JPH057249Y2 - - Google Patents

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Publication number
JPH057249Y2
JPH057249Y2 JP11551485U JP11551485U JPH057249Y2 JP H057249 Y2 JPH057249 Y2 JP H057249Y2 JP 11551485 U JP11551485 U JP 11551485U JP 11551485 U JP11551485 U JP 11551485U JP H057249 Y2 JPH057249 Y2 JP H057249Y2
Authority
JP
Japan
Prior art keywords
shutter plate
particles
tip
container
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11551485U
Other languages
Japanese (ja)
Other versions
JPS6223871U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP11551485U priority Critical patent/JPH057249Y2/ja
Publication of JPS6223871U publication Critical patent/JPS6223871U/ja
Application granted granted Critical
Publication of JPH057249Y2 publication Critical patent/JPH057249Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 この考案は例えば分子線エピタキシヤル装置
(MBE)等の膜形成装置に係り、特にその分子線
源から発生する分子線を遮断するシヤツター板の
改良に関するものである。
[Detailed description of the invention] [Industrial application field] This invention relates to a film forming apparatus such as a molecular beam epitaxial apparatus (MBE), and in particular to a shutter plate that blocks the molecular beams generated from the molecular beam source. It is about improvement.

〔従来の技術〕[Conventional technology]

この種、従来の膜形成装置である分子線エピタ
キシヤル装置には例えば第5図に示す様に粒子体
を収容する容器として複数のるつぼを備えたもの
がある。図に於て、1は分子線源すなわち粒子発
生源で、この粒子発生源1は開口部4からこの開
口部4の前方に向かつてガリウム(Ga)等の比
較的低融点の分子線である膜成形用の粒子を放射
するるつぼからなる粒子体2の収容容器3と、こ
のるつぼ3を暖めるヒーター線5と、上記るつぼ
3の温度を感知して制御するための熱電対6と、
これらるつぼ2及びヒーター線5並びに熱電対6
を収容するための円筒形の穴を複数有し、これら
複数の円筒形の穴の中心が全て基板7の方向に向
かつて設けられているとともにこれら複数の円筒
形の穴の開口部8が設けられている面9が球面状
に快られた形状となつている第6図に示す様な液
体窒素シユラウド10とからなるものである。1
1は上記粒子発生源1上に設けらて、この粒子発
生源1から発生する粒子を遮断する第7図に示す
様な円板状のシヤツター板、12は、このシヤツ
ター板11を支持するとともに上記液体窒素シユ
ラウド10の円筒形の穴内に納められ回転導入端
子13の半回転によつて上記シヤツター板11を
開閉する棒状の支持体、14は上記液体窒素シユ
ラウド10上の円筒形の穴中心の方向に設けられ
るとともに重力方向Gに対して45度の角度で設け
られた基板、15はこの基板14を熱するヒータ
ーである。
This type of molecular beam epitaxial apparatus, which is a conventional film forming apparatus, is equipped with a plurality of crucibles as containers for storing particles, as shown in FIG. 5, for example. In the figure, reference numeral 1 denotes a molecular beam source, that is, a particle generation source, and this particle generation source 1 directs from an opening 4 in front of this opening 4 and generates a relatively low melting point molecular beam such as gallium (Ga). A storage container 3 for the particle body 2 consisting of a crucible that emits particles for film formation, a heater wire 5 for warming the crucible 3, and a thermocouple 6 for sensing and controlling the temperature of the crucible 3;
These crucible 2, heater wire 5 and thermocouple 6
It has a plurality of cylindrical holes for accommodating the cylindrical holes, and the centers of the plurality of cylindrical holes are all directed toward the substrate 7, and the openings 8 of the plurality of cylindrical holes are provided. The liquid nitrogen shroud 10 shown in FIG. 6 has a spherical surface 9. 1
Reference numeral 1 denotes a disc-shaped shutter plate as shown in FIG. 7, which is provided on the particle generation source 1 and blocks particles generated from the particle generation source 1, and 12 supports this shutter plate 11. A rod-shaped support 14 is housed in the cylindrical hole of the liquid nitrogen shroud 10 and opens and closes the shutter plate 11 by a half turn of the rotation introduction terminal 13. A substrate 15 is a heater that heats the substrate 14, which is provided in the direction of gravity and at an angle of 45 degrees with respect to the direction of gravity G.

