JP2892620B2 - Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts - Google Patents

Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts

Info

Publication number
JP2892620B2
JP2892620B2 JP8199872A JP19987296A JP2892620B2 JP 2892620 B2 JP2892620 B2 JP 2892620B2 JP 8199872 A JP8199872 A JP 8199872A JP 19987296 A JP19987296 A JP 19987296A JP 2892620 B2 JP2892620 B2 JP 2892620B2
Authority
JP
Japan
Prior art keywords
forming substance
film
vacuum
optical parts
organic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8199872A
Other languages
Japanese (ja)
Other versions
JPH0913167A (en
Inventor
至三郎 平
泰三郎 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO SEIHIN KAIHATSU KENKYUSHO KK
Original Assignee
TOKYO SEIHIN KAIHATSU KENKYUSHO KK
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Application filed by TOKYO SEIHIN KAIHATSU KENKYUSHO KK filed Critical TOKYO SEIHIN KAIHATSU KENKYUSHO KK
Priority to JP8199872A priority Critical patent/JP2892620B2/en
Publication of JPH0913167A publication Critical patent/JPH0913167A/en
Application granted granted Critical
Publication of JP2892620B2 publication Critical patent/JP2892620B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は光学部品の真空蒸着方法
に関するもので、詳細には光学部品用の有機系被膜形成
性物質を含浸固化している多孔質セラミックス焼結体を
用いことを特徴とする光学部品の真空蒸着方法に関する
ものである。さらに詳細には、本発明は光学部品を真空
蒸着装置内で無機物系蒸着物質で真空蒸着処理した後、
そのまま該装置内で多孔質セラミックス焼結体を加熱し
て、無機物系蒸着物質で真空蒸着処理した上にさらに有
機保護被膜を形成することを特徴とする真空蒸着方法に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for vacuum deposition of optical parts, and more particularly to a method of using a porous ceramic sintered body impregnated and solidified with an organic film-forming substance for optical parts. And a vacuum deposition method for an optical component. More specifically, the present invention, after vacuum-depositing an optical component with an inorganic deposition material in a vacuum deposition apparatus,
The present invention relates to a vacuum evaporation method characterized by heating a porous ceramic sintered body in the apparatus as it is, performing vacuum evaporation with an inorganic evaporation material, and further forming an organic protective film.

【0002】[0002]

【従来の技術】一般に化学物質は融点・沸点を有するも
のであるが、特に沸点においては圧力依存性があり高圧
では高く減圧側で低くなる。このことから通常の圧力で
は沸騰しにくい物質も減圧をすることで容易に蒸発が起
きるようになる。この時蒸発物質の通り道に固形物を存
在させることによって、その表面が蒸発物の析出物で覆
われるが、これが真空蒸着の原理である。
2. Description of the Related Art Generally, a chemical substance has a melting point and a boiling point. In particular, the boiling point has a pressure dependency and is high at a high pressure and low at a reduced pressure side. For this reason, a substance that is difficult to boil under normal pressure can be easily evaporated by reducing the pressure. At this time, the solid is present in the path of the evaporant, so that the surface thereof is covered with the precipitate of the evaporate. This is the principle of vacuum evaporation.

【0003】光学部品を真空蒸着で処理をすると、その
処理の性格上被処理物表面は無機性蒸着物質の結晶の付
着によって生じる非常に小さい激しい凹凸が生じる。こ
の凹凸の隙間を充填して滑らかにし、光学的な性質を損
ねることなく保護膜を形成することが必要である。メガ
ネのレンズの場合、マルチコート(多層反射防止膜)の
最表面は2酸化珪素の膜であり、これは空気中の水分や
飛沫水で簡単に白濁し、いわゆる白焼けとなるので、撥
水性被膜を付けることにより白焼け防止をすることがで
きる。また、手指などが触れたりして生じる汚染から保
護するために保護被膜が使用される。
When an optical component is processed by vacuum evaporation, very small and severe irregularities are generated on the surface of an object to be processed due to adhesion of crystals of an inorganic evaporation material due to the nature of the processing. It is necessary to fill the gaps of the irregularities to make the gap smooth, and to form a protective film without impairing the optical properties. In the case of spectacle lenses, the outermost surface of the multi-coat (multi-layer anti-reflection film) is a silicon dioxide film, which easily becomes cloudy due to moisture or splashing water in the air, and becomes a so-called white burn, so it is water repellent By applying a coating, it is possible to prevent whitening. In addition, a protective coating is used to protect against contamination caused by touching a finger or the like.

