Classifications

• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
  • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
  • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
  • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
  • C08G65/4012—Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
  • C01D7/00—Carbonates of sodium, potassium or alkali metals in general
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C315/00—Preparation of sulfones; Preparation of sulfoxides
  • C07C315/06—Separation; Purification; Stabilisation; Use of additives
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
  • C07C45/78—Separation; Purification; Stabilisation; Use of additives
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
  • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
  • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
  • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
  • C08G65/4087—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group characterised by the catalyst used
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
  • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
  • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
  • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
  • C08G65/4093—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group characterised by the process or apparatus used
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
  • C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
  • C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
  • C08G2261/34—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
  • C08G2261/344—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing heteroatoms
  • C08G2261/3444—Polyethersulfones
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
  • C08G75/20—Polysulfones
  • C08G75/23—Polyethersulfones

Definitions

• This invention relates to highly pure diphenyl sulfone, process for the production of such high purity solvent and its use in a method for the preparation of improved poly(aryl ether ketone) polymers by aromatic nucleophilic substitution.
• Poly(aryl ether ketone) polymers i.e., PAEK polymers
• PAEK polymers are a well known class of engineering polymers useful in various fields of endeavor whose structures combine both ether and ketone groups.
• PEK poly(etherketone)
• PAEK poly(etherketone)
• PEK and PEEK are high-strength, radiation-resistant engineering plastics, thermally stable and highly resistant to chemicals.
• PAEK polymers are prepared by aromatic nucleophilic substitution.
• a bisphenol can be used as a nucleophilic component which is deprotonated with a base such as NaOH, Na 2 CO 3 or K 2 CO 3 .
• the resultant bisphenolate may then react with a bishalogenated monomer, e.g., a dihalobenzophenone such as difluorobenzophenone to form PEEK via nucleophilic substitution, with the halogen atoms of the dihalobenzophenone acting as leaving groups.
• a bishalogenated monomer e.g., a dihalobenzophenone such as difluorobenzophenone
• fluorine is the preferred halogen.
• Examples of fluorinated monomers are represented by structures 1 to 6 (4,4 '-difluorobenzophenone (1), l,4-bis(4'-fluorobenzoyl)benzene (2), 1,3- bis(4'-fluorobenzoyl)benzene (3), etc).
• PAEK reactions are carried out in a solvent that is, or that contains, diphenyl sulfone (DPS).
• DPS diphenyl sulfone
• DPS diphenyl sulfone
• DPS new or unused DPS
• DPS not previously used in a PAEK reaction or in any other process or application, e.g., commercially available DPS
• VGS new or unused DPS
• the present invention is thus related to highly pure DPS.
• the present invention is also related to a method for the production of such high purity solvent.
• the present invention concerns a method for isolating a solid diphenyl sulfone from a diphenyl sulfone solution obtained in the preparation of a poly(aryletherketone), wherein the diphenyl sulfone solubility in said solution is lowered at a level of at or below 1.5 wt.
• the isolated solid diphenyl sulfone is preferably the diphenyl sulfone used in the method for the preparation of a poly(aryletherketone) (PAEK) as detailed hereinafter.
• Another aspect of the present invention is related to a method for the preparation of a poly(aryletherketone) in a solvent comprising such highly pure DPS.
• the present invention concerns a method for the preparation of a poly(aryletherketone) by aromatic nucleophilic substitution in a solvent comprising a diphenyl sulfone, wherein said diphenyl sulfone meets at least one of the following impurity limitations :
• ppm and wt. % are based on the total weight of the diphenyl sulfone and area % represents the ratio of the GC peak area of the impurity of concern over the total area of all GC peaks of the diphenyl sulfone.
• the diphenyl sulfone may comprise therein more than 0.03 area % of one or more oligo(aryl ether ketone) impurities, where area % represents the ratio of the LC peak area of the impurity of concern over the total area of all LC peaks of the diphenyl sulfone.
• the diphenyl sulfone may also comprise at least one fluorinated monomer, such as a fluorinated monomer selected from the group consisting of :
• the diphenyl sulfone meets preferably the impurity limitations for monomethyldiphenylsulfone, monochlorodiphenylsulfone, and residual acidity.
• the diphenyl sulfone meets also preferably the impurity limitations for sodium, iron, diphenyl sulfide, and APHA of 20 wt. % solution in acetone at 25 0 C. Very preferably, it meets further the impurity limitation for potassium.
• the diphenyl sulfone meets further the following impurity limitation :
• the so-prepared poly(aryletherketone) is preferably a poly(ether ether ketone).
• 370 0 C into a 2.5 mm thick compression molded plaque has preferably the following L*, a*, b* values measured under a D65 light source at a 10° angle : L * > 90 -17 * ( ⁇ mt ), a* is between -1 and +3 b* is between +5 and +20.
• Still another aspect of the invention includes a poly(aryletherketone) prepared by a nucleophilic process in highly pure DPS.
• a related aspect of the invention concerns a poly(aryletherketone) obtainable by the method as above detailed. Additional aspects and other features of the present invention will be set forth in part in the description that follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from the practice of the present invention. The advantages of the present invention may be realized and obtained as particularly pointed out in the appended claims. As will be realized, the present invention is capable of other and different embodiments, and its several details are capable of modifications in various obvious respects, all without departing from the present invention. The description is to be regarded as illustrative in nature, and not as restrictive.
• the diphenyl sulfone according to the present invention contains a low level of such impurities and meets at least one of the following impurity limitations : where ppm and wt. % are based on the total weight of the diphenyl sulfone and area % represents the ratio of the GC peak area of the impurity of concern over the total area of all GC peaks of the diphenyl sulfone.
• recurring units (Rl) are chosen from :
• Ar is independently a divalent aromatic radical selected from phenylene, biphenylene or naphthylene,
• n is an integer of from 0 to 3
• b, c, d and e are 0 or 1
• a is an integer of 1 to 4, and preferably, d is 0 when b is 1.
• recurring units (Rl) are chosen from :
• recurring (Rl) are chosen from
• a PEEK polymer is intended to denote any polymer of which more than 50 wt. % of the recurring units are recurring units (Rl) of formula (VII).
• a PEK polymer is intended to denote any polymer of which more than 50 wt. % of the recurring units are recurring units (Rl) of formula (VI).
• the poly(aryletherketone) may be notably a homopolymer, a random, alternate or block copolymer.
