WO2012007469A3 - Verfahren zum beschichten eines substrates mittels eines lichtbogens - Google Patents

Verfahren zum beschichten eines substrates mittels eines lichtbogens Download PDF

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Publication number
WO2012007469A3
WO2012007469A3 PCT/EP2011/061873 EP2011061873W WO2012007469A3 WO 2012007469 A3 WO2012007469 A3 WO 2012007469A3 EP 2011061873 W EP2011061873 W EP 2011061873W WO 2012007469 A3 WO2012007469 A3 WO 2012007469A3
Authority
WO
WIPO (PCT)
Prior art keywords
arc
vacuum chamber
substrate
evaporator
coating
Prior art date
Application number
PCT/EP2011/061873
Other languages
English (en)
French (fr)
Other versions
WO2012007469A2 (de
Inventor
Oliver Kayser
Original Assignee
Dreistegen Gmbh
Hoedtke Gmbh & Co. Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=44510911&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2012007469(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dreistegen Gmbh, Hoedtke Gmbh & Co. Kg filed Critical Dreistegen Gmbh
Priority to US13/808,577 priority Critical patent/US20130146445A1/en
Priority to KR1020137003588A priority patent/KR20130126586A/ko
Priority to CN2011800344649A priority patent/CN103003466A/zh
Priority to EA201390092A priority patent/EA201390092A1/ru
Priority to JP2013519073A priority patent/JP2013532234A/ja
Priority to EP11748597.9A priority patent/EP2593577A2/de
Publication of WO2012007469A2 publication Critical patent/WO2012007469A2/de
Publication of WO2012007469A3 publication Critical patent/WO2012007469A3/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042Electrodes formed of a single material
    • C25B11/046Alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32568Relative arrangement or disposition of electrodes; moving means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32614Consumable cathodes for arc discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating

Abstract

Die Erfindung betrifft ein Verfahren und einen Verdampfer (12, 14, 62, 64, 66, 68) zum Beschichten eines Substrats mittels eines Lichtbogens in einer Vakuumkammer (10) bei Niederdruck-Lichtbogenverdampfen, wobei die Vakuumkammer (10) zumindest einen Verdampfer (12, 14, 62, 64, 66, 68), der ein Targetmaterial (20) umfasst, Reaktivgaszuführungen (53, 54) für die Zufuhr von Reaktivgas, und eine Vakuumpumpe aufweist, wobei der Verdampfer (12, 14, 62, 64, 66, 68) mit dem Targetmaterial (20) als Kathode und die Innenwand (36) der Vakuumkammer (10) als Anode dient, zwischen denen der Lichtbogen erzeugt wird. Nach der Erfindung wird als Targetmaterial (20) hochschmelzendes Metall für die Katalyse verwendet, und der Druck in der Vakuumkammer (20) während des Beschichtens beträgt mindestens 0,5 Pa, insbesondere mindestens 3 Pa, vorzugsweise 5 Pa. Auf dem Substrat wird eine Schicht aus katalytisch aktivem Metall mit hohem Sauerstoffanteil gebildet.
PCT/EP2011/061873 2010-07-12 2011-07-12 Verfahren zum beschichten eines substrates mittels eines lichtbogens WO2012007469A2 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US13/808,577 US20130146445A1 (en) 2010-07-12 2011-07-12 Process for coating a substrate by means of an arc
KR1020137003588A KR20130126586A (ko) 2010-07-12 2011-07-12 아크에 의해 기판을 코팅하기 위한 방법
CN2011800344649A CN103003466A (zh) 2010-07-12 2011-07-12 通过电弧涂布基材的方法
EA201390092A EA201390092A1 (ru) 2010-07-12 2011-07-12 Способ нанесения покрытий на подложку с помощью электрической дуги
JP2013519073A JP2013532234A (ja) 2010-07-12 2011-07-12 アーク放電による基材の被覆方法
EP11748597.9A EP2593577A2 (de) 2010-07-12 2011-07-12 Verfahren zum beschichten eines substrates mittels eines lichtbogens

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010036332.4 2010-07-12
DE102010036332A DE102010036332B4 (de) 2010-07-12 2010-07-12 Verfahren zum Beschichten von Elektroden für die Elektrolyse mittels eines Lichtbogens

Publications (2)

