WO2018180803A1 - 膜形成装置及び膜形成方法 - Google Patents
膜形成装置及び膜形成方法 Download PDFInfo
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- WO2018180803A1 WO2018180803A1 PCT/JP2018/011138 JP2018011138W WO2018180803A1 WO 2018180803 A1 WO2018180803 A1 WO 2018180803A1 JP 2018011138 W JP2018011138 W JP 2018011138W WO 2018180803 A1 WO2018180803 A1 WO 2018180803A1
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- WIPO (PCT)
- Prior art keywords
- substrate
- film forming
- ink
- inkjet head
- heated
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
- B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/02—Ink jet characterised by the jet generation process generating a continuous ink jet
- B41J2002/022—Control methods or devices for continuous ink jet
Definitions
- the present invention relates to a film forming apparatus and a film forming method.
- Patent Document 1 An apparatus that draws photocurable (ultraviolet curable) ink from an inkjet head or the like to draw on a recording medium such as a substrate is known (Patent Document 1). After the ultraviolet curable ink is disposed on the recording medium, the ink can be quickly cured by irradiating an appropriate amount of ultraviolet rays.
- UV curable ink used for printed circuit board solder resist applications has higher viscosity than normal ink. For this reason, it is preferable to reduce the viscosity to such an extent that the ink can be ejected from the inkjet head by heating the ink supplied to the inkjet head. When the temperature of the ink becomes too high, the deterioration of the ink is accelerated. If the temperature of the ink is too low, the viscosity of the ink becomes higher than the target viscosity, so that ink ejection becomes unstable and ink clogging tends to occur.
- An object of the present invention is to provide a film forming apparatus and a film forming method capable of quickly curing ink without using photocurable ink.
- a table for holding the substrate There is provided a film forming apparatus comprising: an inkjet head that discharges thermosetting ink toward the substrate held on the table; and a non-contact heating unit that heats the substrate held on the table in a non-contact manner.
- Heating a partial region of the substrate in a non-contact manner there is provided a film forming method including a step of forming a film by attaching a thermosetting ink to a heated region of the substrate and curing the ink.
- thermosetting ink can be cured by attaching the thermosetting ink to a region where the substrate is heated by non-contact means.
- FIG. 1A is a schematic side view of a film forming apparatus according to an embodiment
- FIG. 1B is a perspective view of a laser light source
- FIG. 1C is relative to an inkjet head, a beam cross section of a laser beam, and a moving direction of a substrate. It is a top view which shows a relationship.
- FIG. 2A is a cross-sectional view of the substrate to be simulated
- FIG. 2B is a diagram showing the positional relationship between the beam spot on the surface of the substrate and a specific location on the substrate
- FIG. 2C is the temperature at the specific location. It is a graph which shows the simulation result of change.
- FIG. 3 is a graph showing the wavelength dependence of the reflectivity of electropolished gold, silver, and copper.
- FIG. 4A is a schematic side view of a film forming apparatus according to another embodiment
- FIG. 4B is a relative relationship between the ink jet head of the film forming apparatus according to this embodiment, the beam cross section by the laser light source, and the direction in which the substrate moves.
- FIG. FIG. 5 is a graph showing the light intensity distribution in the major axis direction of the beam cross section of a film forming apparatus according to another embodiment.
- FIG. 1A is a schematic side view of a film forming apparatus according to the present embodiment.
- the table 10 holds the substrate 30 on its upper surface.
- the table 10 has, for example, a vacuum chuck mechanism, and sucks and fixes the substrate 30.
- the ink jet head 15 ejects thermosetting ink toward the substrate 30 held on the table 10.
- the laser light source 16 as a non-contact heating means irradiates the substrate 30 held on the table 10 with a laser beam, thereby heating a partial region of the substrate 30 in a non-contact manner.
- the moving mechanism 13 moves one of the substrate 30 and the inkjet head 15 held on the table 10 with respect to the other.
- the moving direction is parallel to the upper surface of the table 10.
