WO2012043090A1 - Procédé de production d'un substrat servant à un support d'enregistrement d'informations, et dispositif de lavage utilisé lors de la production du substrat - Google Patents

Procédé de production d'un substrat servant à un support d'enregistrement d'informations, et dispositif de lavage utilisé lors de la production du substrat Download PDF

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Publication number
WO2012043090A1
WO2012043090A1 PCT/JP2011/068832 JP2011068832W WO2012043090A1 WO 2012043090 A1 WO2012043090 A1 WO 2012043090A1 JP 2011068832 W JP2011068832 W JP 2011068832W WO 2012043090 A1 WO2012043090 A1 WO 2012043090A1
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WIPO (PCT)
Prior art keywords
substrate
frequency
cleaning
diaphragm
information recording
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PCT/JP2011/068832
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English (en)
Japanese (ja)
Inventor
遠藤　毅
直之 福本
和幸 西
Original Assignee
コニカミノルタオプト株式会社
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Priority to JP2012536282A priority Critical patent/JPWO2012043090A1/ja
Publication of WO2012043090A1 publication Critical patent/WO2012043090A1/fr

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40—Specific cleaning or washing processes
    • C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation

Definitions

  • the present invention provides an information recording medium (for example, a hard disk) that magnetically records information recorded and reproduced by a flying head of an information storage device (for example, a hard disk device), and an information recording medium having a flat main surface.
  • the present invention relates to a manufacturing method of a substrate for glass (for example, a glass substrate) and a cleaning apparatus used for manufacturing the substrate.
  • a plurality of high-frequency transducers are used.
  • a plurality of high-frequency vibrators are arranged in an array in the medium liquid tank to clean the object.
  • the resonance frequency of the diaphragm arranged in contact with the upper surface of the high-frequency vibrator is lowered, and the substrate cannot be cleaned at a high frequency. Therefore, in order to clean the substrate at a desired high frequency, it is necessary to arrange a plurality of high frequency vibrators in an array with a gap.
  • the high-frequency ultrasonic wave has a straightness traveling in a direction substantially perpendicular to the oscillation surface of the high-frequency vibrator. For this reason, when the main surface on which the recording layer is formed on the substrate is cleaned as a cleaning surface, for example, a cleaning in which a plurality of high-frequency vibrators are arranged in an array with a gap in the medium liquid tank as described above.
  • the cleaning surface is not located above the high-frequency vibrator. Even if it oscillates, the generated ultrasonic wave is difficult to propagate to the cleaning surface. As a result, there arises a problem that the effect of ultrasonic cleaning (the effect of removing deposits) is reduced.
  • the present invention has been made in order to solve the above-described problems.
  • the object of the present invention is to arrange a plurality of high-frequency vibrators in an array with a gap therebetween, and to clean a substrate by ultrasonic cleaning.
  • An object of the present invention is to provide a method for manufacturing an information recording medium substrate capable of reliably obtaining the effect of sonic cleaning, and a cleaning apparatus used for the manufacturing.
  • the method for manufacturing a substrate for information recording medium of the present invention comprises an information recording medium for magnetically recording information recorded and reproduced by a flying head of an information storage device, and an information recording medium having a flat main surface.
  • a substrate manufacturing method comprising: a cleaning step of immersing the substrate in a medium liquid bath and cleaning the main surface of the substrate as a cleaning surface by ultrasonic vibration generated by an ultrasonic vibration generating unit;
  • the ultrasonic vibration generator is arranged in the medium liquid tank in an array with a gap therebetween, and a plurality of high-frequency vibrators that oscillate at a frequency higher than 900 kHz and resonate by the oscillation of the plurality of high-frequency vibrators
  • the substrate is placed in the medium liquid tank so that the cleaning surface is located above the oscillation surface of at least one high-frequency vibrator via the vibration plate. It is characterized by immersing in Te.
  • the cleaning device of the present invention manufactures an information recording medium substrate that comprises an information recording medium that magnetically records information recorded and reproduced by a flying head of an information storage device, and whose main surface is a flat surface.
  • a cleaning device used for the above-mentioned, a holding unit that holds the substrate in a medium liquid bath in an immersed state, and generation of ultrasonic vibration for generating ultrasonic vibration for cleaning the main surface of the substrate as a cleaning surface A plurality of high-frequency vibrators disposed in the medium liquid tank in an array with a gap therebetween and oscillating at a frequency greater than 900 kHz, and the plurality of high-frequency vibrations
  • a vibrating plate that resonates due to oscillation of a child, and the holding unit has the medium liquid tank so that the cleaning surface is located above the oscillating surface of at least one high-frequency vibrator via the vibrating plate. Before It is characterized by holding the substrate placed vertically.