• the poly(aryletherketone) when it is a copolymer, it may notably contain (i) recurring units (Rl) of at least two different formulae chosen from formulae (VI) to (XXI), or (ii) recurring units (Rl) of one or more formulae (VI) to (XXI) and recurring units (Rl *) different from recurring units (Rl).
• PAEK polymers are generally prepared by aromatic nucleophilic substitution.
• a bisphenol can be deprotonated with a base such as NaOH, Na 2 CO 3 or K 2 CO 3 and the resultant bisphenolate may then react with a bishalogenated monomer, e.g., a dihalobenzophenone via nucleophilic substitution, to form a PAEK via nucleophilic substitution.
• a bishalogenated monomer e.g., a dihalobenzophenone via nucleophilic substitution
• Such PAEK reactions are typically carried out in a solvent that is, or that contains, diphenyl sulfone.
• a dihalobenzophenone of particular interest since it can be used to form PEEK via nucleophilic substitution (when it is reacted with the phenolate obtained by deprotonating p-hydroquinone), and also many other useful PAEKs [when it is reacted with other bisphenolates such those obtained by deprotonating 4,4'-biphenol, l,4-bis-(p-hydroxybenzoyl)benzene or l,3-bis-(p-hydroxybenzoyl)benzene)], is 4,4'-difluorobenzophenone.
• the Applicant has surprisingly found that, when 4,4'-difluorobenzophenone is used for preparing semi-crystalline poly(aryletherketone) in the process according to the present invention, improved results are obtained when
• the invented method for the preparation of a poly(aryletherketone) is a method for the preparation of a semi-crystalline poly(aryl ether ketone) by aromatic nucleophilic substitution in a solvent comprising a diphenyl sulfone, wherein :
• 4-monofluorobenzophenone in 4,4'-difluorobenzophenone are determined by liquid chromatography analysis.
• liquid chromatography determination can be carried out with a Agilent 1100 LC High Pressure Liquid Chromatography instrument using a Supelco Discovery HS F5, 5 ⁇ m, 25cm x 4.6mm column.
• Suitable analysis conditions include :
• Injection Volume 5 ⁇ l
• the sample is prepared by dissolving about 0.0 Ig of
• 4-monofluorobenzophenone in 4,4'-difluorobenzophenone is typically determined using a calibration with three external standards of these commercially available compounds, of different concentrations, to generate a calibration curve. Under the above detailed conditions, the retention time of 2,
• 4'-DFBP is typically about 7.4 minutes and typically about 7.1 minutes for 4- monofluorobenzophenone, while the retention time for 4,4'-DFBP is typically about 7.7 minutes. Results are expressed as parts per million of the two impurities.
• the 4,4'-difluorobenzophenone further meets the following impurity limitation :
• PAEK polymers that were prepared in accordance with embodiment (D) exhibited improved properties, including improved chemical resistance, improved mechanical properties over a large temperature range, improved crystallinity and/or melt stability.
• DPS that meets one or more of the specific impurity limits described herein, including DPS that meets one or more of the impurity limits described herein by having undergone a purification according to the invention is called purified DPS or highly pure DPS.
• diphenyl sulfone contains several impurities, including monomethyldiphenylsulfone (several isomers), monochlorodiphenylsulfone (several isomers), sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, iron salts, water, sulfuric acid and benzene sulfonic acid.
• impurities that are generally present in DPS include : - low boiling extraction solvent(s) used during the polymer isolation process (e.g., acetone, methanol, ethanol, monochlorobenzene, xylene, etc) ;
• salts resulting from the manufacturing process typically these can be sodium fluoride, potassium fluoride, sodium chloride, potassium chloride, lithium fluoride, sodium carbonate and potassium carbonate ;
• diphenyl sulfone including diphenyl sulfide, biphenyl, dibenzothiophene sulfone, benzene sulfinic acid, benzene sulfonic acid, biphenyl phenyl sulfone (several isomers), SO 2 ;
• Certain of these impurities have been identified as having a negative impact on the properties of the PAEKs obtained from regular (i.e. non purified) virgin or used DPS.
• the recovered DPS does contain some residual fluorinated monomer.
• Fluorinated monomer (1) to (6) are one of these impurities.
• the presence of fluorinated monomers (1) and (2) is preferred.
• Fluorinated monomer concentration is usually higher than 50 ppm and can be as high 5 wt. %. It is economically advantageous to maximize recycling of monomer.
• these oligo(aryl ether ketone)s have a degree of polymerization of maximum 5, more preferably maximum 4, the most preferably maximum 3. Degrees of polymerizations of 1.5, 2.5 are also possible. Oligo(aryl ether ketone)s with a degree of polymerization higher than five can also be present in the recovered diphenyl sulfone.
• the degree of polymerization is the number of recurring units (Rl) in the molecule. Non integer numbers are used when one bifunctional monomer has reacted in excess of the other bifunctional monomer.
• the oligo(aryl ether ketone)s have exactly the same recurring unit (Rl) as the PAEK they are derived from but, in some instances, the oligo(aryl ether ketone)s can have a recurring unit different, formed by side-reactions during the polymerization reaction or during the DPS recovery process.
• oligo(aryl ether ketone)s found in recovered DPS have either fluorine or chlorine end groups, hydro xyl or ionized end groups or no reactive end groups at all.
• the later oligo(aryl ether ketone)s with no reactive end groups include cyclic oligo(aryl ether ketone)s, oligo(aryl ether ketone)s featuring hydrogen end groups (-H) and oligo(aryl ether ketone)s featuring phenyl ether end groups (-0-Ph).
• the presence of certain specific oligo(aryl ether ketone)s have been identified as detrimental to the synthesis of PAEK.
• oligo(aryl ether ketone)s with hydroxyl or ionized end groups tend to alter the color of recovered diphenyl sulfone, as measured by the color of a 20 % solution in acetone.
• the Applicant has surprisingly found that the presence of oligo(aryl ether ketone)s with fluorine or chlorine end groups or cyclic oligo(aryl ether ketone)s has only very limited or even no negative effect at all.
• the Applicant has surprisingly found that the presence of cyclic oligo(aryl ether ketone)s has essentially no negative effect or no negative effect at all.