【0004】被膜形成物質を溶液として塗布することに
より、一定の効果があることが知られているが、非常に
薄い膜を成膜しなければならないため大量の溶剤で希薄
な溶液としている。従来技術で使用する溶剤はいわゆる
フロン系のオゾン層破壊物質であり、近年開発された非
フロン系の溶剤も将来規制物質検討の対象として考えら
れる有機フッ素系ないしは有機塩素系化合物である。
It is known that applying a film-forming substance as a solution has a certain effect. However, since a very thin film has to be formed, the solution is diluted with a large amount of a solvent. The solvent used in the prior art is a so-called chlorofluorocarbon-based ozone layer depleting substance, and a recently developed non-fluorocarbon-based solvent is also an organic fluorine-based or organic chlorine-based compound that is considered as a subject of study on regulated substances in the future.

【0005】また、従来技術では蒸着装置から取り出し
た後、別に用意した工程で被膜を形成するが、その工程
は溶液の濃度調整、塗布、乾燥とに分かれ、従来技術で
通常に操作すると真空蒸着装置内部は蒸着終了後直ちに
大気圧に解放され品物が取り出され、この時被処理物の
表面に蒸着された結晶性の物質が表面に粒子状に付着し
ているので外部からの汚染に非常に弱い状態となってい
るばかりでなく、大気解放の際空気または窒素ガスなど
を導入して生じた気流によって装置内に堆積していた蒸
着物質が舞い上がり、被処理物に再付着するため、次工
程で湿式の洗浄工程が欠かせない等の問題があることは
周知の通りである。
In the prior art, a film is formed in a separately prepared process after being taken out of a vapor deposition apparatus. The process is divided into solution concentration adjustment, coating, and drying. The inside of the device is released to the atmospheric pressure immediately after the end of the vapor deposition, and the product is taken out. At this time, the crystalline substance deposited on the surface of the object to be treated adheres to the surface in the form of particles, so it is extremely resistant to external contamination. In addition to being in a weak state, the vapors generated by the introduction of air or nitrogen gas when released to the atmosphere cause the vapor deposition material deposited in the device to fly up and re-adhere to the workpiece, so the next process It is well known that there is a problem that a wet cleaning step is indispensable.

【0006】[0006]

【発明が解決しようとする課題】このように従来の保護
被膜の形成には使用溶剤による環境汚染の問題と、工程
上からもたらされる表面洗浄の問題があったことは周知
の通りであり、従って本発明はこれら従来不可欠とされ
てきた溶剤の使用と、湿式洗浄工程の使用の欠点を解消
することを目的とするものであり、特に有機物系の被膜
形成物質を溶媒を全く使用することなく蒸発させて付着
固化させることを目的とするものである。
As described above, it is well known that the conventional formation of a protective film has a problem of environmental pollution due to the solvent used and a problem of surface cleaning caused by the process. An object of the present invention is to eliminate the drawbacks of using a solvent which has been conventionally regarded as indispensable and of using a wet cleaning step, and in particular, evaporating an organic film-forming substance without using a solvent at all. It is intended to be solidified by adhesion.

【0007】本発明は無機物系蒸着物質で真空蒸着処理
をした後、その真空蒸着装置の中で引き続き光学部品用
の有機系被膜形成性物質を含浸固化している多孔質セラ
ミックス焼結体を用いて溶媒を全く使用することなく光
学部品上に有機保護被膜を形成する光学部品の真空蒸着
方法の提供を目的とするものである。
The present invention uses a porous ceramic sintered body which has been subjected to a vacuum evaporation treatment with an inorganic evaporation material and then impregnated and solidified with an organic film-forming material for an optical component in the vacuum evaporation apparatus. It is an object of the present invention to provide a vacuum deposition method for an optical component in which an organic protective film is formed on the optical component without using any solvent.

