WO2011027712A1 - Dispositif d'affichage électroluminescent organique, substrat de filtre de couleur et procédé de fabrication du dispositif d'affichage électroluminescent organique - Google Patents

Dispositif d'affichage électroluminescent organique, substrat de filtre de couleur et procédé de fabrication du dispositif d'affichage électroluminescent organique Download PDF

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Publication number
WO2011027712A1
WO2011027712A1 PCT/JP2010/064515 JP2010064515W WO2011027712A1 WO 2011027712 A1 WO2011027712 A1 WO 2011027712A1 JP 2010064515 W JP2010064515 W JP 2010064515W WO 2011027712 A1 WO2011027712 A1 WO 2011027712A1
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organic
color filter
ultraviolet
layer
substrate
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PCT/JP2010/064515
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English (en)
Japanese (ja)
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和弘 大里
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凸版印刷株式会社
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Priority to JP2011529885A priority Critical patent/JP5609878B2/ja
Publication of WO2011027712A1 publication Critical patent/WO2011027712A1/fr

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers

Definitions

  • the present invention relates to a color filter substrate for an organic EL display device, and an organic EL display device, in which an adhesive layer made of a photocurable resin formed between a color filter substrate and an organic EL element substrate is cured by ultraviolet rays.
  • Patent Document 1 it is necessary to increase the amount of ultraviolet rays irradiated to the ultraviolet curable resin approximately 10 times in the red color filter layer and the blue color filter layer. Is concerned. Further, since the green color filter layer is provided with an opening having no color filter layer, there is a concern that the organic EL element is deteriorated by ultraviolet rays.
  • the light generated in the light emitting layer is formed by stacking the substrate, the first electrode on the substrate, the organic layer including at least the light emitting layer, and the second electrode in this order.
  • a color filter comprising: an organic EL element substrate including a plurality of organic EL elements extracted from the side; a translucent substrate; and a plurality of color filter layers formed on the substrate corresponding to the organic EL elements.
  • the color filter substrate used in an organic EL display device comprising: a substrate; and an adhesive layer made of a photocurable resin interposed between and bonded to the organic EL element substrate and the color filter substrate.
  • an ultraviolet light transmitting region that transmits ultraviolet light for curing the photocurable resin is provided in a part of a pixel region that forms the color filter layer.
  • a light scattering layer that exhibits light scattering properties with respect to ultraviolet light is provided on the ultraviolet transmission region and the incident ultraviolet light is scattered, so that a wider area than the ultraviolet transmission region can be obtained. It is possible to cure the photocurable resin. This leads to a reduction in the area of the ultraviolet transmission region formed in the pixel region.
  • the third aspect of the present invention it is possible to irradiate the photocurable resin under the ultraviolet light transmitting region with an ultraviolet ray having an exposure amount necessary for polymerization without significantly increasing the tact time.
  • the ultraviolet light wavelength region is a wavelength region of 440 nm or less.
  • ultraviolet rays can be transmitted without being absorbed by not forming the color filter layer in the ultraviolet transmission region.
  • the color filter layer in the ultraviolet light transmitting region, is made thinner than the region other than the ultraviolet light transmitting region, so that the absorption of ultraviolet rays is suppressed, and the color filter layer in one pixel. It becomes possible to improve the color purity.
  • each color of the organic layer 7 including the light emitting layer of the organic EL element substrate 10 (red light emitting organic layer: 7R, green light emitting organic layer: 7G, The blue light emitting organic layer: 7B) corresponds to each color (red color filter layer: 2R, green color filter layer: 2G, blue color filter layer: 2B) of the color filter layer 14 of the color filter substrate 5, that is, It is preferable that they are fixed to face each other.
  • the combination of the light-emitting layer and the color filter layer is not limited to the above-described ones.
  • the color purity is increased by transmitting wavelengths of 400 nm to 550 nm for blue, 500 nm to 600 nm for green, and 600 nm for red.
  • a method of forming a pattern by repeatedly applying, exposing, and developing a colored photosensitive material in which a dye or pigment is dispersed in a photosensitive resin layer is a common method, particularly recently in terms of durability. There are more color filters in which pigments are dispersed than dyes.
  • the color conversion layer is a layer having a function of emitting visible light having a different wavelength by the fluorescent dye absorbing light in the near ultraviolet region or visible region emitted from the organic light emitting layer. This can emit fluorescence in various wavelength regions depending on the combination of incident light with a fluorescent dye. In addition, for example, by absorbing light emitted in blue and emitting fluorescence in the red region, it is also possible to output light that is stronger than selectively transmitting wavelengths and emitting light in the red region. These are applied to color conversion type organic EL elements.
  • the thickness of the thin film region depends on the ultraviolet transmittance of each color, the thickness depends on each color and the pigment / dye used. Further, it varies depending on the type and concentration of the photocurable resin and the polymerization initiator.
  • the area of the thin film region is preferably the same as that in the first example.
  • the organic layer 7W using a white light emitting material and the color filter layer 14 having the structure of FIG. 1 are combined.
  • the fifth example is a case where the organic layer 7B using the light emitting material in the near ultraviolet light to blue light emitting region and the color conversion layer having the structure of FIG. 1 are combined as shown in FIG.
