WO2009034954A1 - TiO2含有石英ガラス基板 - Google Patents
TiO2含有石英ガラス基板 Download PDFInfo
- Publication number
- WO2009034954A1 WO2009034954A1 PCT/JP2008/066199 JP2008066199W WO2009034954A1 WO 2009034954 A1 WO2009034954 A1 WO 2009034954A1 JP 2008066199 W JP2008066199 W JP 2008066199W WO 2009034954 A1 WO2009034954 A1 WO 2009034954A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tio2
- quartz glass
- glass substrate
- containing quartz
- substrate
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08830689.9A EP2199049A4 (en) | 2007-09-13 | 2008-09-09 | TiO2-containing quartz glass substrate |
JP2009532178A JP5064508B2 (ja) | 2007-09-13 | 2008-09-09 | TiO2含有石英ガラス基板 |
KR1020107005440A KR101479804B1 (ko) | 2007-09-13 | 2008-09-09 | TiO2 함유 석영 유리 기판 |
US12/659,595 US20100234205A1 (en) | 2007-09-13 | 2010-03-15 | TiO2-containing quartz glass substrate |
US12/978,837 US20110089612A1 (en) | 2007-09-13 | 2010-12-27 | Tio2-containing quartz glass substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007237989 | 2007-09-13 | ||
JP2007-237989 | 2007-09-13 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/659,595 Continuation US20100234205A1 (en) | 2007-09-13 | 2010-03-15 | TiO2-containing quartz glass substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009034954A1 true WO2009034954A1 (ja) | 2009-03-19 |
Family
ID=40451961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/066199 WO2009034954A1 (ja) | 2007-09-13 | 2008-09-09 | TiO2含有石英ガラス基板 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20100234205A1 (ja) |
EP (1) | EP2199049A4 (ja) |
JP (2) | JP5064508B2 (ja) |
KR (1) | KR101479804B1 (ja) |
TW (1) | TWI451188B (ja) |
WO (1) | WO2009034954A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011068100A1 (ja) | 2009-12-04 | 2011-06-09 | 旭硝子株式会社 | インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法 |
WO2011096368A1 (ja) * | 2010-02-03 | 2011-08-11 | 旭硝子株式会社 | 微細凹凸構造を表面に有する物品の製造方法 |
WO2012008343A1 (ja) * | 2010-07-12 | 2012-01-19 | 旭硝子株式会社 | インプリントモールド用TiO2含有石英ガラス基材およびその製造方法 |
JP2012166380A (ja) * | 2011-02-10 | 2012-09-06 | Shin-Etsu Chemical Co Ltd | 金型用基板及び金型用基板の検査方法 |
JP2014013902A (ja) * | 2013-07-30 | 2014-01-23 | Dainippon Printing Co Ltd | 光インプリント用モールドおよびその製造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009274947A (ja) | 2008-04-16 | 2009-11-26 | Asahi Glass Co Ltd | TiO2を含有するEUVリソグラフィ光学部材用シリカガラス |
JP5500686B2 (ja) * | 2010-11-30 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボ |
CN103268919B (zh) * | 2013-05-13 | 2016-07-13 | 河南师范大学 | 一种TiO2薄膜及P3HT/TiO2有机无机杂化的异质结薄膜的制备方法 |
KR20150124408A (ko) * | 2014-04-28 | 2015-11-05 | 아사히 가라스 가부시키가이샤 | 임프린트 몰드, 및 임프린트 방법 |
WO2024008676A1 (de) * | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Verfahren zur herstellung eines grundkörpers eines optischen elementes für die halbleiterlithografie, grundkörper, optisches element und projektionsbelichtungsanlage |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6324973B2 (ja) | 1983-11-16 | 1988-05-23 | Tadao Shiraishi | |