• the oligo(aryl ether ketone)s are preferably present according to the following relationship : cyclic oligo(aryl ether ketone)s are preferred to oligo(aryl ether ketone)s featuring hydrogen end groups (-H) and oligo(aryl ether ketone)s featuring phenyl ether end groups (-0-Ph), which are preferred to oligo(aryl ether ketone)s featuring fluorine end groups, which are preferred to oligo(aryl ether ketone)s featuring chlorine end groups, which are preferred to oligo(aryl ether ketone)s featuring hydroxyl or ionized end groups.
• the DPS according to the present invention is preferably essentially free or free of oligo(aryl ether ketone)s with hydroxyl or ionized end groups.
• Oligo(aryl ether ketone)s that are often present in recovered DPS used to prepare PAEK of recurring unit (Rl) of formula (VII) are shown in structures (7) to (11). Oligo(aryl ether ketone)s (10) and (11) are typically
• the DPS according to the present invention can thus comprise therein at least one oligo(aryl ether ketone), such as those described in formulae (7) to (11).
• the oligo(aryl ether ketone)s can be detected by LC as described in the examples.
• the amount of such oligo(aryl ether ketone)s is not limited, and can range for example from 0.03 area % to 3 area %, as measured in the examples.
• the amount of such oligo(aryl ether ketone)s of formulae (7) to (11) can range from 0.03 area % to 3 area %, as measured in the examples.
• Area % represents the ratio of the LC peak area of the impurity of concern over the total area of all LC peaks of the DPS.
• the DPS according to the present invention can comprise either more than 0.03 area % of one or more oligo(aryl ether ketone)s, or higher than 0.1 area %, or higher than 0.5 area %, or even higher than 1.0 area %, based on the total LC peak area of the diphenyl sulfone plus impurities.
• oligo(aryl ether ketone)s such as oligo(aryl ether ketone)s with hydro xyl or ionized end groups, are detrimental to the synthesis of PAEK, it is beneficial to limit the amount of oligo(aryl ether ketone)s in general to an amount lower than 5 area %, more preferably lower than 4 area %, still more preferably lower than 3 area % and the most preferably lower than 2 area %.
• the DPS according to the present invention comprises preferably more than 0.03 area %, more preferably higher than 0.1 area %, still more preferably higher than 0.5 area %, and the most preferably higher than 1.0 area %, based on the total LC peak area of the diphenyl sulfone plus impurities, of one or more oligo(aryl ether ketone)s selected from the group consisting of cyclic oligo(aryl ether ketone)s, oligo(aryl ether ketone)s featuring hydrogen end groups (-H), oligo(aryl ether ketone)s featuring phenyl ether end groups (-0-Ph), and oligo(aryl ether ketone)s featuring fluorine end groups.
• the DPS according to the present invention comprises preferably more than 0.03 area %, more preferably higher than 0.1 area %, still more preferably higher than 0.5 area %, and the most preferably higher than 1.0 area %, based on the total LC peak area of the diphenyl sulfone plus impurities, of one or oligo(aryl ether ketone)s selected from the group consisting of oligo(aryl ether ketone)s of formulae (7) to (11), more particularly the group consisting of oligo(aryl ether ketone)s of formulae (7), (8) and (11).
• the DPS according to the present invention comprises preferably more than 0.01 area %, more preferably higher than 0.03 area %, still more preferably higher than 0.1 area %, and the most preferably higher than 0.3 area %, based on the total LC peak area of the diphenyl sulfone plus impurities, of one or more cyclic oligo(aryl ether ketone)s, in particular the cyclic oligo(aryl ether ketone)s of formulae (8) to (10), more particularly the cyclic oligo(aryl ether ketone) of formula (10).
• the amount of any oligo(aryl ether ketone) or of any group of oligo(aryl ether ketone) cited in the present paragraph may be either lower than 5 area %, or lower than 4 area %, or lower than 3 area %, or lower than 2 area %.
• the DPS according to the present invention meeting at least one impurity limit (maximum allowable content/Purity Standard) set forth above, may comprise at least one low boiling extraction solvent. It contains preferably less than 1 wt. %, more preferably less than 0.5 wt. %, the most preferably less than 0.2 wt. % of such low boiling extraction solvent.
• the DPS according to the present invention may comprise at least one organic or inorganic impurities arising from thermal degradation of diphenyl sulfone. It contains preferably less than 3 area %, more preferably less than 2 area % of such impurities.
• the present invention relates, in part, to the purification of DPS and the use thereof of the purified product.
• DPS diphenyl sulfone
• b.p. 389°C under atmosphere pressure
• 125-129°C high melting point
• the presence of certain impurities in DPS requires the use of special construction materials for the recovery operation or for storage in the molten stage to limit corrosion.
• the present inventors have found that certain impurities in DPS have a deleterious effect on the properties of the PAEKs produced therein, including color, melt stability, molecular weight, crystallinity, etc., the extent of the impact of these impurities depending on the concentration at which the polymerization reaction is run.
• the polymerization reaction is done with a ratio of DPS solvent to polymer made at least of 1.45 kg DPS/kg polymer made, more preferably at least of 1.50 kg/kg polymer made.
• the amount of DPS solvent used is no more than 2.60 kg DPS/kg polymer. More preferably, the amount of DPS used is no more than 2.50 kg/kg polymer made.
• ppm and wt. % are based on the total weight of the diphenyl sulfone (i.e. the 100 % pure DPS + all present impurities) and area % represents the ratio of the GC peak area of the impurity of concern over the total area of all GC peaks of the diphenyl sulfone.
• area % represents the ratio of the GC peak area of the impurity of concern over the total area of all GC peaks of the diphenyl sulfone.
• chromatographic data is presented as a graph of detector response (y-axis) against retention time (x-axis).
• This provides a spectrum of peaks for a sample representing the analytes present in a sample eluting from the column at different times. Retention time can be used to identify analytes if the method conditions are constant. Also, the pattern of peaks will be constant for a sample under constant conditions and can identify complex mixtures of analytes. In most modern applications however the GC is connected to a mass spectrometer or similar detector that is capable of identifying the analytes represented by the peaks. The area under a peak is proportional to the amount of analyte present. By calculating the area of the peak using the mathematical function of integration, the concentration of an analyte in the original sample can be determined. In most modern systems, computer software is used to draw and integrate peaks. For organic impurities, for which more than one isomer is possible (monomethyldiphenylsulfone and monochlorodiphenylsulfone), the impurity requirement pertains to the total concentration of all the impurity isomers.