  • the color filter layer 14 having the structure of FIG. 1 is taken as an example, but the color filter layer 14 having the structure of FIG. 2 or 3 may be used.
  • the configuration of the ultraviolet light transmitting region 15 exemplified in the first to fifth examples may be used alone or in combination.
  • the case where the ultraviolet transmissive region 15 is formed at the boundary position with the black matrix layer 4 is exemplified as the pattern of the ultraviolet transmissive region 15.
  • the pattern of the ultraviolet transmissive region 15 is not particularly limited to this.
  • various patterns as shown in FIGS. 7A and 7B can be exemplified.
  • FIG. 7A shows an example in which the ultraviolet transmissive region 15 is provided at the center of each pixel region X.
  • FIG. 7B shows an example in which the ultraviolet transmissive region 15 is provided so as to cross each pixel region X. It is more preferable from the viewpoint of curing that the ultraviolet light transmitting region 15 is formed at the boundary position with the black matrix layer 4.
  • the arrangement of the ultraviolet transmissive regions 15 is approximately equidistant so that the polymerization reaction spreads efficiently to portions other than the ultraviolet light transmissive region by performing a heating step after the photocurable resin is exposed to ultraviolet rays, and further, It is preferable to set the ultraviolet transmissive region 15 pattern so that the interval is narrowed.
  • the organic EL element substrate 10 includes a driving substrate on which a thin film transistor (TFT) is formed, and a plurality of organic EL elements 30 formed on the driving substrate. .
  • the organic EL element 30 includes a reflective electrode 8 constituting the first electrode from the driving substrate side, an organic layer 7 including at least a light emitting layer formed thereon, and a light transmissive electrode formed thereon. Is provided.
  • the organic EL element 30 takes out the light generated in the light emitting layer from the light transmissive electrode side.
  • the organic layer 7 of each organic EL element 30 is disposed so as to face the corresponding color filter layer 14.
  • an aluminum / lithium alloy or a magnesium / silver alloy having a low work function is formed as thin as about 10 nm.
  • a transparent conductive film made of ITO or the like is formed thereon.
  • the film thickness of the transparent conductive film is preferably about 100 nm, for example, so as to have sufficient in-plane conductivity.
  • the material for the transparent conductive film is preferably an oxide transparent conductive film containing one or more of indium oxide, tin oxide, and zinc oxide.
  • silicon oxide, silicon oxynitride, and silicon nitride are preferable to use, and further, by using a laminated film or a gradient film with a variable film density, a film having both step coverage and barrier properties Become.
  • a resistance heating vapor deposition method As a method for forming the passivation layer 17, a resistance heating vapor deposition method, an electron beam vapor deposition method, a reactive vapor deposition method, an ion plating method, a sputtering method, or a CVD method can be used depending on the material. It is preferable to use the CVD method because the film density and film composition can be easily varied depending on the surface of the step coverage and the film forming conditions.
  • a thermal CVD method As the CVD method, a thermal CVD method, a plasma CVD method, a catalytic CVD method, a VUV-CVD method, or the like can be used.
  • a gas such as N 2 , O 2 , NH 3 , H 2 , N 2 O is added to an organic silicon compound such as monosilane, hexamethyldisilazane (HMDS), or tetraethoxysilane.
  • the film density may be changed by changing the gas flow rate of silane or the like, or the plasma power, if necessary.
  • Hydrogen or carbon may be added to the film by the reactive gas used. It can also be contained.
  • an ultraviolet protection film 18 may be provided between the adhesive layer 11 and the organic layer 7.
  • the ultraviolet prevention film 18 is an ultraviolet prevention layer that suppresses the incidence of ultraviolet light on the organic layer 7.
  • the ultraviolet ray prevention film 18 cuts off ultraviolet rays incident on the organic layer 7 side when the adhesive layer 11 made of a photocurable resin is irradiated with ultraviolet rays through the ultraviolet ray transmitting region 15 to form the adhesive layer 11, thereby Suppresses damage to layer 7. Thereby, deterioration of the characteristics of the organic EL element 30 due to the ultraviolet rays is reduced.
  • An oxide transparent conductive film such as ITO is generally formed by a film formation method such as sputtering, but the absorption spectrum of the film can also be controlled by a film formation process.
  • the ultraviolet ray prevention layer composed of the ultraviolet ray prevention film 18 and the like is configured so that the light transmittance of light in the ultraviolet wavelength region can be 10% or less, preferably 5% or less.
  • the material for forming the light scattering layer 16 include a material having light scattering properties by dispersing particles having a high refractive index, such as titania, in a transparent resin having light transmittance.
  • the transparent resin includes a thermoplastic resin, a thermosetting resin, and a photosensitive resin.
  • a method for manufacturing the color filter substrate 5 used in the organic EL display device will be described.
  • a colored composition in which a pigment is dispersed in a pigment carrier will be described.
  • organic or inorganic pigments can be used alone or in admixture of two or more.
  • the pigment is preferably a pigment having a high color developability and a high heat resistance, particularly a pigment having a high heat decomposition resistance, and an organic pigment is usually used.
  • the specific example of the organic pigment which can be used for a coloring composition is shown with a color index number.
