JPS6352111B2 - - Google Patents
Info
- Publication number
- JPS6352111B2 JPS6352111B2 JP56073052A JP7305281A JPS6352111B2 JP S6352111 B2 JPS6352111 B2 JP S6352111B2 JP 56073052 A JP56073052 A JP 56073052A JP 7305281 A JP7305281 A JP 7305281A JP S6352111 B2 JPS6352111 B2 JP S6352111B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cylindrical mesh
- evaporation method
- thin film
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 25
- 239000010408 film Substances 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 11
- 238000003756 stirring Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 238000000427 thin-film deposition Methods 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 239000010409 thin film Substances 0.000 description 11
- 238000000151 deposition Methods 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は小型球状、棒状、角状等の基体の全面
に金属薄膜を均一にかつ効率良く真空蒸着させる
金属薄膜蒸着装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a metal thin film deposition apparatus for uniformly and efficiently vacuum depositing a metal thin film over the entire surface of a small spherical, rod-shaped, angular, etc. substrate.
従来前記形状物に薄膜を真空蒸着する場合、円
筒網籠を真空容器内で水平に置いて回転させ、円
筒網籠内の基体を撹拌しつつ網籠下方または網籠
内より薄膜材料を蒸発させ、円筒網籠内の基体表
面に薄膜を形成する方法が一般に行われている。 Conventionally, when vacuum-depositing a thin film on the above-mentioned shaped object, a cylindrical mesh cage is placed horizontally in a vacuum container and rotated, and the thin film material is evaporated from below or inside the mesh cage while stirring the substrate inside the cylindrical mesh cage. A commonly used method is to form a thin film on the surface of a substrate inside a cylindrical mesh cage.
しかし、この方法では収納する基体容積に比べ
円筒網籠容積が非常に大きくなり真空容器も大き
くなる。また下方より薄膜材料を蒸発させる場合
はさらに大きな容積を必要とし、無駄な真空空間
が多くなり、真空ポンプの容量を大きくするか、
必要真空度への到達時間が長くなつた。また基体
表面の蒸着膜の膜厚も、基体の円筒網籠内での位
置によつてばらつきが大きく、基体自身が円筒網
籠の下方に集中するため基板への着膜効率が悪い
といつた欠点があつた。 However, in this method, the volume of the cylindrical mesh basket is very large compared to the volume of the substrate to be accommodated, and the vacuum container also becomes large. In addition, if the thin film material is evaporated from below, an even larger volume is required, resulting in a large amount of wasted vacuum space, and the capacity of the vacuum pump must be increased.
It took longer to reach the required degree of vacuum. In addition, the thickness of the deposited film on the surface of the substrate varies greatly depending on the position of the substrate within the cylindrical mesh cage, and it has been said that the film deposition efficiency on the substrate is poor because the substrate itself is concentrated below the cylindrical mesh cage. There were flaws.
本発明は従来の欠点を除いた金属薄膜蒸着装置
を提供することを目的とするものである。 SUMMARY OF THE INVENTION An object of the present invention is to provide a metal thin film deposition apparatus that eliminates the conventional drawbacks.
以下、本発明の実施例について図面と共に説明
する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の金属膜蒸着装置の一実施例の
概略構成を示す断面図で、１は真空容器、２は基
体３を収納する浅い縁の付いた円筒状網籠で収納
する基体３がこぼれない大きさの網目を有し真空
容器１内に傾斜した状態で配置されている。４は
薄膜材料の収納るつぼ、５は円筒状網籠２を回転
させる回転軸で、空気漏れのない適宜の軸受装置
（図示せず）で保持され、外部より回転速度可変
のモーターにより回転運動が与えられる。６は、
抵抗加熱蒸着法、電子ビーム蒸着法、誘導加熱蒸
着法等の真空蒸着法によりるつぼ４より蒸発する
蒸気流の範囲を示す。 FIG. 1 is a sectional view showing a schematic configuration of an embodiment of the metal film deposition apparatus of the present invention, in which 1 is a vacuum container, and 2 is a cylindrical mesh basket with a shallow edge that houses a substrate 3. It has a mesh large enough to prevent spillage and is arranged in a tilted state inside the vacuum container 1. 4 is a crucible for storing thin film material, and 5 is a rotating shaft for rotating the cylindrical mesh basket 2, which is held by an appropriate bearing device (not shown) that does not leak air, and whose rotational movement is controlled by an externally variable speed motor. Given. 6 is
The range of vapor flow evaporated from the crucible 4 by a vacuum evaporation method such as a resistance heating evaporation method, an electron beam evaporation method, or an induction heating evaporation method is shown.