【0008】[0008]

【課題を解決するための手段】本発明は、光学部品用の
有機系被膜形成性物質を含浸固化している多孔質セラミ
ックス焼結体を用いて光学部品上に有機保護被膜を形成
することを特徴とする光学部品の真空蒸着方法である。
According to the present invention, an organic protective film is formed on an optical component by using a porous ceramic sintered body impregnated and solidified with an organic film-forming substance for an optical component. This is a vacuum deposition method for optical components.

【0009】すなわち、本発明はこれまで不可欠とされ
てきた溶剤の使用を完全に不要とする無溶剤化の原理に
よって有機物系の被膜形成性物質を蒸発し付着固化させ
るものであるが、この場合被膜形成性物質の溶融液や溶
液を容易に吸収することができ、しかも真空中で蒸発し
ない媒介物が必要であり、この目的のため一般に多孔質
セラミックス体の使用が望ましいものである。
That is, the present invention is to evaporate and solidify an organic film-forming substance by a solvent-free principle which completely eliminates the use of a solvent, which has been regarded as indispensable until now. A medium that can easily absorb the melt or solution of the film-forming substance and does not evaporate in vacuum is required. For this purpose, it is generally desirable to use a porous ceramic body.

【0010】多孔質セラミックス体は好ましくは焼結し
たセラミックス体である。多孔質セラミックス焼結体の
形状は特に制限はなく、15×15×1ミリメートルの
板状体、直径φ17×7ミリメートルの円盤状体、直径
φ15ミリメートル球状体、直径φ12×10の円柱状
体、不定形に破砕したものなどが例示される。
[0010] The porous ceramic body is preferably a sintered ceramic body. The shape of the porous ceramics sintered body is not particularly limited, and is a plate-shaped body having a size of 15 × 15 × 1 mm, a disc-shaped body having a diameter of φ17 × 7 mm, a spherical body having a diameter of φ15 mm, a cylindrical body having a diameter of φ12 × 10, Examples thereof include those crushed into irregular shapes.

【0011】真空中で気化し得る有機系被膜形成性物質
としては、メガネ、カメラなどのレンズで代表される光
学部品の表面に有機系被膜を形成することのできる物質
であれば何でもよく、ポリエチレンワックス、シリコー
ン樹脂化合物などが例示される。
As the organic film-forming substance which can be vaporized in a vacuum, any substance can be used as long as it can form an organic film on the surface of optical parts represented by lenses such as glasses and cameras. Waxes and silicone resin compounds are exemplified.

【0012】有機系被膜形成性物質は溶融状態あるいは
溶液状態にして多孔質セラミックス焼結体に含浸固化さ
れる。被膜形成性物質は多孔質セラミックス焼結体に吸
収されているが、有機物系化合物が無溶剤の物であって
も全く差し支えがない。溶剤を使用した場合でも、当該
セラミックス焼結体製造工程までの間に回収することが
できる。
The organic film-forming substance is brought into a molten state or a solution state and is impregnated and solidified in the porous ceramic sintered body. Although the film-forming substance is absorbed by the porous ceramics sintered body, the organic compound may be solvent-free without any problem. Even when a solvent is used, it can be recovered before the ceramic sintered body manufacturing process.

【0013】本発明はこの多孔質セラミックス焼結体を
光学部品の真空蒸着装置内で使用することを特徴とする
光学部品の真空蒸着方法である。
The present invention is a method for vacuum-depositing an optical component, wherein the porous ceramic sintered body is used in a vacuum deposition apparatus for an optical component.

