WO2009034857A1 - Film pour transfert de film métallique et film adhésif avec film métallique - Google Patents
Film pour transfert de film métallique et film adhésif avec film métallique Download PDFInfo
- Publication number
- WO2009034857A1 WO2009034857A1 PCT/JP2008/065523 JP2008065523W WO2009034857A1 WO 2009034857 A1 WO2009034857 A1 WO 2009034857A1 JP 2008065523 W JP2008065523 W JP 2008065523W WO 2009034857 A1 WO2009034857 A1 WO 2009034857A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- film
- metal
- copper
- metal film
- Prior art date
Links
- 239000002184 metal Substances 0.000 title abstract 10
- 229910052751 metal Inorganic materials 0.000 title abstract 10
- 239000002313 adhesive film Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 5
- 229910052802 copper Inorganic materials 0.000 abstract 5
- 239000010949 copper Substances 0.000 abstract 5
- 229910000881 Cu alloy Inorganic materials 0.000 abstract 4
- 239000011342 resin composition Substances 0.000 abstract 3
- 238000005530 etching Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
- H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/421—Blind plated via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Cette invention concerne un film pour un transfert de film métallique et un procédé pour produire une carte de circuit à l'aide d'un film pour transfert de film métallique, qui peuvent réaliser une élimination satisfaisante d'un résidu (déglaçage) présent sur le fond d'un trou d'interconnexion. Le film pour un transfert de film métallique est un film (10) pour un transfert de film métallique comprenant une première couche métallique (2) résistante à un liquide de gravure du cuivre et une seconde couche métallique (3) de cuivre ou d'un alliage de cuivre formées dans cet ordre sur une couche de support (1). Le procédé pour produire une carte de circuit comprend l'étape de préparation d'une carte comprenant une couche de cuivre ou une couche d'alliage de cuivre (un câblage) et une couche de composition de résine durcissable disposée en tant que couche de surface sur la couche de cuivre ou d'alliage de cuivre, superposition et empilage d'un film (10) pour un transfert de film métallique sur la carte, de telle sorte qu'une seconde couche métallique (3) est amenée en contact avec la couche de composition de résine durcissable, et durcissement de la couche de composition de résine durcissable, l'étape de séparation de la couche de support (1), l'étape de formation de trous d'interconnexion par un faisceau laser, l'étape d'élimination d'un résidu de fond de trou d'interconnexion, et l'étape de gravure de la surface de la couche de cuivre ou couche d'alliage de cuivre de substrat de fond de trou d'interconnexion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009532136A JPWO2009034857A1 (ja) | 2007-09-11 | 2008-08-29 | 金属膜転写用フィルム及び金属膜付き接着フィルム |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007236001 | 2007-09-11 | ||
JP2007-236001 | 2007-09-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009034857A1 true WO2009034857A1 (fr) | 2009-03-19 |
Family
ID=40451866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/065523 WO2009034857A1 (fr) | 2007-09-11 | 2008-08-29 | Film pour transfert de film métallique et film adhésif avec film métallique |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2009034857A1 (fr) |
TW (1) | TW200924965A (fr) |
WO (1) | WO2009034857A1 (fr) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011025532A (ja) * | 2009-07-24 | 2011-02-10 | Ajinomoto Co Inc | 金属膜付きフィルム |
