JPH02197564A - Vacuum deposition device - Google Patents
Vacuum deposition deviceInfo
- Publication number
- JPH02197564A JPH02197564A JP1847789A JP1847789A JPH02197564A JP H02197564 A JPH02197564 A JP H02197564A JP 1847789 A JP1847789 A JP 1847789A JP 1847789 A JP1847789 A JP 1847789A JP H02197564 A JPH02197564 A JP H02197564A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- boat
- metal
- vapor deposition
- packing material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title description 2
- 229910052751 metal Inorganic materials 0.000 claims abstract description 48
- 239000002184 metal Substances 0.000 claims abstract description 47
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 14
- 239000000945 filler Substances 0.000 claims description 12
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 abstract description 32
- 238000000151 deposition Methods 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 8
- 238000003860 storage Methods 0.000 abstract description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 6
- 230000005611 electricity Effects 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract 5
- 230000008021 deposition Effects 0.000 description 8
- 239000013078 crystal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000013212 metal-organic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の技術分野)
本発明は、蒸着金属の突沸を防止し高品位の蒸着面を得
ることができる真空蒸着装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a vacuum evaporation apparatus that can prevent bumping of evaporated metal and obtain a high-quality evaporation surface.
(発明の技術的背景とその問題点)
従来、たとえば水晶振動子の製造工程では、水晶板の板
面に電極を形成する場合、真空蒸着装置を用いて蒸着金
属を蒸着するようにしていた。(Technical background of the invention and its problems) Conventionally, for example, in the manufacturing process of a crystal resonator, when forming electrodes on the surface of a crystal plate, a vacuum deposition apparatus was used to deposit a metal.
このような真空蒸着装置では真空中で水晶板と蒸着源と
の間にマスクを配設し、このマスクに設けた透孔によっ
て蒸着域を規制して所定の形状の電極を水晶板の板面に
蒸着するようにしている。In such a vacuum evaporation apparatus, a mask is placed between the quartz crystal plate and the evaporation source in a vacuum, and the evaporation area is regulated by a hole in the mask, and an electrode of a predetermined shape is placed on the surface of the quartz plate. I am trying to evaporate it to
ところで、このような蒸着装置では、たとえば蒸着ボー
トに貯留した蒸着金属に電流を流し、この際に発生する
ジュール熱によって蒸着金属を加熱して金属蒸気を得る
ようにしている。By the way, in such a vapor deposition apparatus, for example, an electric current is passed through the vapor deposited metal stored in the vapor deposition boat, and the Joule heat generated at this time heats the vapor deposited metal to obtain metal vapor.
第3図a、第3図すおよび第3図Cは、従来の各別の蒸
着ボートの一例を示す図である。FIGS. 3A, 3S, and 3C are views showing examples of different conventional vapor deposition boats.
すなわち、第3図aに示す蒸着ボート1は、−船釣な開
放型のもので、帯状の金属板の中央部に蒸発金属を貯留
する舟形の貯留槽2を設けたものである。That is, the vapor deposition boat 1 shown in FIG. 3a is of an open boat type, and has a boat-shaped storage tank 2 for storing evaporated metal in the center of a strip-shaped metal plate.
このような蒸着ボー)1は、構造も簡単であるが、蒸着
金属を加熱、溶融すると、ガス成分が溶融した金属の表
面から真空中に離脱する際に蒸着金属の飛沫が飛び散る
、いわゆる突沸を生じ易く蒸着面に蒸着金属の大きな粒
が付着することがあり蒸着面の品位が低い問題がある。Such a vapor deposition method (1) has a simple structure, but when vapor-deposited metal is heated and melted, it causes so-called bumping, in which droplets of vapor-deposited metal are scattered when the gas component leaves the surface of the molten metal in a vacuum. This tends to occur, and large particles of the vapor-deposited metal may adhere to the vapor-deposited surface, resulting in a problem that the quality of the vapor-deposited surface is low.
また、第3図すに示すものは、高品位の蒸着面を得られ
るように、蒸着ボー)1の蒸発金属の貯留槽2の前面に
二層にじゃま板3.4を配設して被蒸着物から蒸着源を
直視できないようにしたものである。In addition, in order to obtain a high-quality evaporation surface, two layers of baffle plates 3 and 4 are provided on the front surface of the evaporation metal storage tank 2 of the evaporation board 1, as shown in FIG. The evaporation source cannot be seen directly from the evaporation material.
このようにすれば蒸着金属に突沸を生じても大きな粒が
蒸着面に達することがなく、理想的な蒸着源となり得る
が、被蒸着物に蒸着膜の形成される速度、すなわち蒸着
速度が遅くなり、所望の蒸着膜を形成するために必要な
時間が長くなる問題がある。In this way, even if bumping occurs in the deposited metal, large particles will not reach the deposition surface, making it an ideal deposition source, but the rate at which the deposited film is formed on the object to be deposited, that is, the deposition rate, is slow. Therefore, there is a problem that the time required to form a desired deposited film becomes longer.
