ° C., adding 3.2 parts by weight of neopentyl glycol, dissolving by heating and stirring for 4 hours at 50 ° C., cooling to room temperature, and transparent at room temperature A liquid curing agent liquid was obtained.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 12 Add 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) and add 1 part by weight of the curing accelerator tetrabutylphosphonium laurate at 60 ° C. After dissolving by heating and stirring for 30 minutes, cooling to 50 ° C., adding 3.2 parts by weight of neopentyl glycol, dissolving by heating and stirring for 4 hours at 50 ° C., cooling to room temperature, and transparent at room temperature A liquid curing agent liquid was obtained.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 13 Add 100 parts by weight of the curing agent Rikacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), 1 part by weight of a curing accelerator, tetrabutylphosphonium myristic acid salt, at 60 ° C. After dissolving by heating and stirring for 30 minutes, cooling to 50 ° C., adding 3.2 parts by weight of neopentyl glycol, dissolving by heating and stirring for 4 hours at 50 ° C., cooling to room temperature, and transparent at room temperature A liquid curing agent liquid was obtained.
- Rikacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- a curing accelerator tetrabutylphosphonium myristic acid salt
- Example 14 Add 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) with 1 part by weight of the curing accelerator tetrabutylphosphonium palmitate at 60 ° C. After dissolving by heating and stirring for 30 minutes, cooling to 50 ° C., adding 3.2 parts by weight of neopentyl glycol, dissolving by heating and stirring for 4 hours at 50 ° C., cooling to room temperature, and transparent at room temperature A liquid curing agent liquid was obtained.
- the curing agent Jamaicacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 15 Bicyclo [2.2.1] heptane-2,3-dicarboxylic acid / methylbicyclo [2.2.1] heptane-2,3-dicarboxylic acid (100 parts by weight of 40% by weight aqueous solution of tetrabutylphosphonium hydroxide) Weight ratio 1/4) Neutralization was performed by adding 42 parts by weight of the mixture, and the resulting reaction mixture was dehydrated by using a vacuum distillation method to obtain a curing accelerator, that is, tetrabutylphosphonium cation and bicyclo [2.2.
- a curing accelerator that is, tetrabutylphosphonium cation and bicyclo [2.2.
- Example 16 Neutralization is carried out by adding 38 parts by weight of 1,2,4,5-cyclohexanetetracarboxylic acid to 100 parts by weight of a 40% by weight aqueous solution of tetrabutylphosphonium hydroxide, and dehydration is performed from the resulting reaction mixture using a vacuum distillation method.
- a curing accelerator that is, 76 parts by weight of a salt of a tetrabutylphosphonium cation and an anion residue of 1,2,4,5-cyclohexanetetracarboxylic acid was obtained.
- this curing accelerator 1 part by weight of this curing accelerator is added to 100 parts by weight of the curing agent Ricacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) and dissolved by heating and stirring at 80 ° C. for 30 minutes. After cooling to 50 ° C., 3.2 parts by weight of neopentyl glycol was further added and dissolved by heating and stirring for 4 hours at 50 ° C., followed by cooling to room temperature to obtain a transparent liquid curing agent solution at room temperature. It was.
- Example 17 Neutralization was performed by adding 14 parts by weight of methanesulfonic acid (a reagent manufactured by Kanto Chemical Co., Inc.) to 100 parts by weight of a 40% by weight aqueous solution of tetra n-butylphosphonium hydroxide. After neutralization, the resulting reaction mixture was dehydrated using a vacuum distillation method to obtain 51 parts by weight of a curing accelerator, that is, a salt of a tetra n-butylphosphonium cation and an anion of methanesulfonic acid.
- methanesulfonic acid a reagent manufactured by Kanto Chemical Co., Inc.
- a 40% by weight aqueous solution of tetra n-butylphosphonium hydroxide After neutralization, the resulting reaction mixture was dehydrated using a vacuum distillation method to obtain 51 parts by weight of a curing accelerator, that is, a salt of a tetra n-butylphosphonium cation
- this curing accelerator is added to 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), and heated and stirred at 60 ° C. for 30 minutes. After dissolution, the mixture is cooled to 50 ° C., 3.2 parts by weight of neopentyl glycol is further added, and the mixture is dissolved by heating and stirring for 4 hours at 50 ° C., and then cooled to room temperature.