JPH05169459A (ja) * | 1991-12-24 | 1993-07-09 | Sumitomo Electric Ind Ltd | 樹脂あるいはゴム用金型、樹脂あるいはゴム成形装置部品および樹脂あるいはゴムの成形方法 |
JPH08300362A (ja) * | 1995-05-11 | 1996-11-19 | Olympus Optical Co Ltd | 樹脂成形用金型及びその製造方法 |
JP2003077807A (ja) * | 2001-09-04 | 2003-03-14 | Matsushita Electric Ind Co Ltd | モールド、モールドの製造方法、および、パターン形成方法 |
JP2004104114A (ja) | 2002-08-23 | 2004-04-02 | Asml Netherlands Bv | チャック、リソグラフィ装置、およびデバイスの製造方法 |
JP2004315351A (ja) * | 2003-04-03 | 2004-11-11 | Asahi Glass Co Ltd | TiO2を含有するシリカガラスおよびEUVリソグラフィ用光学部材 |
JP2005104820A (ja) * | 2003-04-03 | 2005-04-21 | Asahi Glass Co Ltd | TiO2を含有するシリカガラスおよびその製造方法 |
JP2005210093A (ja) | 2003-12-25 | 2005-08-04 | Hoya Corp | 多層反射膜付き基板、露光用反射型マスクブランクス及び露光用反射型マスク、並びにそれらの製造方法 |
JP2006267595A (ja) | 2005-03-24 | 2006-10-05 | Toshiba Corp | マスクブランクスとその製造方法及び使用方法、並びにマスクとその製造方法及び使用方法 |
JP2006306674A (ja) * | 2005-04-28 | 2006-11-09 | Shinetsu Quartz Prod Co Ltd | ナノインプリントスタンパー用シリカ・チタニアガラス |
JP2006324268A (ja) | 2005-05-17 | 2006-11-30 | Dainippon Printing Co Ltd | Euv露光用マスクブランクスおよびその製造方法、euv露光用マスク |
JP2007182367A (ja) * | 2005-12-08 | 2007-07-19 | Shin Etsu Chem Co Ltd | チタニアドープ石英ガラス、euvリソグラフィ用部材、euvリソグラフィ用フォトマスク基板及びチタニアドープ石英ガラスの製造方法 |
JP2007237989A (ja) | 2006-03-09 | 2007-09-20 | Equos Research Co Ltd | 車両 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造法 |
JP2004315247A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | SiO2−TiO2系ガラスの製造方法、SiO2−TiO2系ガラス及び露光装置 |
DE60336322D1 (de) * | 2003-11-21 | 2011-04-21 | Obducat Ab | Nanoimprint Lithographie in Mehrschichtsystemem |
JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
US7235474B1 (en) * | 2004-05-04 | 2007-06-26 | Advanced Micro Devices, Inc. | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts |
DE102004024808B4 (de) * | 2004-05-17 | 2006-11-09 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung |
JP4957249B2 (ja) * | 2004-07-01 | 2012-06-20 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造方法 |
EP1782472B1 (en) * | 2004-08-18 | 2011-10-05 | Corning Incorporated | Strained semiconductor-on-insulator structures and methods for making strained semiconductor-on-insulator structures |
JP4487783B2 (ja) * | 2005-01-25 | 2010-06-23 | 旭硝子株式会社 | TiO2を含有するシリカガラスの製造方法およびTiO2を含有するシリカガラスを用いたEUVリソグラフィ用光学部材 |
US7592063B2 (en) * | 2006-09-05 | 2009-09-22 | Asahi Glass Company, Limited | Quartz glass substrate and process for its production |
JP5042714B2 (ja) * | 2007-06-06 | 2012-10-03 | 信越化学工業株式会社 | ナノインプリントモールド用チタニアドープ石英ガラス |
JP2009013048A (ja) * | 2007-06-06 | 2009-01-22 | Shin Etsu Chem Co Ltd | ナノインプリントモールド用チタニアドープ石英ガラス |
-
2008
- 2008-09-09 KR KR1020107005440A patent/KR101479804B1/ko not_active IP Right Cessation
- 2008-09-09 WO PCT/JP2008/066199 patent/WO2009034954A1/ja active Application Filing
- 2008-09-09 EP EP08830689.9A patent/EP2199049A4/en not_active Withdrawn
- 2008-09-09 JP JP2009532178A patent/JP5064508B2/ja active Active
- 2008-09-12 TW TW097135288A patent/TWI451188B/zh active
-
2010
- 2010-03-15 US US12/659,595 patent/US20100234205A1/en not_active Abandoned