• Monomethyldiphenylsulfone (sum of all isomers) is advantageously present in an amount of less than 0.2 area % (limitation ⁇ ), preferably less than 0.18 area %, more preferably less than 0.14 area %, still more preferably less than 0.1 area % and the most preferably less than 0.08 area %.
• Monochlorodiphenylsulfone (sum of all isomers) is advantageously present in an amount of less than 0.08 area % (limitation ⁇ ), preferably less than 0.07 area %, more preferably less than 0.06 area %, still more preferably less than 0.05 area % and the most preferably less than 0.04 area %.
• Sodium is advantageously present in an amount of less than 55 ppm
• limit ⁇ preferably less than 50, more preferably less than 40, still more preferably less than 30 and the most preferably less than 25 ppm.
• Potassium is advantageously present in an amount of less than 15 ppm (limitation ⁇ ), preferably less than 14, more preferably less than 12, still more preferably less than 10 and the most preferably less than 8 ppm.
• Iron is advantageously present in an amount of less than 5 ppm (limitation ⁇ ), preferably less than 4, more preferably less than 3, still more preferably less than 2 and the most preferably less than 1 ppm.
• Residual acidity is advantageously present in an amount of less than 2.0 ⁇ eq/g (limitation ⁇ ), preferably less than 1.8, more preferably less than 1.6, still more preferably less than 1.4 and the most preferably less than 1 ⁇ eq/g.
• Water is advantageously present in an amount of less than 0.1 wt. % (limitation ⁇ ), preferably less than 0.09, more preferably less than 0.08, still more preferably less than 0.07 and the most preferably less than 0.06 wt. %.
• Diphenyl sulfide is advantageously present in an amount of less than 2 wt. % (limitation ⁇ ), preferably less than 1.6, more preferably less than 1.2, still more preferably less than 0.8 and the most preferably less than 0.4 wt. %.
• the APHA value of 20 wt. % solution in acetone at 25°C is s advantageously of less than 50 (limitation i), preferably less than 45, more preferably less than 40, still more preferably less than 35 and the most preferably less than 30.
• Total chlorine content is advantageously of less than 120 ppm (limitation K), preferably less than 115, more preferably less than 110, still more preferably less than 105 and the most preferably less than 100 ppm.
• the DPS is pure in a way such that it meets one or more of the following groups of several impurity limits (maximum allowable content/Purity Standard) noted above : 1.)Monomethyldiphenylsulfone (sum of all isomers), monochlorodiphenylsulfone (sum of all isomers), residual acidity, water 2.)sodium, iron, diphenyl sulfide, APHA of 20 wt. % solution in acetone at 25°C 3.) sodium, potassium, iron, diphenyl sulfide, APHA of 20 wt. % solution in acetone at 25 0 C.
• impurity limits maximum allowable content/Purity Standard
• the DPS according to the present invention meets preferably the above described ⁇ and ⁇ limitations, more preferably the above described ⁇ , ⁇ and ⁇ limitations, still more preferably the above described ⁇ , ⁇ , ⁇ and ⁇ limitations. It meets also preferably the above described ⁇ and ⁇ limitations, more preferably the above described ⁇ , ⁇ and ⁇ limitations, still more preferably the above described ⁇ , ⁇ , ⁇ and i limitations and the most preferably the above described ⁇ , ⁇ , ⁇ , i and ⁇ limitations.
• the DPS according to the invention has a minimal amount of diphenyl sulfide present ( ⁇ limitation), yet meets the above impurity limit.
• the diphenyl sulfone according to the present invention contains preferably more than 0.0025, more preferably more than 0.005, still more preferably more than 0.01, 0.05, 0.1, and the most preferably more than 0.2 wt. % diphenyl sulfide.
• it contains advantageously less than 2.0 wt. %, preferably less than 1.8, more preferably less than 1.6 still more preferably less than 1.4 and the most preferably less than 1.2 wt. % diphenyl sulfide.
• the DPS according to the present invention meets at least one of the above described ⁇ to ⁇ impurity limitations, it meets preferably at least two, more preferably at least three, still more preferably at least four and the most preferably at least five of the above described ⁇ to ⁇ impurity limitations. Excellent results were obtained when the DPS according to the present invention met almost all or even all the above described ⁇ to ⁇ impurity limitations.
• the highly pure DPS according to the present invention may in fact be seen as a composition of matter comprising pure DPS and optionally one or more impurities. Accordingly, the GC chromatogram of the highly pure DPS according to the present invention comprise one major peak related to pure DPS and optionally one or more smaller peaks related to the optional one or more impurities.
• Any method of solvent purification can be used in purifying virgin and used DPS so as to meet the above purity standard(s).
• Such techniques include distillation, liquid and gas chromatography, adsorption and/or absorption on silica or other solid media, ion exchange techniques, extraction, (re)crystallization, precipitation, etc. Combinations of such methods may be used.
• Those of ordinary skill in the art know how to measure, and are capable of measuring, the amount of the impurities noted above that are present in the purified DPS to determine whether the invention maximum allowable content of a given impurity has been met. Purifying used and virgin DPS using such techniques is a routine matter in the art, as is the measurement of the noted impurities.
• one of ordinary skill can purify DPS according to the invention, can provide purified DPS, and can provide purified DPS meeting one or more of the above purity standards.
• the recovery of DPS typically involves isolating DPS from a DPS mixture comprising at least one of the following : at least one low boiling organic solvent, water, one or more inorganic salts like chlorides, fluorides and carbonates, residual monomer(s), and residual oligo(aryl ether ketone)s.
• This DPS mixture is hereinafter termed a "DPS solution” or simply “extract”.
• the water content in these extracts is between 0.5 and 15 wt. %.
• a DPS extract is obtained in the preparation of a PAEK as follows.
• the reaction mixture comprising DPS, PAEK, salts, fluorinated monomers, oligo(aryl ether ketone)s, etc, is solidified at the end of the polymerization reaction by cooling and ground to the target particle size.
• a preferred range of mean particle size (D50) is between 100 and 2500 ⁇ m, and more preferably between 200 and 2000 ⁇ m.
• the reaction solvent, DPS is then separated from the polymer by extraction with a low boiling organic solvent (acetone, methanol, ethanol, chlorobenzene, xylene or their mixtures).
• the low boiling organic solvent can be either virgin or recycled.
• Salts present in the reaction mixture are also partially extracted with the organic solvent, as well as DPS, fluorinated monomers and oligo(aryl ether ketone)s .