WO2014074558A2 (fr) | 2012-11-08 | 2014-05-15 | Toray Plastics (America) Inc. | Film de transfert de métal de polyester libérable |
JP2017123452A (ja) * | 2016-01-04 | 2017-07-13 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | 電子部品及びその製造方法 |
US10099462B2 (en) | 2013-06-28 | 2018-10-16 | Toray Plastics (America), Inc. | Releasable polyester high gloss metal transfer film |
KR101948111B1 (ko) * | 2017-03-31 | 2019-02-15 | (주)심텍 | 도금용 시드 구조물, 도금용 시드 구조물의 제조 방법, 및 도금용 시드 구조물을 이용하는 인쇄회로기판의 제조 방법 |
CN113966099A (zh) * | 2021-06-30 | 2022-01-21 | 西安空间无线电技术研究所 | 一种适用于固放产品的微波集成电路薄膜加厚工艺 |
WO2023149007A1 (fr) * | 2022-02-07 | 2023-08-10 | 尾池工業株式会社 | Film électroconducteur pour substrat de circuit, et procédé de production de film électroconducteur pour substrat de circuit |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5625566B2 (ja) * | 2009-07-14 | 2014-11-19 | 味の素株式会社 | 銅箔付き接着フィルム |
KR102465117B1 (ko) * | 2017-11-29 | 2022-11-11 | 주식회사 잉크테크 | 인쇄회로기판 제조방법 |
CN115261859B (zh) * | 2022-08-11 | 2023-06-20 | 李祥庆 | 铜蚀刻液组合物及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000049459A (ja) * | 1998-07-28 | 2000-02-18 | Matsushita Electric Works Ltd | 多層プリント配線板の製造方法 |
JP2001053420A (ja) * | 1999-08-12 | 2001-02-23 | Reiko Co Ltd | プリント配線板用転写フイルムとそれを使用して得るプリント配線板及びその製造方法 |
JP2002301790A (ja) * | 2001-02-01 | 2002-10-15 | Toray Ind Inc | 離型フィルム |
JP2006245213A (ja) * | 2005-03-02 | 2006-09-14 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
-
2008
- 2008-08-29 JP JP2009532136A patent/JPWO2009034857A1/ja active Pending
- 2008-08-29 TW TW97133342A patent/TW200924965A/zh unknown
- 2008-08-29 WO PCT/JP2008/065523 patent/WO2009034857A1/fr active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000049459A (ja) * | 1998-07-28 | 2000-02-18 | Matsushita Electric Works Ltd | 多層プリント配線板の製造方法 |
JP2001053420A (ja) * | 1999-08-12 | 2001-02-23 | Reiko Co Ltd | プリント配線板用転写フイルムとそれを使用して得るプリント配線板及びその製造方法 |
JP2002301790A (ja) * | 2001-02-01 | 2002-10-15 | Toray Ind Inc | 離型フィルム |
JP2006245213A (ja) * | 2005-03-02 | 2006-09-14 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011025532A (ja) * | 2009-07-24 | 2011-02-10 | Ajinomoto Co Inc | 金属膜付きフィルム |
WO2014074558A2 (fr) | 2012-11-08 | 2014-05-15 | Toray Plastics (America) Inc. | Film de transfert de métal de polyester libérable |
EP2917910A4 (fr) * | 2012-11-08 | 2017-02-22 | Toray Plastics (America) , Inc. | Film de transfert de métal de polyester libérable |
US9630385B2 (en) | 2012-11-08 | 2017-04-25 | Toray Plastics (America), Inc. | Releasable polyester metal transfer film |
EP3332963A1 (fr) * | 2012-11-08 | 2018-06-13 | Toray Plastics (America) , Inc. | Film de transfert de métal en polyester retirable |
US10596794B2 (en) | 2012-11-08 | 2020-03-24 | Toray Plastics (America), Inc. | Releasable polyester high gloss metal transfer film method |
US10099462B2 (en) | 2013-06-28 | 2018-10-16 | Toray Plastics (America), Inc. | Releasable polyester high gloss metal transfer film |
JP2017123452A (ja) * | 2016-01-04 | 2017-07-13 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | 電子部品及びその製造方法 |
KR101948111B1 (ko) * | 2017-03-31 | 2019-02-15 | (주)심텍 | 도금용 시드 구조물, 도금용 시드 구조물의 제조 방법, 및 도금용 시드 구조물을 이용하는 인쇄회로기판의 제조 방법 |
CN113966099A (zh) * | 2021-06-30 | 2022-01-21 | 西安空间无线电技术研究所 | 一种适用于固放产品的微波集成电路薄膜加厚工艺 |
WO2023149007A1 (fr) * | 2022-02-07 | 2023-08-10 | 尾池工業株式会社 | Film électroconducteur pour substrat de circuit, et procédé de production de film électroconducteur pour substrat de circuit |
Also Published As
Publication number | Publication date |
---|---|
TW200924965A (en) | 2009-06-16 |
JPWO2009034857A1 (ja) | 2010-12-24 |
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