Publication Number Publication Date
WO2012007469A2 WO2012007469A2 (de) 2012-01-19
WO2012007469A3 true WO2012007469A3 (de) 2012-03-08

Family

ID=44510911

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2011/061873 WO2012007469A2 (de) 2010-07-12 2011-07-12 Verfahren zum beschichten eines substrates mittels eines lichtbogens

Country Status (8)

Country Link
US (1) US20130146445A1 (de)
EP (1) EP2593577A2 (de)
JP (1) JP2013532234A (de)
KR (1) KR20130126586A (de)
CN (1) CN103003466A (de)
DE (1) DE102010036332B4 (de)
EA (1) EA201390092A1 (de)
WO (1) WO2012007469A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017033994A1 (ja) * 2015-08-25 2017-03-02 国立大学法人熊本大学 金属箔触媒及びその製造方法、並びに触媒コンバータ
JP7419107B2 (ja) * 2020-02-28 2024-01-22 いすゞ自動車株式会社 触媒用部材の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995005499A1 (en) * 1993-08-13 1995-02-23 Imperial Chemical Industries Electrode and preparation thereof
US20050106435A1 (en) * 2003-11-13 2005-05-19 Jang Bor Z. Twin-wire arc deposited electrode, solid electrolyte membrane, membrane electrode assembly and fuel cell

Family Cites Families (11)

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JPH0215162A (ja) * 1988-06-30 1990-01-18 Nippon Sheet Glass Co Ltd 酸化チタン被膜の形成方法
JPH03141104A (ja) * 1989-10-24 1991-06-17 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜の作製方法
JPH03147312A (ja) * 1989-11-01 1991-06-24 Nippon Chemicon Corp 電解コンデンサ用アルミニウム電極の製造方法
JP3287163B2 (ja) * 1995-01-23 2002-05-27 日新電機株式会社 アーク式蒸発源
JP2000096212A (ja) * 1998-09-28 2000-04-04 Sumitomo Electric Ind Ltd 光触媒膜被覆部材およびその製造方法
DE19905735A1 (de) * 1999-02-11 2000-08-17 Kennametal Inc Verfahren zum Herstellen eines Zerspanungswerkzeugs sowie Zerspanungswerkzeug
JP3104701B1 (ja) * 1999-08-18 2000-10-30 日新電機株式会社 アーク式蒸発源
JP2009540932A (ja) * 2006-06-21 2009-11-26 プロテウス バイオメディカル インコーポレイテッド 陰極アーク製作構造物を備えるインプラント型医療デバイス
FR2903808B1 (fr) * 2006-07-11 2008-11-28 Soitec Silicon On Insulator Procede de collage direct de deux substrats utilises en electronique, optique ou opto-electronique
SE532049C2 (sv) * 2008-03-07 2009-10-13 Seco Tools Ab Oxidbelagt skärverktygsskär för spånavskiljande bearbetning av stål
EP2107136B1 (de) * 2008-03-31 2014-12-31 Permelec Electrode Ltd. Herstellungsverfahren für Elektroden für Elektrolyse

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995005499A1 (en) * 1993-08-13 1995-02-23 Imperial Chemical Industries Electrode and preparation thereof
US20050106435A1 (en) * 2003-11-13 2005-05-19 Jang Bor Z. Twin-wire arc deposited electrode, solid electrolyte membrane, membrane electrode assembly and fuel cell

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
TAKIKAWA H ET AL: "Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 348, no. 1-2, 6 July 1999 (1999-07-06), pages 145 - 151, XP004177574, ISSN: 0040-6090, DOI: 10.1016/S0040-6090(99)00054-1 *
ZHAO Z ET AL: "Influence of working pressure on properties of titanium oxide thin films at room temperature", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 101, no. 1, 4 January 2007 (2007-01-04), pages 13505 - 013505, XP012096726, ISSN: 0021-8979 *

Also Published As

Publication number Publication date
DE102010036332B4 (de) 2012-02-23
EA201390092A1 (ru) 2013-11-29
EP2593577A2 (de) 2013-05-22
DE102010036332A1 (de) 2012-01-12
US20130146445A1 (en) 2013-06-13
JP2013532234A (ja) 2013-08-15
KR20130126586A (ko) 2013-11-20
CN103003466A (zh) 2013-03-27
WO2012007469A2 (de) 2012-01-19

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