  • the present invention by dipping and holding the substrate in a standing state in the medium liquid tank so that the cleaning surface is located above the oscillation surface of at least one high-frequency vibrator via the vibration plate, At least ultrasonic waves generated by oscillation of the high-frequency vibrator can be reliably propagated to the substrate above the high-frequency vibrator to clean the cleaning surface. Therefore, even when ultrasonic cleaning is performed by arranging a plurality of high-frequency vibrators in an array with a gap, the effect of ultrasonic cleaning can be reliably obtained.
  • FIG. 6 is a plan view showing a positional relationship between a high-frequency vibrator and a substrate in Comparative Example 1.
  • FIG. 6 is an explanatory diagram illustrating an example of a defect map after substrate cleaning in Example 1.
  • FIG. 10 is an explanatory diagram illustrating a defect map example after substrate cleaning in Comparative Example 1.
  • FIG. It is another example of composition of the above-mentioned cleaning device, and is a top view showing a positional relation between a plurality of vibrators and a substrate held. It is explanatory drawing which shows typically distribution of the transmission area
  • FIG. 1 is a flowchart showing a rough flow of a manufacturing process of an information recording medium and a substrate used therefor according to the present embodiment.
  • This information recording medium is a medium (for example, a hard disk) for magnetically recording information recorded and reproduced by a flying head of an information storage device (for example, a hard disk device), and is manufactured through steps S1 to S7.
  • glass which is a substrate material constituting an information recording medium
  • a substrate is melted and pressed to form a substrate (S1; melting press step).
  • the substrate is roughly polished, and the substrate shape is mainly adjusted (S2; rough polishing step).
  • the substrate surface is precisely polished, and the substrate surface roughness is mainly adjusted (S3; precision polishing step (1)).
  • a compressive stress layer is formed on the substrate surface by ion exchange (S4; chemical strengthening step).
  • the substrate surface is polished precisely to mainly adjust the substrate surface roughness (S5; precision polishing step (2)).
  • the substrate surface is cleaned (S6; cleaning process). That is, the foreign matter (adhered matter) on the substrate surface is removed and the substrate surface is cleaned.
  • S6 cleaning process
  • the present invention has a great feature in this cleaning step, and details thereof will be described later.
  • a recording film is formed on the substrate including the underlayer and the protective layer (S7; film forming step), and the process is terminated.
  • steps such as shape processing of the inner end portion and outer end portion of the substrate, chamfer processing, polishing after the processing are performed, but these steps are illustrated in the flowchart. Omitted.
  • the information recording medium is manufactured by the above-described steps S1 to S7, but the substrate constituting the information recording medium is manufactured by the steps S1 to S6.
  • the substrate constituting the information recording medium is referred to as an information recording medium substrate or a glass substrate, but may be simply referred to as a substrate.
  • the details of the above-described cleaning process of S6 in the production of the information recording medium substrate will be described.
  • the glass substrate after finishing the precision polishing step (2) of S5 is sequentially immersed in each medium liquid bath containing neutral detergent, pure water 1, pure water 2, and IPA (isopropyl alcohol), Dry with an IPA vapor machine.
  • ultrasonic cleaning is performed by arranging a vibrator in each medium liquid tank containing a neutral detergent, pure water 1 and pure water 2. That is, ultrasonic chemical cleaning with a neutral detergent and ultrasonic pure water cleaning with pure water 1 and pure water 2 are performed.
  • FIG. 2 shows a schematic configuration of each ultrasonic cleaning device (hereinafter simply referred to as a cleaning device), and a state in which the substrate 1 (information recording medium substrate) is held in the medium liquid tank 11.
  • 3 is a side view of the cleaning apparatus
  • FIG. 4 is a plan view showing a positional relationship between a high-frequency vibrator 21 and a substrate 1 described later in the cleaning apparatus.
  • the cleaning device includes a medium liquid tank 11, a holding unit 12, a hanging member 13, an ultrasonic vibration generating unit 14, and a drive mechanism 15.
  • the medium liquid tank 11 is a tank for storing a medium liquid 11a such as a neutral detergent or pure water. In addition, you may make a medium liquid 11a contain a detergent suitably.
  • the holding unit 12 is configured to stand and hold at least one substrate 1 immersed in the medium liquid tank 11.