第２図は基体３を収納した円筒状網籠２の上面
図であり、７は円筒状網籠２の外周面より放射状
に内方に延びる複数の撹拌羽根である（尚、第１
図においては図面の簡明化のため撹拌羽根７は図
示していない）。回転軸５を回転させるとそれに
固定された円筒状網籠２は同時に回転し、円筒状
網籠２に収納された基体３は、撹拌羽根７によつ
て上部に持ち上げられ、さらに進むと上部より順
次不規則な運動をしながら円筒状網籠２の底面の
網面上を落下し、るつぼ４より蒸発する薄膜材料
の蒸気流６によつて基体３の表面に薄膜が蒸着さ
れる。これを繰り返すことによつて基体３の表面
に所定の膜厚の蒸着薄膜が形成される。尚、第２
図におけるＡ部分は基体３の団塊領域で、Ｂ部分
は基体３が不規則な運動をしつつ着膜される着膜
領域である。るつぼ４より蒸発した薄膜材料の蒸
気流６を効率良く膜に使用するためには、円筒状
網籠２の底面の網面の着膜領域Ｂに基体３の密度
をできるだけ均一に落下させる必要があり、撹拌
羽根７を取り付けることにより網面での基体３の
密度を均一にすることができ効率的に着膜するこ
とができる。また、円筒状網籠２の傾斜角と回転
速度を変化させることによつて基体３を円筒状網
籠２の着膜領域Ｂにより均一に落下させることが
できる。 FIG. 2 is a top view of the cylindrical mesh basket 2 housing the base 3, and 7 is a plurality of stirring blades extending radially inward from the outer peripheral surface of the cylindrical mesh basket 2 (note that the first
In the figure, the stirring blade 7 is not shown for the purpose of simplifying the drawing). When the rotating shaft 5 is rotated, the cylindrical mesh basket 2 fixed thereto simultaneously rotates, and the substrate 3 housed in the cylindrical mesh cage 2 is lifted upward by the stirring blade 7, and as it moves further, it is lifted from the top. A thin film is deposited on the surface of the substrate 3 by a vapor flow 6 of the thin film material that falls on the mesh surface of the bottom of the cylindrical mesh basket 2 while moving irregularly and evaporates from the crucible 4. By repeating this process, a deposited thin film having a predetermined thickness is formed on the surface of the base 3. Furthermore, the second
In the figure, part A is a lump region of the substrate 3, and part B is a film-depositing region where the film is deposited while the substrate 3 moves irregularly. In order to efficiently use the vapor flow 6 of the thin film material evaporated from the crucible 4 to form a film, it is necessary to drop the substrate 3 as evenly as possible in density to the film deposition area B of the net surface on the bottom surface of the cylindrical mesh basket 2. By attaching the stirring blades 7, the density of the substrate 3 on the mesh surface can be made uniform, and a film can be efficiently deposited. Further, by changing the inclination angle and rotational speed of the cylindrical mesh basket 2, the substrate 3 can be uniformly dropped into the coating area B of the cylindrical mesh basket 2.
本実施例の装置は例えば金属皮膜抵抗器の製造
に用いることができる。金属皮膜抵抗器における
セラミツク素体（基体）は、直径１〜３mm、長さ
５〜10mm程度の大きさであり、直径1.5mm、長さ
６mmの棒状のセラミツク素体の場合、１バツチで
10〜15万個のセラミツク素体に抵抗膜を蒸着させ
ることができる。 The apparatus of this embodiment can be used, for example, to manufacture metal film resistors. The ceramic body (substrate) in a metal film resistor is approximately 1 to 3 mm in diameter and 5 to 10 mm in length.In the case of a rod-shaped ceramic body with a diameter of 1.5 mm and a length of 6 mm, one batch
Resistive films can be deposited on 100,000 to 150,000 ceramic bodies.
本実施例においては小型棒状基体を従来例と同
一容積の真空容器に約３倍投入でき、また基体表
面に蒸着した薄膜の膜厚ばらつきも従来例の約1/
３に減少した。 In this example, the small rod-shaped substrate can be charged approximately three times as much into a vacuum container with the same volume as the conventional example, and the variation in the thickness of the thin film deposited on the substrate surface is reduced to about 1/1 of that of the conventional example.
It decreased to 3.
