WO2009118398A1 - Combined pumping system comprising a getter pump and an ion pump - Google Patents
Combined pumping system comprising a getter pump and an ion pump Download PDFInfo
- Publication number
- WO2009118398A1 WO2009118398A1 PCT/EP2009/053634 EP2009053634W WO2009118398A1 WO 2009118398 A1 WO2009118398 A1 WO 2009118398A1 EP 2009053634 W EP2009053634 W EP 2009053634W WO 2009118398 A1 WO2009118398 A1 WO 2009118398A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pump
- getter
- flange
- ion
- magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
Definitions
- the present invention relates to a combined pumping system comprising a getter pump and an ion pump.
- UHV ultra-high vacuum conditions
- particle accelerators and electron microscopes may be mentioned.
- pumping systems comprising a pump that is defined main pump, e.g. a rotary or a membrane pump, and a UHV pump, e.g. a turbo-molecular, getter, ion or cryogenic pump, are generally used.
- the main pump can start operating at atmospheric pressure and can bring the pressure inside the vacuum chamber of an instrument down to values of about 10 " - 10 " Pa. At these pressures it is possible to activate the UHV pump, which brings the pressure of the system down to values of about 10 "8 - 10 "9 Pa.
- the most diffused UHV pumps are ion pumps, since they can practically block all gases (although having a poor pumping efficiency with respect to hydrogen) and they can provide an indication, although approximate, of the pressure value inside the evacuated chamber.
- the latter feature is particularly appreciated by manufacturers and users of vacuum instruments, because it allows to have a control of the system conditions and possibly to interrupt its operation when the pressure inside the chamber increases up to critical values.
- Ion pumps are usually made by an assembly of a plurality of equal members.
- ions and electrons are generated by ionization of the gaseous species present in the chamber as effect of the high electrical fields being applied.
- a magnet arranged around each member provides the electrons with a non-linear (generally helical) trajectory, so to improve their ability to ionize other molecules present in the chamber.
- the set of ions so generated is embedded in the member walls, partially due to ion implantation into the same walls and partially due to a "burial" effect underneath titanium layers formed by the deposition of atoms (or clusters of atoms) generated by the erosion of the walls upon ion bombardment. Titanium has also an intrinsic gettering ability, i.e. it can interact with simple gaseous molecules fixing them through the formation of chemical compounds or the physical sorption.
- an ion pump usually consists in an assembly of a plurality of equal members, its gas sorbing characteristics (the sorbing speed in particular) are an essentially linear function of its size and weight. Since the above-mentioned systems generally require a plurality of pumping units connected to different zones of the vacuum chamber, the set of ion pumps needed for the operation of these systems increases their overall weight and size in a non-negligible way.
- Getter pumps operate on the principle of the chemical sorption of reactive gaseous species such as oxygen, hydrogen, water and carbon oxides by members made of non- evaporable getter materials (known in the field as NEG). The most important NEG materials are zirconium- or titanium-based alloys.
- Getter pumps are described for example in patents US 5,324,172 and US 6,149,392. These pumps have a gas sorbing speed that is remarkably higher than the sorbing speed of ion pumps having similar size and can remove hydrogen much more effectively with respect thereto, whereas their pumping efficiency is poor for hydrocarbons and null for rare gases and they can not provide a measure of the pressure inside the chamber.
- ion and getter pumps provide pumping systems for UHV that are particularly efficient. Similar pumping systems are known for example from the published patent applications JP 58-117371 and GB 2,164,788 as well as from the patent US 5,221,190, which relate to vacuum systems as such, and from the published patent applications JP-A-06-140193 and JP-A-07-263198, which relate to particle accelerators whose vacuum chamber is kept evacuated by using separated ion and getter pumps.
- Patent application US 2006/0231773 describes an electron microscope wherein the vacuum system comprises an ion pump and a getter pump. This document reverses the traditional situation and suggests the use of a getter pump as the main pump in order to exploit its reduced size and the use of a relatively small ion pump for blocking the gases not sorbed by the getter pump.
- This system allows to improve the weight and the size of the vacuum system, but yet has two separated pumps that represent a non- negligible encumbrance for the overall system.
- the critical points in the UHV systems are all the apertures and connections in the chamber wall. This happens because, due to possible defective seals at the microscopic level of flanges, gaskets or brazing materials (in particular in the case of systems that are heated and wherein different thermal dilations of parts made of different materials occur), these apertures may represent preferred degradation points for the vacuum conditions.