- the curing agent Ricacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 18 Neutralization was carried out by adding 23 parts by weight of benzenesulfonic acid (a reagent manufactured by Tokyo Chemical Industry Co., Ltd.) to 100 parts by weight of a 40% by weight aqueous solution of tetra n-butylphosphonium hydroxide. After neutralization, the resulting reaction mixture was dehydrated using a vacuum distillation method to obtain 61 parts by weight of a curing accelerator, that is, a salt of a tetra n-butylphosphonium cation and an anion of benzenesulfonic acid.
- a curing accelerator that is, a salt of a tetra n-butylphosphonium cation and an anion of benzenesulfonic acid.
- this curing accelerator is added to 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), and heated and stirred at 60 ° C. for 30 minutes. After dissolution, the mixture is cooled to 50 ° C., 3.2 parts by weight of neopentyl glycol is further added, and the mixture is dissolved by heating and stirring for 4 hours at 50 ° C., and then cooled to room temperature.
- the curing agent Ricacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Example 19 25 parts by weight of p-toluenesulfonic acid monohydrate (reagent manufactured by Kanto Chemical Co., Inc.) was added to 100 parts by weight of a 40% by weight aqueous solution of tetra-n-butylphosphonium hydroxide for neutralization. After neutralization, the resulting reaction mixture was dehydrated using a vacuum distillation method to obtain a curing accelerator, that is, 57 parts by weight of a salt of tetra n-butylphosphonium cation and p-toluenesulfonic acid anion. .
- a curing accelerator that is, 57 parts by weight of a salt of tetra n-butylphosphonium cation and p-toluenesulfonic acid anion.
- Example 20 To 100 parts by weight of a 40% by weight aqueous solution of tetra n-butylphosphonium hydroxide, 28 parts by weight of 4-chlorobenzenesulfonic acid / n hydrate (reagent manufactured by Tokyo Chemical Industry Co., Ltd.) was added for neutralization. After neutralization, the resulting reaction mixture was dehydrated using a vacuum distillation method to obtain 60 parts by weight of a curing accelerator, that is, a salt of tetra n-butylphosphonium cation and 4-chlorobenzenesulfonic acid anion. .
- a curing accelerator that is, a salt of tetra n-butylphosphonium cation and 4-chlorobenzenesulfonic acid anion.
- Example 21 120 parts by weight of methanol was added to 100 parts by weight of a 40% by weight aqueous solution of tetra-n-butylphosphonium hydroxide and neutralized by adding 52 parts by weight of n-dodecylbenzenesulfonic acid (purity 90%, manufactured by Kanto Chemical Co., Inc.). . After neutralization, the obtained reaction mixture was subjected to removal of methanol water using a vacuum distillation method to obtain a curing accelerator, that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- a curing accelerator that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- this curing accelerator is added to 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), and heated and stirred at 60 ° C. for 30 minutes. After dissolution, the mixture is cooled to 50 ° C., 3.2 parts by weight of neopentyl glycol is further added, and the mixture is dissolved by heating and stirring for 4 hours at 50 ° C., and then cooled to room temperature.
- the curing agent Ricacid MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Add 1 part by weight of imidazole dissolve by heating and stirring at 60 ° C. for 30 minutes, cool to 50 ° C., dissolve by heating and stirring for 4 hours at 50 ° C., cool to room temperature, A curing agent solution was obtained.
- Comparative Example 3 Add 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride) and add 1 part by weight of the curing accelerator tetrabutylphosphonium decanoate at 60 ° C. After dissolving by heating and stirring for 30 minutes, the mixture was cooled to room temperature to obtain a transparent liquid curing agent liquid at room temperature.
- the curing agent centre MH manufactured by Shin Nippon Rika Co., Ltd .