  • the holding unit 12 includes a groove into which the substrate 1 is fitted and holds the substrate 1 at three points from below. Three holding rods 12a that can be received, a support portion 12b that integrally supports each holding rod 12a, a receiving portion 12c that receives the supporting portion 12b from below in the medium liquid 11a, and a single receiving portion 12c And an arm 12d connected to the drive mechanism 15.
  • the holding unit 12 holds only six substrates 1, but in practice, for example, 50 substrates 1 can be held.
  • the substrate 1 to be cleaned has a main surface and an end surface, and one or both of them can be cleaned by the cleaning apparatus.
  • the main surface of the substrate 1 is a surface on the substrate 1 on which a recording layer is formed.
  • the main surface of the substrate 1 is configured as a flat surface on one side or both sides of the substrate 1.
  • the end surface is the outer peripheral surface of the disc-shaped substrate 1.
  • substrate 1 is demonstrated as the cleaning surface 1a.
  • the suspension member 13 is an arm that integrally suspends each holding rod 12a and support portion 12b of the holding unit 12 in order to put the substrate 1 in and out of the medium liquid tank 11, and is vertically moved by a conveying device (not shown). It is provided to be movable. For example, when the substrate 1 is carried into the medium liquid tank 11, the suspension member 13 is moved downward while the substrate 1 is held by the holding rod 12a and the holding rod 12a and the support portion 12b are suspended integrally. By doing so, the substrate 1 can be immersed in the medium liquid tank 11. Thereafter, when the receiving portion 12c is raised together with the arm 12d and the support portion 12b is lifted by the receiving portion 12c, the support portion 12b is transferred from the suspension member 13 to the receiving portion 12c, and the loading of the substrate 1 is completed.
  • the substrate 1 is cleaned in the medium liquid tank 11, when the receiving portion 12c is lowered together with the arm 12d, the two holding rods 12a are caught on the tip of the suspension member 13 during the lowering, and the holding rod 12a is moved to the substrate. While holding 1, the holding rod 12 a and the support portion 12 b are suspended integrally by the suspension member 13. Therefore, as shown in FIG. 5, the substrate 1 can be carried out of the medium liquid tank 11 by moving the suspension member 13 upward.
  • the ultrasonic vibration generating unit 14 generates ultrasonic vibration for cleaning the substrate 1 and includes a plurality of high-frequency vibrators 21 and a diaphragm 22.
  • the plurality of high-frequency vibrators 21 oscillate at a frequency higher than 900 kHz, and are arranged below (bottom part) in the medium liquid tank 11 in an array with a gap therebetween.
  • the diaphragm 22 is a plate-like member that resonates due to the oscillation of the plurality of high-frequency vibrators 21 and is disposed in contact with the upper surfaces of the plurality of high-frequency vibrators 21.
  • the high-frequency vibrator 21 that oscillates at a frequency higher than 900 kHz is used because the thickness of the boundary layer (boundary viscous layer) is set to 1 ⁇ m or less and deposits having a height of 1 ⁇ m or less are removed by the microstreaming effect. It is to do.
  • micro-streaming refers to a local intense flow generated around bubbles that are vibrated by ultrasonic waves. By using this micro-streaming, adhered matter can be removed.
  • a circular oscillator that oscillates at 950 kHz is used as the high-frequency vibrator 21.
  • Such high-frequency vibrators 21 are two-dimensionally arranged in a matrix at equal pitches in the vertical and horizontal directions (see FIG. 4).
  • the gaps 21a formed between adjacent high-frequency vibrators 21 are formed in a grid.
  • the three holding rods 12a described above are disposed above the gap portion 21a where the plurality of high-frequency vibrators 21 do not exist, and the high-frequency waves that go straight upward from the diaphragm 22 by the oscillation of the high-frequency vibrator 21. (Ultrasonic) attenuation is avoided.
  • the thickness of the diaphragm 22 is set to be approximately an integral multiple of half of the wavelength determined based on the oscillation frequency of the high-frequency vibrator 21 and the sound speed according to the material of the diaphragm 22.
  • the thickness of the diaphragm 22 is t (mm)
  • FIG. 6 shows the relationship between the thickness of the diaphragm 22 and the temperature of the high-frequency vibrator 21.
  • the temperature of the high-frequency vibrator 21 is approximated by the temperature of the medium liquid 11 a around the high-frequency vibrator 22.