さらに、第3図Cに示すものは、蒸発金属の貯留槽2の
前面に蒸着金属と反応しない金属等からなるメツシュ5
を配設して蒸着金属の大きな粒が蒸着面に到達すること
を防止したものである。Furthermore, the one shown in FIG.
This prevents large particles of deposited metal from reaching the deposition surface.
しかしながら、このようなものでは蒸着ボートlの溶融
した蒸発金属の電気抵抗はメツシュ5に比して著しく小
さいので、はとんどの電流は溶融した蒸発金属を流れて
メツシュ5には流れないのでメツシュ5の温度はほとん
ど上昇しない。However, in such a device, the electrical resistance of the molten evaporated metal in the evaporation boat L is significantly smaller than that of the mesh 5, so most of the current flows through the molten evaporated metal and does not flow into the mesh 5, so the mesh The temperature of No. 5 hardly rises.
このために、発生した金属蒸気は温度の低いメツシュに
付着して極端な場合にはメツシュの目詰まりを起こす問
題がある。このような問題を解決するためには、たとえ
ば2台の電源を用いて蒸着ボートlとメツシュ5とを相
互に絶縁して各別に通電して加熱制御する必要があり構
造が複雑でコストも高価になる。Therefore, the generated metal vapor adheres to the mesh having a low temperature, and in extreme cases, there is a problem that the mesh may become clogged. In order to solve this problem, it is necessary to insulate the deposition boat L and the mesh 5 from each other using, for example, two power supplies, and to control the heating by applying electricity to each separately, resulting in a complicated structure and high cost. become.
(発明の目的)
本発明は、上記の事情に鑑みてなされたもので、蒸着金
属の突沸による蒸着面の品位の低下を確実に防止でき、
それによって高品位の蒸着を行うことができる蒸着装置
を提供することを目的とするものである。(Object of the Invention) The present invention has been made in view of the above circumstances, and can reliably prevent the deterioration of the quality of the vapor deposition surface due to bumping of the vapor deposited metal.
The object of the present invention is to provide a vapor deposition apparatus that can perform high-quality vapor deposition.
(発明の概要)
本発明は、ra細な間隙を有する充填物に蒸着金属を含
浸させて蒸着ボートに貯留し、この蒸着ボートの開口部
を網目状のスクリーンで覆ったことを特徴とするもので
ある。(Summary of the Invention) The present invention is characterized in that a filler having narrow gaps is impregnated with vapor-deposited metal and stored in a vapor-deposition boat, and the opening of the vapor-deposition boat is covered with a mesh screen. It is.
(実施例)
以下、本発明の一実施例を、凹面を参照して詳細に説明
する。第1図は本発明の一実施例の蒸着装置の蒸着ボー
トの一例を示す斜視図、第2図は上記蒸着ボートの側断
面図である。(Example) Hereinafter, an example of the present invention will be described in detail with reference to a concave surface. FIG. 1 is a perspective view showing an example of a vapor deposition boat of a vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a side sectional view of the vapor deposition boat.
すなわち、蒸着ボート11は、それ自体に通電してこの
際に発生するジュール熱により蒸着金属を加熱するよう
にしている。したがって、このようなものでは、蒸着ボ
ート11は導電性を有し、かつ高温に加熱して蒸着金属
12から金属蒸気を発生させる際にも該金属蒸気と化学
的に反応しない、あるいは反応のきわめて少ない材料が
好ましく、タングステンを用いている。That is, the vapor deposition boat 11 is configured to energize itself and heat the vapor deposited metal using the Joule heat generated at this time. Therefore, in such a device, the evaporation boat 11 has conductivity and does not chemically react with the metal vapor even when heated to a high temperature to generate metal vapor from the evaporated metal 12, or does not react chemically with the metal vapor, or does not react with the metal vapor at a very high temperature. The preferred material is tungsten.
そして、これらの金属板を帯板状に成形して、その略中
央部に船型の貯留槽13を形成している。These metal plates are formed into a strip shape, and a boat-shaped storage tank 13 is formed approximately in the center thereof.
そして、上記蒸着ボー)11の貯留槽13に微細な間隙
を有し、蒸着金属と反応しない金属または無機質等から
なる充填物14を配置し、これに金、銀等の蒸着金属を
含浸させて貯留するようにしている。Then, a filler 14 having minute gaps and made of a metal or inorganic material that does not react with the vapor-deposited metal is placed in the storage tank 13 of the vapor-deposited metal 11, and is impregnated with a vapor-deposited metal such as gold or silver. I'm trying to save it.