従来の膜形成装置は上記のように構成され、た
とえば、ガリウム(Ga)及びヒ素(As)を同時
に蒸着する場合には異なるるつぼ3に各々ガリウ
ム(Ga)及びヒ素(As)を入れ、ヒーター線5
によつてるつぼ3を暖めた状態で各々のるつぼ3
のシヤツター板11を開閉し、これによつてガリ
ウム(Ga)及びヒ素(As)の蒸着割合を調節す
るものである。
A conventional film forming apparatus is configured as described above. For example, when evaporating gallium (Ga) and arsenic (As) at the same time, gallium (Ga) and arsenic (As) are placed in different crucibles 3, respectively, and the heater wire is 5
Warm each crucible 3 by
The shutter plate 11 is opened and closed, thereby adjusting the deposition ratio of gallium (Ga) and arsenic (As).

〔考案が解決しようとする問題点〕[Problem that the invention attempts to solve]

上記の様な従来の膜形成装置に於ては、るつぼ
1を暖めた状態でるつぼ3のシヤツター板11を
閉じていると、シヤツター板11の裏面には蒸発
したガリウム(Ga)が付着し、この付着したガ
リウム(Ga)がシヤツター板最低位部15に溜
つて、その溜り量が多くなるとシヤツター板11
の開閉動作中落下し、るつぼ3の外壁、あるいは
るつぼ3中に落下し、るつぼ3の外壁との化学反
応を生じてるつぼ3の寿命を短くしたり、るつぼ
3内の蒸着材料を汚染するという問題点があり、
また、これを避けるために、支持体12によるシ
ヤツター板11の支持部をシヤツター11の最低
位部15に設け、この支持体12を伝えて上記シ
ヤツター板11に付着したものを取り出そうとす
ると、支持体12を伝つて落ちる付着物が支持体
12下部の回転導入端子13のベアリング等に付
着し、支持体12が回転しなくなるという問題点
があつた。
In the conventional film forming apparatus as described above, when the shutter plate 11 of the crucible 3 is closed while the crucible 1 is warmed, evaporated gallium (Ga) adheres to the back surface of the shutter plate 11. This adhered gallium (Ga) accumulates on the lowest part 15 of the shutter plate, and when the accumulated amount increases, the shutter plate 11
during the opening/closing operation of the crucible 3, falling onto the outer wall of the crucible 3 or falling into the crucible 3, causing a chemical reaction with the outer wall of the crucible 3, shortening the life of the crucible 3, and contaminating the vapor deposition material inside the crucible 3. There are problems,
In addition, in order to avoid this, a support portion of the shutter plate 11 by the support body 12 is provided at the lowest part 15 of the shutter 11, and when an attempt is made to convey this support body 12 to take out the object attached to the shutter plate 11, the support There was a problem in that the deposits falling down the body 12 adhered to the bearings of the rotation introduction terminal 13 at the lower part of the support body 12, and the support body 12 stopped rotating.

この考案は、上記の問題点に鑑みてなされたも
ので、不純物の少ない高品質の膜が得られるとと
もに、粒子体を収容する容器が長寿命化する膜形
成装置を得ることを目的とする。
This invention was made in view of the above-mentioned problems, and aims to provide a film forming apparatus that can produce a high-quality film with few impurities and that can extend the life of a container that accommodates particles.

〔問題点を解決するための手段〕[Means for solving problems]

この考案に係る膜形成装置は、粒子体を収容す
る容器の開口部外に先端が位置する突出体をシヤ
ツター板の最低位部に設けてかつこの先端が突出
体の最も低い位置となるようにしたものである。
The film forming device according to this invention is provided with a protruding body whose tip is located outside the opening of a container containing particles at the lowest part of the shutter plate, and this tip is located at the lowest position of the protruding body. This is what I did.

〔作用〕[Effect]

この考案においてはシヤツター板の最低位部に
設けられた突出体の先端が粒子体を収容する容器
の開口部外に設けられているから、上記シヤツタ
ー板の裏面に付着した粒子は上記突出体の先端に
導かれ、この先端から落下するものであり、この
落下地点には上記容器及びその開口部がないから
容器を傷めたり、容器内の粒子体を汚染したりす
ることはないものである。
In this device, the tip of the protruding body provided at the lowest part of the shutter plate is provided outside the opening of the container containing the particles, so that particles adhering to the back surface of the shutter plate are removed from the protruding body. It is guided to the tip and falls from this tip, and since the container and its opening are not present at this point of fall, it does not damage the container or contaminate the particles inside the container.

