WO2009014398A3 - Multipurpose carrier of vacuum vapor deposition material and method thereof - Google Patents

Multipurpose carrier of vacuum vapor deposition material and method thereof Download PDF

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Publication number
WO2009014398A3
WO2009014398A3 PCT/KR2008/004352 KR2008004352W WO2009014398A3 WO 2009014398 A3 WO2009014398 A3 WO 2009014398A3 KR 2008004352 W KR2008004352 W KR 2008004352W WO 2009014398 A3 WO2009014398 A3 WO 2009014398A3
Authority
WO
WIPO (PCT)
Prior art keywords
vapor deposition
vacuum vapor
present
multipurpose carrier
deposition material
Prior art date
Application number
PCT/KR2008/004352
Other languages
French (fr)
Other versions
WO2009014398A2 (en
Inventor
Huyn Joong Kim
Hong Chul Kim
Jeong Rae Kim
Original Assignee
Ceko Corp Ltd
Huyn Joong Kim
Hong Chul Kim
Jeong Rae Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceko Corp Ltd, Huyn Joong Kim, Hong Chul Kim, Jeong Rae Kim filed Critical Ceko Corp Ltd
Priority to JP2010518125A priority Critical patent/JP5188575B2/en
Priority to CN2008801006455A priority patent/CN101765676B/en
Publication of WO2009014398A2 publication Critical patent/WO2009014398A2/en
Publication of WO2009014398A3 publication Critical patent/WO2009014398A3/en
Priority to HK10111608.9A priority patent/HK1145093A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a multipurpose carrier for vacuum vapor deposition material and manufacturing method thereof. A multipurpose carrier for vacuum vapor deposition materials of the present invention comprises: an outer container made of metallic materials such as stainless steel, iron, copper, molybdenum, tungsten, or titanium etc.; an inner filler such as carbon fiber felt, carbon fiber or metal felt, etc.; and a mesh and a washer which are disposed thereon and are made of metallic materials such as stainless steel, iron, copper, molybdenum, tungsten, or titanium etc., wherein these elements are assembled or welded as a securely-integrated structure. The technical feature of the present invention is that various types of deposition materials with various functions, which are impregnated or filled in a multipurpose carrier of the present invention, can be uniformly deposited as a very thin-film by an electron-beam heating method or a resistance heating method in a vacuum vapor deposition device, wherein the deposition material is composed of organic and/or inorganic compounds which has a solid state such as powder and particle, a liquid state having various viscosity, and a semi-solid state such as slurry.
PCT/KR2008/004352 2007-07-26 2008-07-25 Multipurpose carrier of vacuum vapor deposition material and method thereof WO2009014398A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010518125A JP5188575B2 (en) 2007-07-26 2008-07-25 Multipurpose container for vacuum deposition material and method for manufacturing the same
CN2008801006455A CN101765676B (en) 2007-07-26 2008-07-25 Multipurpose carrier of vacuum vapor deposition material and method thereof
HK10111608.9A HK1145093A1 (en) 2007-07-26 2010-12-14 Multipurpose carrier of vacuum vapor deposition material and method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070075000A KR101025005B1 (en) 2007-07-26 2007-07-26 Multipurpose carrier of vacuum vapor deposition material and method thereof
KR10-2007-0075000 2007-07-26

Publications (2)

Publication Number Publication Date
WO2009014398A2 WO2009014398A2 (en) 2009-01-29
WO2009014398A3 true WO2009014398A3 (en) 2009-04-02

Family

ID=40281990

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/004352 WO2009014398A2 (en) 2007-07-26 2008-07-25 Multipurpose carrier of vacuum vapor deposition material and method thereof

Country Status (5)