• These extracts also contain water, present in the low boiling solvent used for extraction and/or present in the reaction mixture as a result of a previous washing step with water.
• the extraction process can be carried out at room temperature or a temperature higher than room temperature, for instance at the boiling point of the low boiling organic solvent.
• the so-separated PAEK and salts may then be further washed with another solvent, water or mixtures thereof to extract remaining water, low boiling organic solvent, salts, chemicals...to finally lead to the obtention of the PAEK.
• the invention low temperature processes for purifying DPS solution generally involve isolating solid diphenyl sulfone from the solution in which the diphenyl sulfone solubility is preferably at or below 1.5 wt. % at the temperature at which the purification is done, more preferably at or below 1.2 wt. %, still more preferably at or below 1 wt. %.
• the solubility of the DPS is preferably at or higher than 0.02 wt. %, more preferably higher than 0.05, still more preferably higher than 0.08 and the most preferably higher than 0.12.
• DPS solubility in this solution is preferably 0.05 - 1.5 wt. %, including all values and subranges therebetween, such as 0.06, 0.1, 0.5, 0.55, 0.7, 0.9, 1.2, 0.6-1.3, etc. wt. %.
• a non solvent is a solvent in which DPS solubility is lower than 10 wt. %, typically less than 5 wt. % at the temperature at which the purification is operated.
• Non solvents include water, methanol, ethanol, etc and mixtures thereof.
• the ratio of the non solvent/solution is selected such that the final solubility of DPS is preferably below 1.5 wt. % at the purification temperature. This operation is preferably carried out under vigorous agitation. Examples of precipitation procedures and equipment, well known to the persons skilled in the art, can be found in "Crystallization and Precipitation", J. Mullin, “Ullmann's Encyclopedia of Industrial Chemistry", Online Ed. 2005.
• a film evaporator is preferred for the low temperature evaporation process.
• An agitated thin film evaporator is specially preferred.
• Thin film evaporators present the advantages of low residence time and low wall temperature on the product side. Residence time depends on the separation to conduct. Residence time in thin film evaporators can be as low as fractions of seconds. Preferred residence time is shorter than 15 hours, preferably shorter than 10 hours. This can be carried out in a wiped- film evaporator, for example.
• the low temperature evaporation process can be accomplished under vacuum. More preferably, the low temperature evaporation process can be carried out in wiped- film evaporator operating under vacuum. 3.
• the invention low temperature recovery operations described above are preferably carried out at temperatures of 150 0 C or less, more preferably 120 0 C or less, still more preferably 100 0 C or less and the most preferably 70 0 C or less, including 140, 130, 111, 100, 90, 65, 55, 45, 32, 25, 20, 10, 0, etc. 0 C and all values and subranges therebetween.
• the invention low temperature recovery operations described above are preferably carried out at temperatures above -10°C, preferably above 0 0 C.
• the low temperature methods 1-3 preferably do not involve distillation of the DPS.
• Another aspect of the present invention is thus related to a method for isolating a solid diphenyl sulfone from a diphenyl sulfone solution obtained in the preparation of a PAEK, wherein the diphenyl sulfone solubility in said solvent is lowered at a level of at or below 1.5 wt.
• % by either : a) addition of a non solvent to the solution ; or b) addition of the solution to a non solvent ; or c) removal of a fraction of low boiling organic solvent present in the solution by a low temperature evaporation process, followed or preceded by addition of a non solvent to the solution ; or d) cooling the solution ; or e) a combination of two or more of a), b), c) and d).
• the solid DPS provided by the above methods can be separated from the solution by any method, including filtration, centrifuging, etc.
• the separation preferably is accomplished at 150 0 C or less, more preferably 120 0 C or less, still more preferably 100 0 C or less and the most preferably 70 0 C or less, including 140, 130, 111, 100, 90, 65, 55, 45, 32, 25, 20, 10, 0, etc. 0 C and all values and subranges therebetween.
• the separation is preferably carried out at temperatures above -10 0 C, preferably above 0 0 C.
• the solid DPS obtained may contain unreacted bishalogenated monomer (see examples of structures on page 2), for instance 4,4'-difluorobenzophenone or
• the solid DPS obtained may contain the above described oligo(aryl ether ketone)s.
• the isolated DPS solid can be further purified if desired. Since the most corrosive impurities have been removed at this stage, this secondary purification can be performed at high temperature or a at low temperature, for example by washing with a non solvent, dissolution in a solvent a high temperature and recrystallization at low temperature, distillation preferably under vacuum, etc. According to the invention, when a PAEK polymer is made in purified
• the polymer prepared typically has a molecular weight useful industrially, e.g., intrinsic viscosity ⁇ int > 0.62 dl/g in methanesulfonic acid at 30 0 C, and a low color.
• the color is generally characterized by L*, a*, b* values, which are tristimulus coordinates defined by the CIE (Commission Internationale de l'Eclairage) in 1976 (K. Nassau, in "Kirk-Othmer Encylopedia of Chemical Technology", 2004, Chapter 7, P 303-341).
• a* negative values indicate green while positive values indicate magenta
• b* negative values indicate blue and positive values indicate yellow
• L* is measured according to ASTM E308 using D 65 illuminant.
• the PAEK polymer made in purified DPS according to the invention has a color, as defined in USSN 60/955,042, incorporated herein by reference, i.e., a compression molded plaque (2.5 mm thick obtained by compression molding at 370 0 C) has the following L*, a*, b* values measured under D65 light source at 10° angle :
• the DPS of the invention meets at least one impurity limit (maximum allowable content/Purity Standard) set forth above, comprises therein at least one fluorinated monomer, preferably a fluorinated monomer useful in the preparation of PAEKs, such as 4,4'-difluorobenzophenone monomer, 1 ,4-bis(4'-fluorobenzoyl)benzene, l,3-bis(4'-fluorobenzoyl)benzene, etc.
• Said fluorinated monomer is preferably selected from the group consisting of the above described formulae (1) to (6).
• the amount of such monomer(s) is not limited, and can range from, e.g., 0.005 - 5 wt. %, including both more and less than these endpoints, and all amounts in-between this exemplary range.
• the amount of residual fluorinated monomer can be determined by gas chromatography (GC) or by liquid chromatography (LC), as described in the examples below.
• the DPS according to the present invention comprises preferably more than 0.005 wt. %, more preferably more than 0.05 wt. %, still more preferably more than 0.5 wt. % and the most preferably more than 1 wt. % of such monomers. On the other hand, it comprises preferably less than 5 wt.