〔実施例〕〔Example〕

以下、この考案の一実施例を図について説明す
る。第1図は、従来装置の第7図に相当する図で
あり、この図に於ては円板状のシヤツター板11
の最低位部15に、このシヤツター板11と一体
成形された先端が鋭角な三角形状の突出体16を
設け、この突出体16の先端17を粒子体2を収
容する容器3の開口部4外に位置させるととも
に、この先端17を上記シヤツター板11の最低
位部15より低くした点が上記第7図のものと異
なる。
An embodiment of this invention will be described below with reference to the drawings. FIG. 1 is a diagram corresponding to FIG. 7 of the conventional device, and in this diagram, a disc-shaped shutter plate 11
A triangular protrusion 16 with an acute tip is provided at the lowest part 15 of the shutter plate 11, and the tip 17 of the protrusion 16 is placed outside the opening 4 of the container 3 containing the particles 2. It differs from the one shown in FIG. 7 in that the tip 17 is located lower than the lowest portion 15 of the shutter plate 11.

上記の様に構成された膜形成装置に於ては突出
体16の先端17が鋭角な三角形状をしているか
ら、シヤツター板11の裏面に付着した粒子は突
出体16に効率よく集束されるとともに、の集束
された粒子もまた効率良く先端17から落下する
ものであり、従つて、シヤツター板11の裏面に
付着している粒子の量が非常に少なくなるからシ
ヤツター板11を開放したときにシヤツター板1
1に付着したまま凝固してしまう粒子が減り、シ
ヤツター板11を再び閉じたときに凝固した粒子
がはがれ落ちて容器13内に落下することはなく
はなるものである。また、この落下地点には容器
13及びその開口部4がないから、容器13を傷
めたり、容器13内の粒子体2を汚染することは
ないものである。そしてまた、上記の様な構造の
ものを第5図の様な複数の容器13を備えた粒子
発生源1に適用することはお互いの突出体16が
接触することなくシヤツター板11を開閉できる
ため、非常に有効な手段となるものである。
In the film forming apparatus configured as described above, since the tips 17 of the protrusions 16 have an acute triangular shape, particles adhering to the back surface of the shutter plate 11 are efficiently focused on the protrusions 16. At the same time, the focused particles also fall efficiently from the tip 17, and therefore the amount of particles adhering to the back surface of the shutter plate 11 is very small, so when the shutter plate 11 is opened, Shutter plate 1
This reduces the number of particles that solidify while adhering to the shutter plate 1, and prevents the solidified particles from peeling off and falling into the container 13 when the shutter plate 11 is closed again. Furthermore, since there is no container 13 or its opening 4 at this falling point, the container 13 will not be damaged or the particles 2 inside the container 13 will not be contaminated. Furthermore, applying the above-described structure to a particle generation source 1 having a plurality of containers 13 as shown in FIG. , is a very effective means.

なお、上記実施例に於てはシヤツター板11の
最低位部15に設けた突出体16を先端が鋭角な
三角形状のものとしたが、鈍角な三角形状のもの
でも良く、また、棒状のものでも良いものであ
る。
In the above embodiment, the protrusion 16 provided at the lowest part 15 of the shutter plate 11 is triangular with an acute angle at the tip, but it may be triangular with an obtuse angle, or it may be rod-shaped. But it's a good one.

また、上記実施例に於ては、シヤツター板11
を円形状のものとしてこれに突出体16を設けた
が第2図に示す様な半円形のシヤツター板11に
三角形状の突出体16を設けても良いものであ
る。
Further, in the above embodiment, the shutter plate 11
Although the shutter plate 11 is circular and has a protrusion 16 thereon, it is also possible to provide a triangular protrusion 16 on a semicircular shutter plate 11 as shown in FIG.

更に上記実施例に於ては、シヤツター板11の
開閉を回転導入端子13を半回転させることによ
つて行つていたが、第3図に示す様なハネ上げ
式、或いは第4図に示す様なベローズ18を用い
た前後直進式によつて行つても良く、これらのも
のに突出体16を設けても同様の効果を呈すもの
である。
Furthermore, in the above embodiment, the shutter plate 11 was opened and closed by rotating the rotation introduction terminal 13 by half a turn, but it is possible to open and close the shutter plate 11 by rotating the rotation introduction terminal 13 by half a turn, but it is possible to open and close the shutter plate 11 by rotating the rotation introduction terminal 13 by half a rotation, but it is also possible to open and close the shutter plate 11 by rotating the rotation introduction terminal 13 by half a turn, but it is also possible to open and close the shutter plate 11 by rotating the rotation introduction terminal 13 by half a turn. It may also be carried out by a front-rear straight movement type using bellows 18 of various types, and the same effect can be obtained even if the protruding body 16 is provided on these bellows 18.