【0014】上記真空蒸着装置は、無機物系蒸着被膜形
成手段を有する通常の真空蒸着装置であり、この中に上
記特定の多孔質セラミックス焼結体を挿入し通常に真空
蒸着操作の後、この多孔質セラミックス焼結体を加熱し
て有機系被膜形成性物質を蒸発させる。光学部品を無機
物系蒸着物質で真空蒸着処理した上に、さらに有機保護
被膜を形成する。有機系保護被膜の形成は、真空中で気
化し得る有機系被膜形成性物質を含浸固化させた多孔質
セラミックス焼結体を加熱することによって行われる。
このように蒸着後引き続き同じ装置内で保護被膜の形成
処理をするため中間での洗浄工程が不要となるため、蒸
着処理工程では溶剤の使用が不要となる。すなわち通常
の真空蒸着操作の後そのまま蒸着装置の中で本発明の保
護被膜の形成処理をするので被処理物を蒸着装置から外
に取り出すことはなく、外に出すことによって生じた塵
埃や汚染を洗浄するため従来行われていた保護皮膜形成
処理前の洗浄工程を必要としない。
The above-mentioned vacuum vapor deposition apparatus is a normal vacuum vapor deposition apparatus having means for forming an inorganic-based vapor-deposited film, into which the above-mentioned specific porous ceramics sintered body is inserted. The porous ceramics sintered body is heated to evaporate the organic film-forming substance. The optical component is vacuum-deposited with an inorganic deposition material, and an organic protective film is further formed. The organic protective film is formed by heating a porous ceramic sintered body impregnated and solidified with an organic film-forming substance that can be vaporized in a vacuum.
As described above, since the protective film is formed in the same apparatus after the vapor deposition, an intermediate cleaning step is not required. Therefore, the use of a solvent is unnecessary in the vapor deposition processing step. That is, since the protective coating of the present invention is formed in the vapor deposition apparatus as it is after the ordinary vacuum vapor deposition operation, the object to be processed is not taken out of the vapor deposition apparatus, and dust and contamination generated by being taken out are removed. The cleaning step does not require a cleaning step before the protective film forming process, which has been conventionally performed.

【0015】本発明は、光学部品を真空蒸着装置内で無
機物系蒸着物質で真空蒸着処理した後、そのまま該装置
内で真空中で気化し得る光学部品用の有機系被膜形成性
物質を含浸固化している多孔質セラミックス焼結体を加
熱して有機保護被膜を形成することを特徴とする光学部
品の真空蒸着方法である。
According to the present invention, an optical component is vacuum-deposited with an inorganic deposition material in a vacuum deposition apparatus, and then is impregnated with an organic film-forming substance for an optical component which can be vaporized in a vacuum in the apparatus. A vacuum evaporation method for optical parts, characterized in that an organic protective film is formed by heating a porous ceramic sintered body.

【0016】使用する多孔質セラミックス焼結体は、セ
ラミックス焼結体の大きさ、溶液の粘度などを調整する
ことで被膜形成性物質の量が調整でき、その作用を及ぼ
す必要のある被処理物の量が一定している真空蒸着装置
に対していつも決まった量を供給できる。特にその必要
量が微量でよい場合は純粋な被膜形成性物質のみでは計
量に困難を伴い熟練を要するがいつも一定量をセラミッ
クス焼結体に吸収させてあれば特別な計器を必要とせず
計数が容易である。従ってこれが完全になくなるように
調整した蒸発装置で処理するとおのずと必要量だけ蒸発
することになる。また、この方法によれば被処理物を加
熱することが容易なので被処理物上で重合させて膜を形
成するようにすることも可能である。
The amount of the film-forming substance can be adjusted by adjusting the size of the ceramic sintered body, the viscosity of the solution, etc. for the porous ceramic sintered body to be used. A constant amount can always be supplied to a vacuum evaporation apparatus having a constant amount of. Especially when the required amount is very small, it is difficult to measure with pure film-forming substance alone and skill is required. Easy. Therefore, if the treatment is carried out by an evaporator adjusted so as to completely eliminate this, the required amount is naturally evaporated. Further, according to this method, it is easy to heat the object to be processed, so that it is possible to form a film by polymerizing the object to be processed.

【0017】[0017]

【実施例】本発明を実施例によって説明する。本発明は
この実施例によって何ら限定されない。
EXAMPLES The present invention will be described with reference to examples. The present invention is not limited by this embodiment.

【0018】実施例1 有機物系の被膜形成物質である蒸着物質としてポリエチ
レンワックスを溶融し、あらかじめ十分乾燥してある1
5×15×1ミリメートルの多孔性セラミックスに吸収
させた。このセラミックスの増量は1個あたり0.20
グラムである。
Example 1 Polyethylene wax was melted as a vapor-depositing substance which is an organic film-forming substance, and was sufficiently dried beforehand.
Absorbed in 5 × 15 × 1 mm porous ceramics. The increase of this ceramic is 0.20 per piece
Gram.