  • the red coloring composition include C.I. I. Pigment Red 7, 14, 41, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 81: 4, 146, 168, 177, 178, 179, 184, 185, Red pigments such as 187, 200, 202, 208, 210, 246, 254, 255, 264, 270, 272, and 279 can be used, and a yellow pigment can also be used in combination.
  • the yellow pigment C.I. I.
  • Examples of the green coloring composition include C.I. I. Pigment Green 7, 10, 36, 37 or the like can be used, and a yellow pigment can be used in combination.
  • the yellow pigment the same pigments as those mentioned for the red coloring composition can be used.
  • Examples of the blue coloring composition include C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, and the like can be used, and a purple pigment can be used in combination.
  • As the purple pigment C.I. I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50 and the like.
  • an inorganic pigment as the pigment, specifically, metals such as yellow lead, zinc yellow, red bean (red iron oxide (III)), cadmium red, ultramarine blue, bitumen, chromium oxide green, cobalt green, etc.
  • metals such as yellow lead, zinc yellow, red bean (red iron oxide (III)), cadmium red, ultramarine blue, bitumen, chromium oxide green, cobalt green, etc.
  • oxide powder such as oxide powder, metal sulfide powder, and metal powder.
  • inorganic pigments are used in combination with organic pigments in order to ensure good coatability, sensitivity, developability and the like while balancing saturation and lightness.
  • the coloring composition can contain a dye within a range that does not reduce heat resistance for color matching.
  • thermoplastic resin examples include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin.
  • thermosetting resin examples include epoxy resins, benzoguanamine resins, rosin-modified maleic acid resins, rosin-modified fumaric acid resins, melamine resins, urea resins, and phenol resins.
  • the photosensitive resin examples include (meth) acrylic compounds having a reactive substituent such as an isocyanate group, an aldehyde group, and an epoxy group on a linear polymer having a reactive substituent such as a hydroxyl group, a carboxyl group, or an amino group, A resin obtained by reacting an acid and introducing a photocrosslinkable group such as a (meth) acryloyl group or a styryl group into the linear polymer is used.
  • a linear polymer containing an acid anhydride such as a styrene-maleic anhydride copolymer or an ⁇ -olefin-maleic anhydride copolymer is converted into a (meth) acrylic compound having a hydroxyl group such as hydroxyalkyl (meth) acrylate.
  • Half-esterified products are also used.
  • Monomers and oligomers that are precursors of transparent resins include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, cyclohexyl (meth) acrylate, polyethylene glycol di (meth) acrylate, pentaerythritol tri (meth) ) Acrylate, trimethylolpropane tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tricyclodecanyl (meth) acrylate, melamine (meth) acrylate, various acrylic esters such as epoxy (meth) acrylate and methacrylic acid Examples thereof include esters, (meth) acrylic acid, styrene, vinyl acetate, (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, acrylonitrile and the like. These can be used alone or in admixture of two or more.
  • a photopolymerization initiator or the like is added to the coloring composition.
  • the photopolymerization initiator include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- Hydroxycyclohexyl phenyl ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane- Acetophenone photopolymerization initiators such as 1-one, benzoin photopolymerization initiators such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzyldi
  • the photopolymerization initiator can be used in an amount of 5 to 200 parts by weight, preferably 10 to 150 parts by weight, based on 100 parts by weight of the pigment in the coloring composition.
  • the above photopolymerization initiators are used alone or in combination of two or more.
  • sensitizers ⁇ -acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone , Camphorquinone, ethylanthraquinone, 4,4′-diethylisophthalophenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 4,4′-diethylaminobenzophenone, etc. It can also be used together.
  • the sensitizer can be contained in an amount of 0.1 to 60 parts by weight with respect to 100 parts by weight of the photopolymerization initiator.
  • the coloring composition can contain a polyfunctional thiol that functions as a chain transfer agent.
  • the polyfunctional thiol can be used in an amount of 0.2 to 150 parts by weight, preferably 0.2 to 100 parts by weight, with respect to 100 parts by weight of the pigment in the coloring composition. Further, in the coloring composition, the pigment is sufficiently dispersed in the pigment carrier and applied to a flat body such as a glass substrate so that the dry film thickness is 0.2 to 5 ⁇ m to form each color display pixel. A solvent can be included for ease.
  • Examples of the solvent include cyclohexanone, ethyl cellosolve acetate, butyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, ethylbenzene, ethylene glycol diethyl ether, xylene, ethyl cellosolve, methyl-n amyl ketone, propylene glycol monomethyl ether, toluene, Examples include methyl ethyl ketone, ethyl acetate, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, petroleum solvent, and the like. These may be used alone or in combination.
  • the solvent can be used in an amount of 800 to 4000 parts by weight, preferably 1000 to 2500 parts by weight, with respect to 100 parts by weight of the pigment in the coloring composition.
  • the coloring composition comprises one or more pigments, if necessary, together with the above photopolymerization initiator, in a pigment carrier and an organic solvent, such as a three roll mill, a two roll mill, a sand mill, a kneader, and an attritor. It can be produced by finely dispersing using a dispersing means.
  • the coloring composition containing 2 or more types of pigments can also be manufactured by mixing each pigment separately finely dispersed in a pigment carrier and an organic solvent.