〔考案の効果〕[Effect of idea]

この考案は以上説明したとおり、シヤツター板
の最低位部に設けられた突出体の先端が粒子体を
収容する容器の開口部外に設けられているから、
上記シヤツター板の裏面に付着した粒子が容器及
び容器内に落下することがなく、従つて不純物の
少ない高品質の膜が得られるとともに、粒子体を
収容する容器が長寿命化するという効果がある。
As explained above, this device has the tip of the protruding body provided at the lowest part of the shutter plate located outside the opening of the container containing the particles.
The particles adhering to the back surface of the shutter plate do not fall into the container and into the container, so a high quality film with few impurities can be obtained, and the container containing the particles has the effect of extending the lifespan. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の第1の実施例を示すシヤツ
ター板及び突出体並びに支持体及び容器の斜視
図、第2図はこの考案の第2の実施例を示すシヤ
ツター板及び突出体の斜視図、第3図及び第4図
はこの考案の第3及び第4の実施例に於るシヤツ
ター板の開閉機構を示す図、第5図は従来の膜形
成装置の斜視図、第6図はちこの膜形成装置に於
る液体窒素シユラウドの傾斜図、第7図はこの膜
形成装置に於るシヤツター板及び突出体並びに支
持体及び容器を示す斜視図である。 図において、2は粒子体、3は粒子体2の収容
容器、4はこの容器3の開口部、7は基板、11
はシヤツター板、12は支持体、15は上記シヤ
ツター板11の最低位部、16は突出体、17は
ちこの突出体16の先端、Gは重力方向である。
なお、各図中同一符号は同一または相当部分を示
すものである。
Fig. 1 is a perspective view of a shutter plate, a protruding body, a support body, and a container showing a first embodiment of this invention, and Fig. 2 is a perspective view of a shutter plate and a protruding body showing a second embodiment of this invention. , FIGS. 3 and 4 are views showing the opening and closing mechanism of the shutter plate in the third and fourth embodiments of this invention, FIG. 5 is a perspective view of a conventional film forming apparatus, and FIG. FIG. 7 is a perspective view of the liquid nitrogen shroud in the film forming apparatus; FIG. 7 is a perspective view showing the shutter plate, protrusion, support and container in the film forming apparatus. In the figure, 2 is a particle body, 3 is a storage container for the particle body 2, 4 is an opening of this container 3, 7 is a substrate, 11
12 is a shutter plate, 12 is a support, 15 is the lowest part of the shutter plate 11, 16 is a protrusion, 17 is the tip of the protrusion 16, and G is the direction of gravity.
Note that the same reference numerals in each figure indicate the same or corresponding parts.

Claims (1)

【実用新案登録請求の範囲】 (1) 開口部からこの開口部の前方に設けられる基
板に向かつて膜形成用の粒子を放射する粒子体
の収容容器と、この容器の開口部と上記基板と
の間に設けられるとともに重力方向に傾斜して
設けられて上記膜形成用の粒子を遮断するシヤ
ツター板と、このシヤツター板を支持する支持
体とを備えたものに於て、上記開口部外に先端
が位置するとともにこの先端が上記重力方向に
傾斜して設けられたシヤツター板の最低位部よ
りも低くなる様な突出体を上記シヤツター板の
最低位部に設けたことを特徴とする膜形成装
置。 (2) 突出部は先端が鋭角であることを特徴とする
実用新案登録請求の範囲第1項記載の膜形成装
置。 (3) 粒子体の収容容器を複数有することを特徴と
する実用新案登録請求の範囲第1項または第2
項記載の膜形成装置。
[Claims for Utility Model Registration] (1) A container for containing particles that emits film-forming particles from an opening toward a substrate provided in front of the opening; A shutter plate provided between the shutter plate and tilted in the direction of gravity to block the particles for forming the film, and a support for supporting the shutter plate, the shutter plate being provided between A membrane formation characterized in that a protruding body is provided at the lowest part of the shutter plate such that the tip is located and the tip is lower than the lowest part of the shutter plate which is provided inclined in the direction of gravity. Device. (2) The film forming apparatus according to claim 1, wherein the protrusion has an acute tip. (3) Claim 1 or 2 of the utility model registration claim characterized by having a plurality of storage containers for particle bodies
The film forming apparatus described in .
JP11551485U 1985-07-27 1985-07-27 Expired - Lifetime JPH057249Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11551485U JPH057249Y2 (en) 1985-07-27 1985-07-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11551485U JPH057249Y2 (en) 1985-07-27 1985-07-27

Publications (2)

Publication Number Publication Date
JPS6223871U JPS6223871U (en) 1987-02-13
JPH057249Y2 true JPH057249Y2 (en) 1993-02-24

Family

ID=30999236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11551485U Expired - Lifetime JPH057249Y2 (en) 1985-07-27 1985-07-27

Country Status (1)

Country Link
JP (1) JPH057249Y2 (en)

Also Published As

Publication number Publication date
JPS6223871U (en) 1987-02-13

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