- 2010-12-27 US US12/978,837 patent/US20110089612A1/en not_active Abandoned
-
2012
- 2012-07-31 JP JP2012170012A patent/JP2012214382A/ja active Pending
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6324973B2 (ja) | 1983-11-16 | 1988-05-23 | Tadao Shiraishi | |
JPH05169459A (ja) * | 1991-12-24 | 1993-07-09 | Sumitomo Electric Ind Ltd | 樹脂あるいはゴム用金型、樹脂あるいはゴム成形装置部品および樹脂あるいはゴムの成形方法 |
JPH08300362A (ja) * | 1995-05-11 | 1996-11-19 | Olympus Optical Co Ltd | 樹脂成形用金型及びその製造方法 |
JP2003077807A (ja) * | 2001-09-04 | 2003-03-14 | Matsushita Electric Ind Co Ltd | モールド、モールドの製造方法、および、パターン形成方法 |
JP2004104114A (ja) | 2002-08-23 | 2004-04-02 | Asml Netherlands Bv | チャック、リソグラフィ装置、およびデバイスの製造方法 |
JP2004315351A (ja) * | 2003-04-03 | 2004-11-11 | Asahi Glass Co Ltd | TiO2を含有するシリカガラスおよびEUVリソグラフィ用光学部材 |
JP2005104820A (ja) * | 2003-04-03 | 2005-04-21 | Asahi Glass Co Ltd | TiO2を含有するシリカガラスおよびその製造方法 |
JP2005210093A (ja) | 2003-12-25 | 2005-08-04 | Hoya Corp | 多層反射膜付き基板、露光用反射型マスクブランクス及び露光用反射型マスク、並びにそれらの製造方法 |
JP2006267595A (ja) | 2005-03-24 | 2006-10-05 | Toshiba Corp | マスクブランクスとその製造方法及び使用方法、並びにマスクとその製造方法及び使用方法 |
JP2006306674A (ja) * | 2005-04-28 | 2006-11-09 | Shinetsu Quartz Prod Co Ltd | ナノインプリントスタンパー用シリカ・チタニアガラス |
JP2006324268A (ja) | 2005-05-17 | 2006-11-30 | Dainippon Printing Co Ltd | Euv露光用マスクブランクスおよびその製造方法、euv露光用マスク |
JP2007182367A (ja) * | 2005-12-08 | 2007-07-19 | Shin Etsu Chem Co Ltd | チタニアドープ石英ガラス、euvリソグラフィ用部材、euvリソグラフィ用フォトマスク基板及びチタニアドープ石英ガラスの製造方法 |
JP2007237989A (ja) | 2006-03-09 | 2007-09-20 | Equos Research Co Ltd | 車両 |
Non-Patent Citations (2)
Title |
---|
A. AGARWAL; K. M. DABIS; M. TOMOZAWA: "A simple IR spectroscopic method for determining fictive temperature of silica glass", J. NON-CRYST. SOLIDS., vol. 185, 71119, pages 191 - 198 |
See also references of EP2199049A4 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011068100A1 (ja) | 2009-12-04 | 2011-06-09 | 旭硝子株式会社 | インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法 |
WO2011096368A1 (ja) * | 2010-02-03 | 2011-08-11 | 旭硝子株式会社 | 微細凹凸構造を表面に有する物品の製造方法 |
JP5806121B2 (ja) * | 2010-02-03 | 2015-11-10 | 旭硝子株式会社 | 微細凹凸構造を表面に有する物品の製造方法 |
WO2012008343A1 (ja) * | 2010-07-12 | 2012-01-19 | 旭硝子株式会社 | インプリントモールド用TiO2含有石英ガラス基材およびその製造方法 |
JP2012166380A (ja) * | 2011-02-10 | 2012-09-06 | Shin-Etsu Chemical Co Ltd | 金型用基板及び金型用基板の検査方法 |
US10948817B2 (en) | 2011-02-10 | 2021-03-16 | Shin-Etsu Chemical Co., Ltd. | Mold-forming substrate and inspection method |
JP2014013902A (ja) * | 2013-07-30 | 2014-01-23 | Dainippon Printing Co Ltd | 光インプリント用モールドおよびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20100058540A (ko) | 2010-06-03 |
TWI451188B (zh) | 2014-09-01 |
KR101479804B1 (ko) | 2015-01-06 |
EP2199049A4 (en) | 2014-08-27 |
TW200916946A (en) | 2009-04-16 |
JPWO2009034954A1 (ja) | 2010-12-24 |
EP2199049A1 (en) | 2010-06-23 |
US20110089612A1 (en) | 2011-04-21 |
US20100234205A1 (en) | 2010-09-16 |
JP2012214382A (ja) | 2012-11-08 |
JP5064508B2 (ja) | 2012-10-31 |
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