Country Link
JP (1) JP5188575B2 (en)
KR (1) KR101025005B1 (en)
CN (1) CN101765676B (en)
HK (1) HK1145093A1 (en)
WO (1) WO2009014398A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9972128B2 (en) 2012-07-20 2018-05-15 The University Of British Columbia Methods and systems for generating polycubes and all-hexahedral meshes of an object
KR20140013471A (en) 2012-07-24 2014-02-05 주식회사 쎄코 Heating assembly for vacuum deposition and vacuum deposition apparatus having the same
KR101355208B1 (en) * 2012-08-02 2014-01-27 주식회사 유라마 Organic matter carrier housing for vacuum metalizing
KR101480726B1 (en) * 2012-12-21 2015-01-09 주식회사 선익시스템 Vacuum Evaporating Apparatus
EP3066645A4 (en) 2013-11-04 2017-08-30 The University Of British Columbia Methods and systems for generating polycube segmentations from input meshes of objects
KR101404047B1 (en) 2013-11-29 2014-06-10 (주)파인켐텍 Container of vacuum deposition material
JP6694673B2 (en) * 2014-06-02 2020-05-20 キヤノンオプトロン株式会社 Evaporation source and vapor deposition method using the same
KR200480271Y1 (en) 2014-11-26 2016-05-18 (주)파인켐텍 Container For Vacuum Deposition Material
CN107208255B (en) 2014-12-19 2019-09-13 塔塔钢铁荷兰科技有限责任公司 The filter for installation of particle is removed from vapor stream
US10210657B2 (en) 2015-07-24 2019-02-19 The University Of British Columbia Methods and systems for hex-mesh optimization via edge-cone rectification
KR20170116398A (en) * 2016-04-11 2017-10-19 주식회사 쎄코 Carrier for deposition
CN114134464A (en) * 2021-10-26 2022-03-04 惠州市华阳光学技术有限公司 Structural color pigment and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03297528A (en) * 1990-04-17 1991-12-27 Kokusan Buhin Kogyo Kk Porous body made of wire net and its manufacture
JPH04272169A (en) * 1991-02-25 1992-09-28 Shimadzu Corp Impregnating type vacuum deposition device
JPH04285157A (en) * 1991-03-12 1992-10-09 Hitachi Ltd Method for vaporizing metal
KR200322862Y1 (en) * 2003-05-16 2003-08-14 김영정 Porous Ceramic Tablet for Vacuum Coating
KR100528892B1 (en) * 2003-08-22 2005-11-15 신도현 Vehicle for carrying repellent agent for coating treatment under vacuum state

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197564A (en) * 1989-01-27 1990-08-06 Nippon Dempa Kogyo Co Ltd Vacuum deposition device
JP2892620B2 (en) * 1996-06-17 1999-05-17 株式会社東京製品開発研究所 Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts
JP2001183503A (en) * 1999-12-24 2001-07-06 Toray Ind Inc Method of producing optical article
JP2001323367A (en) * 2000-03-09 2001-11-22 Junji Kido Method for vapor depositing organic compound, and method for purifying organic compound
JP2001335920A (en) * 2000-05-26 2001-12-07 Toray Ind Inc Vapor deposition source, optical article and the producing method
JP2002335920A (en) * 2001-05-17 2002-11-26 House Foods Corp White color-based liquid food
JP2003264079A (en) * 2002-03-11 2003-09-19 Sanyo Electric Co Ltd Evaporation source for evaporator, evaporator using the same, and manufacturing method of organic el element
JP4001296B2 (en) * 2005-08-25 2007-10-31 トッキ株式会社 Method and apparatus for vacuum deposition of organic materials
JP2008150678A (en) * 2006-12-19 2008-07-03 Sony Corp Evaporation source, vapor deposition apparatus, vapor deposition method, apparatus for manufacturing organic electroluminescence display unit, and method for manufacturing organic electroluminescence display unit

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03297528A (en) * 1990-04-17 1991-12-27 Kokusan Buhin Kogyo Kk Porous body made of wire net and its manufacture
JPH04272169A (en) * 1991-02-25 1992-09-28 Shimadzu Corp Impregnating type vacuum deposition device
JPH04285157A (en) * 1991-03-12 1992-10-09 Hitachi Ltd Method for vaporizing metal
KR200322862Y1 (en) * 2003-05-16 2003-08-14 김영정 Porous Ceramic Tablet for Vacuum Coating
KR100528892B1 (en) * 2003-08-22 2005-11-15 신도현 Vehicle for carrying repellent agent for coating treatment under vacuum state

Also Published As

Publication number Publication date
KR20090011432A (en) 2009-02-02
HK1145093A1 (en) 2011-04-01
KR101025005B1 (en) 2011-03-24
JP5188575B2 (en) 2013-04-24
WO2009014398A2 (en) 2009-01-29
CN101765676B (en) 2012-04-11
JP2010534767A (en) 2010-11-11
CN101765676A (en) 2010-06-30

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