- said object is achieved with a combined pumping system comprising a getter pump and an ion pump, wherein the getter pump and the ion pump are mounted on a same flange and are arranged on the same side of the flange at two different points thereof.
- figure 1 shows a schematic cross-sectional view of a pumping system of the invention
- figure 2 shows a perspective simplified view of a first embodiment of the pumping system of the invention
- figure 3 shows a cross-section along line IH-IH' of the system of figure 2
- figure 4 shows a perspective simplified view of an alternative embodiment of the invention
- figure 5 shows a cross-section along line V-V of the embodiment of figure 4.
- Figure 1 shows a schematic cross-sectional view of a pumping system of the invention.
- the system, 10 comprises a flange 11 on which a getter pump 12 and an ion pump 13 are mounted.
- the getter pump 12 and the ion pump 13 are arranged on the same side of flange 11 at two different points thereof.
- Figures 2 and 3 show a first embodiment of the pumping system of the invention.
- the getter pump 12 may be formed of elements made of a NEG material having various shapes and assembled according to different geometries.
- the getter pump 12 is comprised of a series of discs 121, 121', ... made of NEG material stacked up on a central support 122 and kept spaced from each other e.g. by means of metal rings 123 (not visible in figure 1);
- the central support 122 e.g. made of ceramic (alumina is preferred), is hollow and houses at its inside a heating element (not shown in the drawings), which may be formed e.g. of a metal wire resistor made to pass through the holes of a support that is also made of a ceramic material (the holes are parallel to the axis of the support and are through-holes with respect thereto).
- support 122 is fixed to a connector 124, which is provided with electrical feedthroughs, is usually made of ceramic and is fixed to flange 11 by brazing.
- the getter pump shown in the drawings does not have shields around the NEG elements so as to maximize its gas sorbing speed.
- the getter pump may comprise metal shields (for example in the form of perforated plates or grids) arranged around the assembly of the elements made of NEG material, in order to retain metal particles possibly lost by the NEG elements, e.g. when handling the getter pump during its introduction in a vacuum chamber.
- NEG materials may be made of sintered powders of NEG materials and therefore may be relatively compact, but they are preferably porous in order to increase the size of the exposed surface area of the material and thereby the gas sorbing properties of pump.
- Porous elements made of NEG material may be manufactured, for example, according to the process described in patent EP 719609 Bl in the applicant's name.
- Alternative embodiments for NEG getter pumps or NEG materials useful for the invention are described in various publications such as, for example, patents EP 719609 and US 5324172 both in the applicant's name.
- the ion pump 13 is formed of a single member of the type of those being repeated in the traditional ion pumps.
- This pump comprises a single anode element 131 in the form of a hollow cylindrical body provided with open ends and made of a conductive material, generally a metal; the cylindrical body is kept in place by a mount 132 fixed to flange 11 by means of a connector 133 similar to connector 124 and in turn provided with one or more electrical feedthroughs insulated from the flange.
- the axis of the anode element 131 is parallel to the inner surface of the flange.
- the assembly formed of the anode element 131 and of the electrodes 134 and 134' is arranged between two prismatic-shaped hollow elements 135 and 135'.
- the cavity of these elements is outwardly open, i.e. from the side of flange 11 opposite to the side where the anode element 131 is arranged, and the assembly of the two cavities defines a seat for a permanent magnet 136. Therefore, when the pumping system is connected to a vacuum chamber, the permanent magnet 136 is arranged on a side of flange 11 external to the chamber.
- the magnet 136 may be any known permanent magnet suitable for generating high magnetic fields, e.g. of the neodymium-iron-boron or the samarium-cobalt type.
- the magnet 136 is simply inserted in the seat and may be easily removed in order to prevent it from being demagnetized in case of heating of the getter pump or of the chamber to which the system of the invention is connected.
- the walls of the two elements 135, 135', and in particular the walls (generally rectangular-shaped) that are closer to electrodes 134 and 134' and parallel thereto, preferably have a reduced thickness, e.g. in the range of about 0.5-1.5 mm, in order not to shield the magnetic field generated by magnet 136.
- the mount 132 of the anode element 131 is hollow in order to allow the passage of the power supply to the anode element itself.
- the magnet 136 is perforated in order to allow the connection of electrical wires to connector 133.