【0019】ここで得たセラミックス1個を直径φ60
0ミリメートルの真空蒸着装置に挿入し通常の蒸着操作
の後85℃に加熱して蒸発させた。干渉法によって膜厚
を測定すると0.03マイクロメートルであった。メガ
ネのレンズに形成された撥水性の膜は、干渉法によって
膜厚を測定すると0.03マイクロメートルであった。
これは保護膜として充分機能する厚みである。
One of the ceramics obtained here was used for a diameter φ60.
It was inserted into a 0 mm vacuum evaporation apparatus and heated to 85 ° C. to evaporate after a normal evaporation operation. The film thickness measured by the interferometry was 0.03 micrometers. The thickness of the water-repellent film formed on the lens of the spectacles was 0.03 μm when measured by an interference method.
This is a thickness that sufficiently functions as a protective film.

【0020】実施例2 有機物系の被膜形成物質である蒸着物質としてシリコー
ン樹脂化合物(パーフロロアルキルシラザン)の溶液を
用いた。この物の蒸発残留物は3%であった。直径φ1
5ミリメートル球状の多孔性セラミックス焼結体を用意
し、あらかじめ充分に乾燥した後シリコーン樹脂溶液を
吸収させて溶剤回収装置の付いた乾燥装置で10-6トー
ルまで減圧乾燥し蒸発性物質を除去した。この操作によ
るセラミックスの増量は1個当たり0.50グラムであ
るようにした。
Example 2 A solution of a silicone resin compound (perfluoroalkylsilazane) was used as a vapor-depositing substance which is an organic film-forming substance. The evaporation residue of this product was 3%. Diameter φ1
A 5 mm spherical porous ceramic sintered body was prepared, sufficiently dried in advance, absorbed with a silicone resin solution, and dried under reduced pressure to 10 -6 torr by a drying apparatus equipped with a solvent recovery apparatus to remove volatile substances. . The amount of ceramics increased by this operation was 0.50 g per piece.

【0021】このセラミックス2個を直径φ800ミリ
メートル真空蒸着装置に挿入し通常に蒸着操作の後、1
50℃に加熱して蒸発させた。メガネのレンズに形成さ
れた撥水性の膜は、干渉法によって膜厚を測定すると
0.08マイクロメートルであった。これは保護膜とし
て充分機能する厚みである。パーフロロアルキルシラザ
ンは不安定な分解し易い部分があり、通常は大量の溶剤
中で保管しているものである。それを濃縮するので安定
性が問題になるが、本実施例の方法ではにセラミックス
焼結体の化学成分と1部のパーフロロアルキルシラザン
が化学的に結合し加熱によって蒸発するまで安定に保持
される。
After inserting these two ceramics into a vacuum evaporation apparatus having a diameter of 800 mm,
Heat to 50 ° C. and evaporate. The thickness of the water-repellent film formed on the lenses of the glasses was measured to be 0.08 micrometers by an interference method. This is a thickness that sufficiently functions as a protective film. Perfluoroalkylsilazane has an unstable and easily decomposable portion, and is usually stored in a large amount of solvent. Since this is concentrated, stability becomes a problem. However, in the method of this embodiment, the chemical component of the ceramic sintered body and one part of perfluoroalkylsilazane are chemically bonded and stably held until evaporated by heating. You.

【0022】実施例3 有機物系被膜形成物質である蒸着物質として脱アンモニ
ア型ウレタンモノマーを用いた。この物の蒸発残留物は
25%であった。この物を不定形に破砕して充分に乾燥
した多孔性セラミックスに吸収させて実施例2で用いた
乾燥装置で乾燥した。この操作によるセラミックス1.
0グラムあたりの増量は0.2グラムすなわち20%で
あった。このセラミックスを2グラム分け取り直径80
0ミリメートル真空蒸着装置に挿入し通常に蒸着操作の
後、80℃に加熱して蒸発させた。
Example 3 A deammonified urethane monomer was used as a vapor-deposited substance which is an organic-based film-forming substance. The evaporation residue of this product was 25%. This product was crushed into an irregular shape, absorbed into a sufficiently dried porous ceramic, and dried using the drying apparatus used in Example 2. Ceramics by this operation 1.
The weight gain per gram was 0.2 grams or 20%. 2 grams of this ceramic was separated and the diameter was 80
After inserting into a 0 mm vacuum evaporation apparatus and performing a normal evaporation operation, it was heated to 80 ° C. to evaporate.

