HK1145093A1 - Multipurpose carrier of vacuum vapor deposition material and method thereof - Google Patents

Multipurpose carrier of vacuum vapor deposition material and method thereof

Info

Publication number
HK1145093A1
HK1145093A1 HK10111608.9A HK10111608A HK1145093A1 HK 1145093 A1 HK1145093 A1 HK 1145093A1 HK 10111608 A HK10111608 A HK 10111608A HK 1145093 A1 HK1145093 A1 HK 1145093A1
Authority
HK
Hong Kong
Prior art keywords
vapor deposition
deposition material
vacuum vapor
multipurpose carrier
multipurpose
Prior art date
Application number
HK10111608.9A
Inventor
Hyun Joong Kim
Hong Chul Kim
Jeong Rae Kim
Original Assignee
Ceko Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceko Corp Ltd filed Critical Ceko Corp Ltd
Publication of HK1145093A1 publication Critical patent/HK1145093A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
HK10111608.9A 2007-07-26 2010-12-14 Multipurpose carrier of vacuum vapor deposition material and method thereof HK1145093A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070075000A KR101025005B1 (en) 2007-07-26 2007-07-26 Multipurpose carrier of vacuum vapor deposition material and method thereof
PCT/KR2008/004352 WO2009014398A2 (en) 2007-07-26 2008-07-25 Multipurpose carrier of vacuum vapor deposition material and method thereof

Publications (1)

Publication Number Publication Date
HK1145093A1 true HK1145093A1 (en) 2011-04-01

Family

ID=40281990

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10111608.9A HK1145093A1 (en) 2007-07-26 2010-12-14 Multipurpose carrier of vacuum vapor deposition material and method thereof

Country Status (5)

Country Link
JP (1) JP5188575B2 (en)
KR (1) KR101025005B1 (en)
CN (1) CN101765676B (en)
HK (1) HK1145093A1 (en)
WO (1) WO2009014398A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9972128B2 (en) 2012-07-20 2018-05-15 The University Of British Columbia Methods and systems for generating polycubes and all-hexahedral meshes of an object
KR20140013471A (en) 2012-07-24 2014-02-05 주식회사 쎄코 Heating assembly for vacuum deposition and vacuum deposition apparatus having the same
KR101355208B1 (en) * 2012-08-02 2014-01-27 주식회사 유라마 Organic matter carrier housing for vacuum metalizing
KR101480726B1 (en) * 2012-12-21 2015-01-09 주식회사 선익시스템 Vacuum Evaporating Apparatus
CA2925435A1 (en) 2013-11-04 2015-05-07 The University Of British Columbia Methods and systems for generating polycube segmentations from input meshes of objects
KR101404047B1 (en) 2013-11-29 2014-06-10 (주)파인켐텍 Container of vacuum deposition material
JP6694673B2 (en) * 2014-06-02 2020-05-20 キヤノンオプトロン株式会社 Evaporation source and vapor deposition method using the same
KR200480271Y1 (en) 2014-11-26 2016-05-18 (주)파인켐텍 Container For Vacuum Deposition Material
JP6896629B2 (en) * 2014-12-19 2021-06-30 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ Filter device for removing particles from steam stream
US10210657B2 (en) 2015-07-24 2019-02-19 The University Of British Columbia Methods and systems for hex-mesh optimization via edge-cone rectification
KR20170116398A (en) * 2016-04-11 2017-10-19 주식회사 쎄코 Carrier for deposition
CN114134464A (en) * 2021-10-26 2022-03-04 惠州市华阳光学技术有限公司 Structural color pigment and preparation method thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197564A (en) * 1989-01-27 1990-08-06 Nippon Dempa Kogyo Co Ltd Vacuum deposition device
JPH0783913B2 (en) * 1990-04-17 1995-09-13 国産部品工業株式会社 Wire mesh porous body for engine muffler and method of manufacturing the same
JPH04272169A (en) * 1991-02-25 1992-09-28 Shimadzu Corp Impregnating type vacuum deposition device
JPH04285157A (en) * 1991-03-12 1992-10-09 Hitachi Ltd Method for vaporizing metal
JP2892620B2 (en) * 1996-06-17 1999-05-17 株式会社東京製品開発研究所 Vacuum evaporation method for optical parts using porous ceramics sintered compact impregnated with organic film-forming substance for optical parts
JP2001183503A (en) * 1999-12-24 2001-07-06 Toray Ind Inc Method of producing optical article
JP2001323367A (en) * 2000-03-09 2001-11-22 Junji Kido Method for vapor depositing organic compound, and method for purifying organic compound
JP2001335920A (en) * 2000-05-26 2001-12-07 Toray Ind Inc Vapor deposition source, optical article and the producing method
JP2002335920A (en) * 2001-05-17 2002-11-26 House Foods Corp White color-based liquid food
JP2003264079A (en) * 2002-03-11 2003-09-19 Sanyo Electric Co Ltd Evaporation source for evaporator, evaporator using the same, and manufacturing method of organic el element
KR200322862Y1 (en) * 2003-05-16 2003-08-14 김영정 Porous Ceramic Tablet for Vacuum Coating
KR100528892B1 (en) * 2003-08-22 2005-11-15 신도현 Vehicle for carrying repellent agent for coating treatment under vacuum state
JP4001296B2 (en) * 2005-08-25 2007-10-31 トッキ株式会社 Method and apparatus for vacuum deposition of organic materials
JP2008150678A (en) * 2006-12-19 2008-07-03 Sony Corp Evaporation source, vapor deposition apparatus, vapor deposition method, apparatus for manufacturing organic electroluminescence display unit, and method for manufacturing organic electroluminescence display unit

Also Published As

Publication number Publication date
CN101765676A (en) 2010-06-30
KR101025005B1 (en) 2011-03-24
JP2010534767A (en) 2010-11-11
JP5188575B2 (en) 2013-04-24
CN101765676B (en) 2012-04-11
WO2009014398A3 (en) 2009-04-02
WO2009014398A2 (en) 2009-01-29
KR20090011432A (en) 2009-02-02

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