- the moving mechanism 13 includes a guide 11 that guides the table 10 in one direction, and a drive unit 12 that moves the table 10 along the guide 11.
- Control device 20 controls ejection of ink from inkjet head 15. Further, the control device 20 controls the drive unit 12 to move the table 10 at the target speed.
- the control device 20 stores pattern data that defines the planar shape of the film to be formed.
- the control device 20 controls the ink jet head 15 and the moving mechanism 13 based on the pattern data, so that the thermosetting ink can be attached to a desired location on the upper surface of the substrate 30 and the resin film 32 can be formed.
- FIG. 1B is a perspective view of the laser light source 16.
- the laser light source 16 outputs a laser beam 18 having a long beam cross section 18A.
- a laser diode (LD) bar with a water cooling mechanism can be used as the laser light source 16.
- the oscillation wavelength of the laser light source 16 is, for example, 808 nm, and the beam cross section has a long shape with a dimension in the major axis direction of about 50 mm.
- the direction of movement of the substrate 30 during film formation is orthogonal to the long axis direction of the beam cross section.
- the divergence angle in the minor axis direction is about 1 ° with a lens, and the beam size in the minor axis direction on a substrate 50 mm away is about 1.5 mm.
- the output of the laser light source 16 is set to a magnitude that can raise the temperature of the substrate 30 to a target temperature.
- FIG. 1C is a plan view showing a relative relationship among the inkjet head 15, the beam cross section 18A of the laser beam, and the moving direction 58 of the substrate 30.
- FIG. A nozzle row 15 ⁇ / b> A composed of a plurality of nozzle holes of the inkjet head 15 is orthogonal to the moving direction 58 of the substrate 30.
- an elongated beam cross section 18A is arranged in parallel to the nozzle row 15A.
- the beam cross section 18A is longer than the nozzle row 15A. For this reason, the whole area to which the thermosetting ink discharged from the inkjet head 15 adheres can be heated by laser irradiation.
- the control device 20 operates the moving mechanism 13 so as to pass under the inkjet head 15 after a partial region of the substrate 30 is heated by the laser light source 16. Thereby, a partial region of the substrate 30 is heated in a non-contact manner by the laser light source 16, and then the ink ejected from the inkjet head 15 adheres to the heated region.
- the power density of the laser beam, the dimension of the beam cross section, and the moving speed of the substrate 30 are set so that the surface temperature of the substrate 30 when the ink adheres to the substrate 30 is maintained at or above the curing temperature of the ink. For this reason, the ink discharged from the inkjet head 15 is cured immediately after adhering to the substrate 30.
- the region to be heated and the region to which the thermosetting ink is attached move within the surface of the substrate 30.
- the resin film 32 in which the thermosetting ink is cured can be formed on the surface of the substrate 30.
- thermosetting ink is used for film formation.
- a thermosetting ink is superior in adhesion and chemical resistance to various materials and has a lower viscosity than an ultraviolet curable ink.
- the substrate 30 is locally heated using the laser light source 16.
- the entire substrate 30 can be heated substantially uniformly by providing the table 10 (FIG. 1A) with a hot plate function.
- no waiting time for heating is required, it is possible to avoid a decrease in throughput due to the heat treatment.
- the laser light source 16 (FIG. 1B) is used as the non-contact heating means.
- a heating device that can locally heat the substrate 30 in a non-contact manner may be used.
- a device that heats by light energy such as a light emitting diode (LED), a high frequency induction heating device, or the like can be used.
- the substrate 30 is moved with respect to the laser light source 16 and the ink jet head 15, but conversely, the laser light source 16 and the ink jet head 15 may be moved with respect to the substrate 30.
- the laser beam output from the laser light source 16 is a continuous wave laser beam, but may be a pulsed laser beam.
- the nozzle row 15A (FIG. 1C) is orthogonal to the moving direction 58 (FIG. 1C) of the substrate 30, but it is not necessarily required to be orthogonal.