  • a dispersion aid such as a resin-type pigment dispersant, a surfactant, or a pigment derivative can be appropriately contained. Since the dispersion aid is excellent in pigment dispersion and has a great effect of preventing re-aggregation of the pigment after dispersion, a coloring composition comprising a pigment dispersed in a pigment carrier and an organic solvent using a dispersion aid is used. If so, a color filter excellent in transparency can be obtained.
  • the dispersing aid can be used in an amount of 0.1 to 40 parts by weight, preferably 0.1 to 30 parts by weight, with respect to 100 parts by weight of the pigment in the coloring composition.
  • the resin-type pigment dispersant has a pigment-affinity part that has the property of adsorbing to the pigment and a part that is compatible with the pigment carrier, and adsorbs to the pigment to stabilize the dispersion of the pigment on the pigment carrier. It works.
  • resin-type pigment dispersants include polycarboxylic acid esters such as polyurethane and polyacrylate, unsaturated polyamides, polycarboxylic acids, polycarboxylic acid (partial) amine salts, polycarboxylic acid ammonium salts, and polycarboxylic acid alkylamines.
  • Salts polysiloxanes, long-chain polyaminoamide phosphates, hydroxyl group-containing polycarboxylic acid esters, their modified products, amides formed by the reaction of poly (lower alkyleneimines) with polyesters having free carboxyl groups, and the like
  • Oil-based dispersants such as salts, water-soluble such as (meth) acrylic acid-styrene copolymers, (meth) acrylic acid- (meth) acrylic ester copolymers, styrene-maleic acid copolymers, polyvinyl alcohol, polyvinylpyrrolidone Resin, water-soluble polymer, polyester Modified polyacrylate, ethylene oxide / propylene oxide addition compound, phosphate ester-based and the like are used, they can be used alone or in admixture of two or more.
  • Surfactants include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzenesulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkylnaphthalenesulfonate, sodium alkyldiphenyletherdisulfonate, lauryl sulfate monoethanolamine, lauryl Anionic surfactants such as triethanolamine sulfate, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate; Polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene Nonionic surfactants such as alkyl ether phosphates, polyoxyethylene sorbitan monostearate and polyethylene glycol monolau
  • the coloring composition may contain an adhesion improving agent such as a silane coupling agent in order to improve the adhesion to the substrate.
  • silane coupling agents include vinyl silanes such as vinyltris ( ⁇ -methoxyethoxy) silane, vinylethoxysilane, vinyltrimethoxysilane, (meth) acrylsilanes such as ⁇ -methacryloxypropyltrimethoxysilane, ⁇ - (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) methyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltriethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ) Epoxysilanes such as methyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane,
  • the silane coupling agent can be contained in an amount of 0.01 to 100 parts by weight with respect to 100 parts by weight of the pigment in the coloring composition.
  • the coloring composition can be prepared in the form of gravure offset printing ink, waterless offset printing ink, silk screen printing ink, ink jet printing ink, solvent development type or alkali development type colored resist.
  • the colored resist is obtained by dispersing a dye in a composition containing a thermoplastic resin, a thermosetting resin or a photosensitive resin, a monomer, a photopolymerization initiator, and an organic solvent.
  • the pigment is preferably contained in a proportion of 5 to 70% by weight based on the total solid content of the coloring composition (100% by weight). More preferably, it is contained in a proportion of 20 to 50% by weight, and the remainder consists essentially of a resinous binder provided by a pigment carrier.
  • the colored composition is removed by means of centrifugal separation, sintering filter, membrane filter, etc. to remove coarse particles of 5 ⁇ m or more, preferably coarse particles of 1 ⁇ m or more, more preferably 0.5 ⁇ m or more and coarse particles It is preferable to carry out.
  • the color filter layer 14 is a color conversion layer
  • a color conversion layer in which a fluorescent dye that performs color conversion is dispersed in the pigment carrier can be used.
  • fluorescent dyes that absorb light in the blue to blue-green region and emit fluorescence in the green region include 3- (2′-benzothiazolyl) -7-diethylamino-coumarin (coumarin 6) and 3- (2′-benzimidazolyl).
  • fluorescent dyes that absorb light in the blue to blue-green region and emit fluorescence in the red region include rhodamine B, rhodamine 6G, rhodamine 3B, rhodamine 101, rhodamine 110, sulforhodamine, basic violet 11, and basic red.
  • Rhodamine dyes such as 2; cyanine dyes; pyridine dyes such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridinium perchlorate (pyridine 1); or oxazine System dyes and the like.
  • Examples of a method for forming the color filter layer material by patterning on the substrate 1 which is a flat body include various pattern forming methods such as a printing method and a photolithography method.
  • a glass plate such as soda lime glass, low alkali borosilicate glass, non-alkali aluminoborosilicate glass, or a resin plate such as polycarbonate, polymethyl methacrylate, polyethylene terephthalate, or the like is used.
  • each color display pixel (color filter layer 14) by the printing method can be patterned simply by repeating the printing and drying of the colored composition prepared as the above various printing inks. Low cost and excellent mass productivity. Furthermore, it is possible to print a fine pattern having high dimensional accuracy and smoothness by the development of printing technology. In order to perform printing, it is preferable that the ink does not dry and solidify on the printing plate or on the blanket. Control of ink fluidity on a printing press is also important, and ink viscosity can be adjusted with a dispersant or extender pigment.
