WO2009072603A1 - パターン描画方法および装置 - Google Patents

パターン描画方法および装置 Download PDF

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Publication number
WO2009072603A1
WO2009072603A1 PCT/JP2008/072151 JP2008072151W WO2009072603A1 WO 2009072603 A1 WO2009072603 A1 WO 2009072603A1 JP 2008072151 W JP2008072151 W JP 2008072151W WO 2009072603 A1 WO2009072603 A1 WO 2009072603A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid droplet
substrate
wettability
suppressed
fine
Prior art date
Application number
PCT/JP2008/072151
Other languages
English (en)
French (fr)
Inventor
Jun Akedo
Akito Endo
Original Assignee
National Institute Of Advanced Industrial Science And Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute Of Advanced Industrial Science And Technology filed Critical National Institute Of Advanced Industrial Science And Technology
Priority to US12/745,295 priority Critical patent/US8398227B2/en
Priority to JP2009544735A priority patent/JP5187913B2/ja
Priority to KR1020107012949A priority patent/KR101220628B1/ko
Publication of WO2009072603A1 publication Critical patent/WO2009072603A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/111—Preheating, e.g. before soldering

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Coating Apparatus (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

　従来のインクジェットを用いた微細配線技術では、基板の濡れ性によって、液滴が着弾後大きく広がり、微細で厚みのある配線パターンを高速に形成するのが容易でなかった。本発明では、基板上の液滴が着弾する箇所を予め加熱し、着弾直後の液滴を迅速に固化し、基板との濡れによる液滴の広がりを抑制し、同時に基板加熱によるノズルの詰まりも抑制し、基板材質に依存せず従来より体積が大きい液滴を用いても、液滴サイズに近い線幅の厚みのある微細配線の高速描画を実現した。
PCT/JP2008/072151 2007-12-06 2008-12-05 パターン描画方法および装置 WO2009072603A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/745,295 US8398227B2 (en) 2007-12-06 2008-12-05 Pattern drawing method and pattern drawing apparatus
JP2009544735A JP5187913B2 (ja) 2007-12-06 2008-12-05 パターン描画方法および装置
KR1020107012949A KR101220628B1 (ko) 2007-12-06 2008-12-05 패턴 묘화 방법 및 장치

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007316154 2007-12-06
JP2007-316154 2007-12-06
JP2008-195512 2008-07-29
JP2008195512 2008-07-29

Publications (1)

Publication Number Publication Date
WO2009072603A1 true WO2009072603A1 (ja) 2009-06-11

Family

ID=40717781

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/072151 WO2009072603A1 (ja) 2007-12-06 2008-12-05 パターン描画方法および装置

Country Status (4)

Country Link
US (1) US8398227B2 (ja)
JP (1) JP5187913B2 (ja)
KR (1) KR101220628B1 (ja)
WO (1) WO2009072603A1 (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005404A (ja) * 2009-06-25 2011-01-13 Dainippon Screen Mfg Co Ltd 配線形成装置、配線形成方法および配線形成用材料
JP2011204748A (ja) * 2010-03-24 2011-10-13 Fukuoka Univ 配線パターン形成方法、及び配線基板
JP2014022149A (ja) * 2012-07-17 2014-02-03 Dainippon Screen Mfg Co Ltd 電池用電極製造装置、電池用電極製造のためのノズルおよび電池用電極の製造方法
WO2014050252A1 (ja) 2012-09-26 2014-04-03 富士フイルム株式会社 パターン形成方法、電子配線基板、光学デバイスおよびパターン形成装置
WO2014069350A1 (ja) * 2012-10-30 2014-05-08 独立行政法人産業技術総合研究所 基材上に形成した構造体、構造体の製造方法および線パターン
JP2014185358A (ja) * 2013-03-22 2014-10-02 M&M Research Inst レーザを用いる焼結体膜形成方法及び焼結体膜形成装置
JP2015030010A (ja) * 2013-08-02 2015-02-16 株式会社タムラ製作所 フラックス塗布方法、フラックス塗布装置及びはんだ付システム
US9120335B2 (en) 2012-08-30 2015-09-01 Advantest Corporation Pattern printing apparatus, pattern printing method, and test apparatus
WO2018180803A1 (ja) * 2017-03-29 2018-10-04 住友重機械工業株式会社 膜形成装置及び膜形成方法
WO2023074507A1 (ja) * 2021-10-25 2023-05-04 富士フイルム株式会社 電子デバイスの製造方法
JP7404695B2 (ja) 2019-07-30 2023-12-26 株式会社リコー インク吐出装置、インク吐出システム及びインク吐出方法
JP7436262B2 (ja) 2020-03-30 2024-02-21 本田技研工業株式会社 配線印刷ヘッド及び配線印刷装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015147124A1 (ja) * 2014-03-28 2015-10-01 トッパン・フォームズ株式会社 積層体
US10390433B2 (en) * 2015-03-31 2019-08-20 Texas Instruments Incorporated Methods of forming conductive and resistive circuit structures in an integrated circuit or printed circuit board
US10744540B2 (en) * 2018-04-12 2020-08-18 The Regents Of The University Of California Reversing coffee-ring effect by laser-induced differential evaporation
CN113207235A (zh) * 2021-04-28 2021-08-03 北京航空航天大学 一种基于Leidenfrost现象的纳米微粒沉积方法
CN115213051B (zh) * 2022-07-20 2023-08-15 郭鋆 一种线材实时全彩色染色机构及其使用方法和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006239899A (ja) * 2005-02-28 2006-09-14 Seiko Epson Corp パターン形成方法、識別コード形成方法、液滴吐出装置、電気光学装置の製造方法及び電気光学装置
JP2007042689A (ja) * 2005-07-29 2007-02-15 Fujifilm Holdings Corp 金属アルコキシド溶液、それを用いた半導体デバイスの製造方法及び半導体デバイス
JP2008085345A (ja) * 2006-09-27 2008-04-10 Samsung Electro Mech Co Ltd 微細配線形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3975272B2 (ja) 2002-02-21 2007-09-12 独立行政法人産業技術総合研究所 超微細流体ジェット装置
TWI562380B (en) * 2005-01-28 2016-12-11 Semiconductor Energy Lab Co Ltd Semiconductor device, electronic device, and method of manufacturing semiconductor device
JP2006247495A (ja) * 2005-03-09 2006-09-21 Kitakyushu Foundation For The Advancement Of Industry Science & Technology 微細パターンの描画方法およびその装置
JP2007296426A (ja) * 2006-04-27 2007-11-15 Seiko Epson Corp パターン形成方法、液滴吐出装置及び回路モジュール