- One single wire may possibly be provided for supplying the anode element 131; electrical contacts needed for measuring the pressure in the vacuum chamber may also be present.
- the electrodes 134 and 134' are shown supported by mounts 137 and 137' that have the simple mechanical function of keeping the electrodes in place. This is possible when the two electrodes are kept at the potential of the flange. Alternatively, the two electrodes may be in turn electrically supplied (and kept at the same potential with respect to each other and at a negative potential with respect to the potential of the anode element 131).
- mounts 137 and 137' may be in turn connected through supplying wires to further feedthroughs provided in connector 133.
- the magnet is preferably a permanent-type magnet, e.g. chosen between the well- known magnets of the samarium-cobalt or iron-boron-neodymium type.
- the magnet may be easily removed from its seat in order to prevent it from being demagnetized.
- Figures 4 and 5 show an alternative embodiment of the invention in which the ion pump 13 is provided with a permanent magnet 236 having a Curie point higher than 350 0 C, i.e. higher than the most common activation temperatures of the getter materials of the getter pump arranged in the vacuum chamber.
- magnet 236 is U-shaped and an anodic element 231 and a pair of electrodes 234 and 234' are inserted therein. Due to its high Curie point, magnet 236 can withstand the activation temperatures of the getter materials of the getter pump 12, whereby it can be arranged on a side of flange 11 internal to a vacuum chamber when the pumping system is connected thereto. This configuration is particularly advantageous, because it does not require any seat to arrange the magnet on the flange.
- the magnet 236 can be fixed to flange 11 in several possible ways, e.g. by screws, springs and the like.
- a permanent magnet of the so-called "Alnico" type is used.
- Alnico is an acronym indicating a composition based on aluminum (8-12% by weight), nickel (15-26%), cobalt (5-24%) with the possible addition of small percentages of copper and titanium, the rest of the composition being formed of iron.
- Alnico magnets In addition to generating very high magnetic fields, Alnico magnets have a Curie point among the highest ones of all magnetic materials, around 800 0 C, whereby they can withstand any thermal treatment a getter pump may undergo.
- the system of the invention can occupy on the flange 11 a rectangular area not larger than 100x50 mm, so as to be fixed onto a single circular flange having a diameter smaller than 125 mm (corresponding to a flange type known in the field as CF 100) or onto rectangular flanges having a size smaller than 100x150 mm.
- the flange is made of materials known in the field, e.g. AISI 316 L or AISI 304 L steel.
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Electron Tubes For Measurement (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/920,797 US8342813B2 (en) | 2008-03-28 | 2009-03-26 | Combined pumping system comprising a getter pump and an ion pump |
| CN200980109641.8A CN101978463B (zh) | 2008-03-28 | 2009-03-26 | 包括吸气剂泵和离子泵的组合式抽气系统 |
| KR1020107024101A KR101455044B1 (ko) | 2008-03-28 | 2009-03-26 | 게터 펌프 및 이온 펌프를 포함하는 조합형 펌핑 시스템 |
| CA2714274A CA2714274A1 (en) | 2008-03-28 | 2009-03-26 | Combined pumping system comprising a getter pump and an ion pump |
| EP09726197.8A EP2260502B1 (en) | 2008-03-28 | 2009-03-26 | Combined pumping system comprising a getter pump and an ion pump |
| BRPI0910238A BRPI0910238A2 (pt) | 2008-03-28 | 2009-03-26 | sistema de bombeamento combinado. |