【0023】また被処理物上で反応を促進するため、別
の加熱装置により被処理物を150℃に保った。蒸着処
理後真空蒸着装置を開けるとアンモニア臭がして脱アン
モニア反応が起きていることが確認された。干渉法によ
って膜厚を測定すると0.05マイクロメートルであっ
た。これは保護膜として充分機能する厚みである。撥水
性の目安となる数字で水の接触角という言葉があるが、
パーフロロアルキルシラザンを蒸着したとき、従来の方
法では110度以下だったものが本発明の方法によれば
120度程度にまで上がる。
In order to promote the reaction on the object, the object was kept at 150 ° C. by another heating device. When the vacuum deposition apparatus was opened after the vapor deposition process, it was confirmed that ammonia odor was emitted and a deammonification reaction had occurred. The film thickness was measured by the interferometry to be 0.05 micrometers. This is a thickness that sufficiently functions as a protective film. There is a word called water contact angle in the number that is a measure of water repellency,
When perfluoroalkylsilazane is deposited, the temperature is reduced from 110 degrees or less in the conventional method to about 120 degrees in the method of the present invention.

【0024】[0024]

【発明の効果】被膜形成性物質の量が調整でき、真空蒸
着装置に熟練を要することなく、いつも決まった量(微
量でもよい)被膜形成性物質を供給でき、容器などにい
れて加熱することにより簡単に使用できる有機系被膜形
成性物質の新しい使用方法を提供することができる。
According to the present invention, the amount of the film-forming substance can be adjusted, the skilled artisan needs no skill in the vacuum deposition apparatus, and can always supply a fixed amount (even a small amount) of the film-forming substance, and put it in a container or the like for heating. Thus, a new method of using an organic film-forming substance that can be used more easily can be provided.

【0025】洗浄工程塗布工程を蒸着工程迄含めて1つ
の工程とし、更に被膜形成のための細かな調整を不要と
してしまう真空蒸着方法を提供することができる。
Cleaning Step The present invention can provide a vacuum vapor deposition method in which the coating step is a single step including the vapor deposition step, and further, fine adjustment for forming a film is not required.

【0026】セラミックス焼結体の大きさや含ませる時
の溶液の濃度などを調整することでセラミックス焼結体
に含ませる被膜形成性物質の量の割合が調整できる、1
台の真空蒸着装置で処理する被処理物の数はそれを処理
する真空蒸着装置の大きさ、とりわけ直径でほぼ決まっ
ているため被膜形成性物質の量も真空蒸着装置の大きさ
で決まる。本発明の方法ではいつも真空蒸着装置の大き
さに合わせた一定の量の被膜形成性物質を供給できる。
特にその被膜形成性物質の量が微量でよい場合は被膜形
成性物質のみでは計量に熟練を要するが、いつも一定量
をセラミックス焼結体に吸収させてあれば個数を数える
だけで良く計量の必要がない。従ってこの被膜形成性物
質が完全になくなるように加熱機構を調整した蒸発装置
に必要な数のセラミックス焼結体を入れて処理すると微
量でよい場合でも必要量だけ蒸発することになる。
The ratio of the amount of the film-forming substance contained in the ceramic sintered body can be adjusted by adjusting the size of the ceramic sintered body or the concentration of the solution when the ceramic sintered body is contained.
The number of objects to be processed by a single vacuum evaporation apparatus is substantially determined by the size of the vacuum evaporation apparatus for processing the same, especially by the diameter, and therefore the amount of the film-forming substance is also determined by the size of the vacuum evaporation apparatus. In the method of the present invention, a constant amount of the film-forming substance can be supplied according to the size of the vacuum deposition apparatus.
In particular, when the amount of the film-forming substance is very small, it is necessary to use only the film-forming substance to perform the measurement. There is no. Therefore, if a necessary number of ceramic sintered bodies are put into an evaporator in which a heating mechanism is adjusted so that the film-forming substance is completely eliminated, the necessary amount is evaporated even if a small amount is required.

【0027】また、この方法によれば被処理物を加熱す
ることが容易なので被処理物上で重合させて膜を形成す
るようにすることも可能である。
Further, according to this method, it is easy to heat the object to be processed, so that it is possible to form a film by polymerizing on the object to be processed.