• the DPS of the invention meeting at least one impurity limit (maximum allowable content/Purity Standard) set forth above, comprises therein at least one oligo(aryl ether ketone), such as those described in figures (7) to (11).
• the oligo(aryl ether ketone)s can be detected by LC as described in the examples.
• the amount of such oligo(aryl ether ketone)s is not limited, and can range for example from 0.03 area % to 3 area %, as measured in the examples.
• the amount of oligo(aryl ether ketone)s is higher than 0.03 area %, more preferably higher than 0.1 area %, still more preferably higher than 0.5 area % and the most preferably higher than 1.0 area %.
• the amount of oligo(aryl ether ketone)s is preferably lower than 5 area %, more preferably lower than 4 area %, still more preferably lower than 3 area % and the most preferably lower than 2 area %.
• Another aspect of the present invention is related to a method for the preparation of a poly(aryl ether ketone) in a solvent comprising the above described DPS according to the present invention.
• a related aspect of the present invention concerns the use of the above highly pure DPS in a method for the manufacture of a PAEK.
• PAEK can be prepared from a variety of starting materials, either via a nucleophilic route or an electrophilic route.
• nucleophilic method comprises reacting a generally substantially equimolar mixture of at least one bisphenol and at least one dihalobenzoid compound (for the two-monomer route) or at least one halophenol compound (for the one- monomer route).
• This nucleophilic route is generally carried out in DPS in the presence of alkali-metal carbonate, often under an inert atmosphere and often at temperatures approaching the melting point of the polymer.
• the alkali-metal carbonate includes preferably particulate sodium carbonate having a certain particle size distribution, as specified in embodiment (E) hereinafter.
• the method for the preparation of a poly(aryletherketone) is a method by aromatic nucleophilic substitution :
• particulate sodium carbonate has a particle size distribution as follows :
• a sodium carbonate particle size distribution expressed as D xx ⁇ Y ⁇ m refers to the percentage (xx %) of sodium carbonate particles by weight in a sample that are less than or equal to Y ⁇ m in diameter.
• Na 2 CO 3 that is "too fine” is avoided as it can notably lead to a low bulk density product that is difficult to handle and synthesis reaction kinetics that are difficult to control.
• the Applicant found that Na 2 CO 3 with a D90 > 45 ⁇ m was beneficial.
• Na 2 CO 3 that contains a certain amount of "big” particles, and especially of "very big” particles is also to be avoided as it can notably slow down the polymerization rate, or require the use of an undesirably high amount OfK 2 CO 3 or other higher alkali metal carbonate (at fixed Na 2 CO 3 amount) ; Na 2 CO 3 that contains a certain amount of "big” particles, and especially of "very big” particles, can also result in polymerizations having poor kinetics consistency.
• particulate sodium carbonate in accordance with embodiment (E) provides several benefits, including the ability to synthesize easily PAEKs in the absence of a cosolvent forming an azeotrope with water such as p-xylene, and thereby prepare PAEKs with no trace of residual cosolvent (such cosolvents, like p-xylene, are generally toxic).
• Cosolvents forming an azeotrope with water used in the synthesis of PAEK resins are known to those of skill in the art, and in addition to p-xylene include chlorobenzene, toluene, etc.
• the use of particulate sodium carbonate in accordance with embodiment (E) makes it also possible to manufacture lower color, whiter PAEK resins.
• the use of particulate sodium carbonate in accordance with embodiment (E) results also beneficially in improved kinetics consistency.
• the D99.5 of the sodium carbonate particles in accordance with embodiment (E) is of at most 630 ⁇ m ; more preferably, it is of at most 500 ⁇ m ; still more preferably, it is of at most 425 ⁇ m ; most preferably, it is of at most 355 ⁇ m.
• the D90 of the sodium carbonate particles in accordance with embodiment (E) is of at least 63 ⁇ m ; more preferably, it is of at least 90 ⁇ m ; still more preferably, it is of at least 112 ⁇ m.
• the D90 of the sodium carbonate particles in accordance with embodiment (E) is of at most 212 ⁇ m ; more preferably, it is of at most 180 ⁇ m ; still more preferably, it is of at most 150 ⁇ m.
• the sodium carbonate has the following particle size distributions :
• the particle size distribution of the sodium carbonate in accordance with embodiment (E) can be determined by mechanical sieving. This method is appreciated because of its easiness, broad availability, and excellent repeatability. Mechanical sieving is generally based on the mechanical separation of the various fractions on a series of superimposed sieves. The analysis can be made partly or fully in accordance with ASTM E 359-00 (reapproved 2005) e l , the whole content of which being herein incorporated by reference. ASTM E 359-00 (reapproved 2005) e l concerns various measurements made specifically on sodium carbonate, notably sieve analysis.
• the particle size distribution is advantageously determined with an automatic mechanical sieving device, such as Ro-Tap RX-29 sieve shaker (as commercialized by W. S. Tyler Company).
• the sieves mounted on the sieve shaker are advantageously in conformity with standard ISO 3310 -1 or ASTM E-I l, preferably with wire stainless steel circular sieves with square meshes, metal mounting with a diameter 200 mm.
• the device and its sieves are advantageously checked periodically using a reference powder ; the control frequency should be desirably be as high as possible for early detection of any deviation, as possibly resulting for damaged meshes.
• the sieves are superimposed and assembled from top to bottom by descending order of opening mesh ; a fixed weight amount of the powder to be investigated is weighed with an analytical balance and placed on top of the widest sieve ; by vibrating the sieving machine, the powder material is conveyed through the various sieves ; the sieving operation is run for a fixed amount of time ; the residues on the sieves are weighed with an analytical balance and related mathematically to the initial weight of material. Notably D90 and D99.5 values can be calculated from the residues weights. This calculation is generally made as follows :
• the results can be displayed on a graph were the Y-coordinate represents the cumulative weight percent particles retained on a particular sieve.
• the X- coordinate corresponds to sieve size.
• the Y-value for a particular sieve can be determined by adding the weight of the particles retained on that sieve plus the weights of the particles retained on all larger sieves above it and dividing the sum by the total weight of the sample.
• the sieves can be ISO 3310-1 or ASTM E-I l test sieves having a diameter of 200 mm, notably commercialized from LAVAL LAB Inc.