- the nozzle row 15 ⁇ / b> A may be crossed with respect to the moving direction 58 of the substrate 30.
- FIG. 2A is a cross-sectional view of the substrate 50 to be simulated.
- the substrate 50 has a three-layer structure including an epoxy substrate 51 having a thickness of 800 ⁇ m, a copper foil 52 having a thickness of 30 ⁇ m, and an epoxy layer 53 having a thickness of 10 ⁇ m.
- the resin film 32 (FIG. 1A) is not formed on the substrate 30 when the laser beam is irradiated, but it is necessary to heat the ink adhering to the substrate 30 to the curing temperature. Therefore, in the simulation, the epoxy layer 53 corresponding to the ink adhered to the substrate 30 was included in the heating target.
- FIG. 2B is a diagram illustrating a positional relationship between the beam spot 56 on the surface of the substrate 50 and a specific portion 55 on the substrate 50.
- the diameter of the beam spot 56 was 0.5 mm
- the power density of the laser beam on the surface of the substrate 50 was 12 kW / cm 2
- the moving speed of the substrate 50 was 200 mm / s.
- a specific portion 55 on the substrate 50 moves at a moving speed of 200 mm / s and passes through the center of the beam spot 56.
- the time for which the specific portion 55 is irradiated with the laser beam is 2.5 ms. In the simulation, it was assumed that the entire energy of the laser beam was absorbed.
- FIG. 2C is a graph showing a simulation result of the temperature change of the surface of the copper foil 52 at a specific location 55.
- the horizontal axis represents elapsed time in the unit “ms”, and the vertical axis represents temperature in the unit “° C.”.
- the temperature at which the decrease in temperature is moderate varies depending on the power density of the laser beam and the irradiation time (the size of the beam spot 56). If the temperature at which the temperature decrease is moderate is equal to or higher than the ink curing temperature, it is considered that the thermosetting ink can be cured.
- thermosetting ink can be cured by adjusting the power density of the laser beam and the size of the beam spot 56.
- thermosetting ink After irradiating the copper foil with a laser beam under the conditions of a wavelength of 808 nm, a beam spot diameter of 0.5 mm, and a moving speed of the substrate of 200 mm / s, a thermosetting ink was sprayed onto the heated copper foil. As a result, it was confirmed that the thermosetting ink was cured in the region irradiated with the laser.
- FIG. 3 is a graph showing the wavelength dependence of the reflectivity of electropolished gold, silver, and copper.
- the horizontal axis represents the wavelength in the unit “nm”, and the vertical axis represents the reflectance.
- FIG. 3 shows that, for example, when a copper foil is provided on the substrate surface, it is preferable to use a laser beam having a wavelength region of 570 nm or less. It can be seen that when a gold foil is provided on the substrate surface, it is preferable to use a laser beam having a wavelength region of 520 nm or less. It can be seen that when a silver foil is provided on the substrate surface, it is preferable to use a laser beam having a wavelength region of 350 nm or less.
- FIGS. 4A and 4B a film forming apparatus according to another embodiment will be described with reference to FIGS. 4A and 4B.
- the description of the configuration common to the embodiment shown in FIGS. 1A to 1C will be omitted.
- FIG. 4A is a schematic side view of the film forming apparatus according to the present embodiment.
- the laser light source 16 is disposed only on one side of the inkjet head 15, but in this embodiment, the laser light sources 16 and 17 are disposed on both sides of the inkjet head 15, respectively. .
- FIG. 4B is a plan view showing a relative relationship between the inkjet head 15 of the film forming apparatus according to the present embodiment, beam cross sections 18A and 19A by the laser light sources 16 and 17, and directions 58A and 58B in which the substrate 30 moves. Beam sections 18A and 19A are arranged on both sides of the nozzle row 15A, respectively.
- the laser light source 16 for the beam cross section 18A is operated, and the other laser light source 17 is not operated.
- the laser light source 17 for the beam cross section 19A is operated, and the other laser light source 16 is not operated.