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006239899A (ja) * 2005-02-28 2006-09-14 Seiko Epson Corp パターン形成方法、識別コード形成方法、液滴吐出装置、電気光学装置の製造方法及び電気光学装置
JP2007042689A (ja) * 2005-07-29 2007-02-15 Fujifilm Holdings Corp 金属アルコキシド溶液、それを用いた半導体デバイスの製造方法及び半導体デバイス
JP2008085345A (ja) * 2006-09-27 2008-04-10 Samsung Electro Mech Co Ltd 微細配線形成方法

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005404A (ja) * 2009-06-25 2011-01-13 Dainippon Screen Mfg Co Ltd 配線形成装置、配線形成方法および配線形成用材料
JP2011204748A (ja) * 2010-03-24 2011-10-13 Fukuoka Univ 配線パターン形成方法、及び配線基板
JP2014022149A (ja) * 2012-07-17 2014-02-03 Dainippon Screen Mfg Co Ltd 電池用電極製造装置、電池用電極製造のためのノズルおよび電池用電極の製造方法
US9120335B2 (en) 2012-08-30 2015-09-01 Advantest Corporation Pattern printing apparatus, pattern printing method, and test apparatus
WO2014050252A1 (ja) 2012-09-26 2014-04-03 富士フイルム株式会社 パターン形成方法、電子配線基板、光学デバイスおよびパターン形成装置
US9596758B2 (en) 2012-09-26 2017-03-14 Fujifilm Corporation Pattern forming method, electronic wiring substrate, and optical device
JPWO2014069350A1 (ja) * 2012-10-30 2016-09-08 国立研究開発法人産業技術総合研究所 基材上に形成した構造体、構造体の製造方法および線パターン
JP2016163888A (ja) * 2012-10-30 2016-09-08 国立研究開発法人産業技術総合研究所 基材上に形成した構造体、構造体の製造方法および線パターン
WO2014069350A1 (ja) * 2012-10-30 2014-05-08 独立行政法人産業技術総合研究所 基材上に形成した構造体、構造体の製造方法および線パターン
US9807887B2 (en) 2012-10-30 2017-10-31 National Institute Of Advanced Industrial Science And Technology Structure formed on substrate, structure manufacturing method and line pattern
US10212822B2 (en) 2012-10-30 2019-02-19 National Institute Of Advanced Industrial Science And Technology Structure formed on substrate, structure manufacturing method and line pattern
JP2014185358A (ja) * 2013-03-22 2014-10-02 M&M Research Inst レーザを用いる焼結体膜形成方法及び焼結体膜形成装置
JP2015030010A (ja) * 2013-08-02 2015-02-16 株式会社タムラ製作所 フラックス塗布方法、フラックス塗布装置及びはんだ付システム
WO2018180803A1 (ja) * 2017-03-29 2018-10-04 住友重機械工業株式会社 膜形成装置及び膜形成方法
CN110446558A (zh) * 2017-03-29 2019-11-12 住友重机械工业株式会社 膜形成装置及膜形成方法
JPWO2018180803A1 (ja) * 2017-03-29 2020-02-06 住友重機械工業株式会社 膜形成装置及び膜形成方法
JP7404695B2 (ja) 2019-07-30 2023-12-26 株式会社リコー インク吐出装置、インク吐出システム及びインク吐出方法
JP7436262B2 (ja) 2020-03-30 2024-02-21 本田技研工業株式会社 配線印刷ヘッド及び配線印刷装置
WO2023074507A1 (ja) * 2021-10-25 2023-05-04 富士フイルム株式会社 電子デバイスの製造方法

Also Published As

Publication number Publication date
US8398227B2 (en) 2013-03-19
KR101220628B1 (ko) 2013-01-21
JPWO2009072603A1 (ja) 2011-04-28
US20100302319A1 (en) 2010-12-02
KR20100087378A (ko) 2010-08-04
JP5187913B2 (ja) 2013-04-24

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