WO2010058930A3 - 전자 맴돌이 공명 이온원 장치 및 그의 제조방법 - Google Patents

전자 맴돌이 공명 이온원 장치 및 그의 제조방법 Download PDF

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Publication number
WO2010058930A3
WO2010058930A3 PCT/KR2009/006707 KR2009006707W WO2010058930A3 WO 2010058930 A3 WO2010058930 A3 WO 2010058930A3 KR 2009006707 W KR2009006707 W KR 2009006707W WO 2010058930 A3 WO2010058930 A3 WO 2010058930A3
Authority
WO
WIPO (PCT)
Prior art keywords
magnet
cyclotron resonance
electron cyclotron
unit
ion source
Prior art date
Application number
PCT/KR2009/006707
Other languages
English (en)
French (fr)
Other versions
WO2010058930A2 (ko
Inventor
원미숙
이병섭
김종필
윤장희
배종성
방정규
이효상
박진용
Original Assignee
한국기초과학지원연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국기초과학지원연구원 filed Critical 한국기초과학지원연구원
Priority to EP09827695.9A priority Critical patent/EP2357658A4/en
Priority to US13/000,501 priority patent/US8461763B2/en
Publication of WO2010058930A2 publication Critical patent/WO2010058930A2/ko
Publication of WO2010058930A3 publication Critical patent/WO2010058930A3/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/06—Coil winding
    • H01F41/098—Mandrels; Formers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F7/20—Electromagnets; Actuators including electromagnets without armatures
    • H01F7/202—Electromagnets for high magnetic field strength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00—Coils
    • H01F5/02—Coils wound on non-magnetic supports, e.g. formers
    • H01F2005/022—Coils wound on non-magnetic supports, e.g. formers wound on formers with several winding chambers separated by flanges, e.g. for high voltage applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/0817—Microwaves

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

전자 맴돌이 공명 이온원 장치는, 자기장을 발생하는 자석을 포함하는 자석부; 플라즈마와 전자 맴돌이 공명으로 이온을 생성하는 이온화 챔버하우징부; 이온 생성을 위하여 상기 이온화 챔버하우징부에 마이크로파를 주입하는 마이크로파 발생부; 생성된 이온을 처리하는 빔 집적 및 가이드 장치부를 포함할 수 있다. 상기 자석부는, 회전체이고 자석부를 구성하기 위한 권취의 중심이 되는 권틀; 상기 권틀을 복수 개의 구역으로 나누는 가변형 스페이서; 및 상기 가변형 스페이서에 의해 형성된 상기 복수 개의 구역에 선재 또는 테이프로 권취되는 자석을 포함할 수 있다.
PCT/KR2009/006707 2008-11-20 2009-11-16 전자 맴돌이 공명 이온원 장치 및 그의 제조방법 WO2010058930A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP09827695.9A EP2357658A4 (en) 2008-11-20 2009-11-16 CYCLOTRONIC ELECTRONIC RESONANCE ION SOURCE APPARATUS AND METHOD FOR MANUFACTURING THE SAME
US13/000,501 US8461763B2 (en) 2008-11-20 2009-11-16 Electron cyclotron ion source and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080115897A KR100927995B1 (ko) 2008-11-20 2008-11-20 전자 맴돌이 공명 이온원 장치 및 그의 제조방법
KR10-2008-0115897 2008-11-20

Publications (2)

Publication Number Publication Date
WO2010058930A2 WO2010058930A2 (ko) 2010-05-27
WO2010058930A3 true WO2010058930A3 (ko) 2010-08-05

Family

ID=41605299

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/006707 WO2010058930A2 (ko) 2008-11-20 2009-11-16 전자 맴돌이 공명 이온원 장치 및 그의 제조방법

Country Status (4)

Country Link
US (1) US8461763B2 (ko)
EP (1) EP2357658A4 (ko)
KR (1) KR100927995B1 (ko)
WO (1) WO2010058930A2 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101044698B1 (ko) 2009-12-01 2011-06-28 한국기초과학지원연구원 전자 맴돌이 공명 이온원 장치를 이용한 엑스선 발생 장치 및 방법
KR101088110B1 (ko) 2010-08-30 2011-12-02 한국수력원자력 주식회사 다가 이온빔 인출을 위한 강자장 ｅｃｒ 이온원 시스템
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
KR101311468B1 (ko) * 2011-11-25 2013-09-25 한국기초과학지원연구원 전자 맴돌이 공명 이온원 장치용 자석 및 이의 제조 방법
US9275833B2 (en) * 2012-02-03 2016-03-01 Seagate Technology Llc Methods of forming layers
US20130307437A1 (en) * 2012-05-17 2013-11-21 Mark Edward Morehouse Energy Density Intensifier for Accelerating, Compressing and Trapping Charged Particles in a Solenoid Magnetic Field
US9928988B2 (en) 2013-03-13 2018-03-27 Varian Semiconductor Equipment Associates, Inc. Ion source
CN104320904B (zh) * 2014-10-21 2018-12-04 明建川 微波电子加速器
JP6470124B2 (ja) * 2015-06-19 2019-02-13 株式会社東芝 粒子線ビームの制御電磁石及びこれを備えた照射治療装置
JP6653066B2 (ja) * 2017-05-23 2020-02-26 日新イオン機器株式会社 プラズマ源
US10522315B2 (en) * 2017-09-08 2019-12-31 Schlumberger Technology Corporation Compact multi antenna based ion sources
CN114360842B (zh) * 2021-12-28 2022-11-22 中国人民解放军海军工程大学 一种应用于高功率微波源的轻型化周期性磁场线圈

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JPH05106501A (ja) * 1991-10-17 1993-04-27 Suzuki Motor Corp 吸気圧力検出センサーの取付装置
JPH05315097A (ja) * 1992-05-11 1993-11-26 Nippon Steel Corp プラズマ処理装置
JPH06124674A (ja) * 1992-10-09 1994-05-06 Nissin Electric Co Ltd Ｅｃｒ型イオン源

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US4952273A (en) * 1988-09-21 1990-08-28 Microscience, Inc. Plasma generation in electron cyclotron resonance
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JPH05106501A (ja) * 1991-10-17 1993-04-27 Suzuki Motor Corp 吸気圧力検出センサーの取付装置
JPH05315097A (ja) * 1992-05-11 1993-11-26 Nippon Steel Corp プラズマ処理装置
JPH06124674A (ja) * 1992-10-09 1994-05-06 Nissin Electric Co Ltd Ｅｃｒ型イオン源

Also Published As

Publication number Publication date
EP2357658A4 (en) 2013-04-10
KR100927995B1 (ko) 2009-11-24
EP2357658A2 (en) 2011-08-17
US8461763B2 (en) 2013-06-11
WO2010058930A2 (ko) 2010-05-27
US20110140641A1 (en) 2011-06-16

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