以上のように本発明の金属薄膜蒸着装置を構成
したので、小容量の真空容器中に多量の基体を投
入することができ、また円筒状網籠の底面の網面
に均一に基体を落下させることができるため着膜
を効率的に行うことができるとともに基体表面の
蒸着膜厚のばらつきを減少させることができ、そ
の工業的価値は高いものとすることができる。 Since the metal thin film deposition apparatus of the present invention is configured as described above, a large amount of substrates can be charged into a small-capacity vacuum container, and the substrates can be uniformly dropped onto the mesh surface at the bottom of the cylindrical mesh basket. Therefore, the film can be deposited efficiently, and the variation in the thickness of the deposited film on the surface of the substrate can be reduced, and its industrial value can be high.
第１図は本発明の一実施例である金属薄膜蒸着
装置の概略構成を示す断面図、第２図は同実施例
の円筒状網籠の上面図である。
１……真空容器、２……円筒状網籠、３……基
体、４……るつぼ、７……撹拌羽根。
FIG. 1 is a sectional view showing a schematic configuration of a metal thin film deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a top view of a cylindrical mesh basket according to the same embodiment. 1... Vacuum container, 2... Cylindrical mesh cage, 3... Substrate, 4... Crucible, 7... Stirring blade.
Claims (1)
で回転し円筒状の外周面より放射状に内方に延び
る複数の撹拌羽根を設けて小型球状、棒状、角状
等の基体を撹拌する浅い円筒状網籠とを備え、前
記円筒状網籠の傾斜した平面からなる底面の下部
より抵抗加熱蒸着法、電子ビーム蒸着法、誘導加
熱蒸着法等の真空蒸着法により金属薄膜材料を蒸
発させ、前記円筒状網籠内の基体表面全面に均一
な金属薄膜を着膜させる金属薄膜蒸着装置。1. A vacuum container and a shallow cylinder that rotates in an inclined state in the vacuum container and is provided with a plurality of stirring blades extending radially inward from the outer peripheral surface of the cylinder to stir a small spherical, rod-shaped, square-shaped substrate, etc. A thin metal film material is evaporated from the lower part of the bottom surface of the cylindrical mesh cage by a vacuum evaporation method such as a resistance heating evaporation method, an electron beam evaporation method, an induction heating evaporation method, etc. A metal thin film deposition device that deposits a uniform thin metal film over the entire surface of a substrate inside a cylindrical mesh cage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7305281A JPS57188677A (en) | 1981-05-14 | 1981-05-14 | Vapor depositing device for metallic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7305281A JPS57188677A (en) | 1981-05-14 | 1981-05-14 | Vapor depositing device for metallic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57188677A JPS57188677A (en) | 1982-11-19 |
| JPS6352111B2 true JPS6352111B2 (en) | 1988-10-18 |
Family
ID=13507202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7305281A Granted JPS57188677A (en) | 1981-05-14 | 1981-05-14 | Vapor depositing device for metallic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57188677A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0245051A (en) * | 1988-08-04 | 1990-02-15 | Shiro Yamada | Artificial hair for planting and method and apparatus for producing artificial hair |
| EP1136587B1 (en) | 2000-03-23 | 2013-05-15 | Hitachi Metals, Ltd. | Deposited-film forming apparatus |
| JP2006342384A (en) * | 2005-06-08 | 2006-12-21 | Moritex Corp | Method and apparatus for manufacturing spherical lens with full face filter film, spherical lens with full-face filter film, and optical module |
| JP4899717B2 (en) * | 2006-08-21 | 2012-03-21 | ソニー株式会社 | Composite powder manufacturing method and composite powder manufacturing apparatus |
| JP5749223B2 (en) * | 2012-07-13 | 2015-07-15 | 株式会社メイハン | Method for forming spherical film |
| EP3567128A1 (en) * | 2018-05-08 | 2019-11-13 | IHI Hauzer Techno Coating B.V. | Deposition apparatus and method of coating spherical objects |
| CN115287601B (en) * | 2022-08-05 | 2023-09-22 | 温州鑫淼电镀有限公司 | Vacuum coating process for plastic product |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5059441A (en) * | 1973-09-27 | 1975-05-22 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5441155Y2 (en) * | 1975-05-01 | 1979-12-03 | ||
| JPS5441156Y2 (en) * | 1975-05-01 | 1979-12-03 |
-
1981
- 1981-05-14 JP JP7305281A patent/JPS57188677A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5059441A (en) * | 1973-09-27 | 1975-05-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57188677A (en) | 1982-11-19 |
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