- a film can be formed by ejecting ink from the inkjet head 15 even when the substrate 30 is moved in any of two opposite directions.
- FIG. 5 is a graph showing the light intensity distribution in the major axis direction of the beam cross section 18A.
- the light intensity is substantially constant.
- the light intensity is higher than in other regions.
Abstract
Description
基板を保持するテーブルと、
前記テーブルに保持された前記基板に向けて熱硬化性インクを吐出するインクジェットヘッドと
前記テーブルに保持された前記基板を非接触で加熱する非接触加熱手段と
を有する膜形成装置が提供される。
基板の一部の領域を非接触で加熱する工程と、
前記基板の加熱された領域に、熱硬化性インクを付着させて硬化させることにより膜を形成する工程と
を有する膜形成方法が提供される。
図1Aは、本実施例による膜形成装置の概略側面図である。テーブル10が、その上面に基板30を保持する。テーブル10は、例えば真空チャック機構を有しており、基板30を吸着して固定する。インクジェットヘッド15が、テーブル10に保持された基板30に向けて熱硬化性のインクを吐出する。非接触加熱手段としてのレーザ光源16が、テーブル10に保持された基板30にレーザビームを照射することにより、基板30の一部の領域を非接触で加熱する。
制御装置20は、基板30の一部の領域がレーザ光源16で加熱された後、インクジェットヘッド15の下を通過するように移動機構13を動作させる。これにより、基板30の一部の領域がレーザ光源16によって非接触で加熱され、その後、加熱された領域にインクジェットヘッド15から吐出されたインクが付着する。インクが基板30に付着するときの基板30の表面温度がインクの硬化温度以上に維持されるように、レーザビームのパワー密度、ビーム断面の寸法、基板30の移動速度が設定されている。このため、インクジェットヘッド15から吐出されたインクは、基板30に付着した直後に硬化する。
上記実施例では、膜形成のために熱硬化性のインクが用いられる。一般的に、熱硬化性のインクは、紫外線硬化性のインクよりも各種素材に対する密着性や耐薬品性に優れており低粘度である。例えば、室温でインクジェットヘッド15から安定してインクを吐出させることが可能な程度の低粘度の熱硬化性のインクを入手することが可能である。このため、インクの粘度を低下させるためのインク加熱装置を準備する必要がない。
図3は、電解研磨した金、銀、銅の反射率の波長依存性を示すグラフである。横軸は波長を単位「nm」で表し、縦軸は反射率を表す。基板上の金属箔を効果的に加熱するためには、反射率の低い波長域のレーザビームを用いることが好ましい。図3から、例えば、基板表面に銅箔が設けられている場合には、570nm以下の波長域のレーザビームを用いることが好ましいことがわかる。基板表面に金箔が設けられている場合には、520nm以下の波長域のレーザビームを用いることが好ましいことがわかる。基板表面に銀箔が設けられている場合には、350nm以下の波長域のレーザビームを用いることが好ましいことがわかる。
11 ガイド
12 駆動部
13 移動機構
15 インクジェットヘッド
15A ノズル列
16、17 レーザ光源
18 レーザビーム
18A、19A ビーム断面
20 制御装置
30 基板
32 樹脂膜
50 シミュレーション対象の基板
51 エポキシ基板
52 銅箔
53 エポキシ層
55 基板上の特定の箇所
56 ビームスポット
58、58A、58B 基板が移動する方向
Claims (8)
- 基板を保持するテーブルと、
前記テーブルに保持された前記基板に向けて熱硬化性インクを吐出するインクジェットヘッドと
前記テーブルに保持された前記基板を非接触で加熱する非接触加熱手段と
を有する膜形成装置。 - さらに、
前記テーブルに保持された前記基板と、前記インクジェットヘッドとの一方を他方に対して移動させる移動機構と、
前記インクジェットヘッド及び前記移動機構を制御する制御装置と
を有し、
前記非接触加熱手段は、前記テーブルに保持された前記基板の一部の領域を加熱し、
前記制御装置は、前記非接触加熱手段で加熱された領域に、前記インクジェットヘッドから吐出された前記熱硬化性インクが付着するように前記移動機構及び前記インクジェットヘッドを制御する請求項1に記載の膜形成装置。 - 前記非接触加熱手段は、前記テーブルに保持された前記基板の一部の領域にレーザビームを入射させることにより、前記基板を加熱する請求項1に記載の膜形成装置。
- 前記インクジェットヘッドは、前記基板の移動方向に対して交差する方向に並んだ複数のノズルからなるノズル列を含み、
前記非接触加熱手段で加熱される領域は、前記ノズル列に平行で、前記ノズル列より長い長尺形状を有する請求項2または3に記載の膜形成装置。 - 前記インクジェットヘッドは、前記基板の移動方向に対して交差する方向に並んだ複数のノズルからなるノズル列を含み、