  • the dried film is exposed to ultraviolet rays through a mask having a predetermined pattern provided in contact or non-contact with the film. Then, after immersing in a solvent or an alkaline developer or spraying the developer by spraying or the like to remove the uncured portion to form a desired pattern, the same operation is repeated for other colors to produce a color filter. be able to. Furthermore, in order to accelerate the polymerization of the colored resist, heating can be performed as necessary. According to the photolithography method, the color filter substrate 5 with higher accuracy than the printing method can be manufactured.
  • an aqueous solution such as sodium carbonate or sodium hydroxide is used as an alkali developer, and an organic alkali such as dimethylbenzylamine or triethanolamine can also be used.
  • an antifoamer and surfactant can also be added to a developing solution.
  • a development processing method a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.
  • a water-soluble or alkaline water-soluble resin such as polyvinyl alcohol or a water-soluble acrylic resin is applied and dried to form a film that prevents polymerization inhibition by oxygen. Thereafter, ultraviolet exposure can also be performed.
  • Method for forming ultraviolet transmissive region As a method for forming the ultraviolet transmissive region 15, when the ultraviolet transmissive region 15 is an opening as shown in FIG. 1 (first example), a pattern forming method such as a printing method or a photolithography method is used. The color filter layer 14 may be patterned in a portion other than the ultraviolet light transmitting region 15.
  • the ultraviolet transmissive region 15 is a thin color filter layer 14 as shown in FIG. 2 (second example)
  • the colored composition formed on the substrate 1 is exposed to ultraviolet rays through a mask.
  • the uncured portion of the ultraviolet transmission region 15 is removed in the subsequent development process to reduce the film thickness.
  • the method to do is simple.
  • a method of performing a plurality of exposures using a plurality of photomasks a method of using a halftone mask having a plurality of regions having different light transmittances , A method using a gray-tone mask having a plurality of regions composed of portions having slits less than the resolution of the exposure machine, a method using a wavelength limiting mask having a plurality of regions having different light transmission wavelengths, and a light beam such as an electron beam
  • a method of drawing by scanning or a combination thereof is conceivable, but is not limited thereto.
  • the ultraviolet transmissive region 15 is formed using a material having good ultraviolet transmissive properties as shown in FIG. 3 (third example)
  • a pattern is formed in each region by a pattern forming method such as a printing method or a photolithography method. It may be formed.
  • the material for forming the light scattering layer 16 As the material for forming the light scattering layer 16, as described above, for example, a material having light scattering properties by dispersing particles having a high refractive index such as titania in a transparent resin having light transmittance. .
  • the transparent resin includes a thermoplastic resin, a thermosetting resin, and a photosensitive resin.
  • the light scattering layer 16 is formed by patterning only on the ultraviolet transmissive region 15 as shown in FIG. 9A by, for example, a printing method or a photolithography method, or formed on the entire surface of the pixel as shown in FIG. 9B.
  • the organic EL element substrate 10 uses a driving substrate on which a thin film transistor (TFT) is formed.
  • TFT thin film transistor
  • a known thin film transistor can be used as the thin film transistor.
  • a thin film transistor mainly including an active layer in which a source / drain region and a channel region are formed, a gate insulating film, and a gate electrode can be given.
  • the structure of the thin film transistor is not particularly limited, and examples thereof include a staggered type, an inverted staggered type, a bottom gate type, a top gate type, and a coplanar type.
  • the thin film transistor is connected so as to function as a switching element of the organic EL element, and the drain electrode of the transistor and the reflective electrode 8 of the organic EL element 30 are electrically connected.
  • the reflective electrode 8 may be partitioned by a partition wall (not shown).
  • the partition wall is formed so as to partition a light emitting region corresponding to the pixel.
  • an active matrix drive type display device has a reflective electrode 8 formed for each pixel, and each pixel tries to occupy as large an area as possible, and is formed so as to cover an end of the reflective electrode 8.
  • the most preferable shape of the partition is basically a lattice shape.
  • Examples of the method for forming the partition include a method in which an inorganic film is uniformly formed and masked with a resist and then dry etching, and a method in which a photosensitive resin is stacked and a predetermined pattern is formed by a photolithography method. If necessary, a water repellent can be added, or plasma or UV can be irradiated to impart liquid repellency to the ink after formation.
  • a preferable height of the partition wall is 0.1 ⁇ m or more and 10 ⁇ m or less, and more preferably 0.5 ⁇ m or more and 2 ⁇ m or less. If the height of the partition wall exceeds 10 ⁇ m, the formation and sealing of the counter electrode is hindered. If the height of the partition wall is less than 0.1 ⁇ m, the end of the reflective electrode 8 cannot be covered, or the adjacent pixel is short-circuited when the light emitting medium layer is formed. This is because there is a risk of color mixing.
  • the reflective electrode 8 is made of a material that reflects light from the light emitting layer, such as Ag or Al.
  • an ITO film may be laminated on a metal material such as Ag or Al.
  • the optimum value of the thickness of the reflective electrode 8 varies depending on the element configuration of the organic EL display, it is not less than 100 mm and not more than 10,000 mm, more preferably not more than 3000 mm, regardless of single layer or stacked layers.