  • ⁇ / 2 the thickness of the diaphragm 22 is an integral multiple of a half wavelength ( ⁇ / 2), the temperature rise due to heat generation of the high-frequency vibrator 21 is suppressed, and vibration energy loss (vibration energy loss) It can be said that there is little loss due to conversion to heat.
  • the thickness of the diaphragm 22 may be set to an integral multiple of 3 mm.
  • the thickness of the diaphragm 22 increases as shown in FIG. Even if the length is an integral multiple of a half wavelength, the heat generation of the high-frequency vibrator 21 gradually increases and the loss of vibration energy gradually increases. Therefore, if possible, it is desirable that the thickness of the diaphragm 22 is thin. .
  • the drive mechanism 15 is a swing mechanism that reciprocally moves the substrate 1 together with the holding unit 12 in a direction parallel to one line in which the plurality of high-frequency vibrators 21 are arranged in the medium liquid tank 11.
  • a cam mechanism that moves the holding portion 12 (particularly, the arm 12d) in the above-described direction and a biasing member that presses the arm 12d against the cam are configured.
  • the drive mechanism 15 may translate the holding unit 12 by a power transmission mechanism other than the cam.
  • the substrate 1 is immersed in the medium liquid tank 11 of the cleaning device by the above-described suspension member 13 while holding the plurality of substrates 1 by the holding unit 12, and is generated by the ultrasonic vibration generating unit 14.
  • the cleaning surface 1a of the substrate 1 is cleaned by ultrasonic vibration.
  • the driving mechanism 15 reciprocates the substrate 1 together with the holding unit 12.
  • the diaphragm 22 is vibrated by operating the plurality of high-frequency vibrators 21 in parallel, and the generated high frequency is transmitted to the cleaning surface 1a of the substrate 1 through the medium liquid 11a, and the deposits are removed by the microstreaming effect.
  • the substrate 1 is taken out of the cleaning device by the lowering of the receiving portion 12c and the lifting member 13, and the cleaning operation is finished.
  • FIG. 7 is an explanatory view schematically showing the distribution of the high-frequency transmission region in the cleaning apparatus. Since the high frequency (ultrasonic wave) has a straight traveling property that proceeds in a direction perpendicular to the oscillation surface of the high frequency vibrator 21 (upward in FIG. 7), a high frequency is effective for the medium liquid 11a as shown in FIG. There are a region R1 having a high ultrasonic vibration energy and a region R2 having a low ultrasonic vibration energy in which high-frequency transmission efficiency is reduced. The region R1 is formed corresponding to the central region of the oscillation surface of the high-frequency vibrator 21, and the region R2 is formed corresponding to at least the gap portion 21a.
  • the high frequency is transmitted also to the region R2, but this is because the high frequency slightly diffuses even though it has a straight traveling property.
  • the transmission efficiency of the high frequency to the region R2 is lower than the region R1 where the high frequency goes straight as described above, and becomes lower as the distance from the region R1 increases. Therefore, in the region immediately above the gap 21a in the region R2, the high-frequency transmission efficiency is extremely reduced, and the ultrasonic vibration energy is extremely low.
  • the cleaning surface 1a of the substrate 1 is positioned above the oscillation surface of at least one high-frequency vibrator 21 via the diaphragm 22 (see FIG. 3). Then, the substrate 1 is immersed in the medium liquid tank 11 (the holding unit 12 holds the substrate 1 in the state in which the substrate 1 is stood in the medium liquid tank 11). By immersing and holding the substrate 1 in the medium liquid tank 11 in this way, ultrasonic waves generated by the oscillation of at least one high-frequency vibrator 21 are utilized above the high-frequency vibrator 21 using its straightness.
  • the cleaning surface 1a can be cleaned by reliably propagating to the substrate 1.
  • the cleaning effect by ultrasonic cleaning can be reliably obtained. That is, by dipping and holding the substrate 1 so as to avoid a region in which the ultrasonic vibration energy is extremely low in the medium liquid tank 11, it is possible to reliably solve the lack of cleaning due to ultrasonic cleaning.
  • the substrate 1 is immersed and held in the medium liquid tank 11 by the holding unit 12 so that the cleaning surface 1a is positioned above the oscillation surface of the plurality of high-frequency vibrators 21 arranged on one line.
  • Ultrasonic waves generated by the oscillations of a plurality of high-frequency vibrators 21 on one line are propagated to the substrate 1, and the deposits on the cleaning surface 1a can be removed in a wide range in the line direction. As a result, the effect of ultrasonic cleaning can be enhanced.