なお上記充填物14としては、たとえば0.2mmの径
のタングステンワイヤの適量を塊状に丸めたものを用い
ている。The filler 14 is, for example, a suitable amount of tungsten wire with a diameter of 0.2 mm rolled into a lump.
この場合、充填物14の密度をあまり高くすると蒸着金
属を含浸できる量が減少して頻繁に補充する必要があり
、密度が低すぎると突沸の防止効果が低くなるので適当
な密度に調整する必要かある。In this case, if the density of the filler 14 is too high, the amount that can be impregnated with the vapor-deposited metal will be reduced, requiring frequent replenishment, and if the density is too low, the effect of preventing bumping will be reduced, so it is necessary to adjust the density to an appropriate value. There is.
そして、蒸着ボート11内の充填物14が運搬、取り付
は時等に脱落するのを防止するために、その上面開口部
を網目状のスクリーン15で覆うようにしている。この
スクリーン15は、たとえば0.3mm径のタングステ
ンワイヤを3 m m程度のメツシュの大きさに編んだ
ものである。In order to prevent the filler 14 in the deposition boat 11 from falling off during transportation, installation, etc., the upper opening is covered with a mesh screen 15. This screen 15 is made of, for example, 0.3 mm diameter tungsten wire woven into a mesh size of about 3 mm.
なお、上記充填物14の上面と上記スクリーン15の下
面とは略接する位置関係とし、スクリーン15の上面と
蒸着ボー)11の開口面上端との間は充填物14に蒸着
金属を含浸させるに必要な間隙を設けてM量の空間を形
成している。The upper surface of the filler 14 and the lower surface of the screen 15 are in a positional relationship in which they are almost in contact with each other, and the space between the upper surface of the screen 15 and the upper end of the opening surface of the vapor deposition bow 11 is necessary for impregnating the filler 14 with the vapor-deposited metal. A space of M amount is formed by providing a gap.
このようにすれば、後述する蒸着金属の塊17を溶融し
て充填物14に含浸させる際に蒸着ボー)11からこぼ
れないようにすることができる。In this way, it is possible to prevent the vapor-deposited metal mass 17 from spilling out from the vapor-deposited bowl 11 when it is melted and impregnated into the filler 14, which will be described later.
そして、蒸着ボー)11の両端部にはクランパ兼電極1
6を設けて、これを図示しない端子に締着してここから
電力を供給するとともに蒸着ボー)11自体を保持する
ようにしでいる。A damper/electrode 1 is provided at both ends of the vapor deposition board 11.
6 is provided and is fastened to a terminal (not shown) to supply power therefrom and to hold the vapor deposition board 11 itself.
なお、真空蒸着装置では容器内を真空に減圧する真空ポ
ンプ、被蒸着物を保持する保持機構、被蒸着物に対する
蒸着部位を規制するマスク等を設けることは勿論である
。Note that the vacuum evaporation apparatus is, of course, provided with a vacuum pump for reducing the pressure inside the container to a vacuum, a holding mechanism for holding the object to be evaporated, a mask for regulating the evaporation site with respect to the object to be evaporated, and the like.
このような構成であれば、蒸着ボー)11で加熱した蒸
着金属12が外部へ飛散しないように図示しないシャッ
タを閉成してスクリーン15の上に第2図に破線17で
示すように蒸着金属の塊を並べて通電すると蒸着金属の
塊17は発熱、溶融して自重で落下し、充填物14の間
隙に含浸させることができる。この状態でシャッタを開
いて発生した金属蒸気を被蒸着物へ飛ばして蒸着を行な
えば突沸等を生じることなく高品位の蒸着面を得ること
ができる。With such a configuration, a shutter (not shown) is closed to prevent the vapor-deposited metal 12 heated by the vapor-depositing board 11 from scattering to the outside, and the vapor-deposited metal is placed on the screen 15 as shown by the broken line 17 in FIG. When the lumps are arranged and energized, the vapor-deposited metal lump 17 generates heat, melts, falls under its own weight, and can be impregnated into the gaps in the filler 14. If the shutter is opened in this state and the metal vapor generated is blown onto the object for vapor deposition, a high quality vapor deposition surface can be obtained without bumping or the like.
しかして、上記実施例によれば、格別に蒸着速度が低下
することなく、しかも溶融した蒸着金属の突沸を防止で
きるので高品質の蒸着面を得ることができる。According to the above-mentioned embodiment, the vapor deposition rate is not particularly reduced, and bumping of the molten vapor-deposited metal can be prevented, so that a high-quality vapor-deposited surface can be obtained.
なお、本発明は上記実施例に限定されるものではなく、
たとえば上記実施例では充填物としてタングステンワイ
ヤの塊を用いるものについて説明したが、小さな粒状の
物質、たとえば直径3mm程度のモリブデンの球を用い
るようにしてもよい。Note that the present invention is not limited to the above embodiments,
For example, in the above embodiment, a lump of tungsten wire is used as the filler, but it is also possible to use a small granular material, for example, a molybdenum ball with a diameter of about 3 mm.