  • a dry film forming method such as a resistance heating vapor deposition method, an electron beam vapor deposition method, a reactive vapor deposition method, an ion plating method, a sputtering method, a gravure printing method, or a screen printing method is used.
  • a wet film-forming method such as a method or a combination of these can be used.
  • the organic layer 7 can be formed of a single layer film or a multilayer film containing at least a light emitting substance.
  • Examples of the configuration in the case of forming a multilayer film include a hole transport layer, an electron transporting light emitting layer or a hole transporting light emitting layer, a two-layer structure comprising an electron transport layer, a hole transport layer, a light emitting layer, and an electron transport layer.
  • hole transport materials include metal phthalocyanines such as copper phthalocyanine and tetra (t-butyl) copper phthalocyanine, and metal-free phthalocyanines, quinacridone compounds, 1,1-bis (4-di-p-tolylaminophenyl) Cyclohexane, N, N′-diphenyl-N, N′-bis (3-methylphenyl) -1,1′-biphenyl-4,4′-diamine, N, N′-di (1-naphthyl) -N, Aromatic amine low molecular hole injection and transport materials such as N′-diphenyl-1,1′-biphenyl-4,4′-diamine, polyaniline, polythiophene, polyvinylcarbazole, poly (3,4-ethylenedioxythiophene) ) and polymer hole transport materials such as a mixture of polystyrene sulfonic acid, polythiophene oligo
  • an interlayer layer is preferably formed on the hole transport material.
  • materials used for the interlayer layer include polymers containing aromatic amines such as polyvinyl carbazole or derivatives thereof, polyarylene derivatives having aromatic amines in the side chain or main chain, arylamine derivatives, and triphenyldiamine derivatives. . These materials can be dissolved or dispersed in a solvent and formed using various coating methods such as spin coating or letterpress printing.
  • Examples of the light emitting material include 9,10-diarylanthracene derivatives, pyrene, coronene, perylene, rubrene, 1,1,4,4-tetraphenylbutadiene, tris (8-quinolinolato) aluminum complex, tris (4-methyl-8- Quinolinolato) aluminum complex, bis (8-quinolinolato) zinc complex, tris (4-methyl-5-trifluoromethyl-8-quinolinolato) aluminum complex, tris (4-methyl-5-cyano-8-quinolinolato) aluminum complex, Bis (2-methyl-5-trifluoromethyl-8-quinolinolato) [4- (4-cyanophenyl) phenolate] aluminum complex, bis (2-methyl-5-cyano-8-quinolinolato) [4- (4- Cyanophenyl) phenolate] aluminum complex, tri (8-quinolinolato) scandium complex, bis [8- (para-tosyl) aminoquinoline] zinc complex and cadmi
  • polymer materials such as polyfluorene, polyparaphenylene vinylene, polythiophene, and polyspiro, materials obtained by dispersing or copolymerizing the low molecular materials in these polymer materials, and other existing fluorescent light emitting materials and phosphorescent light emitting materials are used. be able to.
  • the light emitting material when the color filter layer 14 is a color conversion layer it is preferable to use a material that emits light having a wavelength from near ultraviolet light to a blue light emitting region.
  • the change in color purity with time and the life of the organic layer 7 are uniform. There is no need to consider the aging and life of each color.
  • electron transport materials examples include 2- (4-biphenylyl) -5- (4-tert-butylphenyl) -1,3,4-oxadiazole, 2,5-bis (1-naphthyl) -1 3,4-oxadiazole, oxadiazole derivatives, bis (10-hydroxybenzo [h] quinolinolato) beryllium complexes, triazole compounds, and the like can be used.
  • these electron transport materials may be used as an electron injection layer by doping a small amount of alkali metal or alkaline earth metal having a low work function such as sodium, barium, or lithium.
  • the film thickness of the organic layer 7 is 1000 nm or less, preferably about 50 to 200 nm, even when formed by a single layer or a stacked layer.
  • the organic layer 7 can be formed by vacuum deposition, various coating methods such as slit coating, spin coating, spray coating, nozzle coating, flexographic printing, gravure printing, micro gravure printing, intaglio offset printing, A printing method, an inkjet method, or the like can be used.
  • the light transmissive electrode 6 a material having a high electron injection efficiency into the organic light emitting medium layer 15, a low work function, and a light transmissive material is used. Specifically, a single metal such as Mg, Al, Yb is used, or a compound such as Ba, Ca, Li, its oxide, or fluoride is sandwiched by about 1 nm at the interface in contact with the light emitting medium. High Al and Cu can be laminated and used. Alternatively, in order to achieve both electron injection efficiency and stability, one or more metals such as Li, Mg, Ca, Sr, La, Ce, Er, Eu, Sc, Y, and Yb having a low work function and stable Ag, Al An alloy system with a metal element such as Cu or Cu may be used.
  • a single metal such as Mg, Al, Yb is used, or a compound such as Ba, Ca, Li, its oxide, or fluoride is sandwiched by about 1 nm at the interface in contact with the light emitting medium.
  • alloys such as MgAg, AlLi, and CuLi can be used.
  • transparent metal composite oxides such as ITO (indium tin composite oxide), indium zinc composite oxide, and zinc aluminum composite oxide may be laminated.
  • the organic light emitting medium layer 15 may be laminated with a metal oxide such as ITO by doping a small amount of a metal such as Li or Ca having a low work function.