  • the drive mechanism 15 is held in the medium liquid tank 11 in a direction parallel to one line of the plurality of high-frequency vibrators 21 (in the direction indicated by the white line in FIG. 2 and FIG. 4).
  • the part 12 is reciprocated and the substrate 1 held by the holding part 12 is reciprocated.
  • the reciprocating movement of the substrate 1 may be performed during the entire cleaning period in the cleaning process or may be performed during a part of the cleaning period.
  • the cleaning surface 1 a positioned above the gap portion 21 a of two adjacent high frequency vibrators 21 on one line of the plurality of high frequency vibrators 21 is moved above the high frequency vibrator 21. It is possible to wash it in the position. As a result, the cleaning surface 1a of the substrate 1 can be cleaned almost uniformly, and uneven cleaning of the cleaning surface 1a can be reduced.
  • the cleaning is located above the gap 21a by reciprocating the substrate 1 more than the length of the gap 21a between the two high-frequency vibrators 21 adjacent in the moving direction of the substrate 1 (for example, 2 mm or more described later). Since the surface 1a can be reliably positioned above the high-frequency vibrator 21 by the reciprocating movement, the effect of reducing the cleaning unevenness of the cleaning surface 1a can be reliably obtained.
  • Example 1 Example 1
  • Comparative Example 1 Example 1
  • Example 1 In the above-described cleaning process of S6, as shown in FIG. 4, the substrate 1 is erected and immersed in the medium liquid tank 11 so that the cleaning surface 1a is positioned above the plurality of high-frequency vibrators 21 on one line. Then, high frequency cleaning was performed. At this time, a plurality of (for example, 50) substrates 1 were cleaned at one time by one cleaning apparatus. After cleaning, five substrates 1 were arbitrarily extracted as samples, and defects due to defective cleaning were detected with an optical defect detector (KLA-Tencor, Candera 6300). Table 1 shows the defect detection results of Example 1.
  • top refers to the upper part of the main surface of the substrate 1 (the side opposite to the diaphragm 22), and “bot” refers to the lower part of the main surface of the substrate 1 (the diaphragm 22 side).
  • n number is a number indicating one of the five substrates 1 (respectively indicated by n1 to n5), and the numerical value in each column indicates the number of detected defects.
  • the number of defects corresponds to the number of cleaning defects.
  • the size of the substrate 1 used in Example 1 is 65 mm in diameter.
  • the thickness of the substrate 1 is 0.8 mm, and the size of the high-frequency vibrator 21 that oscillates at 950 kHz is about 1 mm in diameter.
  • the distance between the diaphragm 22 and the lower end of the substrate 1 is 10 cm.
  • the width of the gap 21a that is, the distance between adjacent high-frequency vibrators 21 is preferably 2 mm, and in the first embodiment, it is 2 mm.
  • FIG. 8 is a plan view showing the positional relationship between the high-frequency vibrator 21 and the substrate 1 in the first comparative example.
  • the substrate 1 in the cleaning process of S6, the substrate 1 is erected so that the main surface as the cleaning surface 1a of the substrate 1 is located only above the gap 21a. It was immersed in the tank 11 and washed with high frequency. Other conditions are the same as in the first embodiment.
  • Table 2 shows the defect detection results when the same evaluation as in Example 1 was performed for Comparative Example 1.
  • Comparative Example 3 in the cleaning process of S6, the substrate is placed in the medium liquid tank so that the cleaning surface (main surface) of the substrate is located only above the gap between adjacent low frequency vibrators. Immersion and cleaning by low frequency were performed. Other conditions are the same as in the first embodiment. Tables 3 and 4 show the defect detection results when Comparative Examples 2 and 3 were evaluated in the same manner as in Example 1.
  • Example 1 both the top and bot have noticeable poor cleaning due to ultrasonic irradiation failure at n5.
  • Example 1 no remarkable cleaning failure as in Comparative Example 1 occurred in n1 to n5. From this, in Example 1, it can be said that the poor cleaning can be reduced by optimizing the position where the substrate 1 is immersed and held in the medium liquid tank 11. This is presumably because the high frequency of 950 kHz is strong in straightness, and the cleaning effect is high by positioning the cleaning surface 1a of the substrate 1 above the high frequency.
  • FIG. 9 and FIG. 10 show examples of defect maps by the detection device. Specifically, FIG. 9 shows an example of a defect map on the back surface of the n5 substrate 1 of Example 1, and FIG. 10 shows an example of a defect map on the back surface of the n5 substrate 1 of Comparative Example 1.
  • the black dot portion indicates a defective cleaning portion.