なおこの場合は、スクリーンのメツシュの大きさは上記
粒状物がこぼれ出ないように2mm程度にする必要があ
る。In this case, the mesh size of the screen must be approximately 2 mm to prevent the above-mentioned particulate matter from spilling out.
また、蒸着金属として、たとえば金、銀等を用いる場合
、蒸着ボートとしては、これらの蒸着金属と反応しない
タングステン、モリブデン、タンタル等の導電性の金属
を用いることもできる。Furthermore, when using gold, silver, or the like as the vapor-deposited metal, a conductive metal such as tungsten, molybdenum, or tantalum, which does not react with these vapor-deposited metals, can also be used as the vapor-deposition boat.
さらに上記実施例では、蒸着ボートに直接通電して加熱
するものについて説明したが、他の熱源によって加熱す
るようにしてもよい。この場合は蒸着ボートとしてセラ
ミック等の絶縁物も用いることができる。Furthermore, in the above embodiments, the deposition boat is heated by being directly energized, but the boat may be heated by other heat sources. In this case, an insulating material such as ceramic can also be used as the vapor deposition boat.
(発明の効果)
以上詳述したように、本発明によれば、簡単な構成で、
蒸着速度を低下させることなく、蒸着金属の突沸を確実
に防止することができ、それによって高品位の蒸着面を
得られる蒸着装置を提供することができる。(Effects of the Invention) As detailed above, according to the present invention, with a simple configuration,
It is possible to provide a vapor deposition apparatus that can reliably prevent bumping of vapor-deposited metal without reducing the vapor deposition rate, and thereby obtain a high-quality vapor deposition surface.
第1図は本発明の一実施例の蒸着ボートを示す斜視図、
第2図は第1図に示す蒸着ボートの側断面図、第3図a
、 b、 cは従来の各別の蒸着ボートを示す斜視
図である。
第1r!!1
1し
12・
13・
14・
15・
・・・蒸着ボート
・・・蒸着金属
・・・貯留槽
・・・充填物
・・・スクリーン
第2rM
qFig. 1 is a perspective view showing a vapor deposition boat according to an embodiment of the present invention, Fig. 2 is a side sectional view of the vapor deposition boat shown in Fig. 1, and Fig. 3 a.
, b, and c are perspective views showing different conventional vapor deposition boats. 1st r! ! 1 1shi 12・ 13・ 14・ 15・ ... Deposition boat ... Deposited metal ... Storage tank ... Filler ... Screen 2nd rM q
Claims (1)
する蒸着ボートと、 この蒸着ボートの開口部を覆う網目状のスクリーンと、 を具備することを特徴とする真空蒸着装置。[Claims] A vacuum evaporation system comprising: a evaporation boat for impregnating and storing evaporation metal in a filler having minute gaps; and a mesh screen covering an opening of the evaporation boat. Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1847789A JPH02197564A (en) | 1989-01-27 | 1989-01-27 | Vacuum deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1847789A JPH02197564A (en) | 1989-01-27 | 1989-01-27 | Vacuum deposition device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02197564A true JPH02197564A (en) | 1990-08-06 |
Family
ID=11972722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1847789A Pending JPH02197564A (en) | 1989-01-27 | 1989-01-27 | Vacuum deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02197564A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101025005B1 (en) * | 2007-07-26 | 2011-03-24 | 주식회사 쎄코 | Multipurpose carrier of vacuum vapor deposition material and method thereof |
KR101373270B1 (en) * | 2008-10-08 | 2014-03-11 | 가부시키가이샤 알박 | Evaporation material and method for producing evaporation material |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58136773A (en) * | 1982-02-08 | 1983-08-13 | Toshiba Corp | Vacuum depositing method and constituting body of vacuum depositing source |
-
1989
- 1989-01-27 JP JP1847789A patent/JPH02197564A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58136773A (en) * | 1982-02-08 | 1983-08-13 | Toshiba Corp | Vacuum depositing method and constituting body of vacuum depositing source |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101025005B1 (en) * | 2007-07-26 | 2011-03-24 | 주식회사 쎄코 | Multipurpose carrier of vacuum vapor deposition material and method thereof |
KR101373270B1 (en) * | 2008-10-08 | 2014-03-11 | 가부시키가이샤 알박 | Evaporation material and method for producing evaporation material |
KR101456837B1 (en) * | 2008-10-08 | 2014-11-04 | 가부시키가이샤 알박 | Evaporation material and method for producing evaporation material |
US9434002B2 (en) | 2008-10-08 | 2016-09-06 | Ulvac, Inc. | Evaporating material and method of manufacturing the same |
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