  • a resistance heating vapor deposition method, an electron beam vapor deposition method, a reactive vapor deposition method, an ion plating method, or a sputtering method can be used depending on the material.
  • the thickness of the light transmissive electrode 6 is preferably about 0.1 to 10 nm when a metal material such as Ca or Li is used. If the thickness is less than 0.1 nm, there may be a portion that is not formed depending on the film forming method or the surface state of the organic layer.
  • a sealing layer is applied on the outer periphery of the color filter substrate 5 by a dispenser device, and a filler made of a photo-curing resin is dropped inside the sealing layer.
  • the inside of the vacuum chamber is sealed and the exhaust valve is opened to reduce the pressure in the chamber to about 1 to 10 Pa. .
  • the exhaust valve is opened to reduce the pressure in the chamber to about 1 to 10 Pa.
  • one of the holders is lowered, the holders are overlapped with each other, are aligned again, and are bonded together. After bonding, the chamber is returned to atmospheric pressure and taken out.
  • the sealing layer is formed of an adhesive such as a thermosetting type or an ultraviolet curable type, and may contain glass beads, silica beads, or the like. These beads define the distance between the substrates 5 and 10 when the color filter substrate 5 and the organic EL element substrate 10 are bonded together.
  • spherical spacers such as glass beads and silica beads may be dispersed between the substrates. It is also possible to use a columnar spacer such as an acrylic resin provided on the color filter substrate 5 by a photolithography method or the like.
  • the organic EL element substrate 10 of the present embodiment forms a thin film transistor in each pixel region X on the glass substrate 9.
  • a reflective electrode 8 made of silver is formed as an anode, and ITO is formed thereon.
  • an insulating layer was formed using a photoresist material between the pixels so as to cover the end of the pixel line.
  • a PEDOT: PSS 1.5 wt aqueous solution was formed as a hole transport layer by spin coating so as to have a film thickness of 40 nm.
  • substrate 9 was fixed to the sheet-fed type letterpress printing apparatus, and the organic luminescent ink of each color was printed.
  • the organic light emitting layer was printed so that the red organic light emitting layer, the green organic light emitting layer, and the blue organic light emitting layer were arranged in a stripe pattern. After printing for each color, drying was performed at 130 ° C. for 1 hour in an oven. After drying, calcium is deposited to a thickness of 4 nm as a first cathode having a low work function so that electrons can be efficiently injected onto the organic light emitting layer formed by printing. As the cathode, aluminum was deposited to a thickness of 2 nm. Here, aluminum has a role to prevent calcium as the first cathode from being chemically altered when the transparent electrode 6 formed thereon is formed by sputtering.
  • a transparent conductive film was formed on the cathode by a sputtering method.
  • ITO was used as the transparent conductive film, and the average transmittance in the wavelength range of 300 nm to 400 nm was controlled to 5% according to the film forming conditions so as to fulfill the function of the ultraviolet ray preventing layer.
  • a passivation film 17 was formed by depositing 200 nm of silicon nitride on the transparent conductive film by a CVD method.
  • the substrate was spray-developed using a sodium carbonate aqueous solution at 23 ° C., washed with ion-exchanged water, and air-dried. Further, baking was performed at 230 ° C. for 30 minutes in a clean oven to form a red color filter layer 14 on the substrate.
  • the green color filter layer 14 was similarly formed using the green color composition, and the blue color filter layer 14 was further formed using the blue color composition.
  • the thickness of the black matrix layer was 1.0 ⁇ m
  • the thickness of each color filter layer 14 was 2.0 ⁇ m.
  • a sealing layer is applied on the outer periphery of the color filter substrate 5 by a dispenser device, and a filler is dropped inside the sealing layer. Then, bonding was performed in a vacuum chamber. The ultimate pressure in the chamber at this time was 1 Pa. Next, the bonded substrate was taken out of the chamber and exposed to ultraviolet rays. A metal halide lamp was used as the light source of the ultraviolet exposure machine, the illuminance at a wavelength of 365 nm was 100 mW / cm 2, and the exposure amount was 6000 mJ / cm 2. Further, baking was performed at 80 ° C. for 60 minutes in a clean oven to bond the substrates together. At this time, the distance between the color filter substrate 5 and the organic EL element substrate 10 was 6.0 ⁇ m.
  • the organic EL display device was left in a constant temperature and humidity chamber at a temperature of 60 ° C. and a humidity of 90%, and deterioration of pixel emission was observed. According to this observation, since no deterioration was observed until 1500 hours, it was found that the sealing performance as a display was satisfied. In addition, when the organic EL light emission efficiency before and after performing ultraviolet exposure to the filler was measured, no decrease in the light emission efficiency value was observed, indicating that damage to the organic EL due to ultraviolet light was suppressed. It was.
  • SYMBOLS 1 Transparent substrate, 2R ... Red color filter layer, 2G ... Green color filter layer, 2B ... Blue color filter layer, 2R '... Red conversion layer, 2G' ... Green conversion layer, 2B '... Blue conversion layer, 3 ... Opening Part (ultraviolet ray transmission region), 4 ... black matrix layer, 5 ... color filter substrate, 6 ... light transmitting electrode, 7 ... organic layer, 7R ... red light emitting organic layer, 7G ... green light emitting organic layer, 7B ... blue light emitting organic Layer, 7W ... white light emitting organic layer, 8 ... reflective electrode, 9 ... substrate, 10 ... organic EL element substrate, 11 ... photocurable resin, 12 ...