- the main component is 4-methylhexahydrophthalic anhydride
- Comparative Example 5 120 parts by weight of methanol was added to 100 parts by weight of a 40% by weight aqueous solution of tetra-n-butylphosphonium hydroxide and neutralized by adding 52 parts by weight of n-dodecylbenzenesulfonic acid (purity 90%, manufactured by Kanto Chemical Co., Inc.). . After neutralization, the obtained reaction mixture was subjected to removal of methanol water using a vacuum distillation method to obtain a curing accelerator, that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- a curing accelerator that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- this curing accelerator is added to 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), and heated and stirred at 60 ° C. for 30 minutes. After dissolution, the mixture was cooled to room temperature to obtain a transparent liquid curing agent liquid at room temperature.
- Comparative Example 6 120 parts by weight of methanol was added to 100 parts by weight of a 40% by weight aqueous solution of tetra-n-butylphosphonium hydroxide and neutralized by adding 52 parts by weight of n-dodecylbenzenesulfonic acid (purity 90%, manufactured by Kanto Chemical Co., Inc.). . After neutralization, the obtained reaction mixture was subjected to removal of methanol water using a vacuum distillation method to obtain a curing accelerator, that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- a curing accelerator that is, a salt of tetra n-butylphosphonium cation and n-dodecylbenzenesulfonic acid anion 85 wt. Got a part.
- this curing accelerator is added to 100 parts by weight of the curing agent Jamaicacid MH (manufactured by Shin Nippon Rika Co., Ltd .; the main component is 4-methylhexahydrophthalic anhydride), and heated and stirred at 60 ° C. for 30 minutes. After dissolution, the mixture was cooled to 50 ° C., 1.9 parts by weight of ethylene glycol was further added, dissolved by heating and stirring for 4 hours at 50 ° C., then cooled to room temperature, and a transparent liquid curing agent solution was added at room temperature. Obtained.
- Evaluation 1 The obtained hardener solution was filled in 300 g in a 500 ml steel can and sealed with nitrogen gas. After the can was stored for 6 months in an environment of 30 ° C., the appearance of the can was visually observed. If the can was swollen, it was judged as “failed”, and if it was not swollen, it was judged as “good”.
- the curing agent composition for epoxy resin of the present invention is excellent in storage stability, and even when the curing agent composition for epoxy resin is stored for a long period of time, the generation of carbon dioxide is extremely small and white turbidity due to precipitates does not occur. In addition, the cost is low, and the generation of bubbles can be remarkably suppressed even when the epoxy resin is cured. Therefore, an optical semiconductor device with extremely high reliability can be stably supplied.
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Abstract
Description