| RU2010144064/07A RU2495510C2 (ru) | 2008-03-28 | 2009-03-26 | Комбинированная насосная система, содержащая геттерный насос и ионный насос |
| JP2011501237A JP5302386B2 (ja) | 2008-03-28 | 2009-03-26 | ゲッタポンプ及びイオンポンプを具備する複合排気システム |
| IL208238A IL208238A (en) | 2008-03-28 | 2010-09-19 | An integrated pumping system that includes a getter pump and an ion pump |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITMI20080112 ITMI20080112U1 (it) | 2008-03-28 | 2008-03-28 | Sistema di pompaggio combinato comprendente una pompa getter ed una pompa ionica |
| ITMI2008U000112 | 2008-03-28 | ||
| ITMI2008U000250 | 2008-08-01 | ||
| ITMI20080250 ITMI20080250U1 (it) | 2008-08-01 | 2008-08-01 | Sistema di pompaggio combinato comprendente una pompa getter ed una pompa ionica |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009118398A1 true WO2009118398A1 (en) | 2009-10-01 |
Family
ID=40848542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2009/053634 Ceased WO2009118398A1 (en) | 2008-03-28 | 2009-03-26 | Combined pumping system comprising a getter pump and an ion pump |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US8342813B2 (https=) |
| EP (1) | EP2260502B1 (https=) |
| JP (1) | JP5302386B2 (https=) |
| KR (1) | KR101455044B1 (https=) |
| CN (1) | CN101978463B (https=) |
| BR (1) | BRPI0910238A2 (https=) |
| CA (1) | CA2714274A1 (https=) |
| IL (1) | IL208238A (https=) |
| RU (1) | RU2495510C2 (https=) |
| WO (1) | WO2009118398A1 (https=) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8287247B2 (en) | 2009-03-17 | 2012-10-16 | Saes Getters S.P.A. | Combined pumping system comprising a getter pump and an ion pump |
| WO2014060879A1 (en) | 2012-10-15 | 2014-04-24 | Saes Getters S.P.A. | Getter pump |
| WO2015150974A1 (en) | 2014-04-03 | 2015-10-08 | Saes Getters S.P.A. | Getter pump |
| GB2576968A (en) * | 2019-05-24 | 2020-03-11 | Edwards Ltd | A vacuum pumping system having multiple pumps |
| GB2578293A (en) * | 2018-10-18 | 2020-05-06 | Edwards Ltd | A set of pumps, and a method and system for evacuating a vacuum chamber in a radioactive environment |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102938356B (zh) * | 2012-10-23 | 2015-03-04 | 北京市北分仪器技术有限责任公司 | 用于真空器件的真空保持系统 |
| JP6835592B2 (ja) * | 2014-06-26 | 2021-02-24 | サエス・ゲッターズ・エッセ・ピ・ア | ゲッターポンプシステム |
| JP7008976B2 (ja) * | 2017-11-13 | 2022-01-25 | 国立研究開発法人情報通信研究機構 | 真空作成装置 |
| US10264634B2 (en) * | 2018-04-20 | 2019-04-16 | Advanced Regulated Power Technology, Inc. | Adaptive power regulation of LED driver module for emergency lighting |
| CN108757380B (zh) * | 2018-05-18 | 2019-11-19 | 南京华东电子真空材料有限公司 | 结构简单便于安装的组合泵 |
| CN111377081A (zh) * | 2018-12-27 | 2020-07-07 | 云南全控机电有限公司 | 一种抽真空的封装设备 |
| US11454229B1 (en) | 2019-09-16 | 2022-09-27 | Wavefront Research, Inc. | Dewar vacuum maintenance systems for intermittently powered sensors |
| GB2592655B (en) * | 2020-03-05 | 2023-01-11 | Edwards Vacuum Llc | Pump module |
| GB2592653B (en) * | 2020-03-05 | 2022-12-28 | Edwards Vacuum Llc | Vacuum module and vacuum apparatus and method for regeneration of a volume getter vacuum pump |
| GB2592654B (en) * | 2020-03-05 | 2022-12-14 | Edwards Vacuum Llc | Pump module |
| GB2627462B (en) * | 2023-02-22 | 2025-06-11 | Edwards Vacuum Llc | Magnetic assembly for a sputter ion pump |
| GB2627459A (en) * | 2023-02-22 | 2024-08-28 | Edwards Vacuum Llc | Sputter Ion pump module and vacuum pump |
| CN120867997A (zh) * | 2025-09-03 | 2025-10-31 | 上海晶维材料科技有限公司 | 一种复合吸气泵 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2164788A (en) * | 1984-09-21 | 1986-03-26 | Siemens Ag | A getter/ion atomisation combination pump for high vacuum and ultra-high vacuum systems |