  • the number of black spots is remarkably smaller than that in FIG. 10. Therefore, it can be said that the defective cleaning is significantly reduced in Example 1 compared to Comparative Example 1.
  • FIG. 11 is another example of the configuration of the cleaning apparatus, and is a plan view showing the positional relationship between a plurality of vibrators and the substrate 1 held.
  • FIG. 12 is explanatory drawing which shows typically distribution of the transmission area
  • the ultrasonic vibration generator 14 may further include a plurality of low-frequency vibrators 23.
  • the low frequency vibrator 23 is a vibrator that oscillates at a frequency lower than 500 kHz, and is disposed between two adjacent lines of the plurality of high frequency vibrators 21.
  • the oscillation frequency of the low-frequency vibrator 23 is preferably, for example, 80 to 450 kHz in order to remove relatively large deposits, and is particularly in the vicinity of 450 kHz where the boundary layer (boundary adhesive layer) can be several ⁇ m or less. In this embodiment, for example, it is set to 475 kHz.
  • the above-described diaphragm 22 is disposed in contact with the upper surfaces of the high-frequency vibrator 21 and the low-frequency vibrator 23.
  • the high-frequency vibrator 21 and the low-frequency vibrator 23 may be oscillated simultaneously or alternately in the cleaning step of S6.
  • a relatively large deposit can be removed at a low frequency while a relatively small deposit adhering to the cleaning surface 1a is removed at a high frequency, and the deposit can be efficiently removed as a whole.
  • the medium liquid 11a has a region R1 where the high-frequency is effectively transmitted and a region R2 where the high-frequency transmission efficiency is reduced.
  • the low-frequency vibrator 23 there is further a region R3 where the low frequency is transmitted.
  • the region R3 is formed so as to spread from each low frequency vibrator 23 as shown in FIG. Therefore, in this configuration, the cleaning surface 1a of the substrate 1 can be cleaned at a low frequency without positioning the cleaning surface 1a of the substrate 1 above the low-frequency vibrator 23. That is, in the relationship with the low frequency vibrator 23, it is possible to eliminate the restriction on the position where the substrate 1 is immersed and held in the medium liquid tank 11.
  • the thickness of the diaphragm 22 is based on the oscillation frequency of the high-frequency vibrator 21 and the sound speed corresponding to the material of the diaphragm 22.
  • the sound velocity is 5800 m / sec
  • the oscillation frequency of the high-frequency vibrator 21 is 950 kHz
  • the oscillation frequency of the low-frequency vibrator 23 is 475 kHz
  • first and second respectively lambda 1 wavelengths, lambda 2
  • ⁇ 1/2 (5800/950 ⁇ 10 3) / 2 ⁇ 3 next
  • ⁇ 2/2 (5800 /475 ⁇ 10 3 ) / 2 ⁇ 6
  • the thickness t (mm) of the diaphragm 22 is set to 6 mm, which is the least common multiple of both, for example.
  • the same relationship as in FIG. 6 can be obtained. That is, when the thickness of the vibration plate 22 is an integral multiple of a half wavelength ( ⁇ 2/2), the temperature rise due to heat generation of the low frequency oscillator 23 is suppressed, by conversion to heat losses (vibration energy of the vibration energy Loss). Therefore, by setting the thickness of the diaphragm 22 as described above, the heat generation of both the high-frequency vibrator 21 and the low-frequency vibrator 23 can be suppressed, and the loss of vibration energy can be suppressed. Both can be efficiently transferred to the substrate 1 for cleaning.
  • cleaning of a glass substrate has been described as an example.
  • the effects of the cleaning method and the cleaning apparatus of the present invention can be obtained without depending on the material of the substrate, for example, in cleaning of an aluminum alloy substrate. Is also effective.
  • the technique of the present invention is used in the cleaning process performed after the chemical strengthening process.
  • the present invention is not limited to this, and it is also effective to perform the cleaning before the chemical strengthening process, for example. That is, in general, the chemical strengthening step generates compressive stress by ion exchange on the surface of the substrate, but if there is an adhering substance, the surface ion exchange state becomes uneven and minute irregularities are generated on the substrate. Therefore, by performing the cleaning by the method of the present invention before the chemical strengthening step, higher quality chemical strengthening can be performed.
  • the manufacturing method of the substrate for information recording media of this embodiment constitutes the information recording medium which magnetically records the information recorded and reproduced by the flying head of the information storage device, and the main surface is constituted by a flat surface.