  • color filter thin film part (ultraviolet ray transmission region), 13 ... color filter Dissimilar materials (ultraviolet transmission region), 14 ... color filter layer, 15 ... ultraviolet transmission region, 16 ... light scattering layer, 17 ... passivation layer, 18 ... ultraviolet prevention layer, 19 ... light transmissive electrode / ultraviolet prevention Use layer, 30 ... organic EL element

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

La présente invention se rapporte à un substrat de filtre de couleur (5) pour un dispositif d'affichage électroluminescent organique, ledit substrat de filtre de couleur permettant un durcissement satisfaisant d'une résine photodurcissable formée entre un filtre de couleur et un dispositif d'affichage électroluminescent organique lors de l'irradiation avec un rayonnement ultraviolet ; et à un dispositif d'affichage électroluminescent organique. De façon précise, la présente invention concerne un dispositif d'affichage électroluminescent organique, un substrat d'élément électroluminescent organique (10) qui comprend des éléments électroluminescents organiques (30) formés dans ce dernier, et un substrat de filtre de couleur (5) dans lequel sont formées de multiples couches de filtre de couleur (14), étant collés l'un à l'autre au moyen d'une couche adhésive (11) comprenant une résine photodurcissable. Les multiples couches de filtre de couleur (14) sont disposées de sorte à correspondre aux éléments électroluminescents organiques (30). Sur une partie des régions de pixel qui forment les couches de filtre de couleur (14), on dispose une région pouvant transmettre un rayonnement ultraviolet (15), au moyen de laquelle un rayonnement ultraviolet peut être transmis pour faire durcir la résine photodurcissable.
PCT/JP2010/064515 2009-09-07 2010-08-26 Dispositif d'affichage électroluminescent organique, substrat de filtre de couleur et procédé de fabrication du dispositif d'affichage électroluminescent organique WO2011027712A1 (fr)

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JP2014207159A (ja) * 2013-04-15 2014-10-30 株式会社半導体エネルギー研究所 発光装置
CN104282718A (zh) * 2013-07-10 2015-01-14 三星显示有限公司 有机发光显示装置
KR20180025535A (ko) * 2016-09-01 2018-03-09 엘지디스플레이 주식회사 유기발광 표시장치
EP3442023A1 (fr) * 2017-08-08 2019-02-13 Samsung Display Co., Ltd. Élément de conversion de couleurs et dispositif d'affichage le comprenant
CN110350111A (zh) * 2019-07-12 2019-10-18 昆山梦显电子科技有限公司 高分辨率Micro-OLED的制备方法以及显示模组
TWI685702B (zh) * 2018-06-22 2020-02-21 友達光電股份有限公司 顯示裝置
TWI695994B (zh) * 2018-10-19 2020-06-11 采鈺科技股份有限公司 光學元件
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CN103682058A (zh) * 2012-09-21 2014-03-26 索尼公司 基板、显示面板和显示装置
JP2014063033A (ja) * 2012-09-21 2014-04-10 Sony Corp 基板、表示パネルおよび表示装置
JP2014207159A (ja) * 2013-04-15 2014-10-30 株式会社半導体エネルギー研究所 発光装置
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KR102122380B1 (ko) * 2013-07-10 2020-06-15 삼성디스플레이 주식회사 유기 발광 표시 장치
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US11793398B2 (en) 2016-05-30 2023-10-24 Leica Instruments (Singapore) Pte. Ltd. Medical device for the observation of a partly fluorescent object, using a filter system with a transmission window
US11517188B2 (en) 2016-05-30 2022-12-06 Leica Instruments (Singapore) Pte. Ltd. Medical device for the observation of a partly fluorescent object, using a filter system with a transmission window
KR20180025535A (ko) * 2016-09-01 2018-03-09 엘지디스플레이 주식회사 유기발광 표시장치
KR102520499B1 (ko) 2016-09-01 2023-04-10 엘지디스플레이 주식회사 유기발광 표시장치
US10942389B2 (en) 2017-08-08 2021-03-09 Samsung Display Co., Ltd. Color conversion element and display device including the same
US10466530B2 (en) 2017-08-08 2019-11-05 Samsung Display Co., Ltd. Color conversion element and display device including the same
EP3442023A1 (fr) * 2017-08-08 2019-02-13 Samsung Display Co., Ltd. Élément de conversion de couleurs et dispositif d'affichage le comprenant
EP3706183A4 (fr) * 2017-11-01 2021-08-18 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Procédé d'encapsulation d'oled et structure d'encapsulation d'oled
TWI685702B (zh) * 2018-06-22 2020-02-21 友達光電股份有限公司 顯示裝置
TWI695994B (zh) * 2018-10-19 2020-06-11 采鈺科技股份有限公司 光學元件
US11675115B2 (en) 2018-10-19 2023-06-13 Visera Technologies Company Limited Optical devices
CN110350111A (zh) * 2019-07-12 2019-10-18 昆山梦显电子科技有限公司 高分辨率Micro-OLED的制备方法以及显示模组

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