本発明の他の目的は、上記に加え、さらに、硬化時においても気泡の発生を抑制できるエポキシ樹脂用硬化剤組成物と、該エポキシ樹脂用硬化剤組成物を含む硬化性樹脂組成物、及び該硬化性樹脂組成物の硬化物、並びに該硬化物によって光半導体素子が封止された光半導体装置を提供することにある。
酸無水物系硬化剤(A)としては、一般にエポキシ化合物の硬化に使用される硬化剤を用いることができるが、常温で液状のものが好ましい。具体的には、例えば、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ドデセニル無水コハク酸、メチルエンドメチレンテトラヒドロ無水フタル酸、2,4-ジエチルペンタン二酸無水物、シクロヘキサン-1,2,4-トリカルボン酸-1,2-無水物等を挙げることができる。また、成形作業性を損なわない範囲で、常温で固体の酸無水物、例えば、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルシクロヘキセンジカルボン酸無水物等を使用することができる。常温で固体の酸無水物を使用する場合には、常温で液状の酸無水物に溶解させ、常温で液状の混合物として使用することが好ましい。酸無水物系硬化剤(A)は1種単独で又は2種以上を組み合わせて使用できる。
硬化促進剤(B)としては、エポキシ化合物の硬化促進に一般に使用される硬化促進剤であれば特に制限はなく、例えば、第三級アミン、第三級アミン塩、イミダゾール類、有機リン系化合物、第四級アンモニウム塩、第四級ホスホニウム塩、有機金属塩、ホウ素化合物等を用いることができる。硬化促進剤(B)は1種単独で又は2種以上を組み合わせて使用できる。
で表される化合物などが挙げられる。
本発明では、ネオペンチルグリコールおよび1,3-ブタンジオールから選択された少なくとも1種のジオール(C)を必須成分として用いる。ネオペンチルグリコール及び/又は1,3-ブタンジオールを配合することにより、硬化剤組成物の長期間貯蔵安定性が著しく向上し、硬化剤組成物を長期間保存しても、二酸化炭素の発生がほとんどなく、しかも析出物による白濁も生じず、透明性を維持できる。
本発明の硬化性樹脂組成物は、分子内にエポキシ基を2以上有するエポキシ化合物(D)と、前記本発明のエポキシ樹脂用硬化剤組成物とを必須成分として含む。
分子内にエポキシ基を2以上有するエポキシ化合物(D)としては、特に限定されず、例えば、脂環式エポキシ化合物、ビスフェノール型ジエポキシ化合物、脂肪族多価アルコールポリグリシジルエーテルなどを使用できる。エポキシ化合物(D)は1種単独で又は2種以上を組み合わせて使用できる。
本発明の硬化性樹脂組成物には、必要に応じて、各種添加剤を添加してもよい。該添加剤として、例えば、エチレングリコール、ジエチレングリコール、プロピレングリコール、グリセリン等の水酸基を有する化合物(多価アルコール等)を使用すると、反応を穏やかに進行させることができる。このような水酸基を有する化合物(多価アルコール等)の使用量は、エポキシ化合物(D)100重量部に対して、例えば、0.1~10重量部、好ましくは0.5~5重量部である。なお、前記のように、エチレングリコール等を硬化剤組成物中に添加しておくと、貯蔵中に白濁が生じるので、予めエポキシ化合物(D)と混合しておくか、又は硬化性樹脂組成物調製時に添加するのが好ましい。
本発明の硬化性樹脂組成物を、所望の場所又は型に注入し、硬化させることにより硬化物が得られる。硬化温度は、例えば、45~200℃、好ましくは80~190℃、さらに好ましくは100~180℃である。硬化時間は、例えば、30~1440分、好ましくは45~900分、さらに好ましくは60~600分である。硬化を多段階で行うこともできる。
本発明の光半導体装置は、光半導体素子が本発明の硬化性樹脂組成物の硬化物で封止されている。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液(硬化剤組成物)を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更に1,3-ブタンジオールを2.8重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更に1,3-ブタンジオールを2.8重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤のN,N-ジメチルベンジルアミン1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のN,N-ジメチルベンジルアミン1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤の「U-CAT 5003」(サンアプロ(株)製;第4級ホスホニウムブロマイド)を1重量部加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤の「U-CAT 5003」(サンアプロ(株)製;第4級ホスホニウムブロマイド)を1重量部加え、を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤の1,8-ジアザビシクロ[5.4.0]ウンデセン-7のp-トルエンスルホン酸塩を1重量部加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤の1,8-ジアザビシクロ[5.4.0]ウンデセン-7のp-トルエンスルホン酸塩を1重量部加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のテトラブチルホスホニウムデカン酸塩1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のテトラブチルホスホニウムラウリン酸塩1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のテトラブチルホスホニウムミリスチン酸塩1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のテトラブチルホスホニウムパルミチン酸塩1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、ビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸/メチルビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸(重量比1/4)混合物42重量部を加えて中和し、得られた反応混合物から減圧蒸留法を用いて脱水することにより、硬化促進剤、即ち、テトラブチルホスホニウムカチオンとビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸/メチルビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸(重量比1/4)混合物由来の混合アニオン残基との塩80重量部を得た。