  • a method for manufacturing an information recording medium substrate comprising: immersing the substrate in a medium liquid bath; and cleaning the main surface of the substrate as a cleaning surface by ultrasonic vibration generated by an ultrasonic vibration generating unit
  • the ultrasonic vibration generator is disposed in the medium liquid tank in an array with a gap between each other, and a plurality of high-frequency vibrators that oscillate at a frequency higher than 900 kHz, and the plurality of high-frequency vibrators
  • a vibration plate that resonates by oscillation, and in the cleaning step, the cleaning surface is located above the oscillation surface of at least one high-frequency vibrator via the vibration plate.
  • the cleaning device of the present embodiment is an information recording medium substrate that forms an information recording medium that magnetically records information recorded and reproduced by the flying head of the information storage device, and that has a flat main surface.
  • a cleaning apparatus used for manufacturing a holding unit that holds the substrate in a state of being immersed in a medium liquid bath, and an ultrasonic vibration that generates ultrasonic vibration for cleaning the main surface of the substrate as a cleaning surface
  • a vibration plate that resonates due to oscillation of a vibrator, and the holding unit is configured so that the cleaning surface is located above the oscillation surface of at least one high-frequency vibrator via the vibration plate. In the tank Holding upright the substrate.
  • a plurality of high-frequency vibrators are arranged in an array with gaps.
  • the array-like arrangement includes a matrix-like (lattice-like) arrangement, a staggered arrangement (an arrangement shifted by a half pitch vertically and horizontally), and a random arrangement.
  • the substrate is immersed and held in a state of standing in the medium liquid tank (by the holding unit) so that the cleaning surface is located above the oscillation surface of at least one high-frequency vibrator via the diaphragm. Accordingly, at least ultrasonic waves generated by the oscillation of the high-frequency vibrator can be reliably propagated to the substrate above the high-frequency vibrator, and the cleaning surface can be cleaned. Therefore, even when a plurality of high-frequency vibrators are arranged in an array with a gap therebetween and the substrate is cleaned by ultrasonic cleaning, the effect of ultrasonic cleaning can be reliably obtained.
  • the cleaning surface is positioned in the medium liquid tank so that the cleaning surface is positioned above the oscillation surfaces of a plurality of high-frequency vibrators arranged on one line. It is desirable to immerse the substrate upright.
  • the holding unit stands the substrate in the medium liquid tank so that the cleaning surface is positioned above the oscillation surfaces of the plurality of high frequency vibrators arranged on one line. It is desirable to hold it.
  • ultrasonic waves generated by the oscillation of a plurality of high-frequency vibrators on one line can be propagated to the substrate, and the deposits on the cleaning surface can be removed in a wide range in the line direction. Can be increased.
  • the substrate in the cleaning step, it is desirable that the substrate is reciprocated in a direction parallel to the one line of the plurality of high-frequency vibrators in the medium liquid tank. .
  • the cleaning apparatus further includes a drive mechanism that reciprocates the substrate together with the holding unit in a direction parallel to the one line of the plurality of high-frequency vibrators in the medium liquid tank. It is desirable.
  • the substrate can be cleaned by being positioned above the high-frequency vibrator by reciprocating the substrate.
  • the substrate is moved back and forth more than the length of the gap between two high frequency vibrators adjacent in the moving direction of the substrate.
  • the amount of movement of the substrate is equal to or greater than the length of the gap between two high frequency vibrators adjacent in the direction of movement of the substrate.
  • the cleaning surface located above the gap between two adjacent high-frequency vibrators in the moving direction of the substrate (the direction of one line of the plurality of high-frequency vibrators) is moved above the high-frequency vibrator by the reciprocating movement of the substrate. It can be reliably positioned and cleaned, and the effect of reducing cleaning unevenness on the cleaning surface can be reliably obtained.
  • the thickness of the diaphragm is half of the wavelength determined based on the oscillation frequency of the high-frequency vibrator and the speed of sound according to the material of the diaphragm. It is desirable that it is a substantially integer multiple of.
  • the heat generation of the high-frequency vibrator can be suppressed, loss of vibration energy can be suppressed, and the high-frequency can be efficiently transmitted to the substrate for cleaning.
  • the ultrasonic vibration generating unit is disposed between two adjacent lines of the plurality of high-frequency vibrators and oscillates at a frequency lower than 500 kHz.
  • a low-frequency vibrator may be further included, and the high-frequency vibrator and the low-frequency vibrator may be oscillated simultaneously or alternately in the cleaning step.
  • the ultrasonic vibration generating unit is disposed between two adjacent lines of the plurality of high frequency vibrators and oscillates at a frequency lower than 500 kHz.