【0028】また、通常の真空蒸着操作の後そのまま蒸
着装置の中で本発明の保護被膜の形成処理をするので被
処理物を蒸着装置から外に取り出すことはなく、外に出
すことによって生じた塵埃や汚染を洗浄するため従来行
われていた保護皮膜形成処理前の洗浄工程を必要としな
い。蒸着後引き続き同じ真空蒸着装置内で保護被膜の形
成処理をするため中間での洗浄工程が不要となり、蒸着
処理工程での溶剤の使用も不要となる。溶剤は製造工程
でのみ使用され、この工程では回収が容易であり、この
ため工場から搬出される製品は全く無溶剤となる利点が
ある。
Further, since the protective film of the present invention is formed in the vapor deposition apparatus after the ordinary vacuum vapor deposition operation, the object to be processed is not taken out of the vapor deposition apparatus but is produced by taking it out. There is no need for a conventional cleaning step before the protective film forming process for cleaning dust and contamination. After the vapor deposition, the protective film is formed in the same vacuum vapor deposition apparatus, so that an intermediate cleaning step is not required, and the use of a solvent in the vapor deposition step is not required. The solvent is used only in the manufacturing process, and is easily recovered in this process, so that there is an advantage that the product carried out of the factory is completely solvent-free.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C23C 14/00 - 14/58 G02B 1/10 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) C23C 14/00-14/58 G02B 1/10

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 光学部品用の有機系被膜形成性物質を含
浸固化している多孔質セラミックス焼結体を用いて光学
部品上に有機保護被膜を形成することを特徴とする光学
部品の真空蒸着方法。
1. A vacuum deposition of an optical component, wherein an organic protective film is formed on the optical component by using a porous ceramic sintered body impregnated and solidified with an organic film-forming substance for an optical component. Method.
【請求項2】 光学部品を真空蒸着装置内で無機物系蒸
着物質で真空蒸着処理した後、そのまま該装置内で真空
中で気化し得る光学部品用の有機系被膜形成性物質を含
浸固化している多孔質セラミックス焼結体を加熱して有
機保護被膜を形成する請求項1の光学部品の真空蒸着方
法。
2. An optical component is vacuum-deposited with an inorganic deposition material in a vacuum deposition apparatus, and then impregnated and solidified with an organic film-forming substance for an optical component which can be vaporized in vacuum in the apparatus. 2. The method of claim 1, wherein the porous ceramic sintered body is heated to form an organic protective film.
【請求項3】 多孔質セラミックス焼結体に含浸固化し
ている有機系被膜形成性物質がポリエチレンワックスで
ある請求項1または2の光学部品の真空蒸着方法。
3. The method according to claim 1, wherein the organic film-forming substance impregnated and solidified in the porous ceramics sintered body is polyethylene wax.
【請求項4】 多孔質セラミックス焼結体に含浸固化し
ている有機系被膜形成性物質がシリコーン樹脂化合物で
ある請求項1または2の光学部品の真空蒸着方法。
4. The method according to claim 1, wherein the organic film-forming substance impregnated and solidified in the porous ceramic sintered body is a silicone resin compound.
JP8199872A 1996-06-17 1996-06-17 Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts Expired - Fee Related JP2892620B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8199872A JP2892620B2 (en) 1996-06-17 1996-06-17 Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8199872A JP2892620B2 (en) 1996-06-17 1996-06-17 Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts

Related Parent Applications (1)

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JP18122990A Division JP2858440B2 (en) 1990-07-09 1990-07-09 Porous ceramic material impregnated and solidified with an organic film-forming substance that can be vaporized in a vacuum, and a method for forming an organic substance-based deposited film using the same

Publications (2)

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JPH0913167A JPH0913167A (en) 1997-01-14
JP2892620B2 true JP2892620B2 (en) 1999-05-17

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Country Link
JP (1) JP2892620B2 (en)

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* Cited by examiner, † Cited by third party
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JP4525637B2 (en) * 2006-06-22 2010-08-18 凸版印刷株式会社 Method for forming antifouling thin film
KR101025005B1 (en) * 2007-07-26 2011-03-24 주식회사 쎄코 Multipurpose carrier of vacuum vapor deposition material and method thereof
CN102841391A (en) * 2011-06-23 2012-12-26 苏州五方光电科技有限公司 Sticky wax groove

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