この硬化促進剤1重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、80℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、1,2,4,5-シクロヘキサンテトラカルボン酸38重量部を加えて中和し、得られた反応混合物から減圧蒸留法を用いて脱水することにより硬化促進剤、即ち、テトラブチルホスホニウムカチオンと1,2,4,5-シクロヘキサンテトラカルボン酸のアニオン残基との塩76重量部を得た。この硬化促進剤1重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、80℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、メタンスルホン酸(関東化学(株)製試薬)14重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いて脱水することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとメタンスルホン酸のアニオンとの塩51重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、ベンゼンスルホン酸(東京化成工業(株)製試薬)23重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いて脱水することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとベンゼンスルホン酸のアニオンとの塩61重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、p-トルエンスルホン酸・1水和物(関東化学(株)製試薬)25重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いて脱水することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとp-トルエンスルホン酸のアニオンとの塩57重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃ で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、4-クロロベンゼンスルホン酸・n水和物(東京化成工業(株)製試薬)28重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いて脱水することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンと4-クロロベンゼンスルホン酸のアニオンとの塩60重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃ で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部にメタノール120重量部を加え、n-ドデシルベンゼンスルホン酸(純度90%、関東化学(株)製)52重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いてメタノール水を除去することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとn-ドデシルベンゼンスルホン酸のアニオンとの塩85重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にネオペンチルグリコールを3.2重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH-700(新日本理化(株)製;4-メチルヘキサヒドロ無水フタル酸:ヘキサヒドロ無水フタル酸=70:30)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤の2-エチル-4-メチルイミダゾール1重量部を加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に、硬化促進剤のテトラブチルホスホニウムデカン酸塩1重量部を加え、60℃で30分加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラブチルホスホニウムヒドロキシドの40重量%水溶液100重量部に、ビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸/メチルビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸( 重量比1/4)混合物42重量部を加えて中和し、得られた反応混合物から減圧蒸留法を用いて脱水することにより、硬化促進剤、即ち、テトラブチルホスホニウムカチオンとビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸/メチルビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸(重量比1/4)混合物由来の混合アニオン残基との塩80重量部を得た。この硬化促進剤1重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、80℃ で30分加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部にメタノール120重量部を加え、n-ドデシルベンゼンスルホン酸(純度90%、関東化学(株)製)52重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いてメタノール水を除去することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとn-ドデシルベンゼンスルホン酸のアニオンとの塩85重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃で30分加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
テトラn-ブチルホスホニウムヒドロキシドの40重量%水溶液100重量部にメタノール120重量部を加え、n-ドデシルベンゼンスルホン酸(純度90%、関東化学(株)製)52重量部を加えて中和した。中和後、得られた反応混合物を、減圧蒸留法を用いてメタノール水を除去することにより硬化促進剤、即ち、テトラn-ブチルホスホニウムカチオンとn-ドデシルベンゼンスルホン酸のアニオンとの塩85重量部を得た。この硬化促進剤1.3重量部を硬化剤のリカシッドMH(新日本理化(株)製;主成分は4-メチルヘキサヒドロ無水フタル酸)100重量部に加え、60℃で30分加熱撹拌して溶解した後、50℃まで冷却し、更にエチレングリコールを1.9重量部加えて50℃のまま4時間加熱撹拌して溶解した後、室温まで冷却し、常温で透明液状の硬化剤液を得た。
実施例及び比較例で得られた硬化剤液を用い、下記の評価1~3を行った。結果を表1~3に示す。