前記非接触加熱手段によってレーザビームが入射する領域は、前記ノズル列に平行な長尺形状を有し、長尺形状の両端における光強度が、他の領域における光る強度より高い光強度分布を持つ請求項3に記載の膜形成装置。 - 基板の一部の領域を非接触で加熱する工程と、
前記基板の加熱された領域に、熱硬化性インクを付着させて硬化させることにより膜を形成する工程と
を有する膜形成方法。 - 前記加熱する工程において、前記基板にレーザビームを入射させることにより前記基板の一部の領域を加熱する請求項6に記載の膜形成方法。
- 前記加熱する領域、及び前記熱硬化性インクを付着させる領域を、前記基板の表面内で移動させながら前記膜を形成する請求項6または7に記載の膜形成方法。
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JP2019509612A JP6925770B2 (ja) | 2017-03-29 | 2018-03-20 | 膜形成装置及び膜形成方法 |
KR1020197019352A KR102433555B1 (ko) | 2017-03-29 | 2018-03-20 | 막형성장치 및 막형성방법 |
CN201880005529.9A CN110446558B (zh) | 2017-03-29 | 2018-03-20 | 膜形成装置及膜形成方法 |
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JP2017064872 | 2017-03-29 |
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KR (1) | KR102433555B1 (ja) |
CN (1) | CN110446558B (ja) |
TW (1) | TWI724283B (ja) |
WO (1) | WO2018180803A1 (ja) |
Citations (7)
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- 2018-03-09 TW TW107108032A patent/TWI724283B/zh not_active IP Right Cessation
- 2018-03-20 WO PCT/JP2018/011138 patent/WO2018180803A1/ja active Application Filing
- 2018-03-20 CN CN201880005529.9A patent/CN110446558B/zh active Active
- 2018-03-20 KR KR1020197019352A patent/KR102433555B1/ko active IP Right Grant
- 2018-03-20 JP JP2019509612A patent/JP6925770B2/ja active Active
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JPS63109083A (ja) * | 1986-10-28 | 1988-05-13 | Seiko Epson Corp | インクジエツト記録方法 |
JP2005033049A (ja) * | 2003-07-08 | 2005-02-03 | Nec Toppan Circuit Solutions Inc | プリント配線板の配線パターン形成方法及びプリント配線板の製造方法 |
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WO2009072603A1 (ja) * | 2007-12-06 | 2009-06-11 | National Institute Of Advanced Industrial Science And Technology | パターン描画方法および装置 |
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JP2011070102A (ja) * | 2009-09-28 | 2011-04-07 | Fujifilm Corp | カラーフィルタ製造方法及びカラーフィルタ製造装置 |
Also Published As
Publication number | Publication date |
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JPWO2018180803A1 (ja) | 2020-02-06 |
TW201902583A (zh) | 2019-01-16 |
TWI724283B (zh) | 2021-04-11 |
KR20190132986A (ko) | 2019-11-29 |
CN110446558B (zh) | 2021-11-09 |
JP6925770B2 (ja) | 2021-08-25 |
CN110446558A (zh) | 2019-11-12 |
KR102433555B1 (ko) | 2022-08-17 |
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