• a certain suitable set of sieves is composed of eight ISO 3310-1 or ASTM E-I l test sieves having a diameter of 200 mm, having the following aperture size or ASTM opening designation : 1000 ⁇ m (ASTM No. 18), 500 ⁇ m (ASTM No. 35), 250 ⁇ m
• W 1 is the weight of powder collected on sieve i sample weight
• the percentage under the size x t Pt is thus defined as :
• the percentage under the size x t can be plotted versus x t .
• the curve can be built by considering in each point the following slope : 3) Determine D z values (0 ⁇ z ⁇ 100), e.g. determine D90 and D99.5
• the particle size distribution of the sodium carbonate used in accordance with embodiment (E) is advantageously determined on a sample which is representative of the whole sodium carbonate which is used in said process.
• the skilled person will advantageously rely upon all those sampling recommendations which do form part of the general knowledge and are broadly described in various encyclopedias, including but not limited to "Sampling", Reg. Davies, in “Kirk-Othmer Encyclopedia of Chemical Technology", online Ed. 2000, the whole content of which is herein is incorporated by reference. Since sodium carbonate can be viewed as a free- flowing powder, sampling procedures suitable for stored free-flowing powders will be used preferably.
• Sodium carbonate is broadly commercially available, either in the form of dense sodium carbonate or light sodium carbonate.
• Light sodium carbonate also called light soda ash
• Dense sodium carbonate commonly called dense soda ash
• has generally a free flowing density as measured in accordance with ISO 903 standard, of from 0.90 kg/dm 3 to 1.20 kg/dm 3 .
• neither the commercially available dense sodium carbonates nor the commercially available light sodium carbonates have a particle size distribution as required by embodiment (E). Yet, as will explained below, it is easy for the skilled person, searching for obtaining a sodium carbonate with the appropriate particle size requirements, to obtain it.
• Dense sodium carbonates having the particle size distribution as required by present embodiment (E) can be notably obtained by appropriate grinding and/or sieving dense sodium carbonates having a particle size distribution not in accordance with embodiment (E).
• methods including at least one grinding step followed by at least one sieving step are preferred.
• suitable grinders it can be notably cited jet mills such as helical jet mills, oval tube jet mills, counterjet mills, fluidized bed jet mills, and ball and plate jet mills, can notably be used.
• sieves it can be notably cited 710 ⁇ m, 630 ⁇ m, 500 ⁇ m, 400 ⁇ m, 300 ⁇ m, 250 ⁇ m, 200 ⁇ m, 150 ⁇ m and 125 ⁇ m sieves.
• Light sodium carbonates having the particle size distribution as required in present embodiment (E) can also be obtained by appropriate grinding and/or sieving light sodium carbonates having a particle size distribution not in accordance with embodiment (E).
• methods free of any grinding step are preferred ; such methods may include a sieving step or not.
• a particularly preferred method for obtaining light sodium carbonates having the particle size distribution in accordance with embodiment (E) comprises selecting said light sodium carbonates among different lots of one or more grades of commercially available light sodium carbonates, as detailed below.
• the Applicant determined the particle size distribution of numerous lots of commercially available (unground) light sodium carbonates from different sources, and observed that, among all these lots, none had a D 90 below 45 ⁇ m ; as a matter of fact, their D 90 often ranged usually from about 100 ⁇ m to about 250 ⁇ m, i.e. the lots often complied with both requirements set forth for the D90 in accordance with embodiment (E) of the present invention.
• An important and surprising benefit resulting from the use of sodium carbonate powder meeting the requirements of embodiment (E) is that it allows one to limit the amount of potassium carbonate, and more generally of any other higher alkali metal carbonate, to be used in the preparation of the PAEK.
• higher alkali metal carbonates other than potassium carbonate it can be particularly cited rubidium carbonate and caesium carbonate.
• the molar ratio of A/Na (wherein A designates either K, Cs or Rb or any combination thereof) can be of at most 0.050 mol A/mol Na, preferably at most 0.020 mol A/mol Na, and more preferably at most 0.010 mol A/mol Na.
• the molar ratio of A/Na is equal to 0 (i.e. the nucleophilic substitution takes place in the absence of K, Cs and Rb).
• the molar ratio of A/Na although being maintained at a low level (e.g.
• the particle size distribution of the potassium carbonate when present, is not important, although a slight additional improvement in terms of polymerization kinetics might be observed when using a very finely ground potassium carbonate.
• Still another aspect of the present invention is related to a PAEK obtainable by the above described method.
• the method for the preparation of a poly(aryletherketone) meets further the technical limitations as met in accordance with previously described embodiment (D).
• the PAEK is preferably PEK or PEEK.
• phrases “selected from the group consisting of "chosen from” and the like include mixtures of the specified materials.
• Terms such as “contain(s)” and the like as used herein are open terms meaning “including at least” unless otherwise specifically noted. Phrases such as “mention may be made” etc. preface examples of materials that can be used and do not limit the invention to the specific materials, etc., listed.
• diphenyl sulfone sample was weighed to the nearest 0.1 mg and added to an empty glass titration vessel.
• 55 ml of high-purity methylene chloride was added, followed by addition of a 5.00 ml aliquot of spiking solution, which contains six drops of 37 % hydrochloric acid per liter, into the same titration vessel.
• the vessel was then attached to the titrator cell assembly containing the buret tip, pH electrode, and magnetic stirrer. The vessel was then purged with carbon dioxide-free nitrogen for 5-7 minutes.
• VSl is the amount of titrant in ml required to reach the strong acid/base equivalence points when sample solution is titrated and VBl is the amount of titrant in ml required to reach the strong acid/base equivalence point when only the blank solution is titrated
• W is the sample weight
• N is the normality of the tetrabutylammonium hydroxide titrant. If acidity is negative, the sample contains basic species.
• diphenylsulfone sample was weighed into platinum crucibles using an analytical balance. Two drops of concentrated, trace metals grade sulfuric acid was added to each sample and the crucibles were placed into a muffle furnace set to 250 0 C. After the diphenylsulfone has vaporized, the furnace temperature was raised to 525 0 C for 1 hour to remove any organic residues. Metallic residues were dissolved by adding 1 ml of concentrated hydrochloric acid to the crucible and warming at 50 0 C to dissolve the ash.