得られた硬化剤液を500mlのスチール缶に300g充填し、窒素ガスを封入密閉した。この缶を30℃の環境下に6ヶ月間保管した後、缶の外観を目視観察し、缶が膨れていれば不合格「×」、膨れていなければ合格「○」とした。
得られた硬化剤液を50mlのガラス容器に30g充填し、窒素ガスを封入密閉した。この容器を23℃の環境下に1ヶ月間保管した後、硬化剤液を目視観察し、析出物が生じ白濁していれば不合格「×」、透明のままを維持していれば合格「○」とした。
得られた硬化剤液125重量部に対し、ダイセル化学工業(株)製、商品名「セロキサイド2021P」[3,4-エポキシシクロヘキシルメチル(3,4-エポキシ)シクロヘキサンカルボキシレート]を100重量部、シンキー(株)製「あわとり練太郎」を用いて、均一に混合し(2000rpm、5分)、光半導体封止用樹脂組成物(硬化性樹脂組成物)を得た。光半導体素子(InGaN)付きリードフレームに、得られた光半導体封止用樹脂組成物を注型して加熱硬化させて光半導体装置を作製した。硬化は、110℃で2時間加熱した後、一旦、型から外し、150℃で3時間ほど後硬化を行うという手順で行った。光半導体装置を顕微鏡観察し、光半導体装置の封止部分に気泡が残っている割合が20%を超えている場合を不合格「×」、20%以下の場合を「○」とした。
Claims (6)
- 酸無水物系硬化剤(A)、硬化促進剤(B)、及び、ネオペンチルグリコールおよび1,3-ブタンジオールから選択された少なくとも1種のジオール(C)を含有するエポキシ樹脂用硬化剤組成物。
- 酸無水物系硬化剤(A)100重量部に対して、ジオール(C)を0.5~15重量部の割合で含有する請求項1記載のエポキシ樹脂用硬化剤組成物。
- 分子内にエポキシ基を2以上有するエポキシ化合物(D)と、請求項1又は2記載のエポキシ樹脂用硬化剤組成物とを必須成分として含む硬化性樹脂組成物。
- エポキシ化合物(D)として、少なくとも1種の脂環式エポキシ化合物を用いる請求項3記載の硬化性樹脂組成物。
- 請求項3又は4記載の硬化性樹脂組成物を硬化して得られる硬化物。
- 光半導体素子が請求項5記載の硬化性樹脂組成物の硬化物によって封止されている光半導体装置。
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WO2013159339A1 (en) * | 2012-04-27 | 2013-10-31 | Dow Global Technologies Llc | Curable epoxy resin compositions and composites made therefrom |
JP2015063661A (ja) * | 2013-08-29 | 2015-04-09 | 北興化学工業株式会社 | エポキシ樹脂系組成物 |
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MY169102A (en) * | 2012-06-07 | 2019-02-18 | Nippon Kayaku Kk | Epoxy resin composition and cured product thereof and curable resin composition |
CN103633226B (zh) * | 2012-08-21 | 2016-12-21 | 广州市晶鑫光电科技有限公司 | 荧光粉胶体制备方法及相应的发光二极管封装方法 |
CN104961883B (zh) * | 2014-10-09 | 2017-06-20 | 东莞英铭化工有限公司 | 一种环氧树脂与醇相接合的改性环氧树脂及其制备方法 |
JP6386907B2 (ja) * | 2014-12-26 | 2018-09-05 | 株式会社ダイセル | 硬化性エポキシ樹脂組成物 |
KR102538165B1 (ko) * | 2016-07-29 | 2023-05-31 | 혹꼬우 가가꾸 고오교오 가부시끼가이샤 | 신규 포스포늄 화합물 |
CN108117721A (zh) * | 2016-11-29 | 2018-06-05 | 京瓷株式会社 | 透明环氧树脂组合物及光半导体装置 |
JP2022177333A (ja) * | 2019-10-25 | 2022-12-01 | 東洋合成工業株式会社 | オニウム塩、硬化剤、硬化促進剤、硬化性組成物及びデバイスの製造方法 |
CN113549108B (zh) * | 2021-08-25 | 2023-10-20 | 宝鸡文理学院 | 一种无卤素季磷盐烷基苯磺酸离子液体的制备及其作为钛合金润滑剂的应用 |
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2011
- 2011-09-14 KR KR1020137001289A patent/KR20140009102A/ko not_active Application Discontinuation
- 2011-09-14 CN CN201180033599.3A patent/CN102985460B/zh not_active Expired - Fee Related
- 2011-09-14 WO PCT/JP2011/070990 patent/WO2012046553A1/ja active Application Filing
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WO2013159339A1 (en) * | 2012-04-27 | 2013-10-31 | Dow Global Technologies Llc | Curable epoxy resin compositions and composites made therefrom |
CN102702682A (zh) * | 2012-05-25 | 2012-10-03 | 嘉兴市嘉港合成材料有限公司 | Led封装用液体环氧树脂组合物 |
JP2015063661A (ja) * | 2013-08-29 | 2015-04-09 | 北興化学工業株式会社 | エポキシ樹脂系組成物 |
Also Published As
Publication number | Publication date |
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KR20140009102A (ko) | 2014-01-22 |
JP2012082271A (ja) | 2012-04-26 |
TW201219441A (en) | 2012-05-16 |
CN102985460A (zh) | 2013-03-20 |
TWI591090B (zh) | 2017-07-11 |
JP5745248B2 (ja) | 2015-07-08 |
CN102985460B (zh) | 2017-02-22 |
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