| US5221190A (en) * | 1991-04-02 | 1993-06-22 | Leybold Aktiengesellschaft | Ion sputtering pump with getter module |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3236442A (en) * | 1964-01-20 | 1966-02-22 | Morris Associates | Ionic vacuum pump |
| US3596123A (en) * | 1969-09-18 | 1971-07-27 | Varian Associates | Anode structure for a magnetically confined glow discharge getter ion pump |
| GB2026231B (en) * | 1978-05-30 | 1982-10-27 | Emi Ltd | Mass spectrometers |
| SU943920A1 (ru) * | 1980-12-17 | 1982-07-15 | Предприятие П/Я А-3634 | Комбинированный магниторазр дный геттерно-ионный насос |
| JPS58117371A (ja) | 1981-12-30 | 1983-07-12 | Ulvac Corp | バルクゲツタポンプとスパツタイオンポンプを組合わせた超高真空ポンプ |
| SU1034100A1 (ru) * | 1982-01-29 | 1983-08-07 | Предприятие П/Я А-3634 | Комбинированный магниторазр дный геттерно-ионный насос |
| JPH0334046Y2 (https=) * | 1984-10-02 | 1991-07-18 | ||
| JPS62218834A (ja) * | 1986-03-20 | 1987-09-26 | Seiko Instr & Electronics Ltd | 気体圧力計 |
| JPH03222876A (ja) * | 1990-01-26 | 1991-10-01 | Jeol Ltd | 複合ポンプ |
| IT1255438B (it) * | 1992-07-17 | 1995-10-31 | Getters Spa | Pompa getter non evaporabile |
| JPH06140193A (ja) | 1992-10-21 | 1994-05-20 | Mitsubishi Electric Corp | Sr装置用ビームチェンバ |
| JPH07263198A (ja) | 1994-03-18 | 1995-10-13 | Hitachi Ltd | 加速器及び真空排気装置 |
| TW287117B (https=) | 1994-12-02 | 1996-10-01 | Getters Spa | |
| IT1290548B1 (it) * | 1997-02-24 | 1998-12-10 | Getters Spa | Pompa getter con armatura di sostegno in unico pezzo di una molteplicita' di elementi getter non evaporabili tra loro paralleli |
| IT1295340B1 (it) * | 1997-10-15 | 1999-05-12 | Getters Spa | Pompa getter ad elevata velocita' di assorbimento di gas |
| JP2006066267A (ja) * | 2004-08-27 | 2006-03-09 | Canon Inc | 画像表示装置 |
| JP2006098898A (ja) * | 2004-09-30 | 2006-04-13 | Tdk Corp | 真空装置用フランジ及び該フランジを用いた真空装置 |
| JP4751635B2 (ja) * | 2005-04-13 | 2011-08-17 | 株式会社日立ハイテクノロジーズ | 磁界重畳型電子銃 |
-
2009
- 2009-03-26 WO PCT/EP2009/053634 patent/WO2009118398A1/en not_active Ceased
- 2009-03-26 JP JP2011501237A patent/JP5302386B2/ja active Active
- 2009-03-26 RU RU2010144064/07A patent/RU2495510C2/ru active
- 2009-03-26 BR BRPI0910238A patent/BRPI0910238A2/pt not_active IP Right Cessation
- 2009-03-26 KR KR1020107024101A patent/KR101455044B1/ko active Active
- 2009-03-26 CN CN200980109641.8A patent/CN101978463B/zh active Active
- 2009-03-26 EP EP09726197.8A patent/EP2260502B1/en active Active
- 2009-03-26 US US12/920,797 patent/US8342813B2/en active Active
- 2009-03-26 CA CA2714274A patent/CA2714274A1/en not_active Abandoned
-
2010
- 2010-09-19 IL IL208238A patent/IL208238A/en active IP Right Grant
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2164788A (en) * | 1984-09-21 | 1986-03-26 | Siemens Ag | A getter/ion atomisation combination pump for high vacuum and ultra-high vacuum systems |
| US5221190A (en) * | 1991-04-02 | 1993-06-22 | Leybold Aktiengesellschaft | Ion sputtering pump with getter module |
Non-Patent Citations (1)
| Title |
|---|
| JOHN F. O'HANLON: "A User's Guide to Vacuum Technology", 2003, JOHN WILEY & SONS, INC, HOBOKEN, NJ, USA, XP002537656 * |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2010225069B2 (en) * | 2009-03-17 | 2014-10-09 | Saes Getters S.P.A. | Combined pumping system comprising a getter pump and an ion pump |
| US8287247B2 (en) | 2009-03-17 | 2012-10-16 | Saes Getters S.P.A. | Combined pumping system comprising a getter pump and an ion pump |
| US9638183B2 (en) | 2012-10-15 | 2017-05-02 | Saes Getters S.P.A. | Getter pump |
| WO2014060879A1 (en) | 2012-10-15 | 2014-04-24 | Saes Getters S.P.A. | Getter pump |
| WO2015150974A1 (en) | 2014-04-03 | 2015-10-08 | Saes Getters S.P.A. | Getter pump |