• Plasma conditions used for the analysis were : plasma input power : 1300 watts, plasma argon flow : 15 liters per minute, auxiliary argon flow : 0.5 liters per minute, nebulizer flow : 1.2 liters per minute, and sample flow rate : 1.5 milliliters per minute. Element concentrations in the samples were calculated by the ICP operating software from the element emission line intensities. Determination of total chlorine in diphenyl sulfone
• Calibration pure water (micro-capillary method in this method)
• Carrier gas argon dried with molecular sieve 4
• Carrier gas flow rate 100 ml/min.
• HPLC analysis was carried out on a Waters Alliance 2795 LC instrument using a Supelco Discovery HS F5 25cm x 4.6mm column.
• the analysis conditions were :
• Mobile phase acetonitrile/deionized water.
• the sample was prepared by dissolving 0.2g of DPS in 1Og of acetonitrile.
• the concentration of diphenyl sulfide and of residual monomer was determined using a low concentration diphenyl sulfide and monomer standards as an external calibration standards (commercially available).
• the retention time for DPS was 6.2 minutes and the retention time for diphenyl sulfide was 10.7 minutes.
• oligo(aryl ether ketone)s such as those depicted in figures (7), (8) and (11) are 15.3, 18.0 and 15.1, minutes. They were identified by LC-MS
• Diphenyl sulfone used in these examples was supplied by different companies : Proviron (Belgium), Sloss (US), Wuhan Zhengmao (China) and used without further purification. The analysis of these samples was carried out per the analysis methods described.
• Reaction examples 3 and 4 were run under more dilute conditions, with 175.00 g of diphenyl sulfone, instead of 127.82 g.
• the flask content was evacuated under vacuum and then filled with high purity nitrogen (containing less than 10 ppm O 2 ). The operation was repeated twice.
• the reaction mixture was then placed under a constant nitrogen purge (60 ml/min).
• the reaction mixture was heated slowly to 150 0 C.
• 150 0 C a mixture of 28.4259 g of dry Na 2 CO 3 having a D 90 > 45 ⁇ m, a D 90 ⁇ 250 ⁇ m and a D 99 .5 ⁇ 710 ⁇ m ; and 0.1800 g of dry, very finely ground K 2 CO 3 (D 9 o ⁇ 45 ⁇ m) was added via a powder dispenser to the reaction mixture over 30 minutes.
• the reaction mixture was heated to 320 0 C at l°C/minute.
• the reactor content was then poured from the reactor into a SS pan and cooled.
• the solid was broken up and ground in an attrition mill through a 2 mm screen.
• Diphenyl sulfone and salts were extracted from the mixture with acetone and water at pH between 1 and 12.
• the last wash water had a pH between 6 and 7.
• the powder was then removed from the reactor and dried at 120 0 C under vacuum for 12 hours yielding 67-70 g of a white powder.
• Examples 1 through 5 describe the use of high purity DPS in the preparation of high quality PEEK.
• Examples 6 through 11 are comparative examples showing the adverse effect of : High sodium and chlorine contents (6 and 7)
• Example 12 recovery of diphenyl sulfone by distillation in glassware and its use in PEEK reaction
• the recovered solvent (DPS) was used to prepare PEEK as follows : In a 500 ml 4-neck reaction flask fitted with a stirrer, a N 2 inlet tube, a Claisen adapter with a thermocouple plunging in the reaction medium, and a Dean-Stark trap with a condenser and a dry ice trap were introduced 128.55 g of recovered diphenyl sulfone of quality defined hereafter in table 1, 28.5983 g of p-hydroquinone (p-hydroquinone can typically contain up to 0.6 % water - the weight here is the weight of p-hydroquinone on a dry basis, i.e.
• a mixture of 28.4259 g of dry Na 2 CO 3 having a D90 > 45 ⁇ m, a D90 ⁇ 250 ⁇ m and a D99.5 ⁇ 710 ⁇ m and 0.1800 g of dry, very finely ground K 2 CO 3 (D 90 ⁇ 45 ⁇ m) was added via a powder dispenser to the reaction mixture over 30 minutes. At the end of the addition, the reaction mixture was heated to 320 0 C at l°C/minute.
• the same extract as used in example 12 was used : mixture containing 81.1 wt. % acetone, 12.2 wt. % diphenyl sulfone, 6.1 wt. % water, 0.51 wt. % 4,4'-difluorobenzophenone, 650 ppm NaCl and 60 ppm KCl.
• Example 14 recovery of diphenyl sulfone by precipitation with a non solvent, then evaporation of a fraction of the low boiling solvent A mixture containing 81.1 wt. % acetone, 12.2 wt. % diphenyl sulfone,
• the DPS thus obtained was used in a polymerization reaction similar to example 11, except that the amounts of recovered diphenyl sulfone used was 131.91 g and the amount of virgin 4,4'-difluorobenzophenone used was 53.1445 g. Results can be found in entry 14, tablel.
• Example 15 recovery of diphenyl sulfone by crystallization
• Reaction mixture (1300 g) from example 1 was extracted with xylene (2600 g) at reflux temperature. The extract was then concentrated by evaporation of xylene at atmospheric pressure to generate a typical extract as follows. Only the identified compounds are detailed. As for the other examples, some other compounds like oligo(aryl ether ketone)s were also present.
• the yield of diphenyl sulfone can be maximized (solubility of diphenyl sulfone in p-xylene at 10 0 C is 0.1 wt. %).
• a higher crystallization temperature can be used : at 23°C, the solubility of diphenyl sulfone in p-xylene is 1.38 wt. %.
• the DPS thus obtained was used in a polymerization reaction similar to example 11, except that the amounts of recovered diphenyl sulfone used was 131.39 g and the amount of virgin 4,4'-difluorobenzophenone used was 53.6598 g. Results can be found in entry 15, table 1.
• diphenyl sulfone used in example 5 was spiked with diphenyl sulfide (commercial, 98 %, Sigma- Aldrich) in different amounts (0.3 to 0.8 wt. %). Using this diphenyl sulfone, the polymerization reaction was done under the same conditions as example 5. Results are in entries 16 to 19 in Table 1. Comparative example 20 : recovery by distillation in the presence of 316 stainless steel
• the DPS thus obtained was used in a polymerization reaction similar to example 11, except that the amounts of recovered diphenyl sulfone used was 128.48 g and the amount of virgin 4,4'-difluorobenzophenone used was 56.5784 g. Results can be found in entry 20, table 1.
• the color of the polymer was adversely affected by the impurities in the recovered DPS.
• [monochloroDPS] and [monomethylDPS] represent the concentrations of all the isomers detected by GC.

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