  • the high-frequency vibrator and the low-frequency vibrator may oscillate simultaneously or alternately.
  • the relatively large adhering to the cleaning surface due to the low frequency generated by the oscillation of the low frequency oscillator can be removed, and the deposit can be efficiently removed as a whole. Further, since the vibration spreads at a low frequency as compared with the high frequency, the cleaning surface of the substrate can be cleaned by the low frequency without positioning the cleaning surface of the substrate above the low frequency vibrator.
  • the thickness of the diaphragm is half of the wavelength determined based on the oscillation frequency of the high-frequency vibrator and the speed of sound according to the material of the diaphragm. It is desirable that it is approximately an integer multiple of half of the wavelength determined based on the oscillation frequency of the low-frequency vibrator and the sound speed corresponding to the material of the diaphragm.
  • the present invention can be used for manufacturing a substrate constituting an information recording medium for magnetically recording information recorded and reproduced by a flying head of an information storage device.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

Un procédé de production d'un substrat destiné à être utilisé dans un support d'enregistrement d'informations comprend une étape de lavage consistant à immerger un substrat (1) dans un bain et à laver une surface principale du substrat (1) en tant que surface de lavage (1a) avec des vibrations ultrasoniques générées par une unité de génération d'oscillations ultrasoniques. L'unité de génération d'oscillations ultrasoniques comprend une pluralité d'oscillateurs haute fréquence (21) qui sont disposés ensemble, séparés par des intervalles, dans une zone dans le bain et qui oscillent à une fréquence supérieure à 900 kHz, et une plaque d'oscillation qui résonne à l'oscillation de la pluralité des oscillateurs haute fréquence (21). Dans l'étape de lavage susmentionnée, le substrat (1) est immergé verticalement dans le bain de sorte que la surface de lavage (1a) soit positionnée au-dessus de la surface d'oscillation d'au moins un des oscillateurs haute fréquence (21), la plaque d'oscillation étant interposée entre la surface de lavage et le ou les oscillateurs.
PCT/JP2011/068832 2010-09-30 2011-08-22 Procédé de production d'un substrat servant à un support d'enregistrement d'informations, et dispositif de lavage utilisé lors de la production du substrat WO2012043090A1 (fr)

Priority Applications (1)

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JP2012536282A JPWO2012043090A1 (ja) 2010-09-30 2011-08-22 情報記録媒体用基板の製造方法およびその製造に用いられる洗浄装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045188A (ja) * 2012-08-27 2014-03-13 Imec 液体への超音波エネルギー伝達システム、及び固体部洗浄用のその使用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6443385A (en) * 1987-08-07 1989-02-15 Sekisui Plastics Ultrasonic washer
JPH0487675A (ja) * 1990-07-30 1992-03-19 Kokusai Denki Erutetsuku:Kk 超音波洗浄装置と被洗浄物保持具
JPH10192799A (ja) * 1997-01-07 1998-07-28 Toppan Printing Co Ltd 超音波洗浄装置
JPH11207258A (ja) * 1998-01-22 1999-08-03 Tadahiro Omi 超音波振動発生装置及び超音波洗浄装置
JP2004335081A (ja) * 2003-04-18 2004-11-25 Hoya Corp 磁気ディスク用ガラス基板の洗浄方法及び磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法
JP2010051912A (ja) * 2008-08-29 2010-03-11 Toppan Printing Co Ltd 有機機能性素子蒸気乾燥装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6443385A (en) * 1987-08-07 1989-02-15 Sekisui Plastics Ultrasonic washer
JPH0487675A (ja) * 1990-07-30 1992-03-19 Kokusai Denki Erutetsuku:Kk 超音波洗浄装置と被洗浄物保持具
JPH10192799A (ja) * 1997-01-07 1998-07-28 Toppan Printing Co Ltd 超音波洗浄装置
JPH11207258A (ja) * 1998-01-22 1999-08-03 Tadahiro Omi 超音波振動発生装置及び超音波洗浄装置
JP2004335081A (ja) * 2003-04-18 2004-11-25 Hoya Corp 磁気ディスク用ガラス基板の洗浄方法及び磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法
JP2010051912A (ja) * 2008-08-29 2010-03-11 Toppan Printing Co Ltd 有機機能性素子蒸気乾燥装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045188A (ja) * 2012-08-27 2014-03-13 Imec 液体への超音波エネルギー伝達システム、及び固体部洗浄用のその使用

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