| US9541078B2 (en) | 2014-04-03 | 2017-01-10 | Saes Getters S.P.A. | Getter pump |
| CN106133314A (zh) * | 2014-04-03 | 2016-11-16 | 工程吸气公司 | 吸气剂泵 |
| CN106133314B (zh) * | 2014-04-03 | 2017-09-22 | 工程吸气公司 | 吸气剂泵 |
| RU2673834C2 (ru) * | 2014-04-03 | 2018-11-30 | Саес Геттерс С.П.А. | Геттерный насос |
| TWI660125B (zh) * | 2014-04-03 | 2019-05-21 | 義大利商沙斯格特斯公司 | 吸氣泵 |
| GB2578293A (en) * | 2018-10-18 | 2020-05-06 | Edwards Ltd | A set of pumps, and a method and system for evacuating a vacuum chamber in a radioactive environment |
| GB2576968A (en) * | 2019-05-24 | 2020-03-11 | Edwards Ltd | A vacuum pumping system having multiple pumps |
| GB2576968B (en) * | 2019-05-24 | 2021-12-08 | Edwards Ltd | A vacuum pumping system having multiple pumps |
| US11815079B2 (en) | 2019-05-24 | 2023-11-14 | Edwards Limited | Vacuum pumping system having multiple pumps |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011517836A (ja) | 2011-06-16 |
| CA2714274A1 (en) | 2009-10-01 |
| CN101978463A (zh) | 2011-02-16 |
| US20110014063A1 (en) | 2011-01-20 |
| IL208238A (en) | 2014-05-28 |
| KR101455044B1 (ko) | 2014-10-27 |
| JP5302386B2 (ja) | 2013-10-02 |
| US8342813B2 (en) | 2013-01-01 |
| RU2495510C2 (ru) | 2013-10-10 |
| KR20110004399A (ko) | 2011-01-13 |
| CN101978463B (zh) | 2013-02-13 |
| RU2010144064A (ru) | 2012-05-10 |
| EP2260502A1 (en) | 2010-12-15 |
| EP2260502B1 (en) | 2023-05-03 |
| IL208238A0 (en) | 2010-12-30 |
| BRPI0910238A2 (pt) | 2015-09-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2260502B1 (en) | Combined pumping system comprising a getter pump and an ion pump | |
| AU2010225069B2 (en) | Combined pumping system comprising a getter pump and an ion pump | |
| JP2009128276A (ja) | 電離真空装置 | |
| CN210560702U (zh) | 一种磁控溅射靶枪 | |
| KR101134308B1 (ko) | 표면처리된 영구자석을 구비한 이온 펌프 | |
| Schulz | Sputter-ion pumps | |
| US20070286738A1 (en) | Vacuum ion-getter pump with cryogenically cooled cathode | |
| US7413412B2 (en) | Vacuum micropump and gauge | |
| KR100860274B1 (ko) | 저온 가열탈기체 처리 가능한 소형, 경량 초고진공용스퍼터 이온펌프 및 그제조방법 | |
| HK1164405B (en) | Combined pumping system comprising a getter pump and an ion pump | |
| CN112901448A (zh) | 一种吸气/离子复合一体泵 | |
| JP4639027B2 (ja) | スパッタイオンポンプ | |
| JPS63205475A (ja) | スパツタイオンポンプ | |
| Gaikwad et al. | High efficiency, Combined Triode S Pump for Extreme High Vacuum |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 200980109641.8 Country of ref document: CN |
|
| DPE2 | Request for preliminary examination filed before expiration of 19th month from priority date (pct application filed from 20040101) | ||
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09726197 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2714274 Country of ref document: CA |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2914/KOLNP/2010 Country of ref document: IN |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 12920797 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: PI 2010004462 Country of ref document: MY |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2011501237 Country of ref document: JP |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| REEP | Request for entry into the european phase |
Ref document number: 2009726197 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2009726197 Country of ref document: EP |
|
| ENP | Entry into the national phase |
Ref document number: 20107024101 Country of ref document: KR Kind code of ref document: A |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2010144064 Country of ref document: RU |
|
| ENP | Entry into the national phase |
Ref document number: PI0910238 Country of ref document: BR Kind code of ref document: A2 Effective date: 20100921 |